CN104060242B - 一种载体表面光敏化制备金属纳米材料的装置及方法 - Google Patents
一种载体表面光敏化制备金属纳米材料的装置及方法 Download PDFInfo
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- CN104060242B CN104060242B CN201310086689.XA CN201310086689A CN104060242B CN 104060242 B CN104060242 B CN 104060242B CN 201310086689 A CN201310086689 A CN 201310086689A CN 104060242 B CN104060242 B CN 104060242B
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
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- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 8
- 239000012965 benzophenone Substances 0.000 claims description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical group [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 7
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 claims description 6
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- 239000002082 metal nanoparticle Substances 0.000 claims description 3
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- 239000004065 semiconductor Substances 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- QVCCUCPJAKTFEW-UHFFFAOYSA-N chloric acid gold Chemical compound Cl(=O)(=O)O.[Au] QVCCUCPJAKTFEW-UHFFFAOYSA-N 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 239000001509 sodium citrate Substances 0.000 claims description 2
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 claims description 2
- 229940038773 trisodium citrate Drugs 0.000 claims description 2
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000010453 quartz Substances 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000005286 illumination Methods 0.000 description 6
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- 239000004408 titanium dioxide Substances 0.000 description 5
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
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- 229910052802 copper Inorganic materials 0.000 description 2
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- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 101100001675 Emericella variicolor andJ gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- SDKPSXWGRWWLKR-UHFFFAOYSA-M sodium;9,10-dioxoanthracene-1-sulfonate Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] SDKPSXWGRWWLKR-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
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CN201310086689.XA CN104060242B (zh) | 2013-03-18 | 2013-03-18 | 一种载体表面光敏化制备金属纳米材料的装置及方法 |
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CN201310086689.XA CN104060242B (zh) | 2013-03-18 | 2013-03-18 | 一种载体表面光敏化制备金属纳米材料的装置及方法 |
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CN104060242A CN104060242A (zh) | 2014-09-24 |
CN104060242B true CN104060242B (zh) | 2016-04-13 |
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CN115740430A (zh) * | 2022-11-10 | 2023-03-07 | 苏州大学 | 一种光驱动微纳米马达及其制备方法与应用 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4753821A (en) * | 1984-09-19 | 1988-06-28 | Bayer Aktiengesellschaft | Process for the partial metallization of substrate surfaces |
CN1563550A (zh) * | 2004-04-19 | 2005-01-12 | 太原理工大学 | 纤维表面纳米晶化处理工艺 |
CN102528074A (zh) * | 2012-02-21 | 2012-07-04 | 北京化工大学 | 光致铜离子金属纳米化的方法 |
Family Cites Families (1)
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JP2009221563A (ja) * | 2008-03-18 | 2009-10-01 | Ricoh Co Ltd | 金ナノロッドとその製造方法、金ナノロッドを用いた電磁波吸収体、色材、光記録材料および二光子反応材料 |
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2013
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4753821A (en) * | 1984-09-19 | 1988-06-28 | Bayer Aktiengesellschaft | Process for the partial metallization of substrate surfaces |
CN1563550A (zh) * | 2004-04-19 | 2005-01-12 | 太原理工大学 | 纤维表面纳米晶化处理工艺 |
CN102528074A (zh) * | 2012-02-21 | 2012-07-04 | 北京化工大学 | 光致铜离子金属纳米化的方法 |
Non-Patent Citations (2)
Title |
---|
"Photochemical strategies for the synthesis of gold nanoparticles from Au(III) and Au(I) using photoinduced free radical generation";M. Luisa Marin等;《Journal of the American Chemical Society 》;20081231;第130卷(第49期);第S1-S8页 * |
"Plasmon-Enhanced Photocurrent Generation from Self-Assembled Monolayers of Phthalocyanine by Using Gold Nanoparticle Films";Kosuke Sugawa等;《Langmuir》;20090409;第25卷(第6期);第3887-3893页 * |
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Effective date of registration: 20180117 Address after: 215600 A 207 room A building center of Zhangjiagang Free Trade Zone, Suzhou Free Trade Zone, Jiangsu Patentee after: ZHANGJIAGANG INDUSTRY TECHNOLOGY RESEARCH INSTITUTE CO.,LTD. DALIAN INSTITUTE OF CHEMICAL PHYSICS CHINESE ACADEMY OF SCIENCES Address before: 116023 Zhongshan Road, Liaoning, No. 457, Patentee before: Dalian Institute of Chemical Physics, Chinese Academy of Sciences |
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Effective date of registration: 20240131 Address after: 116023 No. 457, Zhongshan Road, Liaoning, Dalian Patentee after: DALIAN INSTITUTE OF CHEMICAL PHYSICS, CHINESE ACADEMY OF SCIENCES Country or region after: China Address before: Room 207, Building A, Emerging Industry Development Center, Zhangjiagang Free Trade Zone, Suzhou City, Jiangsu Province Patentee before: ZHANGJIAGANG INDUSTRY TECHNOLOGY RESEARCH INSTITUTE CO.,LTD. DALIAN INSTITUTE OF CHEMICAL PHYSICS CHINESE ACADEMY OF SCIENCES Country or region before: China |