CN104046991A - Copper polishing agent and preparation method thereof - Google Patents
Copper polishing agent and preparation method thereof Download PDFInfo
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- CN104046991A CN104046991A CN201410283543.9A CN201410283543A CN104046991A CN 104046991 A CN104046991 A CN 104046991A CN 201410283543 A CN201410283543 A CN 201410283543A CN 104046991 A CN104046991 A CN 104046991A
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- copper
- polishing agent
- rumbling compound
- copper polishing
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Abstract
The invention discloses a copper polishing agent and a preparation method thereof and belongs to the technical field of metal cleaning. According to the copper polishing agent and the preparation method thereof, disclosed by the invention, the copper polishing agent is stable in polishing effect and convenient in use. The copper polishing agent is characterized in that the copper polishing agent per liter contains the following ingredients by weight: 200-500g of hydrogen peroxide, 10-30g of amino disodium triacetate, 30-60g of diethylene glycol monobutyl ether, 80-120g of acid, 3-8g of a corrosion inhibitor, 40-80g of benzyl alcohol and the balance of water. The preparation method of the copper polishing agent comprises the steps: (1) weighing all the ingredients; (2) putting the ingredients weighed in the step (1) in a reaction vessel, adding water until the volume is 1L, and then, stirring for 20-60 minutes at the temperature of 40-50 DEG C, thereby obtaining the copper polishing agent.
Description
Technical field
The present invention relates to a kind of rumbling compound, specifically, relate to a kind of copper rumbling compound, belong to metal cleaning technical field.
Background technology
Hardware shapes rear surface can adhere to one deck greasy dirt or other chemicals conventionally; utensil uses after for some time the corrosion by environment for use; on surface, can produce rusty stain; for attractive in appearance and increase the service life; many metallic elements all need certain luminance brightness, and polished finish is the important link of parts machining, the normal rumbling compound that adds in polished finish process; to improve the luminance brightness of metallic element, and clean metal surface.But the problems such as existing rumbling compound exists and returns rust soon, and applicable metal species is narrow, cleaning is not thorough, contain fluorine cpd or P contained compound, environmental pollution in many rumbling compounds.And conventional rumbling compound be take solid as main on market, i.e. rubbing paste, this product is intermittent type means operation often in use, and labour intensity is large, and unit output is low, complete not to fine structure surface treatment.
Summary of the invention
For the problems referred to above, the object of the present invention is to provide a kind of polishing effect stable, copper rumbling compound easy to use, the present invention also provides the preparation method of this copper rumbling compound.
For this reason, last technical scheme provided by the invention is such: this copper rumbling compound, and every liter of copper rumbling compound contains following component: hydrogen peroxide 200-500g, nitrilotriacetic acid disodium 10-30g, butyl carbitol 30-60g, acid 80～120g, inhibiter 3-8g, phenylcarbinol 40-80g, surplus is water.
Above-mentioned copper rumbling compound, every liter of copper rumbling compound contains following component: hydrogen peroxide 300～400g, nitrilotriacetic acid disodium 15-25g, butyl carbitol 40-50g, mineral acid 90～110g, inhibiter 4-7g, phenylcarbinol 50-70g, surplus is water.
Further, above-mentioned copper rumbling compound, described acid is citric acid.
Further, above-mentioned copper rumbling compound, described inhibiter is acetyl monoethanolamine.
In order to prepare this copper rumbling compound, a rear technical scheme of the present invention is to provide the preparation method of this copper rumbling compound, and the method comprises the steps: successively
1) by following quality, take each component: hydrogen peroxide 200-500g, nitrilotriacetic acid disodium 10-30g, butyl carbitol 30-60g, acid 80～120g, inhibiter 3-8g, phenylcarbinol 40-80g;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 40-50 ℃, stir and within 20-60 minute, obtain copper rumbling compound.
Compared with prior art, technical scheme tool provided by the invention has the following advantages:
1. copper rumbling compound polishing effect of the present invention is good, can remove rapidly the corrosion material on copper surface, improves the luminance brightness of metallic surface, simple to operate, metal products noresidue.
2. metal polish polishing effect of the present invention is stable, the several functions such as having can rust cleaning, oil removing, removal oxide compound, antirust, Cleaning and polishing.
Embodiment
Below in conjunction with concrete enforcement, claim of the present invention is described in further detail, the modification of the limited number of time that anyone makes within the scope of the claims in the present invention, still within claim protection domain of the present invention.
Embodiment 1
A kind of copper rumbling compound provided by the invention, every liter of copper rumbling compound contains following component: hydrogen peroxide 500g, nitrilotriacetic acid disodium 10g, butyl carbitol 60g, citric acid 80g, acetyl monoethanolamine 8g, phenylcarbinol 40g.
Preparation method is as follows:
1) by above-mentioned total mass number, take each component;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 50 ℃, stir and within 50 minutes, obtain copper rumbling compound.
Embodiment 2
A kind of copper rumbling compound provided by the invention, every liter of copper rumbling compound contains following component: hydrogen peroxide 200g, nitrilotriacetic acid disodium 30g, butyl carbitol 30g, citric acid 120g, acetyl monoethanolamine 3g, phenylcarbinol 80g.
Preparation method is as follows:
1) by above-mentioned total mass number, take each component;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 40 ℃, stir and within 60 minutes, obtain copper rumbling compound.
Embodiment 3
A kind of copper rumbling compound provided by the invention, every liter of copper rumbling compound contains following component: hydrogen peroxide 300g, nitrilotriacetic acid disodium 30g, butyl carbitol 30g, citric acid 100g, acetyl monoethanolamine 38g, phenylcarbinol 50g.
Preparation method is as follows:
1) by above-mentioned total mass number, take each component;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 45 ℃, stir and within 40 minutes, obtain copper rumbling compound.
Embodiment 4
A kind of copper rumbling compound provided by the invention, every liter of copper rumbling compound contains following component: hydrogen peroxide 400g, nitrilotriacetic acid disodium 30g, butyl carbitol 50g, citric acid 90g, acetyl monoethanolamine 6g, phenylcarbinol 60g.
Preparation method is as follows:
1) by above-mentioned total mass number, take each component;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 50 ℃, stir and within 20 minutes, obtain copper rumbling compound.
Claims (5)
1. a copper rumbling compound, is characterized in that, every liter of copper rumbling compound contains following component: hydrogen peroxide 200-500g, and nitrilotriacetic acid disodium 10-30g, butyl carbitol 30-60g, acid 80～120g, inhibiter 3-8g, phenylcarbinol 40-80g, surplus is water.
2. copper rumbling compound according to claim 1, is characterized in that, every liter of copper rumbling compound contains following component: hydrogen peroxide 300～400g, nitrilotriacetic acid disodium 15-25g, butyl carbitol 40-50g, mineral acid 90～110g, inhibiter 4-7g, phenylcarbinol 50-70g, surplus is water.
3. according to the copper rumbling compound described in claim 1 or 2, it is characterized in that, described acid is citric acid.
4. according to the copper rumbling compound described in claim 1 or 2, it is characterized in that, described inhibiter is acetyl monoethanolamine.
5. the preparation method of copper rumbling compound claimed in claim 1, is characterized in that, comprises the steps: successively
1) according to quality claimed in claim 1, take each component;
2) by step 1) component that takes puts into reactor, adds water to 1L, and then at 40-50 ℃, stir and within 20-60 minute, obtain copper rumbling compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283543.9A CN104046991A (en) | 2014-06-23 | 2014-06-23 | Copper polishing agent and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283543.9A CN104046991A (en) | 2014-06-23 | 2014-06-23 | Copper polishing agent and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104046991A true CN104046991A (en) | 2014-09-17 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410283543.9A Pending CN104046991A (en) | 2014-06-23 | 2014-06-23 | Copper polishing agent and preparation method thereof |
Country Status (1)
| Country | Link |
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| CN (1) | CN104046991A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637218A (en) * | 2016-12-24 | 2017-05-10 | 李月巧 | Polishing agent and preparation method thereof |
| CN108085687A (en) * | 2017-12-01 | 2018-05-29 | 东方电气集团东方汽轮机有限公司 | Cupric piece surface processing polishing agent |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101851470A (en) * | 2009-04-03 | 2010-10-06 | 比亚迪股份有限公司 | Chemical polishing liquid and polishing method |
| CN102747371A (en) * | 2012-07-17 | 2012-10-24 | 许泽波 | Chemical polish for copper and alloy surface treatment and preparation method thereof |
| CN103695912A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Metal polishing agent |
-
2014
- 2014-06-23 CN CN201410283543.9A patent/CN104046991A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101851470A (en) * | 2009-04-03 | 2010-10-06 | 比亚迪股份有限公司 | Chemical polishing liquid and polishing method |
| CN102747371A (en) * | 2012-07-17 | 2012-10-24 | 许泽波 | Chemical polish for copper and alloy surface treatment and preparation method thereof |
| CN103695912A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Metal polishing agent |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637218A (en) * | 2016-12-24 | 2017-05-10 | 李月巧 | Polishing agent and preparation method thereof |
| CN108085687A (en) * | 2017-12-01 | 2018-05-29 | 东方电气集团东方汽轮机有限公司 | Cupric piece surface processing polishing agent |
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140917 |