CN104037044B - Vertical focusing device for ion beam - Google Patents
Vertical focusing device for ion beam Download PDFInfo
- Publication number
- CN104037044B CN104037044B CN201410324394.6A CN201410324394A CN104037044B CN 104037044 B CN104037044 B CN 104037044B CN 201410324394 A CN201410324394 A CN 201410324394A CN 104037044 B CN104037044 B CN 104037044B
- Authority
- CN
- China
- Prior art keywords
- ion beam
- magnet
- channel
- focused set
- housing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses an ion beam vertical focusing device, which comprises a shell with a lens cavity and a cover plate arranged on the shell, wherein the lens cavity is arranged on the shell; the cover plate is provided with a cooling liquid joint and an electric appliance joint; at least one pair of magnets for generating a symmetrical magnetic field to vertically focus the ion beam are arranged in a lens cavity of the shell, a fan-shaped beam channel for passing the ion beam is formed between each pair of magnets, and the left side wall and the right side wall of the beam channel are vertical to magnetic lines of force generated by the magnets on the corresponding sides; the magnets are vertically arranged, and the beam current channels are transversely arranged; and a graphite protection plate for preventing metal from polluting the lens cavity is arranged between the beam current channel and the magnet. The invention can adjust the vertical focusing state of the beam after being analyzed by the analyzer, and ensure the analysis precision and the transmission efficiency of the beam under different beam states.
Description
Technical field
The present invention relates to a kind of semiconductor device manufacturing control system, particularly relate to the device of a kind of ion beam vertical focusing, vertical focusing lens regulate the focus state of line after device by analysis is analyzed, ensureing the analysis precision under different beam status and the efficiency of transmission of line, this device is one of key device in mental retardation large beam ion injection equipment.
Background technology
In existing semiconductor integrated circuit manufacturing technology, along with the development of semiconductor integrated circuit technology, integrated level is more and more higher, and circuit scale is increasing, and in circuit, unit component size is more and more less, has higher requirement each semiconductor manufacturing equipment.Along with the ion implantation device of chip production process development line big to mental retardation is in great demand, 45nm mental retardation large beam ion implanter is applied widely in IC technique, it has also become ion implanting key processing equipment.
Broadband ion source produces high-density plasma, the broadband ion beam with one fixed width size is drawn by extraction system, then broadband ion beam enters analysis magnet, broadband bundle is deflected by analyzing magnetically confined, broadband ion beam is under the effect analyzing magnetic field vertically and horizontally component, it is achieved vertically and horizontally double focusing, and horizontal focus is positioned at analysis light hurdle, vertical direction focuses on the major control line height in vertical direction, reduces transmission loss；The ion meeting analysis magnet sorting parameter in the ion beam in entrance analysis magnetic field pools focal spot at analysis light hurdle, analysis light hurdle can be passed through, other ion is dispersed into vacuum chamber or is blocked by light hurdle, the space after analyzing light hurdle can not be entered, complete the sorting to ion source educt beaming flow；The horizontal and vertical focus state of line after analysis magnet exports and analyze the horizontal focusing lens arranged between light hurdle and vertical focusing lens regulate analysis respectively, improve the efficiency of transmission of line after analyzing, and better adapt to the transmission of subsequent optical path, therefore, ion normal focused set is the mental retardation requisite key device of large beam ion implanter.
Summary of the invention
For the deficiencies in the prior art, it is desirable to provide a kind of ion beam normal focused set, this device can regulate the vertical focusing state of line after device is analyzed by analysis, it is ensured that the analysis precision under different beam status and the efficiency of transmission of line.
To achieve these goals, the technical solution adopted in the present invention is:
A kind of ion beam normal focused set, including having the housing of lens cavity, and the cover plate being contained on housing；Equipped with coolant joint and electrical connector on described cover plate；It is structurally characterized in that, the lens cavity of described housing carries out the Magnet of vertical focusing built with at least one pair of for producing symmetric magnetic field to ion beam, being formed between every pair of Magnet for by the fan-shaped beam channel of ion beam, this beam channel left and right sides wall is vertical with the magnetic line of force that the Magnet of corresponding side produces；Described Magnet is vertically arranged, described beam channel lateral arrangement；The graphite protective plate preventing metallic pollution lens cavity it is provided with between described beam channel and Magnet.
It is below the technical scheme of further improvement of the present invention:
Preferably, magnetic core is included, around the line bag being contained on magnetic core, and the first magnetic sheet of being contained on magnetic core side and the second magnetic sheet described in；Described line bag electrically connects with described electrical connector.
Further, described magnetic core side has magnetic pole groove, and described first magnetic sheet and the second magnetic sheet are fixedly mounted in described magnetic pole groove.Described magnetic core and magnetic sheet preferably employ DT4 material.
As a kind of concrete version, described graphite protective plate includes the fixed dam for being fixed on housing, and the liner plate up and down that is fixedly linked with described fixed dam and left and right liner plate；Described upper and lower liner plate and left and right liner plate hold described beam channel and form sector channel.
In order to preferably Magnet be cooled down, have in described magnetic core and the cooling passage of described coolant fittings.
Equipped with handle on described cover plate；In the end of housing equipped with the guiding slide being easily installed ion beam normal focused set.Installing/dismounting assembly of the invention for convenience, described guiding slide, built with linear bearing, by a polished rod through guiding slide, after dismounting securing member, can promote or pull out assembly of the invention.
Described Magnet is fixed in inner walls by determining export trade.
Further, the angle between the wall of the described beam channel left and right sides is 14 ° ~ 18 °, and the exit width of beam channel is 62-72mm, and the entrance width of this beam channel is 23 ~ 33mm.
According to embodiments of the invention, the lens cavity of described housing is used for producing symmetric magnetic field built with two and ion beam carries out the Magnet of vertical focusing.
The invention will be further described below:
Compared with prior art, the invention has the beneficial effects as follows:
1), compact in this device overall structure, it is simple to installing/dismounting；
2), replace Co-wound coil direction magnetic pole to produce magnetic field with the magnetic pole becoming direction of winding, make the more flexible regulation of ion beam focusing state；
3), device controls focal length by the electric current of regulation pole coil so that focal length can require to adjust according to ion implanting beam Propagation；
4), device be designed with cooling line, the ion beam focusing lens life-span can be extended；
5), there is graphite protective plate, prevent metallic pollution.
Accompanying drawing explanation
Fig. 1 is the structural representation of one embodiment of the invention；
Fig. 2 is the magnet arrangement schematic diagram of the present invention；
Fig. 3 is the graphite protection plate structure schematic diagram of the present invention；
Fig. 4 is the longitudinal sectional drawing of Fig. 1；
Fig. 5 is the horizontal sectional drawing of Fig. 1.
Detailed description of the invention
The invention will be described further with specific embodiment below in conjunction with the accompanying drawings, it should be appreciated that these descriptions are all illustrative, the invention is not restricted to this.The scope of the present invention is only limited by scope of the following claims.
The device of a kind of ion beam vertical focusing, is mainly used in mental retardation large beam ion and injects the ion vertical focusing in link；This device includes the housing 1 with lens cavity, cover plate 2, handle 3, electrical connector 4, pipeline water swivel 5, mounting seat 6, guides slide 7, upper cover plate 8, graphite protective plate 9, Magnet 10, Magnet alignment pin 12；Its middle shell 1 inner set magnet 10, there is fladellum circulation road 11 centre, and ion beam passes through from which, and the angle between the wall of described beam channel 11 left and right sides is 16 °, and the exit width of beam channel 11 is 67mm, and the entrance width of this beam channel 11 is 28mm.Symmetric magnetic field is produced to ion vertical focusing after Magnet 10 energising；Graphite protective plate 9 can protect cavity inner wall, prevents metallic pollution.Pipeline water swivel 5 is responsible for being connected with total cooling line；Electrical connector 4 is responsible for connecting power supply.
It is provided with 2 on the wherein said housing 1 with lens cavity and guides slides 7, guide in slide 7 and be respectively arranged with 2 linear bearings, inserted in linear bearing to assist this device of installing/dismounting by polished rod.
Wherein Magnet 10 is by magnetic core, magnetic sheet 101, magnetic sheet 102, line bag 103 forms, magnetic core 100 and magnetic sheet use DT4 material, there is good magnetic conduction effect, the vertical focusing magnetic field making generation keeps higher resolution capability, and light path still keeps higher efficiency of transmission magnetic pole both sides to slot simultaneously, and magnetic sheet 101, magnetic sheet 102 are fixed in magnetic pole groove, line bag is wrapped between magnetic sheet by specific direction, and connected mode is shown in accompanying drawing 2.
Being fixed with Magnet alignment pin 12 and upper cover plate 8, handle 3, guiding slide 6 are fixed on housing 1, housing 1 have screwed hole for installing graphite protective plate 9；The assembling mode of Magnet 10 is shown in accompanying drawing 1, the wherein fixing magnetic sheet of magnetic core both sides fluting and line bag, and magnetic pole two ends are fixed by alignment pin, because this device to work under vacuum conditions, relevant place needs to install sealing ring.
Wherein graphite protective plate 9 is made up of left and right liner plate 91, upper and lower liner plate 92, graphite fixed dam 90, and the right liner plate of protective plate 9 and the housing 1 with lens cavity are connected by screw fixing, and concrete connected mode is shown in accompanying drawing 3.
The content of patent of the present invention is elaborated by only certain embodiments of the present invention.For persons skilled in the art, any obvious change on the premise of without departing substantially from patent spirit of the present invention, it done, all constitute the infringement to patent of the present invention, corresponding legal responsibility will be undertaken.
Claims (10)
1. an ion beam normal focused set, including having the housing (1) of lens cavity, and the cover plate (2) being contained on housing (1)；Equipped with coolant joint (5) and electrical connector (4) on described cover plate (2)；It is characterized in that, the lens cavity of described housing (1) carries out the Magnet (10) of vertical focusing built with at least one pair of for producing symmetric magnetic field to ion beam, being formed between every pair of Magnet for by the fan-shaped beam channel (11) of ion beam, this beam channel (11) left and right sides wall is vertical with the magnetic line of force that the Magnet of corresponding side (10) produces；Described Magnet (10) is vertically arranged, described beam channel (11) lateral arrangement；The graphite protective plate (9) preventing metallic pollution lens cavity it is provided with between described beam channel (11) and Magnet.
Ion beam normal focused set the most according to claim 1, it is characterized in that, described Magnet (10) includes magnetic core (100), around the line bag (103) being contained on magnetic core (100), and the first magnetic sheet (101) of being contained on magnetic core (100) side and the second magnetic sheet (102)；Described line bag (103) electrically connects with described electrical connector (4).
Ion beam normal focused set the most according to claim 2, it is characterised in that described magnetic core (100) side has magnetic pole groove, described first magnetic sheet (101) and the second magnetic sheet (102) are fixedly mounted in described magnetic pole groove.
Ion beam normal focused set the most according to claim 1, it is characterized in that, described graphite protective plate (9) includes the fixed dam (90) for being fixed on housing (1), and the liner plate up and down (92) that is fixedly linked with described fixed dam (90) and left and right liner plate (91)；Described upper and lower liner plate (92) and left and right liner plate (91) hold described beam channel (11) and form sector channel.
Ion beam normal focused set the most according to claim 2, it is characterised in that have the cooling passage connected with described coolant joint (5) in described magnetic core (100).
Ion beam normal focused set the most according to claim 1, it is characterised in that equipped with handle (3) on described cover plate (2)；In the end of housing (1) equipped with the guiding slide (7) being easily installed ion beam normal focused set.
Ion beam normal focused set the most according to claim 6, it is characterised in that described guiding slide (7) is built with linear bearing.
Ion beam normal focused set the most according to claim 1, it is characterised in that described Magnet (10) is fixed on housing (1) inwall by alignment pin (12).
Ion beam normal focused set the most according to claim 1, it is characterized in that, angle between the wall of described beam channel (11) left and right sides is 14 ° ~ 18 °, and the exit width of beam channel (11) is 67 ~ 72mm, and the entrance width of this beam channel (11) is 23 ~ 33mm.
Ion beam normal focused set the most according to claim 1, it is characterised in that the lens cavity of described housing (1) is used for producing symmetric magnetic field built with two and ion beam carries out the Magnet (10) of vertical focusing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410324394.6A CN104037044B (en) | 2014-07-09 | 2014-07-09 | Vertical focusing device for ion beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410324394.6A CN104037044B (en) | 2014-07-09 | 2014-07-09 | Vertical focusing device for ion beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104037044A CN104037044A (en) | 2014-09-10 |
| CN104037044B true CN104037044B (en) | 2016-09-28 |
Family
ID=51467773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410324394.6A Active CN104037044B (en) | 2014-07-09 | 2014-07-09 | Vertical focusing device for ion beam |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104037044B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106653533B (en) * | 2015-11-04 | 2018-08-14 | 北京中科信电子装备有限公司 | A kind of ion implantation apparatus of charged particle line magnetic field focusing structure and the application structure |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5227643B2 (en) * | 2008-04-14 | 2013-07-03 | 株式会社日立ハイテクノロジーズ | An electron beam application device that enables observation with high resolution and high contrast |
| US8242469B2 (en) * | 2009-07-15 | 2012-08-14 | Axcelis Technologies, Inc. | Adjustable louvered plasma electron flood enclosure |
| US8471476B2 (en) * | 2010-10-08 | 2013-06-25 | Varian Semiconductor Equipment Associates, Inc. | Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement |
| WO2014043865A1 (en) * | 2012-09-19 | 2014-03-27 | 北京中科信电子装备有限公司 | Apparatus for adjusting divergence angle of divergent beam |
| CN103779164B (en) * | 2013-11-08 | 2015-12-02 | 北京中科信电子装备有限公司 | A kind of beam deceleration device |
-
2014
- 2014-07-09 CN CN201410324394.6A patent/CN104037044B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104037044A (en) | 2014-09-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101678003B1 (en) | Cooling Device For Molded Transformer | |
| CN104037044B (en) | Vertical focusing device for ion beam | |
| TWI523585B (en) | Cyclotron | |
| KR20140130731A (en) | Control rod drive mechanism("crdm") assembly for a nuclear reactor | |
| CN106099765A (en) | A kind of device regulating electric wire tension force | |
| CN102473464B (en) | Cooling unit for nuclear reactor control rod driving apparatus | |
| CN2867584Y (en) | Magnetic quadripolar lens | |
| CN102789948A (en) | Method and structure for controlling magnetic field distributions in an exb wien filter | |
| CN103107056B (en) | Broadband ion beam analyzer | |
| US9852817B2 (en) | Control rod drive mechanism built in nuclear reactor | |
| CN104703380B (en) | The more beamforming drift tube ion accelerators of single-chamber | |
| CN106409635B (en) | A kind of short magnetic focusing arrangement and method for ultrafast electronic impulse transverse compression | |
| CN106026527A (en) | Linear motor water cooling mechanism and cooling method thereof | |
| CN104851471A (en) | Three-unit magnetic quadrupole lens system and manufacturing method thereof | |
| CN115209606A (en) | Parallel acceleration type strong current ion accelerator | |
| CN104576272A (en) | Beam current detection and analysis device | |
| CN104576269A (en) | Cooling mechanism for horizontal ion-beam focusing device | |
| CN103140013A (en) | De-dispersion deflection device for high-energy electron beam | |
| CN206674289U (en) | A kind of new magnet for line homogenization | |
| KR102079024B1 (en) | Magnetic Field Station, Insert Assembly, Mount assembly and 2-Axis Magnetic Generating Equipment Including Thereof | |
| CN106653530A (en) | Novel broadband ion beam adjusting lens | |
| CN216212808U (en) | Inductor that safety protection performance is good | |
| JP2699910B2 (en) | Bending electromagnet device in ion implanter | |
| JP2011160632A (en) | Canned linear motor armature, and canned linear motor | |
| Skaritka et al. | The Design and Construction of NSLS II Magnets |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220509 Address after: 101111 1st floor, building 1, 6 Xingguang 2nd Street, Tongzhou District, Beijing Patentee after: Beijing Scintillation Section Zhongkexin Electronic Equipment Co.,Ltd. Address before: 101100 No. 6, Xingguang Second Street, optical electromechanical integration industrial base, Tongzhou District, Beijing Patentee before: BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT Co.,Ltd. |
|
| TR01 | Transfer of patent right |