CN104576269A - Cooling mechanism for horizontal ion-beam focusing device - Google Patents

Cooling mechanism for horizontal ion-beam focusing device Download PDF

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Publication number
CN104576269A
CN104576269A CN201310507586.6A CN201310507586A CN104576269A CN 104576269 A CN104576269 A CN 104576269A CN 201310507586 A CN201310507586 A CN 201310507586A CN 104576269 A CN104576269 A CN 104576269A
Authority
CN
China
Prior art keywords
copper pipe
ion
focusing device
cooling
magnetic core
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310507586.6A
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Chinese (zh)
Inventor
张进学
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Zhongkexin Electronic Equipment Co Ltd
Original Assignee
Beijing Zhongkexin Electronic Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Zhongkexin Electronic Equipment Co Ltd filed Critical Beijing Zhongkexin Electronic Equipment Co Ltd
Priority to CN201310507586.6A priority Critical patent/CN104576269A/en
Publication of CN104576269A publication Critical patent/CN104576269A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002Cooling arrangements

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a cooling mechanism for a horizontal ion-beam focusing device. The horizontal ion-beam focusing device is mainly used for horizontally focusing ions in the step of injecting low-energy large-beam ions, the heat which is generated when the horizontal ion-beam focusing device is used needs to be cooled by the mechanism disclosed by the invention. The device comprises a magnetic lens core (1), a copper pipe (2) and a straight-through connector (3). The device is characterized in that as a water cooling pipeline, the copper pipe (2) has a good heat-conducting property, and the copper pipe has a good antirust capability, so that the mechanism is guaranteed not to pollute a deionized water system. The mechanism disclosed by the invention is compact in overall structure, and is convenient to process and realize; compared with other schemes, the adoption of the copper pipe for cooling water is better in cooling effect, and besides, the deionized water system is not polluted.

Description

A kind of cooling body of ion beam horizontal focusing device
Technical field
The present invention relates to a kind of semiconductor device manufacturing control system, particularly relate to a kind of cooling body of ion beam horizontal focusing device, the water-cooling system of ion implantor is deionized water system, and wherein each cooling link wants strict antirust preventing pollution deionized water.
Background technology
In existing semiconductor integrated circuit manufacturing technology, along with the development of semiconductor integrated circuit technology, integrated level is more and more higher, and circuit scale is increasing, and in circuit, unit component size is more and more less, has higher requirement to each semiconductor manufacturing equipment.Along with chip production process development is in great demand to the ion implantation device of the large line of low energy, 45nm low energy large beam ion implanter is applied widely in IC technique, has become ion implantation key processing equipment.
The horizontal and vertical focus state of line after horizontal focusing device and vertical focusing lens regulate respectively and analyze, improve the efficiency of transmission of line after analyzing, and adapt to the transmission of subsequent optical path better, it is the requisite key device of low energy large beam ion implanter, wherein the cooling of magnet is the requisite link of horizontal focusing device, in the hyperbaric environment of ion implantor, cooling water needs high water resistance value to prevent high-voltage breakdown, general employing deionized water system, therefore each link of cooling water system will have fabulous antirust ability to prevent bringing ion into affects water resistance value.Iron core DT4 material is very easily got rusty, and mechanism is exactly produce in this context.
Summary of the invention
The invention discloses a kind of cooling body of ion beam horizontal focusing device, can there be good water cooling effect in this mechanism, can ensure not pollute deionized water system simultaneously.The present invention is realized by following scheme:
This device comprises lens magnetic core (1), copper pipe (2), straight coupling (3).
This device major advantage adopts copper pipe water cooled pipeline, and good cooling results does not affect deionized water system simultaneously.
Accompanying drawing explanation
Fig. 1 is general structure schematic diagram of the present invention.
Fig. 2 is enforcement figure of the present invention.
Embodiment
Below in conjunction with the specific embodiment of accompanying drawing, the invention will be described further, and should be appreciated that, these descriptions are all illustrative, the present invention is not limited thereto.Scope of the present invention only limited by the scope of claims.
Figure of abstract is the general structure schematic diagram of this device, opens two elongated holes in magnetic core (1), opens dark 20mm gap for one section, refers to figure (1); Magnetic core endoporus needs strict controlling dimension to ensure to have with copper pipe the gap of 0.05mm to 0.1mm, and such aspect is installed, and cooling is also better.During concrete enforcement, magnetic core magnetic core (1) can be cut into two and half mandrels, two halves mandrel passes through finger setting, be fixed by screws in together, high-quality thermal grease conduction is applied between magnetic core (1) and copper pipe (2), refer to Fig. 2, like this can the installation of aspect copper pipe and the coating of thermal grease conduction.
The specific embodiment of patent of the present invention elaborates the content of patent of the present invention.For persons skilled in the art, to any apparent change that it does under the prerequisite not deviating from patent spirit of the present invention, all form the infringement to patent of the present invention, corresponding legal liabilities will be born.

Claims (3)

1. a cooling body for ion beam horizontal focusing device, ion beam horizontal focusing device is mainly used in the ion concentration focusing that low energy large beam ion injects link, and its this mechanism of caloric requirement produced in use cools.This device comprises lens magnetic core (1), copper pipe (2), straight coupling (3).
2. the device of the ion beam horizontal focusing of claim 1, wherein magnetic core (1) bore size tolerance need strictly be determined to ensure there is certain gap with copper pipe, applies high-quality thermal grease conduction between magnetic core (1) and copper pipe (2).
3. the device of the ion beam horizontal focusing of claim 1, wherein the side of magnetic core (1) have 20mm dark gap to install copper pipe.
CN201310507586.6A 2013-10-24 2013-10-24 Cooling mechanism for horizontal ion-beam focusing device Pending CN104576269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310507586.6A CN104576269A (en) 2013-10-24 2013-10-24 Cooling mechanism for horizontal ion-beam focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310507586.6A CN104576269A (en) 2013-10-24 2013-10-24 Cooling mechanism for horizontal ion-beam focusing device

Publications (1)

Publication Number Publication Date
CN104576269A true CN104576269A (en) 2015-04-29

Family

ID=53092068

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310507586.6A Pending CN104576269A (en) 2013-10-24 2013-10-24 Cooling mechanism for horizontal ion-beam focusing device

Country Status (1)

Country Link
CN (1) CN104576269A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109059629A (en) * 2018-08-20 2018-12-21 北京机械设备研究所 A kind of track of the electromagnetic railgun cooling based on deionized water
CN109059628A (en) * 2018-08-15 2018-12-21 北京机械设备研究所 A kind of electromagnetic railgun track with cooling hole

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109059628A (en) * 2018-08-15 2018-12-21 北京机械设备研究所 A kind of electromagnetic railgun track with cooling hole
CN109059629A (en) * 2018-08-20 2018-12-21 北京机械设备研究所 A kind of track of the electromagnetic railgun cooling based on deionized water

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
DD01 Delivery of document by public notice

Addressee: Zhongkexin Electronic Equipment Co., Ltd., Beijing

Document name: Notification of before Expiration of Request of Examination as to Substance

WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20150429