CN104034072B - Coating for selective absorption of sunlight spectrum and preparation method thereof and application - Google Patents
Coating for selective absorption of sunlight spectrum and preparation method thereof and application Download PDFInfo
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- CN104034072B CN104034072B CN201310074921.8A CN201310074921A CN104034072B CN 104034072 B CN104034072 B CN 104034072B CN 201310074921 A CN201310074921 A CN 201310074921A CN 104034072 B CN104034072 B CN 104034072B
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Abstract
The present invention proposes a kind of coating for selective absorption of sunlight spectrum and preparation method thereof and application, and this coating for selective absorption of sunlight spectrum comprises successively: basalis, infrared reflecting layer, absorbed layer and anti-reflection layer; Described absorbed layer is made up of three layers of gradual change solar spectrum absorbed layer, is followed successively by outer absorbed layer, middle absorbed layer and interior absorbed layer, and the material of described interior absorbed layer is TiN
x1o
y1, the material of described middle absorbed layer is TiN
x2o
y2, the material of described outer absorbed layer is TiN
x3o
y3.The optical parametric gradient of described absorbed layer, achieves the efficient absorption of coating to solar spectrum, higher heat endurance and low radiative thermal emissivity.
Description
Technical field
Solar energy optical-thermal converting material used under the present invention relates to a kind of middle low temperature and preparation method thereof, particularly relates to and a kind ofly can be used for coating for selective absorption of sunlight spectrum of electron tubes type and flat solar water heater and preparation method thereof.
Background technology
Solar energy heat utilization taps a new source of energy and regenerative resource one of the most effective approach, the solar thermal collector wherein used under middle low temperature (80-400 DEG C) has easy popularization, the advantage that popularity rate is high, becomes the important means of energy-saving and emission-reduction.Absorber is the core component of solar energy heat collector, early stage absorber adopts pitch-dark, electroplating black chromium or black nickel as absorbing material, although these materials have high-absorbility at sunshine wave band, solar energy can be converted into heat effectively, meanwhile, due to the rising of absorber temperature, material surface is by the outside radiated electromagnetic wave of heat radiation, and therefore general actual light thermal transition efficiency is not high.
Coating for selective absorption of sunlight spectrum within nearly twenty or thirty year by extensive concern, it can have high-absorbility in the spectral region of 300nm-2500nm (concentration of energy of sunshine 98% is at this wave band), unlike the infrared band beyond 2500nm, there is low absorptivity (i.e. low radiative thermal emissivity) with black matrix material, greatly reduce heat loss through radiation, improve photothermal conversion efficiency.Two classes can be divided into: the coating for selective absorption of sunlight spectrum 1) used in electron tubes type solar thermal collector by range of application coating for selective absorption of sunlight spectrum, this kind of coatings applications is in vacuum environment, relatively low to the thermal stability requirement under air; 2) coating for selective absorption used in flat type solar heat collector, this kind of material is directly in the face of air, and the long-time structure and composition that uses should not change, and should possess higher heat endurance.
The solar thermal collector many employings electron tubes type used under low temperature in present stage, its absorbing material mostly is in AlN or aluminium oxide the ceramic material of adulterate stainless steel or Al.The photothermal conversion efficiency of this kind of material can up to more than 90%, but easily oxidized under air, limits this kind of material and is not suitable in flat type solar heat collector.Method metal such as Ag doped, Au, W, Mo or Pt in oxide or nitride of physical vapour deposition (PVD) is adopted to be found to have stronger heat endurance in an atmosphere, these materials have also been applied in special high temperature photothermal conversion device, but preparation cost is relatively high but limits the application of this type of material in middle low-temperature solar energy thermal-arrest field.In order to better promote flat-plate collector, develop that a kind of to have the photothermal conversion materiat that photothermal conversion efficiency is high, heat endurance is strong and with low cost concurrently indispensable.
Summary of the invention
Coating for selective absorption of sunlight spectrum that the object of the invention uses under being to provide a kind of middle low temperature and preparation method thereof, make the efficient absorption that it can realize solar spectrum, there is higher heat endurance within the scope of serviceability temperature, lower thermal emissivity rate can also be realized.
The object of the invention to solve the technical problems realizes by the following technical solutions.According to a kind of coating for selective absorption of sunlight spectrum that the present invention proposes, described absorber coatings is prepared by following steps:
Step 1, adopts Al, Cu or glass as base layer material, base layer material is placed in vacuum cleaned room, passes into a certain amount of argon gas, carry out the cleaning of radio frequency argon ion;
Step 2, adopts Magnetron Sputtered Al target, copper target or silver-colored target to prepare infrared reflecting layer on above-mentioned basalis;
Step 3, under the condition passing into argon gas and nitrogen, under above-mentioned infrared external reflection is placed on titanium target, adopt magnetron sputtering method prepare on above-mentioned infrared reflecting layer in absorbed layer; Finally pass into a certain amount of oxygen, continuing take Titanium as absorbed layer during target is prepared on above-mentioned interior absorbed layer by reactive magnetron sputtering method; Then increase oxygen flow, continue to be that target prepares outer absorbed layer by reactive magnetron sputtering method on above-mentioned middle absorbed layer with Titanium;
Step 4, before product step 3 obtained is placed in silicon target, passes into argon gas and oxygen, prepares silicon oxide layer as anti-reflection layer with reactive magnetron sputtering method on above-mentioned outer absorbed layer;
Wherein, the material of described interior absorbed layer is TiN
x1o
y1, 1.10 > x1 > 0.90,0.70 > y1 > 0.50, the material of described middle absorbed layer is TiN
x2o
y2, 0.80 > x2 > 0.70,1.15 > y2 > 1.05, the material of described outer absorbed layer is TiN
x3o
y3, 0.55 > x3 > 0.45,1.30 > y3 > 1.10; The thickness of described outer absorbed layer is 10nm-50nm, and the thickness of middle absorbed layer is 10nm-50nm, and the thickness of interior absorbed layer is 20nm-50nm;
The coating for selective absorption of sunlight spectrum obtained by above-mentioned steps is 94.6%-94.7% in the absorptivity of the sunshine wave band of 300nm-2500nm, and the thermal emissivity rate under 100 degrees Celsius is 3%.
On the other hand, the invention provides a kind of preparation method of coating for selective absorption of sunlight spectrum, it comprises the following steps:
Step 1, adopts Al, Cu or glass as base layer material, base layer material is placed in vacuum cleaned room, passes into a certain amount of argon gas, carry out the cleaning of radio frequency argon ion;
Step 2, adopts Magnetron Sputtered Al target, copper target or silver-colored target to prepare infrared reflecting layer on above-mentioned basalis;
Step 3, under the condition passing into argon gas and nitrogen, under above-mentioned infrared external reflection is placed on titanium target, adopt magnetron sputtering method prepare on above-mentioned infrared reflecting layer in absorbed layer; Then pass into a certain amount of oxygen, continuing take Titanium as absorbed layer during target is prepared on above-mentioned interior absorbed layer by reactive magnetron sputtering method; Then increase oxygen flow, continue to be that target prepares outer absorbed layer by reactive magnetron sputtering method on above-mentioned middle absorbed layer with Titanium;
Step 4, before product step 3 obtained is placed in silicon target, passes into argon gas and oxygen, adopts reactive magnetron sputtering method to prepare silicon oxide layer as anti-reflection layer on above-mentioned outer absorbed layer.
Preferably, the preparation method of aforesaid coating for selective absorption of sunlight spectrum, the thickness of wherein said basalis is 0.2-10mm; The thickness of described infrared reflecting layer is 90-500nm; The gross thickness of described interior absorbed layer, middle absorbed layer and outer absorbed layer is 40-150nm, and the thickness of described anti-reflection layer is 80-100nm.
Preferably, the preparation method of aforesaid coating for selective absorption of sunlight spectrum, the material of wherein said interior absorbed layer is TiN
x1o
y1, wherein contained in this layer material oxygen part is from the remaining aqueous vapor in vacuum chamber and oxygen, and another portion is then due to caused by oxidized in atmosphere.Be within the scope of 400nm-600nm at wavelength, refractive index is between 1.9-2.5, and extinction coefficient is between 0.6-1.2; Be that within the scope of 900nm-1100nm, refractive index is in 2.2-2.8 at wavelength, extinction coefficient is in 2.1-2.5; Be that within the scope of 2000nm-2300nm, refractive index is in 3.8-4.1 at wavelength, extinction coefficient is in 2.8-3.0.
Preferably, the preparation method of aforesaid coating for selective absorption of sunlight spectrum, the material of wherein said middle absorbed layer is TiN
x2o
y2, be within the scope of 400nm-600nm at wavelength, refractive index is between 2.0-2.4, and extinction coefficient is between 0.5-0.9; Be within the scope of 900nm-1100nm at wavelength, refractive index is in 2.7-3.1, and extinction coefficient is in 1.3-1.5; Be that within the scope of 2000nm-2300nm, refractive index is in 3.6-3.8 at wavelength, extinction coefficient is in 1.0-1.2.
Preferably, the preparation method of aforesaid coating for selective absorption of sunlight spectrum, the material of wherein said outer absorbed layer is TiN
x3o
y3, be within the scope of 400nm-600nm at wavelength, refractive index is between 2.2-2.5, and extinction coefficient is between 0.3-0.5; This type of material is that within the scope of 900nm-1100nm, refractive index is in 2.6-2.9 at wavelength, and extinction coefficient is 0.4-0.6; Be that within the scope of 2000nm-2300nm, refractive index is in 2.8-3.0 at wavelength, extinction coefficient is in 0.2-0.3.
The present invention also proposes a kind of solar thermal collector, it is characterized in that, comprises above-mentioned coating for selective absorption of sunlight spectrum at this solar thermal collector.
By technique scheme, the present invention at least has following advantages:
Coating for selective absorption of sunlight spectrum disclosed in this invention, by the gradient of absorbed layer optical parametric, can realize coating to the efficient absorption of solar spectrum and higher heat endurance.The light wave of titanium oxynitrides absorbing material to infrared band (beyond 2.5 microns) has high saturating performance, through infrared reflecting layer reflection, thus can realize lower thermal emissivity rate after the light of infrared band penetrates absorbed layer.Outermost layer is chosen and can, with the silica of absorbed layer materials optical parameter matching as anti-reflection layer, be made absorbed layer can absorb solar spectrum to a greater extent.This type coating has following major advantage: a, can to have at sunshine wave band more than 94% absorptivity (300nm-2500nm), the thermal emissivity rate under 100 degrees Celsius can lower than 4%, and overall light thermal transition efficiency is up to more than 90%; B, by preparing gradient absorbed layer, the mechanical property of coating can get a promotion, not easily demoulding under high temperature, can increase coating service life at high temperature; C, coating not only can be used for electron tubes type solar thermal collector, also directly in the face of air, can be applied to flat type solar heat collector.
In addition the present invention also has following characteristics:
A, the infrared reflecting layer prepared by the method for d.c. sputtering, select the metals such as Al, Cu or the Ag at whole light-wave band with high extinction coefficient, the spectrum of metal level to whole wave band of these high extinction coefficients has the effect of strong reflection, is beneficial to the infrared spectrum (beyond 2500nm) of reflectance-transmittance absorbed layer especially; Be three layers of gradual change solar spectrum absorbed layer on b, infrared reflecting layer, consider that the gradual change of reacting gas can cause the consecutive variations of the optical parametric of absorbed layer, have employed the method continuously changing reacting gas oxygen and prepare titanium oxynitrides gradient absorbed layer; The major optical of c, interior absorbed layer is characterized as extinction coefficient and is all greater than 0.6 at whole solar spectrum wave band (0.3 μm-2.5 μm), and increasing the trend be significantly increased along with wavelength, the solar spectrum of this material to whole wave band has relatively strong assimilation effect; The extinction coefficient of d, middle absorbed layer has a minimum between 380nm-420nm, be low to moderate 0.5, and the maximum of an extinction coefficient can be produced between 900nm-1000nm, can reach 1.5, therefore this material has higher absorptivity at 900nm-1000nm wave band; E, outer absorbed layer have the low ebb of an extinction coefficient between 380nm-420nm, and between 700nm-800nm, there is the peak value of an extinction coefficient, extinction coefficient reduces along with the increase of wavelength subsequently, and this material has relatively high absorptivity at 700nm-800nm wave band to solar spectrum; The method of f, employing reaction magnetocontrol sputtering prepares silicon oxide layer as anti-reflection layer, needs the refractive index of silicon oxide layer at 300nm-2500nm micron waveband to control between 1.45-1.52 in preparation process.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand technological means of the present invention, and can be implemented according to the content of description, coordinates accompanying drawing to be described in detail as follows below with preferred embodiment of the present invention.
Accompanying drawing explanation
Fig. 1 is the structural representation of the coating for selective absorption of sunlight spectrum that the present invention proposes.
Fig. 2 is the reverberation spectrogram of example 1 and example 2.
Fig. 3 is absorptivity after example 2 sample is annealed in an atmosphere and thermal emissivity rate schematic diagram.
Detailed description of the invention
For further setting forth the present invention for the technological means reaching predetermined goal of the invention and take and effect, below in conjunction with accompanying drawing and preferred embodiment, to the coating for selective absorption of sunlight spectrum proposed according to the present invention and preparation method thereof its detailed description of the invention, structure, feature and effect thereof, be described in detail as follows.
Referring to shown in Fig. 1, is the structural representation of the coating for selective absorption of sunlight spectrum that the present invention proposes.This coating for selective absorption of sunlight spectrum comprises basalis 4, infrared reflecting layer 3, absorbed layer 2 successively, and anti-reflection layer 1.Described basalis 4 can adopt thickness range to be the glass plate of 0.5-10mm; Also thickness range can be adopted to be the metal material of 0.2-2mm, such as copper or aluminium, when adopting metallic substrate layer, infrared reflecting layer 3 can not be prepared.For increasing the surface-active of basalis 4, need to carry out radio frequency-ion cleaning after mechanical cleaning, thus remove pollution layer and the oxide layer of substrate surface.Described infrared reflecting layer 3 is arranged on basalis, and the effect of this infrared reflecting layer 3 is that the spectrum of the whole wave band to incidence reflects, and particularly to infrared spectrum, especially the infrared light of wavelength more than 2.5 microns reflects.The material of this infrared reflecting layer is aluminium, copper or silver.The thickness of this infrared reflecting layer is 90-500nm.Described absorbed layer 2 is made up of three layers of gradual change solar spectrum absorbed layer, is followed successively by outer absorbed layer 21, middle absorbed layer 22 and interior absorbed layer 23, and interior absorbed layer 23 is prepared on infrared reflecting layer 3.The material of outer absorbed layer 21 is TiN
x3o
y3thickness is 10nm-50nm, this layer material has the low ebb of an extinction coefficient between 380nm-420nm, and between 700nm-800nm, there is the peak value of an extinction coefficient, extinction coefficient reduces along with the increase of wavelength subsequently, and this layer material has relatively high absorptivity at 700nm-800nm wave band to solar spectrum.The material of middle absorbed layer 22 is TiN
x2o
y2, thickness is 10nm-50nm, and the extinction coefficient of this layer material has a minimum between 380nm-420nm, be low to moderate 0.5, and the maximum of an extinction coefficient can be produced between 900nm-1000nm, can reach 1.5, therefore this material has higher absorptivity at 900nm-1000nm wave band.The material of interior absorbed layer 23 is TiN
x1o
y1thickness is 20nm-50nm, the major optical of this layer material is characterized as extinction coefficient and is all greater than 0.6 whole solar spectrum wave band (300nm-2500nm), and increasing the trend be significantly increased along with wavelength, the solar spectrum of this material to whole wave band has relatively strong assimilation effect.Receiving on layer 21 is outside anti-reflection layer 1, and material is silica, and its refractive index for the light of 300nm-2500nm wave band is between 1.45-1.52.
Preparation method
The present invention also proposes a kind of method preparing above-mentioned coating for selective absorption of sunlight spectrum, and the method comprises the following steps:
Prepared by basalis, select metallic plate or the glass plate of polishing, carries out the cleaning of radio frequency argon ion and removes surface contamination layer and oxide layer, promote substrate surface active after mechanical cleaning.
Prepared by infrared reflecting layer, prepare layer of metal infrared reflecting layer by direct current magnetron sputtering process at above-mentioned substrate surface, it is aluminium, copper or silver that selected target can be metal.
The preparation of absorbed layer, absorbed layer in being prepared on above-mentioned infrared reflecting layer by reactive magnetron sputtering method, using Titanium as target, is passed into 50sccm argon gas and 8sccm nitrogen, makes the TiN that thickness is 20nm-50nm
x1o
y1the interior absorbed layer of material; Then pass into the oxygen of 2-2.5sccm, continue to take Titanium as absorbed layer during target is prepared on above-mentioned interior absorbed layer by reactive magnetron sputtering method, in this, the THICKNESS CONTROL of absorbed layer is at 10-50nm, and the material of middle absorbed layer is TiN
x2o
y2; Then the flow increasing oxygen is to 2.5-3.5sccm, and continue to be that target prepares outer absorbed layer by reactive magnetron sputtering method on above-mentioned middle absorbed layer with Titanium, the THICKNESS CONTROL of this outer absorbed layer is at 10-50nm, and the material of outer absorbed layer is TiN
x3o
y3.
The preparation of anti-reflection layer, adopt reactive magnetron sputtering method to prepare silicon oxide layer as anti-reflection layer on above-mentioned outer absorbed layer, the method is mature technology, and in preparation process, controlled oxidization silicon layer controls between 1.45-1.52 in the refractive index of 300nm-2500nm wave band.
Above-mentioned absorbed layer is gradual change absorbed layer, its refractive index at different-waveband and extinction coefficient as shown in table 1.
Table 1
example 1
Step is proceeded as follows according to above-mentioned preparation method:
1) radio frequency-ion cleaning is carried out to glass substrate layers, remove surface contamination layer and oxide layer, promote substrate surface active;
2) basalis is transferred to aluminium target front, treat that base vacuum is better than 6 × 10
-6after Torr, pass into 50sccm argon gas, controlled pressure is 5mTorr, opens shielding power supply, and keep power 1200W, arranging transfer rate is 0.4m/min, makes basalis by aluminium target 12 times, in order to prepare infrared external reflection aluminium lamination;
3) basalis being coated with metallic aluminum is transferred to titanium target front, pass into 50sccm argon gas, 8sccm nitrogen, control air pressure 5mTorr, open shielding power supply, keep power 1000W, transfer rate is 0.4m/min, and making basalis by titanium target 3 times, is TiN in order to prepare material
0.94o
0.60interior absorbed layer;
4) when other parameter constant, passing into the oxygen of 2sccm, make basalis run 3 times by the speed of 0.4m/min under titanium target, is TiN in order to prepare material
0.72o
1.11middle absorbed layer;
5) subsequently oxygen flow is increased to 2.5sccm, transmission speed increases to 0.6m/min, and other parameter remains unchanged, and basalis is run 5 times below titanium target, is TiN in order to prepare material
0.51o
1.12outer absorbed layer;
6) after completing above step, basalis is transferred to silicon target front, pass into 50sccm argon gas, 26sccm oxygen, control air pressure 5mTorr, open shielding power supply, keep power 2000W, arranging transmission speed is 1m/min, makes basalis by silicon target 9 times;
7), after above preparation process to be done, make sample cool 20min, slice, shut down.
Adopt the reflectance spectrum (300nm-2500nm) of the coating sample of the spectrophotometer measurement example 1 of band integrating sphere, as shown in Figure 2, this coating is 94.6% in the absorptivity of this wave band; Adopting bolometer to measure the thermal emissivity rate of coating under 100 degrees Celsius is 3.7%.
The coating sample annealing in process under vacuum atmosphere obtained to example 1, verifies obtained coating high-temperature stability in a vacuum and durability.(1 × 10 is less than under coating sample is placed in vacuum state
-5torr), sample is heated to 380 degrees Celsius of annealing 14h, absorptivity and the thermal emissivity rate of the rear sample of annealing are respectively 93.5% and 3%, the absorptivity (94.6%) of Front-coating mirror of comparatively annealing and thermal emissivity rate (3.7%) slightly change, but not obvious, prove that the coating that example 1 obtains can be applicable to use in electron tubes type solar thermal collector.
embodiment 2
Step is proceeded as follows according to above-mentioned preparation method:
1) carry out radio frequency-ion cleaning to Al basalis, remove surface contamination layer and oxide layer, and promote substrate surface activity, the Al plate thermal emissivity rate after sputter clean is lower than 1.7%, and now Al basalis has the effect of infrared reflecting layer simultaneously;
2) basalis is transferred to magnetron sputtering titanium target front, base vacuum is better than 6 × 10
-6after Torr, pass into 50sccm argon gas, 8sccm nitrogen, control air pressure 5mTorr, open shielding power supply, keep power 1000W, transfer rate is 0.4m/min, and making basalis by titanium target 3 times, is TiN in order to prepare material
0.94o
0.60interior absorbed layer;
3) when other parameter constant, passing into the oxygen of 2sccm, make basalis run 3 times by the speed of 0.4m/min under titanium target, is TiN in order to prepare material
0.72o
1.11middle absorbed layer;
4) subsequently oxygen flow is increased to 2.5sccm, transmission speed increases to 0.6m/min, and other parameter remains unchanged, and basalis is run 5 times below titanium target, is TiN in order to prepare material
0.51o
1.12outer absorbed layer;
5) basalis is transferred to silicon target front, pass into 50sccm argon gas, 26sccm oxygen, control air pressure 5mTorr, open shielding power supply, keep power 2000W, arranging transmission speed is 1m/min, makes basalis by silicon target 9 times;
6), after above preparation process to be done, make sample cool 20min, slice, shut down.
Adopt the reflectance spectrum (300nm-2500nm) of spectrophotometer measurement example 2 coating sample of band integrating sphere, as shown in Figure 2, coating is 94.7% in the absorptivity of this wave band; Adopting bolometer to measure the thermal emissivity rate of coating under 100 degrees Celsius is 5.0%.
The obtained coating sample of example 2 carries out the annealing in process under air atmosphere, verifies the high-temperature stability of obtained coating under air and durability.Coating sample is placed in Muffle furnace successively at 100 degrees Celsius, 250 degrees Celsius, 300 degrees Celsius and 350 degrees Celsius of lower continuous annealing 36h, 10h, 5h and 5h, as shown in Figure 3, the absorptivity of 100 DEG C of annealing this coating after 36 hours is 94.6%, and thermal emissivity rate is 5.0%; There is significant change not yet in absorptivity and the thermal emissivity rate of 250 DEG C of annealing this coating after 10 hours; The absorptivity of 300 DEG C of annealing this coating after 5 hours is 93.3%, and thermal emissivity rate is 4%; The absorptivity of 350 DEG C of annealing this coating after 5 hours is 91.1%, and thermal emissivity rate is 2.4%.After annealing only there is change by a small margin in the absorptivity of this coating and thermal emissivity rate, and the photothermal conversion efficiency of coating does not significantly reduce, and proves that the obtained coating of example 2 may be used for using in flat solar water heater.
The above, it is only preferred embodiment of the present invention, not any pro forma restriction is done to the present invention, although the present invention discloses as above with preferred embodiment, but and be not used to limit the present invention, any those skilled in the art, do not departing within the scope of technical solution of the present invention, make a little change when the technology contents of above-mentioned announcement can be utilized or be modified to the Equivalent embodiments of equivalent variations, in every case be the content not departing from technical solution of the present invention, according to any simple modification that technical spirit of the present invention is done above embodiment, equivalent variations and modification, all still belong in the scope of technical solution of the present invention.
Claims (8)
1. a coating for selective absorption of sunlight spectrum, is characterized in that, described absorber coatings is prepared by following steps:
Step 1, adopts Al, Cu or glass as base layer material, base layer material is placed in vacuum cleaned room, passes into a certain amount of argon gas, carry out the cleaning of radio frequency argon ion;
Step 2, adopts Magnetron Sputtered Al target, copper target or silver-colored target to prepare infrared reflecting layer on above-mentioned basalis;
Step 3, under the condition passing into argon gas and nitrogen, under above-mentioned infrared external reflection is placed on titanium target, adopt magnetron sputtering method prepare on above-mentioned infrared reflecting layer in absorbed layer; Finally pass into a certain amount of oxygen, continuing take Titanium as absorbed layer during target is prepared on above-mentioned interior absorbed layer by reactive magnetron sputtering method; Then increase oxygen flow, continue to be that target prepares outer absorbed layer by reactive magnetron sputtering method on above-mentioned middle absorbed layer with Titanium;
Step 4, before product step 3 obtained is placed in silicon target, passes into argon gas and oxygen, prepares silicon oxide layer as anti-reflection layer with reactive magnetron sputtering method on above-mentioned outer absorbed layer;
Wherein, the material of described interior absorbed layer is TiN
x1o
y1, 1.10 > x1 > 0.90,0.70 > y1 > 0.50, the material of described middle absorbed layer is TiN
x2o
y2, 0.80 > x2 > 0.70,1.15 > y2 > 1.05, the material of described outer absorbed layer is TiN
x3o
y3, 0.55 > x3 > 0.45,1.30 > y3 > 1.10; The thickness of described outer absorbed layer is 10nm-50nm, and the thickness of middle absorbed layer is 10nm-50nm, and the thickness of interior absorbed layer is 20nm-50nm.
2. a preparation method for coating for selective absorption of sunlight spectrum, is characterized in that comprising the following steps:
Step 1, adopts Al, Cu or glass as base layer material, base layer material is placed in vacuum cleaned room, passes into a certain amount of argon gas, carry out the cleaning of radio frequency argon ion;
Step 2, adopts Magnetron Sputtered Al target, copper target or silver-colored target to prepare infrared reflecting layer on above-mentioned basalis;
Step 3, under the condition passing into argon gas and nitrogen, under above-mentioned infrared external reflection is placed on titanium target, adopt magnetron sputtering method prepare on above-mentioned infrared reflecting layer in absorbed layer; Finally pass into a certain amount of oxygen, continuing take Titanium as absorbed layer during target is prepared on above-mentioned interior absorbed layer by reactive magnetron sputtering method; Then increase oxygen flow, continue to be that target prepares outer absorbed layer by reactive magnetron sputtering method on above-mentioned middle absorbed layer with Titanium;
Step 4, before product step 3 obtained is placed in silicon target, passes into argon gas and oxygen, adopts reactive magnetron sputtering method to prepare silicon oxide layer as anti-reflection layer on above-mentioned outer absorbed layer.
3. the coating for selective absorption of sunlight spectrum prepared of method according to claim 2, it is characterized in that, the thickness of described basalis is 0.2-10mm; The thickness of described infrared reflecting layer is 90-500nm; The gross thickness of described interior absorbed layer, middle absorbed layer and outer absorbed layer is 40-150nm, and the thickness of described anti-reflection layer is 80-100nm.
4. the coating for selective absorption of sunlight spectrum prepared of method according to claim 2, it is characterized in that, the material of described interior absorbed layer is TiN
x1o
y1, be within the scope of 400nm-600nm at wavelength, refractive index is between 1.9-2.5, and extinction coefficient is between 0.6-1.2; Be that within the scope of 900nm-1100nm, refractive index is in 2.2-2.8 at wavelength, extinction coefficient is in 2.1-2.5; Be that within the scope of 2000nm-2300nm, refractive index is in 3.8-4.1 at wavelength, extinction coefficient is in 2.8-3.0.
5. the coating for selective absorption of sunlight spectrum prepared of method according to claim 2, it is characterized in that, the material of described middle absorbed layer is TiN
x2o
y2, be within the scope of 400nm-600nm at wavelength, refractive index is between 2.0-2.4, and extinction coefficient is between 0.5-0.9; Be within the scope of 900nm-1100nm at wavelength, refractive index is in 2.7-3.1, and extinction coefficient is in 1.3-1.5; Be that within the scope of 2000nm-2300nm, refractive index is in 3.6-3.8 at wavelength, extinction coefficient is in 1.0-1.2.
6. the coating for selective absorption of sunlight spectrum prepared of method according to claim 2, it is characterized in that, the material of described outer absorbed layer is TiN
x3o
y3, be within the scope of 400nm-600nm at wavelength, refractive index is between 2.2-2.5, and extinction coefficient is between 0.3-0.5; This type of material is that within the scope of 900nm-1100nm, refractive index is in 2.6-2.9 at wavelength, and extinction coefficient is 0.4-0.6; Be that within the scope of 2000nm-2300nm, refractive index is in 2.8-3.0 at wavelength, extinction coefficient is in 0.2-0.3.
7. a solar thermal collector, is characterized in that, comprises coating for selective absorption of sunlight spectrum according to claim 1.
8. the application of coating for selective absorption of sunlight spectrum according to claim 1 in solar thermal collector.
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| CN105276846B (en) * | 2014-11-14 | 2018-07-06 | 中国建筑材料科学研究总院 | Coating for selective absorption of sunlight spectrum that ABSORPTION EDGE is continuously adjusted and preparation method thereof |
| CN106091442A (en) * | 2016-06-06 | 2016-11-09 | 南宁可煜能源科技有限公司 | A kind of slective solar energy absorbing coating with double ceramic structure |
| CN109742187B (en) * | 2018-12-29 | 2020-09-15 | 苏州焜原光电有限公司 | Method for manufacturing multi-section solar cell |
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| JP2007119303A (en) * | 2005-10-28 | 2007-05-17 | Nippon Sheet Glass Co Ltd | Low radiation laminate |
| JP5185406B2 (en) * | 2011-03-14 | 2013-04-17 | 株式会社東芝 | Sputtering target, interface layer film for phase change optical recording medium using the same, method for producing the same, and phase change optical recording medium |
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| CN101737983A (en) * | 2009-11-25 | 2010-06-16 | 北京航空航天大学 | Solar spectrum selective absorbing coating and preparation method thereof |
| CN101818328A (en) * | 2010-04-22 | 2010-09-01 | 常州博士新能源科技有限公司 | Preparation method of multilayer compound solar energy selective absorption plating layer |
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