CN103984090A - Dodging system based on digital micromirror device - Google Patents
Dodging system based on digital micromirror device Download PDFInfo
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- CN103984090A CN103984090A CN201410183857.1A CN201410183857A CN103984090A CN 103984090 A CN103984090 A CN 103984090A CN 201410183857 A CN201410183857 A CN 201410183857A CN 103984090 A CN103984090 A CN 103984090A
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- digital micromirror
- micromirror device
- dmd
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- micro mirror
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Abstract
The invention provides a dodging system based on a digital micromirror device. The dodging system based on the digital micromirror device comprises a light source, the digital micromirror device, a DMD controller and a receiving screen, wherein the digital micromirror device is connected with the DMD controller, the digital micromirror device is provided with an array formed by multiple DMD micromirrors, the receiving screen is located at the reflected ray position where the light rays of the light source enter the digital micromirror device, the deflection vibrational frequency of the DMD micromirrors located in the middle of the digital micromirror device is low, and the larger the distance between the DMD micromirrors and the center is, the higher the deflection vibrational frequency of the DMD micromirrors is. The dodging system based on the digital micromirror device is simple in structure, easy and convenient to adjust and easy to control, the dodging capacity is high, and light beams after the dodging is more flexible.
Description
[technical field]
The present invention relates to be applied to a kind of even photosystem based on Digital Micromirror Device in optical surface topography measurement field.
[background technology]
Conventionally, the light intensity of laser beam becomes Gaussian distribution, and the light intensity in the region of getting weakens greatly and gradually along with beam diameter becomes, and the unevenness of laser beam has been brought larger error to topography measurement.The light-uniforming technology of light beam mainly contains following several at present: 1. light beam is expanded, and adopt the hot spot near central area; 2. utilize multimode optical fiber to carry out even light; 3. utilize a plurality of light sources to reach Uniform Illumination by special arrangement mode; 4. by binary optical device, the luminous flux of light beam of light source is redistributed, to reach the effect of even light.
For above-mentioned light-uniforming technology, existing following subject matter: the light beam that the mode that 1. expands obtains is not really realized homogenising, is only that the whole light intensity of light beam is promoted or reduced, and has reduced the light-intensity difference of central area and fringe region; 2. utilize mode off-energy when coupling fiber of multimode optical fiber serious; 3. the mode of a plurality of light source specific arrangement, when light source is larger, cannot be regarded as and be regarded as pointolite, thereby cannot to a plurality of light sources, arrange according to ideal state; 4. the mode by the even light of binary optical device need to increase optical device, makes whole system become complicated.
[summary of the invention]
The technical problem to be solved in the present invention, is to provide a kind of even photosystem based on Digital Micromirror Device, and it is simple in structure, simple and convenient during adjusting, is easier to control, and even luminous energy power is strong simultaneously, and the light beam after even light has more flexibility.
The present invention realizes above-mentioned technical matters like this:
A kind of even photosystem based on Digital Micromirror Device, the described even photosystem based on Digital Micromirror Device comprises light source, Digital Micromirror Device, DMD controller and receiving screen, described Digital Micromirror Device is connected with DMD controller, in described Digital Micromirror Device, be provided with the array that plural DMD micro mirror forms, described receiving screen is positioned at source light and enters to inject the formed reflection ray of Digital Micromirror Device place.
Further, the DMD micro mirror deflection vibration frequency in the middle of being positioned in described Digital Micromirror Device is little, and DMD micro mirror deflection vibration frequency is more outward larger.
Further, the angle of the incident ray of described light source and Digital Micromirror Device place surface level is 66 °.
Tool of the present invention has the following advantages:
The present invention utilizes the vibration frequency after the deflection of DMD micro mirror to determine the feature of folded light beam light intensity, utilize DMD controller to control the vibration frequency of DMD micro mirror deflection, realize the effect of the local light intensity of accommodation reflex light beam, and then realize the homogenising of laser beam light intensity is processed.Digital Micromirror Device is the micro mirror array that DMD micro mirror forms by the reflection micro mirror of can do ± 12 ° of deflections, can folded light beam, and after reflection, the local light intensity of light beam can be controlled by the deflection vibration frequency of described DMD micro mirror.Be applied among optical surface topography measurement, without system hardware parameter is made to any change, only by regulation and control DMD controller, realize the control to laser beam light intensity, and then realize homogenising and process.In a word, light-uniforming technology of the present invention has more flexibility, simple and convenient during adjusting, is easier to control.
[accompanying drawing explanation]
The present invention is further illustrated in conjunction with the embodiments with reference to the accompanying drawings.
Fig. 1 is the structural representation that the present invention is based on the even photosystem of Digital Micromirror Device.
Fig. 2 is light source actual light intensity and the light intensity comparison diagram after dodging of the present invention.
Accompanying drawing identifier declaration:
1, light source 2, Digital Micromirror Device
3, DMD controller 4, receiving screen
[embodiment]
Refer to shown in Fig. 1 and 2, embodiments of the invention are described in detail.
Emphasis is consulted Fig. 1, the present invention relates to a kind of even photosystem based on Digital Micromirror Device, the described even photosystem based on Digital Micromirror Device comprises light source 1, Digital Micromirror Device 2, DMD controller 3 and receiving screen 4, described Digital Micromirror Device 2 is connected with DMD controller 3, in described Digital Micromirror Device 2, be provided with the array that plural DMD micro mirror forms, described receiving screen 4 is positioned at light source 1 light and enters to inject the formed reflection ray of Digital Micromirror Device 2 place.
DMD micro mirror deflection vibration frequency in the middle of being positioned in described Digital Micromirror Device 2 is little, and DMD micro mirror deflection vibration frequency is more outward larger, and the angle of the incident ray of described light source 1 and Digital Micromirror Device 2 place surface levels is 66 °.
When the light beam of light source 1 enters to inject Digital Micromirror Device 2, DMD controller 3 is adjusted and is controlled DMD micro mirror deflection vibration frequency, the DMD micro mirror deflection vibration frequency in the middle of is little, more past surrounding DMD micro mirror deflection vibration frequency is larger, realize the effect of the local light intensity of accommodation reflex light beam, make to reflex to the light intensity homogenising of receiving screen 4.
In Fig. 2, the curve map that is positioned at the left side is the distribution plan of light source actual light intensity, the curve map that is positioned at the right is the surface of intensity distribution after Digital Micromirror Device 2 reflections, as shown in Figure 2, light intensity after the present invention processes presents the middle light beam consistent with the light intensity of peripheral region, has realized the beam uniformity that gaussian laser is distributed and has processed.
The present invention utilizes the vibration frequency after the deflection of DMD micro mirror to determine the feature of folded light beam light intensity, utilize DMD controller 3 to control the vibration frequency of DMD micro mirror deflection, realize the effect of the local light intensity of accommodation reflex light beam, and then realize the homogenising of laser beam light intensity is processed.Digital Micromirror Device 2 is the micro mirror array that DMD micro mirror forms by the reflection micro mirror of can do ± 12 ° of deflections, can folded light beam, and after reflection, the local light intensity of light beam can be controlled by the deflection vibration frequency of described DMD micro mirror.Be applied among optical surface topography measurement, without system hardware parameter is made to any change, only by regulation and control DMD controller, realize the control to laser beam light intensity, and then realize homogenising and process.In a word, light-uniforming technology of the present invention has more flexibility, simple and convenient during adjusting, is easier to control.
Although more than described the specific embodiment of the present invention; but being familiar with those skilled in the art is to be understood that; our described specific embodiment is illustrative; rather than for the restriction to scope of the present invention; those of ordinary skill in the art are in equivalent modification and the variation done according to spirit of the present invention, all should be encompassed in the scope that claim of the present invention protects.
Claims (3)
1. the even photosystem based on Digital Micromirror Device, it is characterized in that: the described even photosystem based on Digital Micromirror Device comprises light source, Digital Micromirror Device, DMD controller and receiving screen, described Digital Micromirror Device is connected with DMD controller, in described Digital Micromirror Device, be provided with the array that plural DMD micro mirror forms, described receiving screen is positioned at source light and enters to inject the formed reflection ray of Digital Micromirror Device place.
2. a kind of even photosystem based on Digital Micromirror Device as claimed in claim 1, is characterized in that: the DMD micro mirror deflection vibration frequency in the middle of being positioned in described Digital Micromirror Device is little, and DMD micro mirror deflection vibration frequency is more outward larger.
3. a kind of even photosystem based on Digital Micromirror Device as claimed in claim 1 or 2, is characterized in that: the angle of the incident ray of described light source and Digital Micromirror Device place surface level is 66 °.
Priority Applications (1)
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CN201410183857.1A CN103984090A (en) | 2014-05-04 | 2014-05-04 | Dodging system based on digital micromirror device |
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CN201410183857.1A CN103984090A (en) | 2014-05-04 | 2014-05-04 | Dodging system based on digital micromirror device |
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CN201410183857.1A Pending CN103984090A (en) | 2014-05-04 | 2014-05-04 | Dodging system based on digital micromirror device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105116666A (en) * | 2015-09-17 | 2015-12-02 | 哈尔滨理工大学 | Optical logic operation device and method based on double digital micromirror devices |
Citations (4)
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JP2002353105A (en) * | 2001-05-24 | 2002-12-06 | Nikon Corp | Illumination optical apparatus, aligner provided with the same and method of manufacturing microdevice |
TW200938959A (en) * | 2007-11-06 | 2009-09-16 | Nikon Corp | Optical lighting device and exposure device |
CN203518958U (en) * | 2013-08-28 | 2014-04-02 | 华侨大学 | Cross-scale measurement device based on digital micromirror device |
CN203838406U (en) * | 2014-05-04 | 2014-09-17 | 华侨大学 | Light uniformizing system based on digital micro-mirror device |
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2014
- 2014-05-04 CN CN201410183857.1A patent/CN103984090A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002353105A (en) * | 2001-05-24 | 2002-12-06 | Nikon Corp | Illumination optical apparatus, aligner provided with the same and method of manufacturing microdevice |
TW200938959A (en) * | 2007-11-06 | 2009-09-16 | Nikon Corp | Optical lighting device and exposure device |
CN203518958U (en) * | 2013-08-28 | 2014-04-02 | 华侨大学 | Cross-scale measurement device based on digital micromirror device |
CN203838406U (en) * | 2014-05-04 | 2014-09-17 | 华侨大学 | Light uniformizing system based on digital micro-mirror device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105116666A (en) * | 2015-09-17 | 2015-12-02 | 哈尔滨理工大学 | Optical logic operation device and method based on double digital micromirror devices |
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Application publication date: 20140813 |