CN103966655B - A kind of preparation method of opal structural 2 D photon crystal - Google Patents
A kind of preparation method of opal structural 2 D photon crystal Download PDFInfo
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Abstract
The invention discloses the preparation method of a kind of opal structural 2 D photon crystal, the preparation method of the opal structural 2 D photon crystal of the present invention includes: be dispersed in by colloidal particle in the mixed solution of a certain proportion of second alcohol and water, angle by regulation substrate with the water surface, the speed that regulation colloidal particle glides, make colloidal particle along substrate cunning at the interface of water and air, add the surface tension at surfactant regulation water and air interface, form one layer of monofilm, be then transferred in any substrate.Operational approach of the present invention is simple, and preparation cost is cheap, environmentally friendly, can prepare large-area thin film.
Description
Technical field
The invention belongs to the preparation method technical field of 2 D photon crystal thin film, be specifically related to the preparation method of a kind of opal structural 2 D photon crystal.
Background technology
Photonic crystal be a kind of micron, submicron isophotal wavelength magnitude on refractive index present periodically variable dielectric material.1987, E.Yablonovitch first proposing the concept of photonic crystal, from material structure, photonic crystal is that a class has the engineer of periodic dielectric structures and the crystal of manufacture on optics yardstick.High-sequential photonic crystal of opals structure, due at photonic material, high density magnetic memory materials, the extensively application of biosensor etc. and by the extensive concern of researchers.The preparation technology of photonic crystal is extremely difficult, and along with the development of science and technology, scientists is prepared for various crystal structure, and wherein applying most is opal structural.At present, the main method of assembling two dimension opal photonic crystal: spin-coating method, vertical deposition method, czochralski method etc..And preparing the two dimension problem that is primarily present of photonic crystal of opals structure is to there is substantial amounts of fault of construction, such as: point defect, line defect etc..
What the Chinese patent CN200810019681.0 of the application such as Tang Yuefeng was claimed is the preparation method of a kind of adjustable uniform hole polystyrene monolayer film, wherein by monodispersed polystyrene microsphere is passed through czochralski method, obtains the monofilm of long-range order.What the Chinese patent CN201210347815.8 of the application such as Dong Qiming was claimed is the self-assembly preparation method thereof of a kind of colloid micro ball monofilm, after the method utilizes spin-coating method to obtain monofilm, uses gas-liquid interface method to line up closely packed hexagonal structure the most again.But the subject matter that said method exists is to need large-scale instrument could prepare monofilm, and preparation method is complicated, and preparation cost is high.The Chinese patent CN200810143328.3 of the application such as Li Yongjun has been claimed the preparation method of a kind of large-area nano-microparticles monolayer film; the method is by being sequentially added into water soluble organic substance, water-insoluble liquid state organics and water; water soluble nanometer particles is extracted from colloid solution, monofilm is prepared at water/water-insoluble liquid state organics interface.The shortcoming of the method is that environment can be polluted by the organic solvent used.
In order to solve above-mentioned technical problem, the present invention proposes innovatively and directly prepares opal structural 2 D photon crystal single thin film at the interface of air and water, the preparation method of the present invention is simple, preparation cost is cheap, environmentally friendly, and large-area thin film can be prepared, can effectively reduce the defect of the thin film prepared.
Summary of the invention
The present invention provides the preparation method of a kind of opal structural 2 D photon crystal for above-mentioned technical problem present in prior art just.
The preparation method of the present invention comprises the following steps:
(1) being dispersed in by colloidal particle in the mixed solution of second alcohol and water of certain volume ratio, ultrasonic disperse 5 ~ 20 minutes is standby；
(2) take a culture dish, add the deionized water of certain volume, the substrate of washes clean is placed in culture dish, keep substrate to become the angle of 5 ° ~ 90 ° with the water surface；Mixed solution step (1) obtained drips on substrate, angle by regulation substrate with the water surface, colloidal particle is made slowly to slide to the interface of air and water along substrate, at the Surfactant SDS that the interface of air and water dropping mass fraction is 1% ~ 10% with the surface tension of adjustment interface, colloidal particle is made to form one layer of single thin film at the interface of air with water；
(3) separately take the substrate of a washes clean, single thin film is moved to substrate from water turn, drying at room temperature, obtain the opal structural 2 D photon crystal single thin film of high-sequential.
The preparation method of the present invention is simple, and preparation cost is cheap, environmentally friendly, and can prepare large-area thin film, can effectively reduce the defect of the thin film prepared.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram that the present invention prepares opal structural 2 D photon crystal single thin film；
Fig. 2 is the SEM figure of opal structural 2 D photon crystal single thin film prepared by the present invention；
Fig. 3 is opal structural 2 D photon crystal single thin film digital photograph prepared by the present invention.
Detailed description of the invention
Below in conjunction with the accompanying drawings and the present invention is described in further details by embodiment.
Embodiment one:
(1) 556nm polystyrene microsphere is centrifuged, is dried.Weighing quality is 1g microsphere, is dispersed in the mixed solution of the second alcohol and water that 15ml volume ratio is 1:2, ultrasonic ten minutes, mix homogeneously.
(2) 10ml water is added in culture dish, silicon chip is put in culture dish, silicon chip is kept to become 30 ° of angles with the water surface, dropping 10ml polystyrene colloid mix particles solution is on silicon chip, make colloidal particle slowly landing to the water surface, at the interface dropping 10ml Surfactant SDS solution of air with water, form polystyrene single thin film at the water surface.Fig. 1 is the device schematic diagram preparing polystyrene single thin film.
(3) separately taking the silicon substrate of washes clean, insert in water, the most slowly mention, be attached on substrate by single thin film, be dried, obtain opal structural polystyrene single thin film, Fig. 2, Fig. 3 are respectively polystyrene monolayer film film scanning Electronic Speculum and digital photograph.
Embodiment two:
(1) 600nm silicon dioxide microsphere is centrifuged, is dried.Weigh the microsphere that quality is 1g, be dispersed in the mixed solution of the second alcohol and water that 10ml volume ratio is 1:2, ultrasonic ten minutes, mix homogeneously.
(2) 20ml water is added in culture dish, the silicon chip of washes clean is put in culture dish, keep silicon chip and water surface angle at 45 °, dropping 15ml silica colloidal particles mixed solution is on silicon chip, make colloidal particle slowly landing to the water surface, dropping 15ml Surfactant SDS solution, in the water surface, regulation air and the surface tension of water, makes silica colloidal particles form silicon dioxide layer thin film at the interface of air with water.
(3) glass substrate is separately taken, washes clean, single thin film is moved to substrate from water turn, is dried, obtains opal structural silicon dioxide layer thin film.
Claims (1)
1. the preparation method of an opal structural 2 D photon crystal, it is characterised in that include with
Lower step:
(1) colloidal particle is dispersed in the mixed solution of the second alcohol and water that volume ratio is 1:2, super
Sound disperse 5～20 minutes standby；Described colloidal particle be 556nm polystyrene microsphere or
600nm silicon dioxide microsphere；
(2) take a culture dish, add the deionized water of certain volume, the substrate of washes clean is put
In culture dish, substrate is kept to become 5 °～the angle of 90 ° with the water surface；Step (1) is obtained
Mixed solution drips on substrate, by regulation substrate and the angle of the water surface, makes colloidal particle edge
Substrate slowly slides to the interface of air and water, drips mass fraction at the interface of air with water and is
The Surfactant SDS of 1%～10%, with the surface tension of adjustment interface, makes glue
Body particle forms one layer of single thin film at the interface of air with water；
(3) separately take the substrate of a washes clean, single thin film is moved to substrate from water turn, room
Temperature is dried, and obtains the opal structural 2 D photon crystal single thin film of high-sequential.
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951166B (en) * | 2016-04-28 | 2019-03-29 | 河南大学 | The preparation facilities of two-dimensional colloidal crystal |
| CN106370534B (en) * | 2016-08-15 | 2019-03-22 | 常州大学 | A kind of novel colloidal crystal self-assembling method |
| CN106544732B (en) * | 2016-10-27 | 2018-11-23 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
| CN107604433B (en) * | 2017-07-28 | 2020-12-01 | 华南师范大学 | Method for producing a single-layer lattice |
| TW201934483A (en) * | 2017-12-28 | 2019-09-01 | 奧地利商施華洛世奇股份有限公司 | Method and apparatus for manufacturing photonic crystals |
| CN108642566A (en) * | 2018-05-11 | 2018-10-12 | 南京邮电大学 | The method that the two-dimensional colloidal crystal film of ordered arrangement is prepared based on Hybrid assembling mode |
| CN109592910A (en) * | 2018-11-26 | 2019-04-09 | 哈尔滨工业大学 | A kind of preparation method of hollow ball-shape electrochomeric films |
| CN111455466B (en) * | 2020-04-14 | 2021-07-13 | 西安交通大学 | Preparation method of colloidal crystal based on LB membrane method |
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| CN102617874A (en) * | 2012-02-28 | 2012-08-01 | 清华大学 | Two-dimensional colloid crystal thin film and preparation method thereof |
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| CN101270197A (en) * | 2008-03-12 | 2008-09-24 | 南京大学 | Method for preparing adjustable uniform hole polystyrene monolayer film |
| CN101380625A (en) * | 2008-10-15 | 2009-03-11 | 湖南大学 | Preparation method of large-area nano-microparticles monolayer film |
| CN101428493A (en) * | 2008-12-12 | 2009-05-13 | 清华大学 | Method for producing polymer colloid crystal film on hydrophobic substrate |
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