CN103966655A - Preparation method for two-dimensional photonic crystals with opal structures - Google Patents
Preparation method for two-dimensional photonic crystals with opal structures Download PDFInfo
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Abstract
The invention discloses a preparation method for two-dimensional photonic crystals with opal structures. The preparation method for the two-dimensional photonic crystals with the opal structures comprises the following steps: dispersing colloidal particles into a mixed solution with ethanol and water in a certain ratio; adjusting the falling speed of the colloidal particles by adjusting the angle between a substrate and a water surface, so that the colloidal particles slide on an interface between the water and air; adding a surfactant to adjust the surface tension of the interface of the water and the air to form a single-layer film, and then transferring the single-layer film onto any substrate. The preparation method disclosed by the invention is easy to operate, low in preparation cost and environment-friendly, and can prepare a large-area thin film.
Description
Technical field
The invention belongs to preparation method's technical field of 2 D photon crystal film, specifically relate to a kind of preparation method of opal structural 2 D photon crystal.
Background technology
Photonic crystal be a kind of in the magnitude of micron, submicron isophotal wavelength specific refractory power present periodically variable dielectric material.1987, first the concept of photonic crystal is proposed by E.Yablonovitch, from material structure, photonic crystal is that a class has the periodically crystal of the artificial Design and manufacture of dielectric structure on optics yardstick.High-sequential photonic crystal of opals structure, due at photonic material, high-density magnetic memory materials, the widespread use of biosensor etc. and be subject to investigators' extensive concern.The preparation technology of photonic crystal is very difficult, and along with scientific and technological development, scientists has been prepared various crystalline structure, and wherein applying maximum is opal structural.At present, assemble the main method of two-dimentional opal photonic crystal: spin-coating method, vertical deposition method, crystal pulling method etc.And prepare the problem that two-dimentional photonic crystal of opals structure mainly exists, be to exist a large amount of textural defect, such as: point defect, L&S line defect etc.
That the Chinese patent CN200810019681.0 of the applications such as Tang Yuefeng asks for protection is a kind of preparation method of adjustable uniform hole polystyrene monolayer film, wherein, by monodispersed polystyrene microsphere is passed through to crystal pulling method, obtains the unitary film of long-range order.What the Chinese patent CN201210347815.8 of the applications such as Dong Qiming asked for protection is a kind of self-assembly preparation method thereof of colloid micro ball unitary film, and the method utilizes spin-coating method to obtain after unitary film, and then adopts liquid-gas interface method to line up closely packed hexagonal structure.But the subject matter that aforesaid method exists is to need large-scale instrument could prepare unitary film, preparation method is complicated, and preparation cost is high.The Chinese patent CN200810143328.3 of the applications such as Li Yongjun has asked for protection a kind of preparation method of large-area nano-microparticles monolayer film; the method is by adding successively water soluble organic substance, water-insoluble liquid state organics and water; water soluble nanometer particles is extracted from colloidal solution, on water/water-insoluble liquid state organics interface, prepare unitary film.The shortcoming of the method is that the organic solvent using can pollute environment.
In order to solve the problems of the technologies described above, the present invention has proposed directly at the interface of empty G&W, to prepare opal structural 2 D photon crystal single thin film innovatively, preparation method of the present invention is simple, preparation cost is cheap, environmentally friendly, and can prepare large-area film, can effectively reduce the defect of the film preparing.
Summary of the invention
The present invention provides a kind of preparation method of opal structural 2 D photon crystal just for the above-mentioned technical problem existing in prior art.
Preparation method of the present invention comprises the following steps:
(1) colloidal particle is dispersed in the mixing solutions of second alcohol and water of certain volume ratio, ultrasonic dispersion 5 ~ 20 minutes is standby;
(2) get a culture dish, add the deionized water of certain volume, the substrate of washes clean is placed in to culture dish, keep substrate to become the angle of 5 ° ~ 90 ° with the water surface; The mixing solutions that step (1) is obtained drips on substrate, by regulating the angle of substrate and the water surface, make colloidal particle along substrate, slowly slide to the interface of air and water, the Surfactant SDS that is 1% ~ 10% at the interface of air and water dropping massfraction, with the surface tension of adjustment interface, makes colloidal particle at interface formation one deck single thin film of air and water;
(3) separately get the substrate of a washes clean, single thin film is moved to substrate from water turn, drying at room temperature, obtains the opal structural 2 D photon crystal single thin film of high-sequential.
Preparation method of the present invention is simple, and preparation cost is cheap, environmentally friendly, and can prepare large-area film, can effectively reduce the defect of the film preparing.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram that the present invention prepares opal structural 2 D photon crystal single thin film;
Fig. 2 is the SEM figure of the opal structural 2 D photon crystal single thin film prepared of the present invention;
Fig. 3 is opal structural 2 D photon crystal single thin film digital photograph prepared by the present invention.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the present invention is described in further details.
embodiment mono-:
(1) 556nm polystyrene microsphere is centrifugal, dry.Taking quality is 1g microballoon, is dispersed in 15ml volume ratio and is in the mixing solutions of second alcohol and water of 1:2, ultrasonic ten minutes, mixes.
(2) add 10ml water in culture dish, silicon chip is put into culture dish, keep silicon chip to become 30 ° of angles with the water surface, drip 10ml polystyrene colloid mix particles solution on silicon chip, make colloidal particle slowly landing to the water surface, at the interface of air and water, drip 10ml Surfactant SDS solution, at the water surface, form polystyrene single thin film.Fig. 1 is the device schematic diagram of preparing polystyrene single thin film.
(3) separately get the silicon substrate of washes clean, insert in water, then slowly mention, single thin film is attached on substrate, dry, obtain opal structural polystyrene single thin film, Fig. 2, Fig. 3 are respectively polystyrene monolayer film film scanning Electronic Speculum and digital photograph.
embodiment bis-:
(1) 600nm silicon dioxide microsphere is centrifugal, dry.Take the microballoon that quality is 1g, be dispersed in 10ml volume ratio and be in the mixing solutions of second alcohol and water of 1:2, ultrasonic ten minutes, mix.
(2) add 20ml water in culture dish, the silicon chip of washes clean is put into culture dish, keep silicon chip and water surface angle at 45 °, drip 15ml silicon dioxide colloid mix particles solution on silicon chip, make colloidal particle slowly landing to the water surface, drip 15ml Surfactant SDS solution in the water surface, regulate the surface tension of air and water, make silicon dioxide colloid particle at the interface formation silicon-dioxide single thin film of air and water.
(3) separately get glass substrate, washes clean, moves to single thin film substrate from water turn, dry, obtains opal structural silicon-dioxide single thin film.
Claims (1)
1. a preparation method for opal structural 2 D photon crystal, is characterized in that, comprises the following steps:
(1) colloidal particle is dispersed in the mixing solutions of second alcohol and water of certain volume ratio, ultrasonic dispersion 5 ~ 20 minutes is standby;
(2) get a culture dish, add the deionized water of certain volume, the substrate of washes clean is placed in to culture dish, keep substrate to become the angle of 5 ° ~ 90 ° with the water surface; The mixing solutions that step (1) is obtained drips on substrate, by regulating the angle of substrate and the water surface, make colloidal particle along substrate, slowly slide to the interface of air and water, the Surfactant SDS that is 1% ~ 10% at the interface of air and water dropping massfraction, with the surface tension of adjustment interface, makes colloidal particle at interface formation one deck single thin film of air and water;
(3) separately get the substrate of a washes clean, single thin film is moved to substrate from water turn, drying at room temperature, obtains the opal structural 2 D photon crystal single thin film of high-sequential.
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| CN103966655B CN103966655B (en) | 2016-08-10 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951166A (en) * | 2016-04-28 | 2016-09-21 | 河南大学 | Device for preparing two-dimensional colloidal crystals |
| CN106370534A (en) * | 2016-08-15 | 2017-02-01 | 常州大学 | Novel self-assembling method for colloidal crystals |
| CN106544732A (en) * | 2016-10-27 | 2017-03-29 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
| CN107604433A (en) * | 2017-07-28 | 2018-01-19 | 华南师范大学 | The preparation method of individual layer lattice |
| CN108642566A (en) * | 2018-05-11 | 2018-10-12 | 南京邮电大学 | The method that the two-dimensional colloidal crystal film of ordered arrangement is prepared based on Hybrid assembling mode |
| CN109592910A (en) * | 2018-11-26 | 2019-04-09 | 哈尔滨工业大学 | A kind of preparation method of hollow ball-shape electrochomeric films |
| CN111455466A (en) * | 2020-04-14 | 2020-07-28 | 西安交通大学 | Preparation method of colloidal crystal based on L B membrane method |
| CN111629993A (en) * | 2017-12-28 | 2020-09-04 | D.施华洛世奇两合公司 | Method and apparatus for manufacturing photonic crystal |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101270197A (en) * | 2008-03-12 | 2008-09-24 | 南京大学 | Method for preparing adjustable uniform hole polystyrene monolayer film |
| CN101380625A (en) * | 2008-10-15 | 2009-03-11 | 湖南大学 | Preparation method of large-area nano-microparticles monolayer film |
| CN101428493A (en) * | 2008-12-12 | 2009-05-13 | 清华大学 | Method for producing polymer colloid crystal film on hydrophobic substrate |
| CN101787139A (en) * | 2010-03-03 | 2010-07-28 | 清华大学 | Binary colloidal crystal film preparation method |
| CN102617874A (en) * | 2012-02-28 | 2012-08-01 | 清华大学 | Two-dimensional colloid crystal thin film and preparation method thereof |
| CN102826505A (en) * | 2012-09-19 | 2012-12-19 | 电子科技大学 | Self-assembly preparation method of colloid microsphere single-layer film |
-
2014
- 2014-05-07 CN CN201410189467.5A patent/CN103966655B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101270197A (en) * | 2008-03-12 | 2008-09-24 | 南京大学 | Method for preparing adjustable uniform hole polystyrene monolayer film |
| CN101380625A (en) * | 2008-10-15 | 2009-03-11 | 湖南大学 | Preparation method of large-area nano-microparticles monolayer film |
| CN101428493A (en) * | 2008-12-12 | 2009-05-13 | 清华大学 | Method for producing polymer colloid crystal film on hydrophobic substrate |
| CN101787139A (en) * | 2010-03-03 | 2010-07-28 | 清华大学 | Binary colloidal crystal film preparation method |
| CN102617874A (en) * | 2012-02-28 | 2012-08-01 | 清华大学 | Two-dimensional colloid crystal thin film and preparation method thereof |
| CN102826505A (en) * | 2012-09-19 | 2012-12-19 | 电子科技大学 | Self-assembly preparation method of colloid microsphere single-layer film |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951166A (en) * | 2016-04-28 | 2016-09-21 | 河南大学 | Device for preparing two-dimensional colloidal crystals |
| CN105951166B (en) * | 2016-04-28 | 2019-03-29 | 河南大学 | The preparation facilities of two-dimensional colloidal crystal |
| CN106370534B (en) * | 2016-08-15 | 2019-03-22 | 常州大学 | A kind of novel colloidal crystal self-assembling method |
| CN106370534A (en) * | 2016-08-15 | 2017-02-01 | 常州大学 | Novel self-assembling method for colloidal crystals |
| CN106544732A (en) * | 2016-10-27 | 2017-03-29 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
| CN106544732B (en) * | 2016-10-27 | 2018-11-23 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
| CN107604433A (en) * | 2017-07-28 | 2018-01-19 | 华南师范大学 | The preparation method of individual layer lattice |
| CN111629993A (en) * | 2017-12-28 | 2020-09-04 | D.施华洛世奇两合公司 | Method and apparatus for manufacturing photonic crystal |
| CN111629993B (en) * | 2017-12-28 | 2024-01-30 | D.施华洛世奇两合公司 | Method and apparatus for fabricating photonic crystals |
| CN108642566A (en) * | 2018-05-11 | 2018-10-12 | 南京邮电大学 | The method that the two-dimensional colloidal crystal film of ordered arrangement is prepared based on Hybrid assembling mode |
| CN109592910A (en) * | 2018-11-26 | 2019-04-09 | 哈尔滨工业大学 | A kind of preparation method of hollow ball-shape electrochomeric films |
| CN111455466A (en) * | 2020-04-14 | 2020-07-28 | 西安交通大学 | Preparation method of colloidal crystal based on L B membrane method |
| CN111455466B (en) * | 2020-04-14 | 2021-07-13 | 西安交通大学 | Preparation method of colloidal crystal based on LB membrane method |
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