CN103951880B - 一种防击穿高性能电容器用金属化薄膜及其制备方法 - Google Patents
一种防击穿高性能电容器用金属化薄膜及其制备方法 Download PDFInfo
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Abstract
本发明公开了一种防击穿高性能电容器用金属化薄膜,其特征在于,由下列重量份的原料制成:等规聚丙烯200、抗氧剂1010?1-2、铝碳酸镁2-3、丙二醇3-4、乙氧基化脂肪族烷基胺1-2、聚二甲基硅氧烷2-3、乙酰水杨酸1-2、纳米三氧化二铝1-2、肌醇六磷酸酯6-8、助剂5-6;本发明通过过滤,去除原料中的杂质,使原料性能好,降低了薄膜的报废率,不易破裂;采用电晕处理,提高了薄膜的耐压强度,防止击穿,本发明加工工艺简单,并且用其制作的薄膜电容器接触电阻小,从而使得产品特性好,使用寿命长。
Description
技术领域
本发明涉及电容器制造领域,特别是一种防击穿高性能电容器用金属化薄膜及其制备方法。
背景技术
电容器用双向拉伸聚丙烯薄膜具有较高的机械性能和电气性能,与普通型薄膜制得的电容器相比,用聚丙烯薄膜制得的电容器以其热收缩率低、性能稳定、耐高温、耐高压,防止击穿等显著优点,使得聚丙烯薄膜制得的电容器的使用范围越来越广。
电容芯子是电容器的心脏,因此电容器制造芯子材质必须具有耐高频,耐高
温,能承受大电流冲击的一种高分子聚丙烯膜作介质,才能保证整机长期稳定地工作。现有技术中大部分采用的介质为聚脂或聚丙烯光膜,电极为铝箔,也有少量产品使用聚丙烯金属化蒸镀膜。由于市场整机都面向于超薄型,微小型发展,虽然箔膜复合材料载流耐电能力强,但它的缺点是体积大不利于组装整机使用,另一缺点是聚丙烯膜与铝箔复合卷制等工艺难易控制,特别是在绕制芯子过程中因两者材质硬韧性的差异,会造成膜箔间出现间隙,至使材料在定型时热收缩不够充分,导致膜箔间容易被电击穿,报废率较高,造成了成本浪费。
发明内容
本发明的目的是提供一种防击穿高性能电容器用金属化薄膜及其制备方法。
为了实现本发明的目的,本发明通过以下方案实施:
一种防击穿高性能电容器用金属化薄膜,由下列重量份的原料制成:等规聚丙烯200、抗氧剂10101-2、铝碳酸镁2-3、丙二醇3-4、乙氧基化脂肪族烷基胺1-2、聚二甲基硅氧烷2-3、乙酰水杨酸1-2、纳米三氧化二铝1-2、肌醇六磷酸酯6-8、助剂5-6;
所述助剂由下列重量份的原料制成:茂金属线性低密度聚乙烯12-15、苯甲酸钠1-2、当归油1-2、聚异丁烯3-4、硅烷偶联剂KH5501-2、椴木灰烬1-2、亚硒酸钠1-2、纳米玉石粉0.3-0.4、玫瑰精油0.1-0.2;制备方法是将茂金属线性低密度聚乙烯加热至熔融状态,然后,加入纳米玉石粉、椴木灰烬搅拌10-15分钟,最后加入其它成分,搅拌分散均匀,冷却,造粒,即得。
本发明所述防击穿高性能电容器用金属化薄膜,由以下具体步骤制成:
(1)将等规聚丙烯、丙二醇、乙氧基化脂肪族烷基胺、聚二甲基硅氧烷混合加热熔融,再加入助剂以及其余剩余成分充分搅拌,送入挤出机熔融、过滤,然后再通过挤出机挤出片状熔体,过滤>1200目,所述挤出机的温度为220-250℃;
(2)将步骤(1)制成的片状熔体通过激冷辊及风淋室冷却定型后制得铸片,依次进行纵向拉伸、横向拉伸、粗化面电晕处理;
(3)收卷、第一次时效处理、第二次时效处理;
(4)真空蒸发金属化膜,粗化面形成金属化层。
本发明的有益效果为:本发明通过过滤,去除原料中的杂质,使原料性能好,降低了薄膜的报废率,不易破裂;采用电晕处理,提高了薄膜的耐压强度,防止击穿,本发明加工工艺简单,并且用其制作的薄膜电容器接触电阻小,从而使得产品特性好,使用寿命长。
具体实施方式
下面通过具体实例对本发明进行详细说明。
一种防击穿高性能电容器用金属化薄膜,由下列重量份(公斤)的原料制成:等规聚丙烯200、抗氧剂10101、铝碳酸镁2、丙二醇3、乙氧基化脂肪族烷基胺1、聚二甲基硅氧烷2、乙酰水杨酸1、纳米三氧化二铝1、肌醇六磷酸酯6、助剂5;
所述助剂由下列重量份(公斤)的原料制成:茂金属线性低密度聚乙烯12、苯甲酸钠1、当归油2、聚异丁烯3、硅烷偶联剂KH5501、椴木灰烬1、亚硒酸钠1、纳米玉石粉0.3、玫瑰精油0.1;制备方法是将茂金属线性低密度聚乙烯加热至熔融状态,然后,加入纳米玉石粉、椴木灰烬搅拌10-15分钟,最后加入其它成分,搅拌分散均匀,冷却,造粒,即得。
本发明所述防击穿高性能电容器用金属化薄膜,由以下具体步骤制成:
(1)将等规聚丙烯、丙二醇、乙氧基化脂肪族烷基胺、聚二甲基硅氧烷混合加热熔融,再加入助剂以及其余剩余成分充分搅拌,送入挤出机熔融、过滤,然后再通过挤出机挤出片状熔体,过滤>1200目,所述挤出机的温度为220-250℃;
(2)将步骤(1)制成的片状熔体通过激冷辊及风淋室冷却定型后制得铸片,依次进行纵向拉伸、横向拉伸、粗化面电晕处理;
(3)收卷、第一次时效处理、第二次时效处理;
(4)真空蒸发金属化膜,粗化面形成金属化层。
本发明实施例的金属化薄膜的技术指标如下:
(1)横向收缩率≤0.2%、纵向收缩率≤2.5%
(2)横向拉伸强度≥14Mpa、纵向拉伸强度≥16Mpa;
(3)最小击穿电压600Vv/um。
Claims (1)
1.一种防击穿高性能电容器用金属化薄膜,其特征在于,由下列重量份的原料制成:等规聚丙烯200、抗氧剂10101-2、铝碳酸镁2-3、丙二醇3-4、乙氧基化脂肪族烷基胺1-2、聚二甲基硅氧烷2-3、乙酰水杨酸1-2、纳米三氧化二铝1-2、肌醇六磷酸酯6-8、助剂5-6;
所述助剂由下列重量份的原料制成:茂金属线性低密度聚乙烯12-15、苯甲酸钠1-2、当归油1-2、聚异丁烯3-4、硅烷偶联剂KH5501-2、椴木灰烬1-2、亚硒酸钠1-2、纳米玉石粉0.3-0.4、玫瑰精油0.1-0.2;制备方法是将茂金属线性低密度聚乙烯加热至熔融状态,然后,加入纳米玉石粉、椴木灰烬搅拌10-15分钟,最后加入其它成分,搅拌分散均匀,冷却,造粒,即得;
所述防击穿高性能电容器用金属化薄膜由以下具体步骤制成:
(1)将等规聚丙烯、丙二醇、乙氧基化脂肪族烷基胺、聚二甲基硅氧烷混合加热熔融,再加入助剂以及其余剩余成分充分搅拌,送入挤出机熔融、过滤,然后再通过挤出机挤出片状熔体,过滤>1200目,所述挤出机的温度为220-250℃;
(2)将步骤(1)制成的片状熔体通过激冷辊及风淋室冷却定型后制得铸片,依次进行纵向拉伸、横向拉伸、粗化面电晕处理;
(3)收卷、第一次时效处理、第二次时效处理;
(4)真空蒸发金属化膜,粗化面形成金属化层。
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