CN103941911B - A kind of contact panel and display device - Google Patents
A kind of contact panel and display device Download PDFInfo
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- CN103941911B CN103941911B CN201410083697.3A CN201410083697A CN103941911B CN 103941911 B CN103941911 B CN 103941911B CN 201410083697 A CN201410083697 A CN 201410083697A CN 103941911 B CN103941911 B CN 103941911B
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Abstract
The invention provides a kind of contact panel, including transparent substrates and transparency conducting layer, transparency conducting layer further comprises conductive pattern and carved to stitch.By controlling to carve seam dutycycle or the transparent homogeneous layer of laying or the opaque light shield layer of laying, make the transmitance difference for stitching region and conductive pattern region quarter of conductive panel no more than 1%, it is bad to avoid the occurrence of bright line and the figure display such as visible, reach the effect of optimization visual experience.
Description
Technical field
The present invention relates to touch-control field, more particularly to a kind of contact panel and the display device including the contact panel.
Background technology
Currently, being showing improvement or progress day by day with Display Technique, people, which are not intended merely to display panel, has more functions, and right
In the requirement more and more higher of display picture.Nowadays, contact panel has become mobile phone, tablet personal computer, small game equipment, notes
The main flow of this grade panel selection.In order to more frivolous, contact panel at this stage is general by the integrated display panel of touch control electrode
On, such as color membrane substrates, array base palte, organic luminous panel, but it is bad so to also result in some displays, bright line such as occurs
Or electrode pattern is visible, the visual experience of user is influenceed.
The content of the invention
Embodiments of the invention technical problem to be solved be prior art contact panel in electrode pattern it is visible, shadow
Ring the visual experience of user.
In order to solve the above-mentioned technical problem, transparent substrates and transparency conducting layer are included The embodiment provides one kind
Contact panel, transparency conducting layer include transparent conductive patterns, transparent conductive patterns each other have carve seam, electrically conducting transparent figure
The transmitance difference in case region and quarter seam region is no more than 1%.
Embodiments of the invention also provide a kind of touch control display apparatus, and it includes the contact panel that the present invention is provided.
It is visible and there is the display problems such as bright line that such a display device can solve electrode pattern.
Brief description of the drawings
Fig. 1 a are the top view of contact panel;
Fig. 1 b are the profile along AA ' directions of contact panel;
Fig. 1 c are located at the profile of transparent substrates for the transparency conducting layer of contact panel indirectly;
Fig. 1 d are the visual effect comparison diagram in the transparent conductive patterns region of different transmitances;
Fig. 2 a are the top view of electrode pattern and electrode line pattern in embodiment one.
Fig. 2 b are a kind of top view of implementation in embodiment one.
Fig. 2 c are the top view of another implementation in embodiment one.
Fig. 3 a are the existing mode top view of another implementation in embodiment one.
Fig. 3 b are the optimal way top view of another implementation in embodiment one.
Fig. 4 a are a kind of top view of embodiment in embodiment two.
Fig. 4 b are the profile in Fig. 4 a along BB '.
Fig. 4 c are the top view of another embodiment in embodiment two.
Fig. 4 d are the profile in Fig. 4 c along CC '.
Fig. 5 a are a kind of top view of embodiment in embodiment three.
Fig. 5 b are the profile in Fig. 5 a along DD '.
Fig. 5 c are the top view of another embodiment in embodiment three.
Fig. 5 d are the profile in Fig. 5 c along EE '.
Fig. 6 a are a kind of profile of embodiment of the display device comprising contact panel.
Fig. 6 b are the profile of the another embodiment of the display device comprising contact panel.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below in conjunction with the accompanying drawings to the present invention
Embodiment be described in detail.
Many details are elaborated in the following description to facilitate a thorough understanding of the present invention, still the present invention can be with
It is different from other manner described here to implement using other, therefore the present invention is not limited by following public specific embodiment
System.
As shown in Figure 1a, the contact panel 10 that the present invention is provided includes transparent substrates 11 and saturating in transparent substrates 11
Bright conductive layer 12.The quarter that transparency conducting layer 12 is included between multiple transparent conductive patterns 13 and transparent conductive patterns 13 stitches 14.Carve
The transmitance difference for stitching 14 regions and the region of transparent conductive patterns 13 is less than 1%.The material of transparent conductive patterns 13 can
Think tin indium oxide or Nano Silver or CNT.
" on being located at ... " described in present specification had both included the two directly contact, as shown in Figure 1 b, electrically conducting transparent
Layer 12 is in transparent substrates 11;Also include the two to be not directly contacted with, i.e., an at least intermediate layer is set therebetween, such as schemed
Shown in 1b, contact panel 10 may also include intermediate layer 9, and intermediate layer 9 is located between transparent substrates 11 and transparency conducting layer 12.This
" carving 14 regions of seam " described in application documents can both include the region for only carving seam 14, can also include at least having portion
Divide the region for carving seam 14 and partially electronically conductive pattern 13." region of conductive pattern 13 " described in present specification is entirely conductive
The region that pattern 13 is covered.
When the transmitance difference for carving 14 regions of seam and the region of transparent conductive patterns 13 is less than 1%, transparent conductive patterns
13 is i.e. invisible, is that inventor is drawn by substantial amounts of experiment.It is unit that inventor, which chooses human eye and differentiates smallest dimension 0.1mm,
Length, the circular area of the square or a diameter of unit length by unit length of the length of side is unit area, by unit
The transmitance that 14 regions of seam and the region of transparent conductive patterns 13 are carved in area is contrasted, and studies its display effect.
Table 1 is the related data when region transmitance of transparent conductive patterns 13 is 80%:
Ke Feng areas transmitance | Pattern area transmitance | Transmitance total variances | Display effect |
80.9% | 80.0% | 0.9% | Figure is invisible |
81.2% | 80.0% | 1.2% | Figure is slight |
81.5% | 80.0% | 1.5% | Figure is visible |
83.0% | 80.0% | 3.0% | Figure is obvious |
83.9% | 80.0% | 3.9% | Figure is obvious |
Table 1
Table 2 is the related data when region transmitance of transparent conductive patterns 13 is 86%:
Ke Feng areas transmitance | Pattern area transmitance | Transmitance difference | Display effect |
90.0% | 86.0% | 0.9% | Figure is invisible |
87.8% | 86.0% | 1.8% | Figure is visible |
88.3% | 86.0% | 2.3% | Figure is obvious |
Table 2
Table 3 is the related data when region transmitance of transparent conductive patterns 13 is 90%:
Ke Feng areas transmitance | Pattern area transmitance | Transmitance difference | Display effect |
90.5% | 90.0% | 0.5% | Figure is invisible |
91.0% | 90.0% | 1.0% | Figure is invisible |
91.3% | 90.0% | 1.3% | Figure is visible |
Table 3
It can be seen that from the data of table 1, table 2, table 3:The transmitance for carving 14 regions of seam and the region of transparent conductive patterns 13 is poor
Different when being less than 1%, figure is invisible, and transmitance difference figure observability more than 1% is gradually obvious.
How to realize that the transmitance difference for carving 14 regions of seam and the region of transparent conductive patterns 13 is less than 1%, there are different implementations
Mode, is given below several preferred modes and is illustrated.
As a preferred embodiment, as shown in Figure 2 a, the electrically conducting transparent figure for the contact panel 10 that the present invention is provided
Case 13 can further comprise electrode wires 21 and electrode 22, and electrode wires 21 are connected with electrode 22, between electrode wires 21, electrode 22
14 are stitched with carving.Region 210 is the surface any region of contact panel 10, and it is the face that seam 14 is carved in region 120 to carve seam dutycycle X
The long-pending ratio with the area of region 120, Ta is the transmitance in 14 regions of quarter seam in the region 210, and Tb leads to be transparent in region 210
The transmitance in the region of electrical pattern 13.
For purposes of illustration only, exemplified by using glass as transparent substrates 11, the transmitance value of glass is 95%, is being carved in seam 14,
Only there are transparent substrates 11, therefore its transmitance is 95%;As shown in Figure 1 d, the transmitance in the region of transparent conductive patterns 13 is
90%, at the invisible border of figure, it is 20% that its abscissa, which carves seam dutycycle, and transmitance difference is just 1%;Electrically conducting transparent figure
The transmitance in the region of case 13 is 86%, at the invisible border of figure, and its abscissa is 11.7%, and now transmitance difference is 1%.
When the transmitance in the region of transparent conductive patterns 13 is 80%, quarter seam dutycycle appearance after 6.6% is visible, now transmitance difference
It is similarly 1%.
Also, when can also be seen that from Fig. 1 d data when 13 region transmitance increase of transparent conductive patterns, occur without figure
The visible maximum for carving seam dutycycle also increases therewith.According to calculating, when carving seam dutycycle design load no more than estimated value, i.e.,
Figure can be improved visible.The specific different estimated values for carving seam dutycycle X are as listed by table 4:
Table 4
It can be drawn by above-mentioned data and calculating, the quarter seam dutycycle of transparency conducting layer 12When, X
To carve 14 areas of seam and the ratio of unit area in unit area, 1% is the maximum of transmitance difference when figure is invisible, Ta
For it is described carve seam 14 regions transmitance, Tb be the region of transparent conductive patterns 13 transmitance, the region of transparent conductive patterns 13 with
The transmitance difference for carving 14 regions of seam is less than 1%.
Control carves seam dutycycle not above preferred scopeMode have a variety of, be given below several
Different modes is planted to control to carve seam dutycycle:
Due to carving the area of seam and electrode between electrode than stitching the area ratio with electrode wires much smaller than quarter between electrode wires.Electricity
Quarter seam between pole is small on carving seam dutycycle influence, and seam dutycycle is carved in control, and key is the quarter seam face between coordination electrode line
Product and density.As shown in Fig. 2 b and Fig. 2 c, a plurality of electrode wires 210,211,212 include the first terminal 210a, 211a, 212a respectively
With Second terminal 210b, 211b, 212b, the first terminal 210a, 211a, 212b respectively with 220 in multiple electrodes, 221,222
It is connected, Second terminal 210b, 211b, 212b are located at transparent substrates 11(It is not shown)Edge.Electrode wires 210,211,212 with each other
Between quarter seam collectively constitute electrode wires region 24, electrode wires region 24 also includes first electrode line region 24a and second electrode line
Region 24b, first electrode line region 24a are close to the first terminal 210a, 211a, 212a region, second electrode line region 24b
Close to Second terminal 210b, 211b, 212b region.
It is to keep in first electrode line region 24a and second electrode line region 24b to control a kind of mode for carving seam dutycycle
Quarter seam density variation be basically unchanged, the electrode line width in increase first electrode line region 24a reduces first electrode line area
Quarter slit width degree in domain 24, area is stitched with uniform carve.
Electrode wires 210 as shown in Figure 2 b(It is not shown), 211,212, respectively including the first terminal 210a, 211a, 212a and
Second terminal 210b, 211b, 212b, the first terminal 210a, 211a, 212a are connected with electrode 220,221,222, Second terminal
210b, 211b, 212b are located at transparent substrates 11(It is not shown)Edge.First electrode line region 24a close to the first terminal 210a,
211a, 212a, electrode wires second area 24b is close to Second terminal 210b, 211b, 212b.In the 24a of electrode wires first area
The width of electrode wires 210,211,212 be more than be located at electrode wires second area 24b in electrode wires 210,211,212 width.
Quarter seam area in first electrode area 21a and the second electrode region 21b is of substantially equal.
Control carve seam dutycycle another way be, keep carve slit width degree it is constant, reduce first electrode line region 24a and
In second electrode line region 24b quarter seam density variation, i.e. first electrode line region 24a in electrode wires inside have one or
It is multiple to carve seam.
Electrode wires 210 include the first terminal 210a and Second terminal 210b, the first terminal 210a and electrode as shown in Figure 2 c
220 are connected, and Second terminal 210b is located at transparent substrates 11(It is not shown)Edge.Electrode wires 211 include the first terminal 211a and the
Two-terminal 211b, the first terminal 211a is connected with electrode 221, and Second terminal 211b is located at the edge of transparent substrates 11, first electrode
Line region 24a is close to the first terminal 210a and 211a, and second electrode line region 24b is close to Second terminal 210b, 211b.Positioned at
There is multiple carve to stitch 210c, the electrode wires 211 positioned at first electrode area 24a have in one electrode wires region 24a electrode wires 210
There is one to carve seam 211c.The width that quarter slit width degree between electrode wires 210,211,212 stitches 210c and 211c with carving is essentially identical.
It is to optimize electrode structure to control the another way for carving seam dutycycle, reduces electrode wires number, and then seam is carved in reduction
Seam dutycycle is carved in number, reduction.
For the ease of carrying out comparative illustration, mode and optimal way will be had simultaneously.Existing mode as shown in Figure 3 a,
Electrode wires 21 include first electrode line 31 and second electrode line 32, and electrode 22 includes first electrode 33 and second electrode 34, first
Electrode 33 is spaced apart from each other with second electrode 34 along panel broadside or narrow edge direction, and defines this direction for line direction.First
Electrode wires 31 are connected with first electrode 33, and second electrode line 32 is connected with second electrode 34.First electrode 33 is hung down along with line direction
Straight column direction distribution is multiple, and second electrode 34 is per column distribution one.
As shown in Figure 3 b, first electrode 33 further comprises the first sub-electrode 33a and 33b, the first sub-electrode to optimal way
33a and 33b are spaced apart from each other along column direction.First electrode line 31 further comprises the first sub-electrode line 31a and 31b, point
It is not connected with the first sub-electrode 33a and 33b.Second electrode 34 further comprises the second sub-electrode 34a and 34b, the second sub-electrode
34a and 33b are spaced apart from each other along column direction.Second electrode line further comprises the second sub-electrode line 32a and 32b, respectively
It is connected with the second sub-electrode 34a and 34b.First sub-electrode 33a of first electrode 33 and adjacent second electrode 34 the second son electricity
34a and 34b are staggered for pole, i.e., not in same row or column.Likewise, the first sub-electrode 33b of first electrode 33 and adjacent the
The the second sub-electrode 34a and sub-electrode 34b of two electrodes 34 are also staggered.
To embody the technique effect of optimal way, spy is given an example with concrete numerical value:If each column has in existing mode
There are 24 first electrodes and 1 second electrode, then optimal way reaches that identical touch-control effect needs each column to need 12 first
Electrode and 2 second electrodes, both there is 14 row, then corresponding electrode wires number is as shown in table 5:
Each column first electrode line number mesh | Each column second electrode line number mesh | Total columns | Electrode wires sum | |
Existing mode | 24 | 1 | 14 | 350 |
Optimal way | 12 | 2 | 14 | 196 |
Table 5
It can be seen that optimal way considerably reduces electrode wires number, the reduction of electrode wires number, which is directly resulted in, carves subtracting for seam number
It is few, so as to further reduce quarter seam dutycycle.
The present invention removes to pass through and controls to carve seam dutycycleTo realize the region of transparent conductive patterns 13
The transmitance difference that 14 regions are stitched with carving is less than outside 1%, can also control to carve seam dutycycle X by other means beyond estimated value
Ke Feng areas(I.e.Region)Transmitance, to keep carving the seam 14 regions and area of transparent conductive patterns 13
The transmitance difference in domain is less than 1%.Common several preferred examples are given below to be illustrated.
A kind of preferred example is as shown in Fig. 4 a to 4d, and the present invention provides a kind of contact panel 10(It is not shown), except including saturating
Outside bright substrate 11 and transparency conducting layer 12, in addition to a transparent homogeneous layer 26, it include multiple transparent non-conductive patterns 260,
261、262.Transparent homogeneous layer 26 is usually located at side of the transparency conducting layer 12 away from transparent substrates 11.Transparent non-conductive pattern
260th, 261,262 are located at quarter seam dutycycleThe quarter side of sewing in region, enters to the transmitance for carving seam
Row compensation, to reach the homogenization of transmitance.Transparent electrically non-conductive material 260,261,262 is used and the material of transparency conducting layer
Transmitance difference is not more than 1% non-conducting material, such as organic film or low temperature silicon nitride or cryogenic oxidation silicon.
Transparent electrically non-conductive material 260,261,262, which can each be carved to seam, puts one, can also be seamed per multiple quarters and put one
Individual, the transmitance difference for being finally reached the conductive pattern region of contact panel and carving seam region is no more than 1%.
As shown in fig. 4 a, transparency electrode 220,221,222 is connected with electrode wires 210,211,212 respectively, electrode wires 210,
211st, have between 212 and carve quarter seam composition Ke Feng area 24 between seam, electrode wires 210,211,212, and it is carved seam dutycycle and exceeded and estimates
Calculation value.Transparent non-conductive pattern 260,261,262 is distributed in the quarter of electrode wires 210,211,212 seam.Along the profile of BB ' lines
As shown in Figure 4 b, electrode 222 and electrode wires 210,211 are included in transparent substrates 11, electrode wires 210,211 have to each other carves
Seam, each carve is provided with a transparent non-conductive pattern 260,261,262 in seam.
Transparent non-conductive pattern can also be arranged at intervals, as illustrated in fig. 4 c, transparency electrode 220,221,222 respectively with electrode
Line 210,211,212 is connected, and has between electrode wires 210,211,212 and carves seam, and electrode wires 210,211,212 carve seam composition with adjacent
Ke Feng areas 24, and it carves seam dutycycle more than estimated value.It is saturating that one is put at interval of seaming at quarter between an electrode wires 210,211,212
Bright non-conductive pattern 260,261.Along CC ' lines profile as shown in figure 4d, in transparent substrates 11 include electrode 222 and electrode wires
210th, 211, electrode wires 210,211 have to each other carves seam, is carved every one and a transparent non-conductive pattern is provided with seam
260、261。
Except as shown in fig. 4 a, it is each carve to seam put a transparent non-conductive pattern 260,261,262 or as illustrated in fig. 4 c, often
Seamed every a quarter outside the set-up mode for putting a transparent non-conductive pattern 260,261, more than one can also be spaced and carve seam point
One non-conductive clear pattern of cloth, is stitched depending on whether the quarter seam number in Ke Feng areas can meet multiple carve in interval.
Another preferred embodiment is as shown in Fig. 5 a to 5d, and the present invention also provides a kind of contact panel 10(It is not shown), except bag
Include outside transparent substrates 11 and transparency conducting layer 12, in addition to a black matrix 15 and an opaque light shield layer 14, black matrix 15 is located at
Transparent substrates 11 are away from the side of transparency conducting layer 12, and opaque light shield layer 14 is located at transparent substrates 11 close to transparency conducting layer 12
Side.Opaque light shield layer 14 has multiple opaque light-shielding pattern 14a, 14b, 14c, the throwing sewed on positioned at black matrix 15 at quarter
Shadow zone domain, it is carved seam dutycycle X and metOpaque light-shielding pattern is adopted 14a, 14b, 14c and can adopted
With opaque non-conducting material, such as black matrix or ceramics or black oxide.
Opaque light-shielding pattern 14a, 14b, 14c distribution also has various ways, is given below common several:
Black matrix 15 sets opaque light-shielding pattern 14a, 14b, a 14c in the view field in seam of per a moment.As schemed
Shown in 5a, black matrix 15 is located at transparent substrates 11(It is not shown)Side away from transparency conducting layer 12, opaque light shield layer 14
In transparent substrates 11(It is not shown)Close to the side of transparency conducting layer 12(It is that opaque light shield layer 14 is covered in black matrix 15 in figure
Top).Transparency conducting layer 12 includes electrode wires 210,211,212 and electrode 222, electrode wires 210,211,212 and electrode 222 that
Have between this and carve seam, electrode wires 212 are connected with electrode 222.Opaque light-shielding pattern 14a, 14b, 14c be located at black matrix 15 in
In the view field that quarter between electrode wires 210,211,212 stitches.
As shown in Figure 5 b, black matrix 15 is located at transparent substrates 11 away from transparency conducting layer 12 to profiles of Fig. 5 a along DD ' lines
(It is not shown)Side, opaque light shield layer 14 is located at transparent substrates 11 close to transparency conducting layer 12(It is not shown)Side.It is transparent to lead
Electric layer 12(It is not shown)Including electrode wires 210,211 and electrode 222, opaque shading figure layer include opaque light-shielding pattern 14a,
14b、14c.Opaque light-shielding pattern 14a, 14b, 14c, which are located at, carves the electrode wires region 24 that seam dutycycle design load exceedes estimated value
Quarter seam in, with black matrix 15 carve seam projection overlap.
Another mode for setting opaque light-shielding pattern 14a, 14b is that black matrix 15 has projection, every carving in seam
One opaque light-shielding pattern 14a, 14b are set every a projection, as shown in Figure 5 c, black matrix 15 is located at transparent substrates 11(Not
Show)Side away from transparency conducting layer 12, opaque light shield layer 14 is located at transparent substrates 11(It is not shown)Close to electrically conducting transparent
The side of layer 12(It is that opaque light shield layer 14 is covered in the top of black matrix 15 in figure).Transparency conducting layer 12 include electrode wires 210,
211st, 212 and electrode 222, electrode wires 210,211,212 and electrode 222 have each other carves seam, electrode wires 212 and electrode
222 are connected.Opaque light-shielding pattern 14a, 14b are arranged at intervals quarter of the black matrix 15 between electrode wires 210,211,212
In the view field of seam.
As fig 5d, black matrix 15 is located at transparent substrates 11 away from transparency conducting layer 12 to profiles of Fig. 5 c along EE ' lines
(It is not shown)Side, opaque light shield layer 14 is located at transparent substrates 11 close to transparency conducting layer 12(It is not shown)Side.It is transparent to lead
Electric layer 12(It is not shown)Including electrode wires 210,211 and electrode 222, opaque shading figure layer include opaque light-shielding pattern 14a,
14b.Opaque light-shielding pattern 14a, 14b are located at the quarter seam for carving the electrode wires region 24 that seam dutycycle design load exceedes estimated value
Interior, one, interval view field is set.
In carving, seam is interior to have projection to black matrix 15, except each view field sets an opaque shading figure as shown in Figure 5 a
Case 14a, 14b, 14c or the setting that opaque light-shielding pattern 14a, a 14b are set every a view field as shown in Figure 5 c
Outside mode, more than one view field can also be spaced and be distributed an opaque light-shielding pattern, stitched depending on black matrix 15 in quarter
The number of projections of view field whether can meet the multiple projections in interval.
As shown in figures 6 a and 6b, the present invention also provides a kind of touch control display apparatus 16, and it includes any mentioned above
Contact panel 10.Touch control display apparatus 16 can include contact panel 10 in several ways, and several frequently seen side is given below
Formula:
A kind of mode is that contact panel 10 can be external hanging type Trackpad, and as shown in Figure 6 a, i.e., display device 16 includes touch-control
Panel 10 and display panel 17, contact panel 10 are oppositely arranged with display panel 17.Touch panel 10 further comprises transparent lining
Bottom 11 and touch layer 18, touch layer 18 are the general designation of touch panel each level in addition to transparent substrates 11, and touch layer 18 is located at transparent
Side of the substrate 11 away from display panel 17.Display panel 17 further comprises first substrate 19 and second substrate 20, display surface
Plate 17 can be any display panel of the display fields such as liquid crystal display panel, organic electroluminescence display panel.
Another way is that contact panel 10 can also be integrated into display panel, such as On-cell panels, with display surface
Plate 17 shares a substrate and is used as transparent substrates 11.As shown in Figure 6 b, display device 16 includes first substrate 19, contact panel 10,
First substrate 19 is oppositely arranged with contact panel 10.Touch panel 10 further comprises transparent substrates 11 and touch layer 18, touches
Layer 18 is the general designation of touch panel each level in addition to transparent substrates 11, and touch layer 18 is located at transparent substrates 11 away from display panel 17
Side.First substrate 19 can be that array base palte, driving panel in organic luminous panel in liquid crystal display panel etc. are aobvious
Show any driving panel in field.
It should be noted that above example can be used for reference mutually, synthesis is used.Although the present invention is with preferred embodiment
Disclose as above, but it is not that, for limiting the present invention, any those skilled in the art are not departing from the spirit and model of the present invention
In enclosing, the methods and techniques content that may be by the disclosure above makes possible variation and modification to technical solution of the present invention,
Therefore, every content without departing from technical solution of the present invention, what the technical spirit according to the present invention was made to above example appoints
What simple modification, equivalent variation and modification, belongs to the protection domain of technical solution of the present invention.
Claims (13)
1. a kind of contact panel, including:
One transparent substrates and the transparency conducting layer in the transparent substrates;Wherein,
The transparency conducting layer includes multiple transparent conductive patterns,
The multiple transparent conductive patterns are spaced, and are formed multiple carve and are stitched,
The transmitance difference for carving seam region and transparent conductive patterns region is no more than 1%, and the seam region of carving includes
At least there is the part region for carving seam and the part conductive pattern;
By controlling to carve seam dutycycle X the transmitance difference so that the quarter stitches region and the transparent conductive patterns region
No more than 1%, wherein, for any region on the contact panel surface, the quarter seam dutycycle X refers to described in the region
Carve the area of seam and the ratio of the region area.
2. the as claimed in claim 1 contact panel, it is characterised in that the multiple transparent conductive patterns include multiple electrodes and
The a plurality of electrode wires being connected with the multiple electrode, have between a plurality of electrode wires and multiple electrodes and carve seam, carve seam
Dutycycle X meets relationTa is carves the transmitance in seam region, and Tb is the transparent conductive patterns area
The transmitance in domain, for any region on the contact panel surface, the quarter seam dutycycle X refers to that described carve is stitched in the region
Area and the region area ratio.
3. the as claimed in claim 1 contact panel, it is characterised in that the multiple transparent conductive patterns include multiple electrodes and
The a plurality of electrode wires being connected with the multiple electrode, have between a plurality of electrode wires and multiple electrodes and carve seam;
If carving seam dutycycle X meets relationThen the contact panel is also transparent homogeneous including one
Layer, the transparent homogeneous layer include multiple transparent non-conductive patterns, be arranged on it is described carve seam in, make it is described carve seam region with
The transmitance difference in the transparent conductive patterns region is no more than 1%, Ta to carve the transmitance in seam region, and Tb transparent leads to be described
The transmitance in electrical pattern region, for any region on the contact panel surface, the quarter seam dutycycle X refers in the region
The ratio of the area and the region area for carving seam.
4. the contact panel as claimed in claim 3, it is characterised in that each described carve sets transparent non-conductive described in one in seam
Pattern, or seam every one or more quarters and put transparent non-conductive pattern described in one.
5. the as claimed in claim 3 contact panel, it is characterised in that the transmitance of the transparent equal layer of material with it is described
The transmitance difference of bright conductive is not more than 1%.
6. the contact panel as claimed in claim 5, it is characterised in that the material of the transparent homogeneous layer is organic film or low temperature
Silicon nitride or cryogenic oxidation silicon.
7. the as claimed in claim 1 contact panel, it is characterised in that the multiple transparent conductive patterns include multiple electrodes and
The a plurality of electrode wires being connected with the multiple electrode, have between a plurality of electrode wires and multiple electrodes and carve seam;
If carving seam dutycycle X meets relationThen the contact panel also includes a black matrix and one
Opaque light shield layer, the black matrix is located at the transparent substrates away from the transparency conducting layer side, the opaque shading
Layer, positioned at the transparent substrates close to the side of the transparency conducting layer, the opaque light shield layer includes multiple opaque figures
Case, is arranged on the black matrix in the view field carved and sewed on, described carve is stitched region and the electrically conducting transparent figure
The transmitance difference in case region is no more than 1%, Ta to carve the transmitance in seam region, and Tb is saturating for the transparent conductive patterns region
Rate is crossed, for any region on the contact panel surface, the quarter seam dutycycle X refers to the area for carving seam in the region
With the ratio of the region area.
8. the contact panel as claimed in claim 7, it is characterised in that each view field sets opaque figure described in one
Case, or one opaque pattern is set every one or more view fields.
9. the contact panel as claimed in claim 7, it is characterised in that the opaque pattern uses opaque non-conductive material
Material.
10. the as claimed in claim 9 contact panel, it is characterised in that the opaque non-conducting material be black matrix or
Ceramics or black oxide.
11. a kind of touch control display apparatus, including the contact panel described in any one of claim 1-10.
12. such as the touch control display apparatus of claim 11, in addition to display panel, it is oppositely arranged with the contact panel.
13. touch control display apparatus as claimed in claim 11, in addition to first substrate, the first substrate and the touch surface
Plate is oppositely arranged, and the transparent conductive patterns are located at the side of the transparent substrates dorsad first substrate.
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CN103324324A (en) * | 2012-03-21 | 2013-09-25 | 台达电子工业股份有限公司 | Touch screen with optical compensation structure |
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CN102664076A (en) * | 2012-05-14 | 2012-09-12 | 南昌欧菲光科技有限公司 | Novel double-sided conductive film manufacturing process |
CN203178990U (en) * | 2013-03-25 | 2013-09-04 | 南昌欧菲光科技有限公司 | Single-layer multiple-point capacitance type touch screen |
CN103258596A (en) * | 2013-04-27 | 2013-08-21 | 苏州诺菲纳米科技有限公司 | Shadow removing method of conductive thin film |
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