CN103941543A - Photosensitive resin composition based on polylactide polyol, preparation method thereof and photosensitive resin - Google Patents
Photosensitive resin composition based on polylactide polyol, preparation method thereof and photosensitive resin Download PDFInfo
- Publication number
- CN103941543A CN103941543A CN201410116890.2A CN201410116890A CN103941543A CN 103941543 A CN103941543 A CN 103941543A CN 201410116890 A CN201410116890 A CN 201410116890A CN 103941543 A CN103941543 A CN 103941543A
- Authority
- CN
- China
- Prior art keywords
- polylactide
- photosensitive resin
- alcohol
- resin composition
- polyvalent alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000747 poly(lactic acid) Polymers 0.000 title claims abstract description 62
- 239000011347 resin Substances 0.000 title claims abstract description 24
- 229920005989 resin Polymers 0.000 title claims abstract description 24
- 239000011342 resin composition Substances 0.000 title claims abstract description 24
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- 229920005862 polyol Polymers 0.000 title abstract 5
- 150000003077 polyols Chemical class 0.000 title abstract 5
- 238000004132 cross linking Methods 0.000 claims abstract description 14
- 239000000178 monomer Substances 0.000 claims abstract description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 57
- 239000002202 Polyethylene glycol Substances 0.000 claims description 18
- 125000004386 diacrylate group Chemical group 0.000 claims description 18
- 229920001223 polyethylene glycol Polymers 0.000 claims description 18
- -1 acrylic ester Chemical class 0.000 claims description 12
- 150000003254 radicals Chemical class 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- LJRSZGKUUZPHEB-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxypropoxy)propoxy]propyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COC(C)COC(=O)C=C LJRSZGKUUZPHEB-UHFFFAOYSA-N 0.000 claims description 3
- YFPJFKYCVYXDJK-UHFFFAOYSA-N Diphenylphosphine oxide Chemical compound C=1C=CC=CC=1[P+](=O)C1=CC=CC=C1 YFPJFKYCVYXDJK-UHFFFAOYSA-N 0.000 claims description 3
- 230000000994 depressogenic effect Effects 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000000016 photochemical curing Methods 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 231100000252 nontoxic Toxicity 0.000 abstract description 3
- 230000003000 nontoxic effect Effects 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000003973 paint Substances 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- 231100000419 toxicity Toxicity 0.000 abstract 1
- 230000001988 toxicity Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 231100000956 nontoxicity Toxicity 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 238000004040 coloring Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000036314 physical performance Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
The invention provides a photosensitive resin composition based on polylactide polyol. The photosensitive resin composition based on polylactide polyol comprises 40-95% by mass of polylactide polyol, 5-60% by mass of a self-crosslinking acrylate monomer and 1-40% by mass of a free-radical type photopolymerization initiator. The invention also provides a preparation method of the photosensitive resin composition based on polylactide polyol and photosensitive resin. The beneficial effects comprise that the invention provides the non-toxic stimulation-free photosensitive resin composition which is applicable to furniture environment without toxicity, harm and pollution to aquatic environment and is applicable to printing ink, paint and stereo photolithography, and the invention also provides the preparation method of the photosensitive resin composition and the photosensitive resin.
Description
Technical field
The present invention relates to a kind of photosensitive resin composition based on polylactide polyvalent alcohol and preparation method thereof and photosensitive resin.
Background technology
At present, photosensitive resin material is a kind of special resin with many-sided superiority, generally UV-Curable Prepolymer, reactive diluent and photosensitizer, consists of.Photosensitive resin material can produce biologically active fragment under the effect of ultraviolet light, and initiated polymerization, cross-linking reaction realized and solidifying in moment.At present photosensitive resin is used in rapid laser-shaping technique in a large number, and its ultimate principle is: photosensitive resin is contained in resin storage tank, has one by computer-controlled platform that can lifting in resin storage tank.Add man-hour from bottom, according to designed model, carry out laser scanning.After irradiated by ultraviolet ray, there is the cross-sectional layers (thickness is generally 0.11～0.13mm) that cross-linked polymeric produces part in light-cured resin.Then platform moves down a height, and resin is coated on last cured layer, solidifies new one deck, so repeatedly, finally forms a complete part.Because rapid laser-shaping technique can be manufactured 1/10 time and manufacturing cost with traditional moulds and produces the manufactured part that can be directly used in short run injection molding.Its curing rate is fast, production efficiency is high and the advantage such as suitable industrial flow-line production, and photosensitive resin is applied in laser fast shaping manufacturing industry more and more in a large number.
Summary of the invention
In view of the above-mentioned problems in the prior art, fundamental purpose of the present invention is to address the deficiencies of the prior art, provide a kind of nontoxicity, non-stimulated, can be used for furniture environment and photosensitive resin composition and preparation method thereof and photosensitive resin pollution-free to aquatic environment nonhazardous and that can be used for ink, coating and stereolithography.
The invention provides a kind of photosensitive resin composition based on polylactide polyvalent alcohol, described composition comprises polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer and free radical type Photoepolymerizationinitiater initiater, wherein: the mass percent of described polylactide polyvalent alcohol is 40～95%, the mass percent of described self-crosslinking acrylic ester monomer is 5～60%, and the mass percent of described free radical type Photoepolymerizationinitiater initiater is 1～40%.
Optionally, described polylactide polyvalent alcohol is one or more in polylactide monohydroxy alcohol, polylactide dibasic alcohol and polylactide trihydroxy alcohol.
Optionally, the polylactide monohydroxy alcohol that described polylactide monohydroxy alcohol is each molecular weight, the polylactide dibasic alcohol that described polylactide dibasic alcohol is each molecular weight, the polylactide trihydroxy alcohol that described polylactide trihydroxy alcohol is each molecular weight.
Optionally, described self-crosslinking acrylic ester monomer is one or more in polyethyleneglycol diacrylate, polyethyleneglycol diacrylate, polyethyleneglycol diacrylate or tri (propylene glycol) diacrylate.
Optionally, the molecular weight of described polyethyleneglycol diacrylate is 200, and the molecular weight of described polyethyleneglycol diacrylate is 400, and the molecular weight of described polyethyleneglycol diacrylate is 600.
Optionally; described free radical type Photoepolymerizationinitiater initiater is (2; 4; 6-trimethylbenzoyl) diphenyl phosphine oxide, phenyl two (2; 4,6-trimethylbenzene formyl) phosphine oxide, 2-dimethylamino-2-benzyl-1-[4-(4-morpholinyl) phenyl] one or more in-1-butanone and 2-hydroxy-2-methyl-1-phenylacetone.
It is a kind of according to the preparation method of the photosensitive resin composition based on polylactide polyvalent alcohol described above that the present invention also provides, the method comprises being 1～4: 40～95 in mass ratio: 5～60 free radical type Photoepolymerizationinitiater initiater, polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer are depressed evenly and mixed at normal atmosphere, temperature during mixing is 20～80 ℃, the homogeneous that carries out 1～8h stirs, and makes it to become uniform light yellow transparent liquid.
The present invention also provides a kind of photosensitive resin, and this photosensitive resin is formed by the photosensitive resin composition photocuring based on polylactide polyvalent alcohol described above.
The present invention has the following advantages and beneficial effect: a kind of photosensitive resin based on polylactide polyvalent alcohol provided by the invention, there is non-toxic and non-stimulated feature, and can be used for domestic environment, pollution-free to aquatic environment nonhazardous; Meanwhile, can be used for ink, coating and stereolithography, its feature is nontoxicity, good physical performance, and Environmental compatibility is good, is easy to colouring, and the subsequent techniques such as spraying etc., can be used for indoor environment.
Embodiment
Below with reference to specific embodiment, the present invention is further illustrated.
A kind of photosensitive resin composition based on polylactide polyvalent alcohol that the embodiment of the present invention provides, the described photosensitive resin composition based on polylactide polyvalent alcohol comprises polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer and free radical type Photoepolymerizationinitiater initiater, wherein: the mass percent of described polylactide polyvalent alcohol is 40～95%, the mass percent of described self-crosslinking acrylic ester monomer is 5～60%, and the mass percent of described free radical type Photoepolymerizationinitiater initiater is 1～40%.
As the preferred implementation of above-described embodiment, described polylactide polyvalent alcohol is one or more in polylactide monohydroxy alcohol, polylactide dibasic alcohol and polylactide trihydroxy alcohol.
Preferred implementation as above-described embodiment, the polylactide monohydroxy alcohol that described polylactide monohydroxy alcohol is each molecular weight, the polylactide dibasic alcohol that described polylactide dibasic alcohol is each molecular weight, the polylactide trihydroxy alcohol that described polylactide trihydroxy alcohol is each molecular weight.
As the preferred implementation of above-described embodiment, described self-crosslinking acrylic ester monomer is one or more in polyethyleneglycol diacrylate, polyethyleneglycol diacrylate, polyethyleneglycol diacrylate or tri (propylene glycol) diacrylate.
As the preferred implementation of above-described embodiment, the molecular weight of described polyethyleneglycol diacrylate is 200, and the molecular weight of described polyethyleneglycol diacrylate is 400, and the molecular weight of described polyethyleneglycol diacrylate is 600.
Preferred implementation as above-described embodiment; described free radical type Photoepolymerizationinitiater initiater is (2; 4; 6-trimethylbenzoyl) diphenyl phosphine oxide, phenyl two (2; 4,6-trimethylbenzene formyl) phosphine oxide, 2-dimethylamino-2-benzyl-1-[4-(4-morpholinyl) phenyl] one or more in-1-butanone and 2-hydroxy-2-methyl-1-phenylacetone.
It is a kind of according to the preparation method of the photosensitive resin composition based on polylactide polyvalent alcohol described above that the embodiment of the present invention also provides, the method comprises being 1～4: 40～95 in mass ratio: 5～60 free radical type Photoepolymerizationinitiater initiater, polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer are depressed evenly and mixed at normal atmosphere, temperature during mixing is 20～80 ℃, the homogeneous that carries out 1～8h stirs, and makes it to become uniform light yellow transparent liquid.
The embodiment of the present invention also provides a kind of photosensitive resin, this photosensitive resin entered photocuring by the photosensitive resin composition based on polylactide polyvalent alcohol described above and formed, this photosensitive resin has non-toxic and non-stimulated feature, can be used for domestic environment, pollution-free to aquatic environment nonhazardous; Meanwhile, can be used for ink, coating and stereolithography, its feature is nontoxicity, good physical performance, and Environmental compatibility is good, is easy to colouring, and the subsequent techniques such as spraying etc., can be used for indoor environment.
Finally it should be noted that: above-described each embodiment, only for technical scheme of the present invention is described, is not intended to limit; Although the present invention is had been described in detail with reference to previous embodiment, those of ordinary skill in the art is to be understood that: its technical scheme that still can record previous embodiment is modified, or to wherein partly or entirely technical characterictic be equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution depart from the scope of various embodiments of the present invention technical scheme.
Claims (8)
1. the photosensitive resin composition based on polylactide polyvalent alcohol, it is characterized in that: described composition comprises polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer and free radical type Photoepolymerizationinitiater initiater, wherein: the mass percent of described polylactide polyvalent alcohol is 40～95%, the mass percent of described self-crosslinking acrylic ester monomer is 5～60%, and the mass percent of described free radical type Photoepolymerizationinitiater initiater is 1～40%.
2. the photosensitive resin composition based on polylactide polyvalent alcohol according to claim 1, is characterized in that, described polylactide polyvalent alcohol is one or more in polylactide monohydroxy alcohol, polylactide dibasic alcohol and polylactide trihydroxy alcohol.
3. the photosensitive resin composition based on polylactide polyvalent alcohol according to claim 2, it is characterized in that, the polylactide monohydroxy alcohol that described polylactide monohydroxy alcohol is each molecular weight, the polylactide dibasic alcohol that described polylactide dibasic alcohol is each molecular weight, the polylactide trihydroxy alcohol that described polylactide trihydroxy alcohol is each molecular weight.
4. the photosensitive resin composition based on polylactide polyvalent alcohol according to claim 1, it is characterized in that, described self-crosslinking acrylic ester monomer is one or more in polyethyleneglycol diacrylate, polyethyleneglycol diacrylate, polyethyleneglycol diacrylate or tri (propylene glycol) diacrylate.
5. the photosensitive resin composition based on polylactide polyvalent alcohol according to claim 4, it is characterized in that, the molecular weight of described polyethyleneglycol diacrylate is 200, and the molecular weight of described polyethyleneglycol diacrylate is 400, and the molecular weight of described polyethyleneglycol diacrylate is 600.
6. the photosensitive resin composition based on polylactide polyvalent alcohol according to claim 1; it is characterized in that; described free radical type Photoepolymerizationinitiater initiater is (2; 4; 6-trimethylbenzoyl) diphenyl phosphine oxide, phenyl two (2; 4,6-trimethylbenzene formyl) phosphine oxide, 2-dimethylamino-2-benzyl-1-[4-(4-morpholinyl) phenyl] one or more in-1-butanone and 2-hydroxy-2-methyl-1-phenylacetone.
7. one kind according to the preparation method of the photosensitive resin composition based on polylactide polyvalent alcohol described in claim 1-6 any one, it is characterized in that, the method comprises being 1～4: 40～95 in mass ratio: 5～60 free radical type Photoepolymerizationinitiater initiater, polylactide polyvalent alcohol, self-crosslinking acrylic ester monomer are depressed evenly and mixed at normal atmosphere, temperature during mixing is 20～80 ℃, the homogeneous that carries out 1～8h stirs, and makes it to become uniform light yellow transparent liquid.
8. a photosensitive resin, is characterized in that, this photosensitive resin is formed by the photosensitive resin composition photocuring based on polylactide polyvalent alcohol described in claim 1-6 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410116890.2A CN103941543B (en) | 2014-03-27 | 2014-03-27 | A kind of photosensitive resin composition based on polylactide polyol and preparation method thereof and photosensitive resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410116890.2A CN103941543B (en) | 2014-03-27 | 2014-03-27 | A kind of photosensitive resin composition based on polylactide polyol and preparation method thereof and photosensitive resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103941543A true CN103941543A (en) | 2014-07-23 |
| CN103941543B CN103941543B (en) | 2017-09-19 |
Family
ID=51189270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410116890.2A Expired - Fee Related CN103941543B (en) | 2014-03-27 | 2014-03-27 | A kind of photosensitive resin composition based on polylactide polyol and preparation method thereof and photosensitive resin |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103941543B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105399935A (en) * | 2015-11-16 | 2016-03-16 | 孝感市易生新材料有限公司 | Degradable light-cured resin prepolymer and preparation method, light-cured resin and preparation methods |
| EP3033225A4 (en) * | 2013-08-12 | 2017-07-05 | Sun Chemical Corporation | Energy curable lithographic inks containing lactic acid resins |
| CN111909320A (en) * | 2020-07-30 | 2020-11-10 | 武汉工程大学 | Photocuring 3D printing modified polylactic acid composite photosensitive resin and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4952481A (en) * | 1985-02-12 | 1990-08-28 | Napp Systems (Usa), Inc. | Photosensitive resin composition |
| CN101833241A (en) * | 2009-03-09 | 2010-09-15 | 村上精密制版（昆山）有限公司 | Photosensitive resin composition |
| CN102732094A (en) * | 2012-05-21 | 2012-10-17 | 史海生 | LED-UV surface light source light-curing silk-screen printing ink composition and preparation method thereof |
| CN103246164A (en) * | 2013-06-04 | 2013-08-14 | 苏州太速雷电子科技有限公司 | Photosensitive resin for stereo lithography forming and preparation method thereof |
| CN103616799A (en) * | 2013-11-07 | 2014-03-05 | 李厚民 | Organically soluble photosensitive resin after being cured and preparation method and dissolving method thereof |
-
2014
- 2014-03-27 CN CN201410116890.2A patent/CN103941543B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4952481A (en) * | 1985-02-12 | 1990-08-28 | Napp Systems (Usa), Inc. | Photosensitive resin composition |
| CN101833241A (en) * | 2009-03-09 | 2010-09-15 | 村上精密制版（昆山）有限公司 | Photosensitive resin composition |
| CN102732094A (en) * | 2012-05-21 | 2012-10-17 | 史海生 | LED-UV surface light source light-curing silk-screen printing ink composition and preparation method thereof |
| CN103246164A (en) * | 2013-06-04 | 2013-08-14 | 苏州太速雷电子科技有限公司 | Photosensitive resin for stereo lithography forming and preparation method thereof |
| CN103616799A (en) * | 2013-11-07 | 2014-03-05 | 李厚民 | Organically soluble photosensitive resin after being cured and preparation method and dissolving method thereof |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3033225A4 (en) * | 2013-08-12 | 2017-07-05 | Sun Chemical Corporation | Energy curable lithographic inks containing lactic acid resins |
| US10689533B2 (en) | 2013-08-12 | 2020-06-23 | Sun Chemical Corporation | Energy curable lithographic inks containing lactic acid resins |
| CN105399935A (en) * | 2015-11-16 | 2016-03-16 | 孝感市易生新材料有限公司 | Degradable light-cured resin prepolymer and preparation method, light-cured resin and preparation methods |
| CN105399935B (en) * | 2015-11-16 | 2017-07-11 | 孝感市易生新材料有限公司 | Degradable light-cured resin performed polymer and preparation method, light-cured resin and preparation method |
| CN111909320A (en) * | 2020-07-30 | 2020-11-10 | 武汉工程大学 | Photocuring 3D printing modified polylactic acid composite photosensitive resin and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103941543B (en) | 2017-09-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110341097B (en) | Thermoplastic polymer based on DLP photocuring 3D printing and application | |
| CN104312192B (en) | A kind of ultraviolet light solidification structure repair material prepreg and preparation method thereof | |
| CN104031588B (en) | Glue bond material and preparation method thereof | |
| CN109608589B (en) | Dual-curing resin material for 3D printing and preparation method thereof | |
| CN108948280A (en) | A kind of double cured 3D printing resin combinations of optical and thermal | |
| CN101481492B (en) | UV curing photosensitive resin for rapid moulding injection mold | |
| CN104520337A (en) | Liquid optical adhesive compositions | |
| CN106519161A (en) | Light-cured resin prepolymer, light-cured resin and preparation methods of light-cured resin prepolymer and light-cured resin | |
| JP6864807B2 (en) | Patterning material, patterning method, and patterning equipment | |
| JP2010155889A (en) | Photocurable liquid resin composition and method for producing support by inkjet stereolithography | |
| CN104151526A (en) | Novel photosensitive resin material applied to DLP3D printer | |
| CN109824828B (en) | Auxiliary agent composition and application thereof, 3D printing LCD photosensitive resin and preparation method thereof | |
| TWI605928B (en) | Imprinting photocurable resin composition, method for producing structure using the same and structure | |
| JP4409683B2 (en) | Optical molding resin composition, method for producing the same, and optical molding | |
| CN105131581A (en) | Light-cured liquid resin composite for three-dimensional forming and formative object obtained through light-curing of light-cured liquid resin composite | |
| CN103941543A (en) | Photosensitive resin composition based on polylactide polyol, preparation method thereof and photosensitive resin | |
| CN105073789A (en) | Photo-curable composition and molded article | |
| CN110982246A (en) | Material for 3D printing and preparation method thereof | |
| CN105278239A (en) | Stereo-lithography rapid-prototyping polysiloxane photosensitive resin composition and preparation method and application thereof | |
| CN105102493B (en) | Multifunctional (methyl) acrylate copolymer, hardening resin composition and its solidfied material | |
| JP3657057B2 (en) | Photocurable resin composition for molding resin mold production and method for producing molding resin mold | |
| CN106608952A (en) | Flexible light-cured resin material for 3D printing and preparation method and application thereof | |
| CN114752018A (en) | Preparation method of UV resin with rapid curing and low shrinkage | |
| US11787951B2 (en) | Photocurable composition for three-dimensional molding, three-dimensional molded product, and method for producing three-dimensional molded product | |
| CN103937384A (en) | Ultraviolet curing plasticizing coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20170829 Address after: 210038, building 5, block A1, Longgang Science Park, Xingang Development Zone, Qixia District, Nanjing, Jiangsu Applicant after: NANJING BAICHUAN XINGYUAN LASER TECHNOLOGY CO.,LTD. Address before: 110000, room 100-1, 17-11 Miyoshi street, Heping District, Liaoning, Shenyang Applicant before: SHENYANG QIAOSHI QIMEI TECHNOLOGY Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170919 |