CN103924218B - The device in sustainable supply MO source - Google Patents
The device in sustainable supply MO source Download PDFInfo
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- CN103924218B CN103924218B CN201410168822.0A CN201410168822A CN103924218B CN 103924218 B CN103924218 B CN 103924218B CN 201410168822 A CN201410168822 A CN 201410168822A CN 103924218 B CN103924218 B CN 103924218B
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- Prior art keywords
- source
- gas reservoir
- escape pipe
- pipe
- pressure
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- 239000007789 gas Substances 0.000 claims abstract description 36
- 239000012159 carrier gas Substances 0.000 claims abstract description 16
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 239000000523 sample Substances 0.000 claims abstract description 6
- 238000003860 storage Methods 0.000 abstract description 6
- 239000008246 gaseous mixture Substances 0.000 abstract description 3
- 238000000354 decomposition reaction Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses the device in a kind of sustainable supply MO source, described include MO source gas reservoir, escape pipe, high-purity carrier gas pipe, connect in the gas reservoir of described MO source and have escape pipe, described escape pipe is connected in MOCVD device after being connected with the end of high-purity carrier gas pipe, described MO source gas reservoir is arranged in heating bag, and described MO source gas reservoir is provided with pressure and temp probe;MO source and high-purity carrier gas are mixed into the matched proportion density of needs, then pressurized storage is in high-pressure bottle, high-pressure bottle is placed on higher temperature, so MO all gasifies in source and will not decomposition temperature, directly gaseous mixture is transported to MOCVD device finally by pipeline, controls usage amount by mass flow controller, when pressure and temp probe detects that pressure drops to alarm point, standby MO source gas storage tanks can be automatically switched to be operated, solve MO source and persistently supply troublesome problem.
Description
Technical field
The present invention relates to a kind of charging device, the device in a kind of sustainable supply MO source.
Technical field
MO source i.e. high-purity metal organic compound, or it is compound semiconductor fine structure material, it it is the backing material of the technology growth Semiconductor Microstructure Materials such as advanced metal organic chemical vapor deposition (being called for short MOCVD), the performances such as the electricity of its excellence, optics and magnetics, can push higher frequency, faster speed, lower noise and bigger power to by semiconductor and IC.The state of development of Semiconductor Microstructure Materials technology is to weigh the important symbol of a National Electrical Information Technology Development level.It is largely used to multiple fields such as LED, solaode, aeronautical and space technology in China MO source, has been a new high-tech material production technology.It is the most special that MO source uses in MOCVD device, material needs to keep constant temperature (± 0.1 DEG C) in use, constant voltage (± 1torr), stabilizing gas flux (± 1sccm), MO source is stored in steel cylinder (commonly referred to as bubbler), noble gas such as hydrogen or nitrogen, enter in bubbler by going deep into the pipeline of interior of steel bottle, produce bubbling effect through MO source, MO evaporates in source in sparging process in a large number, forms the saturated vapor in MO source with noble gas blending transportation out.
The technology in existing supply MO source has the disadvantage in that the combustibility in 1.MO source, runs into air meeting spontaneous combustion, is intended to fully replace tubing in bubbler dismounting, pipe joint is carried out helium mass spectrum simple and crude, operating process is loaded down with trivial details, and the time is long, it is easy to cause fire because of misoperation;After the newest bubbler, bubbler and constant temperature water bath need to carry out heat exchange to reach steady temperature, and the carrying out time of required heat exchange is longer;3. in bubbler, MO source is not measured and monitoring device, it is impossible to accurately judge residual volume.Therefore, solve that trouble is persistently supplied in MO source, required time is longer, cannot accurately judge residual volume, the problem of easy initiation fire is particularly important in secondary supply.
Summary of the invention
The invention provides the device in a kind of sustainable supply MO source, it is provided by heating bag and MO source gas reservoir to replace bubbler and constant temperature bath tank, MO is come from high-purity carrier gas and is mixed into the matched proportion density of needs, directly gaseous mixture being transported to MOCVD device by pipeline, to solve MO source supply trouble, required time is longer, cannot accurately judge residual volume, the problem of easy initiation fire in secondary supply.
In order to solve the problems referred to above, the present invention provides the device in a kind of sustainable supply MO source, described include MO source gas reservoir, escape pipe, high-purity carrier gas pipe, connect in the gas reservoir of described MO source and have escape pipe, described escape pipe is connected in MOCVD device after being connected with the end of high-purity carrier gas pipe, described MO source gas reservoir is arranged in heating bag, and described MO source gas reservoir is provided with pressure and temp probe.
Further improvement is that: the right side of described MO source gas reservoir is provided with standby MO source gas reservoir, prevent MO source in the gas reservoir of MO source from cannot work not.
Further improvement is that: on the end of described escape pipe and high-purity carrier gas pipe, be provided with mass flow controller, the usage amount in control mixed gas delivery to MOCVD device.
Further improvement is that: on described escape pipe, be provided with air relief valve.
The invention has the beneficial effects as follows: 1. MO source concentration is according to customer requirement direct matching, during use, there is not concentration change problem.
2., for some solids MO source, it is equally applicable this method.
3. MOCVD device saves pressure controller, constant temperature water bath and bubbler, and equipment cost declines, and device interior space increases.
4., by directly changing storage gas cylinder, it is fully able to reach stable supply purpose.
5. can effectively monitor MO source state by the pressure of storage tank is monitored.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the present invention.
Wherein: 1-MO source gas reservoir, 2-escape pipe, 3-high-purity carrier gas pipe, 4-heats bag, and 5-pressure and temp is popped one's head in, 6-mass flow controller, 7-air relief valve, 8-high-pressure bottle.
Detailed description of the invention
In order to deepen the understanding of the present invention, below in conjunction with embodiment, the invention will be further described, and this embodiment is only used for explaining the present invention, is not intended that limiting the scope of the present invention.
As shown in Figure 1, present embodiments provide the device in a kind of sustainable supply MO source, described include MO source gas reservoir 1, escape pipe 2, high-purity carrier gas pipe 3, connect in described MO source gas reservoir 1 and have escape pipe 2, described escape pipe 2 is connected in MOCVD device after being connected with the end of high-purity carrier gas pipe 3, described MO source gas reservoir 1 is arranged in heating bag 4, and described MO source gas reservoir 1 is provided with pressure and temp probe 5.The right side of described MO source gas reservoir 1 is provided with standby MO source gas reservoir, prevents MO source in the gas reservoir of MO source from cannot work not.Mass flow controller 6, the usage amount in control mixed gas delivery to MOCVD device it is provided with on the end of described escape pipe 2 and high-purity carrier gas pipe 3.It is provided with air relief valve 7 on described escape pipe 2, is used for the pressure controlling in escape pipe 2.
MO source and high-purity carrier gas are mixed into the matched proportion density of needs, then pressurized storage is in high-pressure bottle 8, high-pressure bottle 8 is placed at higher temperature, so MO all gasifies in source and will not decomposition temperature, directly gaseous mixture is transported to MOCVD device finally by pipeline, controls usage amount by mass flow controller 6.Heating bag 4 is used for controlling temperature and heating, escape pipe 2 and high-purity carrier gas pipe 3 and has the effect of insulation.When pressure and temp probe 5 detects that pressure drops to alarm point, standby MO source gas storage tanks can be automatically switched to and be operated.Described MO source gas reservoir 1 can carry out gas transmission to three groups of MOCVD device simultaneously.
Claims (3)
1. the device in a sustainable supply MO source, it is characterized in that: include MO source gas reservoir (1), escape pipe (2), high-purity carrier gas pipe (3), the upper connection of described MO source gas reservoir (1) has escape pipe (2), described escape pipe (2) is connected in MOCVD device after being connected with the end of high-purity carrier gas pipe (3), it is inner that described MO source gas reservoir (1) is arranged on heating bag (4), pressure and temp probe (5) it is provided with on described MO source gas reservoir (1), the right side of described MO source gas reservoir (1) is provided with standby MO source gas reservoir, prevent MO source in the gas reservoir of MO source from cannot work not.
2. the device in sustainable supply MO source as claimed in claim 1, it is characterised in that: it is provided with mass flow controller (6), the usage amount in control mixed gas delivery to MOCVD device on the end of described escape pipe (2) and high-purity carrier gas pipe (3).
3. the device in sustainable supply MO source as claimed in claim 1, it is characterised in that: it is provided with air relief valve (7) on described escape pipe (2).
Priority Applications (1)
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CN201410168822.0A CN103924218B (en) | 2014-04-25 | 2014-04-25 | The device in sustainable supply MO source |
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CN201410168822.0A CN103924218B (en) | 2014-04-25 | 2014-04-25 | The device in sustainable supply MO source |
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CN103924218A CN103924218A (en) | 2014-07-16 |
CN103924218B true CN103924218B (en) | 2016-10-19 |
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CN201410168822.0A Active CN103924218B (en) | 2014-04-25 | 2014-04-25 | The device in sustainable supply MO source |
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Families Citing this family (2)
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CN109852948B (en) * | 2019-01-31 | 2024-04-12 | 苏州普耀光电材料有限公司 | MO source supply device |
CN114150294A (en) * | 2020-09-08 | 2022-03-08 | 吕宝源 | Centralized supply system of solid metal organic source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101680561A (en) * | 2007-05-31 | 2010-03-24 | 东京毅力科创株式会社 | Fluid control apparatus |
WO2013189716A1 (en) * | 2012-06-19 | 2013-12-27 | Osram Opto Semiconductors Gmbh | Ald coating system |
CN203846102U (en) * | 2014-04-25 | 2014-09-24 | 安徽亚格盛电子新材料有限公司 | Device for continuously supplying MO (Metal Organic) source |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100591762B1 (en) * | 2004-01-19 | 2006-06-22 | 삼성전자주식회사 | Deposition apparatus and deposition method |
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- 2014-04-25 CN CN201410168822.0A patent/CN103924218B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101680561A (en) * | 2007-05-31 | 2010-03-24 | 东京毅力科创株式会社 | Fluid control apparatus |
WO2013189716A1 (en) * | 2012-06-19 | 2013-12-27 | Osram Opto Semiconductors Gmbh | Ald coating system |
CN203846102U (en) * | 2014-04-25 | 2014-09-24 | 安徽亚格盛电子新材料有限公司 | Device for continuously supplying MO (Metal Organic) source |
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Address after: No. 88 Baoshun Road, Economic and Technological Development Zone, Wuhu City, Anhui Province, 241000 Patentee after: Anhui Yagesheng Electronic New Materials Co.,Ltd. Address before: 241009 Third Floor, Management Committee of Wuhu Economic and Technological Development Zone, Anhui Province Patentee before: ANHUI ARGOSUN NEW ELECRONIC MATERIALS Co.,Ltd. |