CN103914201A - Monolithic glass capacitive touch screen structure and processing method thereof - Google Patents

Monolithic glass capacitive touch screen structure and processing method thereof Download PDF

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Publication number
CN103914201A
CN103914201A CN201410159390.7A CN201410159390A CN103914201A CN 103914201 A CN103914201 A CN 103914201A CN 201410159390 A CN201410159390 A CN 201410159390A CN 103914201 A CN103914201 A CN 103914201A
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CN
China
Prior art keywords
ito
touch screen
cabling
transparent layer
capacitive touch
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Pending
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CN201410159390.7A
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Chinese (zh)
Inventor
马金成
詹达勇
光宣标
童建超
唐鑫
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SHENZHEN SANXIN JMT GLASS CO Ltd
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SHENZHEN SANXIN JMT GLASS CO Ltd
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Application filed by SHENZHEN SANXIN JMT GLASS CO Ltd filed Critical SHENZHEN SANXIN JMT GLASS CO Ltd
Priority to CN201410159390.7A priority Critical patent/CN103914201A/en
Publication of CN103914201A publication Critical patent/CN103914201A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a monolithic glass capacitive touch screen structure which comprises a glass substrate and a chip. The glass substrate is provided with a first ITO (indium-tin oxide) film, ink covers the edge of the first ITO film, the first ITO film is covered with an insulation transparent layer, the insulation transparent layer is covered with a second ITO film, and ITO wires are etched on the first ITO film and the second ITO film and are electrically connected with the chip via flexible circuit boards. The monolithic glass capacitive touch screen structure can meet the requirements of large size, low cost, high transmittance, thinness and light weight and the like.

Description

A kind of monolithic glass capacitive touch screen structure and job operation thereof
Technical field
The present invention relates to capacitance plate, relate in particular to a kind of monolithic glass capacitive touch screen structure and job operation thereof.
Background technology
Along with the progress of multimedia information technology and touch technology, capacitance touch screen is widely used, and existing capacitance touch screen adopts G+G structure, G+F structure, G+P structure and OGS structure mostly, wherein:
G+G structure is the double-layer glass structure of tempered glass+sensor glass, and this structure has been owing to having adopted double glazing, causes the weight of product heavier, thickness is thicker, and double-layer glass structure need adopt attaching process simultaneously, makes processing cost higher;
G+F structure is the structure of tempered glass+FILM film, because the transmittance of FILM material is lower, thereby affects the transmittance of touch-screen, causes imaging effect poor, and adding man-hour requirement utilization attaching process, has higher processing cost;
G+P structure is the structure of sensor glass+PET sheet, because the transmittance of PET material is lower, causes the transmittance of G+P structure thereupon on the low side, affects the overall display effect of touch-screen;
Although OGS structure is all better than G+G structure, G+F structure and G+P structure at aspects such as thickness, weight, transmittance, costs, but because OGS is individual layer ITO structure, individual layer ITO structures shape the length of ITO cabling, in the time that ITO cabling is longer, line resistance is higher, be difficult to meet the low line resistance requirement of touch-control chip to ITO cabling, therefore this structure is only applicable to 10 cun of following touch-screens, cannot be applied on the large scale touch-screen such as 10-32 cun.
In conjunction with above some can find out, existing capacitance touch screen is difficult to meet large scale, low cost, high transmission rate, thin thickness, the requirement such as lightweight.
Summary of the invention
The technical problem to be solved in the present invention is, for the deficiencies in the prior art, provides a kind of and can meet large scale, low cost, high transmission rate, thin thickness, monolithic glass capacitive touch screen structure and the job operation thereof requiring such as lightweight.
For solving the problems of the technologies described above, the present invention adopts following technical scheme.
A kind of monolithic glass capacitive touch screen structure, it includes glass substrate and chip, described glass substrate is provided with an ITO rete, the edges cover of a described ITO rete has ink, a described ITO rete is provided with insulation transparent layer, described insulation transparent layer is provided with the 2nd ITO rete, and a described ITO rete and the 2nd ITO rete respectively etching have ITO cabling, and described ITO cabling is electrically connected on chip by flexible circuit board.
Preferably, described insulation transparent layer is resin transparent layer.
Preferably, the thickness of described insulation transparent layer is 5um~80um.
Preferably, the ITO cabling of a described ITO rete and the 2nd ITO rete is respectively RX cabling and TX cabling.
Preferably, described RX cabling is mutually vertical with TX cabling.
A kind of monolithic glass capacitive touch screen structure job operation, the method comprises the steps: step S1, and monolithic glass substrate is provided; Step S2, sputter the one ITO rete on glass substrate; Step S3, cuts into pre-set dimension by glass substrate; Step S4, goes out ITO cabling by an ITO etched film; Step S5, by ink silk screen printing, in the edge of an ITO rete, and ink is by the edges cover of an ITO rete; Step S6, silk-screen, roller coat or spraying insulation transparent layer on an ITO rete; Step S7, sputter the 2nd ITO rete on insulation transparent layer; Step S8, goes out ITO cabling by the 2nd ITO etched film; Step S9, is electrically connected on chip by the ITO cabling on an ITO rete and the 2nd ITO rete by flexible circuit board.
Preferably, in described step S6, make insulation transparent layer toast 10 minutes~60 minutes under 100 ℃~250 ℃ temperature conditions.
Preferably, described insulation transparent layer is resin transparent layer.
Preferably, the thickness of described insulation transparent layer is 5um~80um.
The present invention's beneficial effect is compared to existing technologies:
1, this capacitance touch screen has the design feature of monolithic glass substrate, has reduced PET film or glass, makes the transmittance of this capacitance touch screen be better than G+G structure, G+F structure, P+G structure etc.;
2, monolithic glass board structure greatly reduces product thickness and weight;
3, adding the attaching process that has reduced one deck glass, Film material or PET film man-hour, effectively reduce processing cost;
4, the design feature of double-deck ITO rete, make TX cabling and RX cabling lay respectively at two ITO retes, thereby effectively reduce the line resistance of ITO cabling, can meet the requirement of the low line resistance of chip to ITO cabling, make the size of this capacitance touch screen can accomplish 32 cun and even larger.
Accompanying drawing explanation
Fig. 1 is the side sectional view of monolithic glass capacitive touch screen structure.
Embodiment
Below in conjunction with drawings and Examples, the present invention is described in more detail.
The invention discloses a kind of monolithic glass capacitive touch screen structure, as shown in Figure 1, it includes glass substrate 1 and chip 2, described glass substrate 1 is provided with an ITO rete 3, the edges cover of a described ITO rete 3 has ink 4, add man-hour, need be by ink 4 silk-screens in the edge of an ITO rete 3, make ink 4 form frame, thereby effectively protect an ITO rete 3, a described ITO rete 3 is provided with insulation transparent layer 5, described insulation transparent layer 5 is provided with the 2nd ITO rete 6, a described ITO rete 3 and the 2nd ITO rete 6 respectively etching have ITO cabling, described ITO cabling is electrically connected on chip 2 by flexible circuit board 7.
As one preferred embodiment, this insulation transparent layer 5 for thickness be the resin transparent layer of 5um~80um, this resin transparent layer not only has higher transmittance, is also located between an ITO rete 3 and the 2nd ITO rete 6 as insulation course.
Further, the ITO cabling of a described ITO rete 3 and the 2nd ITO rete 6 is respectively RX cabling and TX cabling, and RX cabling is mutually vertical with TX cabling.
In order better above-mentioned monolithic glass capacitive touch screen structure to be put into production, the invention also discloses a kind of monolithic glass capacitive touch screen structure job operation, the method comprises the steps:
Step S1, provides monolithic glass substrate 1;
Step S2, sputter the one ITO rete 3 on glass substrate 1;
Step S3, cuts into pre-set dimension by glass substrate 1;
Step S4, etches ITO cabling by an ITO rete 3;
Step S5, by ink 4 silk-screens, in the edge of an ITO rete 3, and ink 4 is by the edges cover of an ITO rete 3;
Step S6, on an ITO rete 3, silk-screen, roller coat or spraying insulation transparent layer 5 afterwards, preferably toast insulation transparent layer 5 10 minutes~60 minutes under 100 ℃~250 ℃ temperature conditions;
Step S7, sputter the 2nd ITO rete 6 on insulation transparent layer 5;
Step S8, etches ITO cabling by the 2nd ITO rete 6;
Step S9, is electrically connected on chip 2 by the ITO cabling on an ITO rete 3 and the 2nd ITO rete 6 by flexible circuit board 7.
In the monolithic glass capacitive touch screen structure of producing by above-mentioned job operation, owing to having adopted the structure of monolithic glass substrate, so compare existing capacitance touch screen, PET film or glass are reduced, make the transmittance of this capacitance touch screen be better than G+G structure, G+F structure, P+G structure etc., and greatly reduce product thickness and weight; Simultaneously, the present invention adopts the structure of monolithic glass substrate in conjunction with double-deck ITO rete, between two-layer ITO rete, isolates with insulation transparent layer 5, compares existing product, adding the attaching process that has reduced one deck glass, Film material or PET film man-hour, effectively reduce processing cost; In addition, the design feature of double-deck ITO rete, make TX cabling and RX cabling lay respectively at two ITO retes, thereby effectively reduce the line resistance of ITO cabling, can meet the requirement of the low line resistance of chip 2 to ITO cabling, make the size of this capacitance touch screen can accomplish 32 cun and even larger, and meet the requirement of Win8 authentication.
The present invention has broken the job operation of traditional handicraft, make capacitance touch screen products possess thin thickness, lightweight, transmittance is high, display effect is good, large scale, can meet the features such as the requirement of Win8 system, and on this basis, improve for existing dielectric resin material, by to processing technology, thicknesses of layers, baking conditions etc. are adjusted, make the touch-screen after processing can there is better adhesion, hardness, transmittance, insulating property, acid and alkali-resistance, the advantages such as resistance to environmental testing, monolithic glass capacitance touch screen products and process technology are had and use widely scope and profound significance.
The above is preferred embodiment of the present invention, is not limited to the present invention, all modifications of making in technical scope of the present invention, is equal to and replaces or improvement etc., all should be included in the scope that the present invention protects.

Claims (9)

1. a monolithic glass capacitive touch screen structure, it is characterized in that, include glass substrate and chip, described glass substrate is provided with an ITO rete, the edges cover of a described ITO rete has ink, and a described ITO rete is provided with insulation transparent layer, and described insulation transparent layer is provided with the 2nd ITO rete, a described ITO rete and the 2nd ITO rete respectively etching have ITO cabling, and described ITO cabling is electrically connected on chip by flexible circuit board.
2. monolithic glass capacitive touch screen structure as claimed in claim 1, is characterized in that, described insulation transparent layer is resin transparent layer.
3. monolithic glass capacitive touch screen structure as claimed in claim 2, is characterized in that, the thickness of described insulation transparent layer is 5um~80um.
4. monolithic glass capacitive touch screen structure as claimed in claim 1, is characterized in that, the ITO cabling of a described ITO rete and the 2nd ITO rete is respectively RX cabling and TX cabling.
5. monolithic glass capacitive touch screen structure as claimed in claim 4, is characterized in that, described RX cabling is mutually vertical with TX cabling.
6. a monolithic glass capacitive touch screen structure job operation, is characterized in that, the method comprises the steps:
Step S1, provides monolithic glass substrate;
Step S2, sputter the one ITO rete on glass substrate;
Step S3, cuts into pre-set dimension by glass substrate;
Step S4, goes out ITO cabling by an ITO etched film;
Step S5, by ink silk screen printing, in the edge of an ITO rete, and ink is by the edges cover of an ITO rete;
Step S6, silk-screen, roller coat or spraying insulation transparent layer on an ITO rete;
Step S7, sputter the 2nd ITO rete on insulation transparent layer;
Step S8, goes out ITO cabling by the 2nd ITO etched film;
Step S9, is electrically connected on chip by the ITO cabling on an ITO rete and the 2nd ITO rete by flexible circuit board.
7. monolithic glass capacitive touch screen structure job operation as claimed in claim 6, is characterized in that, in described step S6, makes insulation transparent layer toast 10 minutes~60 minutes under 100 ℃~250 ℃ temperature conditions.
8. monolithic glass capacitive touch screen structure job operation as claimed in claim 6, is characterized in that, described insulation transparent layer is resin transparent layer.
9. monolithic glass capacitive touch screen structure job operation as claimed in claim 8, is characterized in that, the thickness of described insulation transparent layer is 5um~80um.
CN201410159390.7A 2014-04-21 2014-04-21 Monolithic glass capacitive touch screen structure and processing method thereof Pending CN103914201A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410159390.7A CN103914201A (en) 2014-04-21 2014-04-21 Monolithic glass capacitive touch screen structure and processing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410159390.7A CN103914201A (en) 2014-04-21 2014-04-21 Monolithic glass capacitive touch screen structure and processing method thereof

Publications (1)

Publication Number Publication Date
CN103914201A true CN103914201A (en) 2014-07-09

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104656972A (en) * 2014-11-18 2015-05-27 业成光电(深圳)有限公司 Touch module and touch display device with same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104656972A (en) * 2014-11-18 2015-05-27 业成光电(深圳)有限公司 Touch module and touch display device with same
CN104656972B (en) * 2014-11-18 2017-12-01 业成光电(深圳)有限公司 Touch module and the touch control display apparatus with the touch module

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Application publication date: 20140709

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