CN103913226B - Spectral measurement device and measurement method - Google Patents
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Abstract
The invention belongs to the technical field of optical measurement and discloses a spectral measurement device. The spectral measurement device comprises an optical collimation device, a light scattering device, an array type detecting chip and a data acquisition and analysis system connected with the array type detecting chip. Incident light collimated by the optical collimation device transmits through a light scattering device to form scattered light, and the scattered light is received by the array type detecting chip, the light scattering device can enable incident lights of different frequencies to be distributed at different scattered light intensity angles, and scattered light intensities generated by the incident light at different positions of the light scattering device are different. The invention further discloses a spectral measurement method. Compared with the prior art, the spectral measurement device has the advantages that size is smaller, structural complexity and manufacturing cost are lower, and a novel spectral measurement technical approach is provided.
Description
Technical field
The present invention relates to a kind of spectral measurement device and measuring method, belong to field of optical measuring technologies.
Background technology
Spectrogrph is the optical instrument of research, the frequency, strength characteristics and its Changing Pattern measuring light radiation.It should be used up
Chromatic dispersion principle, diffraction principle or optical modulation principle, by the light radiation of different frequency according to certain rule separately, form light
Spectrum, coordinates a series of optics, precision optical machinery, electronics and computer system, realizes the accurate survey of the frequency to light radiation and intensity
Determine and study.Spectrogrph has the advantages that analysis precision is high, measurement range is big, speed is fast, is widely used in metallurgy, geology is surveyed
The field such as spy, biomedicine, petrochemical industry, astronomical observation, environmental conservation.
In recent years because the modernization in the fields such as environmental monitoring, modern agriculture, military analysis and industrial flow monitoring is sent out
Exhibition it is desirable to analytical tool miniaturization, lightweight, in special occasions (as environmental protection, field, Site Detection, spaceborne analysis detection etc.)
Also require instrument strong, stable and reliable for performance in measurement frequency range width, high resolution, vibration and interference resistance.Accordingly, it would be desirable to it is a kind of micro-
Type, integrated, intelligentized spectrogrph.Its small power consumption, voltage are low, easy to use and flexible, the ratio of performance to price high, and can be fast
Speed, in real time, intuitively obtain spectral signal.And the widely used spectrogrph of current institute not only resolution is not high enough, measure frequency band
Not wide, and the deficiency such as generally existing volume is big, expensive, installation and debugging are difficult, use condition is harsh.As Fourier becomes
Not only volume is larger to change spectrogrph, and to vibration sensing, its resolution is affected by the moving range of index glass.Optical grating diffraction type
Although grating volume is relatively small used by spectrogrph, this kind of spectrogrph resolution is not high, and expensive [yang jae-
chang,et al.micro-electro-mechanical-systems-based infrared spectrometer
composed of multi-slit grating and bolometer array,jap.j.of appl.phys.47(8),
6943-6948(2008)].
State Intellectual Property Office of the People's Republic of China authorizes Application No. on 26th in September in 2012
The patent documentation of 200910264251.x, title is " phase modulation stepped array micro-spectrograph ", and its core component is to build
Two-dimensional stepped array on ccd or cmos.Disclose the patent of Publication No. cn102564586a on July 11st, 2012
Document, title is " diffraction hole arrays structure mini spectrogrph and its high-resolution spectroscopy restored method ", and its core component is structure
It build the two-dimentional diffraction hole arrays on ccd or cmos in.Because the light of different wave length is after step or opening diffracting, can be
Different interference or diffraction intensity are produced on the pixel elements of ccd or cmos.Therefore by measuring different size step or can spread out
The luminous power of next series of pixels unit of perforation is it is possible to restore spectrum using the method solving large linear systems.With tradition
Grating spectrograph or Fourier transform spectrometer, compare, its small volume, frequency resolution are high, spectral measurement ranges width, permissible
Realize static measurement in real time.No matter but be ledge structure or the spectrogrph of diffraction pore structure, its principle is based on spreading out of light
Penetrate, and the cost of manufacture of satisfactory diffraction structure be higher, complex manufacturing process, need use costliness equipment, such as from
Sub- etching system or lithographic equipment etc..
Content of the invention
The technical problem to be solved is to overcome that the cost of manufacture existing for prior art is higher, complex structure
Deficiency, provide that a kind of volume is less, structure complexity and the lower spectral measurement device of cost of manufacture and measuring method.
The spectral measurement device of the present invention, including optical collimator, light scattering, array detection chip, and
The data collection and transmission being connected with described array detection chip；Via the incident illumination warp after optical collimator collimation
Scattered light is formed by light scattering, and is received by array detection chip；Described light scattering can make entering of different frequency
Penetrate light and form that different scattered light intensities are angular distribution, and the incident illumination of same frequency is produced by the different parts of light scattering
Scattered light intensity distribution is also different.
One of preferred version as the present invention, described light scattering includes opaque substrate, described opaque substrate
A series of nanometers are provided with towards on the surface of incident illumination to the projection differing in size of micro-nano-scale and/or pit, described
Raised and/or pit is in uneven distribution in opaque substrate surface.
As the two of the preferred version of the present invention, described light scattering includes opaque substrate, described opaque substrate
One layer of film of nanoparticles is fixed with towards on the surface of incident illumination, described film of nanoparticles includes one group of nanometer to micro-nano-scale
The opaque material particle differing in size, and described opaque material particle in film of nanoparticles be in uneven distribution.
As the three of the preferred version of the present invention, described light scattering includes transparent substrates, and described transparent substrates are extremely
It is fixed with one layer of film of nanoparticles, described film of nanoparticles includes one group of nanometer to the size of micro-nano-scale on a few surface
The opaque material particle not waited, and described opaque material particle is in uneven distribution in film of nanoparticles.
In above preferred version two and three, the preferred metallic of described opaque material particle, wherein preferred argent again.
It is below that one kind of light scattering using nano silver particles preferably prepares scheme:
Step 1, by concentration be 1.0 × 10- 2mol·l- 1Agno3Solution is mixed with water according to the ratio of 1:9, will mix
Liquid is stirred and heated to seethe with excitement；Then in mixed liquor injection 0.02% sodium citrate, continuously stirred and heat make its keep boil
Rise state 40 minutes, obtain silver colloid, be cooled to room temperature standby；
Step 2, substrate is carried out and is dried, by after dried substrate immersion 1%pdda solution soaking 30 minutes again
Secondary be carried out and be dried, obtain the substrate that surface is coated with pdda；
Step 3, surface is coated with pdda substrate immersion silver colloid in soak 1 hour, then take out clean and be dried.
The spectral measurement method of the present invention, using as above spectral measurement device described in arbitrary technical scheme, walks including following
Rapid: step 1, the frequency range that can detect described array detection chip are divided into the frequency band that n frequency range is δ f, n is
Pixel sum in described array detection chip, the mid frequency of each frequency band is f1,f2,…fn；
Step 2, incident illumination to be measured is made to pass sequentially through optical collimator, light scattering, the described array of measurement detects
The optical power value that in chip, each pixel is detected, is designated as p1,p2,…pn；
Step 3, by solve below equation group obtain each frequency component f in incident illumination to be measured1,f2,…fnSize p
(f1), p(f2) ..., p(fn):
In formula, cij(i=1,2 ... n) (j=1,2 ... n) expression mid frequency is fjLight through with without described light dissipate
In the case of emitter part, the ratio of the optical power value that i-th pixel is detected in described array detection chip, pre- by experiment
First record；
Step 4, to p (f1),p(f2),…p(fn) carry out linear fit, and through spectral calibration, obtain incident illumination to be measured
Spectrum.
Preferably, solve described equation group using the method for tikhonov regularization.
Compared to existing technology, the present invention and its optimal technical scheme have the advantages that
1st, spectral measurement device of the present invention is that array detection chip primary recipient is scattering based on scattering of light principle
Light, therefore can be arranged on the incident illumination side of light scattering, thus the volume of whole device can be reduced further, be easy to take
Band；Optics need not be moved, it is less therefore to vibrate the impact to it, can be surveyed in real time in complex environment during measurement
Amount.
2nd, the spectral resolution of spectral measurement device of the present invention is high, measurement range width, restores speed soon, the resolution of spectrum
It is to be determined by the pixel elements quantity of the light-detecting devices such as ccd, cmos, and the pixel of the light-detecting device such as ccd, cmos is now very
Easily reach more than million, so whole spectral measurement device can reach very high resolution.Array detection chip institute energy
The spectral region detecting determines spectral measurement width, and its spectral measurement ranges covers visible infrared band, Nai Zhizi
Wave section, therefore correspondingly, spectral measurement device of the present invention can obtain wider spectral measurement ranges.
3rd, spectral measurement device low manufacture cost of the present invention, light scattering can adopt existing various mature technology systems
Standby；And the light-detecting device such as ccd, cmos is also very ripe, the cost of manufacture of whole device relatively low it is not necessary to the setting of complex and expensive
Standby.
Brief description
Fig. 1 is the principle schematic diagram. of first embodiment of spectral measurement device of the present invention；
Fig. 2 is incident illumination spectrum division methods schematic diagram；Wherein, abscissa represents frequency, and unit is hertz；Vertical coordinate is
Normalization light spectral power, unit is every hertz of watt；With the method for calculus, incident light spectrum is become n equal portions according to frequency partition,
Often portion takes its mid frequency, and often a frequency range is δ f, fjIt is the mid frequency of wherein any one little rectangle, its width
It is worth for p (fj)；
Fig. 3 is the principle schematic diagram. of second embodiment of spectral measurement device of the present invention；
Fig. 4 is the principle schematic diagram. of the 3rd embodiment of spectral measurement device of the present invention.
In figure label implication is as follows:
1st, substrate, 2, raised (or pit), 3, array detection chip, 4, lens, 5, aperture, 6, opaque material
Particle.
Specific embodiment
Below in conjunction with the accompanying drawings technical scheme is described in detail:
The present invention is different from the existing spectral measurement methodses based on diffraction, and its main thought is based on scattering of light principle,
Design a kind of light scattering, the incident illumination of different frequency (wavelength) can be made to form different scattered light intensities angular distribution and identical
The incident illumination of frequency (wavelength) is also different in scattered light intensity distribution produced by the different parts of light scattering.So, array
The pixel elements of the various location in formula detection chip detect different scattering luminous powers.If according to array detection chip
The number of middle all pixels unit, frequency (wavelength) scope that pixel elements can be detected is evenly dividing, often a mid frequency
(wavelength) normalized power in incident illumination is as unknown number；The pixel elements of the various location of detection chip are detected
Value is as augmented matrix；Record the spy to each frequency (wavelength) component of each pixel elements of detection array chip various location in advance
Survey rate, and using this detectivity as coefficient matrix；Just permissible by solution large linear systems, linear fit, spectral calibration
Obtain incident illumination spectrum.
It is to make the incident illumination of different frequency form different scattered lights by the core that above thinking can be seen that the present invention
Angular distribution by force, and the incident illumination of same frequency is also different in scattered light intensity distribution produced by the different parts of light scattering
Light scattering.Technical solution of the present invention is further described with three preferred embodiments below.
Embodiment one,
Fig. 1 shows the structural principle of the spectral measurement device in the present embodiment.As shown in figure 1, this spectral measurement device
Including optical collimator, light scattering, array detection chip 3, and the number being connected with described array detection chip 3
According to collection and analysis system (not shown).Light scattering in the present embodiment is as illustrated, include opaque material system
The substrate 1 becoming, for example, be made up of materials such as metal, jealous glass, opaque high molecular polymers.Substrate 1 is towards incident illumination
Surface on be provided with a series of nanometers to the projection differing in size of micro-nano-scale and/or pit 2, described raised and/or
Pit 2 is in uneven distribution in opaque substrate surface.Because raised and/or pit 2 size is different, irregular arrangement, because
The illumination of this different frequency is mapped to opaque substrate surface and can form different scattered light intensity distributions, and the light of same frequency is through same
After the projection of one position or pit scattering, its scattered light intensity is also different.So, the various location in array detection chip
Pixel elements detect different scattering luminous powers.Optical collimator is used for collimating incident illumination injecting for directional light, this reality
Applying the optical collimator in example as shown in figure 1, including two confocal lens 4, being provided with the common intersection point of two lens 4
One aperture 5.Array detection chip 3 can adopt existing charge coupled cell (ccd) or CMOS (Complementary Metal Oxide Semiconductor)
Semiconductor element (cmos), each of detection chip pixel elements are after calibration it can be ensured that same frequency (wavelength), phase
When inciding these pixel elements with the light of power, the data of each pixel elements output is identical.
Above-mentioned light scattering can be prepared using existing ripe chemical attack, ion etching or photoetching method, only
Make the size that a series of nanometer of uneven distributions to micro-nano-scale is existed at least one surface of opaque substrate
The projection not waited and/or pit.
The luminous power data that data collection and transmission is collected according to pixel each in array detection chip
Realize treating the spectrum recovering of light-metering, specific spectrum recovering method is using the document referring in background technology
Method disclosed in (200910264251.x, cn102564586a).Its detailed content is as follows:
As shown in Fig. 2 the frequency that detection array chip can be detected according to the quantity of detection array chip effective pixel
Scope is evenly dividing into n part, and often a mid frequency is f1,f2,…fn, frequency range is δ f, the light of every band frequency in incident illumination
Power is approximately the area of each little rectangle of in figure.The incident illumination spectrum needing survey can be by the light corresponding to each frequency of in figure
Power magnitude carries out linear fit and obtains, so the targeted transformation of spectrum recovering is the height p (f seeking each little rectangle of in figure1),
p(f2),…p(fn).
According to calculus principle, the general power of incident illumination can be approximated to be the total of each little rectangular area below in figure curve
With the i.e. superposition of each frequency component power.It is represented by:
p0=p(f1) δ f+p(f2)δf+…+p(fn)δf
When incident illumination is after light scattering scattering, detected by one of pixel elements, this pixel elements receives
Power can pass through itself direct detection.And on the other hand, the power that pixel elements detect can also be entered by incident illumination spectrum
Row is calculated.Because the power of each frequency, i.e. the area of each little rectangle of in figure, when being detected by certain pixel elements all
Have and to a certain degree reduce.And because the scattering process of different raised or pit is so that the light of each frequency component of incident illumination exists
The ratio reducing in each pixel elements is different.The reduction ratio of each pixel elements is fixed value after device is carried out, can
To be detected by some pixel elements after light scattering scattering by measuring the light of each frequency in incident beam in advance
Detectivity calculate.Therefore can be obtained by an equation, the left side of equation is the power measurement values of pixel elements, equation group
The right be after in incident illumination, the watt level of each frequency is multiplied to the detectivity of each frequency of incident illumination respectively with pixel elements
Value of calculation obtained by being added again.Assume that incident illumination is detected by ith pixel unit after light scattering scattering, this pixel
The luminous power size obtaining in unit is represented by:
pi=ci1p(f1)δf+ci2p(f2)δf+…+cinp(fn)δf
Here, ci1,ci2,…cinBeing respectively frequency is f1,f2,…fnLight through light scattering scattering after by i-th
The detectivity that pixel elements are detected.Therefore, n pixel elements of array detection chip just can record a series of power, these
Power can be expressed as system of linear equations:
p1=c11p(f1)δf+c12p(f2)δf+…+c1np(fn)δf,
p2=c21p(f1)δf+c22p(f2)δf+…+c2np(fn)δf,
…
pn=cn1p(f1)δf+cn2p(f2)δf+…+cnnp(fn)δf,
Wherein cij(i=1,2 ... n) (j=1,2 ... n) is mid frequency is fjLight by the detection that detected of ith pixel unit
Rate, that is, mid frequency is fjThe power that detected by ith pixel unit of light and this frequency before light scattering scattering
The ratio of luminous power.Can be previously obtained by experiment, for example, obtaining mid frequency by monochromator is fjMonochromatic light directly shine
Penetrate array detection chip, record the luminous power that each pixel elements are detected；Then with same monochromatic light as incident illumination, through light
After scattering device scattering, obtain the luminous power that in array detection chip, each pixel elements are detected；Then use each pixel elements
Divided by the probe value obtaining before, that is, obtain each pixel elements to mid frequency is f to the probe value obtaining afterwardsjLight detection
Rate.Record the detectivity of each pixel elements when in advance it is possible to represent each pixel elements in detection chip with above-mentioned system of linear equations
Measured luminous power.If represented with matrix form cx=y, if detectivity composition coefficient matrix c, and each picture in detection chip
What primitive element recorded treats photometric data composition augmented matrix y, then above-mentioned system of linear equations can be expressed as with matrix form:
Solve above-mentioned system of linear equations equation group and obtain x, and calculate further:
Accordingly, it is possible to try to achieve power p (f corresponding to each frequency component in incident light spectrumi) size, by p (f1),p
(f2),…p(fn) carry out linear fit, just obtain incident light spectrum.
During solving equation group, power that each pixel elements of detection chip are collected and to the light of each frequency
Detectivity is all measured value, and due to reasons such as measurement error, equation group actually ill-conditioned linear systems, along with equation in equation group
Quantity more, be difficult to solve with commonsense method, and adopt the method for tikhonov regularization to solve this system of linear equations effect
Preferably, equation group solve after the corresponding normalization light spectral power of each frequency of incident illumination, finally just carry out spectral calibration
Obtain the recovery spectrum of incident illumination.
Embodiment two,
Fig. 3 shows the structural principle of the spectral measurement device in the present embodiment.The present embodiment different from embodiment 1 it
Place is the structure of light scattering, remainder all same.As shown in figure 3, the light scattering in the present embodiment is included not
Transparent substrate 1, for example, be made up of materials such as metal, jealous glass, opaque high molecular polymers.Substrate 1 is towards incidence
One layer of film of nanoparticles is fixed with the surface of light, described film of nanoparticles include one group of nanometer to micro-nano-scale size not
Deng opaque material particle 6, and described opaque material particle 6 in film of nanoparticles be in uneven distribution.Due to impermeable
The size of bright material particles 6 is different, irregular arrangement, and the illumination of therefore different frequency is mapped on film of nanoparticles and can form difference
Scattered light intensity distribution, and after the opaque material particle 6 through same position for the light of same frequency scatters, its scattered light intensity is not yet
Equally.So, the pixel elements of the various location in array detection chip detect different scattering luminous powers.Using enforcement
Spectrum recovering method in example one can obtain the spectrum of incident illumination to be measured.
Embodiment three,
Fig. 4 shows the structural principle of the spectral measurement device in the present embodiment.The present embodiment different from embodiment 1 it
Place is equally the structure of light scattering, remainder all same.Light scattering in the present embodiment includes transparent base
Bottom 1, for example, made using transparent materials such as glass or silicon dioxide.One layer of nanometer is fixed with least one surface of substrate 1
Particle membrane, described film of nanoparticles includes one group of nanometer to the opaque material particle 6 differing in size of micro-nano-scale, and institute
Stating opaque material particle is in uneven distribution in film of nanoparticles.Film of nanoparticles may be disposed at a surface of substrate 1,
Can also have on two surfaces.Because the size of opaque material particle 6 is different, irregular arrangement, the therefore light of different frequency
It is irradiated to and different scattered light intensity distributions can be formed on film of nanoparticles, and the opaque material through same position for the light of same frequency
After material particle 6 scattering, its scattered light intensity is also different.So, the pixel elements of the various location in array detection chip are visited
Measure different scattering luminous powers.The spectrum of incident illumination to be measured can be obtained using the spectrum recovering method in embodiment one, this
Place repeats no more.
In above example two and embodiment three, the opaque material particle of light scattering preferably employs metal material.Can
Using the method preparation such as existing ripe Electrostatic Absorption, vapour deposition, therefore make simple, low cost of manufacture.To adopt silver granuel
As a example the light scattering of sub- film, it can adopt following preparation method:
Carry out the preparation of silver colloid first: by 50ml1.0 × 10- 2mol·l- 1agno3Injection is equipped with the burning of 450ml water
Bottle, is stirred and heated to seethe with excitement, is then injected into 10ml1% sodium citrate solution, continuously stirred and ebuillition of heated 40 minutes, finally
Colloid is yellow green.
Silver colloid due to preparation carries elecrtonegativity, therefore can be using electropositive electrolyte pdda and electronegative silver
The electrostatic interaction of intergranular is assembled.Specifically comprise the following steps that and first substrate of glass 2 is carried out, by substrate 2 successively in body
It is cleaned by ultrasonic 20 minutes in the long-pending ethanol-acetone solution comparing 1: 1, second alcohol and water, then insert the piranha solution (98% of boiling
h2so4With 30%h2o2Volume ratio 3: 1 is prepared) soak 30 minutes, take out deionized water and rinse 3 times, argon dries up.Then will do
Dry substrate 2 immersion 1%pdda solution soaking makes positive charge in surface band for 30 minutes, takes out deionized water and rinses 3 times, argon blows
Dry.Soak 1 hour in the substrate 2 immersion silver colloid that will be covered with pdda again, after taking-up, deionized water is rinsed 3 times, and argon blows
Dry.
Above multiple embodiments are only easy for public understanding technical scheme, and not to required by the present invention
The restriction of protection domain.Those skilled in the art it is understood that in addition to above example, the with good grounds present invention invention thinking,
Form using the incident illumination that can make different frequency (wavelength) that different scattered light intensities are angular distribution, and the incidence of same frequency (wavelength)
Light is in the also different light scattering of scattered light intensity distribution produced by the different parts of light scattering, thus realize spectrum surveying
The product of amount and method, each fall within protection scope of the present invention.
Claims (10)
1. a kind of spectral measurement device it is characterised in that include optical collimator, light scattering, array detection chip,
And the data collection and transmission being connected with described array detection chip；Via the incidence after optical collimator collimation
Light forms scattered light via light scattering, and is received by array detection chip；Described light scattering can make different frequency
Incident illumination form that different scattered light intensities are angular distribution, and the incident illumination of same frequency is produced in the different parts of light scattering
Raw scattered light intensity distribution is also different.
2. spectral measurement device as claimed in claim 1 is it is characterised in that described light scattering includes opaque substrate, institute
State opaque substrate and one layer of film of nanoparticles is fixed with towards on the surface of incident illumination, described film of nanoparticles includes one group of nanometer
To the opaque material particle differing in size of micro-nano-scale, and described opaque material particle is in not in film of nanoparticles
It is uniformly distributed.
3. spectral measurement device as claimed in claim 1 is it is characterised in that described light scattering includes transparent substrates, described
One layer of film of nanoparticles is fixed with least one surface of transparent substrates, described film of nanoparticles includes one group of nanometer to micro-nano
The opaque material particle differing in size of metrical scale, and described opaque material particle is in uneven point in film of nanoparticles
Cloth.
4. as described in Claims 2 or 3 spectral measurement device it is characterised in that described opaque material particle be metallic.
5. spectral measurement device as claimed in claim 4 is it is characterised in that described metal is silver.
6. spectral measurement device as claimed in claim 5 is it is characterised in that described light scattering utilizes following methods to prepare:
Step 1, by concentration be 1.0 × 10- 2mol• l- 1Agno3Solution is mixed with water according to the ratio of 1:9, by mixed liquor
It is stirred and heated to seethe with excitement；Then in mixed liquor injection 0.02% sodium citrate, continuously stirred and heat make its keep seethe with excitement
State 40 minutes, obtains silver colloid, is cooled to room temperature standby；
Step 2, substrate is carried out and is dried, dried substrate is immersed after 1% pdda solution soaking 30 minutes again
It is carried out and is dried, obtain the substrate that surface is coated with pdda；
Step 3, surface is coated with pdda substrate immersion silver colloid in soak 1 hour, then take out clean and be dried.
7. spectral measurement device as claimed in claim 6 it is characterised in that described clean and drying specifically refer to: first spend from
After sub- water is cleaned multiple times, then dried up with argon.
8. spectral measurement device as claimed in claim 1 is it is characterised in that described light scattering includes opaque substrate, institute
State opaque substrate be provided with towards on the surface of incident illumination a series of nanometers to micro-nano-scale the projection differing in size and/
Or pit, described raised and/or pit is in uneven distribution in opaque substrate surface.
9. spectral measurement device as claimed in claim 1 it is characterised in that described optical collimator include two confocal saturating
Mirror, and it is arranged at the aperture at the common focus of described two lens.
10. a kind of spectral measurement method, using spectral measurement device as described in any one of claim 1～9 it is characterised in that
Comprise the following steps:
Step 1, the frequency range that can detect described array detection chip are divided intonIndividual frequency range is δfFrequency band,n
Total for the pixel in described array detection chip, the mid frequency of each frequency band isf 1 ,f 2 ,…f n ；
Step 2, make incident illumination to be measured pass sequentially through optical collimator, light scattering, measure described array detection chip
In the optical power value that detected of each pixel, be designated asp 1 ,p 2 ,…p n ；
Step 3, by solve below equation group obtain each frequency component in incident illumination to be measuredf 1 ,f 2 ,…f n Sizep(f 1 ),p
(f 2 ) ...,p(f n ):
In formula,c ij (i=1,2…n) (j=1,2…n) represent that mid frequency isf j Light through with without described light scattering
In the case of device, in described array detection chipiThe ratio of the optical power value that individual pixel is detected, by experiment in advance
Record；
Step 4, rightp(f 1 ),p(f 2 ),… p(f n ) carry out linear fit, and through spectral calibration, obtain the light of incident illumination to be measured
Spectrum.
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| CN106838718B (en) * | 2016-12-29 | 2019-03-08 | 中国科学院西安光学精密机械研究所 | A kind of spectral calibration lighting device |
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| CN102564586B (en) * | 2012-01-09 | 2013-08-07 | 南京邮电大学 | Miniature spectrograph with diffraction hole array structure and high resolution spectrum reconstruction method thereof |
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