CN103809374B - Touch panel Lightproof composition and touch panel - Google Patents
Touch panel Lightproof composition and touch panel Download PDFInfo
- Publication number
- CN103809374B CN103809374B CN201310530322.2A CN201310530322A CN103809374B CN 103809374 B CN103809374 B CN 103809374B CN 201310530322 A CN201310530322 A CN 201310530322A CN 103809374 B CN103809374 B CN 103809374B
- Authority
- CN
- China
- Prior art keywords
- touch panel
- methyl
- unit
- composition
- lightproof
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
The present invention provides a kind of touch panel Lightproof composition and touch panel, the Lightproof composition are suitable as the light shield layer of touch panel, and chemical reagent resistance, light resistance and insulating properties are excellent, can form image by photoetching.And provide its cured film.The touch panel Lightproof composition is characterized in that, carbon black (B) containing copolymer (A) and through insulation processing, the copolymer (A) has multiple repetitive units, 1 kind or more of the repetitive unit from polymerizable unsaturated compound of the repetitive unit copolymerization that the repetitive unit and 10~80 moles of % indicated by 20~90 moles of % general formulas (1) can be indicated with general formula (1) is constituted, and number-average molecular weight is 2,000~20,000 and acid value is 35~120mgKOH/g；The cured film is made of solidifying above-mentioned Lightproof composition.
Description
Technical field
The present invention relates to the touch panels of novel touch panel Lightproof composition and the cured film with it.
Background technique
Now, touch panel is widely used as the input unit in the display devices such as liquid crystal display.As touch surface
The composition of plate, it is known that there are various ways, but the touch panel of condenser type (projection-type) rely on can be achieved bright scene display,
The advantages that many places contact can be detected simultaneously and gazed at.
Capacitive touch panel has the mosaic electricity for being formed as 2 layers by transparent conductive materials such as ITO in picture
Pole figure case.2 layers of electrode pattern are presented respectively along x-axis to, to continuous shape, the extraction via metal etc. is routed and outside with y-axis
Control circuit connection.When finger touches the picture of touch panel, capacitance variations, control electricity occur for electrode pattern in its vicinity
The position so as to identify finger is detected as coordinate information in road (referring for example to patent document 1).
Such touch panel is proposed when forming touch panel circuit on glass in front by metal etc.
Extraction wiring is hidden in behind the light shield layer of the peripheral portion in the shape of a frame for being formed in picture, invisible from user direction in this way,
Thus visuality, the technology of design of display are improved.At this point, due to carrying out extraction wiring, electrode after forming light shield layer
The etching and processing of pattern, so the material as light shield layer, it is desirable that the chemically-resistant of the etching solution of metal, the stripper of resist
It is agents.In addition, being located near the surface of display due to the light shield layer, so as its material requirements high-light-fastness.Also,
Interelectrode short circuit in order to prevent, light shield layer must have insulating properties, specially require in the manufacture work by touch panel circuit
Insulating properties is maintained after heat treatment at a high temperature of needed for sequence.
As light shield layer, using the printing ink composition of light-proofness, but positive trial recently passes through photoetching energy shape using a kind of
At the light-proofness photoresist of image.Due to the technique using photoetching can easily only be formed in the peripheral portion of picture it is relatively thin
The light shield layer of film thickness, it is advantageous to.But by existing material, such as the Lightproof composition of black matrix of colour filter turns
When using touch panel purposes, be unable to satisfy there are chemical reagent resistance, light resistance and require level, and their characteristic and absolutely
Edge is difficult to such issues that get both.
On the other hand, it is also proposed that aim at the well-designed Lightproof composition of touch panel (referring for example to patent document
2,3), but adequately improvement is also not implemented in such composition, it is desirable to a kind of material of higher performance occurs.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2011-186717 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2012-145699 bulletin
Patent document 3:WO2012/133148 pamphlet
Summary of the invention
The present invention is the project in view of above-mentioned conventional art and carries out that its purpose is to provide a kind of chemical-resistant reagents
Property, light resistance and insulating properties are excellent, the touch panel Lightproof composition of image can be formed by photoetching.
It is studied in order to solve the above problems, as a result the inventors of the present invention's discovery contains the copolymerization with specific structure
Object and the suitable touch panel purposes of the Lightproof composition for containing the carbon black through insulation processing, so as to complete the present invention.
That is, the present invention relates to touch panel Lightproof compositions, which is characterized in that containing copolymer (A) and through insulating
The carbon black (B) of processing, the copolymer (A) is the copolymer with multiple repetitive units, by 20~90 moles of % the following general formula
(1) a kind or more of the repetitive unit copolymerization that the repetitive unit and 10~80 moles of % indicated can be indicated with general formula (1) comes from
The repetitive unit of polymerizable unsaturated compound is constituted, and number-average molecular weight is 2,000~20,000 and acid value is 35~120mgKOH/g.
(wherein, R1And R2Each independently represent hydrogen atom or methyl.)
Here, it is preferred that A ingredient is only made of the repetitive unit group without containing aromatic rings.
In addition, the invention further relates to the touch panels of the cured film with above-mentioned touch panel Lightproof composition.
Specific embodiment
Hereinafter, the present invention is described in detail.
Lightproof composition of the invention contains copolymer (A), the repetition list indicated by 20~90 moles of % general formulas (1)
1 kind or more of the repetitive unit copolymerization that member and 10~80 moles of % can be indicated with general formula (1) comes from polymerism unsaturation
The repetitive unit for closing object is constituted, and number-average molecular weight is 2,000~20,000 and acid value is 35~120mgKOH/g.It is preferred that A ingredient is to utilize
Obtained by conventional method will carry out free radical polymerization as the polymerizable unsaturated compound of representative using (methyl) acrylic acid derivative
Polymer or copolymer are basic framework.Here, (methyl) acrylic acid refers to acrylic or methacrylic acid (following also the same).
When carrying out free radical polymerization, radical polymerization initiator well known to azo-compound, peroxide etc. can be used.In addition, can
To control the degree of polymerization using well known chain-transferring agent, polymerization inhibitor etc..It should be noted that containing 20~90 moles of % general formula (1) tables
The repetitive unit shown indicates to constitute the ratio of the number of repeat unit of the general formula (1) in total number of repeat unit of copolymer (A).With
Under, repetitive unit is also referred to as unit.
When the unit that general formula (1) is indicated imports A ingredient, also have 1,3- bis- (methyl) glycerol acrylate as raw material
The method for directly carrying out free radical polymerization, but gelation caused by cross-linking reaction in order to prevent, it is preferred to use make to have from (first
Base) acrylic acid unit polymer or copolymer and the addition of (methyl) glycidyl acrylate or make to have from (first
Base) glycidyl acrylate unit polymer or copolymer and (methyl) acrylic acid addition 2 step synthetic methods.It is described to add
It can use conventional method at reaction to carry out, tertiary amine, quaternary ammonium salt, tertiary phosphine, season also can be usedCatalytic reaction well known to salt etc.
Agent.
As described above, the repetitive unit and 10~80 moles of % that there is copolymer (A) 20~90 moles of % general formulas (1) to indicate
1 kind or more of the repetitive unit from polymerizable unsaturated compound of the repetitive unit copolymerization that can be indicated with the general formula (1).
That is, any unit other than general formula (1) can be copolymerized in the A ingredient, such as it can import and come from (methyl) acrylic acid, (methyl)
Acrylate, (methyl) acrylamide, Styrene and its derivatives, maleic anhydride and its derivative, vinyl ethers, olefines
Deng unit.From the point of view of light resistance, preferably do not have absorption as far as possible in UV light region, therefore as A ingredient, preferably
Only it is made of the unit group without containing aromatic rings.
As the alcohol (R for constituting above-mentioned (methyl) acrylate3OH) the amine of ingredient or composition (methyl) acrylamide
(R4R5NH) ingredient can utilize known substance with no particular limitation.As R3、R4And R5Specific example, can enumerate
Methyl, ethyl, propyl, isopropyl, butyl, isobutyl group, sec-butyl, tert-butyl, amyl, isopentyl, neopentyl, tertiary pentyl, oneself
Base, heptyl, octyl, 2- ethylhexyl, nonyl, decyl, dodecyl, myristyl, cetyl, octadecyl, eicosane
Base, cyclopropyl, cyclopenta, cyclopentyl ethyl, cyclohexyl, cyclohexyl methyl, 4- methylcyclohexyl, adamantyl, isobornyl,
Bicyclic pentyl, double cyclopentenyl, vinyl, allyl, acetenyl, phenyl, tolyl,Base, naphthalene, anthryl, phenanthryl, benzyl
The saturated or unsaturated monovalent hydrocarbons such as base, 2- phenylethyl, 2- phenyl vinyl, pyridyl group, piperidyl, piperidino, pyrrole
Cough up base, pyrrolidinyl, imidazole radicals, imidazolidinyl, furyl, tetrahydrofuran base, thienyl, tetrahydro-thienyl, morpholinyl, morpholine
Saturated or unsaturated monovalence heterocycles such as Dai Ji (4- bases), quinolyl etc..In addition it is also possible to enumerate using following radicals as
Substituent group imports the structure of any position of above-mentioned alkyl and heterocycle etc., and the group is halogen atom, hydroxyl, sulfenyl (ス Le
Off ァ ニ Le base), carbonyl, thiocarbonyl, carboxyl, thiocarboxyl group, dithiocarboxyl, formoxyl, cyano, nitro, nitroso, sulphur
Base, amino, imino group, silicyl, ether, thioether group, ester group, thioester substrate, dithioesters base, amide groups, thioamides base, urine
Alkyl, thiourethane base, urea groups, ghiourea group etc..Such univalent perssad is suitably selected according to the structure of the A ingredient as target
Fixed, the saturated or unsaturated monovalent hydrocarbon of preferred carbon atom number 1~20, more excellent from the point of view of performance and economy
Select the saturated or unsaturated monovalent hydrocarbon of carbon atom number 1~6.In addition, R4And R5It can be hydrogen atom, R4And R5It can also tie
It closes and forms ring.
Than that described above, further preferably following units are as copolymer composition, that is, the unit with epoxy group is (such as from (first
Base) glycidyl acrylate, (methyl) acrylic acid [ 4-(glycidyl oxygroup) butyl ] ester, (methyl) acrylic acid [ (3,4-
Epoxycyclohexyl) methyl ester, 4-(glycidyl oxy methyl) styrene etc. unit), with alkoxysilyl
Unit (such as from (methyl) acrylic acid [ 3-(trimethoxysilyl) propyl ] ester, (methyl) acrylic acid [ tri- ethoxy of 3-(
Base silicyl) propyl ester, 4-(trimethoxysilyl) styrene etc. unit).
In addition, the derivative as styrene, it is possible to use α-methylstyrene is imported into the aromatic rings of styrene
The compound of alkyl, halogen atom, hydroxyl etc..In addition, the derivative as maleic anhydride, can be used the monoesters of maleic anhydride and alcohol
Or diester, the amide of maleic anhydride and amine or sub- amide etc..As vinyl ethers, can Exemplary alkyl radicals vinyl ethers etc., as
Olefines can illustrate the structure that the hydrogen atom of ethylene, propylene, butadiene and these compounds is replaced by halogen atom, cyano
Deng.In addition, alkyl vinyl ketone, vinyl acetate etc. can also be used.
It should be noted that alkyl described in upper section indicates the saturated or unsaturated alkyl of carbon number 1~20, the alkyl can
Can be replaced by arbitrary substituent group with branched structure, ring structure.
The unit that A ingredient need to be indicated containing 20~90 moles of % general formulas (1), further preferably 30~90 moles of % are especially excellent
Choosing contains 30~60 moles of %.When the unit that general formula (1) indicates is fewer than above range, the chemical reagent resistance of Lightproof composition,
Insulating properties is insufficient.On the other hand, general formula (1) more than the unit indicated though will not cause functionally, but if its ratio mistake
Greatly, then it is difficult to take into account acid value control within the limits prescribed.Therefore, the upper limit for the unit that general formula (1) indicates need to rub for 90
You are %.
In addition, the number-average molecular weight of A ingredient need to 2,000~20,000 range, more preferably 5,000~10,000 5 thousand range.Number
Average molecular weight is more insufficient than the chemical reagent resistance of above range hour Lightproof composition, insulating properties, passes through photoetching when opposite big
It is difficult to form image.The weight average molecular weight of A ingredient is not particularly limited, preferably dispersion degree (weight average molecular weight ÷ number-average molecular weight)
In 1~4 range.The value of these molecular weight can use GPC(SEC) it measures and acquires.
In addition, the acid value of A ingredient need to be 35~120mgKOH/g, more preferably 50~80mgKOH/g.Acid value is detached from the model
When enclosing, loses the deliquescent balance in alkaline-based developer and be difficult to by being lithographically formed image.Acid value is assigned to A ingredient,
For typical case can by make the unit from (methyl) acrylic acid with defined molar ratio be copolymerized and progress, but it is also preferred that lead
Enter the unit of general formula as described below (2) expression.General formula (2) indicate unit can by make general formula (1) indicate unit with
Dicarboxylic anhydride addition and synthesize.
(wherein, R1And R2Hydrogen atom or methyl are each independently represented, Z indicates the divalent residue of dicarboxylic anhydride.)
As dicarboxylic anhydride, well known substance can be utilized with no particular limitation, for example, succinic anhydride can be enumerated, (Z=is sub-
Ethyl), maleic anhydride (Z=ethenylidene), hexamethylene -1,2- dicarboxylic anhydride (Z=hexamethylene -1,2- diyl), cyclohexene -1,
2- dicarboxylic anhydride (Z=cyclohexene -1,2- diyl), cyclohexene -4,5- dicarboxylic anhydride (Z=cyclohexene -4,5- diyl), norborneol
Alkane -2,3- dicarboxylic anhydride (Z=norbornane -2,3- diyl), phthalic anhydride (Z=1,2- phenylene), benzene -1,2,4- three
Carboxylic acid -1,2- acid anhydride (Z=4- carboxyl -1,2- phenylene), hexamethylene -1,2,4- tricarboxylic acids -1,2- acid anhydride (Z=4- carboxy cyclohex alkane -
1,2- diyl) etc..
In addition to said units, can also be used to come from makes (methyl) acrylic acid 2- hydroxyl ethyl ester, (methyl) acrylic acid 2- hydroxypropyl
The unit of the structure of (methyl) acrylate and dicarboxylic anhydride addition with hydroxyl such as ester, (methyl) acrylic acid 4- hydroxy butyl ester,
Unit etc. from maleic anhydride and its derivative.
A ingredient is suitble to the reasons why Lightproof composition of touch panel not yet completely clear, but is presumably due to general formula
(1) unit indicated has polyunsaturated bond at its end, so chemically-resistant can be formed using fine and close cross-linked structure
Agents, light resistance and the excellent cured film of insulating properties.In addition, A ingredient can be used in combination form it is different of more than two kinds total
Polymers.
Lightproof composition of the invention contains the carbon black (B) through insulation processing.For the insulation processing of carbon black, it is known to
The method (such as Japanese Unexamined Patent Publication 9-95625 bulletin) that is covered with resin, with the method for oxidizing processing (such as Japan
Japanese Laid-Open Patent Publication 11-181326 bulletin), using the method for the high-molecular compound grafting with reactive group, (such as Japan is special
Open flat 9-265006 bulletin), with the method (such as Japanese Unexamined Patent Application Publication 2008-517330 bulletin) of organic group chemical modification,
And with graft reaction and with resin cover method (such as Japanese Unexamined Patent Publication 2002-249678 bulletin), with pigment cover side
Method (such as WO2013/129555 pamphlet) etc. can use either method as B component.As the index of insulating properties,
It is preferred that the surface resistivity of the cured film of Lightproof composition shows 1010The insulation of the resistivity preferably can be achieved in Ω/sq or more
Processing.Surface resistivity using the cured film of Lightproof composition when carbon black not Jing Guo insulation processing is generally less than 108
Ω/sq, therefore the necessity of the insulation processing of B component is clear.Two or more can be applied in combination in B component.
Lightproof composition of the invention contains 20~70 weight %A ingredients and B component respectively preferably in solid component,
Still more preferably contain 30~50 weight % respectively.Refer to other than solvent contained by Lightproof composition in this solid component
Ingredient (aftermentioned about solvent).When the amount of A ingredient is fewer than above range, chemical reagent resistance, light resistance and insulating properties
Deficiency, the design of Lightproof composition becomes difficult when opposite more.In addition, shading when the amount of B component is fewer than above range
Property it is insufficient, become difficult when opposite more by being lithographically formed image.It should be noted that the index as light-proofness, preferably light-proofness
The optical density of the cured film of composition is 2.0/ μm or more.
For control curability, the purpose of the performance of photoetching, can make Lightproof composition of the invention contain A ingredient with
The outer compound (C) with polyunsaturated bond.As C ingredient, previous photosensitive composition can be used with no particular limitation
Well known compound used in object, for instance, it may be preferable to use diethylene glycol two (methyl) acrylate, trimethylolpropane tris
(methyl) acrylate, pentaerythrite four (methyl) acrylate, double trimethylolpropane four (methyl) acrylate, two seasons penta
(methyl) acrylate derivatives such as tetrol six (methyl) acrylate, bisphenol type epoxy two (methyl) acrylate, Bisphenol F
Type ring oxygen two (methyl) acrylate, bisphenol fluorene type ring oxygen two (methyl) acrylate, the poly- (first of phenol novolak-type epoxy
Base) (methyl) the acrylic acid epoxy ester derivant such as acrylate, poly- (methyl) acrylate of cresol novolak type epoxy etc..Separately
Outside, there is (preferably several) isocyanate group, anhydride group etc. in further preferably above-mentioned (methyl) acrylic acid derivative and structure
The reaction product etc. of compound.It should be noted that it is derivative that maleic acid can also be enumerated in addition to (methyl) acrylic acid derivative
Object, maleimide derivatives, crotonic acid derivates, derivatives from itaconic acid, cinnamic acid derivative, ethenyl derivatives, ethylene
01 derivatives, vinyl ketone derivative, vinyl aromatic derivative etc..These compounds with polyunsaturated bond can
With the further Complex Function with alkali-soluble functional groups such as functional group, the carboxyls of heat reactivities such as epoxy group etc..C ingredient
Use level be not particularly limited, in the solid component of Lightproof composition be preferably 1~30 weight %, more preferably 5~20
Weight %.1 kind of compound can be used only in C ingredient, can also be applied in combination a variety of.
For the purpose for improving photo-curable, can make to contain Photoepolymerizationinitiater initiater in Lightproof composition of the invention
And/or dye-sensitized dose (D).As D ingredient, can be used without particular limitation well known used in previous photosensitive composite
Compound, for example, the benzene second such as acetophenone, 2- hydroxy-2-methyl -1- phenyl-propane -1- ketone, benzyl dimethyl ketal can be enumerated
Ketone compound, benzophenone, 2,4,6- tri-methyl benzophenones, 4, the hexichol such as 4 '-bis- (N, N- diethylamino) benzophenone
Methanone compounds, the benzoin ethers compound such as tertiary butyl ether of benzoin ethyl ether, benzoin, 2- methyl-1-4-(methyl mercapto) phenyl ]-
2- morpholino propane -1- ketone, 2- benzyl -2-(N, N- dimethylamino) -1-(4- morphlinophenyl) alpha-amidos such as butane -1- ketone
Alkyl phenones compound, the thioxanthones compounds such as thioxanthone, 2,4- diethyl thioxanthone, 3,3 ', 4,4 '-four (tertiary fourths
Base crosses oxygen carbonyl) organic peroxides such as benzophenone, 2,2 '-bis- (2- chlorphenyls) -4,4 ', 5,5 '-tetraphenyl -1,2-, bis- miaow
The diimidazoles compound such as azoles, bis- (η5Cyclopentadienyl group) the titanocenes chemical combination such as bis- [ the fluoro- 3-(1- pyrrole radicals of 2,6- bis-) phenyl ] titaniums
Object, 2,4,6- tri- (trichloromethyl) -1,3,5-triazines, 2- [ 3,4-(methylenedioxies) phenyl ] -4,6- bis- (trichloromethyls) -
The triaizine compounds such as 1,3,5-triazines, (2,4,6- trimethylbenzoyl) diphenyl phosphine oxide, bis- (2,4,6- trimethylbenzene first
Acyl group) acylphosphine oxide compounds such as phenyl phosphine oxide, the naphtoquinone compounds such as camphorquinone, 1- 4-(thiophenyl) and phenyl ] octane -1,
2- diketone=2-O- benzoyl oxime, 1- [ 9- ethyl -6-(2- methyl benzoyl) carbazole -3- base ] ethyl ketone=O- acetyl oxime, (9- second
Base -6- nitrocarbazole -3- base) the oximes ester such as [ 4-(2- methoxyl group -1- methyl ethoxy) -2- aminomethyl phenyl ] ketone=O- acetyl oxime
Compound etc..From the angle for the sensitivity for improving Lightproof composition, particularly preferred oxime ester compound, more into one in these
Step preferably has oxime ester compound of the carbazole skelton as chromophoric group.The use level of D ingredient is not particularly limited, in light-proofness
It is preferably 0.1~20 weight %, more preferably 1~10 weight % in the solid component of composition.1 kind of change can be used only in D ingredient
Object is closed, can also be applied in combination a variety of.
For the purpose for further increasing chemical reagent resistance, can make to contain epoxy in Lightproof composition of the invention
Compound (E).As E ingredient, can be used without particular limitation as the commercially available well known compound such as epoxy resin, example
Such as, it is clear that bisphenol A type epoxy compound, bisphenol F type epoxy compound, bisphenol fluorene type ring oxygen compound, phenol novolac can be enumerated
Paint shaped epoxide, cresol novolak type epoxy compound, the glycidol ether of polyalcohol, polybasic carboxylic acid glycidol
Ester, for polymer or copolymer with epoxy group and be not the compound of A ingredient, with 3,4- 7-oxa-bicyclo[4.1.0 carboxylic acid (3,4-
Epoxycyclohexyl) methyl esters be representative bis- (the methylol)-n-butyl alcohols of cycloaliphatic epoxy, 2,2- 1,2- epoxy -4-(2-
Epoxy ethyl) hexamethylene addition product (such as DAICEL corporation " EHPE3150 "), (such as Japanese Cao reaches epoxidized polybutadiene
Society's system " NISSO-PBJP-100 "), the epoxide with silicone backbone etc..As these ingredients, preferably epoxide equivalent
For 100~300g/eq and compound that number-average molecular weight is 100~5,000.The use level of E ingredient is not particularly limited, in shading
Property composition solid component in preferably 1~20 weight %, more preferably 2~10 weight %.1 kind of change can be used only in E ingredient
Object is closed, also can be used a variety of.
For making B component be stably dispersed in the purpose in Lightproof composition, Lightproof composition of the invention can be made
In contain dispersing agent (F).As F ingredient, previous pigment dispersion well known compound used can be used without particular limitation
(with commercially available compounds of titles such as dispersing agent, dispersion wetting agent, dispersion enhancing agents etc.), for example, cationic height can be enumerated
Molecule system dispersing agent, anionic property macromolecular dispersing agent, nonionic macromolecular dispersing agent, pigment derivative type dispersing agent
(dispersing aid) etc..Particularly preferably following cationic macromolecular dispersing agent, with imidazole radicals, pyrrole radicals, pyridyl group,
As the absorption point to pigment, amine value is 1~100mgKOH/g for the functional group of the cationics such as primary, secondary or tertiary amino, and number is divided equally
Range of the son amount 1,000~100,000.Such cationic macromolecular is disclosed in Japanese Unexamined Patent Publication 9-169821 bulletin
The example of dispersing agent.The use level of F ingredient is not particularly limited, and is preferably 1~25 in the solid component of Lightproof composition
Weight %, more preferably 2~15 weight %.1 kind of compound can be used only in F ingredient, also can be used a variety of.It should be noted that picture
High-viscosity material as resinae generally also has the function of making stably dispersing, but does not have dispersion and promote the substance of performance not
As dispersing agent.But the purpose for making stably dispersing is not limited.
It can make to contain solvent (G) in Lightproof composition of the invention.As G component, using well known compound,
Such as it can be used without particular limitation ester series solvent (butyl acetate, cyclohexyl acetate etc.), ketone series solvent (methyl-isobutyl
Ketone, cyclohexanone etc.), ether series solvent (diethylene glycol dimethyl ether, diethylene glycol B ether etc.), alcohol series solvent (3- methoxybutanol,
Tertiary butyl ether of ethylene glycol list etc.), aromatic system solvent (toluene, dimethylbenzene etc.), fatty family solvent, amine series solvent, amide system it is molten
Agent etc..From the angle of safety, it is preferable to use having the solvent of the ester system of propylene glycol skeleton, ether system, such as propylene glycol list
Methyl ether, dihydroxypropane single-ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dimethyl ether, propylene glycol monomethyl ether acetic acid
Ester, propylene glycol monoethyl ether acetate, propylene-glycol diacetate etc..In addition, it is also preferred that the acetic acid 3- methoxybutyl of similar structures,
Acetic acid 3- methoxyl group -3- methylbutyl butenoate, oxalic acid 1,3 butylene glycol ester etc..Solid component concentration about Lightproof composition does not have
There is special limitation, as touch panel Lightproof composition, solid component concentration is generally adjusted to the model of 10~30 weight %
It encloses.In addition, in order to improve the coating of Lightproof composition, boiling point is preferably used in combination under 30~90 weight % normal pressures less than 150 DEG C
The solvent that boiling point is 150 DEG C or more under solvent and 10~70 weight % normal pressures, to control the drying property of Lightproof composition.
Lightproof composition of the invention can according to need containing other any ingredients, such as can contain coloring
Material, filler, resin, additive etc..Here, as coloring material dyestuff, organic pigment, inorganic pigment etc. can be enumerated, as filling out
Material, can enumerate silica, talcum etc., and as resin, it is sub- can to enumerate vinylite, polyester resin, polyamide, polyamides
Polyimide resin, polyurethane resin, polyether resin, melamine resin etc. can enumerate crosslinking agent, surfactant, silane as additive
Coupling agent, viscosity modifier, wetting agent, defoaming agent, antioxidant, ultraviolet absorbing agent etc..It, can as these arbitrary ingredients
To use well known compound with no particular limitation.As touch panel Lightproof composition, surfactant (fluorine system is used
Surfactant, silicone based surfactants etc.), silane coupling agent (3-(glycidyl oxygroup) propyl trimethoxy silicon
Alkane, 3- isocyano propyl-triethoxysilicane, 3- urea propyl-triethoxysilicane, 3- aminopropyl triethoxysilane, 3-(benzene
Base amino) propyl trimethoxy silicane, 3-((methyl) acryloxy) propyl trimethoxy silicane etc.) be advantageous, contain
The total for the amount of having is in the solid component of Lightproof composition preferably using 10 weight % as the upper limit.In addition, have (preferably 2 with
On) compound of sulfenyl also has the effect of improving the performance of photoetching, therefore be useful.
The preparation method of Lightproof composition of the invention is not particularly limited, and can illustrate previously prepared makes the charcoal through insulation processing
Black (B) (it is preferable to use dispersing agent (F)) is scattered in dispersion liquid made of solvent (G) etc., poly- with bonding copolymer (A), light thereto
The method for closing the production Lightproof composition such as initiator and/or dye-sensitized dose (D).In addition, also having makes the charcoal through insulation processing
Black (B) is scattered in the method being dissolved in copolymer (A) etc. in composition obtained by solvent (G).The production of dispersion liquid can be used
The method of well known pigment dispersion, such as the processing using three rollers, kneader, ball mill etc. can be enumerated.
Can be by the way that Lightproof composition of the invention be coated on substrate etc., using up irradiation, heating firing etc. makes it
Solidify and obtains cured film.As the method for coating Lightproof composition, using well known method, such as it can enumerate and utilize rotation
The coating of painting machine, rod coater, slit type coater etc..In addition, it is preferable to use hot plate, pressure Reduction Dryers etc. after coating, carry out
The drying of Lightproof composition.Wherein, it is coated with and dry method is not particularly limited.
Irradiating cured method by light can also be used well known method, for example, can enumerate with xenon lamp, halogen lamp, tungsten lamp,
Ultrahigh pressure mercury lamp, high-pressure sodium lamp, medium pressure mercury lamp, low pressure mercury lamp etc. are the ultraviolet light of light source.It, can when carrying out light irradiation
To use photomask etc. to carry out image exposure, is further handled with developer solution, thus form image on substrate.As development
Liquid is not particularly limited as long as the developer solution for dissolving unexposed portion, insoluble exposed portion, preferably comprises various additions
The alkaline aqueous solution of agent.Here, the alkaline components as developer solution, such as the hydrogen of the carbonate of alkali metal, alkali metal can be enumerated
Oxide, hydroxide of quaternary ammonium salt etc. as additive, such as can enumerate organic solvent, surfactant, defoaming agent, prevent
Mould dose etc..Well known method can also be used in developing method, such as can enumerate immersion development, spray development, magnetic brush development, ultrasonic wave
Development etc..The method of light irradiation and development is also not particularly limited.
In order to further increase solidification film strength, heating firing preferably is carried out after light irradiation.Heat the method fired
Well known method can also be used, such as the processing using hot plate, hot-air oven etc. can be enumerated, be not particularly limited.
Condition of cure about Lightproof composition is not particularly limited, for photocuring, preferably 10~1000mJ/ of progress
cm2Ultraviolet light, for heat cure, carried out preferably at 200~250 DEG C 20~60 minutes heating fire.
It should be noted that as the method for solidifying film production touch panel for using Lightproof composition of the invention, it can benefit
With well known method.
Invention effect
It is excellent that touch panel of the invention with Lightproof composition is capable of forming chemical reagent resistance, light resistance and insulating properties
Different cured film, thus it is exceedingly useful.Particularly through being lithographically formed image, thus touch panel productivity it is excellent this
It is preferred on point.
Hereinafter, by embodiment, the present invention is described in more detail, but the present invention is not limited to these Examples.
[ embodiment 1 ]
(production of Lightproof composition)
Cooperated by composition shown in table 1, mixing is stirred at room temperature, and to be dissolved or dispersed in solid component within 3 hours molten
In agent, Lightproof composition is made.The numerical value of composition be parts by weight, by solid component add up to 100 parts by weight in a manner of remember
It carries.Also there is the ingredient synthesized in the state of being dissolved in solvent (propylene glycol methyl ether acetate) at the beginning in solid component,
The numerical tabular formed at this time is shown as the parts by weight of solid component, and the solvent part brought into is documented in the parts by weight of solvent.In addition,
The dispersion liquid made of solvent of the carbon black dispersion through insulation processing is set (to form: pass through covering resin using dispersing agent is advanced with
By the 25.0 weight % of carbon black of insulation processing, 4.0 weight % of cationic macromolecular dispersing agent, copper phthalocyanine derivative type dispersing agent
1.0 weight %, 70.0 weight % of propylene glycol methyl ether acetate).Ingredient used in the cooperation of embodiment described below.
A-1: the unit { 30 }-by the unit { 14 }-from methacrylic acid from methyl methacrylate comes from methyl
The R that the unit { 20 } of cyclohexyl acrylate-general formula (1) indicates1、R2Be methyl unit { 36 } constitute copolymer (number divide equally
Son amount 10,000, acid value 50mgKOH/g)
(being molar ratio in braces { }, below similarly)
A-2: the unit { 22 }-by the unit { 30 }-from methacrylic acid from methyl methacrylate comes from methyl
The R that the unit { 28 } of cyclohexyl acrylate-general formula (1) indicates1、R2Be methyl unit { 20 } constitute copolymer (number divide equally
Son amount 10,000, acid value 120mgKOH/g)
A-3: the unit { 40 }-by the unit { 10 }-from methacrylic acid from methyl methacrylate comes from propylene
The R that unit { 10 }-general formula (1) of the bicyclic pentane ester of acid indicates1、R2Be methyl unit { 40 } constitute copolymer (number divide equally
Son amount 5,000, acid value 35mgKOH/g)
A-4: unit { 30 }-general formula (1) table by the unit { 20 }-from methacrylic acid from methyl methacrylate
The R shown1、R2It is the copolymer (number-average molecular weight 10,000 5 thousand, acid value 70mgKOH/g) that the unit { 50 } of methyl is constituted
B-1: by covering resin by the carbon black of insulation processing
" A- " " B- " is respectively indicated and A of the invention, the comparable ingredient of B component herein.
C-1: dipentaerythritol hexaacrylate
D-1:(9- ethyl -6- nitrocarbazole -3- base) and 4-(2- methoxyl group -1- methyl ethoxy) -2- aminomethyl phenyl ] first
Ketone=O- acetyl oxime
D-2:1- 9- ethyl -6-(2- methyl benzoyl) and carbazole -3- base ] ethyl ketone=O- acetyl oxime
E-1: phenol novolak-type epoxy compound (society, Mitsubishi Chemical system " jER154 ")
1,2- epoxy -4-(2- the epoxy ethyl of bis- (the methylol)-n-butyl alcohols of E-2:2,2-) hexamethylene addition product (DAICEL
Corporation " EHPE3150 ")
F-1: cationic macromolecular dispersing agent
F-2: copper phthalocyanine derivative type dispersing agent
G-1: propylene glycol methyl ether acetate
G-2: cyclohexanone
" C- " " D- " " E- " " F- " " G- " is respectively indicated and the comparable ingredient of C~G component of the invention herein.
S-1:3- isocyano propyl-triethoxysilicane
S-2: fluorine system surfactant (DIC corporation " MEGAFACE F-556 ")
" S- " indicates any other ingredient used as needed herein.
[table 1]
(evaluation of Lightproof composition: chemical reagent resistance)
Above-mentioned Lightproof composition is coated on alkali-free glass substrate using spin coater, is divided with 90 DEG C of press drying 2
Clock makes test film.At this point, adjusting application conditions (rotary rpm) in a manner of obtaining 1.5 μm of film thickness of cured film.Next,
Via the photomask of the pattern of the frame-shaped with touch panel picture, with illumination 30mW/cm2Ultra high pressure mercury light irradiation 100mJ/
cm2Ultraviolet light (numerical value is on the basis of i ray) to test film carry out image exposure.Thereafter, (new with 25 DEG C of alkaline-based developer
Day iron lives 10 times of dilutions of aurification society system " V-2401ID ") test film is handled 1 minute, further progress, which is washed, makes image
Development.Finally test film is fired 30 minutes with 230 DEG C of hot-air oven, obtains the cured film of Lightproof composition.
The test film for being formed with the cured film of Lightproof composition is immersed in at 60 DEG C the stripper (30% of resist
The mixed liquor of 2- ethylaminoethanol and 70% diethylene glycol monobutyl ether) in 10 minutes, after being washed, being dried, measure the film of cured film
Thickness carries out 3 grade evaluations by following benchmark.Zero (good): be impregnated in the Thickness Variation before and after stripper be 2% hereinafter, ▲ (slightly
It is bad): greater than 2% and for 5% hereinafter, × (bad): greater than 5%.
(evaluation of Lightproof composition: light resistance)
Production is formed with the test film of the cured film of Lightproof composition in the same manner as the evaluation of above-mentioned chemical reagent resistance.With
The xenon lamp of 2.5kW from glass surface to test film irradiate 500 hours after, to cured film progress easily tear cloth rubber belt disbonded test, press
It states benchmark and carries out 3 grade evaluations.Zero: without removing, ▲: see a small amount of removing, ×: see many removings.
(evaluation of Lightproof composition: insulating properties)
Production is formed with the test film of the cured film of Lightproof composition in the same manner as the evaluation of above-mentioned chemical reagent resistance.With
After 230 DEG C of hot-air oven further fires test film 180 minutes, with the surface resistivity of 10V voltage determination cured film, press
Following benchmark carry out 3 grade evaluations.Zero: surface resistivity 1010Ω/sq or more, ▲: it is 108Ω/sq is more than and less than 1010
Ω/sq, ×: less than 108Ω/sq。
(evaluation of Lightproof composition: processability)
Production is formed with the test film of the cured film of Lightproof composition in the same manner as the evaluation of above-mentioned chemical reagent resistance.With
The image that optical microphotograph sem observation is formed carries out 3 grade evaluations by following benchmark.Zero: not finding shortcoming, the development of picture pattern
Residual, ▲: a little shortcoming of discovery, development residual, ×: discovery shortcoming, development residual.
By the Lightproof composition of embodiment 1 evaluation result is shown in table 2.The Lightproof composition of embodiment 1 is all satisfied
Chemical reagent resistance required by touch panel purposes, light resistance and insulating properties, and the processability of photoetching is also excellent.Separately
Outside, the optical density of the cured film of Lightproof composition is 3.1/ μm.
[table 2]
[ embodiment 2~8 ]
The composition of embodiment 1 is changed respectively as shown in table 1, other carry out embodiment 2~8 similarly to Example 1
The production and evaluation of Lightproof composition.Show the results of the evaluation table 2.The Lightproof composition of embodiment 2~8 is all satisfied touch
Chemical reagent resistance required by panel use, light resistance and insulating properties, and the processability of photoetching is also excellent.In addition, closing
It is 3.1/ μm in the optical density of the cured film of Lightproof composition, embodiment 2~4, is 2.4/ μm in embodiment 5~8.
[ comparative example 1~4 ]
The composition of embodiment 1 is changed respectively as shown in table 3, other are compared example 1~4 similarly to Example 1
The production and evaluation of Lightproof composition.Ingredient used in the cooperation of comparative example described below.
AX-1: the unit { 16 }-by the unit { 16 }-from methacrylic acid from methyl methacrylate comes from methyl
The copolymer (number-average molecular weight 10,000, acid value 60mgKOH/g) that the unit { 68 } of benzyl acrylate is constituted
AX-2: the unit { 50 }-by the unit { 18 }-from methacrylic acid from methyl methacrylate comes from methyl
The R that the unit { 20 } of cyclohexyl acrylate-general formula (1) indicates1、R2Be methyl unit { 12 } constitute copolymer (number divide equally
Son amount 10,000, acid value 80mgKOH/g)
AX-3: (aurification society system " V-259ME " is lived to the alkali-developable photosensitive resin with bis-phenol fluorene skeleton by Nippon Steel
Solid component)
BX-1: the not carbon black Jing Guo insulation processing
Here, " AX- " " BX- " respectively indicate be detached from A of the invention, B component range ingredient.
[table 3]
By the Lightproof composition of comparative example 1~4 evaluation result is shown in table 4.The Lightproof composition of comparative example 1~4
It is unable to satisfy each characteristic required by touch panel purposes.
[table 4]
Industrial availability
Lightproof composition of the invention is not only suitable for forming the light shield layer of touch panel, can also be preferably used to form filter
The black matrix of color device, light-proofness solder mask.Additionally, it is believed that can also be used as coating, printing ink, stationery ink, plastics etc.
Coloring components are applied to utilize, or as light absorption material in purposes such as optical filters.
Claims (2)
1. a kind of touch panel Lightproof composition, which is characterized in that containing copolymer A and through the black B of insulation processing,
The copolymer A has multiple repetitive units, the repetitive unit and 10 indicated by 30~90 moles of % the following general formula (1)
1 kind or more of the repetitive unit copolymerization that~70 moles of % can be indicated with the general formula (1) comes from polymerism unsaturation chemical combination
The repetitive unit of object is constituted, and number-average molecular weight is 2,000~20,000 and acid value is 35~120mgKOH/g, and A ingredient is not only by containing
The repetitive unit group of aromatic rings is constituted, and a kind or more for capable of being copolymerized with the repetitive unit of the general formula (1) expression carrys out auto polymerization
Property unsaturated compound repetitive unit unit and (b) by (a) from (methyl) acrylic acid from (methyl) acrylate
Unit is constituted,
Wherein, R1And R2Each independently represent hydrogen atom or methyl.
2. a kind of touch panel, the cured film with touch panel Lightproof composition described in claim 1.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-242525 | 2012-11-02 | ||
| JP2012242525 | 2012-11-02 | ||
| JP2013-213571 | 2013-10-11 | ||
| JP2013213571A JP6529213B2 (en) | 2012-11-02 | 2013-10-11 | Shading composition for touch panel and touch panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103809374A CN103809374A (en) | 2014-05-21 |
| CN103809374B true CN103809374B (en) | 2019-11-05 |
Family
ID=50706356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310530322.2A Active CN103809374B (en) | 2012-11-02 | 2013-10-31 | Touch panel Lightproof composition and touch panel |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR102138381B1 (en) |
| CN (1) | CN103809374B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1507580A (en) * | 2001-07-24 | 2004-06-23 | Jsr株式会社 | Positive type radiosensitive composition and method for forming pattern |
| CN1991584A (en) * | 2005-12-28 | 2007-07-04 | 富士胶片电子材料有限公司 | Light solidification pigmentation composition and color filter, and liquid crystal display device |
| CN101401036A (en) * | 2006-03-14 | 2009-04-01 | 旭化成电子材料元件株式会社 | Photosensitive-resin layered product |
| CN101680984A (en) * | 2007-06-01 | 2010-03-24 | 富士胶片株式会社 | Curable composition for color filter, method for producing curable composition for color filter, colored curable resin composition, method for forming colored pattern, colored pattern, method for prod |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003268053A (en) * | 2002-03-13 | 2003-09-25 | Hitachi Chem Co Ltd | Binder resin for battery and electrode and battery comprising the same |
| CN101709192A (en) * | 2009-11-27 | 2010-05-19 | 深圳市威凯士化工涂料有限公司 | One-component metal photocureable coating capable of being directly used on metal surface and recoated, preparation process and application thereof as metal paint for direct spray coating |
| JP2011186717A (en) | 2010-03-08 | 2011-09-22 | Daiwa Sangyo:Kk | Capacitive touch panel and method of manufacturing the same |
| JP5744528B2 (en) * | 2011-01-11 | 2015-07-08 | 東京応化工業株式会社 | Colored photosensitive resin composition for touch panel, touch panel, and display device |
| TWI466931B (en) * | 2011-03-25 | 2015-01-01 | Toray Industries | Black resin composition, resin black matrix substrate and touch panel |
-
2013
- 2013-10-31 CN CN201310530322.2A patent/CN103809374B/en active Active
- 2013-10-31 KR KR1020130130739A patent/KR102138381B1/en active IP Right Grant
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1507580A (en) * | 2001-07-24 | 2004-06-23 | Jsr株式会社 | Positive type radiosensitive composition and method for forming pattern |
| CN1991584A (en) * | 2005-12-28 | 2007-07-04 | 富士胶片电子材料有限公司 | Light solidification pigmentation composition and color filter, and liquid crystal display device |
| CN101401036A (en) * | 2006-03-14 | 2009-04-01 | 旭化成电子材料元件株式会社 | Photosensitive-resin layered product |
| CN101680984A (en) * | 2007-06-01 | 2010-03-24 | 富士胶片株式会社 | Curable composition for color filter, method for producing curable composition for color filter, colored curable resin composition, method for forming colored pattern, colored pattern, method for prod |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140057172A (en) | 2014-05-12 |
| KR102138381B1 (en) | 2020-07-27 |
| CN103809374A (en) | 2014-05-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101221450B1 (en) | Photosensitive resin composition comprising organic and inorganic compound | |
| KR101998449B1 (en) | Photosensitive black resin composition and resin black matrix substrate | |
| CN105849637B (en) | Photosensitive transfer printing material, pattern forming method and engraving method | |
| KR20070079608A (en) | Negative photosensitive resin composition, liquid crystal display having that curing product, method of forming a pattern of liquid crystal display using the same | |
| KR20060128715A (en) | Negative photosensitive resin composition | |
| CN106104380A (en) | Radiation sensitive resin composition and electronic unit | |
| CN107003604B (en) | Photosensitive resin composition, method for producing color filter, and liquid crystal display device | |
| CN107272341B (en) | Photosensitive resin composition for light-shielding film, substrate for display, and method for producing same | |
| CN105652595A (en) | Black photosensitive resin composition, black matrix and image display device | |
| KR20080013849A (en) | Colored alkali-developable photosensitive resin composition and color filters made by using the same | |
| CN105474096A (en) | Radiation-sensitive resin composition, resin film, and electronic component | |
| CN106909027A (en) | Photosensitive composition, colour filter and its preparation method, image display device | |
| CN103718107A (en) | Negative-type photosensitive resin composition, resin film, and electronic component | |
| CN106164773A (en) | Radiation sensitive resin composition, resin molding and electronic unit | |
| CN104969125B (en) | Radiation-sensitive resin composition and electronic component | |
| CN110520796A (en) | Polymerizable composition, polymerizable composition, black matrix" photosensitive composite and black column spacer photosensitive composite | |
| TWI608301B (en) | Curing resin composition and use thereof | |
| TWI588603B (en) | Light-shielding composition for touch panel and touch panel | |
| JPWO2016031643A1 (en) | Reactive polyester compound and active energy ray-curable resin composition using the same | |
| CN103809374B (en) | Touch panel Lightproof composition and touch panel | |
| JP2016029442A (en) | Photosensitive resin composition for etching resist, wiring pattern of metal film or metal oxide film formed using the same, and touch panel having wiring pattern | |
| CN104914670B (en) | White photosensitive polymer combination, using its hardening thing and containing the hardening thing be constituent touch panel | |
| TWI666518B (en) | Photosensitive resin composition and uses thereof | |
| CN110045578A (en) | Negative light-sensitive resin combination, photocuring film and image display device | |
| WO2022092281A1 (en) | Polymerizable unsaturated group-containing alkali-soluble resin, photosensitive resin composition containing same as essential component, and cured product thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20190125 Address after: Tokyo, Japan, Japan Applicant after: Nippon Iron Chemical Materials Co., Ltd. Address before: Tokyo, Japan, Japan Applicant before: Nippon Steel Chemical Co. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |