CN103797449B

CN103797449B - Optical transparent electrode

Info

Publication number: CN103797449B
Application number: CN201280037890.2A
Authority: CN
Inventors: 吉城武宣
Original assignee: Mitsubishi Paper Mills Ltd
Current assignee: Mitsubishi Paper Mills Ltd
Priority date: 2011-07-29
Filing date: 2012-07-19
Publication date: 2016-11-30
Anticipated expiration: 2032-07-19

Abstract

The invention provides the optical transparent electrode that the observability of a kind of electrode pattern is low.Described optical transparent electrode is made by two panels optical clear conductive material is stacked, and described optical clear conductive material has in the one side of optical clear base material: the big grid 11 formed by reticulated conductive portion；With the connecting portion 12 of adjacent big grid 11 electrical connection, described connecting portion 12 at least has 1 and connects grid 16.Described two panels optical clear conductive material is laid out in the way of the center that makes respective connecting portion 12 is unanimous on the whole, and the most a piece of optical clear conductive material has broken string grid 31, in the connecting portion 12 of the described broken string grid 31 optical transparent electrode when corresponding to described stacked making and/or on the position of big grid 11 and connecting portion 12 peripheral part, a part for fine rule breaks and loses electrical conductance.

Description

Optical transparent electrode

Technical field

The present invention relates to the optical transparent electrode of touch screen, especially, the present invention relates to can be highly suitable for throwing Penetrate the optical transparent electrode of capacitive touch screen.

Background technology

At personal digital assistant (PDA), notebook computer, office automation (OA) equipment, armarium or auto navigation In the electronic equipments such as system, extensively application touch screen is as the display of the said equipment and input medium.

According to the mode of position detection, touch screen has optical profile type, ultrasonic type, condenser type, resistance membrane type etc..Resistance membrane type Touch screen has following structure: optical clear conductive material and the glass with transparent conductor layer are oppositely arranged across pad, electricity Stream flows through optical clear conductive material, measures the voltage at the glass with transparent conductor layer.On the other hand, capacitive touch screen On optical clear base material, there is transparent conductor layer as basic structure, it is characterised in that there is no movable part, due to described Capacitive touch screen has high durability and high transmission rate, thus is applicable to the most vehicle-mounted purposes etc..

As the transparency electrode (optical clear conductive material) of touch screen purposes, it is generally used for shape on optical clear base material Become the optical clear conductive material of the optical clear conducting film being made up of ITO.But, the index of refraction of ITO conducting film is big, the table of light Face reflection is big, causes the problem that total light transmittance is low；Further, since the flexibility of ITO conducting film is low, be full of cracks can be produced when bending, Cause the problem that resistance raises.

The alternatively optical clear conductive material with optical clear conducting film of ITO, such as, patent documentation 1, patent Document 2 etc. discloses a kind of semi-additive process forming conductive pattern, and described method forms thin catalyst layer on substrate, After forming corrosion-resisting pattern on described catalyst layer, utilize galvanoplastic at peristome laminated metal layer against corrosion, resist finally by removing Erosion layer and the underlying metal protected by this resist layer, form conductive pattern.

Additionally, in recent years, the method proposing to use silver salt diffusion transfer method, described method uses silver halide photography sensitive material As conductive material precursor.Such as, patent documentation 3, patent documentation 4, patent documentation 5 etc. disclose a kind of formation argent figure The technology of case, this technology, on conductive material precursor, makes soluble silver salt forming agent and reducing agent mutual in alkaline solution Effect, forms argent pattern, and wherein, described conductive material precursor has physics on optical clear base material the most successively and shows Shadow stratum nucleare and silver halide emulsion layer.The pattern obtained by the way can reproduce homogeneous live width, additionally, silver be electric conductivity High metal, compared with other modes, can obtain high conductivity by thinner live width, therefore, it can obtain total light transmittance High and that resistance is low optical clear conductive material.Additionally, further, compared with ITO conducting film, obtained by said method The advantage that optical clear conductive material has flexible height, bending resistance is strong.

Use projected capacitive touch screen, two panels optical clear conductive material is manufactured touch sensing in the way of laminating Device, wherein, described optical clear conductive material uses multiple electrodes to form pattern at grade.Owing to touch screen is typically Operator stares screen operation, if there is the position that total light transmittance is different, it may appear that electrode pattern is mapped to eyes (observability High) problem.The capacitive touch screen optically transparent material by transversely arranged electrode and the optical clear material of longitudinal arrangement electrode Material is stacked to be used, and therefore, in any case the stacked of upper/lower electrode, the total light transmittance step-down of overlapping part all can occur, there is electricity Pole pattern Mapping is to the problem of eyes (observability is high).Additionally, in projected capacitive touch screen, use by than relatively large just The main electrode portion of the compositions such as square or rhombus and the connecting portion of little area electrically connected with adjacent main electrode portion are alternately repeated The electrode that constitutes of structure, two panels optical clear conductive material is stacked so that the connecting portion of little area is stacked, typically can reduce total The area at the position that light transmittance is different, but well-content effect can not be obtained, thus to be improved.

For these problems, such as, patent documentation 6 and patent documentation 7 etc. disclose the conduction of middle grid zigzag arrangement Sheet, wherein, described middle grid has the lattice spacing of n times of sub-box, and described sub-box constitutes the big grid as main electrode. But, in the case of using this technology, although produce between upper/lower electrode stacked can be improved, but between upper/lower electrode Apex can produce the point that there is not pattern, and the picture of touch screen produces harsh feeling, remains to be further improved.

Prior art literature

Patent documentation

Patent documentation 1: the open 2007-287994 publication of Japanese patent application

Patent documentation 2: the open 2007-287953 publication of Japanese patent application

Patent documentation 3: the open 2003-77350 publication of Japanese patent application

Patent documentation 4: the open 2005-250169 publication of Japanese patent application

Patent documentation 5: the open 2007-188655 publication of Japanese patent application

Patent documentation 6: the open 2011-129501 publication of Japanese patent application

Patent documentation 7: the open 2011-113149 publication of Japanese patent application

Summary of the invention

The present invention provides a kind of the optical transparent electrode being adapted as projected capacitive touch screen, electrode pattern visible The optical transparent electrode of property low (user of touch screen is difficult to see that electrode pattern).

The above-mentioned problem of the present invention is realized by following invention:

(1) a kind of optical transparent electrode, described optical transparent electrode is by stacked making of two panels optical clear conductive material Becoming, described optical clear conductive material has in the one side of optical clear base material: the big grid formed by reticulated conductive portion；Extremely Having 1 connecting portion connecting grid less, described connecting portion is electrically connected between adjacent big grid；

It is characterized in that, by described two panels optical clear conductive material so that the side that each center of connecting portion is unanimous on the whole Formula is laid out, and the most a piece of optical clear conductive material has broken string grid, and described broken string grid is corresponding to described folded In the described connecting portion of optical transparent electrode when putting making and/or described big grid and the position of described connecting portion peripheral part On, a part for fine rule breaks and loses electrical conductance.

(2) a kind of optical transparent electrode, described optical transparent electrode has on the two sides of optical clear base material: by netted The big grid that conductive part is formed；At least having 1 connecting portion connecting grid, described connecting portion enters between adjacent big grid Row electrical connection；

It is characterized in that, the center of the connecting portion that the center of connecting portion one side being had has with another side is with substantially one The mode caused is configured, and has broken string grid at least one side, described broken string grid in corresponding to described connecting portion and/ Or on the position of described big grid and described connecting portion peripheral part, a part for fine rule breaks and loses electrical conductance.

(3) optical transparent electrode recorded such as above-mentioned (1), it is characterised in that described two panels optical clear conductive material is each From varying in size of the connecting portion having, and described in the shape broadly similar of connecting portion that varies in size.

(4) optical transparent electrode recorded such as above-mentioned (2), it is characterised in that the one side of described optical clear base material with separately The varying in size of connecting portion that one side has, and described in the shape broadly similar of connecting portion that varies in size.

(5) optical transparent electrode recorded such as above-mentioned (1) or (2), it is characterised in that described formed by reticulated conductive portion The difference of the aperture opening ratio of big grid and non-conductive portion is within 1%, and described non-conductive portion has broken string grid, in described broken string grid A part for fine rule breaks and loses electrical conductance.

(6) optical transparent electrode recorded such as above-mentioned (1) or (2), it is characterised in that described big grid is by multiple Unit Cell Son is constituted, and the fine rule spacing of described unit lattice is the 80～120% of the fine rule spacing of described broken string grid.

Pass through the present invention, it is possible to provide a kind of optical transparent electrode being adapted as projected capacitive touch screen, electrode figure The optical transparent electrode of the observability low (user of touch screen is difficult to see that electrode pattern) of case.

Accompanying drawing explanation

[Fig. 1] Fig. 1 (a)～(c) represent that two panels optical clear conductive material is stacked the optical lens of the present invention being made The figure of the example repeating electrode pattern that prescribed electrode is had.Fig. 1 (a) represents what a piece of optical clear conductive material had The figure of the example repeating electrode pattern of big grid and connecting portion；Fig. 1 (b) represents that another sheet optical clear conductive material has The big grid having and the figure of the example repeating electrode pattern of connecting portion；Fig. 1 (c) will be for having Fig. 1 (a) and Fig. 1 (b) institute Figure after the center of the connecting portion of the optical clear conductive material of the electrode pattern shown is stacked in the way of unanimous on the whole.

[Fig. 2] Fig. 2 (a) is the figure after a part of Fig. 1 (a) being amplified；Fig. 2 (b) is by the part amplification of Fig. 1 (b) After figure；Fig. 2 (c) be by the center of Fig. 2 (a) and the connecting portion of the electrode pattern of Fig. 2 (b) in the way of unanimous on the whole stacked after Figure；Fig. 2 (d) is the figure after multiple unit lattice being amplified；Fig. 2 (e) represents the figure of the connecting portion of Fig. 2 (a)；Fig. 2 (f) represents The figure of the connecting portion of Fig. 2 (b)；Fig. 2 (g) is the figure after a part of Fig. 1 (c) being amplified.

[Fig. 3] Fig. 3 (a) represents the figure of the example arranging broken string grid in the electrode pattern of Fig. 2 (c)；Fig. 3 (b) Represent the figure of the example that broken string grid is set in the electrode pattern of Fig. 2 (a)；Fig. 3 (c) represents and obtains Fig. 3's (a) Electrode pattern, by the figure of an example of 2 molecular electrode patterns of big lattice；Fig. 3 (d) represents the electrode figure at Fig. 2 (a) Case arranges the figure of other examples of broken string grid；Fig. 3 (e) expression arranges the one of broken string grid in the electrode pattern of Fig. 2 (b) The figure of individual example；Fig. 3 (f) represents the electrode pattern obtaining Fig. 3 (a), by other of 2 molecular electrode patterns of big lattice The figure of example；Fig. 3 (g) represents the figure of other examples arranging broken string grid in the electrode pattern of Fig. 2 (b).

[Fig. 4] Fig. 4 represents the figure after being amplified by the non-conductive portion being made up of broken string grid.

[Fig. 5] Fig. 5 (a) represents the figure of the example arranging adjacent grid at the electrode pattern of Fig. 2 (a)；Fig. 5 (b) Represent the figure of the example that adjacent grid is set at the electrode pattern of Fig. 2 (b)；Fig. 5 (c) is by Fig. 5 (a) and Fig. 5 (b) Figure after the center of the connecting portion of electrode pattern is stacked in the way of unanimous on the whole；The connecting portion of Fig. 5 (a) is taken by Fig. 5 (d) expression Figure after going out and amplifying.

[Fig. 6] Fig. 6 (a)～(c) are illustrated respectively at the electrode pattern of Fig. 5 (a)～(c) the electrode figure arranging broken string grid The figure of one example of case.

[Fig. 7] Fig. 7 (a)～(c) represent the 3 of the optical transparent electrode of the present invention with two panels optical clear conductive material The diagrammatic, cross-sectional figure of individual different instances.

[Fig. 8] Fig. 8 represents an example of the optical transparent electrode of the present invention with a piece of optical clear conductive material Diagrammatic, cross-sectional figure.

[Fig. 9] Fig. 9 represents the electrode pattern of embodiment 1.Big grid and connecting portion are carried out by Fig. 9 (a) and Fig. 9 (b) expression The figure of one example of the partial electrode pattern of electrical connection；Fig. 9 (c) and Fig. 9 (d) represents that big grid and connecting portion are electrically connected The figure of one example of the partial electrode pattern connect；Fig. 9 (e) represents the electrode pattern big grid and connecting portion being electrically connected Example amplify after figure；Fig. 9 (f) represents an example of the electrode pattern that big grid and connecting portion be not electrically connected Figure after amplification.

[Figure 10] Figure 10 represents the electrode pattern of embodiment 2.Figure 10 (a) and Figure 10 (b) represents big grid and connecting portion The figure of one example of the partial electrode pattern being electrically connected；Big grid and connecting portion are electrically connected by Figure 10 (c) expression The figure of an example of electrode pattern.

[Figure 11] Figure 11 represents the electrode pattern of embodiment 3.Figure 11 (a) and Figure 11 (b) represents big grid and connecting portion The figure of one example of the partial electrode pattern being electrically connected；Figure 11 (c) and Figure 11 (d) represents that big grid and connecting portion do not enter The figure of one example of the partial electrode pattern of row electrical connection；Big grid and connecting portion are electrically connected by Figure 11 (e) expression The figure of one example of electrode pattern；Figure 11 (f) represents of the electrode pattern that big grid and connecting portion be not electrically connected The figure of example.

[Figure 12] Figure 12 represents the electrode pattern of embodiment 4.Figure 12 (a) and Figure 12 (b) represents big grid and connecting portion The figure of one example of the partial electrode pattern being electrically connected；Figure 12 (c) and Figure 12 (d) represents that big grid and connecting portion do not enter The figure of one example of the partial electrode pattern of row electrical connection；Big grid and connecting portion are electrically connected by Figure 12 (e) expression The figure of one example of electrode pattern；Figure 12 (f) represents of the electrode pattern that big grid and connecting portion be not electrically connected The figure of example.

[Figure 13] Figure 13 represents the electrode pattern of comparative example 1.Figure 13 (a) and Figure 13 (b) represents big grid and connecting portion The figure of one example of the partial electrode pattern being electrically connected；Figure 13 (c) and Figure 13 (d) represents that big grid and connecting portion do not enter The figure of one example of the partial electrode pattern of row electrical connection；Figure 13 (e) represents the electricity that big grid and connecting portion are electrically connected The figure of one example of pole pattern；Figure 13 (f) represents a reality of the electrode pattern that big grid and connecting portion be not electrically connected The figure of example.

[Figure 14] Figure 14 represents the electrode pattern of comparative example 2.Figure 14 (a) and Figure 14 (b) represents big grid and connecting portion The figure of one example of the partial electrode pattern being electrically connected；Figure 14 (c) and Figure 14 (d) represents that big grid and connecting portion do not enter The figure of one example of the partial electrode pattern of row electrical connection；Big grid and connecting portion are electrically connected by Figure 14 (e) expression The figure of one example of electrode pattern；Figure 14 (f) represents of the electrode pattern that big grid and connecting portion be not electrically connected The figure of example.

[Figure 15] Figure 15 is the figure of explanation broken string degree.Figure 15 (a) indicates the figure of the mesh electrode pattern without disconnection portion；Figure 15 (b)～(d) represents the figure of other examples of the mesh electrode pattern that broken string degree is different.

[Figure 16] Figure 16 is the figure of explanation broken string degree.

Detailed description of the invention

First, optical transparent electrode is described in detail.Described optical transparent electrode is by two panels optical clear conduction material Material is stacked to be made, and described optical clear conductive material has in the one side of optical clear base material: by reticulated conductive portion shape The big grid become；At least having 1 connecting portion connecting grid, described connecting portion is electrically connected between adjacent big grid Connect.

Fig. 1 (a)～(c) represent that two panels optical clear conductive material is stacked the optical transparent electrode of the present invention being made The figure of the example repeating electrode pattern having.Fig. 1 (a) represent big grid that a piece of optical clear conductive material has and The figure of the example repeating electrode pattern of connecting portion；Fig. 1 (b) represents the big lattice that another sheet optical clear conductive material has The figure of the example repeating electrode pattern of son and connecting portion；Fig. 1 (c) will be for having the electrode shown in Fig. 1 (a) and Fig. 1 (b) Figure after the center of the connecting portion of the optical clear conductive material of pattern is stacked in the way of unanimous on the whole.

In Fig. 1 (a), big grid 11 and connecting portion 12 are arranged on optical clear base material 1a, by reticulated conductive portion shape The big grid 11 become is longitudinally connected by the connecting portion 12 being electrically connected between big grid 11.On the other hand, at Fig. 1 (b) In, the big grid 11 formed by reticulated conductive portion arranged on optical clear base material 1b is by carrying out electricity between big grid 11 Connecting portion 12 lateral connection connected.Then, the optical transparent electrode of the present invention will be by having big grid 11 He of Fig. 1 (a) The optical clear conductive material 3a repeating electrode pattern of connecting portion 12 with there is the big grid 11 of Fig. 1 (b) and connecting portion 12 The optical clear conductive material 3b repeating electrode pattern intersects vertically according to electrode pattern direction respectively, makes in respective connecting portion The heart overlaps in the way of unanimous on the whole, obtains being applicable to the optical transparent electrode of projected capacitive touch screen.Fig. 1 (c) represents to be made The figure of the state after optical clear conductive material 3a Yu 3b overlapping.

In Fig. 2 (a), (b), big grid 11 is to be arranged in netted by multiple unit lattice 20 and formed.As Unit Cell The shape of son 20, such as, can be listed below the shape after combination of shapes: equilateral triangle, isosceles triangle, right angled triangle etc. Triangle；Square, rectangle, rhombus, parallelogram, the tetragon such as trapezoidal；(just) hexagon, (just) octagon, (just) (just) n limit shapes such as dodecagon, (just) icosagon；Circle；Oval；Star etc..Individually repeat above-mentioned shape additionally, enumerate or incite somebody to action Various shape of more than two kinds combines.Multiple such unit lattice 20 are combined and forms the big grid formed by reticulated conductive portion 11.Wherein, as the shape of unit lattice 20, it is preferably square or rhombus, additionally, unit lattice 20 is preferably and big grid The shape that the shape of the outer perimeter section of 11 is substantially similar.Additionally, as described later, substantially similar shape described herein includes leading to Crossing connecting portion 12 by when being electrically connected between big grid 11, connecting portion 12 puts under the form of big grid 11, along with above-mentioned Put in, the situation that shape that the shape of the outer perimeter section of big grid 11 is not changed in is similar.

The fine rule width of unit lattice 20 is preferably below 20 μm, more preferably 1～10 μm.Additionally, unit lattice The fine rule spacing of 20 is preferably below 500 μm, more preferably below 300 μm.Further, unit lattice 20 formed The aperture opening ratio of big grid 11 is preferably more than 85%, and more preferably 88～97%.For the fine rule width of unit lattice 20, Such as, when unit lattice is square, the fine rule width of unit lattice 20 is the foursquare of the described unit lattice 20 of composition The width on limit；For the fine rule spacing of unit lattice 20, such as, when unit lattice is square, the fine rule of unit lattice 20 Spacing is the distance between relative limit and limit.The aperture opening ratio of big grid 11 refers to: remove thin thread part from the gross area (with reference to figure The symbol 4 of 4) after the ratio of area and the gross area, the described gross area is the gross area of the whole unit lattice constituting big grid (comprising thin thread part).

Connecting portion 12 in the present invention only can be made up of connection grid 16 as shown in Fig. 2 (a), it is also possible to such as Fig. 2 (b) Shown in constitute by connecting grid 16 and attached adjacent grid 17 thereof.Fig. 2 (e) is easy for explanation, only by the connecting portion of Fig. 2 (a) 12 figures taken out；Fig. 2 (f) is the figure after only being taken out by the connecting portion 12 of Fig. 2 (b).When shown in Fig. 2 (e), connecting portion 12 are only made up of connection grid 16, but in Fig. 2 (f), connecting portion 12 is connected grid 16 by 1 and 2 adjacent grid 17 are constituted. In the present invention, the part of such with adjacent big grid 11 electrical connection is but not belonging to the big lattice being made up of unit lattice 20 The part of son 11, belongs to connecting portion 12.

It follows that illustrate connecting grid 16.Connect the shape of grid 16, such as, enumerate following combination of shapes After shape: equilateral triangle, isosceles triangle, right angled triangle equilateral triangle；Square, rectangle, rhombus, parallel four limits Shape, the tetragon such as trapezoidal；(just) (just) n limit shape such as hexagon, (just) octagon, (just) dodecagon, (just) icosagon；Circle Shape, ellipse, star etc..Individually repeat above-mentioned shape additionally, enumerate or various shape of more than two kinds is combined.Wherein, it is preferably Square or rhombus.Further, connect grid 16 is preferably shaped to the shape substantially similar with above-mentioned big grid 11.

In the present invention, by two panels optical clear conductive material in the way of the center that makes respective connecting portion 12 is unanimous on the whole It is laid out.In Fig. 2 (a) and Fig. 2 (b), the central point 15 of connecting portion is present in adjacent 2 electrically connected by connecting portion 12 On the central point connecting line 13 of big grid 11 and 11, and the centre of the central point 14 of the most adjacent 2 big grid 11 and 11 Position.Additionally, the central point 15 of connecting portion may also deviate from the centre position of the central point 14 of adjacent 2 big grid 11 and 11, only Distance to be deviateed is the distance of less than the 20% of an edge lengths of the unit lattice 20 constituting big grid 11, is preferably 10% Following distance.In the present invention, such state is recited as " unanimous on the whole ".

Connect an edge lengths of grid 16 preferably to constitute n times of an edge lengths of unit lattice 20 of big grid 11 (n is Integer) 95～105% in the range of.As shown in Fig. 2 (c), when stacked two panels optical clear conductive material, connect grid 16 An edge lengths more than distance 18,19 between adjacent 2 big grid 11 and 11 time, such as the situation shown in Fig. 2 (a), becomes Connect grid 16 and put in the form of big grid 11, in adjacent big grid 11, with the stacked part of connection grid 16 put in Unit lattice is left out.On the other hand, when the distance connected between the big grid in a length of adjacent 2 11 and 11 of grid 16 18, less than 19 time, the such as situation shown in Fig. 2 (b), with connect the form that grid 16 connects to arrange adjacent grid 17 be also this Invent preferred form.The most adjacent grid 17 is m times of one side of unit grid 20, n times of another side (m, n are integer, m Equal with n, unequal) form.One edge lengths of adjacent grid 17 preferably constitutes the unit lattice 20 of big grid 11 An edge lengths n times (n is integer) 95～105% in the range of.As shown in Fig. 2 (b), when the length of side connecting grid 16 When degree is distance 18, less than 19 between 2 adjacent big grid 11 and 11, becomes adjacent grid 17 and put in the shape of big grid 11 State, constitutes and is left out with the unit lattice 20 of the big grid 11 of adjacent grid 17 overlapping part.Connect grid 16 and adjacent grid The fine rule width of 17 is preferably the fine rule width of below 20 μm, more preferably 1～10 μm, more preferably unit lattice 20 1～2 times.Additionally, only connect grid 16 and one side of adjacent grid 17 or only connect grid 16 and the one of adjacent grid 17 The part on limit, live width can be thicker.

As it has been described above, Fig. 2 (c) is with unanimous on the whole by the center of Fig. 2 (a) and the connecting portion of the electrode pattern of Fig. 2 (b) The figure that mode is stacked.Connection grid 16 from Fig. 2 (a) and the central point 15 connecting grid 16 from Fig. 2 (b) are to deviate shape Become the unit lattice 20 of big grid 11 an edge lengths less than 20%, be preferably offset by less than 10% mode the most unanimous on the whole It is laid out.From the connection grid 16 of Fig. 2 (a) and connect the varying in size of grid 16 from Fig. 2 (b), but in the present invention In, 2 preferably stacked connection grid vary in size such situation.As such, it is possible to make the observability of the electrode pattern being stacked Lower (user of touch screen is difficult to see that electrode pattern).

As it was previously stated, the connection of optical clear conductive material 3a and 3b of the electrode pattern of Fig. 1 (a) and Fig. 1 (b) will be had The electrode pattern when center in portion 12 is stacked in the way of unanimous on the whole is (in Fig. 1 (c), around big grid 11 and connecting portion 12 Part is as being left white part.Fig. 2 (g) is the figure after a part of Fig. 1 (c) being amplified, and further, Fig. 2 (c) is by Fig. 2 (g) A part amplify after figure (with reference to Fig. 2 (c) and the symbol 21 of Fig. 2 (g))).When there is described big grid 11 and connecting portion 12 Around when being left white part 21, described in be left white the total light transmittance of part different from the total light transmittance of big grid 11, the most easily draw Rise and note, it is impossible to obtain the optical transparent electrode that electrode pattern observability is low.

Fig. 3 (a) represents the figure of the example arranging broken string grid in the electrode pattern of Fig. 2 (c), Fig. 3 (b) and Fig. 3 D () represents the figure of other examples arranging broken string grid in the electrode pattern of Fig. 2 (a), Fig. 3 (e) and Fig. 3 (g) represents at Fig. 2 B the electrode pattern of () arranges the figure of other examples of broken string grid.Fig. 4 represents to be put the non-conductive portion being made up of broken string grid Figure after great.

In the optical transparent electrode of the present invention, the big grid 11 of multiple unit lattice 20 composition and multiple broken string grid 31 Within the difference of aperture opening ratio of the non-conductive portion constituted is preferably 1%, within more preferably 0.78%, particularly preferably 0.5% with In.Aperture opening ratio in the present invention is such as the definition of International Publication text [0018] section, in other words, i.e. without the face of part in metal portion It is long-pending that relative to specific part, (it is non-that big grid 11 that such as, multiple unit lattice 20 are constituted or multiple broken string grid 31 are constituted Conductive part) the ratio of the gross area.Such as, for obtaining the electrode pattern of Fig. 3 (a), by the electrode pattern group of Fig. 3 (b) He Fig. 3 (c) Closing, Fig. 3 (b) is to be formed by 2 big grid 11 (conductive part) and 4 parts (non-conductive portion) being made up of multiple broken string grid 31 Pattern, Fig. 3 (c) is the pattern formed by 2 big grid 11 (conductive part).Can be according to International Publication text [0018] Duan Ding The method of justice obtains the aperture opening ratio of the big grid 11 (conductive part) being made up of multiple unit lattice 20.Furthermore, it is possible to according to following Explanation, try to achieve the aperture opening ratio of non-conductive portion being made up of broken string grid 31.

Broken string grid refers to the grid that the trellised fine rule of structure breaks.In the diagram, in the way of adjacent with conductive part, logical Crossing existence broken string grid 31 and form non-conductive portion 6, in described conductive part, the thin thread part 4 of component unit grid 20 is continuous print, Described broken string grid 31 is made up of the thin thread part 5 broken.The aperture opening ratio of described non-conductive portion 6 refers to: from described non-conductive portion 6 The ratio of the area removing the part after the thin thread part 5 of broken string in area and the area of the non-conductive portion 6 of the thin thread part 5 comprising broken string Value.

Additionally, account for the biggest grid with the area sum of the difference of the aperture opening ratio of non-conductive portion big grid 11 within 1% More than the 80% of 11 area sums, moreover it is preferred that with the face of the difference of the aperture opening ratio of the conductive part non-conductive portion within 1% Long-pending sum accounts for more than the 80% of the area sum of whole non-conductive portion.Further, the aperture opening ratio of more preferably whole big grid 11 Equal, and the aperture opening ratio of whole non-conductive portion is equal.But, during computationally stating aperture opening ratio, ignore at electrode pattern In the logo portion etc. that arbitrarily arranges.

Big grid 11 and non-conductive portion use the unit lattice of same shape, arrange broken string grid 31 at non-conductive portion, disconnected Line grid is made up of the thin thread part broken, and therefore, the aperture opening ratio of non-conductive portion uprises.For making opening of big grid 11 and non-conductive portion The difference of mouth rate, within 1%, can use the ratio of the disconnection portion reducing non-conductive portion to suppress by the peristome caused by disconnection portion Area occupation ratio raise method；Or, use the shape of the unit lattice 20 changing big grid 11 and non-conductive portion, big grid 11 The pattern using the unit lattice 20 with high aperture compensates the aperture opening ratio rising owing to using broken string grid 31 to cause Method etc..

Broken string grid 31 (being represented by dashed line in Fig. 3) is made up of by electrically disconnected thin thread part 5 part for line, as long as greatly Between grid 11 or between connecting portion 12 or form electrically disconnected such disconnection portion between grid 11 and connecting portion 12 greatly, Form disconnection portion in which way.Broken string degree is unrelated with the length of disconnection portion, draws and is assigned to each broken string grid The ratio of the number of disconnection portion, as broken string degree.During additionally, cross over multiple broken string grid for disconnection portion, disconnected The number in line portion is calculated by the number of the broken string grid divided by these disconnection portion total.Further, the most equal when disconnection portion Etc. ground when being assigned to each structure further, the average outage degree of the minimum repetitive of the structure further containing disconnection portion is made Broken string degree for non-conductive portion.

Figure 15 is the explanatory diagram of broken string degree, and Figure 15 (a) indicates the figure of the mesh electrode pattern without disconnection portion, Figure 15 (b) ～(d) represents the figure of other examples of the different mesh electrode pattern of broken string degree.Figure 15 (a) indicates the netted electricity without disconnection portion The figure of pole pattern, so broken string degree is 0%., in structure further (square), there are 2 disconnection portion in the situation of Figure 15 (b) 51, but this disconnection portion 51 is common by two structure further, thus, 1 disconnection portion becomes 1/2 in each structure further, As broken string degree, it is designated as (1/2) × 2=100%.The situation of Figure 15 (c), disconnection portion 51 is common by four structure further, Thus, 1 disconnection portion becomes 1/4 in each structure further, owing to four angles of structure further all exist disconnection portion 51, makees It is designated as (1/4) × 4=100% for broken string degree.Additionally, such as, as shown in Figure 15 (d) by 5 × 5 foursquare unit figure The net-like pattern that shape is formed, but disconnection portion 51 is incomplete same in structure further, the square that the thick line of Figure 15 (d) surrounds Part 52 is to repeat.In this case, for the square portion 52 being made up of 4 structure further, because of by four 1/4 Disconnection portion and 1 disconnection portion constitute, so broken string degree is designated as ((1/4) × 4+1 × 1) ÷ 4=50%.Figure 16 is same It is the figure that broken string degree is described, the square portion 53 there is identical broken string pattern, being made up of foursquare structure further Repetitive structure.In such cases, broken string degree is designated as (1/4 × 4+1/2 × 12+1 × 15) ÷ 64=34.375%.

In the present invention, the broken string degree of non-conductive portion is preferably more than 20%.Additionally, utilize the four-terminal method of JISK7134 (terminal pitch 5mm) measure non-conductive portion square resistance time, resistance value be preferably 10K Ω/more than, more preferably 1M Ω/ More than, more preferably 1G Ω/more than, be preferably used the non-conductive portion belonging to so-called insulator field.

The fine rule width (width of the thin thread part 5 of the broken string shown in Fig. 4) of the broken string grid 31 that non-conductive portion has is preferred It is below 20 μm, more preferably 1～10 μm.Additionally, the fine rule spacing of broken string grid 31 (with reference to the symbol L of Fig. 4) is preferably It is below 500 μm, more preferably below 300 μm.The broken string part (with reference to symbol D1, D2 of Fig. 4) of broken string grid 31 Length is preferably below 30 μm, more preferably below 151 μm.Disconnection portion can break, also with fine rule with intersecting vertically Can break sideling.Additionally, the fine rule spacing of above-mentioned unit lattice 20 be preferably broken string grid 31 fine rule spacing 80～ 120%.Further, when two panels optical clear conductive material is stacked, the aperture opening ratio of big grid 11, the aperture opening ratio of connecting portion 12 It is preferably all within 1% with the aperture opening ratio difference each other of broken string grid 31.

When two panels optical clear conductive material is stacked, has and multiple can obtain the electrode pattern shown in above-mentioned Fig. 3 (a) Method.As obtaining the example of such electrode pattern, such as, enumerate by as Fig. 3 (b) and the electrode pattern shown in Fig. 3 (c) with Mode unanimous on the whole is laid out, or is carried out in the way of unanimous on the whole by the electrode pattern as shown in Fig. 3 (d) and Fig. 3 (e) Stacked, or the method that the electrode pattern as shown in Fig. 3 (f) and Fig. 3 (g) is laid out in the way of unanimous on the whole.As above-mentioned Shown in example, it is preferable that broken string grid 31 with stacked between broken string grid and time two panels optical clear conductive material is stacked with Constitute 95～the mode of size of 105% of the unit lattice 20 of big grid 11, form grid (the broken string lattice comprising disconnection portion Son).

Fig. 5 (a)～(c) represent the figure of an example of the electrode pattern with adjacent grid, for making explanation easy to understand, Do not represent broken string grid.Fig. 5 (a) represents the figure of the example arranging adjacent grid 17a in the electrode pattern of Fig. 2 (a), Fig. 5 (b) represents the figure of the example arranging adjacent grid 17b in the electrode pattern of Fig. 2 (b), further, Fig. 5 (c) For the figure after the center of Fig. 5 (a) and the connecting portion of the electrode pattern of Fig. 5 (b) is stacked in the way of unanimous on the whole.By above-mentioned can See, for making connecting portion 12 be electrically connected with adjacent 2 big grid 11 by a plurality of route, adjacent grid is set.To this end, preferably set Put adjacent grid to contact with connection grid 16 and other adjacent grid, or connection grid 16 contacts with big grid 11, or other phases Adjacent grid contacts with another other adjacent grid.In addition it is also possible to the mode putting in connection grid 16 or other adjacent grid sets Put adjacent grid.Fig. 5 (d) illustrates that the figure only taken out by the connecting portion 12 of Fig. 5 (a).As shown in Fig. 5 (d), adjacent grid 17a is 171～176 total 6.In the way of making to contact with big grid 11 (not shown) and adjacent grid 172, phase is set Adjacent grid 171.In the way of making to contact with adjacent grid 171, big grid 11 (not shown) and adjacent grid 173, phase is set Adjacent grid 172.The alignment of both adjacent grid 173 and adjacent grid 174 constitutes connection grid 16, so that with big grid 11 (in figure Not showing) the most adjacent adjacent mode of adjacent grid 172,175 arranges adjacent grid 173 and adjacent grid 174.So that with The mode that adjacent grid 174, big grid 11 (not shown) contact with adjacent grid 176 arranges adjacent grid 175.So that with The mode that adjacent grid 175 contacts with big grid 11 (not shown) arranges adjacent grid 176.

Shown in the electrode pattern of the Fig. 5 (c) after the electrode pattern of Fig. 5 (a) and the electrode pattern of Fig. 5 (b) are stacked, excellent The adjacent grid 17a that choosing is arranged in a piece of electrode pattern and the adjacent grid 17b being arranged in the electrode pattern of another sheet Mutually it is not stacked.Once electrode pattern is stacked, and the total light transmittance step-down of overlapping part easily makes electrode pattern mirror as entirety Eyes.Additionally, the fine rule width of adjacent grid 17a Yu 17b and fine rule spacing are preferably International Publication text [0018th] section note The scope identical with unit lattice carried.

Fig. 6 (a)～(c) represent of the electrode pattern adding broken string grid in the electrode pattern of Fig. 5 (a)～(c) The figure of example.By the electrode pattern of Fig. 6 (a) and the electrode pattern of Fig. 6 (b) are laid out, can make such as Fig. 6 (c) institute The whole the most nonoverlapping electrode pattern of line shown.

Fig. 7 (a)～(c) are three kinds of differences of the optical transparent electrode of the present invention with two panels optical clear conductive material The schematic diagrammatic, cross-sectional figure of example.Optical transparent electrode 100a～100c of the present invention is two panels optical clear conduction material Material 3 is made by adhesive phase 2 is stacked.1 is optical clear base material.As the binding agent of composition adhesive phase 2, can make Use known binding agent, such as acrylic adhesive；Polyurethane series binding agent；Or use thermoplastic resin, such as EVA or PVB；Polyurethane series hotmelt；Thermosetting resin, such as epoxy resin or thermosetting polyurethane resin；Ultraviolet hardening Known binding agent such as resin, such as acrylic acid series ultraviolet curable resin, epoxy ultraviolet curable resin etc..As optical lens The stacked direction of bright conductive material 3, can be to use any one following form: the optical clear conduction material as shown in Fig. 7 (a) The back side (not having the face of conductive part 61) of material 3 is relative with surface (having the face of conductive part 61), optical clear as shown in Fig. 7 (b) The back side of conductive material 3 is relative with the back side, the surface of optical clear conductive material 3 as shown in Fig. 7 (c) is relative with surface.

The optical clear base material used as the optical clear conductive material of the present invention, is preferably used plastics, glass, rubber Glue, pottery etc..Above-mentioned optical clear base material is preferably total light transmittance optical clear base material more than 60%.In the plastic, by In having, flexible resin molding operability is excellent, thus suitably uses.As optical clear base material, as using resin molding Instantiation, can enumerate the polyester resin such as polyethylene terephthalate (PET) or PEN (PEN), Acrylic resin, epoxy resin, fluororesin, organic siliconresin, polycarbonate resin, diacetate resin, triacetate resin, Polyarylate resin, polrvinyl chloride, polysulfone resin, polyethersulfone resin, polyimide resin, polyamide, vistanex, ring The resin molding that shape vistanex etc. are constituted, the thickness of described resin molding is preferably 50～300 μm.Can also be at optical clear base The known layers such as easy adhesive layer are set on material.It is possible to further arrange the public affairs such as physical development nucleus layer on optical clear base material The layer known.

Conductive part 61 is metal, particularly preferably uses the composite that gold, silver, copper, nickel, aluminum and above-mentioned metal are constituted. As the method forming these conductive parts 61, it is possible to use following known method: the method using silver sensitive material；Use Same procedure implements electroless plating or electrolysis electric plating method further on the silver-colored image obtained；Use silk screen print method prints The method of the conductive inks such as brush silver slurry；The method using the conductive inks such as ink-jet method printed silver ink；With electroless plating etc. The method forming the conductive layer that the metals such as copper are constituted；Or after forming conductive layer by vapour deposition or sputter etc., shape in the above Become etchant resist, then through overexposure, the method developing, etch, remove resist layer；Stick the metal formings such as Copper Foil, the most thereon Form etchant resist, through overexposure, the method etc. of the resist layer that develops, etches, removes.Wherein, it is preferably used and can make conductive part 61 Lower thickness, the most easily make the silver salt diffusion transfer method that the live width of conductive part 61 attenuates micro-.As silver salt diffusion transfer Method, such as, the open 2003-77350 publication of Japanese patent application or the open 2005-250169 publication of Japanese patent application In on the books.Make the thickness of conductive part 61 made in aforementioned manners the thinnest, it is difficult to guarantee as necessary to touch screen Electric conductivity.Therefore, this thickness is preferably 0.05～5 μm, more preferably 0.1～1 μm.

In the present invention, in addition to optical clear base material 1 is with the conductive part 61 being arranged on this optical clear base material 1, optics Transparent conductive material 3 can also on electrode pattern on (distance optical clear base material 1 remote side) or optical clear base material with The side that electrode pattern is contrary arranges the known layer such as hard conating, anti-reflection layer, adhesive layer, antiglare layer.

It follows that illustrate for optical transparent electrode.Described optical transparent electrode is on the two sides of optical clear base material On there is the connecting portion that electrically connects with adjacent big grid of big grid that reticulated conductive portion is formed, with surface and the connection at the back side Portion is stacked such mode and arranges and be made.

Fig. 8 represents the outline of other examples of the optical transparent electrode of the present invention with a piece of optical clear conductive material Cross-sectional view.As optical clear base material 1, the optical transparent electrode 100d of the present invention can use two panels optics with above-mentioned Transparent conductive material is stacked the optical clear base material phase that the optical transparent electrode (being designated as two plate electrodes below) being made has Same optical clear base material.As two plate electrodes, optical clear base material 1 can be arranged physical development nucleus layer, easy adhesive layer, The known layer such as adhesive phase.

In Fig. 8, conductive part 71,72 is metal, particularly preferably uses gold, silver, copper, nickel, aluminum and above-mentioned metal to constitute Composite.As the method forming these conductive parts 71, it is possible to use the method identical with above-mentioned conductive part 61.Additionally, its In, it is preferably used and can make the lower thickness of conductive part 71,72, the most easily make the live width of conductive part 71,72 attenuate micro- Silver salt diffusion transfer method.Nonetheless, different from two plate electrodes, a piece of for the what is called that optical clear conductive material is 1 Electrode, it is necessary for arranging conductive part on the two sides of optical clear base material, makees leading of one side by above-mentioned silver salt diffusion transfer legal system Electricity portion 71, next arranges conductive part 72 by same method or method known in other at remaining one side, so can be two Conductive part is set on face.Especially, the autofrettage of exposure process is included in operation, such as, by vapour deposition or sputter shape Become after conductive layer, be formed thereon etchant resist, then through overexposure, the method developing, etch, remove resist layer；Stick Copper Foil Etc. metal forming, it is formed on etchant resist further, through overexposure, the method developing, etch, remove resist layer；Use silver salt The method of diffusion-transfer process；Use the method etc. of monochrome silver salt photographic process；When being exposed, top and bottom can be improved with shank The degree of accuracy of position relatively, therefore be preferably used.The conductive part 71 made by these methods and the thickness once mistake of conductive part 72 Thin, it is difficult to guarantee as electric conductivity necessary to touch screen.Therefore, thickness is preferably 0.05～5 μm, more preferably 0.1～1 μ m。

In addition at optical clear base material 1 with the conductive part 71,72 being arranged on optical clear base material, the optical lens of Fig. 8 Prescribed electrode 100d (side that distance optical clear base material 1 is remote) can also arrange hard conating, anti-reflection layer, glue on electrode pattern Close the known layer such as layer, antiglare layer.

Embodiment

Hereinafter, by embodiment, the present invention is further illustrated, but the present invention is not limited by these embodiments Fixed.

Embodiment 1

As optical clear base material, the polyethylene terephthalate film using thickness to be 100 μm.This optical clear base The total light transmittance of material is 91%.

Below according to following formula, make physical development nucleus layer coating fluid, be then coated on optical clear base material, warp It is dried and physical development nucleus layer is set.

The preparation of palladium sulfide colloidal sol

A chlorination processes palladium 5g

Hydrochloric acid 40ml

Distilled water 1000ml

B liquid sodium sulfide 8.6g

Distilled water 1000ml

Under stirring, A liquid and B liquid are mixed, by ion exchange resin packed column after 30 minutes, obtains palladium sulfide colloidal sol.

The preparation of physical development nucleus layer coating fluid/every 1m²Optical clear base material

(polyethyleneglycol diglycidylether that Na ガセケ system テ Star Network ス (strain) manufactures)

10 mass %SP-200 aqueous solution 0.5mg

(the polymine that (strain) Japan catalyst manufactures；Mean molecule quantity: 10,000)

Then, from the beginning of the side that distance optical clear base material is near, above-mentioned physical development nucleus layer is coated with in order There is the intermediate layer of following compositions, silver halide emulsion layer and protective layer, obtain silver sensitive material 1 after drying.Silver halide emulsion General double note mixing method manufacture of agent photographic silver halide Emulsion.This silver emulsion 95 moles of % of silver chloride and Silver monobromide 5 moles of %, being adjusted to mean diameter is that 0.15 μm is prepared.Conventionally, sodium thiosulfate and gold chloride are used, to upper The silver emulsion that method of stating prepares is implemented gold and is added sulfur sensitizing.As in the silver emulsion that the method obtains, every 1g silver has 0.5g gelatin.

The composition in intermediate layer/every 1m²Optical clear base material

Gelatin 0.5g

Surfactant (there is the material of below formula (1)) 5mg

Dyestuff (there is the material of below formula (2)) 0.1g

The composition of silver halide emulsion layer/every 1m²Optical clear base material

The composition of protective layer/every 1m²Optical clear base material

Gelatin 1g

Amorphous silica delustering agent (mean diameter 3.5 μm) 10mg

Surfactant (there is the material of above chemical formula (1)) 10mg

Preparing original A1 and original B1 respectively, described original A1 has the electrode pattern of Fig. 1 (a), The part that big grid 11 and connecting portion 12 are electrically connected has the electrode pattern of Fig. 9 (a), and big grid 11 does not enters with connecting portion 12 The part of row electrical connection has the electrode pattern of Fig. 9 (c), and described original B1 has the electrode pattern of Fig. 1 (b), at big lattice The part that son 11 and connecting portion 12 are electrically connected has the electrode pattern of Fig. 9 (b), and big grid 11 does not carries out electricity with connecting portion 12 The part connected has the electrode pattern of Fig. 9 (d).

In original A1 and original B1, the Unit Cell that big grid 11 is made up of the square that the length of side is 0.25mm Son 20 is constituted, and big grid 11 is the square of 5mm for the length of side, and these big grid 11 and unit lattice 20 are 7 μm by width Fine rule is constituted.Additionally, broken string grid 31 is the square (with reference to the symbol S of Fig. 4) that the length of side is 0.25mm, broken string grid 31 passes through Width is that the fine rule of 8 μm is constituted.Additionally, broken string grid 31 has the disconnection portion of 10 μm every 67.5 μm (with reference to the symbol P of Fig. 4) (with reference to the symbol D1 of Fig. 4).In this broken string grid 31, a length of 10 μm of the disconnection portion corresponding for symbol D2 of Fig. 4.

The connecting portion 12 of the original A1 as shown in Fig. 9 (a) is only by the company of the square (live width 7 μm) that the length of side is 1mm Connect grid 16 to constitute.On the other hand, the connecting portion 12 of the original B1 as shown in Fig. 9 (b) is the square of 0.5mm by the length of side The connection grid 16 of (live width 7 μm) and 2 same foursquare adjacent grid 17 are constituted.

By former with transparent for the surface with silver halide emulsion layer side of the silver sensitive material 1 obtained according to the method described above The surface laminating with electrode pattern side of original text A1, uses the contact printer with mercury lamp as light source, filters through resin Device exposes, the light of the wavelength of described resin below filter filters 400nm.Additionally, silver sensitive material 1 had silver halide After the surface laminating with electrode pattern side of the surface of emulsion layer side and original B1, similarly it is exposed.This Outward, for embodiment described later and comparative example, when being exposed, the surface of laminating is same as in Example 1.

Hereafter, at 20 DEG C, after following diffusion transfer developer solution impregnates 60 seconds, then wash away with the warm water of 40 DEG C Silver halide emulsion layer, intermediate layer and protective layer, obtain the optical clear having the electrode pattern identical with A1 as silver pattern Conductive material 1a, washes away silver halide emulsion layer, intermediate layer and protective layer with the warm water of 40 DEG C, obtain with have identical with B1 Electrode pattern is as the optical clear conductive material 1b of silver pattern.Additionally, between the live width of optical clear conductive material obtained, line Away from identical in A1 with B1, in optical clear conductive material 1a and 1b obtained, the aperture opening ratio of big grid 11 is 94.5%.On the other hand, in above-mentioned original A1 and B1, as disconnection portion, there are the broken string lattice that broken string degree is 600% Son, the broken string grid and the broken string grid of 800% of 700%, the aperture opening ratio in each broken string grid above-mentioned is respectively 94.5%, 94.6% and 94.7%.Therefore, in the present embodiment, the difference of the aperture opening ratio of big grid and non-conductive portion that reticulated conductive portion is formed is Greatly 0.2%, wherein, described non-conductive portion has broken string grid, and in described broken string grid, a part for fine rule breaks and loses Electrical conductance.

The composition of diffusion transfer developer solution

All being dissolved in above-mentioned in 1000ml water, regulation pH is 12.2.

Use MHM-FW25 (two-sided tape without base material that day Xue chemical industry (strain) manufactures), according to the light shown in Fig. 7 (a) Learn the direction of transparent conductive material, by optical clear conductive material 1a and 1b that obtain so that the connection of conductive material 1a and 1b The mode that the center in portion 12 is consistent is fitted, and obtains optical transparent electrode 1.Additionally, in optical transparent electrode 1, big grid Shown in 11 and enlarged drawing such as Fig. 9 (e) of electrode pattern of being electrically connected of connecting portion 12.Additionally, big grid 11 and connecting portion 12 Shown in the enlarged drawing of the electrode pattern not being electrically connected such as Fig. 9 (f).Embodiment 2

In addition to using original A2 and original B2, carry out operation same as in Example 1, obtain optical clear Electrode 2.Described original A2 has the electrode figure of Figure 10 (a) in the part that big grid 11 and connecting portion 12 are electrically connected Case, the part not being electrically connected at big grid 11 and connecting portion 12 has the electrode pattern of Fig. 9 (c), described original B2 The part being electrically connected at big grid 11 and connecting portion 12 has the electrode pattern of Figure 10 (b), at big grid 11 and connecting portion 12 parts not being electrically connected have the electrode pattern of Fig. 9 (d).In addition, optical clear electricity is obtained similarly to Example 1 Pole 2.

In original A2 and original B2, unit lattice 20 and broken string grid 31 and original A1 and transparent former The unit lattice 20 of original text B1, broken string grid 31 have identical live width, distance between centers of tracks and disconnection portion.

The connecting portion 12 of original A2 is by the connection grid 16 of the square (live width 7 μm) that the length of side is 0.5mm and 2 phases Constitute with foursquare adjacent grid 17.The connecting portion 12 of original B2 is by the square (live width 7 μm) that the length of side is 0.5mm The adjacent grid 17 connecting grid 16 and 2 identical square is constituted.Additionally, in optical transparent electrode 2, big grid 11 and company Connect shown in electrode pattern such as Figure 10 (c) that portion 12 is electrically connected, the electrode that big grid 11 and connecting portion 12 are not electrically connected Shown in the enlarged drawing of pattern such as Fig. 9 (f).Additionally, the big grid that formed of reticulated conductive portion in the present embodiment and non-conductive portion The difference of aperture opening ratio is same as in Example 1, and wherein, described non-conductive portion has broken string grid, in described broken string grid the one of fine rule Partial disconnection and lose electrical conductance.

Embodiment 3

In addition to using original A3 and original B3, carry out operation same as in Example 1, obtain optical clear Electrode 3.Described original A3 has the electrode figure of Figure 11 (a) in the part that big grid 11 and connecting portion 12 are electrically connected Case, the part not being electrically connected at big grid 11 and connecting portion 12 has the electrode pattern of Figure 11 (c), described original B3 The part being electrically connected at big grid 11 and connecting portion 12 has the electrode pattern of Figure 11 (b), at big grid 11 and connecting portion 12 parts not being electrically connected have the electrode pattern of Figure 11 (d).

In original A3 and original B3, unit lattice 20 and broken string grid 31 and original A1 and transparent former The unit lattice 20 of original text B1, broken string grid 31 have identical live width, distance between centers of tracks and disconnection portion.

The connecting portion 12 of original A3 by the square (live width 7 μm) that the length of side is 0.25mm connection grid 16 and and its The adjacent grid 17 of the adjacent square that 2 length of sides are 0.5mm (live width 7 μm) is constituted.On the other hand, the company of original B3 Meet portion 12 to be only made up of the connection grid 16 of the square (live width 7 μm) that the length of side is 0.75mm.Additionally, at optical transparent electrode 3 In, shown in electrode pattern such as Figure 11 (e) that big grid 11 and connecting portion 12 are electrically connected, big grid 11 and connecting portion 12 do not enter Shown in electrode pattern such as Figure 11 (f) of row electrical connection.Additionally, the big grid that the reticulated conductive portion in the present embodiment is formed is led with non- The difference of the aperture opening ratio in electricity portion is same as in Example 1, and wherein, described non-conductive portion has broken string grid, thin in described broken string grid A part for line breaks and loses electrical conductance.

Embodiment 4

In addition to using original A4 and original B4, carry out operation same as in Example 1, obtain optical clear Electrode 4.Described original A4 has the electrode figure of Figure 12 (a) in the part that big grid 11 and connecting portion 12 are electrically connected Case, the part that big grid 11 and connecting portion 12 are not electrically connected has the electrode pattern of Figure 12 (c), and described original B4 exists The part that big grid 11 and connecting portion 12 are electrically connected has the electrode pattern of Figure 12 (b), and big grid 11 is with connecting portion 12 not The part being electrically connected has the electrode pattern of Figure 12 (d).

In original A4 and original B4, unit lattice 20 and broken string grid 31 and original A1 and transparent former The unit lattice 20 of original text B1, broken string grid 31 have identical live width, distance between centers of tracks and disconnection portion.

The connecting portion 12 of original A4 is by connecting grid as follows and adjacent grid is constituted: the length of side is the square of 0.75mm The connection grid 16 (being made up of the rectangular adjacent grid (live width 7 μm) of 3 0.25mm × 0.75mm) of (live width 7 μm)；2 The length of side adjacent with described connection grid 16 is the foursquare adjacent grid of 0.5mm；2 with the described length of side be 0.5mm just Square adjacent grid and the adjacent grid connecting 0.25mm × 0.5mm that grid 16 contacts；2 and described 0.25mm × The adjacent grid of 0.25mm × 0.25mm that the adjacent grid of 0.5mm is adjacent.On the other hand, the connecting portion 12 of original B4 by The length of side is that the connection grid 16 of the square (live width 7 μm) of 1.25mm is (by the rectangle (live width 7 μm) of 2 0.5mm × 1.25mm With the rectangle of 1 0.25mm × 1.25mm (live width 7 μm) constitute) and 8 make connection grid 16 and big grid 11 be electrically connected The length of side connect is that the adjacent grid of square 17 (live width 7 μm) of 0.25mm is constituted.Additionally, in optical transparent electrode 4, big grid Shown in 11 and electrode pattern such as Figure 12 (e) of being electrically connected of connecting portion 12, big grid 11 and connecting portion 12 are not electrically connected Electrode pattern such as Figure 12 (f) shown in.Additionally, the big grid of reticulated conductive portion formation in the present embodiment and opening of non-conductive portion The difference of mouthful rate is same as in Example 1, and wherein, described non-conductive portion has broken string grid, in described broken string grid one of fine rule Disjunction line and lose electrical conductance.

Comparative example 1

In addition to using original A5 and original B5, carry out operation same as in Example 1, obtain comparative example 1 Optical transparent electrode.The part that described original A5 is electrically connected at big grid 11 and connecting portion 12 has Figure 13 (a) Electrode pattern, the part that big grid 11 and connecting portion 12 are not electrically connected has the electrode pattern of Figure 13 (c), described transparent Original copy B5 has the electrode pattern of Figure 13 (b), big grid 11 and company in the part that big grid 11 and connecting portion 12 are electrically connected Connect the part that portion 12 is not electrically connected and there is the electrode pattern of Figure 13 (d).

In original A5 and original B5, unit lattice 20 and original A1 and the Unit Cell of original B1 Son 20 has identical live width, distance between centers of tracks.

The connecting portion 12 of original A5, B5 by the connection grid 16 of the square (live width 7 μm) that the length of side is 0.5mm with saw Dentation configuration forms.Additionally, in the optical transparent electrode of comparative example 1, the electricity that big grid 11 and connecting portion 12 are electrically connected Shown in pole pattern such as Figure 13 (e), additionally, electrode pattern such as Figure 13 (f) institute that big grid 11 and connecting portion 12 are not electrically connected Show.

Comparative example 2

In addition to using original A6 and original B6, carry out operation same as in Example 1, obtain comparative example 2 Optical transparent electrode.The part that described original A5 is electrically connected at big grid 11 and connecting portion 12 has Figure 14 (a) Electrode pattern, the part that big grid 11 and connecting portion 12 are not electrically connected has the electrode pattern of Figure 14 (c), described transparent Original copy B6 has the electrode pattern of Figure 14 (b), big grid 11 and company in the part that big grid 11 and connecting portion 12 are electrically connected Connect the part that portion 12 is not electrically connected and there is the electrode pattern of Figure 14 (d).

In original A6 and original B6, unit lattice 20 and original A1 and the Unit Cell of original B1 Son 20 has identical live width, distance between centers of tracks.

The connecting portion 12 of original A6, B6 by the connection grid 16 of the square (live width 7 μm) that the length of side is 0.5mm with saw Dentation configuration forms.Additionally, in the optical transparent electrode of comparative example 2, the electricity that big grid 11 and connecting portion 12 are electrically connected Shown in pole pattern such as Figure 14 (e), additionally, electrode pattern such as Figure 14 (f) institute that big grid 11 and connecting portion 12 are not electrically connected Show.

The optical transparent electrode 1 of the present invention obtained according to the method described above by visual valuation～4 and the light of comparative example 1,2 Learn the observability of transparency electrode.It is clear that electrode pattern be designated as 1；Even if seldom but it can be seen that being designated as of electrode pattern 2；Carefully see it can be seen that electrode pattern be designated as 3；Do not watch attentively cannot differentiate electrode pattern be designated as 4；Electrode cannot be differentiated completely Pattern be designated as 5.Evaluation result is as shown in table 1.Certainly, for reaching the purpose of the present invention, the preferably numerical value of table 1 is the bigger the better.

Table 1

	Observability
		The optical transparent electrode 1 of the present invention	5
The optical transparent electrode 2 of the present invention	4
		The optical transparent electrode 3 of the present invention	5
The optical transparent electrode 4 of the present invention	5
		The optical transparent electrode of comparative example 1	2
The optical transparent electrode of comparative example 2	1

As can be known from the results of Table 1, it will therefore be apparent that the observability of the electrode pattern of the optical transparent electrode of the present invention is low.

Embodiment 5

Use the polyethylene terephthalate film that embodiment 1 uses as optical clear base material.

Below, make the physical development nucleus layer coating fluid used in embodiment 1, be coated on optical clear base material, be dried After physical development nucleus layer is set.

Then, start to be coated with in fact on above-mentioned physical development nucleus layer in order from the side that distance optical clear base material is near Execute intermediate layer, silver halide emulsion layer and the protective layer used in example 1, obtain silver sensitive material after drying.

The silver sensitive material obtained according to the method described above and original A1 being fixed on shank, laminating, with mercury lamp For light source, exposing through light filter with contact printer, described light filter is only capable of the light through 254nm.

Hereafter, at 20 DEG C, after the diffusion transfer developer solution used in embodiment 1 impregnates 60 seconds, then with 40 DEG C Warm water washing remove silver halide emulsion layer, intermediate layer and protective layer, be then dried process.So, at optical clear The silver-colored pattern that thickness is 0.1 μm is obtained on base material.Additionally, this silver pattern and original A1 have identical live width.

With same as in Example 1 on the optical clear base material in the face relative with the silver-colored pattern obtained according to the method described above Method physical development nucleus layer is set, further, be coated with intermediate layer, silver halide emulsion layer, protective layer in order.Will be according to Silver sensitive material and original B6 shank that said method makes are fixed, are fitted, and with mercury lamp as light source, beat by contact Print machine exposes through light filter, and described light filter is only capable of the light through 254nm, and wherein, the image of described original B6 is The mirror image of bright original copy B1, above-mentioned fixing is carried out as follows: the center of the connecting portion that the silver-colored pattern obtained in advance has Point 15 is consistent with the central point 15 of the connecting portion that original B6 has, shown in connecting portion such as Fig. 9 (e) of big grid, with Shown in part such as Fig. 9 (f) that big grid is not connected with.

Hereafter, at 20 DEG C, after the diffusion transfer developer solution used in embodiment 1 impregnates 60 seconds, then with 40 DEG C Warm water washing remove silver halide emulsion layer, intermediate layer and protective layer, be then dried process.So, obtain at optics The reverse side of transparent base has the optical clear electricity of the silver-colored pattern (thickness be 0.1 μm) different from the silver-colored pattern arranged in advance Pole 5.Additionally, this pattern is to have the silver-colored pattern of identical live width with original B6.The observability of the optical transparent electrode 5 obtained Identical with optical transparent electrode 1, electrode pattern cannot be differentiated completely.Additionally, reticulated conductive portion in the present embodiment formed big Grid is same as in Example 1 with the difference of the aperture opening ratio of non-conductive portion, and wherein, described non-conductive portion has broken string grid, described disconnected In line grid, a part for fine rule breaks and loses electrical conductance.

Symbol description

1 optical clear base material

1a optical clear base material

1b optical clear base material

2 adhesive phases

3 optical clear conductive materials

3a optical clear conductive material

3b optical clear conductive material

The thin thread part that the foursquare limit of 4 component unit grid is formed

The thin thread part of 5 broken strings

6 non-conductive portion

11 big grid

12 connecting portions

The connecting line of the central point of 13 2 big grid

The central point of 14 big grid

The central point of 15 connecting portions

16 connect grid

17, the adjacent grid of 17a, 17b

18, the distance between 19 adjacent big grid

20 unit lattice

It is left white part around 21 big grid and connecting portion

31 broken string grid

51 disconnection portion

52 projected square part

53 projected square part

61,71,72 conductive part

171,172,173,174,175,176 adjacent grid

100,100a, 100b, 100c, 100d optical transparent electrode

Claims

1. an optical transparent electrode, described optical transparent electrode is made by two panels optical clear conductive material is stacked, institute State optical clear conductive material to have in the one side of optical clear base material: the big grid formed by reticulated conductive portion；At least have Having 1 connecting portion connecting grid, described connecting portion is electrically connected between adjacent big grid；

It is characterized in that, by described two panels optical clear conductive material in the way of the center that makes respective connecting portion is unanimous on the whole Being laid out, described connecting portion is only made up of connection grid, or is made up of connection grid and attached adjacent grid thereof, described two What sheet optical clear conductive material each had connect the varying in size of grid, and described in the shape connecting grid that varies in size Broadly similar, and the most a piece of optical clear conductive material has broken string grid, and described broken string grid is corresponding to described folded In the described connecting portion of optical transparent electrode when putting making and/or described big grid and the position of described connecting portion peripheral part On, a part for fine rule breaks and loses electrical conductance.

2. an optical transparent electrode, described optical transparent electrode has on the two sides of optical clear base material: by reticulated conductive The big grid that portion is formed；At least having 1 connecting portion connecting grid, described connecting portion carries out electricity between adjacent big grid Connect；

It is characterized in that, the center of the connecting portion that the center of connecting portion one side being had has with another side is with unanimous on the whole Mode is configured, and described connecting portion is only made up of connection grid, or is made up of connection grid and attached adjacent grid thereof, institute That states that one side and described another side have connects the varying in size of grid, and described in the shape connecting grid that varies in size substantially Similar, and have broken string grid at least one side, described broken string grid is in corresponding to described connecting portion and/or described big lattice On the position of sub and described connecting portion peripheral part, a part for fine rule breaks and loses electrical conductance.

3. optical transparent electrode as claimed in claim 1 or 2, it is characterised in that the described big lattice formed by reticulated conductive portion The difference of the aperture opening ratio of son and non-conductive portion is within 1%, and described non-conductive portion has broken string grid, fine rule in described broken string grid A part broken string and lose electrical conductance.

4. optical transparent electrode as claimed in claim 1 or 2, it is characterised in that described big grid is by multiple unit lattice structures Becoming, the fine rule spacing of described unit lattice is the 80～120% of the fine rule spacing of described broken string grid.