CN103774108B - A kind of coating apparatus - Google Patents
A kind of coating apparatus Download PDFInfo
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- CN103774108B CN103774108B CN201410037789.8A CN201410037789A CN103774108B CN 103774108 B CN103774108 B CN 103774108B CN 201410037789 A CN201410037789 A CN 201410037789A CN 103774108 B CN103774108 B CN 103774108B
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- target
- coating apparatus
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- 239000011248 coating agent Substances 0.000 title claims abstract description 45
- 238000000576 coating method Methods 0.000 title claims abstract description 45
- 230000015556 catabolic process Effects 0.000 claims abstract description 28
- 239000002245 particle Substances 0.000 claims description 44
- 230000004888 barrier function Effects 0.000 claims description 18
- 239000013077 target material Substances 0.000 claims description 18
- 239000013528 metallic particle Substances 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 24
- 230000000803 paradoxical effect Effects 0.000 abstract description 16
- 239000010408 film Substances 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical group [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 238000009413 insulation Methods 0.000 description 5
- 238000005477 sputtering target Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000863 Ferronickel Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 1
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- -1 solar energy Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Abstract
The invention discloses a kind of coating apparatus, in order in plated film production process, the paradoxical discharge of breakdown critical point place of target can be detected accurately, and then avoid because target punctures the damage that causes target backboard. Described coating apparatus comprises target, target backboard and for connecting the articulamentum of target and target backboard, wherein, described coating apparatus also comprises the discharge layer between described target and described articulamentum.
Description
Technical field
The present invention relates to Display Technique field, relate in particular to a kind of coating apparatus.
Background technology
Magnetron sputtering is at Thin Film Transistor-LCD (ThinFilmTransistorLiquidCrystalDisplay, TFT-LCD), the field such as semiconductor, solar energy, material surface processing has and very widely shouldWith. And the sputtering target material of magnetron sputtering is expensive, therefore in actual production process, in order to reduce costs,The general utilization rate that all can as far as possible remove to promote target. But for large-scale magnetron sputtering apparatus, open vacuumChamber is very difficult, therefore checks that target service condition is also comparatively difficult, often occurs in order to carry in actual useHigh utilization rate causes target to be overused to such an extent as to target is breakdown and make target backboard by plasmaThe situation of damage, as shown in Figure 1, magnetron sputtering is in actual plated film is produced, and target 11 is by connectingLayer 13 is connected with target backboard 12, and in the time that target 11 is overused, target 11 is breakdown, now targetMaterial backboard 12 is at 14 places, position by plasma damage, and target backboard is expensive, once be damaged meetingCause larger loss.
In sum, in prior art, check comparatively difficulty of target service condition, easily cause target by excessiveUse to such an extent as to target is breakdown and make target backboard by plasma damage.
Summary of the invention
The invention provides a kind of coating apparatus, in order in plated film production process, can detect accuratelyThe paradoxical discharge of breakdown critical point place of target, and then avoid because target punctures the damage that causes target backboardWound.
According to a kind of coating apparatus provided by the invention, comprise target, target backboard and for connecting targetWith the articulamentum of target backboard, wherein, described coating apparatus also comprises and is positioned at described target and described articulamentumBetween discharge layer.
By a kind of coating apparatus provided by the invention, because comprising, this coating apparatus is positioned at target and articulamentumBetween discharge layer, therefore in plated film production process, the critical point that target is breakdown can be detected accuratelyThe paradoxical discharge at place, and then avoid because target punctures the damage that causes target backboard.
Preferably, in the target material surface or target of described discharge layer between described target and described articulamentumPortion; Or in the articulamentum surface or articulamentum of described discharge layer between described target and described articulamentumPortion.
Like this, can by discharge layer is arranged at target material surface between described target and described articulamentum orTarget inside; Or articulamentum surface or articulamentum inside between described target and described articulamentum, at plated filmIn production process, the paradoxical discharge of breakdown critical point place of target can be detected accurately.
Preferably, described discharge layer is insulating barrier or conductive layer.
Like this, in the time that discharge layer is insulating barrier or conductive layer, can detect more accurately that target is breakdownThe paradoxical discharge of critical point place.
Preferably, in the time that described discharge layer is insulating barrier, described insulating barrier is made up of insulated particle.
Like this, when insulating barrier is made up of insulated particle, more convenient simple in actual production.
Preferably, described insulated particle is the sharp-pointed particle in surface.
Like this, in the time that insulated particle is the sharp-pointed particle in surface, more easily produce electric discharge, like this can be more accurateThe paradoxical discharge that breakdown critical point place of target detected.
Preferably, described insulated particle is Al2O3 particle.
Like this, in the time that insulated particle is Al2O3 particle, more convenient easy row in actual production.
Preferably, in the time that described discharge layer is conductive layer, described conductive layer is made up of metallic particles.
Like this, in the time that conductive layer is made up of metallic particles, simpler in actual production.
Preferably, described metallic particles is the sharp-pointed particle in surface.
Like this, in the time that metallic particles is the sharp-pointed particle in surface, more easily produce electric discharge, like this can be more accurateThe paradoxical discharge that breakdown critical point place of target detected.
Preferably, described coating apparatus also comprises detecting unit, for detection of described target and the described target back of the bodyDischarge voltage between plate or electric current, when the discharge voltage detecting or electric current exceed default voltage or electric currentWhen threshold value, determine that described target is breakdown.
Like this, in actual production, can pass through the detecting unit in described coating apparatus, convenient and simpleDetermine that whether target is breakdown.
Preferably, described coating apparatus also comprises Alarm Unit, for determining described target when described detecting unitWhen material is breakdown, send alarm signal.
Like this, in actual production, can pass through the Alarm Unit in described coating apparatus, more convenient directly perceivedDefinite described target breakdown.
Brief description of the drawings
Fig. 1 is schematic diagram when magnetic control spattering target is breakdown in prior art;
The schematic diagram of a kind of coating apparatus that Fig. 2 provides for the embodiment of the present invention;
In a kind of coating apparatus that Fig. 3 provides for the embodiment of the present invention, discharge layer is positioned at the signal of target material surfaceFigure;
In a kind of coating apparatus that Fig. 4 provides for the embodiment of the present invention, discharge layer is positioned at the signal of target insideFigure;
In a kind of coating apparatus that Fig. 5 provides for the embodiment of the present invention, discharge layer is positioned at the signal on articulamentum surfaceFigure;
In a kind of coating apparatus that Fig. 6 provides for the embodiment of the present invention, discharge layer is positioned at the signal of articulamentum insideFigure.
Detailed description of the invention
The embodiment of the present invention provides a kind of coating apparatus, in order in plated film production process, and can be accuratelyThe paradoxical discharge of breakdown critical point place of target detected, and then avoid causing the target back of the body because target puncturesThe damage of plate.
Provide the detailed introduction of the technical scheme that the specific embodiment of the invention provides below.
In the specific embodiment of the invention coating apparatus be magnetron sputtering apparatus,, can realize and need not open magnetic controlSputtering equipment cavity can check, can find in time that target is breakdown, can effectively avoid because targetMaterial excessively uses puncturing of causing, and then damage to target backboard.
The Principle of plating of magnetron sputtering is, in target one side being sputtered, i.e. and cathode side, and between anode-sideAdd a quadrature field and electric field, in high vacuum chamber, be filled with required inert gas, be generally argon gas, foreverMagnet forms 250 Gauss～350 Gausses' magnetic field at target material surface for a long time, forms orthogonal electromagnetism with high voltage electric field. Under the effect of electric field, argon gas is ionized into cation and electronics, is added with certain negative high voltage on target,The electronics sending from target is subject to accelerate to fly to target the effect in magnetic field, with very high speed bombardment target, makesThe atom that is sputtered out on target is followed momentum transfer principle and is flown to higher kinetic energy disengaging target material surfaceSubstrate deposition film forming.
Plated film target is suitably under process conditions, to sputter at substrate by plated film production systems such as magnetron sputteringsThe sputtering source of the various function films of upper formation, target is the target material of high speed lotus energy particle bombardment, differenceTarget can obtain different film system, as superhard film, wear-resistant membrane, anti-corrosion alloy film.
Target has polytype, as: the metal targets such as nickel target, magnesium target, aluminium target; Magnesium oxide target, silicon nitrideThe ceramic targets such as target, nickel oxide target; The alloy target materials such as aluminium silicon target, ferronickel target, zinc-aluminium target. Wherein, magnetic controlThe target kind of sputter has: metal sputtering plated film target, alloy sputter plated film target, ceramic sputter coating targetMaterial, boride ceramics sputtering target material, carbide ceramics sputtering target material, fluoride ceramic sputtering target material, nitrogenizeThing ceramic sputtering target material, oxide ceramics target etc.
As shown in Figure 2, a kind of coating apparatus that the specific embodiment of the invention provides, this coating apparatus comprises targetMaterial 21, target backboard 22 and for connecting the articulamentum 23 of target 21 and target backboard 22, wherein,This coating apparatus also comprises the discharge layer 24 between target 21 and articulamentum 23. Due to this coating apparatusIn comprise the discharge layer 24 between target 21 and articulamentum 23, therefore in actual production process, canThe paradoxical discharge of breakdown critical point place of target 21 detected accurately.
Wherein, the particular location that discharge layer 24 arranges is as described below.
As shown in Figure 3, discharge layer 24 is arranged on the target material surface between target 21 and articulamentum 23,Here, discharge layer 24 is insulating barrier or conductive layer, and in the time that discharge layer 24 is insulating barrier, this insulating barrier is by absolutelyEdge particle composition, as: this insulated particle is aluminium oxide (Al2O3) particle, preferably, and for betterCause electric discharge, the alumina particle of this insulation is made into the sharp-pointed particle in surface. When discharge layer 24 is for leadingWhen electricity layer, this conductive layer is made up of metallic particles, preferably, and in order better to cause electric discharge, by this metalParticle is made into the sharp-pointed particle in surface. In actual production process, when target fast when breakdown because put, can there is a large amount of paradoxical discharges, the plated film providing by the specific embodiment of the invention in the existence of electricity layer 24Paradoxical discharge detectors in device etc. detect the detecting unit of paradoxical discharge, target can be detected easily21 and target backboard 22 between discharge voltage or electric current, when the discharge voltage detecting or electric current exceed in advanceIf voltage or when current threshold, determine that target 21 is breakdown, at this moment, pass through the specific embodiment of the inventionAlarm Unit in the coating apparatus providing sends alarm signal, and notice production operation personnel, at this moment, produceOperating personnel needs to change in time target, avoids because target punctures the damage that causes target backboard. The present inventionSpecific embodiment is not defined as the voltage and current while detecting paradoxical discharge, as long as can detect target quilt soonParadoxical discharge while puncturing, as all right in the detecting unit in coating apparatus in the specific embodiment of the inventionAura during by detection paradoxical discharge comes to determine that whether target is breakdown extremely. In Fig. 3, discharge layer 24Link together with articulamentum 23 is actual, middle not gap, here, for discharge layer is described24 are positioned at the surface of target 21 instead of are positioned at the surface of articulamentum 23, therefore by discharge layer 24 and articulamentum23 separately. The area of discharge layer 24 is not identical with the area of target 21 yet, here just to discharge layer24 signal, the specific embodiment of the invention is not specifically limited the size of discharge layer 24.
As shown in Figure 4, discharge layer 24 is arranged to target 21 inside between target 21 and articulamentum 23,The specific region that wherein discharge layer 24 can be arranged to target 21 inside, the specific region here refers in realityIn the production process on border, the region that the target calculating by experience the most easily punctures, as this specific regionBe positioned at the zone line of target. Here, discharge layer 24 is insulating barrier or conductive layer, when discharge layer 24 is exhaustedWhen edge layer, this insulating barrier is made up of insulated particle, as: this insulated particle is aluminium oxide (Al2O3) particle,Preferably, in order better to cause electric discharge, the alumina particle of this insulation is made into the sharp-pointed particle in surface,The alumina particle of this insulation can be injected into by methods such as Implantations the specific region of target 21 inside.In the time that discharge layer 24 is conductive layer, this conductive layer is made up of metallic particles, preferably, and in order better to drawPlay electric discharge, this metallic particles is made into the sharp-pointed particle in surface. In actual production process, when target fastWhen breakdown, because a large amount of paradoxical discharges can occur in the existence of discharge layer 24, concrete by the present inventionParadoxical discharge detectors in the coating apparatus that embodiment provides etc. detect the detecting unit of electric discharge, can facilitateDischarge voltage or the electric current between target 21 and target backboard 22 detected, when the discharge voltage detectingOr electric current is while exceeding default voltage or current threshold, determines that target 21 is breakdown, at this moment, by thisAlarm Unit in the coating apparatus that bright specific embodiment provides sends alarm signal, notice production operation peopleMember, at this moment, production operation personnel need to change in time target, avoid causing target backboard because target puncturesDamage.
As shown in Figure 5, the articulamentum 23 discharge layer 24 being arranged between target 21 and articulamentum 23 is shownOn face, here, discharge layer 24 is insulating barrier or conductive layer, in the time that discharge layer 24 is insulating barrier, and this insulationLayer is made up of insulated particle, as: this insulated particle is aluminium oxide (Al2O3) particle, preferably, forBetter cause electric discharge, the alumina particle of this insulation is made into the sharp-pointed particle in surface. When discharge layer 24During for conductive layer, this conductive layer is made up of metallic particles, preferably, in order better to cause electric discharge, shouldMetallic particles is made into the sharp-pointed particle in surface. In actual production process, when target fast when breakdown, because ofFor the existence of discharge layer 24, can there is a large amount of paradoxical discharges, provide by the specific embodiment of the inventionParadoxical discharge detectors in coating apparatus etc. detect the detecting unit of electric discharge, target can be detected easily21 and target backboard 22 between discharge voltage or electric current, when the discharge voltage detecting or electric current exceed in advanceIf voltage or when current threshold, determine that target 21 is breakdown, at this moment, pass through the specific embodiment of the inventionAlarm Unit in the coating apparatus providing sends alarm signal, and notice production operation personnel, at this moment, produceOperating personnel needs to change in time target, avoids because target punctures the damage that causes target backboard. In Fig. 5,Discharge layer 24 links together with target 21 is actual, middle not gap, here, in order to illustrateDischarge layer 24 is positioned at the surface of articulamentum 23 instead of is positioned at the surface of target 21, thus by discharge layer 24 withTarget 21 separately. The area of discharge layer 24 is not identical with the area of articulamentum 23 yet, is hereTo the signal of discharge layer 24, the specific embodiment of the invention is not done concrete limit to the size of discharge layer 24Fixed.
As shown in Figure 6, discharge layer 24 is arranged to the articulamentum inside between target 21 and articulamentum 23,The specific region that wherein discharge layer 24 can be arranged to articulamentum 23 inside, the specific region here refers toIn actual production process, the region that the target calculating by experience the most easily punctures, as this given zoneTerritory is positioned at the zone line of articulamentum. Here, discharge layer 24 is insulating barrier or conductive layer, when discharge layer 24During for insulating barrier, this insulating barrier is made up of insulated particle, as: this insulated particle is aluminium oxide (Al2O3)Particle, preferably, in order better to cause electric discharge, is made into surface by the alumina particle of this insulation sharp-pointedParticle. In the time that discharge layer 24 is conductive layer, this conductive layer is made up of metallic particles, preferably, forBetter cause electric discharge, this metallic particles is made into the sharp-pointed particle in surface. In actual production process,When target fast when breakdown because can there is a large amount of paradoxical discharges in the existence of discharge layer 24, by thisParadoxical discharge detectors in the coating apparatus that invention specific embodiment provides etc. detect the detecting unit of electric discharge,Discharge voltage or electric current between target 21 and target backboard 22 can be detected easily, when what detectWhen discharge voltage or electric current exceed default voltage or current threshold, determine that target 21 is breakdown, at this moment,Alarm Unit in the coating apparatus providing by the specific embodiment of the invention sends alarm signal, and notice is producedOperating personnel, at this moment, production operation personnel need to change in time target, avoid causing target because target puncturesThe damage of material backboard.
Certainly, the discharge layer in the specific embodiment of the invention can also be arranged between articulamentum and target backboardArticulamentum surface or articulamentum inside, be for fear of puncture the damage that causes target backboard due to target equallyWound.
Obviously, those skilled in the art can carry out various changes and modification and not depart from this present inventionBright spirit and set. Like this, if of the present invention these amendment and modification belong to the claims in the present invention andWithin the set of its equivalent technologies, the present invention be also intended to comprise these change and modification interior.
Claims (8)
1. a coating apparatus, comprises target, target backboard and for connecting the articulamentum of target and target backboard, it is characterized in that, described coating apparatus also comprises the discharge layer between described target and described articulamentum; Wherein, described discharge layer is positioned at the zone line of described target or described articulamentum; Described coating apparatus also comprises detecting unit, for detection of discharge voltage or electric current between described target and described target backboard, in the time that the discharge voltage detecting or electric current exceed default voltage or current threshold, determines that described target is breakdown; Described coating apparatus also comprises Alarm Unit, in the time that described detecting unit determines that described target is breakdown, sends alarm signal.
2. coating apparatus according to claim 1, is characterized in that, target material surface or the target inside of described discharge layer between described target and described articulamentum; Or articulamentum surface or the articulamentum inside of described discharge layer between described target and described articulamentum.
3. coating apparatus according to claim 2, is characterized in that, described discharge layer is insulating barrier or conductive layer.
4. coating apparatus according to claim 3, is characterized in that, in the time that described discharge layer is insulating barrier, described insulating barrier is made up of insulated particle.
5. coating apparatus according to claim 4, is characterized in that, described insulated particle is the sharp-pointed particle in surface.
6. according to the coating apparatus described in claim 4 or 5, it is characterized in that, described insulated particle is Al2O3Al2O3Particle.
7. coating apparatus according to claim 3, is characterized in that, in the time that described discharge layer is conductive layer, described conductive layer is made up of metallic particles.
8. coating apparatus according to claim 7, is characterized in that, described metallic particles is the sharp-pointed particle in surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201410037789.8A CN103774108B (en) | 2014-01-26 | 2014-01-26 | A kind of coating apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410037789.8A CN103774108B (en) | 2014-01-26 | 2014-01-26 | A kind of coating apparatus |
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| CN103774108A CN103774108A (en) | 2014-05-07 |
| CN103774108B true CN103774108B (en) | 2016-05-04 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101122008A (en) * | 2006-08-10 | 2008-02-13 | 中华映管股份有限公司 | Plasma sputtering target device and its manufacturing method |
| CN101381860A (en) * | 2007-09-04 | 2009-03-11 | 上海华虹Nec电子有限公司 | Magnetron sputtering apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20080121521A1 (en) * | 2006-08-15 | 2008-05-29 | Chunghwa Picture Tubes, Ltd. | Plasma sputtering target assembly and manufacturing method therefor |
| DE102008046443A1 (en) * | 2008-09-09 | 2010-03-11 | W.C. Heraeus Gmbh | Sputtering target comprises a carrier body, and a sputtering material, which is fixed by a connection layer on the carrier body, where the connection layer consists of inorganic oxide and/or silicate as main component of its binder phase |
| JP5270647B2 (en) * | 2010-12-06 | 2013-08-21 | 信越化学工業株式会社 | Silicon target for sputtering film formation and method for forming silicon-containing thin film |
| CN102409299B (en) * | 2011-09-07 | 2014-08-06 | 三峡大学 | Preparation method of oxide ceramic sputtering target |
| CN202415680U (en) * | 2011-12-30 | 2012-09-05 | 深圳市创益科技发展有限公司 | Magnetic control sputtering target with detection device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101122008A (en) * | 2006-08-10 | 2008-02-13 | 中华映管股份有限公司 | Plasma sputtering target device and its manufacturing method |
| CN101381860A (en) * | 2007-09-04 | 2009-03-11 | 上海华虹Nec电子有限公司 | Magnetron sputtering apparatus |
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