CN103760717A - Color filter substrate, preparation method thereof and display device, - Google Patents
Color filter substrate, preparation method thereof and display device, Download PDFInfo
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- CN103760717A CN103760717A CN201410043227.4A CN201410043227A CN103760717A CN 103760717 A CN103760717 A CN 103760717A CN 201410043227 A CN201410043227 A CN 201410043227A CN 103760717 A CN103760717 A CN 103760717A
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- photochromic material
- color
- filter substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- Manufacturing & Machinery (AREA)
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- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The embodiment of the invention discloses a color filter substrate, a preparation method of the color filter substrate and a display device, and relates to the field of displaying. By means of the color filter substrate, the preparation method of the color filter substrate and the display device, production cost can be lowered, a production cycle is shortened, surface flatness is improved, and angle section differences of color stop blocks are eliminated. The preparation method of the color filter substrate comprises the steps that a substrate with black matrices is coated with photochromic materials or paint containing photochromic materials, so that a photochromic material layer is formed; regional exposure is carried out on the photochromic material layer under different exposure parameters to form a color filter layer composed of the various color stop blocks, and the exposure parameters corresponding to the color stop blocks in the same color are the same.
Description
Technical field
The present invention relates to demonstration field, relate in particular to a kind of colored filter substrate and preparation method thereof, display device.
Background technology
Colored filter is the key of liquid crystal display (Liquid Crystal Display, LCD) colorize.Liquid crystal display is non-active luminous assembly, the demonstration of its color must provide light source by inner backlight module (penetrating type LCD) or outside environment incident light (reflection-type or semi penetration type LCD), arrange in pairs or groups again driving circuit and liquid crystal control forms GTG and shows, the at least red, green, blue color blocking piece then seeing through in colored filter provides form and aspect, could form colored display frame.
At present, the manufacturing process of colored filter is first on glass substrate, to make the black matrix of one deck (Black Matrix, BM); Then the color blocking material of a certain color is coated on the glass substrate that forms BM, through soft roasting, aim at exposure, develop, peel off, the step such as hard roasting, forms the color blocking piece of this kind of color in presetted pixel region, above-mentioned steps forms chromatic filter layer at least in triplicate, and described chromatic filter layer at least comprises red, green, blue color blocking piece.
The every making one deck of existing preparation method color blocking, all needs to carry out the steps such as primary coating, exposure, development, and process is loaded down with trivial details, and waste of material is serious; And existing method, when forming chromatic filter layer, has in color blocking piece junction certain overlapping (Overlap), in overlapping region can there is certain projection in color blocking layer, thereby cause the angle section of color blocking poor, affects formation and the product quality of subsequent film.
Summary of the invention
Embodiments of the invention provide a kind of colored filter substrate and preparation method thereof, display device, can reduce production costs, and shorten the production cycle, improve surface smoothness simultaneously, and the angle section of having eliminated stop block of all kinds is poor.
For achieving the above object, embodiments of the invention adopt following technical scheme:
A preparation method for colored filter substrate, comprising:
On the substrate that is formed with black matrix, apply photochromic material or include the material of photochromic material, form photochromic material layer;
Described photochromic material layer is carried out to subregion exposure under different exposure parameters, form the chromatic filter layer being comprised of plurality of color stop block, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
Alternatively, described chromatic filter layer at least comprises three kinds of color blocking pieces of red, green, blue.
Alternatively, described exposure parameter is wavelength; Described described photochromic material layer is carried out to subregion exposure under different exposure parameters, forms the chromatic filter layer being formed by plurality of color stop block, specifically comprise:
Use the light of the first wavelength, do not need to form the region of red resistance by mask plate shielding, described photochromic material layer is exposed, irradiated area forms red stop block;
Use the light of second wave length, do not need to form the region of green resistance by mask plate shielding, described photochromic material layer is exposed, irradiated area forms green stop block;
Use the light of three-wavelength, do not need to form the region of blue stop block by mask plate shielding, described photochromic material layer is exposed, irradiated area forms blue stop block.
Alternatively, described photochromic material is irreversible ultraviolet color changing powder.
A kind of colored filter substrate of the embodiment of the present invention, comprise: chromatic filter layer, described chromatic filter layer is by photochromic material layer, under different exposure parameters, to be carried out the subregion plurality of color chunk forming that exposes, described photochromic material layer by photochromic material or include photochromic material coating apply form, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
Alternatively, described chromatic filter layer at least comprises three kinds of primary colours filter areas of red, green, blue.
Alternatively, described photochromic material, under the irradiation of the first wavelength, changes redness into; Under the irradiation of second wave length, change green into; Under the irradiation of three-wavelength, change blueness into.
Alternatively, described photochromic material is burst of ultraviolel anti-forgery ink.
Embodiments of the invention also provide a kind of display device, comprising: the colored filter substrate described in any one.
The embodiment of the present invention provides a kind of colored filter substrate and preparation method thereof, display device, wherein, when forming chromatic filter layer, first on substrate, make one deck photochromic material layer, this photochromic material layer comprises photochromic material, can present different color (generally at least comprising three kinds of colors of red, green, blue) under different exposure parameters; After exposing in subregion under different exposure parameters, photochromic material layer directly forms chromatic filter layer.Compared with prior art, the present invention has the following advantages: only need primary coating technique can complete the making of chromatic filter layer, manufacturing process is simple, can reduce production costs, and shortens the production cycle; In addition, photochromic material layer subregion exposure directly forms the stop block of all kinds that forms chromatic filter layer, and therefore stop block of all kinds does not exist overlappingly in junction, and surface smoothness is high, and the angle section of having eliminated stop block of all kinds is poor.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, to the accompanying drawing of required use in embodiment be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Preparation method's process flow diagram of the colored filter substrate that Fig. 1 provides for the embodiment of the present invention one;
Fig. 2 is the structural representation of photochromic material layer in the embodiment of the present invention one;
Fig. 3 is the process flow diagram that in the embodiment of the present invention one, photochromic material layer carries out subregion exposure under different exposure parameters;
Fig. 4 is the exposure schematic diagram that forms red (R) color blocking piece of chromatic filter layer in the embodiment of the present invention one;
Fig. 5 is the exposure schematic diagram that forms green (G) color blocking piece of chromatic filter layer in the embodiment of the present invention one;
Fig. 6 is the exposure schematic diagram that forms indigo plant (B) the color blocking piece of chromatic filter layer in the embodiment of the present invention one.
Reference numeral
10-substrate, the black matrix of 11-, 12-photochromic material layer, the red stop block of 121-, the green stop block of 122-,
The blue stop block of 123-, 20-mask plate, 21-mask plate, 22-mask plate.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.
Embodiment mono-
The embodiment of the present invention provides a kind of preparation method of colored filter substrate, as shown in Figure 1, comprising:
101, on the substrate 10 that is formed with black matrix 11, apply photochromic material or include the coating of photochromic material, forming photochromic material layer 12, as shown in Figure 2;
In this step, form photochromic material layer 12, use be photochromic material or the coating that includes photochromic material.This kind of photochromic material has following characteristics: under the light irradiation of suitable wavelength, can carry out specific chemical reaction (or physical influence), change another kind of material (or another kind of form) into, absorption spectrum (color) also changes thereupon accordingly.This photochromic variation can be reversible, can be also irreversible, if this photochromic variation is reversible, so at least requires under the environment for use of colored filter substrate irreversible.
There is multiple colour mixture scheme in chromatic filter layer 12, except common RGB(red/green/indigo plant) colour mixture scheme, also exist RGBY(red/green/indigo plant/Huang), RGBW(is red/green/blue/white) etc. other colour mixture scheme, but no matter which kind of colour mixture scheme, described chromatic filter layer generally at least comprises three kinds of color blocking pieces of red, green, blue.In the embodiment of the present invention take the RGB(that commonly uses red/green/indigo plant) colour mixture scheme describes as example; those skilled in the art are not paying under the prerequisite of creative work; can be by technical solution of the present invention for other colour mixture scheme, this all belongs to the scope of protection of the invention.
In a kind of embodiment, chromatic filter layer 12 adopts RGB colour mixture scheme, and chromatic filter layer 12 comprises red (R), green (G), blue (B) three kinds of color blocking pieces, therefore, accordingly, described in the present embodiment, after photochromic material illumination, at least present three kinds of colors of red, green, blue.For example, alternatively, a kind of photochromic material as described below (is shown in: application number 200910016892.3,0007 section and 0008 section, instructions), during visual inspection own, be green, after exposing under first group of exposure parameter, this material is shown as blueness, and blueness will keep for a long time; Under second group of exposure parameter, after exposure, this material is shown in red, and redness will keep for a long time.Described photochromic material can also be the material of recording in application number 201310280824.4 and application number 02117597.7.The photochromic material of the realized this method except this records is all fine, and the invention is not restricted to listed photochromic material herein.
102, described photochromic material layer is carried out to subregion exposure under different exposure parameters, form the chromatic filter layer being comprised of plurality of color stop block, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
This step is carried out subregion exposure to photochromic material layer, forms chromatic filter layer.During exposure, the exposure parameter that the same area (same color blocking figure) is corresponding is identical, forms the color blocking piece of color of the same race.Light wavelength when described exposure parameter refers to expose (or frequency), or the power in exposure time, or the combination of the two; Can also be the length of time shutter, the concrete meaning of exposure parameter depends on the variable color condition of photochromic material.
For example, alternatively, if the photochromic material of selecting has the function that different wave length is produced to different colours, light wavelength while exposing by control, under the effect of mask plate, can produce respectively the chromatic filter layer of R, G, B isochrome stop block composition.Particularly, as shown in Figure 3, if form the chromatic filter layer that comprises red (R), green (G), blue (B) three kinds of color blocking pieces, step 102 comprises:
1021, use the light (wavelength is λ 1) of the first wavelength, block the region that does not need to form red resistance by mask plate 20, photochromic material layer 12 is exposed, irradiated area forms red stop block 121, as shown in Figure 4.
1022, use the light (wavelength is λ 2) of second wave length, block the region that does not need to form green resistance by mask plate 21, photochromic material layer 12 is exposed, irradiated area forms green stop block 122, as shown in Figure 5;
1023, the light (wavelength is λ 3) that uses three-wavelength, blocks the region that does not need to form blue stop block by mask plate 22, photochromic material layer 12 is exposed, and irradiated area forms blue stop block 123, as shown in Figure 6.
The sequencing of above-mentioned sub-step 1021,1022 and 1023 does not limit, and can determine according to actual conditions, particularly according to the size of wavelength X 1, λ 2 and λ 3, determines.Wherein, the size of wavelength X 1, λ 2 and λ 3 is relevant to the variable color condition of photochromic material layer 12, and the characteristic of the photochromic material being used by photochromic material layer 12 itself determines, the present embodiment is not construed as limiting this.Alternatively, the photochromic material that in above-mentioned sub-step, photochromic material layer 12 is used can be the capable material of describing in detail that done of the 4th page of 3-7 of this instructions, can also be irreversible ultraviolet color changing powder.
Described irreversible ultraviolet color changing powder, generally be applied in and need above the trade mark of disposable detection, packing etc., under irradiating, ultraviolet light (200～400nm) shows specific color, but after variable color, when replying, be while arriving original visible ray environment, no longer colour killing of the color having generated, thus make trade mark, packing etc. there is disposable detection effect.The photochromic material of the embodiment of the present invention, can be chosen in and under UV-irradiation, show respectively that the irreversible ultraviolet color changing powder of red, green, blue mixes, or directly selects to have the irreversible ultraviolet color changing powder of many colour change functions.While forming photochromic material layer, for being applicable to coating processes, also can suitably add some transparent substrate materials.
The embodiment of the present invention does not limit the specific implementation of photochromic material, can be any implementation well-known to those skilled in the art.
The embodiment of the present invention provides a kind of colored filter substrate preparation method, photochromic material layer is under different exposure parameters after subregion exposure, directly form chromatic filter layer, only need primary coating technique can complete the making of chromatic filter layer, manufacturing process is simple, can reduce production costs, shorten the production cycle; And the stop block of all kinds of chromatic filter layer does not exist overlapping in junction, surface smoothness is high, and the angle section of having eliminated stop block of all kinds is poor.
Embodiment bis-
The embodiment of the present invention also provides a kind of colored filter substrate, comprise: chromatic filter layer, described chromatic filter layer is by photochromic material layer, under different exposure parameters, to be carried out the subregion plurality of color chunk forming that exposes, described photochromic material layer by photochromic material or include photochromic material coating apply form, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
The colored filter substrate that the embodiment of the present invention provides, makes simply, and cost is low; And the stop block of all kinds of chromatic filter layer does not exist overlapping in junction, surface smoothness is high, and the angle section of having eliminated stop block of all kinds is poor.
Alternatively, described chromatic filter layer at least comprises three kinds of color blocking pieces of red, green, blue, generally need select the photochromic material with following features: described photochromic material, under the irradiation of the first wavelength, changes redness into; Under the irradiation of second wave length, change green into; Under the irradiation of three-wavelength, change blueness into.
Alternatively, described photochromic material is irreversible ultraviolet color changing powder.
The colored filter substrate that the embodiment of the present invention provides, makes simply, and cost is low; And the stop block of all kinds of chromatic filter layer does not exist overlapping in junction, surface smoothness is high, and the angle section of having eliminated stop block of all kinds is poor.
Embodiment tri-
The embodiment of the present invention also provides a kind of display device, and it comprises above-mentioned any one colored filter substrate.Described display device can be: any product or parts with Presentation Function such as liquid crystal panel, Electronic Paper, oled panel, mobile phone, panel computer, televisor, display, notebook computer, digital album (digital photo frame), navigating instrument.Display device of the present invention is because having selected the colored filter substrate described in the embodiment of the present invention two, and not only cost is low, and display frame quality also obtains lifting.
It should be noted that, the embodiment of the present invention take the RGB(commonly using red/green/indigo plant) colour mixture scheme describes as example, in addition, also exist RGBY(red/green/indigo plant/Huang), RGBW(is red/green/blue/white) etc. other colour mixture scheme.Those skilled in the art are not paying under the prerequisite of creative work, can be by technical solution of the present invention for other colour mixture schemes, and this all belongs to the scope of protection of the invention.
For the ease of clearly demonstrating; adopted in the present invention first, second printed words such as grade to carry out class discrimination to similar item; these first, second printed words quantitatively do not limit the invention; those skilled in the art are according to content disclosed by the invention, and apparent similar distortion or the related expanding expected all belong in protection scope of the present invention.
Each embodiment in this instructions all adopts the mode of going forward one by one to describe, between each embodiment identical similar part mutually referring to, each embodiment stresses is and the difference of other embodiment.Especially, for apparatus embodiments, because it is substantially similar in appearance to embodiment of the method, so describe fairly simplely, relevant part is referring to the part explanation of embodiment of the method.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited to this, any be familiar with those skilled in the art the present invention disclose technical scope in; the variation that can expect easily or replacement, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claim.
Claims (9)
1. a preparation method for colored filter substrate, is characterized in that, comprising:
On the substrate that is formed with black matrix, apply photochromic material or include the coating of photochromic material, form photochromic material layer;
Described photochromic material layer is carried out to subregion exposure under different exposure parameters, form the chromatic filter layer being comprised of plurality of color stop block, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
2. preparation method according to claim 1, is characterized in that, described chromatic filter layer at least comprises three kinds of color blocking pieces of red, green, blue.
3. preparation method according to claim 2, is characterized in that, described exposure parameter is wavelength; Described described photochromic material layer is carried out to subregion exposure under different exposure parameters, forms the chromatic filter layer being formed by plurality of color stop block, specifically comprise:
Use the light of the first wavelength, do not need to form the region of red resistance by mask plate shielding, described photochromic material layer is exposed, irradiated area forms red stop block;
Use the light of second wave length, do not need to form the region of green resistance by mask plate shielding, described photochromic material layer is exposed, irradiated area forms green stop block;
Use the light of three-wavelength, do not need to form the region of blue stop block by mask plate shielding, described photochromic material layer is exposed, irradiated area forms blue stop block.
4. preparation method according to claim 1, is characterized in that, described photochromic material is irreversible ultraviolet color changing powder.
5. a colored filter substrate, comprising: chromatic filter layer, it is characterized in that,
Described chromatic filter layer is by photochromic material layer, under different exposure parameters, to be carried out the subregion plurality of color chunk forming that exposes, described photochromic material layer by photochromic material or include photochromic material coating apply form, wherein, the described exposure parameter that the color blocking piece of color of the same race is corresponding is identical.
6. colored filter substrate according to claim 5, is characterized in that, described chromatic filter layer at least comprises three kinds of color blocking pieces of red, green, blue.
7. colored filter substrate according to claim 6, is characterized in that,
Described photochromic material, under the irradiation of the first wavelength, changes redness into; Under the irradiation of second wave length, change green into; Under the irradiation of three-wavelength, change blueness into.
8. colored filter substrate according to claim 5, is characterized in that, described photochromic material is irreversible ultraviolet color changing powder.
9. a display device, is characterized in that, comprising: the colored filter substrate described in claim 5-8 any one.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410043227.4A CN103760717A (en) | 2014-01-29 | 2014-01-29 | Color filter substrate, preparation method thereof and display device, |
| PCT/CN2014/091707 WO2015113436A1 (en) | 2014-01-29 | 2014-11-19 | Color filter substrate, manufacturing method therefor, and display apparatus comprising color filter substrate |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410043227.4A CN103760717A (en) | 2014-01-29 | 2014-01-29 | Color filter substrate, preparation method thereof and display device, |
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| CN103760717A true CN103760717A (en) | 2014-04-30 |
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| CN201410043227.4A Pending CN103760717A (en) | 2014-01-29 | 2014-01-29 | Color filter substrate, preparation method thereof and display device, |
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| WO (1) | WO2015113436A1 (en) |
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| WO2015113436A1 (en) * | 2014-01-29 | 2015-08-06 | 京东方科技集团股份有限公司 | Color filter substrate, manufacturing method therefor, and display apparatus comprising color filter substrate |
| CN104965337A (en) * | 2015-07-21 | 2015-10-07 | 深圳市华星光电技术有限公司 | Color filter preparation method |
| CN106526948A (en) * | 2016-11-09 | 2017-03-22 | 惠科股份有限公司 | Light shield applied to display panel manufacturing process |
| CN106842686A (en) * | 2017-03-24 | 2017-06-13 | 惠科股份有限公司 | Display panel and manufacturing process thereof |
| CN110880562A (en) * | 2019-11-29 | 2020-03-13 | 京东方科技集团股份有限公司 | Organic light-emitting display panel, manufacturing method and display device |
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| WO2015113436A1 (en) * | 2014-01-29 | 2015-08-06 | 京东方科技集团股份有限公司 | Color filter substrate, manufacturing method therefor, and display apparatus comprising color filter substrate |
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Also Published As
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| WO2015113436A1 (en) | 2015-08-06 |
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