CN103739203B - Method for manufacturing conductive glass mosaics - Google Patents
Method for manufacturing conductive glass mosaics Download PDFInfo
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- CN103739203B CN103739203B CN201310699126.8A CN201310699126A CN103739203B CN 103739203 B CN103739203 B CN 103739203B CN 201310699126 A CN201310699126 A CN 201310699126A CN 103739203 B CN103739203 B CN 103739203B
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Abstract
The invention relates to the technical field of inorganic nonmetal materials, in particular relates to glass and a production technology thereof, and more particularly relates to a method for manufacturing conductive glass mosaics. The method comprises the steps of (1) material mixing: uniformly coating inorganic conductive powder consisting of one or a mixture of two of inorganic conductive oxide and conductive titanate on glass particles to prepare a mixture, wherein the mass fraction of the inorganic conductive powder is 3-23%, and the mass fraction of the glass particles is 77-97%; (2) material distribution: distributing and spreading the mixture prepared in the step (1) into a mold which is provided with a latticed grid die cavity and is made of a fireproof material or high-temperature metal; and (3) melting: melting in a kiln, taking the obtained product out of the mold after cooling to obtain the conductive glass mosaics, wherein the melting temperature is 1150-1300 DEG C, and the heat preservation time is 1-2 hours.
Description
Technical field
The present invention relates to technical field of inorganic nonmetallic materials, more particularly, to glass and its production technology, more specifically relate to
And a kind of manufacture method of electro-conductive glass mosaic.
Background technology
Our common simple glasses are a kind of insulator under normal conditions, thus are not suitable for some special engineerings and need
Will, particularly needing its demand conductive under normal conditions.Have developed a lot of techniques producing electro-conductive glass for this people, for example
Add conductive ion in glass, in additional conducting film of glass surface etc..In glass add conductive ion mainly for the manufacture of
Solid electrolyte glass, electrocondution slurry conductive glass powder, above main application is lithium ion battery etc.；Add in glass surface
Mainly for the manufacture of electroconductive glass fibre and the glass with surface conductance ability, it is mainly used in flat board to conducting film
Display field, the ITO being for example widely used in flat pannel display（Stannum Indium sesquioxide.）Glass.Leading manufactured by both the above mode
Electric glass high cost, and range is substantially stationary, and particularly ito glass manufacturing equipment is expensive, needs plasma sputtering
Equipment, and the electro-conductive glass manufacturing only has, on surface, the conducting film that one layer of sputtering is formed, and is substantially only used for flat pannel display
Field.
In building and ornament materials, glass occupies very big ratio.With the progress of production technology and material, except
Outside traditional building glass, glass Mosaic, devitrified glass brick, microcrystallite glass-ceramic composite brick, Polished crystal tile, glazed tile etc. are new to produce
Product continue to bring out, and play more and more important effect in building internal and external ornament.If by conducting glass material be used for
Upper product, then can obtain the building decorative product with electro-magnetic screen function, electrostatic-proof function, electric heating function.But, above
The two kinds of existing electro-conductive glass manufacturing technologies introduced are not suitable for manufacturing building and ornament materials electro-conductive glass.
Content of the invention
It is an object of the invention to proposing a kind of cheap electro-conductive glass, it has with low cost, and manufacturing process is simple etc.
Feature, and building and ornament materials can be manufactured by it or as a kind of basic material, using this kind of electro-conductive glass as material
Material is moreover it is possible to producing such as conducting plate glass, electro-conductive glass mosaic, having the glass-ceramic clad plate of conductive glass layer
Deng conductive glass articles, can give people to provide comfortable, healthy living space.
For reaching this purpose, the present invention employs the following technical solutions：A kind of electro-conductive glass, it is by by inorganic conductive powder body bag
Make glass mixture after overlaying on glass particle surface, then melt at 1150 DEG C～1300 DEG C, cooling is obtained, described inorganic
Conductive powder body is inorganic conductive oxide, one of conductive titanate or both mixture, makes in glass mixture
The mass fraction of inorganic conductive powder body is 3%～23%, and glass particle mass fraction is 77%～97%.
Melt at 1150 DEG C～1300 DEG C, there is no complete melting mixing between glass particle, and be only fusion together one
Rise, thus the inorganic conductive powder body being coated on glass particle surface forms conductive mesh in electro-conductive glass, is wrapped in glass in net
Phase, therefore this electro-conductive glass resistance is uniform, and conductive effect is good.
Further, in above-mentioned electro-conductive glass, inorganic conductive oxide is including but not limited to conductive tin oxide, conduction
One or more of zinc oxide, conductive titanium oxide, electric conductive oxidation ferrum mix.
Further, in above-mentioned electro-conductive glass, conductive titanate is including but not limited to conductive Barium metatitanate., conductive titanium
One or more of lead plumbate mixes.
Further, in above-mentioned electro-conductive glass, glass particle can be low temperature glass granule, common building glass
Grain, the combination of one or more of ware glass granule, devitrified glass granule, glass frit granule.
Cryogenic glass powder refers to the relatively low glass dust of melt temperature, such as nonex powder；Common building glass dust refers to
Plate glass used by door and window broken powder made after discarding；Ware glass powder refers to that vial, tank, cup, dish are broken after discarding
The broken powder made；Microcrystalline glass powder refers to the powder that devitrified glass is made after crushing, and glass frit powder refers to molten state
The block that the cooling of glass direct-water-quenching is obtained is broken into the powder that powder is made.In addition, glass frit is usually as Production of Ceramics
Glaze raw material, mainly act as flux and improve glaze quality effect, in addition glass frit can also as produce crystallite glass
The raw material of glass ceramic clad plate.
Further, in above-mentioned electro-conductive glass, the particle diameter of glass particle is 1mm～15mm, more preferably 2mm～
8mm, above particle size range is conducive to inorganic conductive powder body to be wrapped on glass particle.
Above-mentioned electro-conductive glass can be made conducting plate glass, electro-conductive glass mosaic, have the crystallite of conductive glass layer
Glass ceramic composite boards.
The present invention also provides a kind of method manufacturing electro-conductive glass, and it comprises the steps：
Step 1）Batch mixing：To be made up of one of inorganic conductive oxide, conductive titanate or both mixture
Inorganic conductive powder body be uniformly coated on glass particle, make compound, the mass fraction of wherein inorganic conductive powder body is
3%～23%, the mass fraction of glass particle is 77%～97%.
Step 2）Pile up：Just step 1）Prepared compound is piled up on the carrier.
Step 3）Found：By step 2）The supporting body that accumulation has compound is placed in kiln to be founded, and glass melting temperature is
1150 DEG C～1300 DEG C；Electro-conductive glass is obtained after cooling.
Further, in the above-mentioned methods, the material of supporting body can be refractory material, ceramic green body, ceramic biscuiting
One of base substrate, high-temperature metal.Supporting body surface topography and when assuming different shape, prepared electro-conductive glass shape is not yet
With for example supporting body surface topography is plane, then can make conducting plate glass；Supporting body surface has latticed side
Lattice, then can make electro-conductive glass mosaic.
Further, in the above-mentioned methods, it is provided with adherent layer between supporting body and compound, after so sintering, conductive glass
Glass just can be easy to take off from supporting body.The material of adherent layer can be aluminium oxide, aluminum vanadine, mullite, carborundum, nitridation
The refractory materials such as silicon；Specifically, above-mentioned refractory material ball milling can be become slurry, coating on the carrier, then dispenses mixed again
Close material.
Further, in the above-mentioned methods, step 1）Used in conductive oxide include but is not limited to electric conductive oxidation
One or more of stannum, conductive zinc oxide, conductive titanium oxide, electric conductive oxidation ferrum mix.
Further, in the above-mentioned methods, step 1）Used in the titanate of conduction include but is not limited to conductive titanium
The mixing of one or more of sour barium, conductive lead titanates.
Further, in the above-mentioned methods, step 1）Used in glass particle particle diameter be 1mm～15mm；Enter one
Step is preferably 2mm～8mm, and above particle size range is conducive to inorganic conductive powder body to be coated on inorganic conductive powder surface.
In order to inorganic conductive powder body can be preferably wrapped on glass particle, in the above-mentioned methods, step 1）Described
Inorganic conductive powder body is previously added in the organic solvents such as water or ethanol dries system with glass particle cladding after making electrocondution slurry again
Obtain compound.Preferably, the quality of the organic solvent such as water or ethanol is 1/3～3/2 times of inorganic conductive powder quality.
In the above-mentioned methods, electrocondution slurry and glass particle cladding baking operation can adopt slurry atomization spraying process, slurry
Dipping paddling process.Above-mentioned slurry atomization spraying process is to be atomized electrocondution slurry compressed air, by spray gun spraying in glass
Grain surface, to be dried after, be formed at the compound of one layer of inorganic conductive powder body of glass particle Surface coating；Impregnating slurry paddling process
It is to immerse glass particle in electrocondution slurry, be then stirred continuously to uniform, then dry, obtain compound.
Further, in the above-mentioned methods, film former, dispersant, flux, froth breaking can also be contained in electrocondution slurry
Agent.
Film former can select ethyl cellulose, methylcellulose, polyvinyl alcohol, glycerol etc., and addition is generally slurry
The 0.5%-3% of quality, its Main Function is to allow slurry have viscosity so that inorganic conductive powder body can be formed on glass particle surface
Firm integument.
Dispersant is referred to as water reducer, primarily to reducing solvent in slurry, thus reach economizing on resources
Effect, it can be spent pulping liquor, waterglass, polyacrylic acid, sodium tripolyphosphate, and it adds quality and is generally stock quality
0.3%-0.5%.
Cosolvent is primarily to reduce melt temperature, and makes the electro-conductive glass made finer and close, smooth, pore
Rate is low, and it can be potassium, sodium, lithium Anhydrite, spodumene, lead borate, glass dust etc., addition be generally stock quality 5% with
Under.
Primarily to reducing the bubble in slurry, it can be that ethanol, isopropanol, n-butyl alcohol, dimethyl are sweet to defoamer
Oil etc., addition is usually no more than the 1% of stock quality.
Further, the present invention also provides a kind of method manufacturing conducting plate glass, and it comprises the steps：
Step 1）Batch mixing：To be made up of one of inorganic conductive oxide, conductive titanate or both mixture
Inorganic conductive powder body be uniformly coated on glass particle, make compound, the mass fraction of wherein inorganic conductive powder body is
3%～23%, the mass fraction of glass particle is 77%～97%.
Step 2）Cloth：By step 1）The uniform charity of compound of preparation is on surface on the supporting body of plane.
Step 3）Melt system：Found in kiln again, glass melting temperature is 1150 DEG C～1300 DEG C, temperature retention time is little for 1～2
When；Cold go after will obtain product and take off from supporting body, obtain conducting plate glass.
The antistatic plate glass more than made can carry out the machining in later stage, including cutting, grinding, polishing etc..
Further, in the above-mentioned methods, the material of supporting body can be refractory material, ceramic green body, ceramic biscuiting
One of base substrate, high-temperature metal.
Further, in the above-mentioned methods, it is provided with adherent layer between supporting body and compound, after so sintering, conductive flat
Glass sheet just can be easy to take off from supporting body.The material of adherent layer can be aluminium oxide, mullite, carborundum, silicon nitride
In refractory material；Specifically, above-mentioned refractory material ball milling can be become slurry, coating on the carrier, then dispenses mixing again
Material.
Further, the present invention also provides a kind of method manufacturing electro-conductive glass mosaic, and it comprises the steps：
Step 1）Batch mixing：To be made up of one of inorganic conductive oxide, conductive titanate or both mixture
Inorganic conductive powder body be uniformly coated on glass particle, make compound, the mass fraction of wherein inorganic conductive powder body is
3%～23%, the mass fraction of glass particle is 77%～97%.
Step 2）Cloth：The compound cloth that step 1 is made be sprinkled into have latticed grid die cavity by refractory material or
In the mould that high-temperature metal is made.
Step 3）Melt system：Found in kiln again, glass melting temperature is 1150 DEG C～1300 DEG C, temperature retention time is little for 1～2
When；Cold go after will obtain product and be removed from the molds, you can obtain electro-conductive glass mosaic.
Further, in the above-mentioned methods, the material of mould can be refractory material, ceramic green body, ceramic biscuit
One of body, high-temperature metal.
Further, in the above-mentioned methods, it is provided with adherent layer between mould and compound, after so sintering, electro-conductive glass
Mosaic just can be easy to take off from supporting body.The material of adherent layer can be aluminium oxide, mullite, carborundum, silicon nitride
In refractory material；Specifically, above-mentioned refractory material ball milling can be become slurry, be coated on mould, then dispense compound again.
Melt at 1150 DEG C～1300 DEG C, there is no complete melting mixing between glass particle, and be only fusion together one
Rise, thus the inorganic conductive powder body being coated on glass particle surface forms conductive mesh in electro-conductive glass mosaic, wrap up in net
Glass phase, therefore this electro-conductive glass mosaic resistance is uniform, and conductive effect is good.
Further, the present invention also provides a kind of manufacture to have the side of the glass-ceramic clad plate of conductive glass layer
Method, it comprises the steps：
Step 1）Batch mixing：To be made up of one of inorganic conductive oxide, conductive titanate or both mixture
Inorganic conductive powder body be uniformly coated on glass particle, make compound, the mass fraction of wherein inorganic conductive powder body is
3%～23%, the mass fraction of glass particle is 77%～97%.
Step 2）Cloth：Uniform charity step 1 on ceramic body）The compound manufacturing, the ulking thickness of compound is 2
～8mm.
Step 3）Enter klining：Burn till in roller kilns oxidizing atmosphere, 1150～1250 DEG C of firing temperature, firing period is 60
～120 minutes.
Step 4）Rubbing down is processed：The product going out kiln cooling is carried out edging and polishing, obtains with electro-conductive glass
The method of the glass-ceramic clad plate of layer.
In order to allow step 2）Middle compound preferably can be piled up on ceramic body, can spray fixative in cloth；Gu
Determining agent is viscosity solution, and compound can be bonded on ceramic body for it.
Compared to the prior art, the electro-conductive glass of manufacture of the present invention is cheap, process is simple, be easily achieved, and can use
Its construction material enriching as raw material manufacture, such as plate glass, glass Mosaic, the devitrified glass having conductive glass layer are made pottery
Porcelain composite plate etc., imparts the new functions such as glass for building purposes material electromagnetic shielding, antistatic, electrical heating.
Specific embodiment
To further illustrate technical scheme below by specific embodiment.
Table 1 below is the formula table of embodiment.
Table 1
Cryogenic glass powder refers to the relatively low glass dust of melt temperature, such as lead glass powder；Common building glass dust refers to door
Plate glass used by window broken powder made after discarding；Ware glass powder refers to that vial, tank, cup, dish are broken after discarding
The powder made；Microcrystalline glass powder refers to the powder that devitrified glass is made after crushing, and glass frit powder refers to the glass of molten state
The block that the cooling of glass direct-water-quenching is obtained is broken into the powder that powder is made.In addition, glass frit is usually as Production of Ceramics
Glaze raw material, mainly acts as flux and improves glaze quality effect, and in addition glass frit can also be used as production devitrified glass
The raw material of ceramic clad plate.
Embodiment 1～10：Manufacture conducting plate glass.
Its manufacture method is as follows：
Step 1）Batch mixing：According to recipe ingredient listed by table 1, by by inorganic conductive oxide, conductive titanate
Plant or the inorganic conductive powder body of both mixture compositions is uniformly coated on glass particle, make compound, wherein inorganic
The mass fraction of conductive powder body is 3%～23%, and the mass fraction of glass particle is 77%～97%.
Step 2）Cloth：By step 1）The uniform charity of compound of preparation on surface on the supporting body of plane, charity shape
The thickness of feed layer becoming is about 5mm；Here supporting body is chosen as refractory brick, and certain Ceramic Tiles base substrate or refractory metal etc. all may be used
To select.
Step 3）Melt system：Found in kiln again, glass melting temperature is 1150 DEG C～1300 DEG C, temperature retention time is little for 1～2
When；Cold go after will obtain product and take off from supporting body, obtain conducting plate glass.
The manufactured plate glass of test, its bulk resistor is 105～109Ω·m.
Embodiment 1 is inorganic conductive powder body to be shaken together with glass dust stirring make cladding material, because inorganic conductive powder
Body is difficult to adhere on glass particle again, and therefore parcel effect is poor.
In order to allow inorganic conductive powder body and glass particle fully to wrap up, in the manufacture method of embodiment 2-10, step 1）
Described inorganic conductive powder body is previously added in the organic solvents such as water or ethanol after making electrocondution slurry and is coated with glass particle
Dry and compound is obtained, in slurry, the quality of the organic solvent such as water or ethanol is 1/3～3/2 times of inorganic conductive powder quality.
So inorganic conductive powder body can uniformly be wrapped in glass particle surface, can shorten melting time, improves efficiency.Wherein embodiment
2-3 adopts and uses water as solvent, 1/3 times that is inorganic conductive powder quality with quality of water, and in order to allow conductive paste part can be relatively
Good is attached on glass particle, is also dissolved with mass fraction 2%～5% carboxymethyl cellulose in water；In embodiment 4-6 be by
Inorganic conductive powder body adds ball milling mixing in ethanol, and the quality of ethanol is 1 times of inorganic conductive powder quality, and contains in ethanol
There is the polyvinyl alcohol that mass fraction is 1%～3%（PVA）As film former；Embodiment 7 and 8 selects ethanol water as solvent
Ball milling mixing, the quality of ethanol water is 1.2 times of inorganic conductive powder quality, and contains mass parts in ethanol water
The polyvinyl alcohol for 1%～3% for the number（PVA）As film former；Embodiment 9 and 10 selects choosing to use water as solvent, water use quality
For 1.5 times of inorganic conductive powder quality, in addition, be additionally added the film former of stock quality 0.5%-3%, 0.3%- in ball milling
0.5% dispersant ,≤5% cosolvent, after slurry ball milling is released well, in order to eliminate foam, add≤stock quality 1%
Defoamer.
Film former can select ethyl cellulose, methylcellulose, polyvinyl alcohol, glycerol etc., and addition is generally slurry
The 0.5%-3% of quality, its Main Function is to allow slurry have viscosity so that inorganic conductive powder body can be formed on glass particle surface
Firm integument.It is chosen as methylcellulose in the embodiment above.
Dispersant is referred to as water reducer, primarily to reducing solvent in slurry, thus reach economizing on resources
Effect, it can be spent pulping liquor, waterglass, polyacrylic acid, sodium tripolyphosphate, and it adds quality and is generally stock quality
0.3%-0.5%.It is chosen as sodium tripolyphosphate in the embodiment above.
Cosolvent is primarily to reduce melt temperature, and makes the electro-conductive glass made finer and close, smooth, pore
Rate is low, and it can be potassium, sodium, lithium Anhydrite, spodumene, lead borate etc., and addition is generally less than the 5% of stock quality.More than
It is chosen as the spodumene of stock quality 3% in embodiment.
Primarily to reducing the bubble in slurry, it can be that ethanol, isopropanol, n-butyl alcohol, dimethyl are sweet to defoamer
Oil etc., addition is usually no more than the 1% of stock quality.It is chosen as diformazan base glycerol in the embodiment above.
In the above-mentioned methods, electrocondution slurry and glass particle cladding baking operation are using slurry atomization spraying process, slurry
Dipping paddling process.Above-mentioned slurry atomization spraying process is to be atomized electrocondution slurry compressed air, by spray gun spraying in glass
Grain surface, to be dried after, be formed at the compound of one layer of inorganic conductive powder body of glass particle Surface coating, embodiment 2-5 is selected
The method；Impregnating slurry paddling process is to immerse glass particle in electrocondution slurry, is then stirred continuously to uniform, then dries,
Obtain the compound coating, embodiment 6-10 selects the method.
In embodiment 10, it is provided with adherent layer between supporting body and compound, after so sintering, conducting plate glass is just
Can be easy to take off from supporting body.The refractory materials such as the material bauxite of adherent layer；Specifically by bauxite solubilizer ball
It is milled into, coating on the carrier, then dispenses compound again.
In addition, in order to eliminate the stress in conducting plate glass, it can be annealed at 400 DEG C～540 DEG C 0.5～2
Hour.Annealing can eliminate the stress of glass kind, prevents the broken loss that stress concentration causes.In addition also allow for being thrown
The machinings such as mill, cutting.
Embodiment 11-20
A kind of method manufacturing electro-conductive glass mosaic of here system class embodiment, selects formula in table 1, respectively as enforcement
The formula of example 11-20.
This be class embodiment manufacture electro-conductive glass mosaic method as follows：
Step 1）Batch mixing：According to the technique described in embodiment 1-10, inorganic conductive powder body is coated on glass particle
On make compound.
Step 2）Cloth：The compound cloth that step 1 is made be sprinkled into have latticed grid die cavity by refractory material oxygen
Change in the mould that aluminum is made；The specification of mould mesh-type grid die cavity is 50mm × 50mm × 12mm.
Step 3）Melt system：Found in kiln again, glass melting temperature is 1150 DEG C～1300 DEG C, temperature retention time is little for 1～2
When；Cold go after will obtain product and be removed from the molds, you can obtain electro-conductive glass mosaic.
In the above-mentioned methods, the material of mould can also be alumina other refractory materials outer, such as aluminium oxide, carbonization
Silicon, silicon nitride etc., the refractory metal such as alloy of such as tungsten or tungsten can also be used as mold materials certainly.
In embodiment 15-20, between mould and compound, it is provided with adherent layer, after so sintering, electro-conductive glass mosaic
Just can be easy to take off from supporting body.The material of adherent layer is that alumina powder ball milling becomes slurry, is coated in and is formed on mould.
Melt at 1150 DEG C～1300 DEG C, there is no complete melting mixing between glass particle, and be only fusion together one
Rise, thus the inorganic conductive powder body being coated on glass particle surface forms conductive mesh in electro-conductive glass mosaic, wrap up in net
Glass phase, therefore this electro-conductive glass mosaic resistance is uniform, and conductive effect is good.
In addition, in order to prevent the glass paste being formed after melting from overflowing, step 2）Middle compound is dispensed into latticed
When in the mould that refractory material or high-temperature metal are made, fill up 1/2～2/3 depth of grid.It is the choosing of class embodiment at this
Selecting depth is 12mm, and compound maximum ulking thickness within a grid is 6-8mm.
Test the electro-conductive glass mosaic having manufactured, its bulk resistor is 105～109Ω·m.
Wherein embodiment 21-30
It is in class embodiment, to provide a kind of glass-ceramic clad plate with conductive glass layer, its manufacturer at this
Method is as follows：
Step 1）Batch mixing：According to the technique described in embodiment 1-10, inorganic conductive powder body is coated on glass particle
On make compound.
Step 2）Cloth：Uniform charity step 1 on specification is for 800mm × 800mm ceramic body）The compound manufacturing,
The ulking thickness of compound is 2～8mm.
Step 3）Enter klining：Burn till in roller kilns oxidizing atmosphere, 1200～1250 DEG C of firing temperature, firing period is 60
～120 minutes.
Step 4）Rubbing down is processed：The product going out kiln cooling is carried out edging and polishing, obtains with electro-conductive glass
The method of the glass-ceramic clad plate of layer.
In order to avoid in charity, the compound on ceramic body drops because transporting the factors such as vibrations, can be in cloth mistake
Spray fixative in journey, in embodiment 30, spray the carboxymethyl cellulose aqueous solution that mass fraction is 5%.
Test the crystallite glass composite plate having manufactured, the bulk resistor of its surface glass layer is 105～109Ω·m
Describe the know-why of the present invention above in association with specific embodiment.These descriptions are intended merely to explain the present invention's
Principle, and limiting the scope of the invention can not be construed to by any way.Based on explanation herein, the technology of this area
Personnel do not need to pay other specific embodiments that performing creative labour can associate the present invention, and these modes fall within
Within protection scope of the present invention.
Claims (6)
1. a kind of manufacture method of electro-conductive glass mosaic, it comprises the steps：
Step 1）Batch mixing：By by conductive titanate or its inorganic conductive powder body of forming with inorganic conductive hopcalite
It is uniformly coated on glass particle, make compound, the wherein mass fraction of inorganic conductive powder body is 3%～23%, glass
The mass fraction of grain is 77%～97%；
Step 2）Cloth：The compound cloth that step 1 is made be sprinkled into have latticed grid die cavity by refractory material or high temperature
In the mould that metal is made；
Step 3）Melt system：Found in kiln again, glass melting temperature is 1150 DEG C～1300 DEG C, temperature retention time is 1～2 hour；Cold
Product will be obtained after going be removed from the molds, you can obtain electro-conductive glass mosaic；
Described conductive titanate is conductive Barium metatitanate., the mixing of one or more of conductive lead titanates.
2. the method for claim 1 it is characterised in that described inorganic conductive oxide be conductive tin oxide, conductive oxygen
Change the mixing of one or more of zinc, conductive titanium oxide, electric conductive oxidation ferrum.
3. the method as described in any one in claim 1-2 it is characterised in that in the above-mentioned methods, step 1）Described
Inorganic conductive powder body is previously added in water or ethanol to be dried with glass particle cladding after making electrocondution slurry again and compound is obtained.
4. method as claimed in claim 3 is it is characterised in that the quality of described water or ethanol is inorganic conductive powder quality
1/3～3/2 times.
5. the method for claim 1 is it is characterised in that step 2）Middle when compound cloth is sprinkled in mould, fill up mould
1/2～2/3 depth of grid die cavity on tool.
6. if the electro-conductive glass mosaic of any one methods described preparation in claim 1,2,4,5 is it is characterised in that described
Inorganic conductive powder body forms conductive network in electro-conductive glass mosaic, and glass phase is wrapped in above-mentioned conductive network.
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| CN201310699126.8A CN103739203B (en) | 2013-12-17 | 2013-12-17 | Method for manufacturing conductive glass mosaics |
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|---|---|---|---|---|
| CN101117264A (en) * | 2007-06-29 | 2008-02-06 | 上海晶采建材厂 | Process for making glass mosaic |
| CN102219525A (en) * | 2011-05-10 | 2011-10-19 | 广东东鹏陶瓷股份有限公司 | Anti-static ceramic tile and manufacturing method thereof |
| CN103204632A (en) * | 2012-01-14 | 2013-07-17 | 比亚迪股份有限公司 | Conductive glass powder and its preparation method, crystalline silicon solar battery aluminum conductive paste and preparation method |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101117264A (en) * | 2007-06-29 | 2008-02-06 | 上海晶采建材厂 | Process for making glass mosaic |
| CN102219525A (en) * | 2011-05-10 | 2011-10-19 | 广东东鹏陶瓷股份有限公司 | Anti-static ceramic tile and manufacturing method thereof |
| CN103204632A (en) * | 2012-01-14 | 2013-07-17 | 比亚迪股份有限公司 | Conductive glass powder and its preparation method, crystalline silicon solar battery aluminum conductive paste and preparation method |
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