CN103700322A - Array substrate and display device - Google Patents

Array substrate and display device Download PDF

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Publication number
CN103700322A
CN103700322A CN201310741782.XA CN201310741782A CN103700322A CN 103700322 A CN103700322 A CN 103700322A CN 201310741782 A CN201310741782 A CN 201310741782A CN 103700322 A CN103700322 A CN 103700322A
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data line
wave
insulation layer
gate insulation
line
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CN201310741782.XA
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CN103700322B (en
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永山和由
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Abstract

The invention relates to the technical field of displaying and discloses an array substrate which comprises a grid line formed on an underlay substrate, a grid insulating layer and a data line. A plurality of first concave-convex structures are formed on the surface, away from the underlay substrate, of the grid insulating layer. The invention further discloses a display device comprising the array substrate. By enabling the surface of the grid insulating layer to form a graph of a concave-convex structure, the grid or the data line formed on the surface of the grid insulating layer is enabled to form a graph of a concave-convex structure, and the graph of the concave-convex structure can enable a tension portion to be dispersed when a flexible display device bends, so that breaking probability of the grid line or the data line when the flexible display device bends is reduced, and the flexible display device is ensured to be capable of normally displaying.

Description

Array base palte and display device
Technical field
The present invention relates to display technique field, particularly a kind of array base palte and display device.
Background technology
Flexible display apparatus is compared with common rigid display, and flexible display has plurality of advantages: shock-resistant, shock resistance is stronger; Lightweight, volume is little; Carry convenient; Employing is similar to the coil type technique of newspaper printing technique, and cost is cheaper etc.Main flexible display apparatus mainly comprises at present: flexible OLED display and flexible liquid crystal display etc.
For flexible OLED display and flexible liquid crystal display, when bending, easily rupture in grid line and data line corresponding region.This fracture may cause the voltage of signal cannot transfer to pixel electrode, thereby causes showing bad.
The OLED display of 2T1C of take is example, as shown in Fig. 1 a and 1b, shows a pixel cell on this display array substrate.Thin film transistor (TFT) wherein (TFT) is bottom grating structure, and this pixel cell comprises grid line 120, gate insulation layer 130, data line 141, power signal line 142, passivation layer 150, resin bed 160, anode 170 and the pixel defining layer 180 being formed on underlay substrate 110.If this display is when bending, grid line 120 or data line 141 and signal wire 142, in the fracture along dotted line place, can cause the later pixel cell of breaking part normally to work, to such an extent as to show bad.
Summary of the invention
(1) technical matters that will solve
The technical problem to be solved in the present invention is: how to reduce to cause the probability of grid line or data line fracture when flexible display apparatus is crooked, flexible display apparatus can normally be shown.
(2) technical scheme
For solving the problems of the technologies described above, the invention provides a kind of array base palte, comprise the grid line, gate insulation layer and the data line that are formed on underlay substrate, the surface that described gate insulation layer deviates from described underlay substrate is formed with some the first concaveconvex structures.
Wherein, described the first concaveconvex structure and described gate insulation layer are integrally formed, and the surface that makes described gate insulation layer deviate from described underlay substrate is first wave shape wave face.
Wherein, the straight line at the wave bearing of trend place of described first wave shape wave face and described data line are the angle that is greater than 0 ° and is less than 90 °.
Wherein, described grid line is formed on described underlay substrate, and described gate insulation layer is formed on grid line, and described data line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described data line direction.
Wherein, described data line is formed on described underlay substrate, and described gate insulation layer is formed on data line, and described grid line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described grid line direction.
Wherein, also comprise the cushion being formed on described underlay substrate, the surface that described cushion deviates from described underlay substrate is formed with some the second concaveconvex structures.
Wherein, described the second concaveconvex structure and described gate insulation layer are integrally formed, and the surface that makes described gate insulation layer deviate from described underlay substrate is Second Wave shape wave face.
Wherein, straight line and the described data line at the wave bearing of trend place of described first wave shape wave face are the angle that is greater than 0 ° and is less than 90 °, and the straight line at the wave bearing of trend place of described Second Wave shape wave face and described grid line are the angle that is greater than 0 ° and is less than 90 °.
Wherein, described cushion is formed on underlay substrate, described grid line is formed on described cushion, described gate insulation layer is formed on grid line, described data line is formed on gate insulation layer, the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described data line direction, or is with described data line the angle that is greater than 0 ° and is less than 90 °; The straight line at the wave bearing of trend place of described Second Wave shape wave face is consistent with described grid line direction, or is with described grid line the angle that is greater than 0 ° and is less than 90 °.
Wherein, described cushion is formed on underlay substrate, described data line is formed on described cushion, described gate insulation layer is formed on data line, described grid line is formed on gate insulation layer, the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described grid line direction, or is with described grid line the angle that is greater than 0 ° and is less than 90 °; The straight line at the wave bearing of trend place of described Second Wave shape wave face is consistent with described data line direction, or is with described data line the angle that is greater than 0 ° and is less than 90 °.
The present invention also provides a kind of display device, comprises the array base palte described in above-mentioned any one.
(3) beneficial effect
The present invention is by forming the surface of gate insulation layer in the figure of concaveconvex structure, make to be like this formed on the grid line of gate electrode insulation surface or the figure that data line also forms concaveconvex structure, the figure of this concaveconvex structure can make tension portion dispersion when flexible display apparatus is crooked, thereby the probability that has reduced to cause grid line or data line fracture when flexible display apparatus is crooked, has guaranteed that flexible display apparatus can normally show.
Accompanying drawing explanation
Fig. 1 a is the structural representation (only showing a dot structure) of a kind of array base palte of prior art.
Fig. 1 b is along the schematic cross-section of A-A in Fig. 1 a;
Fig. 2 a is the structural representation of a kind of array base palte of the embodiment of the present invention;
Fig. 2 b is along the schematic cross-section of A-A in Fig. 2 a;
Fig. 2 c is the structural representation of the another kind of array base palte of the embodiment of the present invention;
Fig. 2 d is along the schematic cross-section of A-A in Fig. 2 c;
Fig. 3 is the structural representation of another array base palte of the embodiment of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples are used for illustrating the present invention, but are not used for limiting the scope of the invention.
The array base palte of the present embodiment, comprise the structures such as grid line, gate insulation layer and data line that are formed on underlay substrate, for reducing flexible display panels at when bending grid line (top gate type TFT) or the probability of data line (bottom gate type TFT) fracture, the surface that deviates from described underlay substrate at gate insulation layer is formed with some the first concaveconvex structures, the grid line or the data line that make to be like this formed on gate insulation layer also correspondingly form some the first concaveconvex structures, this first concaveconvex structure has the effect of the tension force of dispersion, thereby makes not easy fracture of grid line or data line.
Particularly, shown in Fig. 2 a and 2b, with OLED array base palte, and thin film transistor (TFT) is that bottom gate type is example, comprise the grid line 220, gate insulation layer 230, data line 241, power signal line 242, passivation layer 250, resin bed 260, anode 270 and the pixel defining layer 180 that are formed on successively on underlay substrate 210.When display panel is crooked, for data line 241 and power signal line 242 are not ruptured, in the present embodiment, the surface of gate insulation layer 230 away from substrate substrates 210 is formed with some the first concaveconvex structures, for convenient, make, preferably, described the first concaveconvex structure and gate insulation layer 230 are integrally formed, and to make the surface of gate insulation layer 230 away from substrate substrates 210 be first wave shape wave face.Described first wave shape wave face and data line 241 are the angle that is greater than 0 ° and is less than 90 °, make like this data line 241 and the power signal line 242 that are formed on gate insulation layer 230 surfaces also form ups and downs structure.Preferably, as shown in Fig. 2 a and 2b, make the straight line at wave bearing of trend place of first wave shape wave face consistent with data line 241 directions, make to be like this formed on also undulate structure of the data line 241 on gate insulation layer 230 surfaces and power signal line 242.Wavy shaped configuration can be disperseed tension force better, therefore, has reduced the probability of data line 241 and power signal line 242 fractures.
For top gate type TFT structure, data line is formed on underlay substrate, gate insulation layer is formed on grid line on data line and is formed on gate insulation layer, the wave bearing of trend of first wave shape wave face and grid line are the angle that is greater than 0 ° and is less than 90 °, preferably, the straight line at the wave bearing of trend place of first wave shape wave face is consistent with grid line direction.
No matter be the TFT of bottom gate or top gate structure, the concaveconvex structure of gate electrode insulation surface can only make not easy fracture of the data line that is located thereon or grid line.In order to be all easy fractures not of data line and grid line, further, this array base palte also comprises the cushion being formed on underlay substrate, and the surface of cushion away from substrate substrate is formed with some the second concaveconvex structures, then in this buffering, form grid line or data line and on figure.The grid line or the data line that make to be like this formed on cushion also correspondingly form some the second concaveconvex structures, and this second concaveconvex structure has the effect of the tension force of dispersion, thereby makes not easy fracture of grid line or data line.
Take bottom grating structure TFT equally as example, as shown in Fig. 2 c and 2d, the cushion 290 on underlay substrate 210.For convenient, make, preferably, described the second concaveconvex structure and cushion 290 are integrally formed, and to make the surface of cushion 290 away from substrate substrates 210 be Second Wave shape wave face.Grid line 210 is formed on cushion 290, and gate insulation layer 230 is formed on grid line 210, and described data line 241 and power signal line 242 are formed on gate insulation layer 230.The wave bearing of trend of described first wave shape wave face and data line 241 are the angle that is greater than 0 ° and is less than 90 °, preferably, consistent with data line 241 directions.Straight line and the grid line 210 at the wave bearing of trend place of described Second Wave shape wave face are the angle that is greater than 0 ° and is less than 90 °, preferably, consistent with grid line 210 directions.
TFT for top gate structure, described cushion is formed on underlay substrate, described data line is formed on described cushion, described gate insulation layer is formed on data line, described grid line is formed on gate insulation layer, straight line and the described grid line at the wave bearing of trend place of described first wave shape wave face are the angle that is greater than 0 ° and is less than 90 °, preferably, consistent with described grid line direction.Straight line and the described data line at the wave bearing of trend place of described Second Wave shape wave face are the angle that is greater than 0 ° and is less than 90 °, preferably, consistent with described data line direction.
No matter be the TFT of top grid or bottom grating structure, above-mentioned first wave shape wave face and Second Wave shape wave face wave bearing of trend separately can also as shown in Figure 3, all be with grid line or data line the angle that is greater than 0 ° and is less than 90 °.
The present invention main improved be gate insulation layer and the cushion structure on surface separately on array base palte so that flexible display apparatus grid line or data line easy fracture not when bending.On array base palte, other hierarchical structure is all identical with existing structure, repeats no more herein.
The mode that adopts mask plate to expose to the gate insulation layer of colloid material and cushion when making gate insulation layer and cushion is made, and in practical operation, first has the angle of gradient after exposure, and this angle of gradient can control, and can form the inclined-plane of both sides.And because material is glue class, the horizontal level forming in exposure process and inclined-plane intersection can form fillet, and on-right angle or wedge angle.Therefore shorten after the pitch of holes of exposure mask, in the scope that can reach at process, the figure that exposure forms can form level and smooth waveform.
The present invention also provides a kind of display device that comprises above-mentioned array base palte, this display device is flexible display apparatus, can be: any product or parts with Presentation Function such as liquid crystal panel, Electronic Paper, oled panel, mobile phone, panel computer, televisor, display, notebook computer, digital album (digital photo frame), navigating instrument.
Above embodiment is only for illustrating the present invention; and be not limitation of the present invention; the those of ordinary skill in relevant technologies field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.

Claims (11)

1. an array base palte, comprises the grid line, gate insulation layer and the data line that are formed on underlay substrate, it is characterized in that, the surface that described gate insulation layer deviates from described underlay substrate is formed with some the first concaveconvex structures.
2. array base palte as claimed in claim 1, is characterized in that, described the first concaveconvex structure and described gate insulation layer are integrally formed, and the surface that makes described gate insulation layer deviate from described underlay substrate is first wave shape wave face.
3. array base palte as claimed in claim 2, is characterized in that, straight line and the described data line at the wave bearing of trend place of described first wave shape wave face are the angle that is greater than 0 ° and is less than 90 °.
4. array base palte as claimed in claim 2, it is characterized in that, described grid line is formed on described underlay substrate, described gate insulation layer is formed on grid line, described data line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described data line direction.
5. array base palte as claimed in claim 2, it is characterized in that, described data line is formed on described underlay substrate, described gate insulation layer is formed on data line, described grid line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described grid line direction.
6. array base palte as claimed in claim 2, is characterized in that, also comprises the cushion being formed on described underlay substrate, and the surface that described cushion deviates from described underlay substrate is formed with some the second concaveconvex structures.
7. array base palte as claimed in claim 6, is characterized in that, described the second concaveconvex structure and described gate insulation layer are integrally formed, and the surface that makes described gate insulation layer deviate from described underlay substrate is Second Wave shape wave face.
8. array base palte as claimed in claim 6, it is characterized in that, straight line and the described data line at the wave bearing of trend place of described first wave shape wave face are the angle that is greater than 0 ° and is less than 90 °, and the straight line at the wave bearing of trend place of described Second Wave shape wave face and described grid line are the angle that is greater than 0 ° and is less than 90 °.
9. array base palte as claimed in claim 7, it is characterized in that, described cushion is formed on underlay substrate, described grid line is formed on described cushion, described gate insulation layer is formed on grid line, described data line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described data line direction, or is with described data line the angle that is greater than 0 ° and is less than 90 °; The straight line at the wave bearing of trend place of described Second Wave shape wave face is consistent with described grid line direction, or is with described grid line the angle that is greater than 0 ° and is less than 90 °.
10. array base palte as claimed in claim 7, it is characterized in that, described cushion is formed on underlay substrate, described data line is formed on described cushion, described gate insulation layer is formed on data line, described grid line is formed on gate insulation layer, and the straight line at the wave bearing of trend place of described first wave shape wave face is consistent with described grid line direction, or is with described grid line the angle that is greater than 0 ° and is less than 90 °; The straight line at the wave bearing of trend place of described Second Wave shape wave face is consistent with described data line direction, or is with described data line the angle that is greater than 0 ° and is less than 90 °.
11. 1 kinds of display device, is characterized in that, comprise the array base palte as described in any one in claim 1~10.
CN201310741782.XA 2013-12-27 2013-12-27 Array base palte and display device Active CN103700322B (en)

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WO2015180349A1 (en) * 2014-05-26 2015-12-03 京东方科技集团股份有限公司 Flexible display substrate and preparation method therefor, and flexible display device
CN106469523A (en) * 2016-09-30 2017-03-01 昆山工研院新型平板显示技术中心有限公司 Flexible display apparatus and its manufacture method
CN107195253A (en) * 2017-07-26 2017-09-22 武汉天马微电子有限公司 Foldable flexible display device
CN107424520A (en) * 2017-07-26 2017-12-01 京东方科技集团股份有限公司 Substrate and preparation method thereof, display panel, display device
CN108022942A (en) * 2016-10-31 2018-05-11 上海和辉光电有限公司 A kind of array base palte and organic electroluminescence display panel
CN108231672A (en) * 2018-01-19 2018-06-29 昆山国显光电有限公司 The production method and flexible display panels of flexible display panels
CN108447404A (en) * 2018-04-04 2018-08-24 京东方科技集团股份有限公司 The manufacturing method of flexible array substrate, display device and flexible array substrate
CN108694890A (en) * 2017-04-05 2018-10-23 上海和辉光电有限公司 A kind of display panel and display device
WO2019058501A1 (en) * 2017-09-22 2019-03-28 シャープ株式会社 Display device and method for manufacturing display device
CN109545823A (en) * 2018-10-23 2019-03-29 武汉华星光电半导体显示技术有限公司 Array substrate, the preparation method of the array substrate and display panel
WO2019064534A1 (en) * 2017-09-29 2019-04-04 シャープ株式会社 Flexible display device and production method for flexible display device
US10269829B2 (en) 2016-09-29 2019-04-23 Shanghai Tianma Micro-electronics Co., Ltd. Flexible array substrate with stress relief layer openings
CN110211969A (en) * 2019-05-14 2019-09-06 武汉华星光电半导体显示技术有限公司 Array substrate and preparation method thereof, flexible display panels
WO2022142141A1 (en) * 2021-01-04 2022-07-07 京东方科技集团股份有限公司 Display substrate and display device
CN115000020A (en) * 2022-05-30 2022-09-02 福建华佳彩有限公司 Stretchable array substrate manufacturing method

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WO2015180349A1 (en) * 2014-05-26 2015-12-03 京东方科技集团股份有限公司 Flexible display substrate and preparation method therefor, and flexible display device
US10269829B2 (en) 2016-09-29 2019-04-23 Shanghai Tianma Micro-electronics Co., Ltd. Flexible array substrate with stress relief layer openings
CN106469523A (en) * 2016-09-30 2017-03-01 昆山工研院新型平板显示技术中心有限公司 Flexible display apparatus and its manufacture method
CN108022942A (en) * 2016-10-31 2018-05-11 上海和辉光电有限公司 A kind of array base palte and organic electroluminescence display panel
CN108694890A (en) * 2017-04-05 2018-10-23 上海和辉光电有限公司 A kind of display panel and display device
CN108694890B (en) * 2017-04-05 2021-05-25 上海和辉光电股份有限公司 Display panel and display device
US11049885B2 (en) 2017-07-26 2021-06-29 Boe Technology Group Co., Ltd. Array substrate and manufacturing method thereof, display panel, and display device
WO2019019618A1 (en) * 2017-07-26 2019-01-31 京东方科技集团股份有限公司 Array substrate and preparation method therefor, display panel, and display device
CN107424520A (en) * 2017-07-26 2017-12-01 京东方科技集团股份有限公司 Substrate and preparation method thereof, display panel, display device
CN107424520B (en) * 2017-07-26 2019-04-16 京东方科技集团股份有限公司 Substrate and preparation method thereof, display panel, display device
CN107195253A (en) * 2017-07-26 2017-09-22 武汉天马微电子有限公司 Foldable flexible display device
WO2019058501A1 (en) * 2017-09-22 2019-03-28 シャープ株式会社 Display device and method for manufacturing display device
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WO2019064534A1 (en) * 2017-09-29 2019-04-04 シャープ株式会社 Flexible display device and production method for flexible display device
CN108231672A (en) * 2018-01-19 2018-06-29 昆山国显光电有限公司 The production method and flexible display panels of flexible display panels
CN108447404A (en) * 2018-04-04 2018-08-24 京东方科技集团股份有限公司 The manufacturing method of flexible array substrate, display device and flexible array substrate
CN109545823A (en) * 2018-10-23 2019-03-29 武汉华星光电半导体显示技术有限公司 Array substrate, the preparation method of the array substrate and display panel
CN110211969A (en) * 2019-05-14 2019-09-06 武汉华星光电半导体显示技术有限公司 Array substrate and preparation method thereof, flexible display panels
WO2020228235A1 (en) * 2019-05-14 2020-11-19 武汉华星光电半导体显示技术有限公司 Array substrate and preparation method therefor, and flexible display panel
US11380717B2 (en) 2019-05-14 2022-07-05 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Array substrate and manufacturing method thereof, flexible display panel
WO2022142141A1 (en) * 2021-01-04 2022-07-07 京东方科技集团股份有限公司 Display substrate and display device
CN115000020A (en) * 2022-05-30 2022-09-02 福建华佳彩有限公司 Stretchable array substrate manufacturing method

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