CN103681167B - Thyratron gas charging system - Google Patents

Thyratron gas charging system Download PDF

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Publication number
CN103681167B
CN103681167B CN201210332971.7A CN201210332971A CN103681167B CN 103681167 B CN103681167 B CN 103681167B CN 201210332971 A CN201210332971 A CN 201210332971A CN 103681167 B CN103681167 B CN 103681167B
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valve
hydrogen
pipeline
thyratron
charging system
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CN103681167A (en
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黄俊杰
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Kunshan national electronic Polytron Technologies Inc
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KUNSHAN GUOLI VACUUM ELECTRIC CO Ltd
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Abstract

The invention discloses a kind of thyratron gas charging system, comprise the thyratron be placed in annular seal space, described thyratron by pipeline communication one hydrogen container, and pipeline between thyratron and hydrogen container is provided with station valve successively and fills hydrogen micro-adjustable valve; Described hydrogen container is connected to one first metal hydride hydrogen-storing device by pipeline again, the pipeline between this hydrogen container and the first metal hydride hydrogen-storing device is provided with successively hydrogen inlet valve, the first isolating valve and the first storage hydrogen valve; Pipeline between described hydrogen inlet valve and the first isolating valve is provided with successively two pipeline branch roads, this two pipelines branch road is respectively equipped with connection valve and emptying valve; Described hydrogen container is provided with the first film vacuum gauge; Pipeline between described thyratron and station valve is provided with the second diagram vacuum gauge.This thyratron gas charging system, can realize in thyratron, fill high-purity, pressure controllable hydrogen or deuterium etc.<!--1-->

Description

Thyratron gas charging system
Technical field
The present invention relates to a kind of thyratron gas charging system.
Background technology
Along with the growth of thyratron output and the raising of thyratron production efficiency, the method of traditional palladium alloy membrane diffusion method purifying hydrogen more and more has certain limitation, particularly when a large amount of hydrogen of process requirements, the purifying speed of current palladium alloy membrane diffusion method cannot meet.In order to improve speed and the efficiency of palladium alloy membrane diffusion method purifying hydrogen, the thickness of palladium alloy pipe can be reduced, raising palladium closes the working temperature of pipe, raise the pressure reduction at palladium alloy pipe two ends, but so easily causing palladium alloy pipe gas leakage severe life time reduction.Palladium is a kind of noble metal simultaneously, expensive, causes cost higher.
Summary of the invention
In order to overcome above-mentioned defect, the invention provides a kind of thyratron gas charging system, in thyratron, fill high-purity, pressure controllable hydrogen or deuterium etc. can be realized.
The present invention in order to the technical scheme solving its technical problem and adopt is: a kind of thyratron gas charging system, comprise the thyratron be placed in annular seal space, described thyratron by pipeline communication one hydrogen container, and pipeline between thyratron and hydrogen container is provided with station valve successively and fills hydrogen micro-adjustable valve; Described hydrogen container is connected to one first metal hydride hydrogen-storing device by pipeline again, the pipeline between this hydrogen container and the first metal hydride hydrogen-storing device is provided with successively hydrogen inlet valve, the first isolating valve and the first storage hydrogen valve; Pipeline between described hydrogen inlet valve and the first isolating valve is provided with successively two pipeline branch roads, this two pipelines branch road is respectively equipped with connection valve and emptying valve; Described hydrogen container is provided with the first film vacuum gauge; Pipeline between described thyratron and station valve is provided with the second diagram vacuum gauge.
As a further improvement on the present invention, described hydrogen container also by pipeline communication to the second metal hydride hydrogen-storing device.
As a further improvement on the present invention, between described hydrogen inlet valve and the first isolating valve, establish a pipeline branch road to be communicated to described second metal hydride hydrogen-storing device, and pipeline between this hydrogen inlet valve to the second metal hydride hydrogen-storing device is provided with successively the second isolating valve and the second storage hydrogen valve.
As a further improvement on the present invention, the pipeline between described second isolating valve and the second storage hydrogen valve is provided with the second micro-adjustable valve.
As a further improvement on the present invention, the pipeline between described first isolating valve and the first storage hydrogen valve is provided with the first micro-adjustable valve.
As a further improvement on the present invention, the pipeline between station valve and hydrogen container is also provided with a hydrogen charging valve; Pipeline between described station valve and hydrogen charging valve is established a pipeline branch road be communicated in described annular seal space, and this pipeline branch road is provided with successively takes out hydrogen valve and bell jar electromagnetically operated valve, separately on this pipeline taking out between hydrogen valve and bell jar electromagnetically operated valve, be provided with the first mechanical pump.
As a further improvement on the present invention, be also provided with a pipeline branch road at described station valve with on filling between hydrogen micro-adjustable valve pipeline, this pipeline branch road be provided with successively main valve, molecular pump and the second mechanical pump.
As a further improvement on the present invention, in described annular seal space, be also provided with two bypass line, this two bypass line be respectively equipped with inflation electromagnetically operated valve and pressure-releasing electromagnetic valve.
As a further improvement on the present invention, described annular seal space is that metal baking oven is formed.
The invention has the beneficial effects as follows: after thyratron adds filament voltage, gas pressure can be monitored, can realize conversion inflation thyratron being carried out to the gas such as hydrogen and deuterium, and gas purity is high, gas-storing capacity is large, and long service life is economical and practical.Meanwhile, important function is served to the performance of thyratron.
Accompanying drawing explanation
Fig. 1 is thyratron gas charging system structural representation described in the embodiment of the present invention.
By reference to the accompanying drawings, make the following instructions:
1---annular seal space 2---thyratron
3---station valves 4---fill hydrogen micro-adjustable valve
5---hydrogen container 6---hydrogen inlet valve
7---first isolating valve 8---first stores up hydrogen valve
9---first metal hydride hydrogen-storing device 10---connection valve
11---emptying valve 12---the first film vacuum gauge
13---second diagram vacuum gauge 14---second isolating valve
15---second storage hydrogen valve 17---second micro-adjustable valve
16---second metal hydride hydrogen-storing device 18---first micro-adjustable valve
19---hydrogen charging valves 20---take out hydrogen valve
21---bell jar electromagnetically operated valve 22---first mechanical pump
23---main valve 24---molecular pump
25---second mechanical pump 26---inflation electromagnetically operated valve
27---pressure-releasing electromagnetic valve
Embodiment
By reference to the accompanying drawings, elaborate to the present invention, but protection scope of the present invention is not limited to following embodiment, the simple equivalence namely in every case done with the present patent application the scope of the claims and description changes and modifies, and all still belongs within patent covering scope of the present invention.
As shown in Figure 1, a kind of thyratron gas charging system, comprise be placed in metal baking oven formed annular seal space 1 in thyratron 2 (thyratron can arrange one or many according to annular seal space herein, and every thyratron needs to arrange a station valve controls), this thyratron by pipeline communication one hydrogen container 5, and pipeline between this thyratron and hydrogen container is provided with station valve 3 successively and fills hydrogen micro-adjustable valve 4; Hydrogen container 5 is connected to one first metal hydride hydrogen-storing device 9 by pipeline again, the pipeline between this hydrogen container and the first metal hydride hydrogen-storing device is provided with successively hydrogen inlet valve 6, first isolating valve 7 and the first storage hydrogen valve 8; Pipeline between hydrogen inlet valve and the first isolating valve is provided with successively two pipeline branch roads, this two pipelines branch road is respectively equipped with connection valve 10 and emptying valve 11; Hydrogen container 5 is provided with the first film vacuum gauge 12; Pipeline between thyratron and station valve is provided with the second diagram vacuum gauge 13.
Wherein, hydrogen container 5 also can arrange multi-wad join herein to multiple metal hydride hydrogen-storing device by pipeline communication to the second metal hydride hydrogen-storing device 16(as required).This example for establish a pipeline branch road to be communicated to the second metal hydride hydrogen-storing device 16 between hydrogen inlet valve 6 and the first isolating valve 7, and pipeline between this hydrogen inlet valve to the second metal hydride hydrogen-storing device is provided with successively the second isolating valve 14 and the second storage hydrogen valve 15.
Pipeline separately between the second isolating valve 14 and the second storage hydrogen valve 15 is provided with the second micro-adjustable valve 17, the pipeline between the first isolating valve 7 and the first storage hydrogen valve 8 is provided with the first micro-adjustable valve 18.
The pipeline of said system between station valve and hydrogen container is also provided with a hydrogen charging valve (19); Pipeline between station valve and hydrogen charging valve is established a pipeline branch road be communicated in described annular seal space, and this pipeline branch road is provided with successively takes out hydrogen valve 20 and bell jar electromagnetically operated valve 21, separately take out between hydrogen valve and bell jar electromagnetically operated valve be provided with the first mechanical pump 22 at this.
Also be provided with a pipeline branch road at above-mentioned station valve with on filling between hydrogen micro-adjustable valve pipeline, this pipeline branch road be provided with successively main valve 23, molecular pump 24 and the second mechanical pump 25.
In above-mentioned annular seal space, be also provided with two bypass line, this two bypass line be respectively equipped with inflation electromagnetically operated valve 26 and pressure-releasing electromagnetic valve 27.
This system work process is as follows: vacuumize metal hydride hydrogen-storing device, hydrogen container and pipeline before purified gases.One end of connection valve is connected with hydrogen gas cylinder (being connected with deuterium steel cylinder during purifying deuterium), opens hydrogen gas cylinder pressure-reducing valve, and make it maintain certain pressure, open connection valve 10 successively, emptying valve 11, emptied for 2 ~ 3 seconds, then closed emptying valve 11, opened Fig. 1 left side first isolating valve 7, first micro-adjustable valve 18, first storage hydrogen valve 8(purifying deuterium opens Fig. 1 right side second isolating valve 14, second micro-adjustable valve 17, second storage hydrogen valve 15), start purifying hydrogen, during the carrying out of purifying, the first metal hydride hydrogen-storing device 9 tank body has fever phenomenon, along with reaction is constantly carried out, when tank surface temperature is tending towards room temperature, shows that purifying terminates, closes the first storage hydrogen valve 8, connection valve 10, hydrogen gas cylinder pressure-reducing valve, leaves hydrogen inlet valve 6 to hydrogen container inflation, opens the first mechanical pump 22, take out hydrogen valve 20, hydrogen charging valve 19, vacuumizes hydrogen container 5 and pipeline, closes and take out hydrogen valve 20 after rough vacuum reaches requirement, first mechanical pump 22, opens the second mechanical pump 25, main valve 23, molecular pump 24, closes hydrogen charging valve 19 after condition of high vacuum degree reaches requirement, main valve 23, molecular pump 24, second mechanical pump 25, drives the first storage hydrogen valve 8 and fills hydrogen to hydrogen container, after the instruction of hydrogen container 5 the first film vacuum gauge 12 meets technological requirement, then closes hydrogen inlet valve 6, first isolating valve 7, first micro-adjustable valve 18, first storage hydrogen valve 8.When inflating to workpiece (thyratron), thyratron adds technological requirement filament voltage, opens to fill hydrogen micro-adjustable valve 4 and inflate in pipe, and after the second diagram vacuum gauge 13 pressure instruction meets technological requirement and be stable, hydrogen micro-adjustable valve 4 is filled in closedown.
Wherein molecular pump and the second mechanical pump can vacuumize thyratron, and the first mechanical pump can vacuumize annular seal space, and inflation electromagnetically operated valve and pressure-releasing electromagnetic valve can realize, to sealing interacvity air-filling and venting, being beneficial to opening encapsulation chamber.

Claims (9)

1. a thyratron gas charging system, comprise the thyratron (2) be placed in annular seal space (1), it is characterized in that: described thyratron by pipeline communication one hydrogen container (5), and pipeline between thyratron and hydrogen container is provided with station valve (3) successively and fills hydrogen micro-adjustable valve (4); Described hydrogen container is connected to one first metal hydride hydrogen-storing device (9) by pipeline again, the pipeline between this hydrogen container and the first metal hydride hydrogen-storing device is provided with successively hydrogen inlet valve (6), the first isolating valve (7) and the first storage hydrogen valve (8); Pipeline between described hydrogen inlet valve and the first isolating valve is provided with successively two pipeline branch roads, this two pipelines branch road is respectively equipped with connection valve (10) and emptying valve (11); Described hydrogen container is provided with the first film vacuum gauge (12); Pipeline between described thyratron and station valve is provided with the second diagram vacuum gauge (13).
2. thyratron gas charging system according to claim 1, is characterized in that: described hydrogen container also by pipeline communication to the second metal hydride hydrogen-storing device (16).
3. thyratron gas charging system according to claim 2, it is characterized in that: between described hydrogen inlet valve and the first isolating valve, establish a pipeline branch road to be communicated to described second metal hydride hydrogen-storing device, and pipeline between this hydrogen inlet valve to the second metal hydride hydrogen-storing device is provided with successively the second isolating valve (14) and the second storage hydrogen valve (15).
4. thyratron gas charging system according to claim 3, is characterized in that: the pipeline between described second isolating valve and the second storage hydrogen valve is provided with the second micro-adjustable valve (17).
5. thyratron gas charging system according to any one of claim 1 to 4, is characterized in that: the pipeline between described first isolating valve and the first storage hydrogen valve is provided with the first micro-adjustable valve (18).
6. thyratron gas charging system according to any one of claim 1 to 4, is characterized in that: the pipeline between station valve and hydrogen container is also provided with a hydrogen charging valve (19); Pipeline between described station valve and hydrogen charging valve is established a pipeline branch road be communicated in described annular seal space, and this pipeline branch road is provided with successively takes out hydrogen valve (20) and bell jar electromagnetically operated valve (21), separately on this pipeline taking out between hydrogen valve and bell jar electromagnetically operated valve, be provided with the first mechanical pump (22).
7. thyratron gas charging system according to any one of claim 1 to 4, it is characterized in that: be also provided with a pipeline branch road at described station valve with on filling between hydrogen micro-adjustable valve pipeline, this pipeline branch road be provided with successively main valve (23), molecular pump (24) and the second mechanical pump (25).
8. thyratron gas charging system according to any one of claim 1 to 4, is characterized in that: in described annular seal space, be also provided with two bypass line, this two bypass line is respectively equipped with inflation electromagnetically operated valve (26) and pressure-releasing electromagnetic valve (27).
9. thyratron gas charging system according to any one of claim 1 to 4, is characterized in that: described annular seal space is that metal baking oven is formed.
CN201210332971.7A 2012-09-11 2012-09-11 Thyratron gas charging system Active CN103681167B (en)

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Application Number Priority Date Filing Date Title
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CN103681167B true CN103681167B (en) 2015-10-28

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10153009C1 (en) * 2001-10-26 2003-04-17 Marcus Thielen Gas discharge lamp manufacturing method uses activation of lamp electrodes for heating inert gas during lamp envelope conditioning stage
JP2004111267A (en) * 2002-09-19 2004-04-08 Truweal Inc Manufacturing device of high-pressure lamp
GB0506076D0 (en) * 2005-03-24 2005-05-04 Boc Group Plc Method of suppressing contamination of a noble gas
CN201185168Y (en) * 2008-04-24 2009-01-21 海宁新光阳光电有限公司 Apparatus for charging and discharging gas of xenon lamp
CN201893309U (en) * 2010-11-08 2011-07-06 上海易玺电子科技有限公司 Gas charging pipeline for integrated vacuum gas charging host machine
CN102496544A (en) * 2010-06-18 2012-06-13 江苏技术师范学院 Gas distributing system of non-polar excimer lamp and gas distributing method thereof
CN202758840U (en) * 2012-09-11 2013-02-27 昆山国力真空电器有限公司 An inflation system of a thyratron

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10153009C1 (en) * 2001-10-26 2003-04-17 Marcus Thielen Gas discharge lamp manufacturing method uses activation of lamp electrodes for heating inert gas during lamp envelope conditioning stage
JP2004111267A (en) * 2002-09-19 2004-04-08 Truweal Inc Manufacturing device of high-pressure lamp
GB0506076D0 (en) * 2005-03-24 2005-05-04 Boc Group Plc Method of suppressing contamination of a noble gas
CN201185168Y (en) * 2008-04-24 2009-01-21 海宁新光阳光电有限公司 Apparatus for charging and discharging gas of xenon lamp
CN102496544A (en) * 2010-06-18 2012-06-13 江苏技术师范学院 Gas distributing system of non-polar excimer lamp and gas distributing method thereof
CN201893309U (en) * 2010-11-08 2011-07-06 上海易玺电子科技有限公司 Gas charging pipeline for integrated vacuum gas charging host machine
CN202758840U (en) * 2012-09-11 2013-02-27 昆山国力真空电器有限公司 An inflation system of a thyratron

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CB03 Change of inventor or designer information

Inventor after: Huang Junjie

Inventor after: Huang Hao

Inventor after: Cao Mingkun

Inventor after: Zhang Jingui

Inventor after: Li Zongchao

Inventor before: Huang Junjie

COR Change of bibliographic data
CP03 Change of name, title or address

Address after: 215301 West Lake Road, Kunshan Development Zone, Jiangsu, China, No. 28, No.

Patentee after: Kunshan national electronic Polytron Technologies Inc

Address before: 215301 Kunshan, Jiangsu Development Zone, the Yangtze River Road, No. 179, No.

Patentee before: Kunshan Guoli Vacuum Electric Co., Ltd.

CP03 Change of name, title or address