CN103645603A - Device and method for cleaning light mask plate - Google Patents
Device and method for cleaning light mask plate Download PDFInfo
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- CN103645603A CN103645603A CN201310625617.8A CN201310625617A CN103645603A CN 103645603 A CN103645603 A CN 103645603A CN 201310625617 A CN201310625617 A CN 201310625617A CN 103645603 A CN103645603 A CN 103645603A
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Abstract
The invention relates to the technical field of semiconductor manufacturing equipment, and particularly relates to a device for cleaning a light mask plate and a cleaning method. The device comprises a cavity, a platform and a spraying pipe, wherein the cavity is provided with an exhausting opening; the platform is located in the cavity and is used for fixing a light mask plate to be cleaned; the spraying pipe can be moved in a manner of being parallel to the surface of the light mask plate; the spraying pipe is provided with a first group of nozzles and a second group of nozzles which are arranged in parallel along the length extending direction; the first group of the nozzles are connected with an aerosol generation device; the second group of the nozzles are connected with an ion-containing gas generation device; the platform is connected with a static electricity leading-out channel to realize potential grounding. According to the device, micro-dust and dirt on the surface of the light mask plate can be effectively removed and static electricity on the surface of the light mask plate is efficiently removed so that damages to the light mask plate by releasing the static electricity are avoided; the efficiency of removing the micro-dust and the dirt on the surface of the light mask plate is improved and the service life of the light mask plate in the production can be effectively prolonged.
Description
Technical field
The present invention relates to semiconductor manufacturing equipment technical field, especially a kind of device of cleaning photo masks plate and clean method.
Background technology
Optical mask plate is the main tool of making litho pattern.Photoetching process is transferred to the complex figure on optical mask plate in photoresist.In the past few decades, the integrated scale of integrated circuit expands fast along the speed of Moore's Law, and chip becomes and becomes increasingly complex, also more and more higher to the requirement of optical mask plate.Constantly dwindling of characteristic dimension, makes micronic dust and stains increasing on the impact of optical mask plate.Especially ArF optical mask plate is more responsive to micronic dust and contamination.The micronic dust that environment is introduced and contamination easily cause vaporific defect to be grown on ArF optical mask plate.
In order to keep the clean of optical mask plate, conventionally to regularly do defect inspection to optical mask plate, and remove in time micronic dust and the contamination of adsorption.The method of removing at present micronic dust is to adopt air blowing type air/nitrogen gun or gas curtain by the micronic dust optical mask plate surface of blowing off.This method can not effectively be removed absorption more firmly micronic dust and contamination.Remove and stain and optical mask plate Song Fandao optical mask plate factory need to be carried out to cleaning treatment, very large to Influence of production.
Gaseous solvents (Aerosol) is good clean-out system.Be used in body surface cleaning.Chinese patent CN1213847A has reported gaseous solvents cleaning method.Different from liquid cleaning, gaseous solvents not only can more effectively be removed body surface micronic dust and contamination, and can not leave a trace at body surface after gaseous solvents gasification.
In the cleaning course of optical mask plate, inevitably can on optical mask plate, produce static.Static on optical mask plate can attract charged micronic dust, causes staiing again.And, when static charge accumulation arrives certain degree, can on optical mask plate, there is electrostatic discharge (ESD), cause element layout damaged graphics, cause optical mask plate to scrap.In order to prevent electrostatic damage, conventionally on the ceiling of factory toilet, deionized stick is installed.Deionized stick produces the air-flow with positive and negative charge, and the object institute static electrification lotus in a conical area is neutralized, and reaches the effect of removing static.The static eliminating method of this common employing is not strong for concentrating the removal effect of the static producing.Gaseous solvents cleans the gaseous solvents air-flow of injection and the friction of scavenger surface, is easy to concentrate and produce static at scavenger surface.Need to there is efficient static eliminating method to guarantee the excellent cleaning performance that gaseous solvents cleans.
Summary of the invention
Technical matters to be solved by this invention, for more effectively removing on the one hand micronic dust and the contamination on optical mask plate surface, is removed the static on optical mask plate surface on the other hand.
The technology used in the present invention means are: a kind of device of cleaning photo masks plate, comprises the cavity with exhausr port; Be positioned at the platform for fixing optical mask plate to be cleaned of described cavity; Can be parallel to the mobile jet pipe in optical mask plate surface, described jet pipe has first group of nozzle and the second group of nozzle being arranged in parallel along its length bearing of trend, described first group of nozzle is connected with the generation device of gaseous solvents, and described second group of nozzle is connected with the generation device containing ionized gas; Described platform connects static derivation passage and realizes current potential ground connection.
Preferably, described cavity forms a relatively isolated space.
Preferably, described jet pipe is parallel to the length of side that the mobile stroke in optical mask plate surface is greater than optical mask plate to be cleaned.
Preferably, the position of described first group of nozzle and second group of nozzle is all positioned at jet pipe bottom, and the place ahead of described first group of nozzle moving direction when comparing second group of more close jet pipe of nozzle and spraying.
Preferably, can to take the bearing of trend of jet pipe be that axial line rotates for described first group of nozzle and second group of nozzle.
Preferably, described jet pipe can be take its bearing of trend and can be adjusted as the angle that axial line rotates and/or first group of nozzle and second group of nozzle are positioned on jet pipe.
Preferably, the air capacity of described exhausr port is greater than the jet amount of jet pipe.
Preferably, the generation device of described gaseous solvents comprises source of the gas, refrigeratory and vacuum chamber, and described source of the gas is connected to vacuum chamber by refrigeratory, and described vacuum chamber is connected to described first group of nozzle.
Preferably, the generation device of described gaseous solvents also comprises for controlling flow and the fast variable valve of spray.
Preferably, the described generation device containing ionized gas comprises interconnective source of the gas and ion generator, and described ion generator is connected to described second group of nozzle.
Preferably, the described generation device containing ionized gas also comprises for controlling flow and the fast variable valve of spray.
The present invention also proposes a kind of method of cleaning photo masks plate, comprises the steps:
A) optical mask plate to be cleaned is put on the platform of cavity;
B) open the generation device and the generation device that contains ionized gas of gaseous solvents;
C) parallel jet pipe is injected in optical mask plate surface equably by gaseous solvents and containing ionized gas;
D) optical mask plate is taken out from cavity, and the cleanliness of optical mask plate are checked.
By adopting above technology, the present invention is when effectively removing the micronic dust and contamination on optical mask plate surface, removed efficiently the static on optical mask plate surface, avoided static to discharge the damage to optical mask plate, improve the efficiency of removing optical mask plate surface dust and contamination, can effectively extend the serviceable life aborning of photomask.
Accompanying drawing explanation
By the more specifically explanation of the preferred embodiments of the present invention shown in accompanying drawing, above-mentioned and other object of the present invention, Characteristics and advantages will be more clear.In whole accompanying drawings, identical Reference numeral is indicated identical part.Deliberately by physical size equal proportion convergent-divergent, do not draw accompanying drawing, focus on illustrating purport of the present invention.
Fig. 1 is the device of a kind of cleaning photo masks plate of proposing of the present invention;
Fig. 2 is the vertical view of the relative optical mask plate motion of jet pipe;
Fig. 3 is the side view of the relative optical mask plate motion of jet pipe;
Fig. 4 is the generation device of gaseous solvents and the generation device schematic diagram that contains ionized gas.
Embodiment
Below in conjunction with accompanying drawing, embodiments of the invention are elaborated: the present embodiment is implemented take technical solution of the present invention under prerequisite, provided detailed embodiment, but protection scope of the present invention is not limited to following embodiment.
The device of a kind of cleaning photo masks plate shown in Figure 1, comprise the cavity 1 with exhausr port 5, be positioned at the platform 3 for fixing optical mask plate 2 to be cleaned of described cavity 1, can be parallel to the optical mask plate 2 mobile jet pipes 4 in surface, described jet pipe 4 has first group of nozzle 41 and the second group of nozzle 42 being arranged in parallel along its length bearing of trend, described first group of nozzle 41 is connected with the generation device of gaseous solvents, and described second group of nozzle 42 is connected with the generation device containing ionized gas; Described platform 3 connects static derivation passage 30 and realizes current potential ground connection.
From one-piece construction, say, described cavity 1 forms a relatively isolated space, avoids micronic dust in environment to drop on the surface of optical mask plate 2 to be cleaned.
Shown in Fig. 2 and Fig. 3, in figure, solid arrow represents the shift motion of jet pipe 4, and it is mobile that visible described jet pipe 4 is parallel to optical mask plate 2 surfaces, and its stroke is greater than the length of side of optical mask plate 2 to be cleaned.
Shown in Figure 3, the position of described first group of nozzle 41 and second group of nozzle 42 is all positioned at jet pipe 4 bottoms, the place ahead of moving direction when described first group of nozzle 41 compared second group of more close jet pipe injection of nozzle 42.
Referring to the dotted arrow in Fig. 3, described first group of nozzle 41 is injected in gaseous solvents 61 optical mask plate to be cleaned 2 surfaces equably, and described second group of nozzle 42 will be injected in optical mask plate to be cleaned 2 surfaces containing ionized gas 62 equably.Further, by regulating first group of nozzle 41 and second group of nozzle 42 to take the bearing of trend of jet pipe 4, rotate as axial line, can realize gaseous solvents 61 and the spray angle with respect to optical mask plate 2 surfaces containing ionized gas 62.Its implementation can be for directly take its bearing of trend as axial line rotable nozzle 4, or adjust first group of nozzle 41 and second group of nozzle 42 is positioned at the angle on jet pipe 4.
Described gaseous solvents 61, gases used nitrogen, carbon dioxide and the argon gas of comprising.As shown in Figure 4, source of the gas 70 is connected to vacuum chamber 72 by refrigeratory 71 to the generation device of this gaseous solvents, and vacuum chamber 72 is connected to first group of nozzle 41.Because the gas in cavity 1 is discharged by exhausr port 5, so that the inner vacuum tightness that forms of cavity 1 is higher than the vacuum of vacuum chamber 72, when the gas of the partial liquefaction in vacuum chamber 72 sprays from first group of nozzle 41, gaseous tension sharply reduces, cause adiabatic expansion, thereby reduce rapidly the temperature of gas, to form the gaseous solvents 61 that contains fine solid particle.
Described containing ionized gas 62, gases used nitrogen, carbon dioxide and the argon gas of comprising.Should contain the generation device of ionized gas equally as shown in Figure 4, source of the gas is connected to second group of nozzle 42 by ion generator 8.
From the gaseous solvents 61 of described first group of nozzle, 41 ejections and converging cavity 1 containing ionized gas 62 of spraying from second group of nozzle 42, form containing ion-gas solvent, complete cleaning optical mask plate 2 surfaces.
The flow of said apparatus and spray speed can be controlled by variable valve 91,92,93,94,95.
Owing to having adopted said structure, the clean method of the optical mask plate of this device is as follows:
A), referring to Fig. 1, photomask 2 to be cleaned is put on the platform 3 of cavity 1.
B), referring to Fig. 4, open the generation device of gaseous solvents and the generation device that contains ionized gas.Regulate variable valve 91,92,93,94,95, thereby adjust gaseous solvents and the discharge rate and the spray speed that contain ionized gas.Adjust if desired first group of nozzle 41 and second group of nozzle 42 with respect to the spray angle on optical mask plate 2 surfaces.
C), referring to Fig. 3, parallel jet pipe 4 is injected in photomask 2 surfaces equably by gaseous solvents 61 and containing ionized gas 62.
D) optical mask plate 2 is taken out from cavity 1, and the cleanliness of optical mask plate 2 are checked.
Although the present invention with preferred embodiment openly as above; but it is not for limiting claim; any those skilled in the art without departing from the spirit and scope of the present invention; can make possible change and modification, so protection scope of the present invention should be as the criterion with the scope that the claims in the present invention were defined.
Claims (12)
1. a device for cleaning photo masks plate, is characterized in that comprising: the cavity with exhausr port; Be positioned at the platform for fixing optical mask plate to be cleaned of described cavity; Can be parallel to the mobile jet pipe in optical mask plate surface, described jet pipe has first group of nozzle and the second group of nozzle being arranged in parallel along its length bearing of trend, described first group of nozzle is connected with the generation device of gaseous solvents, and described second group of nozzle is connected with the generation device containing ionized gas; Described platform connects static derivation passage and realizes current potential ground connection.
2. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: described cavity forms a relatively isolated space.
3. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: described jet pipe is parallel to the length of side that the mobile stroke in optical mask plate surface is greater than optical mask plate to be cleaned.
4. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: the position of described first group of nozzle and second group of nozzle is all positioned at jet pipe bottom, and the place ahead of described first group of nozzle moving direction when comparing second group of more close jet pipe of nozzle and spraying.
5. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: it is that axial line rotates that described first group of nozzle and second group of nozzle can be take the bearing of trend of jet pipe.
6. the device of cleaning photo masks plate as claimed in claim 5, is characterized in that: described jet pipe can be take its bearing of trend and can be adjusted as the angle that axial line rotates and/or first group of nozzle and second group of nozzle are positioned on jet pipe.
7. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: the air capacity of described exhausr port is greater than the jet amount of jet pipe.
8. the device of cleaning photo masks plate as claimed in claim 1, it is characterized in that: the generation device of described gaseous solvents comprises source of the gas, refrigeratory and vacuum chamber, described source of the gas is connected to vacuum chamber by refrigeratory, and described vacuum chamber is connected to described first group of nozzle.
9. the device of cleaning photo masks plate as claimed in claim 8, is characterized in that: the generation device of described gaseous solvents also comprises for controlling flow and the fast variable valve of spray.
10. the device of cleaning photo masks plate as claimed in claim 1, is characterized in that: the described generation device containing ionized gas comprises interconnective source of the gas and ion generator, and described ion generator is connected to described second group of nozzle.
The device of 11. cleaning photo masks plates as claimed in claim 10, is characterized in that: the described generation device containing ionized gas also comprises for controlling flow and the fast variable valve of spray.
The method of the cleaning photo masks plate of 12. 1 kinds of devices as claimed in claim 1, is characterized in that comprising the steps:
A) optical mask plate to be cleaned is put on the platform of cavity;
B) open the generation device and the generation device that contains ionized gas of gaseous solvents;
C) parallel jet pipe is injected in optical mask plate surface equably by gaseous solvents and containing ionized gas;
D) optical mask plate is taken out from cavity, and the cleanliness of optical mask plate are checked.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310625617.8A CN103645603A (en) | 2013-11-28 | 2013-11-28 | Device and method for cleaning light mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310625617.8A CN103645603A (en) | 2013-11-28 | 2013-11-28 | Device and method for cleaning light mask plate |
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| Publication Number | Publication Date |
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| CN103645603A true CN103645603A (en) | 2014-03-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310625617.8A Pending CN103645603A (en) | 2013-11-28 | 2013-11-28 | Device and method for cleaning light mask plate |
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| CN (1) | CN103645603A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107037688A (en) * | 2015-10-20 | 2017-08-11 | 信越化学工业株式会社 | Base plate cleaning device and substrate-cleaning method used in photomask related substrate |
| CN113879593A (en) * | 2021-12-06 | 2022-01-04 | 常州铭赛机器人科技股份有限公司 | Paste dress carousel buffer memory device |
Citations (5)
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| CN1595237A (en) * | 2004-06-18 | 2005-03-16 | 友达光电股份有限公司 | Particle clearing device |
| US20080302390A1 (en) * | 2004-05-28 | 2008-12-11 | Koninklijke Philips Electronics N.V. | Cleaning a Mask Substrate |
| CN102360157A (en) * | 2011-09-28 | 2012-02-22 | 上海华力微电子有限公司 | Device for removing tiny dust and stains from photomask surface and method thereof |
| CN102426412A (en) * | 2011-07-12 | 2012-04-25 | 上海华力微电子有限公司 | Method for removing surface dust of mask plate |
| CN102427047A (en) * | 2011-09-28 | 2012-04-25 | 上海华力微电子有限公司 | Wafer back cleaning device and wafer back cleaning method |
-
2013
- 2013-11-28 CN CN201310625617.8A patent/CN103645603A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080302390A1 (en) * | 2004-05-28 | 2008-12-11 | Koninklijke Philips Electronics N.V. | Cleaning a Mask Substrate |
| CN1595237A (en) * | 2004-06-18 | 2005-03-16 | 友达光电股份有限公司 | Particle clearing device |
| CN102426412A (en) * | 2011-07-12 | 2012-04-25 | 上海华力微电子有限公司 | Method for removing surface dust of mask plate |
| CN102360157A (en) * | 2011-09-28 | 2012-02-22 | 上海华力微电子有限公司 | Device for removing tiny dust and stains from photomask surface and method thereof |
| CN102427047A (en) * | 2011-09-28 | 2012-04-25 | 上海华力微电子有限公司 | Wafer back cleaning device and wafer back cleaning method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107037688A (en) * | 2015-10-20 | 2017-08-11 | 信越化学工业株式会社 | Base plate cleaning device and substrate-cleaning method used in photomask related substrate |
| CN113879593A (en) * | 2021-12-06 | 2022-01-04 | 常州铭赛机器人科技股份有限公司 | Paste dress carousel buffer memory device |
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Application publication date: 20140319 |