CN103645455A - Probe calibration device - Google Patents
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- CN103645455A CN103645455A CN201310705549.6A CN201310705549A CN103645455A CN 103645455 A CN103645455 A CN 103645455A CN 201310705549 A CN201310705549 A CN 201310705549A CN 103645455 A CN103645455 A CN 103645455A
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Abstract
The invention discloses a probe calibration device. The probe calibration device comprises a positioning datum disc, a first calibration support and a second calibration support; wherein the first calibration support comprises a first supporting base plate, a first supporting column with one end arranged on the first supporting base plate, and a first measuring assembly arranged on the other end of the first supporting column; the second calibration support comprises a second supporting base plate, a second supporting column with one end arranged on the second supporting base plate, and a second measuring assembly arranged on the other end of the second supporting column; the positioning datum disc is connected with the first calibration support through a first connecting plate, one end of the first connecting plate is hinged to the positioning datum disc, and the other end of the first connecting plate is fixedly connected with the first supporting base plate; the first calibration support is connected with the second calibration support through a second connecting plate, one end of the second connecting plate is hinged to the first connecting base plate, and the other end of the second connecting plate is hinged to the second supporting base plate. The probe calibration device can adjust the position of a probe through simple rotation, thereby improving the accuracy of testing and work efficiency.
Description
Technical field
The present invention relates to a kind of probe sizing stop, particularly a kind of probe sizing stop that utilizes three turning axles to carry out the many test position points of many test surfaces.
Background technology
Along with scientific and technical development, a large amount of electronic apparatus application, aspect military hardware, civilian installation, once electromagnetic pulse energy is invaded, can make electronic component failure or permanent damages in equipment, cause large-scale Command, Control, Communications systemic breakdown.Electromagnetic pulse is the strong electromagnetic radiation phenomenon of of short duration transition, and electromagnetic pulse has the spontaneous artificial manufacture that also has, and modal spontaneous electromagnetic pulse is Lightning Electromagnetic Pulse and static discharge electromagnetic pulse.Artificial electromagnetic pulse is divided into again nuclear explosion electrical measurement pulse and common electromagnetic pulse.The electromagnetic pulse peak electric field that nuclear explosion produces can reach 50～100kV/m, the world military powers such as the United States, Russia are all in the exploitation of carrying out high power microwave weapon, electromagnetic pulse bomb is exactly a kind of ELECTROMAGNETIC WEAPON of new ideas, although lasting time of electromagnetic pulse is very of short duration, the energy of abrupt release is huge.After entering electronic system, the EMP Coupling which kind of mode of excitation produces all can exert an influence to electronic devices and components, circuit and even whole system, when serious, can make system suffer to destroy paralysis, power network opens circuit, metal pipe line and underground cable communication network etc. are all affected, thereby be absorbed in non-transformer, without communication, without the San Wu world of computing machine, its destructive power is known as " the second atomic bomb ".
How to improve the electromagnetic pulse-resisting performance of military weapon in wartime, equipment and civil equipment, assurance equipment can continue the emphasis that normal work becomes research after being subject to electromagnetic impulse radiation.There are extensive, deep research in the U.S. and Russia to electromagnetic pulse, and attach great importance to weaponry electronic environment effect and protective reinforcing technology, and the research and development electromagnetic pulse weapon of doing one's utmost.Meanwhile, they have had multiple large-scale electromagnetic pulse test macro except the infrastructure using it as scientific research, are mainly used in testing the effect of electromagnetic pulse weapon and the protective capacities of various electronic systems.
In order to carry out check, the performance test and acceptance of the electromagnetic pulse-resisting abilities such as electrical and electronic product, weaponry, the U.S. takes the lead in having proposed radiation sensitivity test method in American army mark MIL-STD-461F, China has formed national military standard GJB151A/GJB152A with reference to this standard, RS105 test item wherein, specified in more detail method and the grade of electromagnetic pulse test.The test position point that in American army mark 461F, RS105 pilot project requires transient electromagnetic field field uniformity is, transmission line is apart from four summits of square homogeneous area and the center point on 1 meter, ground, wherein center point is reference point, and during test, reference probe position keeps motionless.When current laboratory test device carries out the test of multiposition point in the Different Plane of space, major part is all very simple reference test bar, the position of popping one's head on the position by continuous moved by hand testing jig and testing jig is tested, mobile test frame can be introduced displacement error frequently, and work efficiency is also very low simultaneously.When space plane region and space multistory domain test, detection calibration frame in the past, also need to carry out certain movement and just can complete the test of whole location points, through mobile calibrated mount, also need to re-start origin reference location, in practical operation, still there is certain regulating error, also increased workload, what still have much room for improvement aspect measuring accuracy and work efficiency simultaneously.
Summary of the invention
The defect existing for above-mentioned prior art, technical matters to be solved by this invention is to provide a kind of transient electromagnetic field three turning axle probe sizing stops, when it not only can improve test, determine the efficiency of location point, and can also guarantee accuracy and the degree of reliability of location.
For solving the problems of the technologies described above, transient electromagnetic field three turning axle probe sizing stops of the present invention comprise, comprise positioning datum dish, the first sizing stop and the second sizing stop;
Described the first sizing stop comprises that the first support chassis, one end are arranged on the first support column in the first support chassis and are arranged on first of the first support column other end and measures assembly;
Described the second sizing stop comprises that the second support chassis, one end are arranged on the second support column in the second support chassis and are arranged on second of the second support column other end and measures assembly;
Described positioning datum dish is connected with the first sizing stop by the first web joint, and described first web joint one end and described positioning datum dish are hinged, and the other end is fixedly connected with the first support chassis;
Described the first sizing stop is connected with the second sizing stop by the second web joint, and one end of described the second web joint and the first support chassis are hinged, and the other end and the second support chassis are hinged;
Described first measures assembly comprises the first measurement cross bar and the first field intensity probe, the first Ba Lun and the first photoelectric conversion module disposed thereon and that be connected successively, and described second measures assembly comprises the second measurement cross bar and the second field intensity probe, the second Ba Lun and the second photoelectric conversion module disposed thereon and that be connected successively.
The ground probe locating support that is also provided with level in described the second support chassis, one end of the locating support of popping one's head in is connected with the second support chassis describedly, and another termination is positioned at the second field intensity and pops one's head on vertical central axis.
Described positioning datum dish is provided with the first pilot hole, and described the first web joint is provided with first register pin corresponding with described the first pilot hole coupling; Described the first support chassis is provided with the second pilot hole, and described the second web joint is provided with second register pin corresponding with described the second pilot hole coupling; The second support chassis is provided with the 3rd pilot hole, and described the second web joint is provided with three register pin corresponding with described the 3rd pilot hole coupling; Described positioning datum Pan center is provided with datum hole.
The vertical central axis of described the first field intensity probe and the distance between the first support column axis are 45.2cm, the vertical central axis of described the second field intensity probe and the distance between the second support column axis are 45.2cm, distance between the vertical central axis of described positioning datum dish and the first support column axis is 45.2cm, and the distance range between described the first support column axis and the second support column axis is 60～90cm.
Distance between described the first support column axis and the second support column axis is 60cm.
Distance between described the first support column axis and the second support column axis is 90cm.
Described the first pilot hole comprises the first hole, the second hole and the 3rd hole, and the angle between described the first hole and the second hole is 45 degree, and the angle between the second hole and the 3rd hole is 45 degree; Described the second pilot hole comprises the 4th hole and the 5th hole, and the angular range between described the 4th hole and the 5th hole is 178～176 degree; Described the 3rd pilot hole comprises the 6th hole, seven apertures in the human head, octal and the 9th hole, angular range between described the 6th hole and seven apertures in the human head is 26～40 degree, angular range between seven apertures in the human head and octal is 156～144 degree, and the angular range between octal and the 9th hole is 26～40 degree.
Angle between described the 4th hole and the 5th hole is 178 degree, and the angle between described the 6th hole and seven apertures in the human head is 26 degree, and the angle between seven apertures in the human head and octal is 156 degree, and the angle between octal and the 9th hole is 26 degree.
Angle between described the 4th hole and the 5th hole is 176 degree, and the angle between described the 6th hole and seven apertures in the human head is 40 degree, and the angle between seven apertures in the human head and octal is 144 degree, and the angle between octal and the 9th hole is 40 degree.
Described the first support column is height-adjustable structure, and described the second support column is height-adjustable structure.
The bottom surface of described origin reference location dish is provided with sucker.
3 multi-directional ball are evenly set around the center of circle on the bottom surface of described the first support chassis and the second support chassis.
Adopt after said structure, when probe correcting device of the present invention is tested at transient electromagnetic field field uniformity, by simple rotation, can complete the test of transient electromagnetic field area of space field uniformity test.Reduced repeatedly the mobile measuring error of adjusting probe positions attitude and introducing, improved measuring accuracy, and then improved work efficiency; And realized the test request that a calibrating installation can meet different transient electromagnetic field field uniformity standards, improved the applicability of sizing stop.In the design's invention, all rotating parts all have orientation locating device, have improved accuracy and the degree of reliability of location.
The present invention is with low cost, simple in structure.All rotations are rotated by the multi-directional ball of bottom, have realized the stable operation of each several part rotation and revolution.Reduce move operation step, reduce error, improve measuring accuracy and work efficiency.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in further detail.
Fig. 1 is structural representation of the present invention
Fig. 2 is the structural representation of the first sizing stop in the present invention.
Fig. 3 is the vertical view of the first sizing stop in the present invention.
Fig. 4 is the structural representation of the second sizing stop in the present invention.
Fig. 5 is the vertical view of the second sizing stop in the present invention.
Fig. 6 is the vertical view of the positioning datum dish in the present invention.
Fig. 7 is the front view of RS105 test macro.
Fig. 8 is the vertical view of RS105 test macro.
Fig. 9 is the stereographic map of the present invention while carrying out planar survey.
Figure 10 is the vertical view of the present invention while carrying out planar survey.
Figure 11 is the stereographic map of the present invention while carrying out bulk measurement.
Figure 12 is the vertical view of the present invention while carrying out bulk measurement.
Figure 13 is the stereographic map of the present invention while carrying out bulk measurement.
Figure 14 is the vertical view of the present invention while carrying out bulk measurement.
Embodiment
Shown in Figure 14, a kind of probe correcting device, as shown in Figure 1, this calibrating installation comprises the first sizing stop 1, the second sizing stop 2 and positioning datum dish 3; Positioning datum dish 3 is connected with the first support chassis 101 by the first web joint 4, one end of the first web joint 4 and positioning datum dish 3 are hinged, the other end is fixedly connected with the first support chassis 101, and the first web joint 4 is provided with first register pin 401 corresponding with the first pilot hole coupling.Distance between the axis of the vertical central axis of positioning datum dish 3 and the first support column jacket 102 is 45.2cm.The first support chassis 101 is connected with the second support chassis 201 by the second web joint 5, and one end of the second web joint 5 and the first support chassis 101 are hinged, and the other end and the second support chassis 201 are hinged.On the second web joint 5, be respectively equipped with second register pin 501 and three register pin 502 corresponding with the second pilot hole and the 3rd pilot hole coupling.Adopt after such structure, the first sizing stop 1 can rotate around positioning datum dish 3, and the second sizing stop 2 can rotate around the first sizing stop 1.
As shown in Figure 2, described the first support column is height-adjustable structure, first support chassis 101, first that comprises the first sizing stop 1 supports column jacket 102, the first support inner prop 103 and first is measured assembly 104, the first measurement assemblies 104 and comprised the first measurement cross bar 1041 and be arranged on the first field intensity probe the 1042, first Ba Lun 1043 and the first photoelectric conversion module 1044 being connected successively on the first measurement cross bar 1041.First one end of supporting column jacket 102 is arranged on the center of the first support chassis 101, first one end of supporting inner prop 103 is inserted first and is supported in column jacket 102, and can slide up and down along the madial wall of the first support column jacket 102, on the sidewall of the first support inner prop 103 and on the sidewall of the first support column jacket 102, be respectively equipped with fixed orifice corresponding to coupling, first other end that supports inner prop 103 is fixedly connected with the first support rail 1041.Adopt the height of the first sizing stop 1 after this spline structure can up-down adjustment, to adapt to different test requests.At the first support column jacket 102 and first, measure between cross bar 1041 and be also provided with inclined support bar, in order to strengthen the stability of the first measurement cross bar 1041.Distance between the axis of the vertical central axis of the first field intensity probe 1042 and the first support column jacket 102 is 45.2cm.
As shown in Figure 3, the first support chassis 101 is provided with the second pilot hole, and the second pilot hole comprises the 4th hole 1011 and the 5th hole 1012.
As shown in Figure 4, described the second support column is height-adjustable structure, second support chassis 201, second that comprises the second sizing stop 2 supports column jacket 202, the second support inner prop 203 and second is measured assembly 204, the second measurement assemblies 204 and comprised the second measurement cross bar 2041 and be arranged on the second field intensity probe the 2042, second Ba Lun 2043 and the second photoelectric conversion module 2044 being connected successively on the second measurement cross bar 2041.The second two ends that support column jacket 202 are arranged on the center of the second support chassis 202, second one end of supporting inner prop 203 is inserted second and is supported in column jacket 202, and can slide up and down along the madial wall of the second support column jacket 202, on the sidewall of the second support inner prop 203 and on the sidewall of the second support column jacket 202, be respectively equipped with fixed orifice corresponding to coupling, second other end that supports inner prop 203 is fixedly connected with the second support rail 2041.Adopt the height of the second sizing stop 2 after this spline structure can up-down adjustment, to adapt to different test requests.At the second support column jacket 202 and second, measure between cross bar 2041 and be also provided with inclined support bar, in order to strengthen the stability of the second measurement cross bar 2041.Distance between the axis of the vertical central axis of the second field intensity probe 2042 and the second support column jacket 202 is 45.2cm.The second sizing stop 2 also comprises the locating support 205 of popping one's head in, and probe locating support 205 in ground is and is horizontally disposed with, and its one end is connected with the second support chassis 201, and another termination is positioned on the vertical central axis that the second field intensity pops one's head in.
As shown in Figure 5, the second support chassis 201 is provided with the 3rd pilot hole, and the 3rd pilot hole comprises the 6th hole 2011, seven apertures in the human head 2012, octal 2013 and the 9th hole 2014.
As shown in Figure 6, positioning datum dish 3 is provided with the first pilot hole, and the first pilot hole comprises the first hole 301, the second hole 302 and the 3rd hole 303.Angle between the first hole 301 and the second hole 302 is 45 degree, and the angle between the second hole 302 and the 3rd hole 303 is 45 degree.The center of positioning datum dish 3 is also provided with datum hole.On the bottom surface of positioning datum dish 3, be also provided with nonmetal sucker, for stationary positioned reference disk 3.
The test position point that in American army mark 461F, RS105 pilot project requires transient electromagnetic field field uniformity is: four summits of square homogeneous area and center point, and wherein center point is reference point, during test, reference probe position keeps motionless.As shown in Figure 7,8, dashed region is test zone.Probe correcting device test philosophy of the present invention: this device can carry out space single plane test, also can carry out space cube end points and the test of body central point, is applicable to different transient electromagnetic field field uniformity standard testing requirements.
Embodiment 1:
As Fig. 9, the 10th, schematic diagram when the present invention tests plane OPMN.Plane OPMN is that the length of side is the square of 1 meter, the first distance supporting between the axis of column jacket 102 and the axis of the second support column jacket 202 is 60cm, angle between the axis of the 4th hole 1011 and the first measurement cross bar 1041 is 89 degree, angle between the 4th hole 1011 and the 5th hole 1012 is 178 degree, angle between the 6th hole 2011 and seven apertures in the human head 2012 is 26 degree, angle between seven apertures in the human head 2012 and octal 2013 is 156 degree, and the angle between octal 2013 and the 9th hole 2014 is 26 degree.
When plane test position fix starts, first utilize datum hole and test zone ground orthogonal centre lines on positioning datum dish 3 to carry out origin reference location, the first pilot hole is on test plane right side, and nonmetal sucker positions.Adjust the angle of the first sizing stop 1 relative positioning benchmark pallet 3, make the first sizing stop 1 vertical with MN, and utilize the second hole 302 and 401 pairs of the first field intensity probes 1042 of the first register pin to carry out location, orientation, regulate the height of the first sizing stop 1 simultaneously, make the center that is centered close to plane OPMN of the first field intensity probe 1042.By adjusting the second sizing stop 2, the second register pin 501 on the second web joint 5 is overlapped with the 4th hole 1011 again, the 3rd register pin 502 overlaps with seven apertures in the human head 2012, and the height of simultaneously adjusting the second sizing stop 2 is 1 meter.Face central point, the second field intensity probe 2042 that now the first field intensity probe 1042 is positioned at plane OPMN is positioned at the pop one's head in terminations of locating support 205 of O point and ground and is positioned at N point.
After O point has been tested, the second sizing stop 2 need to be tested to P point by rotary moving.Take off the second register pin 501, make the second sizing stop 2 around the first sizing stop 1 182 degree that turn clockwise, the second register pin 501 is overlapped with the 5th hole 1012.Again the 3rd register pin 502 is taken out, make the second sizing stop 2 around the axis of the second support column jacket 202 204 degree that turn clockwise, the 3rd register pin 502 is overlapped with octal 2013.Now the second field intensity probe 2042 is positioned at P point and is positioned at M point with the termination of ground probe locating support 205.
On the bottom surface of the first support chassis 101 and the second support chassis 201, be also provided with around 3 uniform multi-directional ball, make the movement of sizing stop convenient.When whole sizing stop is tested at transient electromagnetic field field uniformity, by simple rotation, can complete the location point in transient electromagnetic field field uniformity requirement perpendicular in 461F standard and test.As tested, need to change test plane, the position by conversion origin reference location dish 3 re-starts adjustment test.
Embodiment 2:
The difference of the present embodiment and embodiment 1 is: when plane OPMN is the length of side while being 1.5 meters square, the height of adjusting the first sizing stop 1 is 0.75 meter, and the height of the second sizing stop 2 is 1.5 meters.The first distance supporting between the axis of column jacket 102 and the axis of the second support column jacket 202 is 90cm, angle between the axis of the 4th hole 1011 and the first measurement cross bar 1041 is 88 degree, angle between the 4th hole 1011 and the 5th hole 1012 is 176 degree, angle between the 6th hole 2011 and seven apertures in the human head 2012 is 40 degree, angle between seven apertures in the human head 2012 and octal 2013 is 144 degree, and the angle between octal 2013 and the 9th hole 2014 is 40 degree.
Embodiment 3:
In transient electromagnetic field field uniformity calibration operation, in American army mark 461F RS105 pilot project, also has the test request of some other transient electromagnetic field field uniformity.The test zone of its requirement is cubical 8 summits and body mid point.Figure 11 to Figure 14 is the schematic diagram of the present invention when cube ABCDEFGH is tested.The length of side of cube ABCDEFGH is 1 meter, and the height of adjusting the first sizing stop 1 is 0.5 meter, and the height of the second sizing stop 2 is 1 meter.The first distance supporting between the axis of column jacket 102 and the axis of the second support column jacket 202 is 60cm, angle between the axis of the 4th hole 1011 and the first measurement cross bar 1041 is 89 degree, angle between the 4th hole 1011 and the 5th hole 1012 is 178 degree, angle between the 6th hole 2011 and seven apertures in the human head 2012 is 26 degree, angle between seven apertures in the human head 2012 and octal 2013 is 156 degree, and the angle between octal 2013 and the 9th hole 2014 is 26 degree.
Eight summits and body central point for cube ABCDEFGH carry out location, position, and positioning datum dish 3 is that locator meams is identical with face test.Datum hole on positioning datum dish 3 and test zone ground orthogonal centre lines are carried out origin reference location, and the first pilot hole is towards BF line direction, and nonmetal sucker positions.End points testing sequence is H-E, C-B, D-A, G-F.
One, H-E point location: the 3rd hole 303 and the first register pin 401 are overlapped, thereby the first field intensity probe 1042 is carried out to location, orientation, then make the second register pin 501 overlap with the 4th hole 1011, the 3rd register pin 502 overlaps with the 6th hole 2011.Now the first field intensity probe 1042 is positioned at cube center, and the second field intensity probe 2042 is positioned at cubical end points H position, and the termination of ground probe bracket 205 is positioned at E point position.
Two, C-B point location: the second sizing stop 2 is turned clockwise after 182 degree around the first sizing stop 1 center, the second register pin 501 is overlapped with the 5th hole 1012, the second sizing stop 2 152 degree that self turn clockwise again, make the 3rd register pin 502 overlap with the 9th hole 2014.Now the second field intensity probe 2042 is positioned at cubical end points C point and is positioned at B point with the termination of ground probe bracket 205.
Three, D-A point location: the first sizing stop 1 is turn 90 degrees around the 3 center dextrorotations of positioning datum dish, the first register pin 401 is overlapped with the first hole 301, and now the second field intensity probe 2042 is positioned at cubical end points D point and is positioned at A point with the termination of ground probe bracket 205.
Four, G-F point location: the second sizing stop 2 is rotated counterclockwise after 182 degree around the first sizing stop 1 center, the second register pin 501 is overlapped with the 4th hole 1011, the second sizing stop 2 self is rotated counterclockwise 152 degree again, and the 3rd register pin 502 is overlapped with the 6th hole 2011.Now the second field intensity probe 2042 is positioned at cubical end points G point and is positioned at F point with the termination of ground probe bracket 205.
Embodiment 4:
The difference of the present embodiment and embodiment 3 is: when the length of side of cube ABCDEFGH is 1.5 meters, the height of adjusting the first sizing stop 1 is 0.75 meter, and the height of the second sizing stop 2 is 1.5 meters.The first distance supporting between the axis of column jacket 102 and the axis of the second support column jacket 202 is 90cm, angle between the axis of the 4th hole 1011 and the first measurement cross bar 1041 is 88 degree, angle between the 4th hole 1011 and the 5th hole 1012 is 176 degree, angular range between the 6th hole 2011 and seven apertures in the human head 2012 is 40 degree, angular range between seven apertures in the human head 2012 and octal 2013 is 144 degree, and the angular range between octal 2013 and the 9th hole 2014 is 40 degree.
In whole test process, test point remains constant.When whole probe correcting device is tested at transient electromagnetic field field uniformity, by simple rotation, can complete the test of transient electromagnetic field area of space field uniformity test.Reduced repeatedly the mobile measuring error of adjusting probe positions attitude and introducing, improved measuring accuracy, and then improved work efficiency; And realized the test request that a sizing stop can meet different transient electromagnetic field field uniformity standards, improved the applicability of sizing stop.
The word in the description orientation that adopted herein " on ", D score, " left side ", " right side " etc. are all convenience in order to illustrate based on the orientation shown in drawing in accompanying drawing, in actual device, these orientation may be different due to the disposing way of device.
By reference to the accompanying drawings the specific embodiment of the present invention is explained in detail above, but the present invention is not limited to above-mentioned embodiment, in the ken possessing those skilled in the art, can also makes without departing from the inventive concept of the premise various variations.
Claims (10)
1. a probe correcting device, is characterized in that: this calibrating installation comprises positioning datum dish, the first sizing stop and the second sizing stop;
Described the first sizing stop comprises that the first support chassis, one end are arranged on the first support column in the first support chassis and are arranged on first of the first support column other end and measures assembly;
Described the second sizing stop comprises that the second support chassis, one end are arranged on the second support column in the second support chassis and are arranged on second of the second support column other end and measures assembly;
Described positioning datum dish is connected with the first sizing stop by the first web joint, and described first web joint one end and described positioning datum dish are hinged, and the other end is fixedly connected with the first support chassis;
Described the first sizing stop is connected with the second sizing stop by the second web joint, and one end of described the second web joint and the first support chassis are hinged, and the other end and the second support chassis are hinged;
Described first measures assembly comprises the first measurement cross bar and the first field intensity probe, the first Ba Lun and the first photoelectric conversion module disposed thereon and that be connected successively, and described second measures assembly comprises the second measurement cross bar and the second field intensity probe, the second Ba Lun and the second photoelectric conversion module disposed thereon and that be connected successively.
2. calibrating installation according to claim 1, it is characterized in that: the ground probe locating support that is also provided with level in described the second support chassis, pop one's head in one end of locating support is connected with the second support chassis describedly, and another termination is positioned at the second field intensity and pops one's head on vertical central axis.
3. calibrating installation according to claim 1, is characterized in that: described positioning datum dish is provided with the first pilot hole, and described the first web joint is provided with first register pin corresponding with described the first pilot hole coupling; Described the first support chassis is provided with the second pilot hole, and described the second web joint is provided with second register pin corresponding with described the second pilot hole coupling; The second support chassis is provided with the 3rd pilot hole, and described the second web joint is provided with three register pin corresponding with described the 3rd pilot hole coupling; Described positioning datum Pan center is provided with datum hole.
4. calibrating installation according to claim 1, it is characterized in that: the vertical central axis of described the first field intensity probe and the distance between the first support column axis are 45.2cm, the vertical central axis of described the second field intensity probe and the distance between the second support column axis are 45.2cm, distance between the vertical central axis of described positioning datum dish and the first support column axis is 45.2cm, and the distance range between described the first support column axis and the second support column axis is 60～90cm.
5. calibrating installation according to claim 4, is characterized in that: the distance between described the first support column axis and the second support column axis is 60cm.
6. calibrating installation according to claim 4, is characterized in that: the distance between described the first support column axis and the second support column axis is 90cm.
7. calibrating installation according to claim 4, is characterized in that: described the first pilot hole comprises the first hole, the second hole and the 3rd hole, and the angle between described the first hole and the second hole is 45 degree, and the angle between the second hole and the 3rd hole is 45 degree; Described the second pilot hole comprises the 4th hole and the 5th hole, and the angular range between described the 4th hole and the 5th hole is 178～176 degree; Described the 3rd pilot hole comprises the 6th hole, seven apertures in the human head, octal and the 9th hole, angular range between described the 6th hole and seven apertures in the human head is 26～40 degree, angular range between seven apertures in the human head and octal is 156～144 degree, and the angular range between octal and the 9th hole is 26～40 degree.
8. calibrating installation according to claim 7, it is characterized in that: the angle between described the 4th hole and the 5th hole is 178 degree, angle between described the 6th hole and seven apertures in the human head is 26 degree, and the angle between seven apertures in the human head and octal is 156 degree, and the angle between octal and the 9th hole is 26 degree.
9. calibrating installation according to claim 7, it is characterized in that: the angle between described the 4th hole and the 5th hole is 176 degree, angle between described the 6th hole and seven apertures in the human head is 40 degree, and the angle between seven apertures in the human head and octal is 144 degree, and the angle between octal and the 9th hole is 40 degree.
10. calibrating installation according to claim 1, is characterized in that: described the first support column is height-adjustable structure, and described the second support column is height-adjustable structure.
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| CN201310705549.6A CN103645455B (en) | 2013-12-19 | 2013-12-19 | Probe correcting device |
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| WO2020187323A1 (en) * | 2019-03-20 | 2020-09-24 | 深圳市道通科技股份有限公司 | Calibration bracket |
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| WO2020187323A1 (en) * | 2019-03-20 | 2020-09-24 | 深圳市道通科技股份有限公司 | Calibration bracket |
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