CN103628038A - Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition - Google Patents
Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition Download PDFInfo
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- CN103628038A CN103628038A CN201210301805.0A CN201210301805A CN103628038A CN 103628038 A CN103628038 A CN 103628038A CN 201210301805 A CN201210301805 A CN 201210301805A CN 103628038 A CN103628038 A CN 103628038A
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- vapor deposition
- chemical vapor
- crawler belt
- spray
- cleaning
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Abstract
The invention relates to chemical vapor deposition equipment, and a method used for cleaning crawler belts in chemical vapor deposition. The chemical vapor deposition equipment comprises a chamber, a gas inlet device used for providing the chamber with gas to be treated; a gas exhausting device used for delivering treated gas out from the chamber, crawler belts used for moving loaded wafers to be treated; a heating block used for heating the wafers to be treated on the crawler belts, a spray device used for spraying gasification corrosive liquid onto the surfaces of the crawler belts, an ultrasonic cleaning device used for cleaning the surfaces of the crawler belts using ultrasonic wave, and a drying device used for drying the surfaces of the crawler belts. The chemical vapor deposition equipment and the method are capable of removing SiO2 accumulated on the crawler belts effectively, solving surface particle problems of the wafers, improving surface quality of the wafers, and increasing service efficiency of the chemical vapor deposition equipment.
Description
Technical field
The present invention relates to the method for cleaning crawler belt in a kind of chemical vapor deposition (CVD) equipment and chemical gas-phase deposition method, particularly, relate in chemical vapor deposition being accumulated in the SiO in track surface
2the technology of cleaning, removing.
Background technology
Chemical vapor deposition (CVD, Chemical Vapor Deposition) is that reaction material is imported in reaction cavity, utilizes well heater, plasma, light homenergic to make gas generation chemical reaction, forms the technique of the stable solid film of one deck in disk surfaces.In semiconductor production, CVD operation is mainly for the preparation of various films, pre-doping etc.
Fig. 1 means the schematic diagram of the chemical vapor deposition device of prior art.As shown in Figure 1, in this chemical gas phase equipment, by cavity is imported to SiH
4and O
2, so that crawler belt 101 mounting disk on deposit SiO
2.Below crawler belt 101, be provided with the heat block 201 that crawler belt 101 is heated.
This atmospheric pressure cvd growth SiO
2film or doping SiO
2film is an important procedure in fabrication of semiconductor device, on comparatively advanced production line, generally adopts following two kinds of modes to clean the contamination on crawler belt and disk: at atmospheric pressure cvd growth SiO
2after the film end of job, adopt the mode that disk is carried out to pure water scouring to remove the particle of surface contamination; Strengthen equipment washing frequency, the particle of the upper accumulation of the devices such as crawler belt is controlled to a certain degree.
But there is following problem in such prior art: (1) is at growth SiO
2in thin-film process, crawler belt 101 surfaces ceaselessly evenly accumulate SiO
2film, reaches after certain thickness SiO
2film can burst apart, and spatters in disk and equipment everywhere, and disk surfaces particle contaminant is many, cleans disk also may not necessarily solve surface particles problem completely with pure water; (2) efficiency is low, and every operation 40-60 criticizes disk, and equipment will clean.
Summary of the invention
In view of the above problems, the present invention aim to provide a kind of can solve disk surfaces particle contaminant problem and can improve the chemical vapor deposition device of plant efficiency and CVD (Chemical Vapor Deposition) method in clean crawler belt method.
Chemical vapor deposition device of the present invention, comprising: cavity; Processing gas is supplied with to the diffuser of described cavity; Gas after processing is derived to the gas barrier of described cavity; The crawler belt of the processed disk of mobile mounting, is characterized in that, also comprises:
Spray equipment, to described track surface spray gasification corrosive fluid;
Ultrasonic cleaning equipment, utilizes ultrasonic wave to clean described track surface;
Drying unit, dries described track surface.
Preferably, described spray equipment is the spray equipment of spray gasification HF.
Preferably, described spray equipment possesses: a pass enters the air outlet of inlet mouth and a plurality of ejection vaporization HF of HF acid.
Preferably, described spray equipment, described ultrasonic cleaning equipment, described drying unit set gradually according to the rotating direction of crawler belt.
Preferably, described spray equipment is arranged on the top of described crawler belt, and described ultrasonic cleaning equipment and described drying unit are arranged on the below of described crawler belt.
Preferably, described drying unit utilizes filament to heat described crawler belt.
The method of cleaning crawler belt in CVD (Chemical Vapor Deposition) method of the present invention, is characterized in that, comprises the steps:
Spray step to described track surface spray gasification corrosive fluid;
The cleaning step that utilizes ultrasonic wave to clean described track surface;
The baking step that described track surface is dried.
Preferably, in described spray step, spray gasification HF.
Preferably, in described spray step, by a plurality of air outlet spray gasification HF.
Preferably, in described baking step, utilize filament to heat described crawler belt.
According to the method for cleaning crawler belt in chemical vapor deposition device of the present invention and CVD (Chemical Vapor Deposition) method of the present invention, can effectively remove the SiO accumulating on crawler belt
2, can solve disk surfaces particle issues, improve disk surfaces quality, but also can improve the service efficiency of chemical vapor deposition device.
Accompanying drawing explanation
Fig. 1 means the schematic diagram of the chemical vapor deposition device of prior art.
Fig. 2 means the schematic diagram of the chemical vapor deposition device of an embodiment of the present invention.
Fig. 3 means the organigram of the spray equipment in chemical vapor deposition device of the present invention.
Embodiment
What introduce below is some in a plurality of embodiment of the present invention, aims to provide basic understanding of the present invention.Be not intended to confirm key of the present invention or conclusive key element or limit claimed scope.
Fig. 2 means the schematic diagram of the chemical vapor deposition device of an embodiment of the present invention.Below with reference to Fig. 2, chemical vapor deposition device of the present invention is described.
The chemical vapor deposition device of present embodiment, comprising: cavity (not shown); The diffuser of processing gas being supplied with to described cavity (is diagram, only in Fig. 2, expresses and supply with cavity processing gas SiH
4and N
2); By the gas after processing derive described cavity gas barrier (not shown, only in Fig. 2, represent the O after processing
2and N
2derive); The crawler belt 100 of the processed disk of mobile mounting; For the heat block 200 that the processed disk on crawler belt 100 is heated; Spray equipment 300 to crawler belt 100 surface spraying gasification corrosive fluids; The ultrasonic cleaning equipment 400 that utilizes ultrasonic wave to clean crawler belt 100 surfaces; The drying unit 500 that crawler belt 100 surfaces are dried.
Wherein, spray equipment 300, ultrasonic cleaning equipment 400, drying unit 500 are 3 parts that set gradually on the rotating direction of crawler belt 100, wherein, spray equipment 300 is arranged on the top of crawler belt 100, and ultrasonic cleaning equipment 400 and drying unit 500 are arranged on the below of crawler belt 100.These 3 parts are in order to eliminate disk surfaces, to stain, improve plant efficiency and increase the new parts of setting.
Particularly, utilize 300 pairs of crawler belts 100 of spray equipment to eject the HF of vaporization, the HF of vaporization can with crawler belt 100 on SiO
2, there is corrosion reaction, like this, when crawler belt 100 during through spray equipment 300 below by eject vaporization HF, the SiO of crawler belt 100 lip-deep depositions from spray equipment 300
2just can be fully and HF carry out corrosion reaction, can remove the SiO on crawler belt 100 thus
2.Then,, when crawler belt 100 passes through the top of ultrasonic cleaning equipments 400, ultrasonic cleaning equipment 400 utilizes ultrasonic wave that the residuals after HF corrosion reaction is removed, cleaned.Then, when crawler belt 100 passes through the top of drying units 500,500 pairs of drying units are dried through the crawler belt 100 cleaning, and make dried crawler belt 100 can carry out continuously follow-up deposit operation.
An embodiment that has represented spray equipment 300 in Fig. 3.As shown in Figure 3, spray equipment 300 is a cuboid device, and it is arranged on the top of crawler belt 100.Spray equipment 300 mainly comprises: a pass enters the inlet mouth 301 of HF acid and is arranged on the air outlet 302 of a plurality of ejection vaporization HF of below.A plurality of air outlets 302 are apertures of rectangular dense arrangement, utilize such air outlet 302 to eject equably HF, thus, can make HF fully with crawler belt 100 on SiO
2react.
On the other hand, as an embodiment of drying unit 500, can exemplify the drying unit forming with heating fluorescent tube.For example, can as drying unit, be arranged on the below of crawler belt 100 in the downstream of ultrasonic cleaning equipment 400 using organizing heating fluorescent tube more, the crawler belt 100 through ultrasonic cleaning be carried out to heating, drying, so that crawler belt 100 can continue to bear follow-up deposit operation.
According to chemical vapor deposition device of the present invention, utilize spray equipment 300, ultrasonic cleaning equipment 400 and drying unit 500, can effectively remove the SiO of accumulation on crawler belt 100
2, can solve disk surfaces particle issues, improve disk surfaces quality, but also can improve the service efficiency of chemical vapor deposition device.
For chemical vapor deposition device of the present invention, be illustrated above.Under regard to the method for cleaning crawler belt in CVD (Chemical Vapor Deposition) method of the present invention and be briefly described.The method mainly comprises the steps: the spray step to track surface spray gasification corrosive fluid; The cleaning step that utilizes ultrasonic wave to clean track surface; The baking step that track surface is dried.
Wherein, in described spray step, crawler belt spray is gasified to HF so that the SiO on HF and crawler belt
2carry out corrosion reaction, can effectively remove the SiO accumulating on crawler belt like this
2.In the process of spray HF, for example can excessively a plurality ofly be arranged in rectangular small air outlet to crawler belt spray gasification HF, can make like this HF can with crawler belt on SiO
2react equably.In addition, in described baking step, for example, can crawler belt be heated, be dried with many groups of heating fluorescent tubes.
Similarly, according to cleaning the method for crawler belt in CVD (Chemical Vapor Deposition) method of the present invention, can effectively remove the SiO accumulating on crawler belt
2, can solve disk surfaces particle issues, improve disk surfaces quality, but also can improve the service efficiency of chemical vapor deposition device.
Above example has mainly illustrated the method for cleaning crawler belt in chemical vapor deposition device of the present invention and CVD (Chemical Vapor Deposition) method.Although only some of them the specific embodiment of the present invention is described, those of ordinary skills should understand, and the present invention can be within not departing from its purport and scope implements with many other forms.Therefore, the example of showing and embodiment are regarded as illustrative and not restrictive, and in the situation that not departing from spirit of the present invention as defined in appended each claim and scope, the present invention may be contained various modifications and replacement.
Claims (10)
1. a chemical vapor deposition device, comprising: cavity; Processing gas is supplied with to the diffuser of described cavity; Gas after processing is derived to the gas barrier of described cavity; The crawler belt of the processed disk of mobile mounting, is characterized in that, also comprises:
Spray equipment, to described track surface spray gasification corrosive fluid;
Ultrasonic cleaning equipment, utilizes ultrasonic wave to clean described track surface; And
Drying unit, dries described track surface.
2. chemical vapor deposition device as claimed in claim 1, is characterized in that,
Described spray equipment, described ultrasonic cleaning equipment, described drying unit set gradually according to the rotating direction of crawler belt.
3. chemical vapor deposition device as claimed in claim 1, is characterized in that,
Described spray equipment is arranged on the top of described crawler belt, and described ultrasonic cleaning equipment and described drying unit are arranged on the below of described crawler belt.
4. chemical vapor deposition device as claimed in claim 3, is characterized in that,
Described spray equipment is the spray equipment of spray gasification HF.
5. chemical vapor deposition device as claimed in claim 4, is characterized in that,
Described spray equipment possesses: a pass enters the air outlet of inlet mouth and a plurality of ejection vaporization HF of HF acid.
6. chemical vapor deposition device as claimed in claim 5, is characterized in that,
Described drying unit utilizes filament to heat described crawler belt.
7. in CVD (Chemical Vapor Deposition) method, clean a method for crawler belt, it is characterized in that, comprise the steps:
Spray step to described track surface spray gasification corrosive fluid;
The cleaning step that utilizes ultrasonic wave to clean described track surface; And
The baking step that described track surface is dried.
8. the method for cleaning crawler belt in CVD (Chemical Vapor Deposition) method as claimed in claim 7, is characterized in that,
In described spray step, spray gasification HF.
9. the method for cleaning crawler belt in CVD (Chemical Vapor Deposition) method as claimed in claim 8, is characterized in that,
In described spray step, by a plurality of air outlet spray gasification HF.
10. the method for cleaning crawler belt in CVD (Chemical Vapor Deposition) method as claimed in claim 9, is characterized in that,
In described baking step, utilize filament to heat described crawler belt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210301805.0A CN103628038A (en) | 2012-08-23 | 2012-08-23 | Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210301805.0A CN103628038A (en) | 2012-08-23 | 2012-08-23 | Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103628038A true CN103628038A (en) | 2014-03-12 |
Family
ID=50209481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210301805.0A Pending CN103628038A (en) | 2012-08-23 | 2012-08-23 | Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109136882A (en) * | 2018-09-07 | 2019-01-04 | 上海申和热磁电子有限公司 | A kind of improvement SiO2The chemical vapor deposition method of film compactness |
| CN112705514A (en) * | 2020-12-31 | 2021-04-27 | 有研半导体材料有限公司 | Crawler belt offline cleaning device and method for APCVD |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06342758A (en) * | 1993-05-31 | 1994-12-13 | Sony Corp | Semiconductor manufacturing device |
| JP2000216099A (en) * | 1999-01-22 | 2000-08-04 | Sony Corp | Conveyer cleaning system |
| JP2001135577A (en) * | 1999-11-02 | 2001-05-18 | Sony Corp | Semiconductor film deposition system |
| JP2002246356A (en) * | 2001-02-19 | 2002-08-30 | Sony Corp | Thin-film forming equipment |
| KR20020082285A (en) * | 2001-04-20 | 2002-10-31 | 삼성전자 주식회사 | Apcvd for belt type |
-
2012
- 2012-08-23 CN CN201210301805.0A patent/CN103628038A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06342758A (en) * | 1993-05-31 | 1994-12-13 | Sony Corp | Semiconductor manufacturing device |
| JP2000216099A (en) * | 1999-01-22 | 2000-08-04 | Sony Corp | Conveyer cleaning system |
| JP2001135577A (en) * | 1999-11-02 | 2001-05-18 | Sony Corp | Semiconductor film deposition system |
| JP2002246356A (en) * | 2001-02-19 | 2002-08-30 | Sony Corp | Thin-film forming equipment |
| KR20020082285A (en) * | 2001-04-20 | 2002-10-31 | 삼성전자 주식회사 | Apcvd for belt type |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109136882A (en) * | 2018-09-07 | 2019-01-04 | 上海申和热磁电子有限公司 | A kind of improvement SiO2The chemical vapor deposition method of film compactness |
| CN109136882B (en) * | 2018-09-07 | 2020-09-18 | 上海新欣晶圆半导体科技有限公司 | SiO improvement2Chemical vapor deposition method for film compactness |
| CN112705514A (en) * | 2020-12-31 | 2021-04-27 | 有研半导体材料有限公司 | Crawler belt offline cleaning device and method for APCVD |
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Application publication date: 20140312 |