CN103605265B - A kind of curve lithography process system of the picture dot variable-angle based on vector curve path and photoetching method - Google Patents
A kind of curve lithography process system of the picture dot variable-angle based on vector curve path and photoetching method Download PDFInfo
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- CN103605265B CN103605265B CN201310611339.0A CN201310611339A CN103605265B CN 103605265 B CN103605265 B CN 103605265B CN 201310611339 A CN201310611339 A CN 201310611339A CN 103605265 B CN103605265 B CN 103605265B
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Abstract
The present invention relates to a kind of lithography process system and photoetching method of the picture dot variable-angle based on vector curve path, this lithography process system comprise can resolve vector curve, decompose, the control system of composite calulation function and the exposure system by this control system control realization, picture dot angle control system.This etching system, according to vector curve, by analyzing the structure of this curve, resolving into path and the picture dot Angle ambiguity data of curve, then according to these data, photoetching hectograph etching, realize the etching of the picture dot variable-angle based on vector curve path.By enforcement of the present invention, can etch arbitrary shape curve, regular picture dot distribution on curved path, and have the advantages such as smooth linear, higher etching Efficiency and accuracy.
Description
[technical field]
The invention belongs to Ultra-Violet Laser technical field of lithography, on photoresist lamina membranacea, particularly make the lithographic method of vector path curve picture dot variable-angle.
[background technology]
Vector photoetching curve has in laser anti-counterfeit field to be applied in a large number widely, as securities, radium-shine wrappage, trade mark making, legal card etc.The known technology realizing vector curve processing at present mainly contains: dot matrix techniques makes curve, and laser-engraving technique makes curve mode.Wherein:
Dot matrix techniques makes curve method.In the graphic designs stage, the vector curve of design is converted to bitmap file, made a kind of method of curve by array light etching system.This kind of method is due in the design configuration stage, and figure has carried out linear transformation, makes the loss of plan position information, by the artificial method arranged, positional information need be re-started setting in the production phase.Ensure that curve relative position is in the graphic correct.There is technical sophistication in this artificial position method to set up, same figure different resolution arranges shortcomings such as being also not quite similar.Meanwhile, the line smoothing degree produced is sufficiently oily, and curve exists zigzag, affects attractive in appearance.The curve made is more single, can not make complicated curvilinear figure.Owing to adopting array light lithography to make, fabrication cycle is long.In sum, this kind of method makes complicated, and fabrication cycle is long, the single angle direction of picture dot.
Laser-engraving technique method for making.Made by vector graphics, directly import in process equipment, photoetching hectograph etches.The method simplicity of design, but shortcoming is brightness irregularities on whole vector curve, and exposure station is of uneven density, and particularly at initial period, luminous point is overlapping, has a strong impact on product quality, also there is the single angle direction of unthreaded hole.
[summary of the invention]
In view of this, the present invention proposes and utilize optical interference circuit and vector curve characteristic to make vector curve lithography process system based on the picture dot variable-angle of vector path and photoetching method, for making vector curve.
Any curve we can regard that countless sections little straight-line segments form as, each little line segment all has start position and end point location information, can determine slope and the normal of line segment according to these information, the direction vector according to normal can determine the angle direction of unthreaded hole.
Suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1); (x2, y2), the slope of this line segment is
K1=(y2-y1)/(x2-x1), cross p2 point perpendicular to mistake p1, p2 point connect the slope k 2 of straight line
Be-1 by two straight slope products that intersect vertically, can k1*k2=-1 be obtained
Obtain k2=-1/k1.
According to theoretical analysis above, we can determine the normal of any point on curve, rotated according to the direction vector of exposure station normal by a single shaft motor, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained.
Thus, propose a kind of according to object of the present invention, propose a kind of lithography process system to be made up of exposure system and control system, described exposure system comprises light source, first optical frames head group, variable picture dot, light-splitting device, iris, second optical frames head group, described variable picture dot is a spatial light picture dot modulator, described light-splitting device is a spatial light modulator, what described first optical frames head group and the second optical frames head group formed a convergent-divergent can only the projection optics lens group of UV light permeability, described iris has the adjustable through hole device composition in one group of aperture, iris can stop 0 aurora, the various combination of ± 1 aurora or ± 2 aurora, form the through hole by each aurora, this exposure system is by light source, first optical frames head group, variable picture dot, light-splitting device, iris, second optical frames head group rearranges from top to bottom, described control system comprise for march line analysis and coding computing machine and utilize coded data to carry out the driving governor of spectrum assignment, driving governor comprises one for controlling the drive motor of picture dot angle change, and for driving two axis drive motors of whole system movement.
Described spatial light modulator above, can adopt special grating, Digital Micromirror Device.
The convergent-divergent multiple of the projection optics lens group of described convergent-divergent is 10 times-20 times above.
Variable picture dot described above is a spatial light picture dot modulator, and shape can be maybe any shape for square or circle, comprises various font and figure, digital micro-mirror.
Variable picture dot described above is connected on described single shaft motor, and by the driving of single shaft motor, variable picture dot rotates, and makes variable picture dot angle meet designing requirement, namely realizes picture dot variable-angle.
Iris described above has the adjustable through hole device composition in one group of aperture, as requested, can stop 0 aurora, ± 1 aurora, the through hole of the various combinations such as ± 2 aurora.
Iris shutter manually converts the grating device of different space frequency; Iris manually regulates the aperture of diaphragm.
According to the object of the invention, propose a kind of photoetching method utilizing said system to carry out photoetching, method step is as follows:
A) photoetching vector curve figure is designed;
B) utilize in computing machine and be provided with tracing analysis and coding module, by vector curve graphics decomposition to be etched and be encoded into the photoetching file that can carry out spectrum assignment: any curve has been regarded countless sections little straight-line segments as and formed, each little line segment all has start position and end point location information, according to slope and the normal of information determination line segment, direction vector according to normal can determine the angle direction of unthreaded hole, suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1); (x2, y2), the slope of line segment is K1=(y2-y1)/(x2-x1), cross p2 point perpendicular to mistake p1, p2 point connect straight line slope k 2 be-1 by two straight slope products that intersect vertically, k1*k2=-1 can be obtained and obtain k2=-1/k1;
C) then determine that the normal of any point on curve is rotated according to the direction vector of exposure station normal by a single shaft motor according to step b, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained.
Above-mentioned photoetching method also comprises:
D) Curve transform based on the picture dot variable-angle in vector curve path becomes can carry out the photoetching file of spectrum assignment;
E) obtain controlling exposure position parameter according to the photoetching file of steps d, picture dot angle parameter, completes the exposure in whole vector curve path successively.
Described exposure position parameter refers to eachly need exposure station location parameter, and this parameter is obtained by decoding photoetching file; Picture dot angle parameter, refers to each picture dot angle needing exposure station, is obtained by decoding photoetching file.
Vector curve lithography process system recited above and photoetching method, compared with prior art, have following advantage:
Advantage one: vector curve is easy to make, fabrication cycle is short.The curve of arbitrary shape and angle, has perfect photoetching to show;
Advantage two: the vector curve produced, smooth without sawtooth owing to being the photoetching curve plotting that vector graphics carries out, vector curve does not have dot matrix to make during when advancing produce step shape;
Advantage three: the vector curve produced, exposure station density is even, and controllability is high.According to curve requirement, density control can be carried out to exposure station;
Advantage four: utilize spatial light picture dot modulator to show different picture dots, same vector curve path obtains different picture dot combinations, and each exposure station can form regular word, pattern.
[accompanying drawing explanation]
Accompanying drawing 1 is lithography process system architecture schematic diagram of the present invention
1 light source 2 first optical frames head group 3 variable picture dot 4 spatial modulator 5 iris 6 second optical frames head group 7 mobile platform in figure;
Accompanying drawing 2 dot matrix photoetching curve synoptic diagram;
Accompanying drawing 3 photoetching curve synoptic diagram of the present invention.
[embodiment]
Now in conjunction with the drawings and the specific embodiments technical scheme of the present invention is further elaborated, believes it is clearly for a person skilled in the art.
Lithography process system in the present embodiment, as shown in Figure 1, assembly is made up of exposure system and control system,
Control system comprise for march line analysis and coding computing machine and utilize coded data to carry out the driving governor of spectrum assignment, driving governor comprises one for controlling the drive motor of picture dot angle change, and for driving two axis drive motors of whole system movement;
Exposure system comprises light source 1; Spatial light picture dot modulator as variable picture dot 3, shape is not limit, but is square or circular or other any shapes, also can comprise various font and figure, digital micro-mirror; Spatial light modulator 4 as light-splitting device, can adopt special grating or Digital Micromirror Device, iris shutter is by manual change different space frequency; Iris 5, have the through hole device that one group of aperture is adjustable, can stop 0 aurora, ± 1 aurora, the various combinations such as ± 2 aurora, form the through hole by each aurora, manually regulate the aperture of diaphragm; What the first optical frames head group 2 and the second optical frames head group 6 formed convergent-divergent can only the projection optics lens group of UV light permeability, and convergent-divergent multiple is 10 times-20 times.。
By the first optical frames head group 2, variable picture dot 3, light-splitting device, the equidistant composition exposure system of iris 5, second optical frames head group about 6 order, and variable picture dot 3 is connected on single shaft motor, by the driving of single shaft motor, variable picture dot 3 rotates, and makes variable picture dot angle meet designing requirement.
Tracing analysis and coding module is provided with in computing machine, described tracing analysis and coding module principle of work as follows: any curve has been regarded countless sections little straight-line segments as and has been formed, each little line segment all has start position and end point location information, according to slope and the normal of information determination line segment, suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1); (x2, y2), the slope of line segment is K1=(y2-y1)/(x2-x1), cross p2 point perpendicular to crossing p1, p2 point connect straight line slope k 2 be-1 by two straight slope products that intersect vertically, k1*k2=-1 can be obtained and obtain k2=-1/k1 and determine the normal of any point on curve; Direction vector according to normal can determine the angle direction of unthreaded hole; Rotated according to the direction vector of exposure station normal by a single shaft motor, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained;
Said system is utilized to carry out the photoetching method step of photoetching as follows:
A) photoetching vector curve figure is designed;
B) utilize in computing machine and be provided with tracing analysis and coding module, by vector curve graphics decomposition to be etched and be encoded into the photoetching file that can carry out spectrum assignment: any curve has been regarded countless sections little straight-line segments as and formed, each little line segment all has start position and end point location information, according to slope and the normal of information determination line segment, direction vector according to normal can determine the angle direction of unthreaded hole, suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1); (x2, y2), the slope of line segment is K1=(y2-y1)/(x2-x1), cross p2 point perpendicular to mistake p1, p2 point connect straight line slope k 2 be-1 by two straight slope products that intersect vertically, k1*k2=-1 can be obtained and obtain k2=-1/k1;
C) then determine the normal of any point on curve according to step b, rotated according to the direction vector of exposure station normal by a single shaft motor, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained.
D) Curve transform based on the picture dot variable-angle in vector curve path becomes can carry out the photoetching file of spectrum assignment;
E) obtain controlling exposure position parameter according to the photoetching file of steps d, picture dot angle parameter, completes the exposure in whole vector curve path successively.The dot matrix photoetching curve obtained and photoetching curve are respectively as shown in Figures 2 and 3.
Described exposure position parameter refers to eachly need exposure station location parameter, and this parameter is obtained by decoding photoetching file; Picture dot angle parameter, refers to each picture dot angle needing exposure station, is obtained by decoding photoetching file.
Claims (9)
1. the curve lithography process system based on the picture dot variable-angle in vector curve path, it is characterized in that described system of processing is made up of exposure system and control system, described exposure system comprises light source, first optical frames head group, variable picture dot, light-splitting device, iris, second optical frames head group, described variable picture dot is a spatial light picture dot modulator, described light-splitting device is a spatial light modulator, what described first optical frames head group and the second optical frames head group formed a convergent-divergent can only the projection optics lens group of UV light permeability, described iris is made up of the through hole device that one group of aperture is adjustable, iris can stop 0 aurora, the various combination of ± 1 aurora or ± 2 aurora, form the through hole by each aurora, this exposure system is by light source, first optical frames head group, variable picture dot, light-splitting device, iris, second optical frames head group rearranges from top to bottom, described control system comprise for march line analysis and coding computing machine and utilize coded data to carry out the driving governor of spectrum assignment, driving governor comprises one for controlling the drive motor of picture dot angle change, and for driving two axis drive motors of whole system movement.
2. the curve lithography process system of a kind of picture dot variable-angle based on vector curve path as claimed in claim 1, it is characterized in that: described variable picture dot is a spatial light picture dot modulator, shape is square or circular, comprises various font and figure, digital micro-mirror.
3. the curve lithography process system of a kind of picture dot variable-angle based on vector curve path as claimed in claim 2, it is characterized in that: described variable picture dot is connected on single shaft motor, by the driving of single shaft motor, variable picture dot rotates.
4. the curve lithography process system of a kind of picture dot variable-angle based on vector curve path as claimed in claim 1, it is characterized in that: what described first optical frames head group and the second optical frames head group formed a convergent-divergent can only the projection optics lens group of UV light permeability, and the convergent-divergent multiple of optical frames head group is 10 times-20 times.
5. a kind of curve lithography process system of the picture dot variable-angle based on vector curve path carries out the photoetching method processed as claimed in claim 1, it is characterized in that: iris shutter manually converts the grating device of different space frequency; Iris manually regulates the aperture of diaphragm.
6. the curve lithography process system of a kind of picture dot variable-angle based on vector curve path as claimed in claim 1, it is characterized in that: in described computing machine, be provided with tracing analysis and coding module, described tracing analysis and coding module principle of work as follows: any curve has been regarded countless sections little straight-line segments as and has been formed, each little line segment all has start position and end point location information, according to slope and the normal of information determination line segment, suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1); (x2, y2), the slope of line segment is K1=(y2-y1)/(x2-x1), cross p2 point perpendicular to crossing p1, p2 point connect straight line slope k 2 be-1 by two straight slope products that intersect vertically, k1*k2=-1 can be obtained and obtain k2=-1/k1 and determine the normal of any point on curve; Direction vector according to normal can determine the angle direction of unthreaded hole; Rotated according to the direction vector of exposure station normal by a single shaft motor, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained.
7. a kind of curve lithography process system of the picture dot variable-angle based on vector curve path carries out the photoetching method processed as claimed in claim 1, it is characterized in that: comprise the following steps:
A) photoetching vector curve figure is designed;
B) utilize in computing machine and be provided with tracing analysis and coding module, by vector curve graphics decomposition to be etched and be encoded into the photoetching file that can carry out spectrum assignment: any curve has been regarded countless sections little straight-line segments as and formed, each little line segment all has start position and end point location information, according to slope and the normal of information determination line segment, direction vector according to normal can determine the angle direction of unthreaded hole, suppose that starting point p1 and the terminal p2 coordinate of a line segment are respectively (x1, y1);
(x2, y2), the slope of line segment is K1=(y2-y1)/(x2-x1), crosses p2 point perpendicular to crossing p1, p2 point connect straight line slope k 2 be-1 by two straight slope products that intersect vertically, k1*k2=-1 can be obtained and obtain k2=-1/k1;
C) then determine the normal of any point on curve according to step b, rotated according to the direction vector of exposure station normal by a single shaft motor, coordinate exposure system and positioning system, the curve of the picture dot variable-angle based on vector curve path can be obtained.
8. a kind of curve lithography process system of the picture dot variable-angle based on vector curve path carries out the photoetching method processed as claimed in claim 7, it is characterized in that: also comprise
Steps d) become can carry out the photoetching file of spectrum assignment based on the Curve transform of the picture dot variable-angle in vector curve path;
Step e) obtain controlling exposure position parameter according to the photoetching file of steps d, picture dot angle parameter, completes the exposure in whole vector curve path successively.
9. a kind of curve lithography process system of the picture dot variable-angle based on vector curve path carries out the photoetching method processed as claimed in claim 8, it is characterized in that: described exposure position parameter refers to eachly need exposure station location parameter, this parameter is obtained by decoding photoetching file; Picture dot angle parameter, refers to each picture dot angle needing exposure station, is obtained by decoding photoetching file.
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| DE10258248A1 (en) * | 2002-12-13 | 2004-07-15 | Carl Zeiss Smt Ag | Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located |
| CN101185032A (en) * | 2005-05-24 | 2008-05-21 | 富士胶片株式会社 | Image processor |
| EP2267534A1 (en) * | 2009-06-22 | 2010-12-29 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Illumination system |
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| US6768125B2 (en) * | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
| US7434199B2 (en) * | 2005-09-27 | 2008-10-07 | Nicolas Bailey Cobb | Dense OPC |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10258248A1 (en) * | 2002-12-13 | 2004-07-15 | Carl Zeiss Smt Ag | Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located |
| CN101185032A (en) * | 2005-05-24 | 2008-05-21 | 富士胶片株式会社 | Image processor |
| EP2267534A1 (en) * | 2009-06-22 | 2010-12-29 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Illumination system |
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