CN103592712A - High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof - Google Patents
High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof Download PDFInfo
- Publication number
- CN103592712A CN103592712A CN201310614521.1A CN201310614521A CN103592712A CN 103592712 A CN103592712 A CN 103592712A CN 201310614521 A CN201310614521 A CN 201310614521A CN 103592712 A CN103592712 A CN 103592712A
- Authority
- CN
- China
- Prior art keywords
- film
- tco
- light filter
- medium
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention discloses a high-performance all-dielectric interference multilayer film-TCO series type light filter and a manufacturing method thereof. The light filter comprises a substrate, a TCO film layer arranged on the first face of the substrate, an all-dielectric multilayer film arranged on the TCO film layer and an antireflection film layer arranged on the second face of the substrate. The all-dielectric multilayer film is composed of a plurality of high-refraction-rate dielectric film layers and low-refraction-rate dielectric film layers which are superposed alternatively. In the manufacturing method of the light filter, the all-dielectric multilayer film is manufactured through a thin film deposition system, a TCO light filter is manufactured through the thin film deposition system and then is subjected to annealing treatment, then the all-dielectric multilayer film and the TCO light filter are combined organically, and finally the series type light filter is obtained. The all-dielectric multilayer film and the TCO light filter are combined organically, and the advantages of the all-dielectric multilayer film and the TCO light filter are integrated, so that the light filter can modulate full-spectrum energy, enable available wave band energy to be transmitted and enable unavailable wave band energy to be reflected and can be combined with a thermo-photovoltaic system in use, the spectrum efficiency of the light filter can be improved, and the system efficiency can be improved.
Description
Technical field
The present invention relates to a kind of tandem type light filter, particularly, relate to a kind of all-dielectric multilayer-film light filter and transparent conductive oxide film (being called for short TCO) light filter and combine, overcome shortcoming each other, the two advantage is rolled into one, and is a kind of light filter of high spectrum efficiency.
Background technology
Technology of the present invention is mainly for thermo-optical photovoltaic generating system, hot photovoltaic system will have huge application potential aspect dual-use power supply in future, because it has many merits: thermal source is extensive, output power density is high, system is at work without moving-member, and reliability is high.Wave filter is critical component in hot photovoltaic system, the energy of thermal source radiation can be carried out optionally by with reflection, alleviate the hot burden of battery, improve the utilization factor of heat energy, Hoisting System whole efficiency, so the performance of wave filter directly affects the whole efficiency of system.
Summary of the invention
The object of the present invention is to provide a kind of light filter, it can carry out organic assembling by all-dielectric multilayer-film light filter and TCO light filter, integrate the two advantage, full spectral energy is modulated, make available wave band energy transmission, not available wave band energy reflection, to improve the spectrum efficiency of light filter, can use in conjunction with hot photovoltaic system, improve system effectiveness.
For achieving the above object, the invention provides the full medium of a kind of high-performance and interfere multilayer film-TCO tandem type light filter, this light filter comprises:
Substrate,
Be arranged on the TCO rete on substrate first surface;
Be arranged on the all-dielectric multilayer-film on TCO rete; And
Be arranged on second upper antireflection film layer of substrate;
Described all-dielectric multilayer-film is alternately to be superposeed and form by some floor height index medium films and low refractive index dielectric film.
The full medium of above-mentioned high-performance is interfered multilayer film-TCO tandem type light filter, wherein, described all-dielectric multilayer-film is formed by 8-50 floor height index medium film, low refractive index dielectric film, and wherein, the thickness of every floor height index medium film, low refractive index dielectric film is 10-400nm.
The full medium of above-mentioned high-performance is interfered multilayer film-TCO tandem type light filter, and wherein, described high refractive index medium film is Si film; Described low refractive index dielectric film is SiO
2film.
The full medium of above-mentioned high-performance is interfered multilayer film-TCO tandem type light filter, and wherein, described antireflection film layer is alternately superposeed and forms by some floor height index medium films and low refractive index dielectric film.
The full medium of above-mentioned high-performance is interfered multilayer film-TCO tandem type light filter, wherein, described antireflection film layer is formed by 4-20 floor height index medium film and low refractive index dielectric film, wherein, the thickness of every floor height index medium film, low refractive index dielectric film is 10-400nm, and described high refractive index medium film is selected TiO
2film, described low refractive index dielectric film is SiO
2film.
The present invention also provides the full medium of a kind of above-mentioned high-performance to interfere the preparation method of multilayer film-TCO tandem type light filter, and the method comprises following concrete steps:
Step 1, under the vacuum tightness of 10-3Pa, is coated on TCO film in substrate with evaporation method;
Step 2, carries out annealing in process to the substrate of coated TCO rete and obtains TCO light filter, and annealing temperature is 550 ℃, and annealing time is 20 minutes;
Step 3, is positioned over high-index material, low-index material respectively in coating machine and carries out fritting, and substrate is heated 200 ℃, and vacuum tightness is 10-3Pa, and high-index material and low-index material are evaporated, and is alternately coated on TCO filter surface;
Step 4, is coated with antireflection film layer at the backside of substrate of the ready-made light filter of step 3, to strengthen the transmissivity that can transform wave band, obtains full medium and interferes deielectric-coating-TCO serial filter.Antireflecting film of the present invention is, by the different multilayer film of refractive index, incident light is carried out to comprehensive interference modulations, thereby plays antireflective effect, and wherein the main anti-reflection transmissivity of utilizing wave band, reflects and can not utilize wave band mainly to carry out height by TCO rete.
The full medium of above-mentioned high-performance is interfered the preparation method of multilayer film-TCO tandem type light filter, wherein, in described step 1, during being coated with thickness and reaching 300nm of TCO film, has been coated with.
The full medium of above-mentioned high-performance is interfered the preparation method of multilayer film-TCO tandem type light filter, and wherein, described high refractive index medium material is Si material; Described low refractive index dielectric material is SiO
2material.
The full medium of above-mentioned high-performance is interfered the preparation method of multilayer film-TCO tandem type light filter, and wherein, in step 3, the every floor height refraction materials layer being alternately coated with, the thickness of low refractive index material layer are 10 ~ 400nm, and the number of plies is 8-50 layer.
The full medium of above-mentioned high-performance is interfered the preparation method of multilayer film-TCO tandem type light filter, wherein, in step 4, described antireflection film layer is alternately coated with and forms by 4 ~ 20 floor height index medium layers and low refractive index dielectric layer, wherein, described high refractive index medium film is selected TiO
2film, described low refractive index dielectric film is SiO
2film.
It is shortwave part (as being less than 4 μ m) that full dielectric film wave filter of the present invention can design spectral range, by thin film deposition system, prepares; It is long wave part (being greater than 4 μ m) that TCO light filter can design spectral range, after preparing, carries out annealing in process by thin film deposition system; Again the two is organically combined, and suitably adjust, just can carry out large-scale spectrum control.
First the present invention prepares TCO filtering rete on substrate, its can right >=4 μ m long wave partly carry out height reflection, and in the high transmission of shortwave part, then on coated TCO rete, prepare multilayer dielectric film, the film alternately superposeing for high and low refractive index rete is, it can carry out height reflection to 1.8 ~ 4 mu m wavebands, the high transmission of shortwave part, the high transmission of final formation shortwave, the high reflection of long wave, and there is the very wide zone of reflections, improved wave filter spectrum efficiency, and promoted overall thermal photovoltaic system efficiency.
The present invention is directed to the specific demand of hot photovoltaic system to optical filter, wave filter (TCO filter membranous layer, multilayered medium film optical filter) in conjunction with two kinds of different spectral characteristics, provide the full medium of a kind of high-performance to interfere multilayer film-TCO tandem type light filter, the combination of the two can make advantage separately organically combine, improve the spectrum efficiency of wave filter, also improved the transformation efficiency of hot photovoltaic system simultaneously.
The major defect of full deielectric-coating is low at long wave band reflectivity; The shortcoming of TCO is that rejection zone is wider; The two is in conjunction with there is no precedent both at home and abroad.
Advantage of the present invention is: multilayer dielectric film filter coating system is organically combined with TCO filter membranous layer and antireflection film layer, multilayer dielectric film is tied up to the high reflection characteristic of 2 ~ 4 mu m waveband and TCO filtering rete is combined in the high reflection characteristic of >=4 mu m wavebands, and can strengthen transmissivity, integrate three's advantage, overcome shortcoming and defect separately, improve the spectrum efficiency of light filter, thereby improved the efficiency of thermo-optical volt total system.
Accompanying drawing explanation
Fig. 1 is the structural representation that the full medium of high-performance of the present invention is interfered multilayer film-TCO tandem type light filter.
Fig. 2 is TCO filter membranous layer spectral curve.
Fig. 3 is multilayer dielectric film filter spectra curve map.
Fig. 4 is the spectral curve that the full medium of high-performance of the present invention is interfered multilayer film-TCO tandem type light filter.
Embodiment
Below in conjunction with embodiment and accompanying drawing, technical scheme of the present invention is further described.
Be illustrated in figure 1 full medium of the present invention and interfere the structure of multilayer film-TCO tandem type light filter, this light filter comprises:
Be arranged on the TCO rete 20 on substrate 10 first surfaces, its right >=4 μ m can not utilize the high reflection of wave band, the high transmission of utilized wave band of right≤4 μ m;
Be arranged on the all-dielectric multilayer-film 30 on TCO rete 20, it can not utilize the high reflection of wave band, the high transmission of utilized wave band of right≤1.8 μ m to 1.8-4 μ m's;
And
Be arranged on 10 second upper antireflection film layers 40 of substrate, this antireflecting film is mainly to utilizing wave band (≤1.8 μ m) to carry out anti-reflection;
Described all-dielectric multilayer-film 30 is alternately to be superposeed and form by some floor height index medium films and low refractive index dielectric film.
Incident light is interfered the assembly of thin films one side incident of multilayer film-TCO tandem type light filter from the full medium of high-performance of the present invention, the reflectance spectrum curve that it obtains as shown in Figure 4, in≤1.8 μ m part (can utilize wave band) high transmissions, the high reflection of >=1.8 μ m part (can not utilize wave band), make like this radiation spectrum part (≤1.8 μ m) that can carry out high-level efficiency utilization arrive photoelectric cell by light filter, carry out efficient photoelectricity treater conversion, the part that can not be utilized (>=1.8 μ m) is reflected back and reuses, can put forward high-octane utilization factor like this, but also reduced long-wave radiation to photronic heat burden, improve cell conversion efficiency, improve on the whole the transformation efficiency of system.
Full medium of the present invention interferes the production method of multilayer film-TCO tandem type light filter as follows:
1) membraneous material needs being coated with is positioned in coating machine in crucible, clean substrate is fixed on fixture, then close coating machine hatch door, it is vacuumized, when vacuum tightness reaches 10-3Pa, fixture is opened revolution, open electron gun power supply, select suitable electron gun parameter (as line 50mA), the TCO material that will be coated with evaporates and to be attached to the K9 at coating machine top on glass, by the real-time monitoring film thickness of crystal oscillation film thickness gauge, when being coated with thickness and reaching 300nm of TCO film, be coated with;
2) then the substrate of coated TCO rete is positioned in annealing furnace and carries out annealing in process, general annealing temperature is 550 ℃, and annealing time is 20 minutes, finally obtains TCO light filter;
3) the high low-index material of having of needs is positioned in coating machine in crucible, high-index material is Si material, and low-index material is SiO
2material, then TCO light filter previous step being prepared is fixed on the fixture at coating machine top, be coated with pellicular front down, then close coating machine hatch door, it is vacuumized, and substrate is heated to 200 ℃, fixture is opened revolution, when vacuum tightness reaches 10-3Pa, open electron gun, by Si material and SiO in crucible
2material carries out fritting, then by Si and SiO
2evaporation is got up, and is alternately coated on TCO filter surface and (is coated with one deck Si, then is coated with one deck SiO
2, then be coated with one deck Si, then be coated with one deck SiO
2so bi-material is alternately coated on to TCO filter surface), by the real-time monitoring film thickness of film thickness gauge, every layer film THICKNESS CONTROL is 10-400nm, and the number of plies is 8-50 layer, after being coated with, waits for ten minutes, and vacuum breaker takes out light filter;
4) finally at the ready-made light filter back side, be coated with antireflection film layer, antireflecting film is 4 ~ 20 layers, and thickness range is alternately coated with combination at the multilayer film of the high and low refractive index of 10 ~ 400nm, and described high refractive index medium film is selected TiO
2film, described low refractive index dielectric film is SiO
2film; Such antireflection film layer structure can strengthen the transmissivity that can transform wave band, finally obtains full medium and interferes deielectric-coating-TCO serial filter.
The full medium of high-performance provided by the invention is interfered multilayer film-TCO tandem type light filter, first on substrate, prepare TCO filtering rete, its can right >=4 μ m long wave partly carry out height reflection, and in the high transmission of shortwave part, as shown in Figure 2, then on coated TCO rete, prepare multilayer dielectric film, for Si and the high low-index film of the SiO2 film system of stack alternately, it can carry out height reflection to 1.8 ~ 4 mu m wavebands, shortwave (≤1.8 μ m) the high transmission of part, as shown in Figure 3, the high transmission of final formation shortwave, the high reflection of long wave, as shown in Figure 4, and there is the very wide zone of reflections, improved wave filter spectrum efficiency, and promoted overall thermal photovoltaic system efficiency.
Although content of the present invention has been done detailed introduction by above preferred embodiment, will be appreciated that above-mentioned description should not be considered to limitation of the present invention.Those skilled in the art, read after foregoing, for multiple modification of the present invention with to substitute will be all apparent.Therefore, protection scope of the present invention should be limited to the appended claims.
Claims (10)
1. the full medium of high-performance is interfered multilayer film-TCO tandem type light filter, it is characterized in that, this light filter comprises:
Substrate (10),
Be arranged on the TCO rete (20) on substrate (10) first surface;
Be arranged on the all-dielectric multilayer-film (30) on TCO rete (20); And
Be arranged on (10) second upper antireflection film layers (40) of substrate;
Described all-dielectric multilayer-film (30) is alternately to be superposeed and form by some floor height index medium films and low refractive index dielectric film.
2. the full medium of high-performance as claimed in claim 1 is interfered multilayer film-TCO tandem type light filter, it is characterized in that, described all-dielectric multilayer-film (30) is formed by 8-50 floor height index medium film, low refractive index dielectric film, wherein, the thickness of every floor height index medium film, low refractive index dielectric film is 10-400nm.
3. the full medium of high-performance as claimed in claim 1 or 2 is interfered multilayer film-TCO tandem type light filter, it is characterized in that, described high refractive index medium film is Si film; Described low refractive index dielectric film is SiO
2film.
4. the full medium of high-performance as claimed in claim 1 is interfered multilayer film-TCO tandem type light filter, it is characterized in that, described antireflection film layer (40) is alternately superposeed and forms by some floor height index medium films and low refractive index dielectric film.
5. the full medium of high-performance as claimed in claim 4 is interfered multilayer film-TCO tandem type light filter, it is characterized in that, described antireflection film layer (40) is formed by 4-20 floor height index medium film and low refractive index dielectric film, wherein, the thickness of every floor height index medium film, low refractive index dielectric film is 10-400nm, and described high refractive index medium film is selected TiO
2film, described low refractive index dielectric film is SiO
2film.
6. the full medium of high-performance according to claim 1 is interfered a preparation method for multilayer film-TCO tandem type light filter, it is characterized in that, the method comprises following concrete steps:
Step 1, under the vacuum tightness of 10-3Pa, is coated on TCO film in substrate with evaporation method;
Step 2, carries out annealing in process to the substrate of coated TCO rete and obtains TCO light filter, and annealing temperature is 550 ℃, and annealing time is 20 minutes;
Step 3, is positioned over high-index material, low-index material respectively in coating machine and carries out fritting, and substrate is heated 200 ℃, and vacuum tightness is 10-3Pa, and high-index material and low-index material are evaporated, and is alternately coated on TCO filter surface;
Step 4, is coated with antireflection film layer at the backside of substrate of the ready-made light filter of step 3, to strengthen the transmissivity that can transform wave band, obtains full medium and interferes deielectric-coating-TCO serial filter.
7. the full medium of high-performance as claimed in claim 1 is interfered the preparation method of multilayer film-TCO tandem type light filter, it is characterized in that, in described step 1, during being coated with thickness and reaching 300nm of TCO film, has been coated with.
8. the full medium of high-performance as claimed in claim 1 is interfered the preparation method of multilayer film-TCO tandem type light filter, it is characterized in that, described high refractive index medium material is Si material; Described low refractive index dielectric material is SiO
2material.
9. the full medium of high-performance as claimed in claim 1 is interfered the preparation method of multilayer film-TCO tandem type light filter, it is characterized in that, in step 3, the thickness that is alternately coated with every floor height refraction materials layer and low refractive index material layer is 10 ~ 400nm, and the number of plies is 8-50 layer.
10. the full medium of high-performance as claimed in claim 1 is interfered the preparation method of multilayer film-TCO tandem type light filter, it is characterized in that, in step 4, described antireflection film layer is alternately coated with and forms by 4 ~ 20 floor height index medium layers and low refractive index dielectric layer, wherein, the thickness of every floor height index medium film, low refractive index dielectric film is 10-400nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310614521.1A CN103592712A (en) | 2013-11-28 | 2013-11-28 | High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310614521.1A CN103592712A (en) | 2013-11-28 | 2013-11-28 | High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103592712A true CN103592712A (en) | 2014-02-19 |
Family
ID=50082921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310614521.1A Pending CN103592712A (en) | 2013-11-28 | 2013-11-28 | High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103592712A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107356559A (en) * | 2017-06-01 | 2017-11-17 | 宁波大学 | The acquisition methods of refractive index at a kind of any wavelength of single layer optical film |
| CN110212404A (en) * | 2019-04-17 | 2019-09-06 | 深港产学研基地（北京大学香港科技大学深圳研修院） | The automobile-used mixing Fresnel Lenses interferometric filter semiconductor laser of intelligence |
| CN111856639A (en) * | 2020-07-15 | 2020-10-30 | 晋中学院 | All-dielectric ultraviolet filter film |
| CN112305655A (en) * | 2020-10-29 | 2021-02-02 | 沈阳仪表科学研究院有限公司 | B-level solar simulation optical filter for photovoltaic and plating method thereof |
| CN114919250A (en) * | 2022-05-13 | 2022-08-19 | 温州大学 | Dark field imaging glass slide based on multi-angle tunable filter film |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04122909A (en) * | 1990-09-14 | 1992-04-23 | Fuji Elelctrochem Co Ltd | Antireflection film for adhesive of faraday rotor |
| CN201173977Y (en) * | 2008-04-02 | 2008-12-31 | 甘国工 | Optical filter of plasma display device |
| CN102759768A (en) * | 2012-07-31 | 2012-10-31 | 杭州科汀光学技术有限公司 | Optical filter |
| CN102826763A (en) * | 2012-09-25 | 2012-12-19 | 上海北玻玻璃技术工业有限公司 | Method for producing transparent conducting oxide (TCO) coated glass |
| CN103151963A (en) * | 2013-03-27 | 2013-06-12 | 上海空间电源研究所 | Electric heating type universal thermophotovoltaic system |
| CN203164459U (en) * | 2013-02-19 | 2013-08-28 | 东莞五方光电科技有限公司 | An-reflection optical filter |
-
2013
- 2013-11-28 CN CN201310614521.1A patent/CN103592712A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04122909A (en) * | 1990-09-14 | 1992-04-23 | Fuji Elelctrochem Co Ltd | Antireflection film for adhesive of faraday rotor |
| CN201173977Y (en) * | 2008-04-02 | 2008-12-31 | 甘国工 | Optical filter of plasma display device |
| CN102759768A (en) * | 2012-07-31 | 2012-10-31 | 杭州科汀光学技术有限公司 | Optical filter |
| CN102826763A (en) * | 2012-09-25 | 2012-12-19 | 上海北玻玻璃技术工业有限公司 | Method for producing transparent conducting oxide (TCO) coated glass |
| CN203164459U (en) * | 2013-02-19 | 2013-08-28 | 东莞五方光电科技有限公司 | An-reflection optical filter |
| CN103151963A (en) * | 2013-03-27 | 2013-06-12 | 上海空间电源研究所 | Electric heating type universal thermophotovoltaic system |
Non-Patent Citations (1)
| Title |
|---|
| 茆磊: "热光伏系统数值模拟及其光谱控制方法研究", 《中国博士学位论文全文数据库工程科技Ⅱ辑》, no. 9, 30 September 2010 (2010-09-30), pages 43 - 68 * |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107356559A (en) * | 2017-06-01 | 2017-11-17 | 宁波大学 | The acquisition methods of refractive index at a kind of any wavelength of single layer optical film |
| CN107356559B (en) * | 2017-06-01 | 2020-05-08 | 宁波大学 | Method for obtaining refractive index of single-layer optical film at any wavelength |
| CN110212404A (en) * | 2019-04-17 | 2019-09-06 | 深港产学研基地（北京大学香港科技大学深圳研修院） | The automobile-used mixing Fresnel Lenses interferometric filter semiconductor laser of intelligence |
| CN111856639A (en) * | 2020-07-15 | 2020-10-30 | 晋中学院 | All-dielectric ultraviolet filter film |
| CN111856639B (en) * | 2020-07-15 | 2022-06-14 | 晋中学院 | All-dielectric ultraviolet filter film |
| CN112305655A (en) * | 2020-10-29 | 2021-02-02 | 沈阳仪表科学研究院有限公司 | B-level solar simulation optical filter for photovoltaic and plating method thereof |
| CN112305655B (en) * | 2020-10-29 | 2023-02-17 | 沈阳仪表科学研究院有限公司 | B-level solar simulation optical filter for photovoltaic and plating method thereof |
| CN114919250A (en) * | 2022-05-13 | 2022-08-19 | 温州大学 | Dark field imaging glass slide based on multi-angle tunable filter film |
| CN114919250B (en) * | 2022-05-13 | 2023-07-25 | 温州大学 | Dark field imaging glass slide based on multi-angle tunable filter film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105144397B (en) | Photovoltaic module | |
| KR101194257B1 (en) | Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same | |
| US20110096391A1 (en) | Broadband reflecting mirror | |
| CN103592712A (en) | High-performance all-dielectric interference multilayer film-TCO series type light filter and manufacturing method thereof | |
| CN103094390B (en) | Carbon-base photonic crystal back reflection device for film solar cell and manufacture method of carbon-base photonic crystal back reflection device | |
| CN102732830B (en) | Plating method for anti-reflection film with high transmittance and low reflectivity | |
| CN102650709A (en) | Band-pass filter of spatial silicon solar cell | |
| CN104035147B (en) | Take germanium as the LONG WAVE INFRARED anti-reflection film with sunshine reflection function of substrate | |
| JP7345793B2 (en) | High efficiency and angle resistant colored filter assembly for photovoltaic devices | |
| CN101913780A (en) | Solar cell component packaging glass with double dereflection coatings | |
| CN103884122B (en) | A kind of solar energy optical-thermal conversion transparent heat mirror of heat collector and preparation method thereof | |
| CN109994564A (en) | Photovoltaic cell component | |
| CN103066161B (en) | Preparation method for solar cell composite antireflection coating | |
| KR101194258B1 (en) | Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same | |
| EP3736859B1 (en) | Method for configuring a multilayer spectral-separation filter for photovoltaic and thermal uses, and filter and generation plant associated with said method | |
| KR101456220B1 (en) | Transparent substrate having an anti-reflective multilayered coating thereon and method for preparing the same | |
| CN203965649U (en) | A kind ofly take the LONG WAVE INFRARED anti-reflection film with sunshine reflection function that germanium is substrate | |
| CN103325884B (en) | The method that anti-reflection plural layers improve conversion efficiency of solar cell is changed under a kind of wide spectral | |
| CN103426939A (en) | Composite antireflective film for solar cells and preparation method thereof | |
| CN115451594A (en) | Wide-spectrum solar absorption enhancement device and preparation method thereof | |
| CN102790125A (en) | Method for improving efficiency of solar cell | |
| CN114447229A (en) | Wide-angle incident color-invariant solar cell | |
| CN102496633A (en) | Multi-layer antireflection film for GaAs solar cell | |
| TW201445748A (en) | Colored solar cells and panels containing the same | |
| CN203116350U (en) | Solar photothermal conversion heat collector transparent thermal lens with anti-reflection coating system structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140219 |