CN103588250A - Method for preparing oriented La0.5Ba0.5MnO3 nanorod or nanobar growing on SrTiO3 substrate - Google Patents
Method for preparing oriented La0.5Ba0.5MnO3 nanorod or nanobar growing on SrTiO3 substrate Download PDFInfo
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- CN103588250A CN103588250A CN201310485753.1A CN201310485753A CN103588250A CN 103588250 A CN103588250 A CN 103588250A CN 201310485753 A CN201310485753 A CN 201310485753A CN 103588250 A CN103588250 A CN 103588250A
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Abstract
The invention discloses a method for preparing an oriented La0.5Ba0.5MnO3 nanorod or nanobar growing on a SrTiO3 substrate. The method comprises the following steps of firstly corroding the selected SrTiO3 substrate in a hydrogen fluoride buffer solution for 15-20 seconds, then annealing for 30 minutes in 900 DEG C-950 DEG C oxygen, wherein the distance between gills on the surface of the corroded SrTiO3 substrate is averaged at 0.14-0.26mu m; finally, putting the SrTiO3 substrate into a La0.5Ba0.5MnO3 solution prepared by a hydrothermal method, thereby obtaining La0.5Ba0.5MnO3 nanorods or nanobars of different shapes due to different placing positions, wherein the average height of the nanorods or nanobars is 0.14-4.22mu m, and the average width of the nanorods or nanobars is 0.14-1.79mu m. The method is simple in processes, low in cost, and little in environment pollution; the orientation of the prepared nanorods or nanobars is consistent, and the nanorods or nanobars are distributed uniformly.
Description
Technical field
The present invention relates to a kind of La
0.5ba
0.5mnO
3the preparation method of nano-pillar or rod, particularly a kind of at SrTiO
3on substrate, growth has the La of orientation
0.5ba
0.5mnO
3the preparation method of nano-pillar or rod, belongs to ceramic synthesis technical field.
Background technology
La
0.5ba
0.5mnO
3a kind of typical calcium titanium ore manganose oxide, in this material, produced huge magneto-resistor, electric charge/track in order, the physical property such as electronic phase separation, it has potential application prospect in the preparation of the microelectronic devices such as magneticstorage, a detector.Along with electronics miniaturization requires to improve constantly, on substrate, consistent nano-pillar or the nanometer rod of growth orientation causes that people more and more pay close attention to.At present, prepare this type of material nano-pillar or rod main method have the methods such as template, pulsed laser deposition.There are a lot of shortcomings in these preparation methods, as very high preparation temperature (approximately 800 ℃), complicated preparation technology, high preparation cost and large-scale plant and instrument etc., and in preparation process, very easily sneaks into impurity.As everyone knows, hydrothermal method is a kind of method of carrying out chemical reaction under the autogenous pressure of low temperature (240 ℃) aqueous solution in encloses container, this method improves the product purity obtaining greatly, can control the more regular of product crystal growth simultaneously, using under the condition of mineralizer, can also effectively control crystal morphology.And utilize sample prepared by this low-temperature synthetic method to compare with high temperature solid-state, and preparation method is simple, and product pattern rule mostly is crystal.For this reason, find a kind of combination SrTiO
3the pattern of substrate corrosion surface, position, time and temperature that while controlling reaction, substrate is placed, realize La
0.5ba
0.5mnO
3the controllable synthesis method of nano-pillar or rod, has positive effect.
Summary of the invention
It is a kind of at SrTiO that the object of the invention is to provide
3on substrate, growth has the La of orientation
0.5ba
0.5mnO
3the preparation method of nano-pillar or rod.
It is as follows that the present invention solves the technical scheme that its technical problem takes:
A kind of at SrTiO
3on substrate, growth has the La of orientation
0.5ba
0.5mnO
3the preparation method of nano-pillar or rod, comprises the following steps:
(1) Neutral ammonium fluoride that the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction are 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 to 20 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and then sintering 3 hours at 900-950 ℃, cools to room temperature with the furnace;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3make material dissolution, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate be placed into step (4) gained solution above or below, subsequently reactor is placed in loft drier, dry 48 hours at 240 ℃;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nano-pillar or rod.
Preparation method of the present invention, the etching time in step (2) is 15 seconds, the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.14um, when substrate is placed into the top of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 0.15 and 0.27 μ m.
Preparation method of the present invention, the etching time in step (2) is 15 seconds, the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.14um, when substrate is placed into the below of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 4.22 and 0.49 μ m.
Preparation method of the present invention, the etching time in step (2) is 15 seconds, the sintering temperature in step (3) is 900 ℃, the SrTiO putting in step (4)
3substrate surface gully spacing average out to 0.21um, when substrate is placed into the top of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 1.87 and 1.79 μ m.
Preparation method of the present invention, the etching time in step (2) is 15 seconds, the sintering temperature in step (3) is 900 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.21um, when substrate is placed into the below of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 1.88 and 0.14 μ m.
Preparation method of the present invention, the etching time in step (2) is 20 seconds, the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.26um, when substrate is placed into the top of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 0.14 and 0.34 μ m.
Preparation method of the present invention, the etching time in step (2) is 20 seconds, the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.26um, when substrate is placed into the below of obtain solution, can prepare along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 2.98 and 0.54 μ m.
The beneficial effect that the present invention obtains is as follows:
Preparation process of the present invention is simple, with low cost; Environmental pollution is little, and the orientation of the nano-pillar making or rod is consistent, and is evenly distributed.This preparation method's easy handling.The SrTiO of gained
3la on substrate
0.5ba
0.5mnO
3nano-pillar or rod have potential application prospect in the preparation of the microelectronic devices such as magneticstorage, a detector.
Accompanying drawing explanation
Fig. 1 is the SrTiO of gained in the embodiment of the present invention 1,2
3la on substrate
0.5ba
0.5mnO
3nano-pillar or
The X-ray diffractogram (XRD) of rod.Curve (a) is SrTiO in the embodiment of the present invention 1
3la on substrate
0.5ba
0.5mnO
3the XRD of nano-pillar, curve (b) is SrTiO in the embodiment of the present invention 2
3la on substrate
0.5ba
0.5mnO
3the XRD of nanometer rod.
Fig. 2 is used in the embodiment of the present invention 1,2, through excessive erosion gained SrTiO
3the scanning of substrate
Probe microscope photo (SPM).
Fig. 3 (a) is the SrTiO of gained in the embodiment of the present invention 1
3la on substrate
0.5ba
0.5mnO
3sweeping of nano-pillar
Retouch electromicroscopic photograph (SEM); Fig. 3 (b) is the SrTiO of gained in the embodiment of the present invention 2
3la on substrate
0.5ba
0.5mnO
3the SEM of nanometer rod.
Embodiment
Following examples are used for illustrating the present invention.
Embodiment 1
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 950 ℃, cools to room temperature with the furnace subsequently.Fig. 2 is the SPM figure of this substrate, as we can see from the figure SrTiO
3the surperficial gully average headway of substrate is 0.14 μ m;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the top of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nano-pillar.The X ray diffracting spectrum that curve in Fig. 1 (a) is this sample; Fig. 3 (a) is this Sample Scan electromicroscopic photograph, and as can be seen from the figure the center line average of this nano-pillar, width are respectively 0.15 and 0.27 μ m.
Embodiment 2
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 950 ℃, cools to room temperature with the furnace subsequently.Fig. 2 is the SPM figure of this substrate, as we can see from the figure SrTiO
3the surperficial gully average headway of substrate is 0.14 μ m;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the below of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nanometer rod.The X ray diffracting spectrum that curve in Fig. 1 (b) is this sample; Fig. 3 (b) is this Sample Scan electromicroscopic photograph, and as can be seen from the figure the mean length of this nanometer rod is 4.22 μ m, thickness average out to 0.49 μ m.
Embodiment 3
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 900 ℃, cools to room temperature with the furnace subsequently.This SrTiO
3the surperficial gully average headway of substrate is 0.21 μ m;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the top of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nano-pillar.This nano-pillar center line average is 1.87 μ m, width average out to 1.79 μ m.
Embodiment 4
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 900 ℃, cools to room temperature with the furnace subsequently.This SrTiO
3the surperficial gully spacing average out to 0.21 μ m of substrate;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the below of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nanometer rod.This nanometer rod mean length is 1.88 μ m, thickness average out to 0.14 μ m;
Embodiment 5
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 20 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 950 ℃, cools to room temperature with the furnace subsequently.This SrTiO
3the surperficial gully average headway of substrate is 0.26 μ m;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the top of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nano-pillar.This nano-pillar center line average is 0.14 μ m, width average out to 0.34 μ m.
Embodiment 6
(1) Neutral ammonium fluoride of the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 20 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and sintering 3 hours at 950 ℃, cools to room temperature with the furnace subsequently.This SrTiO
3the surperficial gully average headway of substrate is 0.26 μ m;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3it is dissolved, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate is placed into the below of step (4) gained solution, subsequently reactor is placed in loft drier, at 240 ℃, is dried 48 hours;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, can prepare La
0.5ba
0.5mnO
3nanometer rod.This nanometer rod mean length is 2.98 μ m, thickness average out to 0.54 μ m.
Claims (7)
1. one kind at SrTiO
3on substrate, growth has the La of orientation
0.5ba
0.5mnO
3the preparation method of nano-pillar or rod, is characterized in that comprising the following steps:
(1) Neutral ammonium fluoride that the hydrogen fluoride solution that is 40% by 3ml massfraction, 10.615g massfraction are 96% mixes with the deionized water of 17.330ml, fully stir, it is dissolved completely, and synthetic mass ratio is Neutral ammonium fluoride: hydrogen fluoride=7.8:1, and PH is about 6 hydrogen fluoride buffered soln;
(2) select the SrTiO of market sale
3substrate, is put into successively in acetone, dehydrated alcohol, deionized water and carries out ultrasonic cleaning, puts into subsequently the prepared hydrogen fluoride damping fluid of step (1) and corrodes 15 to 20 seconds;
(3) by the SrTiO after step (2) corrosion
3substrate is put into tube furnace, under 250 ℃ of oxygen atmospheres, keeps 30 minutes, and then sintering 3 hours at 900-950 ℃, cools to room temperature with the furnace;
(4) La that is 99.99% by massfraction
2o
3, 99.5% Ba (NO
3)
2, 99.5% KMnO
4, 99% MnCl
2.4H
2o in molar ratio 0.2:0.4:0.12:0.56 adds in deionized water after weighing, and drips HNO
3make material dissolution, add subsequently complexing agent KOH, fully stir, it is dissolved completely, with glass stick, drain in pyroreaction still;
(5) SrTiO being prepared by step (3)
3substrate be placed into step (4) gained solution above or below, subsequently reactor is placed in loft drier, dry 48 hours at 240 ℃;
(6) by SrTiO
3substrate takes out from dried reactor, with deionized water rinsing, filtration repeatedly, at 70 ℃, is dried 3 hours, prepares at SrTiO
3on substrate, growth has the La of orientation
0.5ba
0.5mnO
3nano-pillar or rod.
2. preparation method according to claim 1, is characterized in that the etching time in step (2) is 15 seconds, and the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.14um, substrate is placed into the top of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 0.15 and 0.27 μ m.
3. preparation method according to claim 1, is characterized in that the etching time in step (2) is 15 seconds, and the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.14um, substrate is placed into the below of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 4.22 and 0.49 μ m.
4. preparation method according to claim 1, is characterized in that the etching time in step (2) is 15 seconds, and the sintering temperature in step (3) is 900 ℃, the SrTiO putting in step (4)
3substrate surface gully spacing average out to 0.21um, substrate is placed into the top of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 1.87 and 1.79 μ m.
5. preparation method according to claim 1, is characterized in that the etching time in step (2) is 15 seconds, and the sintering temperature in step (3) is 900 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.21um, substrate is placed into the below of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 1.88 and 0.14 μ m.
6. preparation method according to claim 1, is characterized in that the etching time in step (2) is 20 seconds, and the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.26um, substrate is placed into the top of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nano-pillar, its center line average, width are respectively 0.14 and 0.34 μ m.
7. preparation method according to claim 1, is characterized in that the etching time in step (2) is 20 seconds, and the sintering temperature in step (3) is 950 ℃, the SrTiO putting in step (5)
3substrate surface gully spacing average out to 0.26um, substrate is placed into the below of obtain solution, prepares along the La of (100) crystal orientation growth
0.5ba
0.5mnO
3nanometer rod, its center line average, width are respectively 2.98 and 0.54 μ m.
?
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| CN111261885A (en) * | 2018-11-30 | 2020-06-09 | 中国科学院大连化学物理研究所 | Application of oxide with three-side structure in cathode of solid oxide fuel cell |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101423243A (en) * | 2008-11-25 | 2009-05-06 | 北京科技大学 | La doped SrTiO3 base oxide pyroelectric material and preparation method |
| CN102723400A (en) * | 2011-12-31 | 2012-10-10 | 中国科学院半导体研究所 | Method for regulating and controlling multiferroic BiFeO3 epitaxial film band gap on SrTiO3 substrate |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101423243A (en) * | 2008-11-25 | 2009-05-06 | 北京科技大学 | La doped SrTiO3 base oxide pyroelectric material and preparation method |
| CN102723400A (en) * | 2011-12-31 | 2012-10-10 | 中国科学院半导体研究所 | Method for regulating and controlling multiferroic BiFeO3 epitaxial film band gap on SrTiO3 substrate |
Non-Patent Citations (2)
| Title |
|---|
| TIFFANY S. SANTOS ET AL.: ""Tuning between the metallic antiferromagnetic and ferromagnetic phases of La1−xSrxMnO3 near x=0.5 by digital synthesis"", 《PHYSICAL REVIEW B》 * |
| TIFFANY S. SANTOS ET AL.: ""Tuning between the metallic antiferromagnetic and ferromagnetic phases of La1−xSrxMnO3 near x=0.5 by digital synthesis"", 《PHYSICAL REVIEW B》, 8 October 2009 (2009-10-08), pages 1 - 7 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111261885A (en) * | 2018-11-30 | 2020-06-09 | 中国科学院大连化学物理研究所 | Application of oxide with three-side structure in cathode of solid oxide fuel cell |
| CN111261885B (en) * | 2018-11-30 | 2021-01-15 | 中国科学院大连化学物理研究所 | Application of oxide with three-side structure in cathode of solid oxide fuel cell |
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