CN103576446A - Preparation method of novel nickel template - Google Patents
Preparation method of novel nickel template Download PDFInfo
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- CN103576446A CN103576446A CN201310541745.4A CN201310541745A CN103576446A CN 103576446 A CN103576446 A CN 103576446A CN 201310541745 A CN201310541745 A CN 201310541745A CN 103576446 A CN103576446 A CN 103576446A
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Abstract
The invention belongs to the fields of nano-micro processing and application and particularly relates to a method for copying a nickel template through nano stamping, physical vapor deposition and chemical plating. The method comprises the steps: firstly, preparing a silicon template A with a required structure by using a coherent light exposure technology; then, pouring a layer of PDMS (Polydimethylsiloxane) on the surface of the silicon template with good anti-adhesion property, and placing the silicon template into a vacuum drying oven to be cured at a certain temperature; next, uncovering the template to obtain a soft PDMS template B; next, evaporating a layer of 60nm nickel on the soft PDMS template, and placing the structure into a specific electroplating solution for electroplating to obtain a plating layer with the thickness of 300-500mum; and removing a PDMS layer on the back of an electroplated sample to obtain the copied nickel template structure C. The nickel template prepared by combining a chemical electroplating method is uniform in structure, good in compactness and high in mechanical strength and can be used for a later-period hot stamping process for a long term.
Description
Technical field
The invention belongs to micro-nano processing and application, be specifically related to copy by the method for nano impression, electron beam evaporation plating, electroless plating the technology of nickel template.
Background technology
In the manufacture process of integrated circuit, optical lithography is being played the part of the key player who realizes figure transfer always.Yet along with the development of semiconductor technology, the characteristic dimension of device is more and more less, the realization of photoetching also becomes and becomes increasingly complex.Therefore, find the continuation development that a kind of new figure transfer techniques guarantees semiconductor industry and become more and more important.Wherein, nineteen ninety-five has been received the concern of increasing research institution and commercial undertaking by the nanometer embossing of scientist Stephen Y Chou proposition of Chinese origin.Than traditional photoetching technique, nano impression is directly transferred to the pattern in template on substrate, reaches the object of template massive duplication, has process principle simple, and production efficiency is high, the feature that cost is low; Owing to not relating to the impact of optical diffraction in optical exposure in the process of nano impression, its ability of preparing micro-nano graph can directly compare favourably with electron beam, has the feature of ultrahigh resolution simultaneously.
In the process of nano impression, the quality of impression block has determined the quality of coining pattern.In traditional hot padding process, the fragility due to silicon, quartz substrate self, is unfavorable for reusing of template, thereby by nickel template, replaces gradually in technique.But in traditional combination, electroplate and prepare in the process of nickel template, electroplating parameter, stripping result all can affect the quality of nickel template, therefore seeks a kind of novelly, and the reproduction process of nickel template easily becomes particularly important.
Summary of the invention
The object of the present invention is to provide a kind of preparation method of novel nickel template, can in nano impression, use widely.
The technical solution used in the present invention is as follows:
A preparation method for New Nickel template, concrete steps are as follows:
A) utilize coherent light exposure to prepare nano impression caster A;
B) by the good nano impression caster A surface casting one deck PDMS of release treatment, in the vacuum drying oven of 80 ℃, place and be cured for 4 hours;
C) break the mold, obtains the PDMS soft template B with caster A complementary structure, the metallic nickel that recycling physical gas-phase deposite method is 60nm in structure side evaporation a layer thickness of PDMS soft template B;
D) the PDMS soft template B of evaporation nickel is put into electroplate liquid and electroplate 12h, obtaining thickness is the nickel coating of 300 μ m-500 μ m;
E) break the mold is removed the PDMS supporting layer of having electroplated the sample back side, can obtain copying the nickel template C of caster A structure.
Compared to existing technology, use the inventive method to prepare nickel template and there is following beneficial effect: the nickel template that prepare in conjunction with electroless plating (1), even structure, compactness is good, and the physical strength of himself is high, in nano impression process, can be repeatedly used, life cycle is long; (2) surface of nickel template can be low, without carrying out the antiseized of template, convenient and swift in hot nano impression process; (3) use PDMS soft template as the supporting layer of nickel template, the silicon template than traditional, facilitates break the mold, can not destroy the structure of nickel template.
Accompanying drawing explanation
Fig. 1 is preparation method's process flow diagram of New Nickel template of the present invention; The silicon template A that 1-coherent light optical graving is standby; The PDMS soft template that 2-casting obtains; The 60nm nickel dam that 3-electron beam evaporation plating obtains; 4-copies the nickel template of the 300 μ m-500 μ m that obtain.
Embodiment
Below in conjunction with drawings and Examples, the present invention is further detailed explanation.
The preparation process of the present embodiment is as follows:
(1) preparation of 500nm cycle PDMS optical grating mold plate B:
A) use coherent light optical graving for 500nm cycle silicon grating template A, dutycycle is 1:1;
B) by the good silicon grating template A surface casting one deck PDMS of release treatment, approximately 1-2mm is thick, in the vacuum drying oven of 80 ℃, places and is cured for 4 hours;
C) break the mold, obtains the PDMS optical grating mold plate B with silicon grating template A complementary structure.
(2) preparation of 500nm cycle metallic nickel optical grating mold plate C:
A) on the surface of PDMS soft template B, utilize the thick metallic nickel of electron beam evaporation plating plating one deck 60nm;
B) (principal ingredient is NiSO the PDMS soft template of nickel plating to be put into electroplate liquid
46H
2o/H
3bO
3) the middle 12h that electroplates, obtain the thick nickel coating of 300 μ m-500 μ m;
C) break the mold, removes the PDMS supporting layer of having electroplated the sample back side, the nickel optical grating mold plate C that can obtain copying.
Case study on implementation 2
The preparation process of the present embodiment is as follows:
(1) preparation of 400nm cycle PDMS dot matrix template B:
A) use coherent light optical graving for 400nm cycle silicon dot matrix template A, spot diameter is 200nm;
B) by the anti-silicon dot matrix template A surface casting one deck PDMS gluing, in the vacuum drying oven of 80 ℃, place and be cured for 4 hours;
C) break the mold, obtains the PDMS hole battle array template B with silicon dot matrix template A complementary structure.
(2) preparation of 400nm cycle metallic nickel dot matrix template C:
A) on the surface of PDMS soft template B, utilize the thick metallic nickel of electron beam evaporation plating plating one deck 60nm;
B) (principal ingredient is NiSO the PDMS soft template of nickel plating to be put into electroplate liquid
46H
2o/H
3bO
3) the middle 12h that electroplates, obtain the thick nickel coating of 300 μ m-500 μ m;
C) break the mold, removes the PDMS supporting layer of having electroplated the sample back side, the nickel dot matrix template C that can obtain copying.
Claims (3)
1. a preparation method for New Nickel template, is characterized in that, concrete steps are as follows:
A) utilize coherent light exposure to prepare nano impression caster A;
B) by the good nano impression caster A surface casting one deck PDMS of release treatment, in the vacuum drying oven of 80 ℃, place and be cured for 4 hours;
C) break the mold, obtains the PDMS soft template B with caster A complementary structure, and recycling physical gas-phase deposite method is at the structure side evaporation layer of metal nickel of PDMS soft template B;
D) the PDMS soft template B of evaporation nickel is put into electroplate liquid and electroplate, obtain nickel coating;
E) break the mold is removed the PDMS supporting layer of having electroplated the sample back side, can obtain copying the nickel template C of caster A structure.
2. the preparation method of a kind of New Nickel template according to claim 1, is characterized in that, described step c) in the thickness of metallic nickel be 60nm.
3. the preparation method of a kind of New Nickel template according to claim 1 and 2, is characterized in that, described steps d) in, electroplating time is 12h, the thickness of nickel coating is 300 μ m-500 μ m.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310541745.4A CN103576446A (en) | 2013-11-05 | 2013-11-05 | Preparation method of novel nickel template |
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| CN201310541745.4A CN103576446A (en) | 2013-11-05 | 2013-11-05 | Preparation method of novel nickel template |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108563099A (en) * | 2018-01-18 | 2018-09-21 | 中国科学院上海光学精密机械研究所 | A kind of nano-imprint stamp preparation method |
| CN109634055A (en) * | 2019-01-11 | 2019-04-16 | 南京大学 | A kind of preparation method of low-surface-energy nickel nano-imprint stamp |
| CN110412684A (en) * | 2019-08-01 | 2019-11-05 | 国家纳米科学中心 | A kind of preparation method of near-eye display diffraction grating waveguide |
| CN111216288A (en) * | 2020-02-28 | 2020-06-02 | 中国科学技术大学 | Micro-channel mold surface treatment method and micro-channel chip manufacturing method |
| CN112540430A (en) * | 2020-12-25 | 2021-03-23 | 南京邮电大学 | PDMS flexible force-sensitive sensor based on waveguide grating and preparation method thereof |
| CN114660720A (en) * | 2022-03-31 | 2022-06-24 | Oppo广东移动通信有限公司 | Preparation method of optical waveguide master, optical waveguide and augmented reality equipment |
-
2013
- 2013-11-05 CN CN201310541745.4A patent/CN103576446A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108563099A (en) * | 2018-01-18 | 2018-09-21 | 中国科学院上海光学精密机械研究所 | A kind of nano-imprint stamp preparation method |
| CN109634055A (en) * | 2019-01-11 | 2019-04-16 | 南京大学 | A kind of preparation method of low-surface-energy nickel nano-imprint stamp |
| CN110412684A (en) * | 2019-08-01 | 2019-11-05 | 国家纳米科学中心 | A kind of preparation method of near-eye display diffraction grating waveguide |
| WO2021017077A1 (en) * | 2019-08-01 | 2021-02-04 | 国家纳米科学中心 | Method for preparing diffraction grating waveguide of near-eye display |
| GB2601258A (en) * | 2019-08-01 | 2022-05-25 | Nat Ct Nanoscience & Technology China | Manufacturing method for diffraction grating waveguide of near-eye display |
| GB2601258B (en) * | 2019-08-01 | 2023-07-26 | Nat Ct Nanoscience & Technology China | Manufacturing method for diffraction grating waveguide of near-eye display |
| CN111216288A (en) * | 2020-02-28 | 2020-06-02 | 中国科学技术大学 | Micro-channel mold surface treatment method and micro-channel chip manufacturing method |
| CN112540430A (en) * | 2020-12-25 | 2021-03-23 | 南京邮电大学 | PDMS flexible force-sensitive sensor based on waveguide grating and preparation method thereof |
| CN112540430B (en) * | 2020-12-25 | 2022-05-17 | 南京邮电大学 | PDMS flexible force-sensitive sensor based on waveguide grating and preparation method thereof |
| CN114660720A (en) * | 2022-03-31 | 2022-06-24 | Oppo广东移动通信有限公司 | Preparation method of optical waveguide master, optical waveguide and augmented reality equipment |
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Application publication date: 20140212 |
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