CN103572306A - Deplating solution for removing nickel on cooper surface, preparation method thereof, and method for removing nickel on cooper surface - Google Patents

Deplating solution for removing nickel on cooper surface, preparation method thereof, and method for removing nickel on cooper surface Download PDF

Info

Publication number
CN103572306A
CN103572306A CN201210264913.5A CN201210264913A CN103572306A CN 103572306 A CN103572306 A CN 103572306A CN 201210264913 A CN201210264913 A CN 201210264913A CN 103572306 A CN103572306 A CN 103572306A
Authority
CN
China
Prior art keywords
decoating liquid
nickel
sulfuric acid
copper
hydrogen peroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201210264913.5A
Other languages
Chinese (zh)
Other versions
CN103572306B (en
Inventor
韦家亮
连俊兰
林宏业
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BYD Co Ltd
Original Assignee
BYD Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BYD Co Ltd filed Critical BYD Co Ltd
Priority to CN201210264913.5A priority Critical patent/CN103572306B/en
Publication of CN103572306A publication Critical patent/CN103572306A/en
Application granted granted Critical
Publication of CN103572306B publication Critical patent/CN103572306B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The invention provides a deplating solution for removing nickel on cooper surface. The deplating solution contains water solutions of following components: 100 to 200 g/L of sulfuric acid, 50 to 200 g/L of hydrogen peroxide, 90 to 270 g/L of ethene diamine, 5 to 50 g/L of cysteine, and 1 to 10 g/L of sulfamic acid. The invention also provides a preparation method of the deplating solution, and a method for removing nickel on cooper surface by using the deplating solution. The deplating solution provided by the invention is capable of carrying out a process on a tool to be deplated at a room temperature, barely no volatile irritant gas is generated during the deplating process, so the deplating solution is very environment-friendly; and at the same time, the quality and thickness of the copper layer, and the combining force between the copper layer and subsequent coating are not affected.

Description

For moving back the decoating liquid and preparation method thereof of nickel and for the method for the copper surface nickel of decorporating in copper surface
Technical field
The invention belongs to chemical strip technical field, relate in particular to a kind of decoating liquid that moves back nickel for copper surface and preparation method thereof and a kind of method for the copper surface nickel of decorporating.
Background technology
Often need to be on metallic copper in modern electroplating technology metallizing nickel dam anticorrosion to play, antirust, or on metallic copper, plate other metal transfer coating.Because quality problems easily appear in nickel layer in copper plating nickel on surface process, therefore need to re-start again Nickel Plating Treatment after strip nickel dam.About coating withdrawal plating, generally can adopt the method for chemistry or electrochemistry stripping.Electrochemical method stripping liquid composition is simple, faint to base material corrosion, some metal recoverable is conducive to environment protection, but power supply and strip groove need to be provided, and sometimes needs special hanger, and this is disadvantageous for the workshop of not producing in enormous quantities.In addition, owing to being generally complex geometric shapes in waste material, in electrolytic removal process, be always difficult to guarantee all dissolved strippings and part is not corroded of low current density and high current density place coating, the application of electrochemistry stripping is limited greatly.
Therefore, in prior art, the general chemical dissolution method that adopts carries out strip.But common strip agent often also can be returned copper layer, causes product rejection.In current chemical strip method, conventional strip agent is the mixed system of potassium sulfocyanate and m-nitrobenzene sodium sulfonate, adopt on the one hand this strip agent to carry out can forming the film that one deck is difficult to wash off, the bonding force while affecting follow-up metal lining again between coating and copper at copper surface after strip processing; On the other hand, this strip agent temperature when strip raises, and produces volatility irritant gas larger to human injury.
Summary of the invention
The invention solves the harmful property of generation volatility irritant gas that strip agent that in prior art, chemical strip method is used exists, affect the quality of copper layer and subsequent plating layer and the technical problem of bonding force simultaneously.
The invention provides a kind of decoating liquid that moves back nickel for copper surface, in described decoating liquid, contain the aqueous solution of following component:
Sulfuric acid 100-200g/L;
Hydrogen peroxide 50-200g/L;
Quadrol 90-270g/L;
Halfcystine 5-50g/L;
Thionamic acid 1-10g/L.
The present invention also provides the preparation method of described decoating liquid, comprises sulfuric acid, hydrogen peroxide, quadrol, halfcystine, the thionamic acid formation aqueous solution soluble in water in proportion.
Finally, the invention provides a kind of method for the copper surface nickel of decorporating, comprise and will treat that strip workpiece impregnated in decoating liquid provided by the invention; Describedly treat that strip workpiece comprises metallic copper, this copper surface is laminated with metallic nickel.
Decoating liquid provided by the invention; by adopting the compound system of sulfuric acid and hydrogen peroxide as the oxygenant of metallic nickel; by quadrol and halfcystine coordinating protection metallic copper, exempt to be corroded simultaneously; and control by thionamic acid the speed that nickel is moved back in oxygenant dissolving, thereby the metallic nickel on copper surface thoroughly can be removed under the prerequisite not being corroded at protection copper.Adopting decoating liquid provided by the invention at room temperature can treat strip workpiece processes; and in strip process, produce hardly volatile irritating smell gas; very environmental protection, can not affect the quality of copper layer quality, thickness coating and the bonding force between copper layer and subsequent plating layer simultaneously.
Embodiment
The invention provides a kind of decoating liquid that moves back nickel for copper surface, in described decoating liquid, contain the aqueous solution of following component:
Sulfuric acid 100-200g/L;
Hydrogen peroxide 50-200g/L;
Quadrol 90-270g/L;
Halfcystine 5-50g/L;
Thionamic acid 1-10g/L.
Decoating liquid provided by the invention; by adopting the compound system of sulfuric acid and hydrogen peroxide as the oxygenant of metallic nickel; by quadrol and halfcystine coordinating protection metallic copper, exempt to be corroded simultaneously; and control by thionamic acid the speed that nickel is moved back in oxygenant dissolving, thereby the metallic nickel on copper surface thoroughly can be removed under the prerequisite not being corroded at protection copper.
As a kind of preferred implementation of the present invention, in described decoating liquid, each component concentration is:
Sulfuric acid 120-180g/L;
Hydrogen peroxide 80-150g/L;
Quadrol 120-240g/L;
Halfcystine 10-30g/L;
Thionamic acid 3-7g/L.
The present invention also provides the preparation method of described decoating liquid, comprises sulfuric acid, hydrogen peroxide, quadrol, halfcystine, the thionamic acid formation aqueous solution soluble in water in proportion.
Under preferable case, first prepare aqueous sulfuric acid, then in aqueous sulfuric acid, add successively hydrogen peroxide, quadrol and halfcystine, obtain mixed system; Thionamic acid is dissolved in the water and forms thionamic acid solution, then thionamic acid solution is mixed with mixed system, obtain described decoating liquid.
Finally, the invention provides a kind of method for the copper surface nickel of decorporating, comprise and will treat that strip workpiece impregnated in decoating liquid provided by the invention; Describedly treat that strip workpiece comprises metallic copper, this copper surface is laminated with metallic nickel.
For guaranteeing the homogeneity of metallic nickel strip, under preferable case, in described strip treating processes, also comprise the step that decoating liquid is stirred.
Method provided by the invention is applicable to the workpiece that various copper surface coverage have nickel, for example, in the present invention, described in treat that plastics part, surface that strip workpiece stacks gradually metallic copper and metallic nickel for surface stack gradually the ceramic workpiece of metallic copper and metallic nickel or the metallic copper workpiece that surface is laminated with metallic nickel.
Adopt decoating liquid provided by the invention at room temperature can treat strip workpiece and process, and in strip process, volatility is few, very environmental protection, can not affect the quality of copper layer quality, thickness coating and the bonding force between copper layer and subsequent plating layer simultaneously.While adopting decoating liquid provided by the invention to carry out strip processing to copper layer surface metal nickel dam, the temperature of decoating liquid and strip immersion treatment time can suitably be selected according to the concrete thickness of nickel dam.For example, when described metallic nickel is thickness while being the chemical Ni-plating layer of 1-10 micron, the temperature of described decoating liquid is 40-70 ℃, and dipping time is 5-10min.
In order to make technical problem solved by the invention, technical scheme and beneficial effect clearer, below in conjunction with embodiment, the present invention is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain the present invention, is not intended to limit the present invention.
Embodiment 1
By following formula, first sulfuric acid is mixed with to the aqueous solution, thionamic acid is mixed with to the aqueous solution; Then in aqueous sulfuric acid, add successively hydrogen peroxide, quadrol and halfcystine, obtain mixed system; Then the thionamic acid aqueous solution is mixed with mixed system, obtain decoating liquid S1, in this decoating liquid S1, each component concentration is: sulfuric acid 150g/L, hydrogen peroxide 100g/L, quadrol 180g/L, halfcystine 7g/L, thionamic acid 5g/L.
Embodiment 2
By following formula, first sulfuric acid is mixed with to the aqueous solution, thionamic acid is mixed with to the aqueous solution; Then in aqueous sulfuric acid, add successively hydrogen peroxide, quadrol and halfcystine, obtain mixed system; Then the thionamic acid aqueous solution is mixed with mixed system, obtain decoating liquid S2, in this decoating liquid S2, each component concentration is: sulfuric acid 120g/L, hydrogen peroxide 90g/L, quadrol 135g/L, halfcystine 5g/L, thionamic acid 3g/L.
Embodiment 3
By following formula, first sulfuric acid is mixed with to the aqueous solution, thionamic acid is mixed with to the aqueous solution; Then in aqueous sulfuric acid, add successively hydrogen peroxide, quadrol and halfcystine, obtain mixed system; Then the thionamic acid aqueous solution is mixed with mixed system, obtain decoating liquid S3, in this decoating liquid S3, each component concentration is: sulfuric acid 100g/L, hydrogen peroxide 50g/L, quadrol 90g/L, halfcystine 5g/L.
Embodiment 4
By following formula, first sulfuric acid is mixed with to the aqueous solution, thionamic acid is mixed with to the aqueous solution; Then in aqueous sulfuric acid, add successively hydrogen peroxide, quadrol and halfcystine, obtain mixed system; Then the thionamic acid aqueous solution is mixed with mixed system, obtain decoating liquid S4, in this decoating liquid S4, each component concentration is: sulfuric acid 200g/L, hydrogen peroxide 200g/L, quadrol 270g/L, halfcystine 50g/L, thionamic acid 10g/L.
Comparative example 1
According to the following ratio sulfuric acid, hydrogen peroxide, halfcystine, thionamic acid are dissolved in the water: sulfuric acid 150g/L, hydrogen peroxide 100g/L, halfcystine 7g/L, thionamic acid 5g/L, obtains the decoating liquid DS1 of the present embodiment.
Comparative example 2
According to the following ratio sulfuric acid, hydrogen peroxide, quadrol, thionamic acid are dissolved in the water: sulfuric acid 150g/L, hydrogen peroxide 100g/L, quadrol 180g/L, thionamic acid 5g/L, obtains the decoating liquid DS2 of the present embodiment.
Comparative example 3
According to the following ratio sulfuric acid, hydrogen peroxide are dissolved in the water: sulfuric acid 150g/L, hydrogen peroxide 100g/L obtains the decoating liquid DS3 of the present embodiment.
Comparative example 1
According to the following ratio m-nitrobenzene sodium sulfonate, potassium sulfocyanate are dissolved in the water: m-nitrobenzene sodium sulfonate 60g/L, potassium sulfocyanate 1g/L obtains the decoating liquid DS4 of the present embodiment.
Performance test
The ABS plastic workpiece (surperficial nickel dam is that thickness is the chemical Ni-plating layer of 3 microns) that surface is coated with successively to copper layer and nickel dam impregnated in respectively in decoating liquid S1-S4 and DS1-DS4, constantly stirs decoating liquid in steeping process; Estimate to nickel dam by rear the taking-up workpiece, the time of recording each workpiece surface strip nickel dam of complete strip removal.Record the smell size of the irritant gas producing in strip process simultaneously, and observe after strip the workpiece surface metallic copper phenomenon that whether is corroded.
Test result is as shown in table 1.
Table 1
Figure 2012102649135100002DEST_PATH_IMAGE001
From the test result of upper table 1, can find out, adopt the decoating liquid that the present invention passes through the metallic nickel on copper surface thoroughly can be stripped, and do not corrode copper surface, in strip process, produce hardly volatile irritating smell gas simultaneously or produce less, very environmental protection.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any modifications of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.

Claims (8)

1. for copper surface, move back a decoating liquid for nickel, it is characterized in that, in described decoating liquid, contain the aqueous solution of following component:
Sulfuric acid 100-200g/L;
Hydrogen peroxide 50-200g/L;
Quadrol 90-270g/L;
Halfcystine 5-50g/L;
Thionamic acid 1-10g/L.
2. decoating liquid according to claim 1, is characterized in that, in described decoating liquid, each component concentration is:
Sulfuric acid 120-180g/L;
Hydrogen peroxide 80-150g/L;
Quadrol 120-240g/L;
Halfcystine 10-30g/L;
Thionamic acid 3-7g/L.
3. the preparation method of the decoating liquid described in claim 1 or 2, is characterized in that, comprises sulfuric acid, hydrogen peroxide, quadrol, halfcystine, the thionamic acid formation aqueous solution soluble in water in proportion.
4. preparation method according to claim 3, is characterized in that, comprises and first prepares aqueous sulfuric acid, then in aqueous sulfuric acid, adds successively hydrogen peroxide, quadrol and halfcystine, obtains mixed system; Thionamic acid is dissolved in the water and forms thionamic acid solution, then thionamic acid solution is mixed with mixed system, obtain described decoating liquid.
5. for a method for the copper surface nickel of decorporating, it is characterized in that, comprise and will treat that strip workpiece impregnated in the decoating liquid described in claim 1 or 2; Describedly treat that strip workpiece comprises metallic copper, this copper surface is laminated with metallic nickel.
6. method according to claim 5, is characterized in that, also comprises and will after strip workpiece impregnated in decoating liquid, stir the step of decoating liquid.
7. method according to claim 5, it is characterized in that, described in treat that plastics part, surface that strip workpiece stacks gradually metallic copper and metallic nickel for surface stack gradually the ceramic workpiece of metallic copper and metallic nickel or the metallic copper workpiece that surface is laminated with metallic nickel.
8. according to the method described in claim 5 or 7, described metallic nickel is that thickness is the chemical Ni-plating layer of 1-10 micron; The temperature of described decoating liquid is 40-70 ℃, and dipping time is 5-10min.
CN201210264913.5A 2012-07-30 2012-07-30 For copper surface decoating liquid moving back nickel and preparation method thereof and the method for copper surface nickel of decorporating Active CN103572306B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201210264913.5A CN103572306B (en) 2012-07-30 2012-07-30 For copper surface decoating liquid moving back nickel and preparation method thereof and the method for copper surface nickel of decorporating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210264913.5A CN103572306B (en) 2012-07-30 2012-07-30 For copper surface decoating liquid moving back nickel and preparation method thereof and the method for copper surface nickel of decorporating

Publications (2)

Publication Number Publication Date
CN103572306A true CN103572306A (en) 2014-02-12
CN103572306B CN103572306B (en) 2016-04-13

Family

ID=50044995

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210264913.5A Active CN103572306B (en) 2012-07-30 2012-07-30 For copper surface decoating liquid moving back nickel and preparation method thereof and the method for copper surface nickel of decorporating

Country Status (1)

Country Link
CN (1) CN103572306B (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104562055A (en) * 2014-05-09 2015-04-29 扬州虹扬科技发展有限公司 Novel nickel stripping treatment method
CN105239072A (en) * 2015-11-11 2016-01-13 广州市太和电路板有限公司 Electroplating hanger deplating solution and deplating method thereof
CN106011860A (en) * 2016-07-21 2016-10-12 佛山市仁昌科技有限公司 Technology for environment-friendly chemical deplating agent
CN106435616A (en) * 2016-10-10 2017-02-22 深圳大学 Deplating liquid of TiNC film and deplating process
CN106835142A (en) * 2017-01-09 2017-06-13 苏州圣天迈电子科技有限公司 Environmental protection stripping nickel passivator and its compound method and application method
CN108754498A (en) * 2018-06-15 2018-11-06 西安微电子技术研究所 A kind of method that cryochemistry nickel groove body deposited nickel layer takes off except solution and take off nickel layer
CN109957830A (en) * 2017-12-25 2019-07-02 比亚迪股份有限公司 A kind of strip method of positive pole oxidation film on aluminum alloy surface decoating liquid and positive pole oxidation film on aluminum alloy surface
WO2021168536A1 (en) * 2020-02-28 2021-09-02 Sixring Inc. Sulfuric acid composition and uses thereof
WO2022178613A1 (en) * 2021-02-25 2022-09-01 Fluid Energy Group Ltd. Modified sulfuric acid and uses thereof
WO2022178615A1 (en) * 2021-02-25 2022-09-01 Sixring Inc. Modified sulfuric acid and uses thereof
US11760720B2 (en) 2020-02-28 2023-09-19 Sixring Inc. Modified sulfuric acid and uses thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1896314A (en) * 2005-07-11 2007-01-17 佛山市顺德区汉达精密电子科技有限公司 Stabilized decoating liquid
CN101092696A (en) * 2007-07-18 2007-12-26 天津市中环高科技有限公司 Fluid for removing vacuum metallic coated nickel layer for decorating nonmetallic surface
CN101353793A (en) * 2007-07-26 2009-01-28 江苏海迅实业集团股份有限公司 Copper alloy antirust agent
CN101358352A (en) * 2008-09-11 2009-02-04 河北理工大学 Novel aminoacid derivate restrainer and method of use thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1896314A (en) * 2005-07-11 2007-01-17 佛山市顺德区汉达精密电子科技有限公司 Stabilized decoating liquid
CN101092696A (en) * 2007-07-18 2007-12-26 天津市中环高科技有限公司 Fluid for removing vacuum metallic coated nickel layer for decorating nonmetallic surface
CN101353793A (en) * 2007-07-26 2009-01-28 江苏海迅实业集团股份有限公司 Copper alloy antirust agent
CN101358352A (en) * 2008-09-11 2009-02-04 河北理工大学 Novel aminoacid derivate restrainer and method of use thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
姜力强等: "镍与镍合金镀层的退除", 《电镀与环保》 *
杨桂林: "用双氧水-硫酸退除镍镀层", 《材料保护》 *

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104562055A (en) * 2014-05-09 2015-04-29 扬州虹扬科技发展有限公司 Novel nickel stripping treatment method
CN105239072A (en) * 2015-11-11 2016-01-13 广州市太和电路板有限公司 Electroplating hanger deplating solution and deplating method thereof
CN106011860A (en) * 2016-07-21 2016-10-12 佛山市仁昌科技有限公司 Technology for environment-friendly chemical deplating agent
CN106435616A (en) * 2016-10-10 2017-02-22 深圳大学 Deplating liquid of TiNC film and deplating process
CN106835142A (en) * 2017-01-09 2017-06-13 苏州圣天迈电子科技有限公司 Environmental protection stripping nickel passivator and its compound method and application method
CN109957830A (en) * 2017-12-25 2019-07-02 比亚迪股份有限公司 A kind of strip method of positive pole oxidation film on aluminum alloy surface decoating liquid and positive pole oxidation film on aluminum alloy surface
CN108754498A (en) * 2018-06-15 2018-11-06 西安微电子技术研究所 A kind of method that cryochemistry nickel groove body deposited nickel layer takes off except solution and take off nickel layer
US11760720B2 (en) 2020-02-28 2023-09-19 Sixring Inc. Modified sulfuric acid and uses thereof
CN115461509A (en) * 2020-02-28 2022-12-09 六环股份有限公司 Sulfuric acid composition and use thereof
GB2608074A (en) * 2020-02-28 2022-12-21 Sixring Inc Sulfuric acid compositions and uses thereof
WO2021168536A1 (en) * 2020-02-28 2021-09-02 Sixring Inc. Sulfuric acid composition and uses thereof
US11846067B2 (en) 2020-02-28 2023-12-19 Sixring Inc. Modified sulfuric acid and uses thereof
GB2608074B (en) * 2020-02-28 2024-02-21 Sixring Inc Sulfuric acid composition and uses thereof
CN115461509B (en) * 2020-02-28 2024-02-27 六环股份有限公司 Sulfuric acid composition and use thereof
WO2022178613A1 (en) * 2021-02-25 2022-09-01 Fluid Energy Group Ltd. Modified sulfuric acid and uses thereof
WO2022178615A1 (en) * 2021-02-25 2022-09-01 Sixring Inc. Modified sulfuric acid and uses thereof

Also Published As

Publication number Publication date
CN103572306B (en) 2016-04-13

Similar Documents

Publication Publication Date Title
CN103572306B (en) For copper surface decoating liquid moving back nickel and preparation method thereof and the method for copper surface nickel of decorporating
CN102787321B (en) Deplating liquid for NiCuNi plating on surface of sintered NdFeB and deplating process thereof
CN103046052B (en) The stripping liquid of environment-friendly type titanium-containing film and using method thereof
JP2571375B2 (en) Release agent for water-soluble resist film
CN103924245A (en) Chemical stripping solution and stripping method
JPH04501138A (en) Inhibitor-containing compositions and methods for stripping tin, lead or tin-lead alloys from copper surfaces
CZ302996B6 (en) Electrochemical stripping process and system for stripping metallic coatings
CN109898085A (en) It moves back tin combination liquid and moves back tin method
CN102828226B (en) Recyclable environment friendly electrolytic stripping solution, preparation method and usage method
CN102234834A (en) Electrolytic stripping liquid, and method for removing titanium-containing film by using electrolytic stripping liquid
CN102220133B (en) Stripping solution of titanium carbide and/or titanium nitride film and stripping method
CN106245030A (en) The chemical decoating liquid of a kind of palladium-nickel alloy coating strip and strip method
CN110629224A (en) Environment-friendly nickel removing agent and preparation method and use method thereof
CN103614752B (en) A kind of zirconium material copper coating method
JPS58213900A (en) Electrolytic peel-off bath and method thereof
CN103409755A (en) High-efficiency environment-friendly nickel stripper and preparation method thereof
CN108624946A (en) A kind of electrolysis stripping paint agent and stripping paint method
JP5247142B2 (en) Silver plating method
CN110714214A (en) Electroplating pretreatment process for die-casting aluminum alloy
CN105821452B (en) A kind of plating solution and electro-plating method of the Tin plating on copper wire
CN104878388A (en) Deplating solution for stripping nickel layer on copper layer, and preparation method and deplating method thereof
CN109778299A (en) A kind of release agent for electrolytic of iron-based material copper coating layer and preparation method thereof and stripping technology
Zhu et al. Electroplating of Zn coating on AZ31 magnesium alloy in ZnF2 solution
CN108425145A (en) A kind of nontoxic copper and iron base silver decoating liquid and its withdrawal plating
CN105386100A (en) Method for electroplating copper and sliver on iron-nickel alloy frame

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant