CN103560182A - 一种GaN基低色温高显色白光LED制备方法 - Google Patents
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Abstract
本发明涉及一种GaN基低色温高显色白光LED制备方法,包括如下步骤,采用金属有机物化学气相沉积方法,在图形化蓝宝石衬底上外延InGaN/GaN结构;InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发后制备成LED芯片;LED芯片再通过刺晶、引线、灌胶、烘烤,被封装成LED管座;向LED管座注入荧光粉封,装成GaN基低色温高显色白光LED。本发明制备方法,操作简单,成本低廉,所得GaN基低色温高显色白光LED可以满足对色温和演色性要求较高的领域。
Description
技术领域
本发明涉及半导体设计及制造技术领域,尤其涉及一种GaN基低色温高显色白光LED制备方法。
背景技术
发光二极管(LED)作为一种新型光源,具有体积小、效率高、寿命长、节能、抗震动能力强、响应时问快、无污染等优点,这些优点都会给人带来便利,被人们称为第四代固体照明光源,广泛应用于医疗,电子通讯,科研,显示等领域。目前,在相同的照明条件下,其能耗仅为白炽灯的20%,荧光灯的50%。到2020年,即使只将50%的白炽灯和荧光灯替换为白光LED,至少可以节约一半的照明用电,减少C02排放3亿5千万吨,节能和环保效果将十分明显。
理想的白光LED是采用红、绿、蓝三基色发光二极管来合成,三色二极管的光强度可分开控制,形成全彩的变色效果,并可通过波长和强度的选择来得到较佳的演色性,但由于使用的三个二极管都是热源,散热是其他封装形式的三倍,芯片光效更会随温度的上升而明显的下降,并造成其寿命的缩短。为了解决散热,多个小组研制出单芯片型白光LEDs,中国台湾Chen等采用有源层中不同的量子阱,用不同的In组分来控制发光波长(Chen C H,ChangS J,Su Y K,et a1.IEEE Photonics TeehnoI.Lett.,2002,14(7):908),他们在蓝宝石衬底上依次生长InGaN/GaN蓝光LEDs和InGaN/GaN绿光LEDs结构,当注入电流小于200mA时,得到了接近白光的发射光谱,但色温却高达9000K。北京工业大学Guo等则采用键合技术制作GaAs/GaN白光LEDs(Guo X,Shen G D,Guan B L,et a1.Appl.Phys.Lett,2008,92(1):013507)。然而,由于三种i卷片的量子效率各不相同,衰减也不同,最终造成出光颜色不稳定。日本日亚公司(Nichia Co.)首先提出采用460nm蓝光激发YAG黄光荧光粉来得到白光LED(Park J K,Lira M A,Kim C H,eta1.Appl.Phys.Lett;2003,82(5):683.Allen S C,Steckl Aj.Appl.Phys.Lett.,2008,92(14):143309),YAG荧光粉通过吸收一部分蓝光来激发黄光,黄光与没被吸收的蓝光混合产生白光,这种方法因其结构简单,容易制作,加上YAG荧光粉制作工艺的成熟,已经广泛应用到自光LED的生产领域,但也存在几个重要问题很长时问无法解决,首先是均匀度问题,由于参与自光配色的蓝光芯片波长的偏移、强度的变化以及荧光粉涂料厚度的改变均会影响其出光均匀度,其次由于激发的发光光谱中缺少红色波段成分,其白光色温偏高(4000~7000K)、演色性偏低等问题,限制其在医疗、显示等对色域要求高的领域中的应用。用紫外光配上三色(RGB)荧光粉提供了另一个研发方向,其方法主要是利用实际上不参与配出白光的紫外LEDs激发红、绿、蓝荧光粉,再由三色荧光粉发出的三色光配成白光。由于紫外二极管不参与白光的配色,因此其波长与强度的波动对出光稳定性而言不会影响太大,通过调整各色荧光粉的配比,虽然可得到理想的色温和演色性,但激发三色荧光粉的紫外光波长(荧光粉最佳转换效率之激发波长)很难选择,由于荧光粉在Stocks变换中存在能量损失,用高能量的UV光子激发低能量的红、绿、蓝光子造成光效比较低,且封装材料在紫外光下易老化,寿命短,还存在紫外线泄露的安全隐患。
采用440nm短波长InGaN/GaN蓝光LED芯片激发高效红、绿荧光粉制得低色温高显色性白光LED是实现白光LED的又一途径,用这种方法即可避免紫外光激发带来的一系列问题,又可得到较好的色温和演色性。
发明内容
本发明所要解决的技术问题是提供一种GaN基低色温高显色白光LED制备方法。
本发明解决上述技术问题的技术方案如下:一种GaN基低色温高显色白光LED制备方法,其特征在于,包括如下步骤:
采用金属有机物化学气相沉积方法,在图形化蓝宝石衬底上外延InGaN/GaN结构;
InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发后制备成LED芯片;
LED芯片再通过刺晶、引线、灌胶、烘烤,被封装成LED管座;
向LED管座注入荧光粉封,装成GaN基低色温高显色白光LED。
在上述技术方案的基础上,本发明还可以做如下改进。
进一步,所述GaN基低色温高显色白光LED在20mA工作电流下,工作电压为3.19V,发光波长为440nm。
所述GaN基低色温高显色白光LED在20mA工作电流下,工作电压为3.19V,发光波长为440nm时,色温变化受电流变化的影响小,并且色温与演色性最佳对人眼更有益。
进一步,所述图形化蓝宝石尺寸大小为2英寸。
进一步,所述制备的GaN基低色温高显色白光LED芯片尺寸大小为14x14mil。
进一步,选用封装材料有双酚A/B型环氧树脂、日本信越SCR1012/AB型弹性硅胶、2.5μm金丝引线、0.94±0.05mm支架银杯杯底。
进一步,烘烤温度为800~1400℃,在烘烤时气氛中含有氢气。
进一步,所述荧光粉由A胶、B胶、绿粉、红粉按照质量比为0.5:0.5:0.2:0.03混合而成,其中颗粒尺寸为7~8μm。
所述荧光粉(A胶、B胶、绿粉、红粉)按照质量比为0.5:0.5:0.2:0.03时,所述GaN基低色温高显色白光LED显色指数较高,色温最低可到3251k,比传统的蓝光激发YAG荧光粉制得的白光LED显色指数要高。
本发明的有益效果是:本发明制备方法操作简单,成本低廉,所得GaN基低色温高显色白光LED可以满足对色温和演色性要求较高的领域。
附图说明
图1为本发明一种GaN基低色温高显色白光LED制备方法流程图;
具体实施方式
以下结合附图对本发明的原理和特征进行描述,所举实例只用于解释本发明,并非用于限定本发明的范围。
如图1所示,一种GaN基低色温高显色白光LED制备方法,包括如下步骤:
采用金属有机物化学气相沉积方法,在图形化蓝宝石衬底上外延InGaN/GaN结构;
InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发后制备成LED芯片;
LED芯片再通过刺晶、引线、灌胶、烘烤,被封装成LED管座;
向LED管座注入荧光粉封,装成GaN基低色温高显色白光LED。
实施例1:
采用金属有机物化学气相沉积方法,在2英寸图形化蓝宝石衬底上外延InGaN/GaN结构;InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发工艺制备成GaN基低色温高显色白光LED芯片;LED芯片再通过双酚A/B型环氧树脂、日本信越SCR1012/AB型弹性硅胶、2.5μm金丝引线、0.94±0.05mm支架银杯杯底、在氢气气氛中800℃温度下烘烤,被封装成LED管座;注入荧光粉(A胶、B胶、绿粉、红粉质量比为0.5g:0.5g:0.2g:0.03g,颗粒大小平均为7μm)封装成GaN基低色温高显色白光LED。
实施例2:
采用金属有机物化学气相沉积方法,在2英寸图形化蓝宝石衬底上外延InGaN/GaN结构;InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发工艺制备成GaN基低色温高显色白光LED芯片;LED芯片再通过双酚A/B型环氧树脂、日本信越SCR1012/AB型弹性硅胶、2.5μm金丝引线、0.94±0.05mm支架银杯杯底、在氢气气氛中1000℃温度下烘烤,被封装成LED管座;注入荧光粉(A胶、B胶、绿粉、红粉质量比为1g:1g:0.4g:0.06g,颗粒大小平均为7.8μm)封装成GaN基低色温高显色白光LED。
实施例3:
采用金属有机物化学气相沉积方法,在2英寸图形化蓝宝石衬底上外延InGaN/GaN结构;InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发工艺制备成GaN基低色温高显色白光LED芯片;LED芯片再通过双酚A/B型环氧树脂、日本信越SCR1012/AB型弹性硅胶、2.5μm金丝引线、0.94±0.05mm支架银杯杯底、在氢气气氛中1400℃温度下烘烤,被封装成LED管座;注入荧光粉(A胶、B胶、绿粉、红粉质量比为2g:2g:0.8g:0.12g,颗粒大小平均为8μm)封装成GaN基低色温高显色白光LED。
以上所述仅为本发明的较佳实施例,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。
Claims (7)
1.一种GaN基低色温高显色白光LED制备方法,其特征在于,包括如下步骤:
采用金属有机物化学气相沉积方法,在图形化蓝宝石衬底上外延InGaN/GaN结构;
InGaN/GaN结构通过等离子体增强化学气相沉积、光刻、ICP刻蚀、电子束蒸发后制备成LED芯片;
LED芯片再通过刺晶、引线、灌胶、烘烤,被封装成LED管座;
向LED管座注入荧光粉封,装成GaN基低色温高显色白光LED。
2.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,GaN基低色温高显色白光LED在20mA工作电流下,工作电压为3.19V,发光波长为440nm。
3.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,所述图形化蓝宝石衬底尺寸为2英寸。
4.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,所述LED芯片尺寸为14x14mil。
5.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,选用封装材料有双酚A/B型环氧树脂、弹性硅胶、2.5μm金丝引线、0.94±0.05mm支架银杯杯底。
6.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,烘烤温度为800~1400℃,在烘烤时气氛中含有氢气。
7.根据权利要求1所述一种GaN基低色温高显色白光LED制备方法,其特征在于,所述荧光粉由A胶、B胶、绿粉、红粉按照质量比为0.5:0.5:0.2:0.03混合而成,其中颗粒尺寸为7~8μm。
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