CN103558939A - Transparent conducting film, manufacturing method thereof and touch device using transparent conducting film - Google Patents
Transparent conducting film, manufacturing method thereof and touch device using transparent conducting film Download PDFInfo
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- CN103558939A CN103558939A CN201310531018.XA CN201310531018A CN103558939A CN 103558939 A CN103558939 A CN 103558939A CN 201310531018 A CN201310531018 A CN 201310531018A CN 103558939 A CN103558939 A CN 103558939A
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- 238000004519 manufacturing process Methods 0.000 title abstract description 3
- 230000006698 induction Effects 0.000 claims abstract description 98
- 239000000758 substrate Substances 0.000 claims abstract description 89
- 239000004020 conductor Substances 0.000 claims description 112
- 238000000576 coating method Methods 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 36
- 229910052709 silver Inorganic materials 0.000 claims description 26
- 239000004332 silver Substances 0.000 claims description 26
- 239000010409 thin film Substances 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 20
- 238000009413 insulation Methods 0.000 claims description 7
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 6
- 238000010329 laser etching Methods 0.000 claims description 5
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 23
- 239000002002 slurry Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000013067 intermediate product Substances 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
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Abstract
The invention discloses a transparent conducting film. The transparent conducting film comprises a substrate, an induction conducting layer, electrode leads and electrode blocks, wherein the substrate comprises a visible region and a frame region; the induction conducting layer is arranged at the visible region and comprises a plurality of induction electrodes which are arranged at intervals; the electrode leads are arranged at the frame region and comprise lead parts and connection parts which are formed at one end of each of the lead parts; the electrode leads are electrically connected with the induction electrodes through the connection parts; the extension direction of the connection parts is the same as the arrangement direction of a plurality of induction electrodes; a plurality of electrode leads are arranged; the electrode leads are mutually insulated; the thickness of the parts of the electrode leads protruding out of the surface of the substrate is greater than the thickness of the induction electrodes protruding out of the surface of the substrate; the electrode blocks are positioned between adjacent connection parts and are at least insulated from one of the electrode leads; the thickness of the parts of the electrode blocks protruding out of the surface of the substrate is the same as the thickness of the parts of the electrode leads protruding out of the surface of the substrate. The ghost of a view window region can be effectively eliminated by the transparent conducting film. In addition, the invention also provides a manufacturing method of the transparent conducting film and a touch device using the transparent conducting film.
Description
Technical field
The present invention relates to contactor control device technical field, the contactor control device that particularly relates to a kind of nesa coating, its method for making and adopt this nesa coating.
Background technology
Along with consumer is more and more higher to the requirement of electronic product, in order effectively to reduce touch-control module cost, meet the lightening market demands of terminal consumption electronic product simultaneously, nearly 2 years touch-control industries are actively set about the production of G+F and G+F+F structure capacitive contactor control device.In increasing contactor control device product, product appearance becomes the viewing area part of emphasis, the especially contactor control device of more consumers' concerns.
Contactor control device generally includes transparent panel, touch induction device and display device.Wherein, touch induction device is realized touch sensible by nesa coating.Nesa coating comprises and is positioned at the induction conductive layer of viewing area and the contact conductor that is positioned at frame region.Induction conductive layer comprises the induction conductive layer of many spaced induction electrodes, and contact conductor comprises leading part and is formed at the connecting portion of leading part one end.Contact conductor is corresponding one by one with induction electrode, and the edge of contact conductor in visible area is electrically connected to induction electrode by connecting portion.And between induction conductive layer in most of nesa coatings and contact conductor, there is very large thickness drop, the gap forming between especially adjacent two connecting portions.Space between two connecting portions makes nesa coating be easy to produce folding line in the edge of visible area, at nesa coating, in laminating, forms after contactor control device, can the edge in visible area occur rough phenomenon.And because the existence in thickness difference space causes the light path of reflection ray to change, thereby cause in visible area, occurring " ghost " phenomenon, thus make the outward appearance display effect of contactor control device poor.
Summary of the invention
Based on this, be necessary the contactor control device that the good nesa coating of a kind of outward appearance display effect, its method for making is provided and adopts this nesa coating.
, comprising:
Substrate, the frame region that comprises viewing area and be positioned at described viewing area periphery;
Induction conductive layer, is located at described viewing area, comprises many spaced induction electrodes;
Contact conductor, be located at described frame region, comprise leading part and be formed at the connecting portion of described leading part one end, described contact conductor is electrically connected to described induction electrode by described connecting portion, and the bearing of trend of described connecting portion is identical with the direction that many described induction electrodes are arranged, the number of described contact conductor is many, many described contact conductor mutually insulateds, and the thickness that described contact conductor protrudes from described substrate surface is greater than the thickness that described induction electrode protrudes from described substrate surface;
Electrode block, between the connecting portion of contact conductor described in adjacent two, and at least with a wherein described contact conductor insulation, the thickness that described electrode block protrudes from described substrate surface is identical with the thickness that described contact conductor protrudes from described substrate surface.
In an embodiment, described electrode block is linearly therein, the two ends of described electrode block respectively with the described connecting portion of the both sides of described electrode block over against.
Therein in an embodiment, described electrode block comprises covering part and is convexly set in the Access Division in described covering part, described wedging position is in described in adjacent two between connecting portion, and the two ends of described covering part lay respectively at described in adjacent two connecting portion away from the surface of described induction electrode.
In an embodiment, described electrode block comprises the short leg and long leg and the vertical support portion that is connected described short leg and described long leg center be arrangeding in parallel therein;
The two ends of described connecting portion lay respectively at outside the both sides of described induction electrode, the two ends of described short leg lay respectively at described in adjacent two connecting portion near the surface of described induction electrode, and the two ends of described long leg lay respectively at described in adjacent two connecting portion away from the surface of described induction electrode.
In an embodiment, described contact conductor is solid bus therein; Described electrode block is solid conducting block; Described induction electrode is latticed, comprises many conductor wires, and described connecting portion is electrically connected to at least two described conductor wires of described induction electrode.
In an embodiment, the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron therein, and the thickness of described induction electrode is 10～20 nanometers.
Above-mentioned nesa coating is by between adjacent two connecting portions, electrode block being set, and electrode block to protrude from the thickness of substrate surface identical with the thickness that contact conductor protrudes from substrate surface.By electrode block, fill the space between the connecting portion at edge, viewing area, thereby nesa coating laminating is formed after contactor control device, be not easy to cause folding line, can there is not in the edge of viewing area rough phenomenon, but fitting together with certain even angle on the whole.The existence that can effectively eliminate due to thickness difference space causes the light path of reflection ray to change simultaneously, thereby cause causing the phenomenon of " ghost " in viewing area, and then make the contactor control device that comprises above-mentioned nesa coating there is good outward appearance display effect.
A method for making for nesa coating, comprises the steps:
Substrate is provided, and on described substrate, forms induction conductive layer, described induction conductive layer comprises many spaced induction electrodes;
Periphery at described induction conductive layer forms contact conductor and electrode block, wherein, described contact conductor comprises leading part and is formed at the connecting portion of described leading part one end, described contact conductor is electrically connected to described induction electrode by described connecting portion, and the bearing of trend of described connecting portion is identical with the direction that many described induction electrodes are arranged, described contact conductor is corresponding one by one with described induction electrode, and many described contact conductor mutually insulateds, the thickness that described contact conductor protrudes from described substrate surface is greater than the thickness that described induction electrode protrudes from described substrate surface, electrode block, described in adjacent two between connecting portion, and at least with a wherein described contact conductor insulation, the thickness that described electrode block protrudes from described substrate surface is identical with the thickness that described contact conductor protrudes from described substrate surface.
In an embodiment, on described substrate, form in the process of described induction conductive layer therein,
Adopt the mode of vacuum evaporation or magnetron sputtering that ITO is coated on described substrate, obtain the ito thin film that thickness is 10～20 nanometers;
Ito thin film after burin-in process is carried out to etching, obtain many spaced described induction electrodes, wherein, it is acidproof etching mode, laser etching mode or gold-tinted processing procedure mode that described ito thin film is carried out to etched mode.
Therein in an embodiment, in the periphery of described induction conductive layer, form in the process of described contact conductor and described electrode block:
Adopt the mode of serigraphy that silver is starched to silk-screen to described substrate, directly synchronously obtain described contact conductor and described electrode block, the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron;
Or adopt the mode of serigraphy that photosensitive silver is starched to silk-screen to described substrate, then successively adopt the mode of exposure, development and etching, indirect synchronization obtains described contact conductor and described electrode block, and the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron;
Or adopt the mode of serigraphy that silver is starched to silk-screen to described substrate, then adopt the etched mode of laser, indirect synchronization obtains described contact conductor and described electrode block, and the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron.
The method for making of above-mentioned nesa coating is simple, when making contact conductor, can synchronously obtain electrode block, does not need extra operation.
, adopt above-mentioned nesa coating.This contactor control device has good outward appearance display effect.
Accompanying drawing explanation
Fig. 1 is the structural representation of the nesa coating of an embodiment;
Fig. 2 is the partial enlarged drawing of the A in Fig. 1;
Fig. 3 is the structural representation of the nesa coating of another embodiment;
Fig. 4 is the partial enlarged drawing of the B in Fig. 3;
Fig. 5 is the structural representation of the nesa coating of another embodiment;
Fig. 6 is the partial enlarged drawing of the C in Fig. 5.
Embodiment
Below in conjunction with drawings and the specific embodiments to nesa coating, its method for making and adopt the contactor control device of this nesa coating to be further detailed.
As shown in Figures 1 and 2, the nesa coating 10 of an embodiment, comprises substrate 100, induction conductive layer 200, contact conductor 300 and electrode block 400.
The frame region 120 that substrate 100 comprises viewing area 110 and is positioned at viewing area 110 peripheries.
Induction conductive layer 200 is located on viewing area 110, comprises many spaced induction electrodes 210.
In the present embodiment, contact conductor 300 is solid bus, and electrode block 400 is solid conducting block.Induction electrode 210 is latticed, comprises many conductor wire (not shown).The connecting portion 320 of contact conductor 300 is electrically connected to at least two conductor wires of induction electrode 210.
Further, the material of contact conductor 300 and electrode block 400 is silver, and the material of induction electrode 210 is ITO(tin indium oxide).The thickness that contact conductor 300 and electrode block 400 protrude from substrate 100 surfaces is 1～2 micron, and the thickness of induction electrode 210 is 10～20 nanometers.The thickness of contact conductor 300 is hundreds of times of the thickness of induction electrode 210, has larger thickness drop.Be appreciated that induction electrode 210 can be located in substrate 100, now, the thickness that induction electrode 210 protrudes from substrate 100 surfaces can be less than the thickness of himself, and to protrude from the thickness on substrate 100 surfaces can be also 0 to induction electrode 210 certainly.Be appreciated that contact conductor 300 and electrode block 400 can be located in substrate 100.
Be appreciated that in other embodiments, the material of contact conductor 300 and electrode block 400 can be also gold, copper etc.The material of induction electrode 210 can be Graphene, carbon nano-tube or conducting polymer etc.
In the present embodiment, electrode block 400 is linearly.The two ends of electrode block 400 respectively with the connecting portion 320 of electrode block 400 both sides over against.Linearly electrode block 400 easy moulding and realization when serigraphy, can also effectively save the actual materials of electrode block 400.
As shown in Figures 3 and 4, in other embodiments, electrode block 500 comprises covering part 510 and is convexly set in the Access Division 520 in covering part 510.Access Division 520 is between adjacent two connecting portions 320, and the two ends of covering part 510 lay respectively at adjacent two connecting portions 320 away from the surface of induction electrode 210.There is the electrode block 500 of covering part 510 with respect to linearly electrode block 400, can fill more fully space between adjacent two connecting portions 320 (linearly electrode block 400 because need at least and wherein contact conductor 300 insulation, and then cause the very little space of existence between electrode block 400 and connecting portion 320).
As shown in Figures 5 and 6, in other embodiments, electrode block 600 comprises the short leg 610 and long leg 620 and vertical by the support portion 630 at short leg 610 and long leg 620 centers be arrangeding in parallel, is also that electrode block 600 is "working"-shaped.
The two ends of connecting portion 320 lay respectively at outside the both sides of induction electrode 210, the two ends of short leg 610 lay respectively at adjacent two connecting portions 320 near the surface of induction electrode 210, and the two ends of long leg 620 lay respectively at adjacent two connecting portions 320 away from the surface of induction electrode 210.Thereby make the two ends of connecting portion 320 between short leg 610 and long leg 620.
In the present embodiment, also provide a kind of method for making of nesa coating, comprise the steps:
Step S710, provides substrate, and on substrate, forms induction conductive layer, and induction conductive layer comprises many spaced induction electrodes.
Substrate can be pet substrate, glass substrate etc.
On described substrate, form in the process of described induction conductive layer,
Adopt the mode of vacuum evaporation or magnetron sputtering that ITO is coated on substrate, obtain the ito thin film that thickness is 10～20 nanometers.Ito thin film after burin-in process is carried out to etching, obtain many spaced induction electrodes.Wherein, ito thin film being carried out to etched mode is acidproof etching mode, laser etching mode or gold-tinted processing procedure mode.
Step S720, at periphery formation contact conductor and the electrode block of induction conductive layer.
Wherein, contact conductor comprises leading part and is formed at the connecting portion of leading part one end, contact conductor is electrically connected to induction electrode by connecting portion, and the bearing of trend of connecting portion is identical with the direction that many induction electrodes are arranged, contact conductor is corresponding one by one with induction electrode, and many contact conductor mutually insulateds, the thickness that contact conductor protrudes from substrate is greater than the thickness that induction electrode protrudes from substrate.
Electrode block between adjacent two connecting portions, and at least with wherein contact conductor insulation, the thickness that electrode block protrudes from substrate is identical with the thickness that contact conductor protrudes from substrate, with the thickness difference between balance induction electrode and contact conductor.
In the present embodiment, contact conductor and electrode block synchronously form, and in the periphery of responding to conductive layer, synchronously form in the process of contact conductor and electrode block:
Can adopt the mode of serigraphy that silver is starched to silk-screen to substrate, directly synchronously obtain contact conductor and electrode block, wherein, on web plate, be provided with in advance the model of contact conductor and electrode.Also can adopt the mode of serigraphy that photosensitive silver is starched to silk-screen to substrate, then successively adopt the mode of exposure, development and etching, indirect synchronization obtains contact conductor and electrode block.Also can adopt the mode of serigraphy that photosensitive silver is starched to silk-screen to substrate, then adopt the etched mode of laser, indirect synchronization obtains contact conductor and electrode block.Wherein, to protrude from the thickness of substrate be 1～2 micron for contact conductor and electrode block.
Step S710 and step S720 do not have sequencing, can first form induction conductive layer, then form contact conductor and electrode block.Also can form induction conductive layer, contact conductor and electrode block simultaneously.
In addition, present embodiment also provides a kind of contactor control device that adopts above-mentioned nesa coating.
Above-mentioned nesa coating 10 is by between adjacent two connecting portions 320, electrode block 400 being set, and electrode block 400 to protrude from the thickness on substrate 100 surfaces identical with the thickness that contact conductor 300 protrudes from substrate 100 surfaces.By electrode block 400, fill the space between the connecting portion 320 at 110 edges, viewing area, thereby nesa coating 10 laminatings are formed after contactor control device, be not easy to cause folding line, can be in viewing area 110 edge there is rough phenomenon, but fitting together with certain even angle on the whole.The existence that can effectively eliminate due to thickness difference space causes the light path of reflection ray to change simultaneously, thereby cause causing the phenomenon of " ghost " in viewing area 110, and then make the contactor control device that comprises above-mentioned nesa coating 10 there is good outward appearance display effect.
The method for making of above-mentioned nesa coating 10 is simple, when making contact conductor 300, can synchronously obtain electrode block 400, does not need extra operation.
It is below embodiment part
Embodiment 1
Adopt the mode of magnetron sputtering that ITO is coated on substrate, obtain the ito thin film that thickness is 10 nanometers.Adopt acidproof etching mode to carry out etching to the ito thin film after burin-in process, detailed process is: on ito thin film, enclose the acidproof film of one deck, then carry out UV(ultraviolet) dry, after UV is dry, utilize the acidproof not alkaline-resisting characteristic of acidproof film, first pickling again alkali cleaning mode required interior ITO conducting wire etching out, on substrate, formation comprises the induction conductive layer of many spaced induction electrodes.
Adopt the mode of serigraphy that silver is starched to silk-screen to substrate, directly synchronously obtain contact conductor and electrode block (on web plate, being provided with in advance the model of contact conductor and electrode).Then carry out the baking of silver slurry, so that silver slurry is fixing, be shaped, obtain nesa coating.Wherein, the thickness of contact conductor and electrode block is 1 micron.
Embodiment 2
Adopt the mode of vacuum evaporation that ITO is coated on substrate, obtain the ito thin film that thickness is 15 nanometers, and carry out burin-in process to being coated with the substrate of ito thin film.Then adopt the mode of serigraphy that silver is starched to silk-screen to being coated with on the substrate of ito thin film, obtain the intermediate product of nesa coating, and it is dry that intermediate product are carried out to UV.
Adopt laser etching mode to walk line locking to ITO Film and silver and carry out laser-induced thermal etching, radium-shinely go out required interior ITO conducting wire, contact conductor and electrode block.Then carry out the baking of silver slurry, so that silver slurry is fixing, be shaped, obtain nesa coating.Wherein, the thickness of contact conductor and electrode block is 2 microns.
Embodiment 3
Adopt the mode of magnetron sputtering that ITO is coated on substrate, obtain the ito thin film that thickness is 20 nanometers.Adopt acidproof etching mode to carry out etching to the ito thin film after burin-in process, detailed process is: on ito thin film, enclose the acidproof film of one deck, then carry out UV(ultraviolet) dry, after UV is dry, utilize the acidproof not alkaline-resisting characteristic of acidproof film, first pickling again alkali cleaning mode required interior ITO conducting wire etching out, on substrate, formation comprises the induction conductive layer of many spaced induction electrodes.
Adopt the mode of serigraphy that silver is starched to silk-screen to substrate, then adopt laser etching mode to carry out etching to silver-colored cabling, indirect synchronization obtains contact conductor and electrode block.Then carry out the baking of silver slurry, so that silver slurry is fixing, be shaped, obtain nesa coating.Wherein, the thickness of contact conductor and electrode block is 1.5 microns.
Embodiment 4
Adopt the mode of magnetron sputtering that ITO is coated on substrate, obtain the ito thin film that thickness is 18 nanometers.Adopt gold-tinted processing procedure mode to carry out etching to the ito thin film after burin-in process, detailed process is: adopt successively exposure, development, etched technique to make the interior ITO conducting wire of appearing.
Adopt the mode of serigraphy that silver is starched to silk-screen to substrate, directly synchronously obtain contact conductor and electrode block (on web plate, being provided with in advance the model of contact conductor and electrode).Then carry out the baking of silver slurry, so that silver slurry is fixing, be shaped, obtain nesa coating.Wherein, the thickness of contact conductor and electrode block is 1.8 microns.
Embodiment 5
Adopt the mode of magnetron sputtering that ITO is coated on substrate, obtain the ito thin film that thickness is 18 nanometers.Adopt gold-tinted processing procedure mode to carry out etching to the ito thin film after burin-in process, detailed process is: adopt successively exposure, development, etched technique to make the interior ITO conducting wire of appearing.
Adopt the mode of serigraphy that photosensitive silver is starched to silk-screen to substrate, then successively adopt the mode of exposure, development and etching, indirect synchronization obtains contact conductor and electrode block.Then carry out the baking of silver slurry, so that silver slurry is fixing, be shaped, obtain nesa coating.Wherein, the thickness of contact conductor and electrode block is 1.5 microns.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a nesa coating, is characterized in that, comprising:
Substrate, the frame region that comprises viewing area and be positioned at described viewing area periphery;
Induction conductive layer, is located at described viewing area, comprises many spaced induction electrodes;
Contact conductor, be located at described frame region, comprise leading part and be formed at the connecting portion of described leading part one end, described contact conductor is electrically connected to described induction electrode by described connecting portion, and the bearing of trend of described connecting portion is identical with the direction that many described induction electrodes are arranged, the number of described contact conductor is many, many described contact conductor mutually insulateds, and the thickness that described contact conductor protrudes from described substrate surface is greater than the thickness that described induction electrode protrudes from described substrate surface;
Electrode block, between the connecting portion of contact conductor described in adjacent two, and at least with a wherein described contact conductor insulation, the thickness that described electrode block protrudes from described substrate surface is identical with the thickness that described contact conductor protrudes from described substrate surface.
2. nesa coating according to claim 1, is characterized in that, described electrode block is linearly, the two ends of described electrode block respectively with the described connecting portion of the both sides of described electrode block over against.
3. nesa coating according to claim 1, it is characterized in that, described electrode block comprises covering part and is convexly set in the Access Division in described covering part, described wedging position is in described in adjacent two between connecting portion, and the two ends of described covering part lay respectively at described in adjacent two connecting portion away from the surface of described induction electrode.
4. nesa coating according to claim 1, is characterized in that, described electrode block comprises the short leg and long leg and the vertical support portion that is connected described short leg and described long leg center be arrangeding in parallel;
The two ends of described connecting portion lay respectively at outside the both sides of described induction electrode, the two ends of described short leg lay respectively at described in adjacent two connecting portion near the surface of described induction electrode, and the two ends of described long leg lay respectively at described in adjacent two connecting portion away from the surface of described induction electrode.
5. according to the nesa coating described in any one in claim 1-4, it is characterized in that, described contact conductor is solid bus; Described electrode block is solid conducting block; Described induction electrode is latticed, comprises many conductor wires, and described connecting portion is electrically connected to at least two described conductor wires of described induction electrode.
6. nesa coating according to claim 5, is characterized in that, the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron, and the thickness of described induction electrode is 10～20 nanometers.
7. a method for making for nesa coating, is characterized in that, comprises the steps:
Substrate is provided, and on described substrate, forms induction conductive layer, described induction conductive layer comprises many spaced induction electrodes;
Periphery at described induction conductive layer forms contact conductor and electrode block, wherein, described contact conductor comprises leading part and is formed at the connecting portion of described leading part one end, described contact conductor is electrically connected to described induction electrode by described connecting portion, and the bearing of trend of described connecting portion is identical with the direction that many described induction electrodes are arranged, described contact conductor is corresponding one by one with described induction electrode, and many described contact conductor mutually insulateds, the thickness that described contact conductor protrudes from described substrate surface is greater than the thickness that described induction electrode protrudes from described substrate surface, electrode block, described in adjacent two between connecting portion, and at least with a wherein described contact conductor insulation, the thickness that described electrode block protrudes from described substrate surface is identical with the thickness that described contact conductor protrudes from described substrate surface.
8. the method for making of nesa coating according to claim 7, is characterized in that, on described substrate, form in the process of described induction conductive layer,
Adopt the mode of vacuum evaporation or magnetron sputtering that ITO is coated on described substrate, obtain the ito thin film that thickness is 10～20 nanometers;
Ito thin film after burin-in process is carried out to etching, obtain many spaced described induction electrodes, wherein, it is acidproof etching mode, laser etching mode or gold-tinted processing procedure mode that described ito thin film is carried out to etched mode.
9. according to the method for making of the nesa coating described in claim 7 or 8, it is characterized in that, in the periphery of described induction conductive layer, form in the process of described contact conductor and described electrode block:
Adopt the mode of serigraphy that silver is starched to silk-screen to described substrate, directly synchronously obtain described contact conductor and described electrode block, the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron;
Or adopt the mode of serigraphy that photosensitive silver is starched to silk-screen to described substrate, then successively adopt the mode of exposure, development and etching, indirect synchronization obtains described contact conductor and described electrode block, and the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron;
Or adopt the mode of serigraphy that silver is starched to silk-screen to described substrate, then adopt the etched mode of laser, indirect synchronization obtains described contact conductor and described electrode block, and the thickness that described contact conductor and described electrode block protrude from described substrate surface is 1～2 micron.
10. a contactor control device, is characterized in that, adopts the nesa coating as described in any one in claim 1-6.
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| CN201310531018.XA CN103558939B (en) | 2013-10-31 | 2013-10-31 | Nesa coating, its preparation method and use the contactor control device of this nesa coating |
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| CN107103843A (en) * | 2017-05-15 | 2017-08-29 | 京东方科技集团股份有限公司 | A kind of preparation method of flexible display, flexible display and display device |
| CN109799934A (en) * | 2019-01-24 | 2019-05-24 | 蓝思科技（长沙）有限公司 | A kind of preparation method of touch sensing |
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| CN104020920A (en) * | 2014-06-26 | 2014-09-03 | 金龙机电（东莞）有限公司 | Method for producing ultrathin touch screen thin-film sensor |
| CN105334988A (en) * | 2014-07-01 | 2016-02-17 | 长鸿光电(厦门)有限公司 | Touch panel |
| CN105334988B (en) * | 2014-07-01 | 2019-03-12 | 长鸿光电(厦门)有限公司 | Touch panel |
| CN104281322B (en) * | 2014-09-29 | 2017-10-27 | 深圳欧菲光科技股份有限公司 | Touch-screen conductive structure preparation method |
| CN104281322A (en) * | 2014-09-29 | 2015-01-14 | 深圳欧菲光科技股份有限公司 | Method for manufacturing electricity conduction structure of touch screen |
| CN104267853A (en) * | 2014-10-13 | 2015-01-07 | 深圳欧菲光科技股份有限公司 | Touch screen |
| CN104793821A (en) * | 2015-04-20 | 2015-07-22 | 南昌欧菲光科技有限公司 | Touch panel and manufacturing method |
| CN106354297A (en) * | 2015-07-15 | 2017-01-25 | 三星显示有限公司 | Touch panel |
| CN106802734A (en) * | 2015-11-26 | 2017-06-06 | 南昌欧菲光科技有限公司 | Touch sensible element and preparation method thereof |
| CN107103843A (en) * | 2017-05-15 | 2017-08-29 | 京东方科技集团股份有限公司 | A kind of preparation method of flexible display, flexible display and display device |
| CN107103843B (en) * | 2017-05-15 | 2019-09-06 | 京东方科技集团股份有限公司 | A kind of preparation method of flexible display, flexible display and display equipment |
| US11119344B2 (en) | 2017-05-15 | 2021-09-14 | Boe Technology Group Co., Ltd. | Manufacturing method of flexible display, flexible display, and display device |
| CN110362220A (en) * | 2018-04-11 | 2019-10-22 | 南昌欧菲显示科技有限公司 | Touch screen film and preparation method thereof |
| CN109799934A (en) * | 2019-01-24 | 2019-05-24 | 蓝思科技（长沙）有限公司 | A kind of preparation method of touch sensing |
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