CN103531263A - 一种使用电场降低碎屑的方法、装置和euv光源系统 - Google Patents
一种使用电场降低碎屑的方法、装置和euv光源系统 Download PDFInfo
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- CN103531263A CN103531263A CN201310538366.XA CN201310538366A CN103531263A CN 103531263 A CN103531263 A CN 103531263A CN 201310538366 A CN201310538366 A CN 201310538366A CN 103531263 A CN103531263 A CN 103531263A
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109599297A (zh) * | 2017-10-02 | 2019-04-09 | 富士通电子零件有限公司 | 电磁继电器 |
CN110981154A (zh) * | 2019-12-19 | 2020-04-10 | 西安交通大学 | 污泥干燥装置及干燥方法 |
Citations (7)
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US20030190012A1 (en) * | 2002-04-05 | 2003-10-09 | Xtreme Technologies Gmbh | Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma |
US20060243927A1 (en) * | 2005-04-29 | 2006-11-02 | Tran Duc C | Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma |
CN101194341A (zh) * | 2005-06-08 | 2008-06-04 | 西默股份有限公司 | 使等离子体-生成的离子偏转以防止离子到达euv光源的内部元件的系统和方法 |
US20090101850A1 (en) * | 2007-10-22 | 2009-04-23 | Xtreme Technologies Gmbh | Arrangement for generating euv radiation |
US20090186282A1 (en) * | 2008-01-17 | 2009-07-23 | Banqiu Wu | Contamination prevention in extreme ultraviolet lithography |
US20110266468A1 (en) * | 2008-10-24 | 2011-11-03 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus |
WO2013155004A2 (en) * | 2012-04-09 | 2013-10-17 | Kla-Tencor Corporation | Advanced debris mitigation of euv light source |
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2013
- 2013-11-04 CN CN201310538366.XA patent/CN103531263B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030190012A1 (en) * | 2002-04-05 | 2003-10-09 | Xtreme Technologies Gmbh | Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma |
US20060243927A1 (en) * | 2005-04-29 | 2006-11-02 | Tran Duc C | Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma |
CN101194341A (zh) * | 2005-06-08 | 2008-06-04 | 西默股份有限公司 | 使等离子体-生成的离子偏转以防止离子到达euv光源的内部元件的系统和方法 |
US20090101850A1 (en) * | 2007-10-22 | 2009-04-23 | Xtreme Technologies Gmbh | Arrangement for generating euv radiation |
US20090186282A1 (en) * | 2008-01-17 | 2009-07-23 | Banqiu Wu | Contamination prevention in extreme ultraviolet lithography |
US20110266468A1 (en) * | 2008-10-24 | 2011-11-03 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus |
WO2013155004A2 (en) * | 2012-04-09 | 2013-10-17 | Kla-Tencor Corporation | Advanced debris mitigation of euv light source |
Non-Patent Citations (2)
Title |
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陈尔奎等: "《高电压技术》", 31 August 2012, article "碰撞电离" * |
陈海丰: "针阵列双极电晕放电及其捕集颗粒物研究", 《中国博士学位论文全文数据库工程科技I辑》, no. 9, 15 September 2009 (2009-09-15) * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109599297A (zh) * | 2017-10-02 | 2019-04-09 | 富士通电子零件有限公司 | 电磁继电器 |
US10930459B2 (en) | 2017-10-02 | 2021-02-23 | Fujitsu Component Limited | Electromagnetic relay |
CN112927988A (zh) * | 2017-10-02 | 2021-06-08 | 富士通电子零件有限公司 | 电磁继电器 |
CN109599297B (zh) * | 2017-10-02 | 2022-07-26 | 富士通电子零件有限公司 | 电磁继电器 |
CN110981154A (zh) * | 2019-12-19 | 2020-04-10 | 西安交通大学 | 污泥干燥装置及干燥方法 |
CN110981154B (zh) * | 2019-12-19 | 2021-06-01 | 西安交通大学 | 污泥干燥装置及干燥方法 |
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Inventor after: Xie Wanlu Inventor after: Wu Xiaobin Inventor after: Chen Jinxin Inventor after: Wang Kuibo Inventor after: Luo Yan Inventor after: Zhang Luosha Inventor after: Wang Yu Inventor before: Wang Kuibo Inventor before: Wu Xiaobin Inventor before: Wang Yu Inventor before: Chen Jinxin Inventor before: Zhang Luosha Inventor before: Luo Yan Inventor before: Xie Wanlu |
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Free format text: CORRECT: INVENTOR; FROM: WANG KUIBO WU XIAOBIN WANG YU CHEN JINXIN ZHANG LUOSHA LUO YAN XIE WANLU TO: XIE WANLU WU XIAOBIN CHEN JINXIN WANG KUIBO LUO YAN ZHANG LUOSHA WANG YU |
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Effective date of registration: 20200804 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200804 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |