CN103434203A - Anti-fingerprint film and preparation method thereof - Google Patents
Anti-fingerprint film and preparation method thereof Download PDFInfo
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- CN103434203A CN103434203A CN2013103009535A CN201310300953A CN103434203A CN 103434203 A CN103434203 A CN 103434203A CN 2013103009535 A CN2013103009535 A CN 2013103009535A CN 201310300953 A CN201310300953 A CN 201310300953A CN 103434203 A CN103434203 A CN 103434203A
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Abstract
The invention discloses an anti-fingerprint film and a preparation method thereof. The anti-fingerprint film comprises a base material, and a silicon oxide layer and a fluoride layer are successively deposited on the surface of the base material, wherein the total thickness of the silicon oxide layer and the fluoride layer is 15-35 nm. The preparation method comprises the steps: firstly, selecting a product to be processed as the base material, and cleaning and dedusting the surface of the base material; then sequentially carrying out ion cleaning, plating the silicon oxide layer and dedusting by utilizing a magnetron sputtering film plating machine; and finally, depositing the fluoride layer by utilizing a vacuum evaporation film plating machine. Therefore, the appearance of the product is kept clean, fingerprints and other smudges are quite easy to wipe clean, and the surface hardness of the product is enhanced.
Description
Technical field
The present invention relates to a kind of filth-resisting thin film, relate in particular to a kind of anti-fingerprint film and preparation method thereof.
Background technology
Electronic product extensive use at present, camera lens, precison optical component, panel computer, LCD TV, mobile phone, touch screen etc. product particularly, these products are dirty with in the frequent contact process of human skin, being easy to be stained with fingerprint, sweat, grease etc., and this dirty very difficult wiping, thereby performance and the appearance effect of product have been affected.
In prior art, a kind of anti-fingerprint film of Chinese patent (application number is 201010205501.5) and preparation method thereof, thick PFPE or the organosilicon polymer film at plastic rubber substrate surface deposition 50-30nm.Although certain anti-fingerprint is arranged, and effect is still undesirable, and product surface hardness is lower.
Summary of the invention
The purpose of this invention is to provide and a kind ofly make product appearance keep clean, make the dirty very easily wiped clean such as fingerprint, strengthen anti-fingerprint film of product surface hardness and preparation method thereof.
The objective of the invention is to be achieved through the following technical solutions:
Anti-fingerprint film of the present invention, comprise base material, and described substrate surface is silicon oxide layer deposited, fluoride layer successively, and the gross thickness of described silicon oxide layer and fluoride layer is 15-35nm.
The preparation method of above-mentioned anti-fingerprint film of the present invention, comprise the steps:
At first, choose processed product as base material, to substrate surface cleaned, dedusting;
Then, utilize magnetron sputtering coater to carry out successively Ion Cleaning, be coated with silicon oxide layer, dedusting;
Afterwards, utilize the depositing fluorinated thing layer of vacuum evaporating coating machine.
As seen from the above technical solution provided by the invention, anti-fingerprint film that the embodiment of the present invention provides and preparation method thereof, owing to being 15-35nm silicon oxide layer, fluoride layer by magnetron sputtering coater and vacuum evaporating coating machine at substrate surface deposit thickness successively, can making product appearance keep clean, make the dirty very easily wiped clean such as fingerprint, strengthen product surface hardness.
The specific embodiment
Below will be described in further detail the embodiment of the present invention.
Anti-fingerprint film of the present invention, its preferably the specific embodiment be:
Comprise base material, described substrate surface deposits silicon oxide layer, fluoride layer successively, and the gross thickness of described silicon oxide layer and fluoride layer is 15-35nm.
The general formula of described silica is Si
xo
y, the mixture that described fluoride is multiple fluorine-based polymer;
Described base material be following any: PC plastic plate, PMMA plastic plate, PET plastic plate, PS plastic plate, PA plastic plate, ABS plastic plate, corrosion resistant plate, metallic plate.
Described substrate surface can be spray, plating or print surface, silicon oxide layer deposited, fluoride layer successively on described spray, plating or print surface.
The preparation method of above-mentioned anti-fingerprint film of the present invention, its preferably the specific embodiment be:
Comprise the steps:
At first, choose processed product as base material, to substrate surface cleaned, dedusting;
Then, utilize magnetron sputtering coater to carry out successively Ion Cleaning, be coated with silicon oxide layer, dedusting;
Afterwards, utilize the depositing fluorinated thing layer of vacuum evaporating coating machine.
Described cleaning comprises:
With alcohol, non-dust cloth, substrate surface is cleaned.
Described dedusting comprises:
Carry out dedusting with the electrostatic precipitation rifle, the voltage of the electrostatic generator that described electrostatic precipitation rifle is used is 7KV.
Described Ion Cleaning, be coated with silicon oxide layer and comprise:
In magnetron sputtering coater, vacuum is evacuated to 7 * 10
-3more than Pa, open grid bias power supply, be filled with argon gas and form plasma, base material is carried out to Ion Cleaning, bias mains voltage is set 500V-700V, and the grid bias power supply dutycycle is set 60%-70%, and argon flow amount is set as 450Sccm-550Sccm, scavenging period is set as 5min-10min, and vacuum is down to 7 * 10
-1pa;
Close grid bias power supply after Ion Cleaning, stop being filled with argon gas, vacuum is extracted into to 6.5 * 10
-3more than Pa, be filled with argon gas and oxygen, open the intermediate frequency power supply of silicon target, carrying out silicon oxide film is coated with, intermediate frequency power supply current settings 10A-12A, argon flow amount is set as 150Sccm-180Sccm, and oxygen flow is set as 10Sccm-12Sccm, the plated film time is set as 2min-3min, and vacuum is down to 2.3 * 10
-1pa;
Described Ion Cleaning, be coated with in the silicon oxide layer process, the speed setting of product pivoted frame is 3.1rpm.
Described depositing fluorinated thing layer comprises:
In vacuum evaporating coating machine, vacuum is evacuated to 3.5 * 10
-3more than Pa, start at the depositing fluorinated thing of substrate surface, control 300 ℃ of evaporation source temperature, vaporization voltage is set 1.5V, and evaporation time is set 300S, the speed setting 50rpm of product pivoted frame.
The described silicon target be coated with in the silicon oxide layer process adopts twin polycrystalline silicon target, the basket source of tungsten filament that the evaporation source in described depositing fluorinated thing layer process adopts.
The pumping high vacuum equipment of described vacuum evaporating coating machine and magnetron sputtering coater all adopts oily diffusion vacuum pump and cryogenic trapping pump.
Anti-fingerprint film of the present invention and preparation method thereof, can make product appearance keep clean, make the dirty very easily wiped clean such as fingerprint, strengthen product surface hardness.
Specific embodiment:
First deposit one deck silica at substrate surface, then deposit one deck fluoride, film thickness is 15-35nm.
Wherein, described silica is Si
xo
y, the mixture that fluoride is three kinds of fluorine-based polymer.Base material can be the various plastic plates such as PC, PMMA, PET, PS, PA, ABS, can be also various corrosion resistant plates, metallic plate etc., and base material can be the product that spray, plating, printing etc. process.
The preparation method of anti-fingerprint film, comprise the steps:
A), choose processed product as base material, with alcohol, non-dust cloth, substrate surface is cleaned.
B), by the product group on Special tooling clamp, then hang on the frock bar.
C), the frock bar that will overwork base material is placed on and moves on the work car, moves in the dedusting cabinet, with special-purpose electrostatic precipitation rifle, carries out dedusting.
D), by dedusting, complete frock bar is hung on the chassis of magnetron sputtering coater, first insert lower hole, then hang up hole.
E), rotate chassis, confirm the frock bar target surface that can not drop or scratch, shut the coating machine gate, and locked.
F), according to the magnetron sputtering coater operational procedure, open successively various vavuum pumps, vacuumized.
G), be evacuated to 7 * 10 in vacuum
-3close the grating valve when Pa is above, open chassis pivoted frame switch, open grid bias power supply, be filled with argon gas and form plasma, base material is carried out to Ion Cleaning, speed setting 3.1rpm, bias mains voltage is set 700V, and the grid bias power supply dutycycle sets 70%, and argon flow amount is set as 450Sccm, scavenging period is set as 10min, and vacuum is down to 7 * 10
-1pa.
H), close grid bias power supply after Ion Cleaning, stop being filled with argon gas, open the grating valve, treat that vacuum is extracted into 6.5 * 10
-3when Pa is above, close the grating valve, open chassis pivoted frame switch, be filled with argon gas and oxygen, open the intermediate frequency power supply of silicon target, base material is coated with to silicon oxide film, speed setting 3.1rpm, intermediate frequency power supply current settings 12A, argon flow amount is set as 150Sccm, oxygen flow is set as 12Sccm, and the plated film time is set as 3min, and vacuum is down to 2.3 * 10
- 1pa.
I), close successively various pump valves according to the magnetron sputtering coater operational procedure, the taking-up product that opens the door of exitting after plated film.
J), the base material that will plate silica is suspended on the vacuum evaporating coating machine chassis, with special-purpose electrostatic precipitation rifle, carries out dedusting.
K), rotate chassis, confirm that the frock bar can not drop, shut the coating machine gate, start semi-automatic program, coating machine starts automatic vacuum.
L), be evacuated to 3.5 * 10 in vacuum
-3when Pa is above, point is driven semi-automatic plated film button, starts plated film, sets evaporation conditions, controls 300 ℃ of evaporation source temperature, and at the depositing fluorinated thing of substrate surface, wherein vaporization voltage is set 1.5V, and evaporation time is set 300S, speed setting 50.
M), coating machine cuts out various pump valves automatically successively after plated film, venting is opened the door.
Wherein, the silicon target step h) adopts twin polycrystalline silicon target.
What wherein, step l), evaporation source adopted is the basket source of tungsten filament.
Wherein, step c) and step j) in electrostatic precipitation rifle electrostatic generator voltage used be 7KV.
Wherein, vacuum evaporating coating machine and magnetron sputtering coater pumping high vacuum equipment all adopt oily diffusion vacuum pump and cryogenic trapping pump.
Wherein, the thickness of every layer film is all to regulate the plated film time to control.
The excellent characteristic of the film that the present invention produces is:
1., thicknesses of layers is in tens nanometers left and right, color is fully transparent, has good optical property, transparent at visible ray, infrared region, does not affect the penetrating of light fully; 2., at glass, metal, plastic cement, coating, coating surface, good firmness and wearability are arranged, can scratch-resistant, the corrosion of the various washing agent of ability, organic solvent, highly basic, weak acid, sweat, prevent that film surface is because of the pollution variable color; 3., rete has low-friction coefficient, with the contact angle of water, is greater than 110 degree, makes surface have extremely strong hydrophobic, hydrophobic, waterproof effect, has significant lotus leaf effect.Foreign material are difficult for being bonded at the subordinate list face, increase waterproof, antifog, dustproof, prevent fingerprint, the function such as grease proofing, anti-pollution; 4., do not affect the work of capacitance plate fully, can not produce interference effect; 5., coating do not contain heavy metal silver, lead, cadmium, mercury, arsenic composition, to the external world, do not discharge noxious material, totally nontoxic.
The excellent characteristic of production method of the present invention is:
For being coated with of fluoride films, most of producers all adopt electron gun to add the evaporation equipment of crucible, and this equipment has the shortcoming that output is little, rete is inhomogeneous, my company adopts electric resistor heating type evaporation coating machine to be coated with the shortcoming that fluoride films has exactly made up electron gun equipment, this equipment yield is large, and speed is fast, and evaporation source is many, can be complementary up and down, good uniformity, technique is simple, easy to operate, whole stove product thicknesses of layers is coated with very even, is applicable to producing in enormous quantities.
Product appearance and performance:
Unchanged before and after the product colour plated film.
With the adhesive force of hundred lattice cutter test products, it is 0 grade.
By the wearability of paper tape friction testing instrument test products, 3000 the product retes that rub do not fall film, not variable color.
Product is rubber friction and the equal OK of alcohol friction testing.
Product is done high temperature, high humidity tries equal OK.
Product cold-hot impact test OK.
Product sweat proof liquid test OK.
Product oil resistant test OK.
Product is hardness test OK.
Wherein, the rubber friction test is: by the power of 9.8N, rubber is pressed in to product surface, and stroke 30mm, with the speed frictions of 30 times per minute 2000 times, it is OK that product does not fall film.
Wherein, the alcohol friction test is: cloth absolute alcohol is moistening by the power of 4.8N is pressed in product surface, rubs 100 times, and it is OK that product does not fall film.
Wherein, hot test is: product is placed on to lower 48 hours of the environment of 80 ℃ of temperature, humidity 10%, product appearance is unchanged is OK.
Wherein, high wet test is: product is placed on to lower 48 hours of the environment of temperature 60 C, humidity 90%, product appearance is unchanged is OK.
Wherein, the cold-hot impact test is: product is placed on to lower 0.5 hour of the environment of temperature-40 ℃, then product is placed on to lower 0.5 hour of the environment of temperature 70 C, do altogether 10 circulations, product appearance is unchanged is OK.
Wherein, sweat proof liquid test is: the product that will coat the synthetic perspiration is placed on lower 0.5 hour of the environment of temperature 50 C, humidity 90%, then product is placed on to lower 0.5 hour of the environment of 35 ℃ of temperature, humidity 90%, does altogether 100 circulations, and product appearance is unchanged is OK.
Wherein, oil resistant test is: the product that will coat edible oil is placed on lower 12 hours of the environment of temperature 70 C, humidity 90%, then does hundred lattice tests, and not falling film is OK.
Wherein, hardness measuring method is: the 2H pencil of Mitsubishi is to miter angle with the power of 9.8N and product surface and draws 1cm length, draw 5 times, 2 no markings are OK.
Preparation method of the present invention realizes low-temperature and high-speed deposition by novel PVD technology and evaporation coating technique at product surface, obtains anti-fingerprint film.With other technology, compare, this technology is widely used, and applicability is strong, and base material can be plastic cement, can be also glass, stainless steel, pottery, other metal or nonmetal plate.This technology, without heating, can be carried out under normal temperature, is real low-temperature and high-speed.The uniformity of film and homogeney excellence, fully transparent, do not affect the product background color, and this technical matters process is simple, easily operation, with low cost, nuisanceless, pure environmental protection.
The above; be only the present invention's specific embodiment preferably, but protection scope of the present invention is not limited to this, anyly is familiar with in technical scope that those skilled in the art disclose in the present invention; the variation that can expect easily or replacement, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (10)
1. an anti-fingerprint film, comprise base material, it is characterized in that, described substrate surface deposits silicon oxide layer, fluoride layer successively, and the gross thickness of described silicon oxide layer and fluoride layer is 15-35nm.
2. anti-fingerprint film according to claim 1, is characterized in that, the general formula of described silica is Si
xo
y, the mixture that described fluoride is multiple fluorine-based polymer;
Described base material be following any: PC plastic plate, PMMA plastic plate, PET plastic plate, PS plastic plate, PA plastic plate, ABS plastic plate, corrosion resistant plate, metallic plate.
3. anti-fingerprint film according to claim 2, is characterized in that, described substrate surface is provided with spray, plating or print surface, silicon oxide layer deposited, fluoride layer successively on described spray, plating or print surface.
4. the preparation method of a claim 1,2 or 3 described anti-fingerprint films, is characterized in that, comprises the steps:
At first, choose processed product as base material, to substrate surface cleaned, dedusting;
Then, utilize magnetron sputtering coater to carry out successively Ion Cleaning, be coated with silicon oxide layer, dedusting;
Afterwards, utilize the depositing fluorinated thing layer of vacuum evaporating coating machine.
5. the preparation method of anti-fingerprint film according to claim 4, is characterized in that, described cleaning comprises:
With alcohol, non-dust cloth, substrate surface is cleaned.
6. the preparation method of anti-fingerprint film according to claim 4, is characterized in that, described dedusting comprises:
Carry out dedusting with the electrostatic precipitation rifle, the voltage of the electrostatic generator that described electrostatic precipitation rifle is used is 7KV.
7. the preparation method of anti-fingerprint film according to claim 4, is characterized in that, described Ion Cleaning, is coated with silicon oxide layer and comprises:
In magnetron sputtering coater, vacuum is evacuated to 7 * 10
-3more than Pa, open grid bias power supply, be filled with argon gas and form plasma, base material is carried out to Ion Cleaning, bias mains voltage is set 500V-700V, and the grid bias power supply dutycycle is set 60%-70%, and argon flow amount is set as 450Sccm-550Sccm, scavenging period is set as 5min-10min, and vacuum is down to 7 * 10
-1pa;
Close grid bias power supply after Ion Cleaning, stop being filled with argon gas, vacuum is extracted into to 6.5 * 10
-3more than Pa, be filled with argon gas and oxygen, open the intermediate frequency power supply of silicon target, carrying out silicon oxide film is coated with, intermediate frequency power supply current settings 10A-12A, argon flow amount is set as 150Sccm-180Sccm, and oxygen flow is set as 10Sccm-12Sccm, the plated film time is set as 2min-3min, and vacuum is down to 2.3 * 10
-1pa;
Described Ion Cleaning, be coated with in the silicon oxide layer process, the speed setting of product pivoted frame is 3.1rpm.
8. the preparation method of anti-fingerprint film according to claim 7, is characterized in that, described depositing fluorinated thing layer comprises:
In vacuum evaporating coating machine, vacuum is evacuated to 3.5 * 10
-3more than Pa, start at the depositing fluorinated thing of substrate surface, control 300 ℃ of evaporation source temperature, vaporization voltage is set 1.5V, and evaporation time is set 300S, the speed setting 50rpm of product pivoted frame.
9. the preparation method of anti-fingerprint film according to claim 8, is characterized in that, the described silicon target be coated with in the silicon oxide layer process adopts twin polycrystalline silicon target, the basket source of tungsten filament that the evaporation source in described depositing fluorinated thing layer process adopts.
10. the preparation method of anti-fingerprint film according to claim 9, is characterized in that, the pumping high vacuum equipment of described vacuum evaporating coating machine and magnetron sputtering coater all adopts oily diffusion vacuum pump and cryogenic trapping pump.
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| CN116273779A (en) * | 2021-12-03 | 2023-06-23 | 富联裕展科技(深圳)有限公司 | Double-nano-coating with low surface energy, preparation method thereof and dispensing needle |
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