CN103380388A - 具有小的涂层直径的弯曲不敏感光纤和包括该光纤的光缆 - Google Patents
具有小的涂层直径的弯曲不敏感光纤和包括该光纤的光缆 Download PDFInfo
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Abstract
提供一种弯曲不敏感光纤以及包括该弯曲不敏感光纤的弯曲不敏感光缆,该弯曲不敏感光纤包括:芯,位于光纤的中心;包层,包围芯且具有比芯低的折射率;涂层,包围包层;以及区域,形成在包层中且具有比包层低的折射率,其中该涂层具有多层结构和240μm或更小的总外直径。
Description
相关申请的交叉引用
本申请要求于2011年2月15日提交的第10-2011-0013268号韩国专利申请的优先权,其全部公开内容通过引用合并于此,用于各种用途。
技术领域
本发明涉及一种弯曲不敏感光纤和光缆,尤其涉及一种通过对内部结构和材料性能的改善而具有低弯曲损耗的弯曲不敏感光纤以及包括该弯曲不敏感光纤的光缆。
背景技术
光纤具有依赖于芯和包层的折射率分布而变化的光学性能,通常,可以通过控制折射率分布来制作具有期望性能的光纤。
当与用于数据传输的其它介质(例如铜线)相比时,光纤在损耗和带宽方面是具有优势的,但不利的是难以处理。
尤其,应用于光纤到户(FTTH)的现有光纤由于小的弯曲而展现出高弯曲损耗,因此,难以靠近角落安装,或者使得很难使用具有小弯曲直径的结构(organizer)。而且,密集波分复用(DWDM)系统或粗波分复用(CWDM)通常使用1550nm的波长,并且也使用1600nm的波长,然而,当适用于1550nm波长的现有光纤在1600nm波长处被应用时,模场直径(MFD)和弯曲损耗增加。为了防止由增加的损耗引起的传输特性的恶化,需要使1600nm波长的弯曲损耗等于或小于1550nm波长。
随着弯曲损耗成为一个问题,对改善光纤的结构以减少弯曲损耗的关注日益增加。
现有单模光纤(SMF)需要减小MAC,以基于阶跃折射率(step index,SI)结构改善其结构。MAC是MFD与截止波长的比,并与光纤的折射特性紧密相关。MAC越小,光纤的弯曲损耗越易于改善。
在SI光纤的情况下,通过减小MAC来改善弯曲损耗。不利地,SI光纤与现有光纤之间的MFD存在差异,这导致不兼容。
具有改善的SI结构的光纤的一个实例是凹陷折射率光纤,在这种凹陷折射率光纤中相邻于芯的内包层具有减小的折射率(index)。凹陷折射率光纤一次通过外气相沉积(OVD)工艺,尤其通过气相轴向淀积(VAD)工艺来制造。
具有改善的SI结构的光纤的另一个实例是具有沟槽型折射率分布的光纤,在该沟槽型折射率分布中内包层的折射率与外包层的类似,并且折射率减小位置与芯间隔开适当的距离。沟槽型折射率光纤具有比现有阶跃折射率光纤或凹陷折射率光纤更复杂的结构,并且由此通过内部气相沉积工艺而不是外部气相沉积工艺得以制造,以更易于进行折射率控制。
通常,已知的是凹陷折射率光纤在改善弯曲损耗方面存在限制,因此,其可弯曲直径被限制到大约7.5mm。为了解决这个问题,对具有的改善弯曲损耗的可能性比凹陷折射率光纤高的沟槽型折射率光纤已进行了积极的研究。
例如,提及了US7440663、US7450807、US2007/0280615、JP2009-038371、JP2008-233927、US7505660以及WO08/157341。
具体地,US7440663和US7450807涉及一种沟槽型折射率光纤,并且建议诸如深度、地点等沟槽的条件。
US2007/0280615也涉及一种沟槽型折射率光纤,并且提出使用等离子体形成沟槽结构的氟掺杂技术。
JP2009-038371和JP2008-233927公开了在包层中形成孔以构建沟槽结构,从而改善弯曲损耗。然而,这些技术由于孔形成工艺而使得生产力下降,并且被评价为不适用于批量生产。
US7505660旨在通过使用孔二次光纤设计来确保生产力,并且教导了在包层中创建气泡(bubble),以形成孔。然而,气泡是随意的,这导致在光纤的纵向和周向上的非均匀弯曲特性。而且,必须确保机械可靠性。
WO08/157341涉及一种环二次的光纤,并且建议一种在沟槽结构中包括阻挡层(barrier layer)以去掉高次模(higher order mode)的折射率分布。该沟槽结构是深的,以便改善弯曲损耗并去掉高次模,因而抑制了截止增加。然而,这一技术具有复杂的折射率分布,这使得难以确保再现性,并且不利于批量生产。
为了改善光纤的弯曲特性,近来已进行尝试改善形成在包层上的涂层的树脂材料性能。图1示出光纤的一次结构,包括:芯11,位于光纤的中心;包层12,包围芯11;以及涂层13,形成在包层12上。
通常,通过控制涂层13的模量(modulus)来改善涂层13的树脂材料性能。而且,涂层13的尺寸也是重要的设计因素。典型地,包层12具有125μm的外直径,涂层13具有250μm的外直径。然而,这个光纤结构不适用于现今需求的多芯光缆,并且增加光缆的制造成本。
发明内容
本发明的目的是要提供一种具有小的涂层直径以改善弯曲损耗特性并使体积最小化的弯曲不敏感光纤以及包括该弯曲不敏感光纤的光缆。
技术方案
为了实现该目的,本发明提供一种弯曲不敏感光纤,包括:芯,位于光纤的中心;包层,包围芯且具有比芯低的折射率;涂层,包围包层;以及区域,形成在包层中且具有比包层低的折射率,其中该涂层包括:一次涂层(primary coating),形成在包层上;以及二次涂层(secondary coating),形成在一次涂层上且具有比一次涂层高的模量,涂层具有240μm或更小的总外直径,一次涂层在室温下具有10MPa或更小的模量,二次涂层在室温下具有50至1000MPa的模量,以及涂层具有通过溶胶-凝胶分析测量的90%或更大的固化程度(degree of cure)。
在本发明的另一个方案中,弯曲不敏感光纤可以包括:芯,位于光纤的中心;包层,包围芯且具有比芯低的折射率;涂层,具有包围包层的多层结构且具有240μm或更小的总外直径;以及区域,形成在包层中且具有比包层低的折射率,其中光纤具有在室温下在1550nm波长处通过方平组织(basketweave)测试测量出的0.02dB/km或更小的微弯曲损耗,光纤具有0.1dB/km或更小的双向接头损耗(splice loss),光纤具有18或更大的应力腐蚀参数(Nd),以及相对于室温,光纤在-60℃与85℃之间的温度处具有0.05dB/km或更小的损耗增加。
在本发明的又一个方案中,弯曲不敏感光纤可以包括:芯,位于光纤的中心;包层,包围芯且具有比芯低的折射率;涂层,包围该包层;以及区域,形成在包层中且具有比包层低的折射率,其中该涂层具有多层结构和240μm或更小的总外直径。
优选地,该涂层具有200至240μm的外直径。
该涂层可以包括:一次涂层,形成在包层上;以及二次涂层,形成在一次涂层上且具有比一次涂层高的模量。
优选地,一次涂层在室温下具有10MPa或更小的模量,二次涂层在室温下具有50至1000MPa的模量。
优选地,r1/r2的比率是1比1.5,其中r1是一次涂层的厚度,r2是二次涂层的厚度。
优选地,一次涂层具有-30℃或更低的玻璃化转变温度Tg,二次涂层具有50℃或更高的玻璃化转变温度Tg。
优选地,光纤具有在室温下在1550nm波长处通过方平组织测试测量出的0.02dB/km或更小的微弯曲损耗。
优选地,光纤在1310nm、1550nm以及1625nm波长处具有-30dB或更小的多径干扰(MPI)电平。
而且,本发明提供一种包括弯曲不敏感光纤的弯曲不敏感光缆。
发明的有益效果
具有小的涂层直径的弯曲不敏感光纤可以改善弯曲损耗特性,并使体积最小化。因此,可以实施多芯光缆,并且可以减少制造成本。
附图说明
附图示出本公开文本的优选实施例,并与前述公开内容一起用于提供对本公开文本的技术精神的进一步理解。然而,本公开文本不应被理解为局限于附图。
图1为示出传统光纤的结构的分解透视图。
图2为示出根据本发明的弯曲不敏感光纤的剖视图。
图3为示出可应用于本发明的沟槽型折射率分布的图示。
图4为示出用于尺寸比较的具有根据本发明的弯曲不敏感光纤的光缆和具有现有光纤的光缆的剖视图。
图5为示出根据本发明的示例性实施例的弯曲不敏感光纤和传统光纤的微弯曲特性评估结果的图示。
图6为示出取决于比率r1:r2与一次涂层和二次涂层的模量的室温下的微弯曲特性以及机械特性的表格。
图7为示出具有240μm或更小的小的涂层直径的光纤在室温下的微弯曲特性的表格。
图8为示出具有240μm或更小的小的涂层直径的光纤的双向接头损耗的表格。
具体实施方式
在下文中,将具体描述本发明。在描述之前,应当理解,在说明书和所附的权利要求书中使用的词语不应当被理解为局限于普通含义和词典上的含义,而是基于在为了最佳解释而允许发明人适当定义词语的这一原理的基础上与本发明的技术方案对应的含义和概念来解释。
图2为示出根据本发明的优选实施例的弯曲不敏感光纤的剖视图。
参照图2,根据本发明的优选实施例的弯曲不敏感光纤100包括芯101、包层102以及具有240μm或更小的外直径Da的涂层103。这里,本发明不局限于本文公开和示出的芯101、包层102以及涂层103之间的特定厚度比。
芯101位于光纤100的中心,包层102包围芯101。包层102具有比芯101低的折射率,并且优选具有大约125μm的外直径Da。
包层102设置有折射率比包层102低的区域。该区域优选具有沟槽结构,然而,在这一点上,本发明不受限制。该沟槽区域提供沟槽型折射率分布,如图3所示。
在弯曲不敏感光纤100中,包层102中的沟槽区域在1550nm波长处具有0.02dB/km的弯曲损耗。这种情况下,通过方平组织(basket weave testing)测试来测量微弯曲特性。方平组织测试是根据TIA/EIA TSB62-13标准的微弯曲损耗测试方法之一,并被执行以测量微弯曲损耗,即,当长度为2.5km的光纤在预定张力和线速度条件下被卷绕在具有与该光纤相同特性的石英线轴上时与当该光纤通常被卷绕在线管(spool)上时在1550nm波长处的损耗差。作为参考,当弯曲不敏感光纤100具有SI结构时,弯曲不敏感光纤100在通过方平组织测试测量时,在1550nm波长处具有0.02dB/km或更小的微弯曲损耗。
涂层103包括形成在包层102上的一次涂层和形成在一次涂层上的二次涂层。为了改善光纤的弯曲特性以及满足最小化需求,涂层103被设计为具有最终外直径,即,大约240μm或更小的总外直径Da。通常,如果涂层103的外直径太小,则难以保护光纤免于外部冲击,并且传输损耗在严酷条件下显著增加。因此,涂层103优选具有200μm与240μm之间的外直径Da。
在涂层103中,一次涂层用作缓冲垫(cushion),二次涂层用作阻挡件(blocker)。优选地,一次涂层由模量比二次涂层低的材料形成。而且,一次涂层具有-30℃或更低的玻璃化转变温度Tg,二次涂层具有50℃或更高的玻璃化转变温度Tg。因此,当涂层剂暴露于紫外线时,一次涂层被固化并变软,而二次涂层被固化并变硬。尤其,当满足一次涂层在室温下小于10MPa的模量要求以及二次涂层在室温下处于50MPa至1000MPa范围内的模量要求时,能够提供适于在室温下保护光纤的玻璃芯的柔软度(softness),并能够在施加大约90度的弯曲应力或张力的住宅区中最小化在严酷安装条件下的传输损耗。
优选地,涂层103具有90%或更大的固化程度。这种情况下,通过普通的溶胶-凝胶(sol-gel)分析来分析固化特性,其中光纤被分割成具有预定长度的多个样本,样本被称重并浸入能够溶解涂层的树脂的80℃的四氢呋喃(THF)溶液2个小时,在非固化涂层的树脂被溶解在THF溶液中之后,再次对该样本称重,并且通过涂层的树脂溶解之前和之后的重量差分析固化程度。
如上所述,弯曲不敏感光纤100设置有在包层102中具有相对较低的折射率的区域,并且通过优化涂层103的模量而具有优良的弯曲特性和体积减小(涂层103的外直径Da是240μm或更小)。
为了在弯曲条件下更为有效地减少光纤的光损耗,优选的是满足比率r1/r2是1比1.5的条件,其中一次涂层的厚度是r1,二次涂层的厚度是r2。
根据本发明的优选实施例的弯曲不敏感光纤100具有18或更大的应力腐蚀参数(Nd),以及当通过根据IEC60793-1-33标准的两点弯曲测试在1μm/秒、10μm/秒、100μm/秒以及1000μm/秒测量时具有0.1dB/km或更小的双向接头(splice)损耗。
而且,根据本发明的优选实施例的弯曲不敏感光纤100在-60℃与85℃之间的温度处相对于室温具有0.05dB/km或更小的损耗增加,以及在1310nm、1550nm以及1625nm波长处具有-30dB或更小的多径干扰(MPI)电平。
上文描述的弯曲不敏感光纤100可以通过拉制(draw)经改进的化学气相淀积(MCVD)生产并随后进行涂布的光纤预制品来得以制造。尤其,当生产光纤预制品时,在包层102的形成期间形成一个区域,优选为折射率比包层102低的沟槽区域,并在涂布期间,涂层103的外直径被调整为240μm或更小,同时优化涂层103的模量。
如图4的(a)所示,本发明提供一种包括护套200和插入到护套200中的多个弯曲不敏感光纤100的光缆。如图4的(b)所示,当与包括护套20和相同数量的插入到护套20中的传统光纤10的光缆20相比时,本发明的光缆具有减小的总体积。
具体地,当与涂层的外直径为250μm的传统光纤10相比时,本发明能够实现每芯20%的体积减小,并在相同尺寸的某一微管中容纳1.5倍或更大的更多的芯。
图5为示出根据本发明的示例性实施例的弯曲不敏感光纤的传输损耗的光时域反射仪(OTDR)图。在图5中,每一个峰值表示出现在待测试的光纤的起始端和终止端处的接头损耗,并且能够从两个峰值之间的斜率评估光纤的传输损耗特性。
图5的(a)所示的OTDR图示出具有优良微弯曲特性的光纤在1550nm波长处的损耗,图5的(b)所示的OTDR图示出具有不良弯曲特性的光纤在1550nm波长处的损耗。当弯曲应力被施加到传输光的光纤的特定区域时,光从光纤逃逸出去,并且光功率减小。换句话说,光损耗增加。这是图上的拐点。当涂层103的外直径减小时,传统的光纤不能防止外部冲击,而本发明的弯曲不敏感光纤在相同的弯曲条件下具有小的损耗,如图5的(a)所见。这是因为本发明的弯曲不敏感光纤具有最佳的涂层材料性能,例如模量、一次涂层的厚度相对于二次涂层的厚度的最佳比(其是耐弯曲应力的)以及几何结构。
图6为示出取决于比率r1:r2与一次涂层和二次涂层的模量的室温下的微弯曲特性以及机械特性(尤其是涂层剥离力(C.S.F)和抗层离性(delamination resistance))的表格。这种情况下,施加相同的玻璃化转变温度Tg。当r1:r2是1:1时,且当一次涂层的模量小于10MPa以及二次涂层的模量小于1000MPa时,室温下0.02dB/km或更小的微弯曲损耗得以实现。当r1增加时,微弯曲特性改善,但层离特性比涂层直径为250μm的传统光纤恶化得更加严重。当r2增加时,机械特性改善,但微弯曲特性迅速恶化。优选地,抗层离性等于或是涂层直径为250μm的传统光纤的抗层离性的至少80%。假如传统光纤的抗层离性是400g至500g,则当抗层离性至少处于300g至400g的范围时,其它特性处于良好的水平。
图7为示出具有240μm或更小的小的涂层直径的光纤在室温下的微弯曲特性的表格。室温下方平组织结构与松散缠绕(loose wind)结构之间在1550nm波长处的损耗差ΔMB是0.02dB/km或更小。因此,发现具有240μm或更小的小的涂层直径的光纤确保与具有250μm涂层直径的传统光纤类似的微弯曲特性。
图8为示出具有240μm或更小的小的涂层直径的光纤的双向接头损耗的表格。具有240μm或更小的小的涂层直径的光纤在1310nm和1550nm波长处满足0.1dB/km或更小的双向接头损耗要求。因此,发现具有240μm或更小的小的涂层直径的光纤确保与具有250μm涂层直径的传统光纤类似的接头损耗特性。
在上文中,已具体描述了本发明。然而,应当理解,鉴于从这些详细描述中在本发明的精神和范围内的各种改变和变型对本领域技术人员而言是明显的,因而仅通过示例的方式给出表明本公开文本的优选实施例的详细描述和具体实例。
工业实用性
本发明的弯曲不敏感光纤能够被有效地免于外部冲击,同时实现体积减小,并且在施加大约90度弯曲应力或张力的住宅区中最小化在严酷安装条件下的传输损耗。
Claims (15)
1.一种弯曲不敏感光纤,包括:
芯,位于所述光纤的中心;
包层,包围所述芯,且具有比所述芯低的折射率;
涂层,包围所述包层;以及
区域,形成在所述包层中,且具有比所述包层低的折射率;
其中所述涂层包括:一次涂层,形成在所述包层上;以及二次涂层,形成在所述一次涂层上且具有比所述一次涂层高的模量,以及所述涂层具有240μm或更小的总外直径,
所述一次涂层在室温下具有10MPa或更小的模量,
所述二次涂层在室温下具有50至1000MPa的模量,以及
所述涂层具有通过溶胶-凝胶分析测量的90%或更大的固化程度。
2.一种弯曲不敏感光纤,包括:
芯,位于所述光纤的中心;
包层,包围所述芯,且具有比所述芯低的折射率;
涂层,具有包围所述包层的多层结构,且具有240μm或更小的总外直径;以及
区域,形成在所述包层中,且具有比所述包层低的折射率;其中,
所述光纤具有在室温下在1550nm波长处通过方平组织测试测量出的0.02dB/km或更小的微弯曲损耗,
所述光纤具有0.1dB/km或更小的双向接头损耗,
所述光纤具有18或更大的应力腐蚀参数(Nd),以及
相对于室温,所述光纤在-60℃与85℃之间的温度处具有0.05dB/km或更小的损耗增加。
3.一种弯曲不敏感光纤,包括:
芯,位于所述光纤的中心;
包层,包围所述芯,且具有比所述芯低的折射率;
涂层,包围所述包层;以及
区域,形成在所述包层中,且具有比所述包层低的折射率;其中,
所述涂层具有多层结构和240μm或更小的总外直径。
4.根据权利要求3所述的弯曲不敏感光纤,其中,
所述涂层具有200至240μm的外直径。
5.根据权利要求4所述的弯曲不敏感光纤,其中,
所述涂层包括:一次涂层,形成在所述包层上;以及二次涂层,形成在所述一次涂层上且具有比所述一次涂层高的模量。
6.根据权利要求5所述的弯曲不敏感光纤,其中,
所述一次涂层在室温下具有10MPa或更小的模量,以及
所述二次涂层在室温下具有50至1000MPa的模量。
7.根据权利要求5所述的弯曲不敏感光纤,其中,
r1/r2的比率是1比1.5,其中r1是所述一次涂层的厚度,以及r2是所述二次涂层的厚度。
8.根据权利要求5所述的弯曲不敏感光纤,其中,
所述一次涂层具有-30℃或更低的玻璃化转变温度Tg,以及
所述二次涂层具有50℃或更高的玻璃化转变温度Tg。
9.根据权利要求5所述的弯曲不敏感光纤,其中,
所述光纤具有在室温下在1550nm波长处的通过方平组织测试测量出的0.02dB/km或更小的微弯曲损耗。
10.根据权利要求5所述的弯曲不敏感光纤,其中,
所述涂层具有通过溶胶-凝胶分析所获得的90%或更大的固化程度。
11.根据权利要求5所述的弯曲不敏感光纤,其中,
所述光纤具有18或更大的应力腐蚀参数(Nd)。
12.根据权利要求5所述的弯曲不敏感光纤,其中,
所述光纤具有0.1dB/km或更小的双向接头损耗。
13.根据权利要求5所述的弯曲不敏感光纤,其中,
相对于室温,所述光纤在-60℃与85℃之间的温度处具有0.05dB/km或更小的损耗增加。
14.根据权利要求5所述的弯曲不敏感光纤,其中,
所述光纤在1310nm、1550nm以及1625nm波长处具有-30dB或更小的多径干扰(MPI)电平。
15.一种弯曲不敏感光缆,包括根据权利要求3至14任一项所述的弯曲不敏感光纤。
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Also Published As
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KR20120093605A (ko) | 2012-08-23 |
US20130330050A1 (en) | 2013-12-12 |
KR101920934B1 (ko) | 2018-11-22 |
WO2012111959A3 (en) | 2012-11-29 |
WO2012111959A2 (en) | 2012-08-23 |
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