CN103336390B - Chock insulator matter and preparation method thereof, substrate and display device - Google Patents
Chock insulator matter and preparation method thereof, substrate and display device Download PDFInfo
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- CN103336390B CN103336390B CN201310250193.1A CN201310250193A CN103336390B CN 103336390 B CN103336390 B CN 103336390B CN 201310250193 A CN201310250193 A CN 201310250193A CN 103336390 B CN103336390 B CN 103336390B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a kind of chock insulator matter and preparation method thereof, substrate and display device, belong to display technique field.Wherein, the method for making of this chock insulator matter comprises: on substrate, form the photosensitive material thin film for making chock insulator matter, includes nonwettable first transparent polymer or monomer whose with described substrate in described photosensitive material; Exposure imaging is carried out to described photosensitive material thin film, forms the chock insulator matter figure of multiple different size on the substrate; Heat under preset temperature the substrate being formed with chock insulator matter figure, then cool, make described chock insulator matter figure convex to form chock insulator matter, wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.By technical scheme of the present invention, the aperture opening ratio of display device can be increased, and can production cost be reduced.
Description
Technical field
The present invention relates to display technique field, be specifically related to a kind of chock insulator matter and preparation method thereof, substrate and display device.
Background technology
TFT LCD(Thin Film Transistor Liquid Crystal Display, Thin Film Transistor-LCD) display panel be usually made up of array base palte, liquid crystal layer and color membrane substrates, in order to control thickness and the homogeneity thereof of liquid crystal layer, usually on color membrane substrates or array base palte, chock insulator matter (Post Spacer, PS) is formed to ensure that liquid crystal cell is thick.
In prior art, the normal crylic acid resin mixture solution that adopts prepares chock insulator matter, the principal ingredient of crylic acid resin mixture solution is acryl resin or acryl resin monomer and light trigger etc., crylic acid resin mixture solution is light sensitive material, crylic acid resin mixture solution is coated on substrate, can form chock insulator matter through techniques such as exposure imagings, chock insulator matter is preferably formed with multiple height to realize better support effect.
In order to form the chock insulator matter of multiple height, need to use intermediate tone mask plate or gray tone mask plate (Half-tone mask) to expose.To adopt intermediate tone mask plate or gray tone mask board to explosure, as shown in (a) of Fig. 1, substrate 3 is coated with crylic acid resin mixture solution 2, Half-tone mask1 includes lightproof part, partial light permeability part and full light transmission part, after utilizing this mask plate to expose, as shown in (b) of Fig. 1, because illumination is different, and cause the section of appearance on crylic acid resin potpourri poor, then as shown in (c) of Fig. 1, the place that substrate 3 is blocked by lightproof part is not owing to being irradiated by light, crylic acid resin potpourri is above removed after development, the place that substrate 3 is irradiated by light, because the light intensity of the beam intensity ratio partial light permeability part of full light transmission part is large, the Thickness Ratio of the crylic acid resin potpourri therefore retained after development is larger, can height of formation is larger on the substrate of the full light transmission part of correspondence main chock insulator matter 4, the auxiliary chock insulator matter 5 that height of formation is less on the substrate of corresponding part light transmission part.
The method for making of existing chock insulator matter needs to utilize intermediate tone mask plate or gray tone mask plate to expose, and adds the complicacy of technique, improves production cost; And by the impact of exposure accuracy, the size of chock insulator matter is all larger, causes the aperture opening ratio of display panel less, adds backlight cost.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of chock insulator matter and preparation method thereof, substrate and display device, can increase the aperture opening ratio of display device, and can reduce production cost.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme as follows:
On the one hand, a kind of method for making of chock insulator matter is provided, comprises:
Substrate being formed the photosensitive material thin film for making chock insulator matter, in described photosensitive material, including nonwettable first transparent polymer or monomer whose with described substrate;
Exposure imaging is carried out to described photosensitive material thin film, forms the chock insulator matter figure of multiple different size on the substrate;
Heat under preset temperature the substrate being formed with chock insulator matter figure, then cool, make described chock insulator matter figure convex to form chock insulator matter, wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
Further, in above-mentioned method for making, the described photosensitive material thin film formed on substrate for making chock insulator matter comprises:
Substrate is coated with photosensitive material solution and forms described photosensitive material thin film, in described photosensitive material solution, include light trigger, the first transparent polymer or monomer whose.
Further, in above-mentioned method for making, also include in described photosensitive material solution and there is with described first transparent polymer not wellability have infiltrating second transparent polymer or monomer whose with described substrate.
Further, in above-mentioned method for making, described second transparent polymer is acrylic resin.
Further, in above-mentioned method for making, described preset temperature is greater than the glass transition temperature of described first transparent polymer.
Further, in above-mentioned method for making, the surface energy of described first transparent polymer and monomer whose is 5-50dynes/cm.
Further, in above-mentioned method for making, described first transparent polymer is styrene resin.
Further, in above-mentioned method for making, the described substrate to being formed with chock insulator matter figure heats, and makes described chock insulator matter figure convex to form chock insulator matter and comprises:
The substrate being formed with chock insulator matter figure is heated 10s-1800s in the temperature of 150-300 degree Celsius.
Preferably, can heat described substrate under vacuum conditions.
The embodiment of the present invention additionally provides a kind of chock insulator matter, makes for adopting above-mentioned method for making.
The embodiment of the present invention additionally provides a kind of substrate, has the chock insulator matter adopting above-mentioned method for making to make.
The embodiment of the present invention additionally provides a kind of display device, comprises substrate as above.
Embodiments of the invention have following beneficial effect:
In such scheme, the chock insulator matter figure that exposure imaging forms different size on substrate is carried out to photosensitive material thin film, afterwards substrate is heated, the at high temperature molecule setting in motion of the first transparent polymer or monomer whose, because the first transparent polymer and monomer whose and substrate do not infiltrate, according to surface energy minimum principle, in order to form stable structure, chock insulator matter figure will convex to form chock insulator matter, chock insulator matter size in the horizontal direction can be reduced like this, thus be conducive to the aperture opening ratio increasing display device; And technical scheme of the present invention can realize by the chock insulator matter figure forming different size the chock insulator matter forming differing heights, intermediate tone mask plate or gray tone mask plate need not be adopted to expose, reduce the complicacy of technique, can reduce production cost.
Accompanying drawing explanation
Fig. 1 adopts intermediate tone mask board to explosure to form the schematic diagram of main chock insulator matter and auxiliary chock insulator matter in prior art;
Fig. 2 is the schematic diagram of the method for making of embodiment of the present invention chock insulator matter.
Reference numeral
1 intermediate tone mask plate 2 crylic acid resin mixture solution 3 substrate
4 main chock insulator matter 5 auxiliary chock insulator matter 6 photosensitive material thin film
7 styrene resin chock insulator matter 8 chock insulator matter figures
Embodiment
For embodiments of the invention will be solved technical matters, technical scheme and advantage clearly, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
Following problems is there is: need to utilize intermediate tone mask plate or gray tone mask plate to expose, add the complicacy of technique, improve production cost in the method for making of existing chock insulator matter; And by the impact of exposure accuracy, the size of chock insulator matter is all larger, causes the aperture opening ratio of display panel less, adds backlight cost.Embodiments of the invention provide a kind of chock insulator matter and preparation method thereof, substrate and display device for the problems referred to above in the method for making of existing chock insulator matter, can increase the aperture opening ratio of display device, and can reduce production cost.
Embodiments provide a kind of method for making of chock insulator matter, comprising:
Substrate being formed the photosensitive material thin film for making chock insulator matter, in described photosensitive material, including nonwettable first transparent polymer or monomer whose with described substrate;
Exposure imaging is carried out to described photosensitive material thin film, forms the chock insulator matter figure of multiple different size on the substrate;
Heat under preset temperature the substrate being formed with chock insulator matter figure, then cool, make described chock insulator matter figure convex to form chock insulator matter, wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
The method for making of chock insulator matter of the present invention, the chock insulator matter figure that exposure imaging forms different size on substrate is carried out to photosensitive material thin film, afterwards substrate is heated, the at high temperature molecule setting in motion of the first transparent polymer or monomer whose, because the first transparent polymer and monomer whose and substrate do not infiltrate, according to surface energy minimum principle, in order to form stable structure, chock insulator matter figure will convex to form chock insulator matter, chock insulator matter size in the horizontal direction can be reduced like this, thus be conducive to the aperture opening ratio increasing display device; And technical scheme of the present invention can realize by the chock insulator matter figure forming different size the chock insulator matter forming differing heights, intermediate tone mask plate or gray tone mask plate need not be adopted to expose, reduce the complicacy of technique, can reduce production cost.
Particularly, in above-mentioned method for making, the described photosensitive material thin film formed on substrate for making chock insulator matter comprises:
Substrate is coated with (spin coating or blade coating) one deck photosensitive material solution and forms described photosensitive material thin film, include light trigger in described photosensitive material solution, and include the first transparent polymer or monomer whose.
Further, also can include in described photosensitive material solution and there is with described first transparent polymer not wellability have infiltrating second transparent polymer or monomer whose with described substrate, the chock insulator matter figure of such formation is by the first transparent polymer or monomer whose, second transparent polymer or monomer whose composition, the at high temperature molecule setting in motion of the first transparent polymer or monomer whose, because the first transparent polymer and monomer whose and the second transparent polymer and monomer whose have not wellability, according to surface energy minimum principle, in order to form stable structure, the first transparent polymer wherein or monomer whose will be protruding, also the second transparent polymer or monomer whose can be driven to have certain projection, chock insulator matter size in the horizontal direction can be reduced like this, thus be conducive to the aperture opening ratio increasing display device.
Wherein, described preset temperature needs the glass transition temperature being greater than described first transparent polymer, so just can impel the molecule setting in motion of the first transparent polymer or monomer whose.In order to ensure that the first transparent polymer or monomer whose can form protruding chock insulator matter, the surface energy of described first transparent polymer and monomer whose is 5-50dynes/cm.
Particularly, described second transparent polymer can be commonly used to for existing the acryl resin making chock insulator matter, described first transparent polymer can for have not infiltrating styrene resin with acryl resin, the described substrate to being formed with chock insulator matter figure heats, and makes described chock insulator matter figure convex to form chock insulator matter and is specially:
The substrate being formed with chock insulator matter figure is heated 10s-1800s in the temperature of 150-300 degree Celsius, preferably heats in a vacuum, after the heating, the substrate being formed with chock insulator matter is cooled to room temperature, get final product the making of chock insulator matter on completing substrate.
The embodiment of the present invention additionally provides a kind of chock insulator matter, makes for adopting above-mentioned method for making.
The embodiment of the present invention additionally provides a kind of substrate, has the chock insulator matter adopting above-mentioned method for making to make.Described substrate can be, but not limited to as array base palte, color membrane substrates etc.
The embodiment of the present invention additionally provides a kind of display device, comprises substrate as above.The structure of other parts of display device with reference to prior art, can be not described in detail this herein.This display device can be display panels, Electronic Paper, OLED(Organic Light Emitting Diode, Organic Light Emitting Diode) panel, LCD TV, liquid crystal display, digital album (digital photo frame), mobile phone, panel computer etc. have product or the parts of any Presentation Function, as long as the substrate of display device needs to arrange chock insulator matter.
Below in conjunction with accompanying drawing and specific embodiment, the method for making to chock insulator matter of the present invention describes in detail:
Embodiment one
The present embodiment can be implemented in chock insulator matter substrate being formed multiple differing heights, and wherein substrate can be array base palte or color membrane substrates.The present embodiment specifically comprises the following steps:
Step a1: form photosensitive material solution, the principal ingredient of photosensitive material solution is the first transparent polymer or monomer whose, light trigger, wherein, first transparent polymer and monomer whose and substrate do not infiltrate, the molecular weight ranges of the first transparent polymer can be several thousand to 1,000,000, particularly, the first transparent polymer can select styrene resin;
Step a2: the spin coating of photosensitive material solution or blade coating are formed one deck photosensitive material thin film on substrate, wherein, can be realized the size reducing chock insulator matter by the thickness controlling photosensitive material thin film, the thickness of photosensitive material thin film is less, and the size of the chock insulator matter finally formed is also less;
Step a3: carry out exposure imaging to the photosensitive material thin film on substrate, substrate is formed the chock insulator matter figure of multiple different size, in this step, adopts monotone mask board to explosure, reduces the complicacy of technique, can reduce production cost.Wherein, the size of chock insulator matter figure is determined by the resolution of exposure machine, by several microns to some tens of pm not etc.;
Step a4: the substrate being formed with chock insulator matter figure is heated, heating-up temperature need be greater than the glass transition temperature of styrene resin, particularly, 10s-1800s can be heated at the temperature of 150-300 DEG C, preferably in a vacuum substrate is heated, the impact of outer bound pair chock insulator matter can be avoided like this, reduce the impurity in chock insulator matter.At high temperature, the molecular motion of styrene resin starts, because styrene resin and substrate do not infiltrate, interfacial energy is each other comparatively large, according to surface energy minimum principle, in order to form stable structure, chock insulator matter figure will convex to form chock insulator matter, the chock insulator matter figure of different size will form the chock insulator matter of differing heights, and the size of chock insulator matter figure is larger, and the height of the chock insulator matter of formation is larger;
Step a5: cool the substrate being formed with chock insulator matter, be preferably cooled to room temperature in a vacuum, can complete the making of chock insulator matter, obtains the substrate being formed with chock insulator matter.
Due to the principle of mass conservation, the increase of chock insulator matter pattern height will cause the reduction of size in its horizontal direction, greatly can reduce the size of the last chock insulator matter formed, thus is conducive to the aperture opening ratio increasing display device.The present embodiment can control the height of chock insulator matter by the size controlling chock insulator matter figure, the chock insulator matter of multiple height can be formed on substrate, and monotone mask board to explosure only need be adopted can to realize the making of chock insulator matter, the complicacy of technique can be reduced, reduce production cost.
Embodiment two
The present embodiment can be implemented in chock insulator matter substrate being formed multiple differing heights, and wherein substrate can be array base palte or color membrane substrates.The present embodiment specifically comprises the following steps:
Step b1: form photosensitive material solution, existing be used for preparing in the crylic acid resin mixture solution of chock insulator matter add the first transparent polymer or monomer whose forms photosensitive material solution, wherein, first transparent polymer and acryl resin do not infiltrate mutually, the molecular weight ranges of the first transparent polymer can be several thousand to 1,000,000, particularly, the first transparent polymer can select styrene resin;
Step b2: as shown in (a) of Fig. 2, the spin coating of photosensitive material solution or blade coating are formed one deck photosensitive material thin film 6 on the substrate 3, wherein, the size reducing chock insulator matter can be realized by the thickness controlling photosensitive material thin film, the thickness of photosensitive material thin film is less, and the size of the chock insulator matter finally formed is also less;
Step b3: as shown in (b) of Fig. 2, carries out exposure imaging to the photosensitive material thin film 6 on substrate 3, substrate is formed the chock insulator matter figure 8 of multiple different size, in this step, adopt monotone mask board to explosure, reduce the complicacy of technique, can production cost be reduced.Wherein, the size of chock insulator matter figure 8 is determined by the resolution of exposure machine, by several microns to some tens of pm not etc.;
Step b4: the substrate 3 being formed with chock insulator matter figure 8 is heated, heating-up temperature need be greater than the glass transition temperature of styrene resin, particularly, 10s-1800s can be heated at the temperature of 150-300 DEG C, preferably in a vacuum substrate is heated, the impact of outer bound pair chock insulator matter can be avoided like this, reduce the impurity in chock insulator matter.At high temperature, the molecular motion of styrene resin and monomer whose starts, because styrene resin and acryl resin have not wellability, interfacial energy is each other larger, according to surface energy minimum principle, in order to form stable structure, styrene resin in chock insulator matter figure 8 and monomer whose will be protruding, and acryl resin and substrate have wellability, the styrene resin chock insulator matter 7 finally formed is as shown in (c) of Fig. 2, the chock insulator matter figure of different size will form the chock insulator matter of differing heights, the size of chock insulator matter figure is larger, the height of the chock insulator matter formed is larger,
Step b5: cool the substrate being formed with chock insulator matter, be preferably cooled to room temperature in a vacuum, can complete the making of chock insulator matter, obtains the substrate being formed with chock insulator matter.
The projection of styrene resin and monomer whose, also acryl resin and monomer whose can be driven to have certain projection, due to the principle of mass conservation, the increase of chock insulator matter pattern height will cause the reduction of size in its horizontal direction, the last chock insulator matter size in the horizontal direction formed can be reduced like this, thus be conducive to the aperture opening ratio increasing display device.The present embodiment can control the height of chock insulator matter by the size controlling chock insulator matter figure, the chock insulator matter of multiple height can be formed on substrate, and monotone mask board to explosure only need be adopted can to realize the making of chock insulator matter, the complicacy of technique can be reduced, reduce production cost.
In above-described embodiment, one or both transparent polymers are included in photosensitive material solution, further, two or more transparent polymers can also be included in photosensitive material solution, as long as meet a kind of transparent polymer wherein and other transparent polymers and substrate not infiltrate, in actual production process, in order to reduce the complicacy of technique, generally, photosensitive material solution comprises one or both transparent polymers.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the prerequisite not departing from principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (12)
1. a method for making for chock insulator matter, is characterized in that, comprising:
Substrate being formed the photosensitive material thin film for making chock insulator matter, in described photosensitive material, including nonwettable first transparent polymer or monomer whose with described substrate;
Exposure imaging is carried out to described photosensitive material thin film, forms the chock insulator matter figure of multiple different size on the substrate;
Heat under preset temperature the substrate being formed with chock insulator matter figure, then cool, make described chock insulator matter figure convex to form chock insulator matter, wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
2. the method for making of chock insulator matter according to claim 1, is characterized in that, the described photosensitive material thin film formed on substrate for making chock insulator matter comprises:
Substrate is coated with photosensitive material solution and forms described photosensitive material thin film, include light trigger in described photosensitive material solution, and include the first transparent polymer or monomer whose.
3. the method for making of chock insulator matter according to claim 2, is characterized in that, also includes and have not wellability have infiltrating second transparent polymer or monomer whose with described substrate with described first transparent polymer in described photosensitive material solution.
4. the method for making of chock insulator matter according to claim 3, is characterized in that, described second transparent polymer is acrylic resin.
5. the method for making of chock insulator matter according to claim 1, is characterized in that, described preset temperature is greater than the glass transition temperature of described first transparent polymer.
6. the method for making of chock insulator matter according to claim 1, is characterized in that, the surface energy of described first transparent polymer and monomer whose is 5-50dynes/cm.
7. the method for making of chock insulator matter according to claim 1, is characterized in that, described first transparent polymer is styrene resin.
8. the method for making of chock insulator matter according to claim 7, is characterized in that, the described substrate to being formed with chock insulator matter figure heats, and makes described chock insulator matter figure convex to form chock insulator matter and comprises:
The substrate being formed with chock insulator matter figure is heated 10s-1800s in the temperature of 150-300 degree Celsius.
9. the method for making of chock insulator matter according to claim 8, is characterized in that, heats under vacuum conditions to described substrate.
10. a chock insulator matter, is characterized in that, makes for adopting method for making as claimed in any one of claims 1-9 wherein.
11. 1 kinds of substrates, is characterized in that, have the chock insulator matter adopting the method for making described in any one of claim 1-9 to make.
12. 1 kinds of display device, is characterized in that, comprise substrate as claimed in claim 11.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310250193.1A CN103336390B (en) | 2013-06-21 | 2013-06-21 | Chock insulator matter and preparation method thereof, substrate and display device |
| PCT/CN2013/080790 WO2014201754A1 (en) | 2013-06-21 | 2013-08-05 | Spacer manufacturing method, substrate, display apparatus, and electronic product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310250193.1A CN103336390B (en) | 2013-06-21 | 2013-06-21 | Chock insulator matter and preparation method thereof, substrate and display device |
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| Publication Number | Publication Date |
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| CN103336390A CN103336390A (en) | 2013-10-02 |
| CN103336390B true CN103336390B (en) | 2015-09-09 |
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| WO (1) | WO2014201754A1 (en) |
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| CN105549273A (en) * | 2016-02-03 | 2016-05-04 | 京东方科技集团股份有限公司 | Spacer making method, substrate, display panel and display device |
| CN108983504A (en) | 2017-05-31 | 2018-12-11 | 京东方科技集团股份有限公司 | Liquid crystal display panel and its manufacturing method, liquid crystal display |
| JP6821046B2 (en) * | 2017-09-29 | 2021-01-27 | 富士フイルム株式会社 | Circuit wiring manufacturing method and touch panel manufacturing method |
| CN109243304B (en) * | 2018-08-07 | 2021-06-29 | 苏州星烁纳米科技有限公司 | Display panel and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1841193A (en) * | 2005-03-15 | 2006-10-04 | Jsr株式会社 | X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same |
| CN1950751A (en) * | 2004-05-06 | 2007-04-18 | Jsr株式会社 | Radiation-sensitive resin composition, spacer, and method of forming the same |
| CN101416103A (en) * | 2006-04-06 | 2009-04-22 | 日立化成工业株式会社 | Ink for forming liquid crystal spacer and liquid crystal display device using such ink |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006284976A (en) * | 2005-04-01 | 2006-10-19 | Jsr Corp | Radiation-sensitive resin composition, protrusion and spacer formed of the same, and liquid crystal display element equipped with them |
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- 2013-06-21 CN CN201310250193.1A patent/CN103336390B/en active Active
- 2013-08-05 WO PCT/CN2013/080790 patent/WO2014201754A1/en active Application Filing
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1950751A (en) * | 2004-05-06 | 2007-04-18 | Jsr株式会社 | Radiation-sensitive resin composition, spacer, and method of forming the same |
| CN1841193A (en) * | 2005-03-15 | 2006-10-04 | Jsr株式会社 | X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same |
| CN101416103A (en) * | 2006-04-06 | 2009-04-22 | 日立化成工业株式会社 | Ink for forming liquid crystal spacer and liquid crystal display device using such ink |
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| CN103336390A (en) | 2013-10-02 |
| WO2014201754A1 (en) | 2014-12-24 |
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