CN103317430A - Anti-collision suspended polishing device - Google Patents

Anti-collision suspended polishing device Download PDF

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Publication number
CN103317430A
CN103317430A CN2013101971287A CN201310197128A CN103317430A CN 103317430 A CN103317430 A CN 103317430A CN 2013101971287 A CN2013101971287 A CN 2013101971287A CN 201310197128 A CN201310197128 A CN 201310197128A CN 103317430 A CN103317430 A CN 103317430A
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China
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permanent
ring
basal disc
suspension
magnetic clamp
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CN2013101971287A
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Chinese (zh)
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CN103317430B (en
Inventor
张利
金明生
单晓杭
孙建辉
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Outbay Tianjin Robot Co ltd
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Zhejiang University of Technology ZJUT
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

An anti-collision suspended polishing device comprises a machine base, a suspended basic disc, a grinding disc and a correction ring. The suspended basic disc is connected with a pressurizing assembly, the suspended basic disc is clamped in the corrosion ring which is installed on the grinding disc, the grinding disc rotates around a fixed center axis through a main driver, wedge-shaped grooves and positioning work positions for placing workpiece to be processed are formed in corresponding surfaces of the suspended basic disc and the grinding disc along the circumferential direction, polishing liquid is full of the wedge-shaped grooves, and the wedge-shaped grooves and the processing work positions are arranged at intervals. The polishing device further comprises a first permanent magnet ring and a second permanent magnet ring, the first permanent magnet ring is sleeved on the outer side of the suspended basic disc, the second permanent magnet ring is sleeved on the inner surface of the connection ring, a gap is reserved between the first permanent magnet ring and the second permanent ring, and the magnetism of an outer ring of the first permanent magnet ring is the same as that of an inner ring of the second permanent magnet ring. The anti-collision polishing device is stable to grind, small in surface damage and high in quality.

Description

Anticollision suspension polishing device
Technical field
The present invention relates to a kind of polishing field, especially a kind of suspension polishing device.
Background technology
Substrate is indispensable material in the noncrystalline membrane preparation process, and substrate character will have a strong impact on the surface topography of noncrystal membrane, and the alloy firm of thin in order to obtain, flawless and good adhesion requires substrate to have the super-smooth surface of few damage.Keep away the impact of the factor effects on surfaces such as the damage of model machine tool, pollution, oxidation, excessive corrosion, so traditional chemical Mechanical Polishing Technique not exclusively is applicable to the Ultraprecise polished of noncrystalline membrane substrate.
Fluid polishing has now become one of important means of obtaining super-smooth surface, compare with the polishing of rigidity contact, the contact condition of abrasive particle and surface of the work is soft contact, both can by the contour that promotes abrasive machining obtain more the super-smooth surface of low roughness, the contact condition that can improve again abrasive particle and surface of the work obtains less undamaged processing effect.According to the specification requirement of noncrystalline membrane substrate preparation, suspension polishing has obvious advantage with present common fluid polishing.Be that 201210140631.4 " but suspension basal disc burnishing device of active drive " just announced a kind of affected layer less thick that makes such as number of patent application, but can obtain again the suspension basal disc burnishing device of the active drive of higher surface quality simultaneously, this device is on 200910153716.4 " the conditioning ring driving mechanism of active drive lapping device " basis at number of patent application, adopt the suspension basal disc to be provided with the design of wedge-shaped slot at circumference, use hydrodynamics phenomenon and powder effect, so that polishing particles and surface of the work soft contact.But through evidence, there is following problem in this equipment:
This device is to drive conditioning ring by active driving device; the suspension basal disc is stuck in the conditioning ring; pressurize by counterweight in suspension basal disc top; owing to only having frictional constraint between suspension basal disc and the conditioning ring; the suspension basal disc of High Rotation Speed rotates steadily will not cause collision; stuck; the phenomenons such as inclination; thereby affect the polished surface quality; on the other hand, counterweight is as pressue device, and well controlled pressure is big or small; precision is not high; under the initial and halted state, the Hydrodynamic of suspension basal disc wedge-shaped slot generation is little, and workpiece easily is crushed on the abrasive disk; particle can produce the damage layer to the workpiece effect in the polishing fluid, has affected greatly the internal performance of machined material.
Summary of the invention
In order to overcome the deficiency that prior art is ground not steadily, surface quality is not high, the invention provides a kind of anticollision suspension polishing device steady, that the little quality of surface damage is high that grinds.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of anticollision suspension polishing device, comprise support, suspension basal disc, abrasive disk and conditioning ring, described suspension basal disc is connected with pressure-applying unit, described suspension basal disc is installed in the conditioning ring, described conditioning ring is installed on the abrasive disk, described abrasive disk rotates around the fixed center axis by master driver, described suspension basal disc and abrasive disk opposite face are provided with wedge-shaped slot and in the circumferential direction of the circle in order to place the processing stations of workpiece to be processed, be full of polishing fluid in the described wedge-shaped slot, described wedge-shaped slot and processing stations interval arrange; Described burnishing device also comprises the first permanent-magnetic clamp and the second permanent-magnetic clamp, described the first permanent-magnetic clamp is sleeved on suspension basal disc outer surface, described the second permanent-magnetic clamp is sleeved on the conditioning ring inner surface, exist between permanent-magnetic clamp and the second permanent-magnetic clamp described for the first time gap and the first permanent-magnetic clamp outer ring and the second permanent-magnetic clamp inner ring Magnetic Phase with.
Further, described pressure-applying unit is the electromagnetism pressure-applying unit, and described electromagnetism pressure-applying unit comprises electromagnet and pressure sensor, and described electromagnet is fixed on the support and is concentric with the suspension basal disc, between described electromagnet and the support pressure sensor is installed, described suspension basal disc is ferromagnet.
Technical conceive of the present invention is: suspension basal disc and abrasive disk opposite face are provided with a plurality of wedge-shaped slots in the circumferential direction of the circle, be full of polishing fluid between suspension basal disc and the abrasive disk, be to be full of polishing fluid in the described wedge-shaped slot, processing work is affixed on the suspension basal disc with on the plane of wedge-shaped slot and do not affect wedge-shaped slot, under the original state, the suspension basal disc is adsorbed by electromagnet, abrasive disk rotates with main shaft, magnet control suspension basal disc slowly contacts with polishing fluid, there is relative motion between suspension basal disc and the abrasive disk, the Hydrodynamic that wedge-shaped slot produces is so that basal disc floats a height H, become the soft collision of polishing particles thereby the particle in the polishing fluid does not have powerful rigidity contact when polishing workpiece, and then reduced the damage of workpiece.
The suspension basal disc is ferromagnet, and described ferromagnet refers to produce the material of the strong complementary field identical with external magnetic field under magnetic fields, and described ferromagnet comprises iron-cobalt-nickel etc.The electromagnet of belt coil can change by the size that change passes into electric current the size and Orientation of magnetic force, controlling described suspension basal disc slowly is placed on the abrasive disk with polishing fluid, strong sensor is installed between electromagnet and the support, can accurately measure the size of power between electromagnet and the suspension basal disc, adopt computer closed loop control, exerted pressure accurately, solved and loaded uncontrollable because of counterweight, wear and tear thereby when Hydrodynamic does not also form, cause between workpiece and the abrasive disk, affect the problem of quality of finish.
Utilize electromagnetism there is a natural attraction between the sexes the principle of two like magnetic poles repel each other, at suspension basal disc outer ring and conditioning ring inner ring suit permanent-magnetic clamp, so that be not in contact with one another between suspension basal disc and the conditioning ring, avoided collision, the phenomenon such as stuck.
Beneficial effect of the present invention is mainly manifested in: accurately pressurization, grind steadily, the little quality of surface damage is high.
Description of drawings
Fig. 1 is anticollision suspension polishing device schematic diagram.
Fig. 2 is suspension basal disc schematic diagram.
The specific embodiment
The invention will be further described below in conjunction with accompanying drawing.
See figures.1.and.2, a kind of anticollision suspension polishing device, comprise support 7, suspension basal disc 3, abrasive disk 1 and conditioning ring 5, described suspension basal disc 3 is connected with pressure-applying unit, described suspension basal disc 3 is installed in the conditioning ring 5, described conditioning ring 5 is installed on the abrasive disk 1, described abrasive disk 1 rotates around the fixed center axis by master driver 11, described suspension basal disc 3 is provided with wedge-shaped slot 12 with abrasive disk 1 opposite face and in the circumferential direction of the circle in order to place the processing stations of workpiece to be processed, be full of polishing fluid in the described wedge-shaped slot 12, described wedge-shaped slot 12 and processing stations interval arrange; Described burnishing device also comprises the first permanent-magnetic clamp 9 and the second permanent-magnetic clamp 4, described the first permanent-magnetic clamp 9 is sleeved on suspension basal disc 3 outer surfaces, described the second permanent-magnetic clamp 4 is sleeved on conditioning ring 5 inner surfaces, exist between permanent-magnetic clamp 9 and the second permanent-magnetic clamp 4 described for the first time gap and the first permanent-magnetic clamp outer ring and the second permanent-magnetic clamp inner ring Magnetic Phase with.
Further, described pressure-applying unit is the electromagnetism pressure-applying unit, described electromagnetism pressure-applying unit comprises electromagnet 6 and pressure sensor 8, described electromagnet 6 is fixed on the support 7 and is concentric with suspension basal disc 3, between described electromagnet 6 and the support 7 pressure sensor 8 is installed, described suspension basal disc 3 is ferromagnet.
In the present embodiment, described suspension basal disc 3 is provided with a plurality of wedge-shaped slots 12 in the circumferential direction of the circle with abrasive disk 1 opposite face, is full of polishing fluid in the described wedge-shaped slot 12, and described processing work 13 is affixed on suspension basal disc 3 with on the plane of wedge-shaped slot and do not affect wedge-shaped slot.
Under the original state, described suspension basal disc 3 is adsorbed on the electromagnet 6 and does not contact with abrasive disk 1, described abrasive disk 1 begins to rotate around central axis, described power sensor 8 can accurately obtain the size of electromagnet 6 and suspension basal disc 3 Interaction Forces, pass through again computer closed loop control, adjustment passes into the size and Orientation of electromagnet 6 coil currents, controls described suspension basal disc 3 and slowly is placed on the abrasive disk 1 with polishing fluid 2, and apply the required pressure size of polishing.

Claims (2)

1. anticollision suspension polishing device, comprise support, suspension basal disc, abrasive disk and conditioning ring, described suspension basal disc is connected with pressure-applying unit, described suspension basal disc is installed in the conditioning ring, described conditioning ring is installed on the abrasive disk, described abrasive disk rotates around the fixed center axis by master driver, described suspension basal disc and abrasive disk opposite face are provided with wedge-shaped slot and in the circumferential direction of the circle in order to place the processing stations of workpiece to be processed, be full of polishing fluid in the described wedge-shaped slot, described wedge-shaped slot and processing stations interval arrange; It is characterized in that: described burnishing device also comprises the first permanent-magnetic clamp and the second permanent-magnetic clamp, described the first permanent-magnetic clamp is sleeved on suspension basal disc outer surface, described the second permanent-magnetic clamp is sleeved on the conditioning ring inner surface, exist between permanent-magnetic clamp and the second permanent-magnetic clamp described for the first time gap and the first permanent-magnetic clamp outer ring and the second permanent-magnetic clamp inner ring Magnetic Phase with.
2. anticollision suspension polishing device as claimed in claim 1, it is characterized in that: described pressure-applying unit is the electromagnetism pressure-applying unit, described electromagnetism pressure-applying unit comprises electromagnet and pressure sensor, described electromagnet is fixed on the support and is concentric with the suspension basal disc, between described electromagnet and the support pressure sensor is installed, described suspension basal disc is ferromagnet.
CN201310197128.7A 2013-05-22 2013-05-22 Anticollision suspension polishing device Active CN103317430B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108705411A (en) * 2018-05-29 2018-10-26 昆明理工大学 A kind of pressure adjustable floats off burnishing device
CN108705411B (en) * 2018-05-29 2024-05-28 昆明理工大学 Pressure-adjustable floating polishing device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102975112A (en) * 2012-12-24 2013-03-20 厦门大学 Online controllable polishing device
CN103079767A (en) * 2010-08-18 2013-05-01 Lg化学株式会社 Polishing pad for a polishing system
CN103100970A (en) * 2013-01-31 2013-05-15 西安工业大学 Rotating sealing device capable of polishing with air
WO2013119261A1 (en) * 2012-02-09 2013-08-15 Duescher Wayne O Coplanar alignment apparatus for rotary spindles
CN203266380U (en) * 2013-05-22 2013-11-06 浙江工业大学 Anti-collision suspension polishing device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103079767A (en) * 2010-08-18 2013-05-01 Lg化学株式会社 Polishing pad for a polishing system
WO2013119261A1 (en) * 2012-02-09 2013-08-15 Duescher Wayne O Coplanar alignment apparatus for rotary spindles
CN102975112A (en) * 2012-12-24 2013-03-20 厦门大学 Online controllable polishing device
CN103100970A (en) * 2013-01-31 2013-05-15 西安工业大学 Rotating sealing device capable of polishing with air
CN203266380U (en) * 2013-05-22 2013-11-06 浙江工业大学 Anti-collision suspension polishing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108705411A (en) * 2018-05-29 2018-10-26 昆明理工大学 A kind of pressure adjustable floats off burnishing device
CN108705411B (en) * 2018-05-29 2024-05-28 昆明理工大学 Pressure-adjustable floating polishing device

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Effective date of registration: 20191210

Address after: 314300 room 241, building 1, new economy Pioneer Park, Tongyuan Town, Haiyan County, Jiaxing City, Zhejiang Province

Patentee after: Jiaxing Huizhai home furnishing Co.,Ltd.

Address before: 310018 Room 1004-1006, 17 Block 57, Baiyang Street Science Park Road, Hangzhou Economic and Technological Development Zone, Zhejiang Province

Patentee before: Zhejiang Qibo Intellectual Property Operation Co.,Ltd.

Effective date of registration: 20191210

Address after: 310018 Room 1004-1006, 17 Block 57, Baiyang Street Science Park Road, Hangzhou Economic and Technological Development Zone, Zhejiang Province

Patentee after: Zhejiang Qibo Intellectual Property Operation Co.,Ltd.

Address before: The city Zhaohui six districts Chao Wang Road Hangzhou City, Zhejiang province 310014 18

Patentee before: Zhejiang University of Technology

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TR01 Transfer of patent right

Effective date of registration: 20200918

Address after: Room 402, building 32, No.8 Nujiang Road, Hexi District, Tianjin 300202

Patentee after: Outbay (Tianjin) robot Co.,Ltd.

Address before: 314300 room 241, building 1, new economy Pioneer Park, Tongyuan Town, Haiyan County, Jiaxing City, Zhejiang Province

Patentee before: Jiaxing Huizhai home furnishing Co.,Ltd.