CN103226986A - Manufacturing device of continuous energy spectrum electron source - Google Patents
Manufacturing device of continuous energy spectrum electron source Download PDFInfo
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- CN103226986A CN103226986A CN201310145194XA CN201310145194A CN103226986A CN 103226986 A CN103226986 A CN 103226986A CN 201310145194X A CN201310145194X A CN 201310145194XA CN 201310145194 A CN201310145194 A CN 201310145194A CN 103226986 A CN103226986 A CN 103226986A
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Abstract
The invention relates to a manufacturing device of a continuous energy spectrum electron source and belongs to the technical field of space utilization. The device is characterized in that an electron beam scattering film is applied under an electron gun; one side of the film is coated with an aluminum layer and the other side thereof is coated with a concentric silver ring Kapton film; during actual use, an aluminum disc equipped with the electron beam scattering film and the electron gun are mounted in a vacuum chamber; the aluminum disc is grounded by a wire; the vacuum chamber is vacuumized to 10-4Pa; the electron gun is turned on to emit a monoenorgetic electron beam; and after the monoenorgetic electron beam penetrates through the electron beam scattering film, an electron beam with a continuous energy spectrum is obtained. The device can simulate a space electron environment relatively truly, and is applicable to surface charge and discharge experiments of a satellite.
Description
Technical field
The present invention relates to a kind of manufacturing installation of continuum electron source, belong to technical field of space application.
Background technology
Geostationary orbit (GEO) space plasma environment can be to aircraft surface material charging, thereby causes Induced by Space Electrostatic Discharges (SESD), causes incidents such as the interference of responsive electronic system and non-mandatory switch.And the effective method of identifying the space material charged effect is exactly a ground simulation space actual environment, carries out ground simulation test the satellite spatial materials used is estimated.
What GEO existed is the electronic environment of continuum, and use in the ground simulation test be mostly the monoenergetic electrons rifle.Show in the rail data: adopt the simulation test of monoenergetic electrons rifle and true Monitoring Data to exist bigger difference at rail.For example, SCATHA satellite and DSP satellite shows that in the rail data time of origin of real space static discharge and ground simulation test are also inconsistent.Document " Electron-beam-charged dielectrics-Internal charge distribution " studies show that, it mainly is that the electric field intensity of material internal exists difference to cause the difference of ground experiment and space-orbit actual conditions owing to incident electron power spectrum difference.When a beam energy is the monoenergetic electron beam of tens of keV when shining metallic target, the electronics that has 20%～30% is scattered, remaining portions of electronics is with penetrating metal or rest on positions different in the metal.If the thickness of metal is enough thin, portions of electronics is with complete penetrating metal and produce power decay.Therefore, utilize this phenomenon monoenergetic electron beam can be become the electron beam of continuum.Therefore, in order accurately to estimate charged effect, be necessary to develop a kind of more near the electron source space actual environment, continuum.
Summary of the invention
The invention provides a kind of manufacturing installation of continuum electron source, be specially and under electron gun, apply a beam scatter film, scattering and energy loss process take place in the electronics that electron gun produces after passing film, monoenergetic electron beam is become the electron beam of continuum.
For achieving the above object, technical scheme of the present invention is as follows:
A kind of manufacturing installation of continuum electron source, described device is for applying the beam scatter film of a circle under electron gun, film simultaneously is coated with concentric silver ring, another side is coated with aluminium lamination, the electron gun transmitting terminal is relative with the one side that film is coated with concentric silver ring, and described film is polyimide (Kapton) film.
Preferred described concentric silver ring is for one or more layers, and between the different layers of same silver ring, width successively decreases from the bottom up successively.
Preferably offer through hole on the aluminium dish, described beam scatter film is installed in through hole, and the aluminium dish is installed under the outer acceleration grid of monoenergetic electrons rifle, the electron gun transmitting terminal is relative with the center of concentric silver ring, simultaneously with aluminium dish ground connection.
The diameter of offering through hole on the preferred described aluminium dish is 50mm, and described electron gun transmitting terminal is 50mm to the distance of beam scatter film.
Preferred described Kapton film diameter is 50mm, thick 7.5 μ m; The thick 100nm of aluminium lamination; Described concentric silver-colored ring width 10mm, thick 0.2 μ m, adjacent two with one heart the distance between the silver ring be 1mm, with the contacted concentric silver-colored ring width of film be 10mm.
Preferred described electron gun comprises positive electrode, negative electrode, filament, ceramic ring, intensifying ring and sphere wire netting; Wherein, positive and negative electrode is positioned at the electron gun top, and filament is installed between positive and negative electrode; The positive and negative electrode that will be connected with filament by ceramic ring is fixedlyed connected with intensifying ring, and intensifying ring below is the sphere wire netting fixedly, penetrates after making filament ejected electron Shu Yici by ceramic ring, intensifying ring and sphere wire netting;
The beam energy of preferred described electron gun radiation is 0～50KeV, and beam current density is 1nA/cm
2～20 μ A/cm
2
During actual the use, aluminium dish and the electron gun that described beam scatter film is housed is installed in the vacuum chamber, by lead with aluminium dish ground connection; Be evacuated to 10 to vacuum chamber
-4Pa, the unlocking electronic rifle makes electron gun emission monoenergetic electron beam, after described monoenergetic electron beam passes the beam scatter film, the electron beam that obtains having continuum.
Beneficial effect
The invention provides a kind of manufacture method of continuum electron source, the monoenergetic electron beam power spectrum that electron gun is launched becomes the electron beam with continuum, can compare real simulated space electronic environment, is applicable to that the satellite surface discharges and recharges the use of experiment.
Description of drawings
Fig. 1 is the structural representation of beam scatter film of the present invention and electron gun.
Fig. 2 is the vertical view of beam scatter film.
Fig. 3 is the sectional view of beam scatter film.
The energy of the electron gun that Fig. 4 obtains for embodiment and the graph of relation of current density.
Wherein, 1-positive electrode, 2-negative electrode, 3-filament, 4-ceramic ring, 5-intensifying ring, 6-sphere wire netting, 7-are equipped with the silver-colored with one heart ring of aluminium dish, 8-, the 9-Kapton film of beam scatter film.
Embodiment
The manufacturing installation of a kind of continuum electron source as shown in Figure 1, described device is for applying a beam scatter film under electron gun, and described film is coated with aluminium lamination for one side, and another side is coated with the Kapton film 9 of concentric silver ring 8;
Described Kapton film 9 diameters are 50mm, thick 7.5 μ m; The thick 100nm of aluminium lamination; Described concentric silver-colored ring width 10mm, thick 0.2 μ m, the distance between the adjacent two silver-colored with one heart rings 8 is 1mm;
Described concentric silver ring 8 is one or more layers, and between the different layers of same silver ring, width successively decreases from the bottom up successively, and the concentric silver-colored ring width of bottom one deck is 10mm;
The hole that to open a diameter on the aluminium dish of a 300 * 300mm be 50mm is installed described beam scatter film, and the aluminium dish is installed under the outer acceleration grid of monoenergetic electrons rifle, simultaneously with aluminium dish ground connection on the hole.
Described electron gun comprises positive electrode 1, negative electrode 2, filament 3, ceramic ring 4, intensifying ring 5 and sphere wire netting 6; Wherein, positive and negative electrode is positioned at the electron gun top, and between positive and negative electrode filament 3 is installed; The positive and negative electrode that will be connected with filament 3 by ceramic ring 4 is fixedlyed connected with intensifying ring 5, and intensifying ring 5 belows are sphere wire netting 6 fixedly, and filament 3 ejected electron Shu Yici are penetrated by ceramic ring 4, intensifying ring 5 and sphere wire netting 6 backs; The electron gun transmitting terminal is 50mm to the distance of beam scatter film.
The assembling process of described device is as follows:
The monoenergetic electrons rifle is made: the electron gun manufacturing materials is a brass, divides two parts up and down.Top is divided into gun cathode, cylindrical structural, and hollow, the inner electron gun filament 3 of placing, filament 3 one ends are connected with negative electrode, and the other end is an interpole, connects and and cathode insulation from negative electrode by ceramic ring 4.Bottom opening under the negative electrode can penetrate filament 3 ejected electron streams from the opening part of centre.The electron gun bottom is the intensifying ring 5 of ring texture, the intensifying ring 5 bottoms face wire netting 6 of receiving.Electron gun two parts up and down connects by ceramic ring 4.In the use, apply the high pressure of 0～50KeV for the accelerating grid electrode of electron gun, and to keep the beam current density scope of the monoenergetic electron beam of emission be 1nA/cm
2～20 μ A/cm
2
The scattering film is made: the hole of opening a 50mm diameter on 300 * 300mm aluminium dish, the thick silver-plated Kapton film 9 of 7.5 μ m is installed, and the aluminium dish 7 that the beam scatter film will be housed is installed in 50mm place under the outer acceleration grid of electron gun of monoenergetic on the hole.GEO space electronic environment for the more approaching reality of electron beam power spectrum that makes generation, need silver-plated film on the thick calorize Kapton of 7.5 μ m, silver plating process adopts the sputter coating method, the silver-plated thick silver bar line of the wide 0.2 μ m of 10mm that is shaped as, striped adopts the coverage mode of stack fully, spacing between each striped is 1mm, and its structure as shown in Figure 2.Therefore, 0.4 μ m silver bar line thick and that 0.2 μ m is thick has covered the total area of 75% and 17% scattering film respectively, and remaining 8% area is the Kapton substrate of aluminizing.
The line of electron gun and energy monitoring: the method that adopts Faraday cylinder and retardance potential analysis instrument to combine is monitored the power spectrum and the beam current density of electron gun, monitoring result illustrates that the monoenergetic electron beam power spectrum with the electron gun emission becomes the electron beam with continuum as shown in Figure 4.
In sum, more than be preferred embodiment of the present invention only, be not to be used to limit protection scope of the present invention.Within the spirit and principles in the present invention all, any modification of being done, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. the manufacturing installation of a continuum electron source, it is characterized in that: described device is for applying the beam scatter film of a circle under electron gun, film simultaneously is coated with concentric silver ring (8), another side is coated with aluminium lamination, the electron gun transmitting terminal is relative with the one side that film is coated with concentric silver ring (8), and described film is Kapton film (9).
2. the manufacturing installation of a kind of continuum electron source according to claim 1 is characterized in that: described concentric silver ring (8) is for one or more layers, and between the different layers of same silver ring, width successively decreases from the bottom up successively.
3. the manufacturing installation of a kind of continuum electron source according to claim 1 and 2, it is characterized in that: on the aluminium dish, offer through hole, described beam scatter film is installed in through hole, and the aluminium dish is installed under the outer acceleration grid of monoenergetic electrons rifle, the electron gun transmitting terminal is relative with the center of concentric silver ring (8), simultaneously with aluminium dish ground connection.
4. the manufacturing installation of a kind of continuum electron source according to claim 3 is characterized in that: the diameter of offering through hole on the described aluminium dish is 50mm, and described electron gun transmitting terminal is 50mm to the distance of beam scatter film.
5. the manufacturing installation of a kind of continuum electron source according to claim 1 and 2 is characterized in that: described Kapton film (9) diameter is 50mm, thick 7.5 μ m; The thick 100nm of aluminium lamination; Described concentric silver-colored ring width 10mm, thick 0.2 μ m, adjacent two with one heart the distances between the silver ring (8) be 1mm, with the contacted concentric silver-colored ring width of film (9) be 10mm.
6. the manufacturing installation of a kind of continuum electron source according to claim 1 is characterized in that: described electron gun comprises positive electrode (1), negative electrode (2), filament (3), ceramic ring (4), intensifying ring (5) and sphere wire netting (6); Wherein, positive and negative electrode is positioned at the electron gun top, and filament (3) is installed between positive and negative electrode; The positive and negative electrode that will be connected with filament (3) by ceramic ring (4) is fixedlyed connected with intensifying ring (5), intensifying ring (5) below is sphere wire netting (6) fixedly, and filament (3) ejected electron Shu Yici is penetrated by ceramic ring (4), intensifying ring (5) and sphere wire netting (6) back.
7. the manufacturing installation of a kind of continuum electron source according to claim 6 is characterized in that: the beam energy of described electron gun radiation is 0～50KeV, and beam current density is 1nA/cm
2～20 μ A/cm
2
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| CN201310145194XA CN103226986A (en) | 2013-04-24 | 2013-04-24 | Manufacturing device of continuous energy spectrum electron source |
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| CN201310145194XA CN103226986A (en) | 2013-04-24 | 2013-04-24 | Manufacturing device of continuous energy spectrum electron source |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111142147A (en) * | 2019-12-26 | 2020-05-12 | 兰州空间技术物理研究所 | Nondestructive installation method of light blocking sheet in space charged particle detector |
Citations (3)
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|---|---|---|---|---|
| SU830891A1 (en) * | 1980-01-10 | 1982-03-30 | Московский Ордена Трудового Красного Знамени Инженерно-Физический Институт | Sensor for sensing energy of accelerated electron beam |
| CN101521136A (en) * | 2008-02-28 | 2009-09-02 | 佳能株式会社 | Multi x-ray generating apparatus and x-ray imaging apparatus |
| CN101728185A (en) * | 2009-12-17 | 2010-06-09 | 中国航天科技集团公司第五研究院第五一○研究所 | Scattering-type electronic gun and method for using same |
-
2013
- 2013-04-24 CN CN201310145194XA patent/CN103226986A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU830891A1 (en) * | 1980-01-10 | 1982-03-30 | Московский Ордена Трудового Красного Знамени Инженерно-Физический Институт | Sensor for sensing energy of accelerated electron beam |
| CN101521136A (en) * | 2008-02-28 | 2009-09-02 | 佳能株式会社 | Multi x-ray generating apparatus and x-ray imaging apparatus |
| CN101728185A (en) * | 2009-12-17 | 2010-06-09 | 中国航天科技集团公司第五研究院第五一○研究所 | Scattering-type electronic gun and method for using same |
Non-Patent Citations (3)
| Title |
|---|
| M. VOS, C.A. CHATZIDIMITRIOU-DREISMANN, T. ABDUL-REDAH: "Electron and neutron scattering from polymer films", 《NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH B》, vol. 3, no. 227, 31 January 2005 (2005-01-31), pages 233 - 250 * |
| PAUL KIRKPATRICK AND P. A. ROSS: "A RingTarget XRay Generator Adapted to Scattering, Fluorescence and", 《REVIEW OF SCIENTIFIC INSTRUMENTS》, vol. 4, no. 645, 31 December 1933 (1933-12-31), pages 645 - 649 * |
| 周菊英: "《医学放射防护学》", 31 December 2010, 原子能出版社, article "第1章-电离辐射的物理基础", pages: 7-8 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111142147A (en) * | 2019-12-26 | 2020-05-12 | 兰州空间技术物理研究所 | Nondestructive installation method of light blocking sheet in space charged particle detector |
| CN111142147B (en) * | 2019-12-26 | 2023-04-07 | 兰州空间技术物理研究所 | Nondestructive installation method of light blocking sheet in space charged particle detector |
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Application publication date: 20130731 |