CN103217869B - Liquid tin target generator for laser plasma extreme ultraviolet light source - Google Patents
Liquid tin target generator for laser plasma extreme ultraviolet light source Download PDFInfo
- Publication number
- CN103217869B CN103217869B CN201310105336.XA CN201310105336A CN103217869B CN 103217869 B CN103217869 B CN 103217869B CN 201310105336 A CN201310105336 A CN 201310105336A CN 103217869 B CN103217869 B CN 103217869B
- Authority
- CN
- China
- Prior art keywords
- container
- nozzle
- liquid
- laser
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The invention discloses a liquid tin target generator for a laser plasma extreme ultraviolet light source. The liquid tin target generator comprises a container, a vibrating rod, a nozzle, a heating system, a pressurizing system and a cooling mechanism, wherein micropores which are in central symmetry by using the center of the nozzle as a symmetric point and are uniformly distributed are formed in the nozzle, the diameter of the outlet end of each micropore is more than that of the inlet end of the micropore, and all micropores are pointed to a laser acting point from different angles. The heating system is used for melting a tin material which is in a solid state at a normal temperature into a molten tin material; the molten tin material is fragmented into liquid drops from a continuous liquid flow due to the vibration of the vibrating rod; the pressurizing system is used for applying a high pressure to the container to ensure that the molten tin material are sprayed out from the tiny micropores of the nozzle and form thick mist; a laser beam focuses on the converged liquid mist through a lens to generate EUV (Extreme Ultraviolet) radiation; and the vacuum system is used for vacuumizing a target chamber through a mechanical pump. The liquid tin generator has the advantages that the spraying distance of the target material is far, the influence on optical elements such as the nozzle and a converging lens is little, the laser absorption efficiency and the EUV conversion efficiency are high, and the system stability is good; and the liquid tin target generator is suitable for industrial large-scale production.
Description
Technical field
The invention belongs to laser technology field, be specifically related to a kind of liquid tin target generator for laser plasma (LPP) extreme ultraviolet (EUV) light source, mainly for generation of making, EUV conversion efficiency is high, the little and Molten Tin target of system stability of debris contamination.
Background technology
Chip industry has a theme all the time: transistor is done little as far as possible, and transistor as much as possible is integrated together, and allows the integrated level of chip improve constantly.The minimum yardstick that chip technology can carve mainly is determined by the optical wavelength of photoetching process light source used.Optical wavelength used is shorter, and the yardstick that can reach is less, and the integrated level that can obtain is higher.Along with the progress of technology, state-of-the-art photoetching technique traditional at present can not meet the demands, so Next Generation Lithography---and extreme ultraviolet (EUV) photoetching technique is arisen at the historic moment.But it is high-power that restriction extreme ultraviolet (EUV) photoetching technique develops a main restricting factor, extreme ultraviolet (EUV) radiating light source of high-quality and long-lived operation is difficult to obtain.
At present, conventional extreme ultraviolet (EUV) light source mainly contains laser plasma (LPP) light source, gas discharge plasma (DPP) light source and synchrotron radiation light source etc. three class.
Wherein, the principle of work of laser plasma (LPP) light source utilizes high power pulsed laser (power density is greater than 10
10w/cm
2) irradiated material (comprising solid-state, liquid and gaseous material), produce high-temperature high-density laser plasma, ionized by atom high and the plasma that formed can produce very strong radiation at extreme ultraviolet (EUV) wave band, and obtain higher conversion efficiency.
The target of laser plasma extreme ultraviolet (EUV) light source is determined by its density the absorption efficiency of incident laser energy.Target density is larger, and absorption efficiency is higher, and thus the conversion efficiency of extreme ultraviolet (EUV) is also higher.The EUV conversion efficiency of solid target is the highest, but at generation high temperature, while high-density plasma, more ejections be neutral or slight Ionized fragment, this does not only contribute EUV radiation, on the contrary also can severe contamination, destroy catoptron, cause specular reflectance to reduce rapidly.Liquid jet needs often to change unlike solid target, as long as target storage container is enough large, substantially can realizes without time-limited operation, and can ensure it is fresh at any time with the target of laser action, improve the stability of system.In addition, recycling can also be carried out to injection target, can use cost be reduced.Although gas spray target overcome fragment sputtering pollute disadvantage, mainly with nonmetal be main, conversion efficiency entirety is on the low side.Therefore, liquid target material becomes the emphasis of research.
The Chinese patent application of Commissariat A L'Energie Atomique just relates to for the production method of the micron order drop of extreme ultraviolet (EUV) photoetching technique and device that (publication number is CN1379968A, publication date is on November 13rd, 2002), its method is mainly injected into very minor diameter in the nozzle opened in vacuum chamber, by producing light in laser emission pack to thick fog the liquid of pressurization.Also applied for another kind of Chinese patent application (publication number is CN1618259A, and publication date is on May 18th, 2005) in addition, laser beam and fine and close microlayer model mist interact by it, and this liquid is the rare gas of liquefaction.Special use liquid xenon, obtains liquid xenon by the liquefaction of gaseous xenon, is pressurizeed by liquid xenon by gaseous xenon, then the liquid xenon of pressurization is injected into opening towards in the relative very little region nozzle of pressure.
In a word, the rare gas of the liquefaction such as existing fog-like liquid sputtering target many employings xenon is as target, but general EUV conversion efficiency is not high, and radiant light spectral characteristic is general.And adopt the conversion efficiencies such as tin compared with drop sputtering target many employings pre-pulse technology of high target, namely before main pulse arrives, the laser and borne tin droplets effect that a beam energy is lower is first used, become vaporific, to reduce debris contamination, but too increase the difficulty of operation simultaneously, reduce the stability of system.
Summary of the invention
The object of the invention is to provide a kind of fog-like liquid tin target generator for laser plasma extreme ultraviolet light source, and this generator not only makes EUV conversion efficiency high, and radiant light spectral characteristic is good, and debris contamination is little, and has higher system stability.
A kind of liquid tin target generator for laser plasma extreme ultraviolet light source provided by the invention, is characterized in that, this liquid tin target generator comprises container, the bar that shakes, nozzle, heating system, compression system and cooling body;
Described heating system is arranged in container, and container bottom is provided with nozzle.Shake one end of bar is positioned at container, and is positioned at the top of nozzle; Shake the other end of bar with described cooling body.Described compression system is connected with container, for it provides required air pressure.
Nozzle having with nozzle center is that symmetric points are centrosymmetric and equally distributed micropore, and the diameter of pore openings end is greater than the diameter of inlet end, and each micropore is directed to laser action point from different angles.
As the improvement of technique scheme, described compression system comprises the gentle source controller of pressure unit.Pressure unit is vertically mounted on the cover plate of container, be connected, and the pressure interface of pressure unit is positioned at container with source of the gas controller electric signal; Source of the gas controller controls source of the gas; Source of the gas is connected by gas source pipe with container.
As the further improvement of technique scheme, described heating system comprises electric heater and thermal resistance, and electric heater is positioned in container, and the test lead of thermal resistance is positioned at container, and thermal resistance is connected with electric heater electric signal.Wherein, the preferred helicoidal structure of electric heater.
As the further improvement of technique scheme, described cooling body comprises cooling jacket and cooling blower, and cooling jacket is enclosed within and shakes outside the other end of bar, and cooling blower is arranged on the top of the bar that shakes.
Liquid jet provided by the invention adopts microporous nozzle to point to same point from multiple different angle, and this design can make fog-like liquid target jet length farther, and laser action point is also further from nozzle.This structural design also makes pore openings end to effectively reduce to be subject to the impact of the high energy particle ablation that plasma produces, the life-span of prolonging nozzle and other optical elements, the liquid simultaneously more assembled spraying, and can improve the yield of EUV radiation.Because tin has good radiation spectrum characteristic and higher EUV conversion efficiency, so adopt tin liquor as liquid target material of the present invention.Heating system allows and is melted into liquid state in solid-state tin material at normal temperatures.The vibration of bar that shakes makes Molten Tin be fragmented into drop by continuous flow.Compression system is used for adding high pressure to container, allows Molten Tin spray from the minimum micropore of nozzle and to form thick fog shape.The focusing of laser beam scioptics is beaten and produce EUV in the Molten Tin spraying of converging, and the adjustable Molten Tin size of flow is suitable with laser spot spot size, reduces the generation of chip to greatest extent, and can ensure there is higher absorption efficiency to laser.During use, vacuum system is vacuumized in target chamber by mechanical pump, to reduce the impact of various gas on EUV radiation.
In a word, instant invention overcomes the shortcoming of prior art, adopt Molten Tin as target, pressurizeed by liquid tin, the modes such as Optimizing Spray Nozzle Structure make nozzle directly spray fog-like liquid tin.This sputtering target is on nozzle and to collect the impact of the optical elements such as mirror little, Molten Tin to laser light absorbing efficiency and EUV conversion efficiency higher, system stability is good, is more suitable for industrial large-scale production.
Accompanying drawing explanation
The structural representation of the liquid tin target generator that Fig. 1 provides for example of the present invention;
Fig. 2 is the structural representation of nozzle, and wherein, (a) is front view, and (b) is vertical view;
Fig. 3 is laser and liquid tin target effect schematic diagram.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described further.It should be noted that at this, the explanation for these embodiments understands the present invention for helping, but does not form limitation of the invention.In addition, if below in described each embodiment of the present invention involved technical characteristic do not form conflict each other and just can mutually combine.
As shown in Figure 1, a kind of liquid tin target generator for laser plasma extreme ultraviolet light source that example of the present invention provides comprises container 1, electric heater 2, the bar 4 that shakes, thermal resistance 7, pressure unit 8 and nozzle 13.
The test lead of electric heater 2 and thermal resistance 7 is all positioned at container 1, and when placement tin material 3 is in container 1, electric heater 2 and thermal resistance 7 obtain test lead and be all arranged in tin material 3, and thermal resistance 7 is connected with electric heater 2 electric signal.Container 1 bottom centre is provided with nozzle 13.Shake one end of bar 4 is positioned at container 1, and is positioned at the top of nozzle 13; The other end overcoat of bar 4 of shaking has cooling jacket 6, and top is provided with cooling blower 5.Pressure unit 8 is vertically mounted on the cover plate of container 1, and its pressure interface is positioned at container 1 but can not contacts with tin material 3.
Electric heater 2 is helicoidal structure preferably, as shown in the example that Fig. 1 provides.
Gas source pipe 11 one end to be inserted in container 1 but can not be contacted with tin material 3; The other end connects pneumatic pump 10.Pressure unit 8 is connected with source of the gas controller 9 electric signal, and source of the gas controller 9 controls pneumatic pump 10 again simultaneously.
In the present invention, source of the gas is not limited to the mode adopting pneumatic pump 10, and alternate manner also can be adopted to provide gas to container 1.
As shown in Figures 2 and 3, nozzle 13 having with nozzle center is that symmetric points are centrosymmetric and equally distributed micropore 14, and the diameter of micropore 14 endpiece is greater than the diameter of inlet end, and each micropore 14 is directed to same point from different angles, i.e. laser action point 16.In order to improve the effect of the atomizing of liquids tin spraying of nozzle, the degree of depth of micropore 14 is preferably 0.5mm ~ 1.8mm; The distance L that laser action point 16 and nozzle 13 export is preferably 10mm ~ 13mm.The average diameter of micropore 14 is preferably 2 μm ~ 20 μm.
The course of work of the generator that example of the present invention provides is:
Electric heater 2 in container 1 works, and is elevated to more than 232 DEG C, is melted into liquid tin under making normal temperature in solid-state tin material 3 temperature.Thermal resistance 7 detects the temperature of tin material 3, and temperature signal is fed back to electric heater 2, makes electric heater 2 only when tin material 3 temperature works lower than when 232 DEG C.Shake bar 4 under the effect of piezoelectric ceramics with the frequency vibration of about 1M, makes liquid tin be fragmented into drop by continuous flow.Blow downwards at the cooling blower 5 in the masthead portion that shakes, in cooling jacket 6, inject recirculated cooling water, with the heat load of the bar 4 that reduces to shake.Pressure unit 8 detects and shows the air pressure size in container 1, and air pressure signal is fed back to source of the gas controller 9, and source of the gas controller 9 controls pneumatic pump 10 again, pressurizes or reduce pressure, to keep container 1 internal gas pressure 5 × 10 to container 1 through gas source pipe 11
6pa ~ 10
7within the scope of Pa.Target chamber 12 vacuumizes by vacuum system 17 simultaneously, makes its air pressure remain on 10
-3about Pa.At this moment because there is great pressure difference at nozzle 13 two ends, and each micropore 14 has minimum bore, and therefore liquid tin sprays from many micropore nozzles 13, and forms dense fog-like liquid 15, and the average-size of sprayed droplet is 5 μm ~ 50 μm under these conditions.
When dense fog-like liquid 15 flies through pack laser spot, namely during laser action point 16, high energy pulse CO
2the focusing of laser beam scioptics is just in time beaten on liquid target material.Can by the flow regulating shake bar 4 frequency and gas pressure intensity to change spraying, make the sizableness of fog-like liquid tin 15 and laser spot hot spot.Laser spot place produces the highly dense plasma of high temperature, and laser continues heating and produces highly ionized and then send EUV radiation.Finally, droplet by laser vaporization, was discharged by vacuum system 17 immediately, to reduce the impact of various gas on EUV radiation before arrival optical element.Fig. 3 is target chamber inner laser and liquid tin target effect schematic diagram.
The above is preferred embodiment of the present invention, but the present invention should not be confined to the content disclosed in this embodiment and accompanying drawing.The equivalence completed under not departing from spirit disclosed in this invention so every or amendment, all fall into the scope of protection of the invention.
Claims (5)
1. the liquid tin target generator for laser plasma extreme ultraviolet light source, it is characterized in that, this liquid tin target generator comprises container (1), the bar that shakes (4), nozzle (13), heating system, compression system and cooling body;
Described heating system is arranged in container (1), and container (1) bottom is provided with nozzle (13); Shake one end of bar (4) is positioned at container (1), and is positioned at the top of nozzle (13), and the other end of the bar that shakes (4) is with described cooling body; Described compression system is connected with container (1), for it provides required air pressure;
Nozzle (13) has with nozzle center is that symmetric points are centrosymmetric and equally distributed micropore (14), the degree of depth of micropore (14) is 0.5mm ~ 1.8mm, mean diameter is 2 μm ~ 20 μm, the diameter of micropore (14) endpiece is greater than the diameter of inlet end, the distance L that laser action point (16) and nozzle (13) export is 10mm ~ 13mm, and each micropore (14) is directed to laser action point (16) from different angles;
During work, adopt tin liquor as liquid target material, described heating system allows and is melted into liquid state in solid-state tin material at normal temperatures, the vibration of bar that shakes makes Molten Tin be fragmented into drop by continuous flow, described compression system is used for adding high pressure to container, Molten Tin is allowed to spray from the minimum micropore of nozzle and to form thick fog shape, the focusing of laser beam scioptics is beaten and produce EUV in the Molten Tin spraying of converging, flow adjustable Molten Tin size is suitable with laser spot spot size, to reduce the generation of chip to greatest extent, and ensure there is higher absorption efficiency to laser.
2. the liquid tin target generator for laser plasma extreme ultraviolet light source according to claim 1, it is characterized in that, described compression system comprises pressure unit (8) gentle source controller (9), pressure unit (8) is vertically mounted on the cover plate of container (1), be connected with source of the gas controller (9) electric signal, and the pressure interface of pressure unit (8) is positioned at container (1); Source of the gas controller (9) controls source of the gas; Source of the gas is connected by gas source pipe (11) with container (1).
3. the liquid tin target generator for laser plasma extreme ultraviolet light source according to claim 1, it is characterized in that, described heating system comprises electric heater (2) and thermal resistance (7), electric heater (2) is positioned in container (1), the test lead of thermal resistance (7) is positioned at container (1), and thermal resistance (7) is connected with electric heater (2) electric signal.
4. the liquid tin target generator for laser plasma extreme ultraviolet light source according to claim 3, is characterized in that, electric heater (2) is helicoidal structure.
5. according to the described liquid tin target generator for laser plasma extreme ultraviolet light source arbitrary in Claims 1-4, it is characterized in that, described cooling body comprises cooling jacket (6) and cooling blower (5), cooling jacket (6) is enclosed within outside the other end of the bar that shakes (4), and cooling blower (5) is arranged on the top of the bar that shakes (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310105336.XA CN103217869B (en) | 2013-03-28 | 2013-03-28 | Liquid tin target generator for laser plasma extreme ultraviolet light source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310105336.XA CN103217869B (en) | 2013-03-28 | 2013-03-28 | Liquid tin target generator for laser plasma extreme ultraviolet light source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103217869A CN103217869A (en) | 2013-07-24 |
| CN103217869B true CN103217869B (en) | 2015-04-15 |
Family
ID=48815784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310105336.XA Expired - Fee Related CN103217869B (en) | 2013-03-28 | 2013-03-28 | Liquid tin target generator for laser plasma extreme ultraviolet light source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103217869B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103412320A (en) * | 2013-07-29 | 2013-11-27 | 中国原子能科学研究院 | High vacuum target chamber for picosecond-level atomic nucleus life span measurement experiment |
| US10310380B2 (en) * | 2016-12-07 | 2019-06-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | High-brightness light source |
| CN112272426A (en) * | 2020-10-27 | 2021-01-26 | 浙江大学 | EUV light source tin target droplet generating device |
| CN112540512B (en) * | 2020-12-01 | 2022-06-28 | 上海集成电路装备材料产业创新中心有限公司 | Tin drips generating device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101918144A (en) * | 2008-01-16 | 2010-12-15 | 贝林格尔英格海姆法玛两合公司 | Nozzle and inhaler and method for producing a nozzle |
| CN102736450A (en) * | 2012-06-15 | 2012-10-17 | 华中科技大学 | Metallic target generator without vibrating rod |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5486795B2 (en) * | 2008-11-20 | 2014-05-07 | ギガフォトン株式会社 | Extreme ultraviolet light source device and its target supply system |
| JP5670174B2 (en) * | 2010-03-18 | 2015-02-18 | ギガフォトン株式会社 | Chamber apparatus and extreme ultraviolet light generation apparatus |
-
2013
- 2013-03-28 CN CN201310105336.XA patent/CN103217869B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101918144A (en) * | 2008-01-16 | 2010-12-15 | 贝林格尔英格海姆法玛两合公司 | Nozzle and inhaler and method for producing a nozzle |
| CN102736450A (en) * | 2012-06-15 | 2012-10-17 | 华中科技大学 | Metallic target generator without vibrating rod |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103217869A (en) | 2013-07-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103217869B (en) | Liquid tin target generator for laser plasma extreme ultraviolet light source | |
| CN103257531A (en) | Cavity liquid tin target generator for laser plasma pole ultraviolet source | |
| US9295147B2 (en) | EUV light source using cryogenic droplet targets in mask inspection | |
| CN103170744B (en) | Laser soldering device and welding method | |
| US20210277491A1 (en) | Cryogenic laser shock strengthening method and apparatus based on laser-induced high temperature plasma technology | |
| JP2012523106A (en) | Extreme ultraviolet light source with cooled condensing optics with reduced debris | |
| CN101774084A (en) | Method and device for light, powder and gas coaxial transmission laser cladding forming manufacturing | |
| CN110385313A (en) | High power laser light cleaning system based on laser array and bundling optical fiber | |
| JP2009030963A (en) | Steam generator and steam generating method | |
| CN104439717B (en) | A kind of current laser cutting device and cutting method | |
| JP2006244837A (en) | Method of generating radiation light from laser plasma, and laser plasma radiation light generating device using above method | |
| CN110125532A (en) | A kind of method, system and its equipment of water guiding laser processing workpiece | |
| CN104511691A (en) | Laser beam outer light path system for laser welding machine | |
| CN210333608U (en) | High-efficient cleaning system of laser | |
| CN109107996A (en) | The method of recombination laser cleaning | |
| CN201574192U (en) | Light, powder and gas coaxial conveying device for laser cladding formation | |
| CN103447191A (en) | Ultrasonic atomization device for controlling aerosol pollution | |
| CN207629424U (en) | A kind of ultrafast laser air film hole highly-efficient processing device | |
| US9044725B2 (en) | Effective droplet drying | |
| JP2006210110A (en) | Liquid drop supply method and device | |
| CN103212819A (en) | Coaxial water jet device used for laser micro machining of thin-walled tube | |
| CN208051176U (en) | A kind of multifunction laser device for clearing away obstacle | |
| CN104009372A (en) | Phase-locked multi-channel strip discharging array carbon dioxide laser | |
| CN205659940U (en) | A carbon dioxide laser cleaning equipment for aircraft skin paint removal | |
| CN109732185A (en) | A kind of novel plasma powder weld deposition welding gun structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150415 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |