CN103214947A - Low-radiation paint composition as well as preparation method and low-radiation material thereof - Google Patents
Low-radiation paint composition as well as preparation method and low-radiation material thereof Download PDFInfo
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Abstract
The invention provides a low-radiation paint composition as well as a method for preparing the low-radiation paint composition and a low-radiation material including the low-radiation paint composition. The low-radiation paint composition comprises the following components in percentage by weight: 1wt%-15wt% of semiconductor nanometer particles, 1wt%-10wt% of water-soluble conductive high polymer materials and 10wt%-60wt% of organic silicon resin, wherein the semiconductor nanometer particles have a mean particle diameter of 1nm-100nm. The low-radiation paint composition provided by the invention can be used for improving the conductivity of the coating, improving the radiance, lowering a heat transfer coefficient, and achieving good thermal-insulation heat insulation performance. Moreover, the low-radiation composition is environment-friendly.
Description
Technical field
The invention belongs to function nano material technology field, relate in particular to a kind of low radiation paint composition that comprises semiconductor nanoparticle, water-soluble conductive macromolecular material and silicone resin, preparation should be hanged down the radiation paint method for compositions, and the low radiative material that comprises the coating that is formed by this low radiation paint composition.
Background technology
Along with the proposition of China's strategy of sustainable development and the conception of building a resource-conserving society, building energy conservation becomes one of current hot issue that presses for solution.At present, building energy consumption accounts for 40% of the total power consumption of society, and wherein the energy by the glass door and window loss reaches 40% in building energy consumption, and windowpane has become the maximum energy leak of building.
In recent years, nano paint was as having good barrier near infrared light, can keep the energy-saving coatings of higher visible light transmissivity simultaneously again, because of its environment friendly, characteristics such as effect of heat insulation is better, preparation technology is simple, caused extensive concern.U.S. Pat 5518810 adopt kind of tin-doped indium oxide powders to be dispersed in inorganic or organic polymer in form coating, film, it is transparent at visible region, and can intercept wavelength all near infrared lights more than 1000nm, thereby reach heat insulation purpose, the gained coating reaches more than 90% ultrared obstruct.European patent EP 1040913 has been reported a kind of transparent red extrernal resistance heat insulating coat of the multilayered structure that is made of base membrane layer, infrared barrier layer, protective layer, adhesion layer, separating layer; it adopts particle diameter is following tin indium oxide (ITO) particle of 100nm as infrared barrier filler, the nonionogenic tenside dispersion agent as ITO, and this coating can intercept the energy that wavelength is the near infrared light of 1000～2500nm.United States Patent (USP) 6107360 discloses a kind of resin compounded sunshade coating that needs the fellatio light absorber (dehydration dysprosium acid zinc) of ultraviolet light polymerization, and its sunlight absorption agent is dispersed in the toluene, and needs ultraviolet light polymerization.Chinese invention patent CN1903958 discloses a kind of synthesized polyurethane glass heat insulating paint and preparation method thereof, this coating comprises nano antimony tin oxide (ATO) slurry and the thinner of synthesis of polyurethane resin, 50～100nm, the glass made from this coating has higher visible light transmissivity, reflectivity to infrared rays (thermal radiation) is very high simultaneously, has the effect that blocking radiant heat directly sees through.Chinese invention patent CN1609030A utilizes the mineral compound of tin to be raw material, has synthesized the required presoma of a kind of low emissivity glass coating, forms the doped stannum oxide low-emissivity coating of different thickness and performance at the execution glass surface spraying precursor solution of heat.Chinese invention patent CN1800068 in macromolecule resin, is coated in glass surface to coating by the mode that sprays and brush with nanoparticulate dispersed such as ATO or ITO, behind the dry solidification, obtains having the glass of heat insulating function.Chinese invention patent CN101239788A discloses a kind of glass with transparent conductive heat insulation performance of zinc-gallium oxide (GZO) nano material.Chinese invention patent CN101993657A has reported a kind of heat insulating glass paint of intelligent transparent, and it is that nano-ITO or ATO, nano vanadium dioxide etc. mix with silicone resin, when having high temperature and low temperature to the regulating effect of infrared rays transmitance.Comprehensive above-mentioned patent, the heat-insulated transparent coating of making after playing heat-blocking action and be tin-antiomony oxide, tin indium oxide or zinc-gallium oxide nano particle and organic resin mixing, but the organic resin that contains in these glass coatings has reduced the resistance of coating and has increased, the heat transfer coefficient on surface is increased, and reduce the heat preservation and insulation of coating.
Summary of the invention
Therefore, proposed the present invention, the purpose of this invention is to provide a kind of low radiation paint composition of water-based of environmental protection, can effectively intercept ultraviolet ray, seen through visible light and reflected infrared, thereby good function of heat insulation is provided at the problems referred to above.
According to an aspect of the present invention, the invention provides a kind of low radiation paint composition, comprising: the semiconductor nanoparticle of 1～15wt%; The water-soluble conductive macromolecular material of 1～10wt%; The silicone resin of 10～60wt%; Wherein said semiconductor nanoparticle has the median size of 1～100nm.
Described semiconductor nanoparticle is to be selected from the particle of silver, gold, tin indium oxide, tin-antiomony oxide, zinc oxide aluminum, zinc-gallium oxide one or more.
Described water-soluble conductive macromolecular material forms by being selected from thiophene that aniline, anils, pyrroles, pyrrole derivative, C1～18 alkyl replace and one or more conductive high polymer monomers in the diethoxy thiophene and poly styrene sulfonate polymerization.
Described silicone resin is by being selected from methyl triacetoxysilane, methyltrimethoxy silane, divinyl triamino propyl trimethoxy silicane, divinyl triamino propyl group methyldiethoxysilane, vinyltrimethoxy silane, α-(methacryloxy) propyl trimethoxy silicane, N-(α-aminoethyl)-γ-aminopropyl methyl dimethoxysilane, γ-glycidyl ether oxygen base propoxy-propyl trimethoxy silicane, γ-methacryloxypropyl trimethoxy silane, one or more organosilane monomer polymerizations in the gamma-mercaptopropyltriethoxysilane form.
According to another aspect of the present invention, the invention provides the low radiation paint method for compositions of a kind of preparation, comprise: making median size is that the semiconductor nanoparticle of 1～100nm disperses to obtain the semiconductor nanoparticle dispersion liquid in water, and the content of wherein said semiconductor nanoparticle is 20～50% of described semiconductor nanoparticle dispersion liquid gross weight; Make conductive high polymer monomer and poly styrene sulfonate water-soluble conductive macromolecular material solution with mol ratio polymerization formation 5～20% in comprising the solvent of water of 1: 1～2: 1; Make organosilane monomer polymerization in comprising the solvent of water form 50～90% silicone resin solution; Described semiconductor nanoparticle dispersion liquid is mixed with described water-soluble conductive macromolecular material solution with the weight ratio of described water-soluble conductive macromolecular material with 1: 10～15: 1 described semiconductor nanoparticles and to obtain composite mortar; With described composite mortar and described silicone resin solution with 20～50%: 50～80% weight ratio is mixed and is obtained low radiation paint composition.
According to another aspect of the present invention, the invention provides a kind of low radiative material, comprise substrate and the coating that forms by above-mentioned low radiation paint composition.
Described substrate is glass or transparent plastics.
In low radiation paint composition provided by the invention, adopt the harmless solvent that comprises water, added water miscible conducting polymer composite, can improve the electroconductibility of coating, improve radiant ratio, reduce heat transfer coefficient, thermal and insulating performance is good, and is simultaneously environmentally friendly.In addition, low radiation paint composition provided by the invention also has the effect of waterproof, mildew-resistant, the usage period be ten surplus year.
Description of drawings
Fig. 1 is the transmission electron microscope picture of the nano ATO aqueous dispersions of preparation among the embodiment 1;
Fig. 2 is the size distribution figure of the nano ATO aqueous dispersions of preparation among the embodiment 1;
Fig. 3 is the optics picture that scribbles the glass of the low radiation paint composition of preparation among the embodiment 1;
Fig. 4 is the ultraviolet-visible spectrogram that scribbles the glass of the low radiation paint composition of preparation among the embodiment 1.
Embodiment
The invention provides a kind of low radiation paint composition of high-efficiency environment friendly, it comprises the semiconductor nanoparticle of 1～15wt%; The water-soluble conductive macromolecular material of 1～10wt%; The silicone resin of 10～60wt%; Wherein nano particle has the median size of 1～100nm.
Above-mentioned semiconductor nanoparticle can be the particle that is selected from silver, gold, tin indium oxide, tin-antiomony oxide, zinc oxide aluminum, zinc-gallium oxide, or their combination.
Above-mentioned water-soluble conductive macromolecular material is by being selected from aniline, anils (for example o-toluidine, meta-aminotoluene, m-nitraniline, p-Nitroaniline, Ortho-Chloro aniline, p-Chlorobenzoic acid amide, m-chloro aniline etc.), pyrroles, pyrrole derivative (for example 2; 5-dithienyl pyrroles; 3-pentanoyl pyrroles etc.), the thiophene of C1～18 (preferred C1～10, more preferably C1～6) alkyl replacement and one or more conductive high polymer monomers in the diethoxy thiophene and poly styrene sulfonate polymerization form.
Above-mentioned silicone resin is by being selected from methyl triacetoxysilane, methyltrimethoxy silane, divinyl triamino propyl trimethoxy silicane, divinyl triamino propyl group methyldiethoxysilane, vinyltrimethoxy silane, α-(methacryloxy) propyl trimethoxy silicane, N-(α-aminoethyl)-γ-aminopropyl methyl dimethoxysilane, γ-glycidyl ether oxygen base propoxy-propyl trimethoxy silicane, γ-methacryloxypropyl trimethoxy silane, one or more organosilane monomer polymerizations in the gamma-mercaptopropyltriethoxysilane form.
The invention provides a kind of above-mentioned low radiation paint preparation of compositions method, specifically comprise the steps:
1) 0.1～0.5% tensio-active agent with semiconductor nano material dispersion liquid gross weight joins in the solvent, with the ultrasonic mixing of above-mentioned semiconductor nanoparticle 0.5～2.5 hour, preferred 1 hour, used the ball mill ball milling then 8～12 hours, preferred 10 hours, obtain the semiconductor nano material dispersion liquid of modification, wherein the content of inorganic semiconductor nano particle is 20～50% of semiconductor nanoparticle dispersion liquid gross weight.
Used tensio-active agent can be one or more in sodium laurylsulfonate, sodium lauryl sulphate, Sodium dodecylbenzene sulfonate, oleic acid, stearic acid, tween 80, the polysorbate60.
Above-mentioned solvent can comprise in ethanol, n-propyl alcohol, Virahol, propyl carbinol, isopropylcarbinol, ethylene glycol, propylene glycol, butyleneglycol, the pentanediol mixed solvent and the water of two or more.
2) conductive high polymer monomer and poly styrene sulfonate are added to the water, ultrasonic mixing, form mixed emulsion, add oxygenant then, oxypolymerization is 5～12 hours under 20～70 ℃ temperature, wherein, the add-on of conductive high polymer monomer is stated mixed emulsion 100～1000 mmoles for whenever going up; The add-on of poly styrene sulfonate and monomeric molar ratio are 1: 1～2: 1; The add-on of oxygenant for monomeric mol ratio be 1: 1～5: 1.In the conducting polymer composite solution that obtains, conducting polymer composite content is 5～20%.
Above-mentioned oxygenant can be iron trichloride, tosic acid iron, ammonium persulphate, horseradish peroxidase, four p-sulfonic acids base-phenyl ferrous porphyrin, or their mixture.
Above-mentioned poly styrene sulfonate can be any dissociable water-soluble poly styrene sulfonate, for example can be sodium polystyrene sulfonate, polystyrolsulfon acid potassium etc.
3) get a certain amount of organosilane monomer in certain water gaging, add catalyzer then, wherein the content of organosilane monomer is 20～90wt%, the amount of catalyzer is 0.1～5wt%, mechanical stirring also is heated to 30～60 ℃, polymerization 1～4 hour preferred 2 hours, obtains silicone resin content and is 50～90% silicone resin solution.
Above-mentioned catalyzer can be mineral acid, mineral alkali, organic acid, the organic bases of solid or liquid state, or in the above-mentioned catalyzer one or more, for example hydrochloric acid, sulfuric acid, oxalic acid, acetic acid etc.
4) with the weight ratio of 1: 10～15: 1 semiconductor nanoparticle and water-soluble conductive macromolecular material the water-based conducting polymer solution for preparing in the semiconductor nano material dispersion liquid of preparation in the step 1 and the step 2 is mixed, obtain composite mortar.
5) with the silicone resin solution that makes in the composite mortar that makes in the step 4 and the step 3 with 20～50%: 50～80% weight ratio is mixed, and makes low radiation paint composition.
The invention provides a kind of low radiative material that comprises the coating that forms by above-mentioned low radiation paint composition, wherein this has the efficient low transparent heat-insulated coating of radiation and coats in the substrate of clean glass or transparent plastics with the thickness of 0.1～500 μ m with methods such as spraying, roller coat, brushings, it is had intercept ultraviolet, as to see through visible light and reflected infrared function, have the effect of heat insulating.
In the low radiation paint composition of the invention described above, semiconductor nano material has following character: to the ultraviolet ray of wavelength less than 400nm, specific absorption reaches about 90%; To wavelength is the visible light of 400～800nm, and transmitance does not have obvious influence; To wavelength is the near infrared ray of 800～2500nm, because sun incident light frequency is higher than the vibrational frequency of semiconductor nano material, has caused the high reflection of its ionic, thereby the sun power of high band is measured reflex action.In addition, the adding of water-soluble conductive macromolecular material can effectively improve the electroconductibility of coating, helps reducing radiant ratio and heat transfer coefficient, improves the heat preservation and insulation of coating.The effect of binding agent is played in the interpolation of silicone resin, makes between the semiconductor nano material, bonding force strengthens between semiconductor nano material and the substrate.In addition, by regulating the ratio of semiconductor nano material, water-soluble conductive macromolecular material, silicone resin, the heat-proof quality of adjustable coating is to satisfy different technical needs.
Thus, the electric conductivity that can provide according to low radiation paint composition provided by the invention is 10～1000 Ω/cm
2Coating, and the heat transfer coefficient (U value) with double glazing (5+12A+6) of this coating can be 2.0～2.5W/m
2K, visible light transmissivity be greater than 70%, the infrared reflection rate greater than 70% and the ultraviolet isolating rate greater than 95%.Should not only have function of heat insulation by low radiation paint composition, also have the effect of waterproof, mildew-resistant, can have the usage period that reaches year surplus in the of ten.
Embodiment
One, low radiation paint preparation of compositions
The 0.1g Sodium dodecylbenzene sulfonate is joined in the 100mL deionized water, and adding the 40g median size to it again is the ATO particle of 5nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 28.6% nano ATO aqueous dispersions of modification.To this nano ATO aqueous dispersions with transmission electron microscope (NEC, JEM-100CXII) observed particle state as shown in Figure 1, and to it (Britain Ma Erwen, the size distribution figure that zs90) records as shown in Figure 2 with laser particle analyzer.
12.8g (90mmol) enedioxy thiophene is added in 37g (180mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.In this mixed emulsion, add 24.3g (90mmol) iron trichloride as oxygenant, and stir.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 5% water-soluble conductive macromolecular material solution.
Get the 180g methyl triacetoxysilane and add in the 20g deionized water, as catalyzer, under mechanical stirring, be heated to 40 ℃, carried out polymerization 2 hours, obtain silicone resin content and be 89.8% silicone resin solution to its hydrochloric acid that adds 0.5g2M.
The water-soluble conductive macromolecular material solution that makes more than the 20g is joined in the above-mentioned nano ATO aqueous dispersions of 20g, mix, obtain composite mortar.
The silicone resin solution that makes more than the 60g is joined in the above-mentioned composite mortar of 40g, mix, obtain low radiation paint composition-1.
Embodiment 2
The 0.1g sodium laurylsulfonate is joined in the 500mL deionized water, and adding the 150g median size to it again is the ATO particle of 100nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 23.1% nano ATO aqueous dispersions of modification.
12.8g (90mmol) enedioxy thiophene is joined in 18.5g (90mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.In this mixed emulsion, add 102.7g (450mmol) ammonium persulphate as oxygenant, and stir.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 7% water-soluble conductive macromolecular material solution.
Get the 180g methyltrimethoxy silane and join in the 20g deionized water, as catalyzer, under mechanical stirring, be heated to 30 ℃, carried out polymerization 2 hours, obtain silicone resin content and be 88.5% silicone resin solution to its hydrochloric acid that adds 3.4g2M.
The water-soluble conductive macromolecular material solution that makes more than the 15g is joined in the above-mentioned nano ATO aqueous dispersions of 25g, mix, make composite mortar.
The silicone resin solution that makes more than the 60g is joined in the above-mentioned composite mortar of 40g, mix, make low radiation paint composition-2.
Embodiment 3
The 0.1g sodium lauryl sulphate is joined in the 300mL deionized water, and adding the 200g median size to it again is the ATO particle of 1nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 40% nano ATO aqueous dispersions of modification.
12.8g (90mmol) enedioxy thiophene is joined in 37g (180mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.Adding 60.01g (90mmol) tosic acid iron in this mixed emulsion is oxygenant, and stirs.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 8% water-soluble conductive macromolecular material solution.
Getting 46.7g γ-glycidyl ether oxygen propoxy-propyl trimethoxy silicane joins in the 20g deionized water, as catalyzer, under mechanical stirring, be heated to 55 ℃ to its hydrochloric acid that adds 0.8g2M, carry out polymerization 2 hours, and obtained silicone resin content and be 69.2% silicone resin solution.
The water-soluble conductive macromolecular material solution that makes more than the 3g is joined in the above-mentioned nano ATO aqueous dispersions of 7g, mix, make composite mortar.
The silicone resin solution that makes more than the 10g is joined in the above-mentioned composite mortar of 10g, mix, make low radiation paint composition-3.
Embodiment 4
0.1g oleic acid is joined in the 100mL deionized water, and adding the 60g median size to it again is the ATO particle of 10nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 37.5% nano ATO aqueous dispersions of modification.
8.4g (90mmol) aniline is joined in 37g (135mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.In this mixed emulsion, add 48.7g (180mmol) iron trichloride as oxygenant, and stir.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 9% water-soluble conductive macromolecular material solution.
Getting 46.7g divinyl triammonium base propyl group methyldiethoxysilane joins in the 20g deionized water, as catalyzer, under mechanical stirring, be heated to 45 ℃ to its hydrochloric acid that adds 0.8g2M, carry out polymerization 2 hours, and obtained silicone resin content and be 69.2% silicone resin solution.
The water-soluble conductive macromolecular material solution that makes more than the 25g is joined in the above-mentioned nano ATO aqueous dispersions of 20g, mix, make composite mortar.
The silicone resin solution that makes more than the 55g is joined in the above-mentioned composite mortar of 45g, mix, make low radiation paint composition-4.
The 0.1g stearic acid is joined in the 100mL deionized water, and adding the 70g median size to it again is the ATO particle of 30nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 41.2% nano ATO aqueous dispersions of modification.
12.8g (90mmol) pyrroles is joined in 37g (180mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.In this mixed emulsion, add 60.01g (90mmol) tosic acid iron as oxygenant, and stir.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 10% water-soluble conductive macromolecular material solution.
Get the 60g vinyltrimethoxy silane and join in the 20g deionized water, as catalyzer, under mechanical stirring, be heated to 50 ℃, carried out polymerization 2 hours, obtain silicone resin content and be 74.3% silicone resin solution to its hydrochloric acid that adds 0.8g2M.
The water-soluble conductive macromolecular material solution that makes more than the 3g is joined in the above-mentioned nano ATO aqueous dispersions of 6g, mix, make composite mortar.
The silicone resin solution that makes more than the 11g is joined in the above-mentioned composite mortar of 9g, mix, make low radiation paint composition-5.
Embodiment 6
The 0.1g tween 80 is joined in the 200mL deionized water, and adding the 100g median size to it again is the ATO particle of 70nm.The gained mixture is carried out ultrasonic mixing 1 hour, used the ball mill ball milling then 10 hours, thereby obtain 33.3% nano ATO aqueous dispersions of modification.
12.8g (90mmol) enedioxy thiophene is joined in 37g (180mmol) sodium polystyrene sulfonate as conductive high polymer monomer, after ultrasonic mixing, form mixed emulsion.In this mixed emulsion, add 60.01g (90mmol) tosic acid iron as oxygenant, and stir.The gained mixture carries out oxypolymerization 5 hours under 25 ℃, make the water-soluble conductive macromolecular material content and be 20% water-soluble conductive macromolecular material solution.
Getting 100g divinyl triamino propyl trimethoxy silicane adds in the 20g water, as catalyzer, under mechanical stirring, be heated to 30 ℃ to its hydrochloric acid that adds 0.8g2M, carry out polymerization 2 hours, and obtained silicone resin content and be 82.8% silicone resin solution.
The water-soluble conductive macromolecular material solution that makes more than the 10g is joined in the above-mentioned nano ATO aqueous dispersions of 20g, mix, make composite mortar.
The silicone resin solution that makes more than the 70g is joined in the above-mentioned composite mortar of 30g, mix, make low radiation paint composition-6.
Two, the performance evaluation of low radiation paint composition
Each low radiation paint composition that the foregoing description 1～6 is made is applied on the clean double glazing, and dry back coat-thickness is about 100 μ m, and double glazing (5+12A+6) sample with above-mentioned coating is carried out following test, the results are shown in the table 1.
(1) electric conductivity (Ω/cm of drying back coating
2): adopt four point probe method Keithley 4200 instrument tests.
(2) has the heat transfer coefficient U (W/m of the double glazing (5+12A+6) of coating
2K): calculate by Infrared Reflective Spectra.
(3) have visible light transmissivity, infrared reflection rate and the ultraviolet isolating rate of the glass of coating: with Tianjin, island-UV-3600 instrument test.
Particularly, optics picture and the ultraviolet-visible spectrogram that scribbles the low radiation paint composition of preparation among the embodiment 1 distinguished as shown in Figure 3 and Figure 4.
Table 1
In conjunction with Fig. 3 and Fig. 4, can find out by embodiment 1～6 and table 1, double glazing with coating that the coating composition by above each embodiment forms has transmitance greater than 70% to visible light, ultraviolet ray had rejection rate greater than 95%, infrared rays had reflectivity greater than 70%, heat transfer coefficient is reduced simultaneously, thereby has good thermal and insulating performance, and environmentally friendly.
Claims (10)
1. one kind low radiation paint composition is characterized in that, described low radiation paint composition comprises:
The semiconductor nanoparticle of 1～15wt%;
The water-soluble conductive macromolecular material of 1～10wt%;
The silicone resin of 10～60wt%;
Wherein said semiconductor nanoparticle has the median size of 1～100nm.
2. low radiation paint composition according to claim 1 is characterized in that, described semiconductor nanoparticle is to be selected from the particle of silver, gold, tin indium oxide, tin-antiomony oxide, zinc oxide aluminum, zinc-gallium oxide one or more.
3. low radiation paint composition according to claim 1, it is characterized in that, described water-soluble conductive macromolecular material is formed by one or more conductive high polymer monomers and poly styrene sulfonate polymerization, and described conductive high polymer monomer is selected from the thiophene and the diethoxy thiophene of aniline, anils, pyrroles, pyrrole derivative, C1～18 alkyl replacement.
4. low radiation paint composition according to claim 1, it is characterized in that, described silicone resin is formed by one or more organosilane monomer polymerizations, and described organosilane monomer is selected from methyl triacetoxysilane, methyltrimethoxy silane, divinyl triamino propyl trimethoxy silicane, divinyl triamino propyl group methyldiethoxysilane, vinyltrimethoxy silane, α-(methacryloxy) propyl trimethoxy silicane, N-(α-aminoethyl)-γ-aminopropyl methyl dimethoxysilane, γ-glycidyl ether oxygen base propoxy-propyl trimethoxy silicane, γ-methacryloxypropyl trimethoxy silane, in the gamma-mercaptopropyltriethoxysilane.
5. one kind prepares low radiation paint method for compositions, it is characterized in that described method comprises:
Making median size is that the semiconductor nanoparticle of 1～100nm disperses to obtain the semiconductor nanoparticle dispersion liquid in comprising the solvent of water, and the content of wherein said semiconductor nanoparticle is 20～50% of described semiconductor nanoparticle dispersion liquid gross weight;
Make conductive high polymer monomer and poly styrene sulfonate water-soluble conductive macromolecular material solution with mol ratio polymerization formation 5～20% in comprising the solvent of water of 1: 1～2: 1;
Make organosilane monomer polymerization in comprising the solvent of water form 50～90% silicone resin solution;
Described semiconductor nanoparticle dispersion liquid is mixed with described water-soluble conductive macromolecular material solution with the weight ratio of described water-soluble conductive macromolecular material with 1: 10～15: 1 described semiconductor nanoparticles and to obtain composite mortar;
With described composite mortar and described silicone resin solution with 20～50%: 50～80% weight ratio is mixed and is obtained low radiation paint composition.
6. low radiation paint composition according to claim 5 is characterized in that, described semiconductor nanoparticle is to be selected from the particle of silver, gold, tin indium oxide, tin-antiomony oxide, zinc oxide aluminum, zinc-gallium oxide one or more.
7. the radiation paint method for compositions is hanged down in preparation according to claim 5, it is characterized in that described conductive high polymer monomer is to be selected from thiophene that aniline, anils, pyrroles, pyrrole derivative, C1～18 alkyl replace and in the diethoxy thiophene one or more.
8. low radiation paint composition according to claim 5, it is characterized in that described organosilane monomer is for being selected from methyl triacetoxysilane, methyltrimethoxy silane, divinyl triamino propyl trimethoxy silicane, divinyl triamino propyl group methyldiethoxysilane, vinyltrimethoxy silane, α-(methacryloxy) propyl trimethoxy silicane, N-(α-aminoethyl)-γ-aminopropyl methyl dimethoxysilane, γ-glycidyl ether oxygen base propoxy-propyl trimethoxy silicane, in γ-methacryloxypropyl trimethoxy silane and the gamma-mercaptopropyltriethoxysilane one or more.
9. a low radiative material is characterized in that, described low radiative material comprises substrate and by the coating that forms according to each described low radiation paint composition in the claim 1 to 4.
10. low radiative material according to claim 9, described substrate are glass or transparent plastics.
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| CN103865263A (en) * | 2014-01-09 | 2014-06-18 | 常州大学 | Preparation method of organic-inorganic composite infrared stealthy material |
| CN105295453A (en) * | 2014-05-28 | 2016-02-03 | 中国科学院化学研究所 | Low-radiation coating composition, and coating layer and glass containing the coating composition |
| CN106479240A (en) * | 2016-09-17 | 2017-03-08 | 浙江大学自贡创新中心 | The preparation method of osmosis type self-leveling cement anti-static and abrasion-resistant floor coatings |
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| US5660961A (en) * | 1996-01-11 | 1997-08-26 | Xerox Corporation | Electrophotographic imaging member having enhanced layer adhesion and freedom from reflection interference |
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| CN102627918A (en) * | 2011-02-04 | 2012-08-08 | 日东电工株式会社 | Adhesive sheet and surface protective film |
Cited By (10)
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| CN103396734A (en) * | 2013-08-07 | 2013-11-20 | 常州市特种涂料有限公司 | Anti-radiation heat-insulation coating and preparation method thereof |
| CN103865263A (en) * | 2014-01-09 | 2014-06-18 | 常州大学 | Preparation method of organic-inorganic composite infrared stealthy material |
| CN103865263B (en) * | 2014-01-09 | 2016-05-11 | 常州大学 | The preparation method of the compound infrared stealth material of a kind of organic and inorganic |
| CN103773223A (en) * | 2014-01-10 | 2014-05-07 | 北京航空航天大学 | Preparation method of core-shell structural high-transparency low-radiation heat-insulating composite nanometer coating |
| CN103773223B (en) * | 2014-01-10 | 2016-01-27 | 北京航空航天大学 | A kind of heat insulation composite nano-coating preparation method of high transparency Low emissivity of nucleocapsid structure |
| CN105295453A (en) * | 2014-05-28 | 2016-02-03 | 中国科学院化学研究所 | Low-radiation coating composition, and coating layer and glass containing the coating composition |
| CN105295453B (en) * | 2014-05-28 | 2017-07-21 | 中国科学院化学研究所 | The coating composition of Low emissivity, the coating containing it and glass |
| CN106479240A (en) * | 2016-09-17 | 2017-03-08 | 浙江大学自贡创新中心 | The preparation method of osmosis type self-leveling cement anti-static and abrasion-resistant floor coatings |
| CN106634135A (en) * | 2016-09-17 | 2017-05-10 | 浙江大学自贡创新中心 | Use method of permeable type self-levelling anti-static and wearable cement flooring coating |
| CN106479240B (en) * | 2016-09-17 | 2018-10-19 | 浙江大学自贡创新中心 | The preparation method of osmosis type self-leveling cement anti-static and abrasion-resistant floor coatings |
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