CN103207424A - Super wide band cut-off long-wave-pass filter optical film and production method thereof - Google Patents
Super wide band cut-off long-wave-pass filter optical film and production method thereof Download PDFInfo
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Abstract
The invention relates to a super wide band cut-off long-wave-pass filter optical film and a production method thereof. A filter optical film comprises a substrate; transition bounding layers are respectively plated on a front surface and a rear surface of the substrate; a plurality of layers of long-wave-pass filter optical films with different central wavelengths are plated on the transition bounding layers in an alternating mode to form into two long-wave-pass filter optical film series which comprise a substrate front surface long-wave-pass filter optical film series and a substrate rear surface long-wave-pass filter optical film series; and the two long-wave-pass filter optical film series are formed by high refractive index layers and low refractive index layers. The production method of the super wide band cut-off long-wave-pass filter optical film comprises steps of substrate cleaning, substrate surface processing, transition bounding layer plating and high refractive index layer and low refractive index layer plating. The super wide band cut-off long-wave-pass filter optical film has the advantages of being high in transmittance, good in optical performance and good in adhesive force between film layers and the substrate. The production method of the super wide band cut-off long-wave-pass filter optical film has the advantages of being easy to refer and transplant, capable of adapting to mass coating film production of large size optical elements, capable of improving performance indexes of a detector and capable of being widely applied to the optical electric technical fields of an precision optical instrument, photoelectric detection and celestial navigation.
Description
Technical field
The present invention relates to a kind of super broadband by long-pass filter coating and manufacture method thereof, be that visible light and the super broadband of near infrared that is coated with on optical component surfaces such as coloured glass, infrared crystals ended the long-pass filter coating, can be widely used in photoelectron technology fields such as precision optical instrument, photodetection, celestial navigation, belong to optical film technology field.
Background technology
Interference stopping lightscreening plate has the advantage that can not be substituted at aspects such as improving electro-optical system signal to noise ratio (S/N ratio) and elimination inoperative wave band interference of stray light, thereby is widely used in the technical fields such as optical communication, photodetection and imaging, celestial navigation.Wherein, the principle of work of celestial navigation culminant star sensing detector is to utilize fixed star luminescent spectrum intensity to be better than the characteristics of sky background parasitic light and to carry out celestial body identification and location at a certain limited wave band of near infrared, belongs to the passive extracting mode of typical weak signal.Therefore, need develop a kind of super broadband by the long-pass filter coating, the sky parasitic light be filtered out as far as possible, but have good transmitance near infrared master detecting band simultaneously.The optical filter technical requirement a kind of of the same type of foreign literature report is: greater than 92%, and rete is stood temperature shock, constant damp and hot, moderate friction test and adhesion test to 400-1200nm wave band transmitance less than 0.5%, 1260-1700nm wave band transmitance.
The manufacture method of cutoff filter commonly used can be divided into two classes at present: the coloured glass that a class directly forms for heavy metal ion is mixed, a class then are that full medium type is interfered cut-off light filtering films.Wherein, the former is with low cost, absorb by wide, but optical property is bad, and zone of transition is not steep, poor stability; The latter's shortcoming is cut off band width limited (generally being no more than 0.25um), and film structure is complicated, but can guarantee that with manufacturing process filter coating has the good optical performance by the design of film system.Therefore, if will realize the super broadband long-pass filter coating of above-mentioned celestial navigation, main difficulty has three aspects: the one, by the super wide and passband transmitance requirement height of wave band, adopt coloured glass generally can only the degree of depth by to 800nm, adopt then film structure very complicated (more than at least 65 layers) of medium type filter coating merely, the cycle that is coated with is long and technology difficulty is big, especially film thickness monitoring accuracy requirement height; The 2nd, transition region slope requires high (being no more than 7%), consider actual manufacturing factor and yield rate problem, must should be worth control in 5%, namely the transition wave band is no more than 70nm, and this requires the rete sum at least in more than 35 layers and filter coating centre wavelength location accurately; The 3rd, the densification of requirement rete, inherent vice is little, possesses the mechanochemistry stability of good anti-adverse environment.The difficulty that it is pointed out that above-mentioned aspect is interweaved often, and influence need comprehensively be paid attention to each other.
Based on this, with the manufacturing of ultra broadband by the long-pass filter coating, be necessary to develop a kind of new manufacture method at celestial navigation, to overcome above-mentioned many difficulties and to realize the through engineering approaches application.
Summary of the invention
The objective of the invention is: provide a kind of super broadband by long-pass filter coating and manufacture method thereof, should super broadband end long-pass filter coating excellent optical performance, absorb by wide, transmitance is high, stability is high, have good adhesion between rete and substrate, can promote the detector performance index; Film structure is simple, makes easily, and cost is low; Plating method is easy to use for reference and transplants, and can adapt to the production of large-sized optical elements filter coating mass plated film.
A kind of super broadband of the present invention by the technical scheme of long-pass filter coating is:
A kind of super broadband is by the long-pass filter coating, it comprises substrate, this substrate is optical element, its tow sides have been coated with the transition adhesive linkage respectively, on this transition adhesive linkage, alternately be coated with the long-pass filter coating of some layers of different centre wavelength, constitute two long-pass filter coating systems: one is the positive long-pass filter coating of substrate system, and another is substrate reverse side long-pass optical filtering module system, and these two long-pass filter coating systems form by high refractive index layer and low-index layer; High refractive index layer is coated with by high-index material and forms, and low-index layer is coated with by low-index material and forms.
Further technical scheme is:
Described super broadband is by the long-pass filter coating, and its substrate material mainly is selected from coloured glass or infrared crystal; Transition adhesive linkage material is SiO
2, or SiO or Al
2O
3, high-index material is TiO
2, or Ta
2O
5, low-index material is SiO
2
Described super broadband is by the long-pass filter coating, and two long-pass filter coating system is connected in series fully by wave band, and the overlay region of ending of 10～50nm is arranged; Wherein, the shortwave cut off of the less long-pass filter coating of centre wavelength absorbs by the upper limit less than the intrinsic of optical element.
Described super broadband is by the long-pass filter coating, the optical element after the final film forming of its long-pass filter coating have from the 400-1400nm wave band degree of depth by and 1500-1700nm wave band transmitance be not less than 92% optical characteristics.
A kind of super broadband of the present invention by the technical scheme of long-pass filter coating manufacture method is:
The described super broadband of a kind of claim 1 is by the manufacture method of long-pass filter coating, and its manufacturing step comprises: substrate cleans, the substrate surface plasma etching treatment, the transition adhesive linkage is coated with, high refractive index layer is coated with, and low-index layer is coated with, the processing after plated film is finished; Described high refractive index layer is coated with and is coated with low-index layer is to use based on monitoring piece to change tactful indirect optics real-time film thickness monitoring method is coated with different centre wavelengths respectively at the substrate tow sides long-pass filter coating, constitute two long-pass filter coating systems, one is the positive long-pass filter coating of substrate system, and another is substrate reverse side long-pass filter coating system.
Further technical scheme is:
Described super broadband is by the manufacture method of long-pass filter coating, described substrate cleans: the planar optics after the twin polishing is at first wiped one time with polishing fluid is rough, clean with anhydrous mixed organic solvents again, then with the whether smooth finish standard up to specification of method inspection of breathing out, put into the coating machine vaporization chamber after qualified, vacuumize at last and heat eyeglass.
Described super broadband is by the manufacture method of long-pass filter coating, and described substrate surface plasma etching treatment is: when base vacuum reaches in the coating machine vaporization chamber after substrate has cleaned, namely open ion gun substrate surface is carried out the ion bombardment; The working gas of described ion bombardment is pure argon (4N), and its technological parameter comprises: bias voltage 100～220V, discharge current 30～60A, 3～8 minutes duration; Etch thicknesses 30～100nm.
Described super broadband is by the manufacture method of long-pass filter coating, and the technological parameter of its ion bombardment is selected at the substrates of different material:
A, when substrate is coloured glass: bias voltage 150～220V, discharge current 30～60A, 3～8 minutes duration, etch thicknesses 30～100nm charges into auxiliary oxygen flow 3～10sccm;
B, when substrate is infrared crystal: bias voltage 100～150V, discharge current 30～50A, 3～5 minutes duration, etch thicknesses 30～80nm.
Described super broadband is by the manufacture method of long-pass filter coating, and described transition adhesive linkage is coated with and is: select SiO for use
2, or SiO, or Al
2O
3, adopt electron beam evaporation and ion assisted deposition; The film thickness monitoring mode is the crystal oscillator film thickness monitoring, and rate of sedimentation is 0.2-0.7nm/s, and oxygen flow is 0-5sccm; The ion assisted deposition bias voltage is 110-150V, and discharge current is 30-60A.
Described super broadband is by the manufacture method of long-pass filter coating, its high refractive index layer is coated with the electron beam evaporation of employing, and rate of sedimentation is 0.2-0.5nm/s, and oxygen flow is 5-20sccm, the ion assisted deposition parameter is: bias voltage 120-160V, discharge current 30-60A.
Described super broadband is by the manufacture method of long-pass filter coating, described low-index layer is coated with the employing electron beam evaporation, and its speed is 0.3-0.7nm/s, and oxygen flow is 0-5sccm, the ion assisted deposition parameter is: bias voltage 120-150V, discharge current 30-60A.
Described super broadband is by the manufacture method of long-pass filter coating, its substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating are alternately to be coated with by high-index material and low-index material to form, adopt the indirect optical thickness monitor method of changing strategy based on monitoring piece to monitor in real time in the deposition process when being coated with and stop a plating point criterion: at first, convert substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating system to monitoring piece film system separately, then by optimizing selected supervisory wavelength, make each rete stop plating and put the positive control amount in feedback signal light changes 2.0%～10% scope of amplitude peak, and an extreme value appears at least, simultaneously, cross the positive control amount at difference and carry out the overall situation deposition emulation that monitoring piece is changed strategy, that obtains the evaluation function minimum a kind ofly is optimum monitoring piece and changes strategy.
The significant technique effect of the present invention mainly contains:
1, the directed etching substrate surface of using plasma, remove substrate surface organic contaminant and activating surface molecule or atom effectively, eliminated the residual defective seed of substrate surface, and then promoted rete effectively at on-chip adhesion and become the film quality amount.Adopted a kind of indirect optics real-time film thickness monitoring and monitoring piece to change strategy, by the real-time monitoring of thickness deposition process, thereby film structure is improved at the place of pinpointing the problems intuitively targetedly, can realize that each rete stops plating point criterion simultaneously.By optimizing selected supervisory wavelength, make each rete stop plating point (namely crossing the positive control amount) in feedback signal light changes 2%～10% scope of amplitude peak.Simultaneously, set that hardware is closed down plating point stochastic error mutually and the condition of the experience error that the monitoring piece that more renews causes under, cross the positive control amount at difference and carry out the overall situation deposition emulation that monitoring piece is changed strategy, that obtains the evaluation function minimum a kind ofly is optimum monitoring piece and changes strategy.By this method, can take full advantage of the thickness compensating effect, eliminate simultaneously effectively the thickness cumulative errors, thereby guarantee the optical property of optical filter after the final film forming of film.
2, adopt the optical element tow sides to be coated with different centre wavelength filter coatings respectively, decomposed the design of film system and the manufacture difficulty of coating single side.In fact, for common optical coating system, the several films more than 30 layers of rete tie up in the process of being coated with the thickness cumulative errors and often cause optical property variation after the final film forming easily.On the other hand, for the bigger film system of total film thickness, at the after-stage of the process of being coated with, the space distribution of evaporation coating materials can change more significantly than early stage generation, and this causes, and the thickness of actual deposition departs from the monitoring value and finally influences the film forming optical property on the eyeglass.Meanwhile, evaporitic environment is also dirty significantly thereupon, and this also directly influences quality of forming film, and is even unqualified.One-tenth film quality and yield rate have been guaranteed by this method.
3, utilize coloured glass mix by or the infrared crystal intrinsic end, realized that visible light and the part infrared band degree of depth end, reduced the complexity of interfering the light cutoff filter membrane system effectively.
4, this manufacture method relies on common filming equipment and conventional coating process, and related process is easy to transplant, and has directive significance widely in the manufacturing of other high precision filter coating.
Description of drawings
Fig. 1 is that a kind of super broadband of the present invention is by long-pass filter coating structural representation;
Fig. 2 is that a kind of super broadband of the present invention is by long-pass filter coating manufacture method flow chart;
Fig. 3 be on the silicon crystal of the present invention visible light and the super broadband of near infrared by the actual measurement transmittance curve (based on common thickness monitor mode) of long-pass filter coating;
Fig. 4 is for being coated with visible light and the super broadband of the near infrared actual measurement transmittance curve (changing strategy based on indirect optical thickness monitor and monitoring piece) behind the long-pass filter coating on the silicon crystal of the present invention;
Fig. 5 is for being coated with visible light and the super broadband of the near infrared actual measurement transmittance curve (high and low temperature and constant hygrothermal environment test back) behind the long-pass filter coating on the silicon crystal of the present invention.
The Reference numeral name is called among the figure: the 1-substrate, the positive transition adhesive linkage of 2-substrate, 2 '-substrate reverse side transition adhesive linkage, 3-substrate front high refractive index layer, 3 '-substrate reverse side high refractive index layer, 4-substrate front low-index layer, 4 '-substrate reverse side low-index layer, the positive long-pass filter coating of n-substrate system, n '-substrate reverse side long-pass filter coating system.
Embodiment
Below in conjunction with drawings and Examples a kind of super broadband of the present invention is described further by long-pass filter coating and manufacture method thereof:
Embodiment 1: as shown in Figure 1, be that a kind of super broadband of the present invention is by the basic embodiment of long-pass filter coating.A kind of super broadband is by the long-pass filter coating, it comprises substrate 1, this substrate 1 is optical element, its tow sides have been coated with transition adhesive linkage 2 respectively, on this transition adhesive linkage 2, alternately be coated with the long-pass filter coating of some layers of different centre wavelength, constitute two long-pass filter coating systems: one is n for the positive long-pass filter coating of substrate, another is substrate reverse side long-pass optical filtering module system n ', these two long-pass filter coating systems form by high refractive index layer and low-index layer, among Fig. 1: the positive long-pass filter coating of substrate is that n is made up of high refractive index layer 3 and low-index layer 4, and substrate reverse side long-pass optical filtering module system n ' is made up of high refractive index layer 3 ' and low-index layer 4 '; High refractive index layer 3,3 ' is coated with by high-index material and forms, and low-index layer 4,4 ' is coated with by low-index material and forms.
Embodiment 2: different with above-described embodiment 1 is: described substrate 1 material mainly is selected from coloured glass or infrared crystal; Transition adhesive linkage material is SiO
2, or SiO or Al
2O
3, high-index material is TiO
2, or Ta
2O
5, low-index material is SiO
2Described two long-pass filter coatings are being connected in series fully by wave band of n, n ', and the overlay region of ending of 10～50nm is arranged; Wherein, the shortwave cut off of the less long-pass filter coating of centre wavelength absorbs by the upper limit less than the intrinsic of optical element.Optical element after the final film forming of long-pass filter coating have from the 400-1400nm wave band degree of depth by and 1500-1700nm wave band transmitance be not less than 92% optical characteristics.
Embodiment 3: as shown in Figure 2, be that a kind of super broadband of the present invention is by the basic embodiment of long-pass filter coating manufacture method.Described super broadband of the present invention is by the manufacture method of long-pass filter coating, and its manufacturing step comprises: A, substrate clean B, substrate surface plasma etching treatment, C, transition adhesive linkage are coated with, D, high refractive index layer are coated with, and E, low-index layer are coated with, the processing after F, plated film are finished; Described high refractive index layer is coated with and is coated with low-index layer is to use based on monitoring piece to change tactful indirect optics real-time film thickness monitoring method is coated with different centre wavelengths respectively at the substrate tow sides long-pass filter coating, constitute two long-pass filter coating systems, one is that the positive long-pass filter coating of substrate is n, and another is n ' for substrate reverse side long-pass filter coating; Described monitoring piece is changed strategy and is referred to the replacing position of monitoring piece and the preferred version of quantity.
Embodiment 4: be a preferred embodiment of manufacture method of the present invention.Different with above-described embodiment 3 is: described substrate cleans and is: the planar optics after the twin polishing is at first wiped one time with polishing fluid is rough, clean with anhydrous mixed organic solvents again, then with the whether smooth finish standard up to specification of method inspection of breathing out, put into the coating machine vaporization chamber after qualified, vacuumize at last and heat eyeglass.Described substrate surface plasma etching treatment is: when base vacuum reaches in the coating machine vaporization chamber after substrate has cleaned, namely open ion gun substrate surface is carried out the ion bombardment; The working gas of described ion bombardment is pure argon (4N), and its technological parameter comprises: bias voltage 100～220V, discharge current 30～60A, 3～8 minutes duration; Etch thicknesses 30～100nm.The technological parameter of described ion bombardment is selected at the substrates of different material: a, when substrate is coloured glass: bias voltage 150～220V, discharge current 30～60A, 3～8 minutes duration, etch thicknesses 30～100nm charges into auxiliary oxygen flow 3～10sccm; B, when substrate is infrared crystal: bias voltage 100～150V, discharge current 30～50A, 3～5 minutes duration, etch thicknesses 30～80nm.Described transition adhesive linkage is coated with and is: select SiO for use
2, or SiO, or Al
2O
3, adopt electron beam evaporation and ion assisted deposition; The film thickness monitoring mode is the crystal oscillator film thickness monitoring, and rate of sedimentation is 0.2-0.7nm/s, and oxygen flow is 0-5sccm; The ion assisted deposition bias voltage is 110-150V, and discharge current is 30-60A.Described high refractive index layer is coated with the electron beam evaporation of employing, and rate of sedimentation is 0.2-0.5nm/s, and oxygen flow is 5-20sccm, and the ion assisted deposition parameter is: bias voltage 120-160V, discharge current 30-60A.Described low-index layer is coated with the employing electron beam evaporation, and its speed is 0.3-0.7nm/s, and oxygen flow is 0-5sccm, and the ion assisted deposition parameter is: bias voltage 120-150V, discharge current 30-60A.Described substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating are alternately to be coated with by high-index material and low-index material to form, adopt the indirect optical thickness monitor method of changing strategy based on monitoring piece to monitor in real time in the deposition process when being coated with and stop a plating point criterion: at first, convert substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating system to monitoring piece film system separately, then by optimizing selected supervisory wavelength, make each rete stop plating and put the positive control amount in feedback signal light changes 2.0%～10% scope of amplitude peak, and an extreme value appears at least, simultaneously, cross the positive control amount at difference and carry out the overall situation deposition emulation that monitoring piece is changed strategy, that obtains the evaluation function minimum a kind ofly is optimum monitoring piece and changes strategy.
Embodiment 5: be another preferred embodiment of manufacture method of the present invention.Different with above-described embodiment 4 is: the technological parameter of described ion bombardment is selected at the substrates of different material: a, when substrate is coloured glass: bias voltage 150～220V, discharge current 30～60A, 3～8 minutes duration, etch thicknesses 30～100nm charges into auxiliary oxygen flow 3～10sccm; B, when substrate is infrared crystal: bias voltage 100～150V, discharge current 30～50A, 3～5 minutes duration, etch thicknesses 30～80nm.
Embodiment 6: for a kind of super broadband of the present invention is ended long-pass filter coating and manufacture method preferred embodiment thereof, realize at the precious SYRUSpro1110 type of Lay vacuum coating equipment.This equipment disposes advanced APS ion gun, Polycold cold-trap, IC5 crystal oscillator film thickness monitoring system and OMS5000 optical film thickness monitoring system etc.
A kind of visible light of the present invention and the super broadband of near-infrared band are applied in the celestial navigation size by the long-pass filter coating
Technical requirement is as follows:
At first, as substrate material, it effectively reaches about 920nm by wave band according to the selected monocrystalline silicon of above-mentioned technical requirement.Design two kinds of near infrareds then respectively by the long-pass filter coating, first kind require 900-1150nm to end and 1250-1700nm high saturating; Second kind require 1200-1420nm to end and 1480-1700nm high saturating.Selected high-index material and low-index material are respectively: titania (TiO
2) and monox (SiO
2), total number of plies of two kinds of long-pass optical filtering membrane systems is respectively 19 layers and 35 layers, all comprises transition adhesive linkage SiO.Next introduce the blooming scale factor (being respectively 1.355 and 1.287) of above-mentioned material, using the Macleod film is that design software changes into monitoring piece film system respectively with two kinds of film systems.Set then and stop plating point stochastic error
And the experience error that causes of the monitoring piece that more renews
(annotating: must change at the high-index material place) value is as follows:
Be the just too probability distribution function N(0 of computing machine generation, 1), simulation quantity is set at 30 times.On the other hand, the blooming overshoot of rule of thumb setting high low-index material is respectively 5% and 8%, and is limited to 10 layers on each monitoring piece monitoring rete number to guarantee that monitor procedure change in optical signal amplitude is not less than 2.0%.Simultaneously, the evaluation function of the selected S rank modular form of using always (S=2 usually) is defined as follows:
In the formula,
With
Be respectively target reflectivity values (theoretical design result) and deposition simulation result,
Be the weight that each wavelength is got, unification here is set at 0.5.Through the emulation of computing machine deposition, the Policy Result of the monitoring piece of selected evaluation function minimum replacing at last is: [2,8,14] (first kind of filter coating); [2,10,20,28] (second kind of filter coating).
On the other hand, by optimizing selected supervisory wavelength, make high low-index layer stop plating an overshoot and be respectively 5% and 8% of blooming.Rule of thumb, variable quantity is finely tuned with interior rete supervisory wavelength at 15nm, will be close to supervisory wavelength by adjustment overshoot value and become a kind of supervisory wavelength with the frequent wavelength switching of abundant minimizing optical film thickness monitoring system.
Manufacturing step is as follows:
A, substrate clean: after 1 planar optics of substrate shown in Fig. 1 is carried out twin polishing earlier, wipe one time with special-purpose polishing liquid is rough again, clean with anhydrous mixed organic solvents again after finishing, then with the whether smooth finish standard up to specification of method inspection of breathing out, put into the coating machine vaporization chamber after qualified, vacuumize and heat eyeglass; Heating-up temperature is set at 160 ℃, and heat penetration 45 minutes.Simultaneously, open OMS5000 thickness system and carry out preheating and calibration;
B, plasma etching treatment: when reaching base vacuum
The time, to open ion gun lens surface is carried out the ion bombardment, working gas is high-purity argon gas (4N); Parameter arranges as follows: bias voltage 135V, discharge current 50A, 5 minutes duration; The about 50nm of etch thicknesses;
Being coated with of C, transition adhesive linkage: after the plasma etching treatment of B step is intact, carry out being coated with of transition adhesive linkage, transition adhesive linkage material selection SiO, adopt electron beam evaporation, rate of sedimentation 0.35nm/s, the ion assisted deposition parameter is: bias voltage 125V, discharge current 50A, the duration determines that according to film structure the film thickness monitoring mode is the crystal oscillator film thickness monitoring;
Being coated with of D, high refractive index layer: at first need to carry out fritting fully before being coated with; Adopt electron beam evaporation, rate of sedimentation 0.35nm/s, oxygen flow 18sccm; Set the corresponding supervisory wavelength of rete according to result of calculation, adopt the optical thickness monitor mode; The assistant depositing parameter is: bias voltage 120V, and discharge current 50A, the duration is determined according to film structure;
Being coated with of E, low-index layer: adopt electron beam evaporation, at first carry out the coating materials fritting, rate of sedimentation 0.65nm/s, oxygen flow 5sccm; Set the corresponding supervisory wavelength of rete according to result of calculation, adopt the optical thickness monitor mode; The ion assisted deposition parameter is: bias voltage 130V, and discharge current 55A, the duration is determined according to film structure;
Processing after F, plated film are finished: after plated film is finished, close components and parts such as ion gun, electron gun, and continue to vacuumize, close the Polycold cold-trap after 5 minutes, wait the vaporization chamber temperature to be down to and open the vaporization chamber sampling below 100 ℃.
Detect: the plated film part is carried out the optical property check and film adhesion, environmental adaptability detect.
Claim protection domain of the present invention is not limited to above-described embodiment.
Claims (12)
1. a super broadband is by the long-pass filter coating, it is characterized in that, it comprises substrate, this substrate is optical element, its tow sides have been coated with the transition adhesive linkage respectively, alternately are coated with the long-pass filter coating of some layers of different centre wavelength on this transition adhesive linkage, constitute two long-pass filter coating systems: one is the positive long-pass filter coating of substrate system, another is substrate reverse side long-pass optical filtering module system, and these two long-pass filter coating systems form by high refractive index layer and low-index layer; High refractive index layer is coated with by high-index material and forms, and low-index layer is coated with by low-index material and forms.
2. super broadband according to claim 1 is characterized in that by the long-pass filter coating substrate (1) material mainly is selected from coloured glass or infrared crystal; Transition adhesive linkage material is SiO
2, or SiO or Al
2O
3, high-index material is TiO
2, or Ta
2O
5, low-index material is SiO
2
3. super broadband according to claim 1 is characterized in that by the long-pass filter coating, and two long-pass filter coating systems are connected in series fully by wave band, and the overlay region of ending of 10～50nm is arranged; Wherein, the shortwave cut off of the less long-pass filter coating of centre wavelength absorbs by the upper limit less than the intrinsic of optical element.
4. super broadband according to claim 1 is by the long-pass filter coating, it is characterized in that, the optical element after the final film forming of long-pass filter coating have from the 400-1400nm wave band degree of depth by and 1500-1700nm wave band transmitance be not less than 92% optical characteristics.
5. the manufacture method that the described super broadband of claim 1 is ended the long-pass filter coating is characterized in that manufacturing step comprises: the substrate cleaning, the substrate surface plasma etching treatment, the transition adhesive linkage is coated with, and high refractive index layer is coated with, low-index layer is coated with, the processing after plated film is finished; Described high refractive index layer is coated with and is coated with low-index layer is to use based on monitoring piece to change tactful indirect optics real-time film thickness monitoring method is coated with different centre wavelengths respectively at the substrate tow sides long-pass filter coating, constitute two long-pass filter coating systems, one is the positive long-pass filter coating of substrate system, and another is substrate reverse side long-pass filter coating system.
6. super broadband according to claim 5 is by the manufacture method of long-pass filter coating, it is characterized in that, described substrate cleans: the planar optics after the twin polishing is at first wiped one time with polishing fluid is rough, clean with anhydrous mixed organic solvents again, then with the whether smooth finish standard up to specification of method inspection of breathing out, put into the coating machine vaporization chamber after qualified, vacuumize at last and heat eyeglass.
7. super broadband according to claim 5 is by the manufacture method of long-pass filter coating, it is characterized in that, described substrate surface plasma etching treatment is: when base vacuum reaches in the coating machine vaporization chamber after substrate has cleaned, namely open ion gun substrate surface is carried out the ion bombardment; The working gas of described ion bombardment is pure argon (4N), and its technological parameter comprises: bias voltage 100～220V, discharge current 30～60A, 3～8 minutes duration; Etch thicknesses 30～100nm.
8. super broadband according to claim 5 is characterized in that by the manufacture method of long-pass filter coating, and the technological parameter of ion bombardment is selected at the substrates of different material:
A, when substrate is coloured glass: bias voltage 150～220V, discharge current 30～60A, 3～8 minutes duration, etch thicknesses 30～100nm charges into auxiliary oxygen flow 3～10sccm;
B, when substrate is infrared crystal: bias voltage 100～150V, discharge current 30～50A, 3～5 minutes duration, etch thicknesses 30～80nm.
9. super broadband according to claim 5 is characterized in that by the manufacture method of long-pass filter coating described transition adhesive linkage is coated with and is: select SiO for use
2, or SiO, or Al
2O
3, adopt electron beam evaporation and ion assisted deposition; The film thickness monitoring mode is the crystal oscillator film thickness monitoring, and rate of sedimentation is 0.2-0.7nm/s, and oxygen flow is 0-5sccm; The ion assisted deposition bias voltage is 110-150V, and discharge current is 30-60A.
10. super broadband according to claim 5 is by the manufacture method of long-pass filter coating, it is characterized in that, high refractive index layer is coated with the electron beam evaporation of employing, rate of sedimentation is 0.2-0.5nm/s, oxygen flow is 5-20sccm, the ion assisted deposition parameter is: bias voltage 120-160V, discharge current 30-60A.
11. super broadband according to claim 5 is by the manufacture method of long-pass filter coating, it is characterized in that, described low-index layer is coated with the employing electron beam evaporation, its speed is 0.3-0.7nm/s, oxygen flow is 0-5sccm, the ion assisted deposition parameter is: bias voltage 120-150V, discharge current 30-60A.
12. super broadband according to claim 5 is by the manufacture method of long-pass filter coating, it is characterized in that, substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating are alternately to be coated with by high-index material and low-index material to form, adopt the indirect optical thickness monitor method of changing strategy based on monitoring piece to monitor in real time in the deposition process when being coated with and stop a plating point criterion: at first, convert substrate positive long-pass filter coating system and substrate reverse side long-pass filter coating system to monitoring piece film system separately, then by optimizing selected supervisory wavelength, make each rete stop plating and put the positive control amount in feedback signal light changes 2.0%～10% scope of amplitude peak, and an extreme value appears at least, simultaneously, cross the positive control amount at difference and carry out the overall situation deposition emulation that monitoring piece is changed strategy, that obtains the evaluation function minimum a kind ofly is optimum monitoring piece and changes strategy.
Priority Applications (1)
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| CN105068170A (en) * | 2015-07-21 | 2015-11-18 | 美德瑞光电科技（上海）有限公司 | Infrared cut-off filter with good infrared light filtering effects |
| CN105405912A (en) * | 2015-12-15 | 2016-03-16 | 重庆鹰谷光电有限公司 | Silicon photoelectric detector chip with self-filtering function |
| CN109182972A (en) * | 2018-08-30 | 2019-01-11 | 华中光电技术研究所（中国船舶重工集团有限公司第七七研究所） | Multispectral hard anti-reflection film of large-size sapphire substrate and preparation method thereof |
| CN109655954A (en) * | 2019-03-05 | 2019-04-19 | 浙江水晶光电科技股份有限公司 | Optical filter and preparation method thereof, fingerprint recognition mould group and electronic equipment |
| CN110058343A (en) * | 2019-04-16 | 2019-07-26 | 河南平原光电有限公司 | A kind of short-pass optical filtering membrane preparation method based on multi-angle spectral measurement |
| CN110927963A (en) * | 2019-11-18 | 2020-03-27 | 中国科学院上海光学精密机械研究所 | Design and preparation method of short-wave broadband cut-off medium-wave transmission film |
| CN111596391A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Gun-aiming red-film optical filter and preparation method thereof |
| CN111596393A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Anti-color-cast sighting telescope filter film, preparation method and optical filter |
| CN111596394A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Red exposure prevention filter film for inhibiting blue-violet edge gluing, preparation method and optical filter |
| CN111596392A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Gun-aiming narrow-band negative filter film, preparation method and optical filter |
| CN112162342A (en) * | 2020-10-15 | 2021-01-01 | 昆明南旭光电技术有限公司 | Special infrared filter and film coating method thereof |
| CN112596140A (en) * | 2020-11-26 | 2021-04-02 | 中国航空工业集团公司洛阳电光设备研究所 | Infrared long-wave cut-off filter and preparation method thereof |
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| CN105405912A (en) * | 2015-12-15 | 2016-03-16 | 重庆鹰谷光电有限公司 | Silicon photoelectric detector chip with self-filtering function |
| CN109182972A (en) * | 2018-08-30 | 2019-01-11 | 华中光电技术研究所（中国船舶重工集团有限公司第七七研究所） | Multispectral hard anti-reflection film of large-size sapphire substrate and preparation method thereof |
| CN109182972B (en) * | 2018-08-30 | 2021-01-19 | 华中光电技术研究所（中国船舶重工集团有限公司第七一七研究所） | Large-size sapphire substrate multispectral hard antireflection film and preparation method thereof |
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| CN110058343B (en) * | 2019-04-16 | 2021-08-17 | 河南平原光电有限公司 | Preparation method of short wave pass filter film based on multi-angle spectral measurement |
| CN110927963A (en) * | 2019-11-18 | 2020-03-27 | 中国科学院上海光学精密机械研究所 | Design and preparation method of short-wave broadband cut-off medium-wave transmission film |
| CN111596393A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Anti-color-cast sighting telescope filter film, preparation method and optical filter |
| CN111596394A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Red exposure prevention filter film for inhibiting blue-violet edge gluing, preparation method and optical filter |
| CN111596392A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Gun-aiming narrow-band negative filter film, preparation method and optical filter |
| CN111596391A (en) * | 2020-06-19 | 2020-08-28 | 三明福特科光电有限公司 | Gun-aiming red-film optical filter and preparation method thereof |
| CN111596391B (en) * | 2020-06-19 | 2023-07-11 | 三明福特科光电有限公司 | Gun aiming red film filter and preparation method thereof |
| CN111596392B (en) * | 2020-06-19 | 2023-07-14 | 三明福特科光电有限公司 | Gun aiming narrow-band negative filter film, preparation method and filter |
| CN111596394B (en) * | 2020-06-19 | 2023-07-14 | 三明福特科光电有限公司 | Red exposure prevention filter film for inhibiting blue-violet edge gluing, preparation method and filter |
| CN111596393B (en) * | 2020-06-19 | 2023-07-11 | 三明福特科光电有限公司 | Color cast prevention sighting telescope filter film, preparation method and filter |
| CN112162342A (en) * | 2020-10-15 | 2021-01-01 | 昆明南旭光电技术有限公司 | Special infrared filter and film coating method thereof |
| CN112162342B (en) * | 2020-10-15 | 2022-07-05 | 昆明南旭光电技术有限公司 | Special infrared filter and film coating method thereof |
| CN112596140B (en) * | 2020-11-26 | 2022-11-01 | 中国航空工业集团公司洛阳电光设备研究所 | Infrared long-wave cut-off filter and preparation method thereof |
| CN112596140A (en) * | 2020-11-26 | 2021-04-02 | 中国航空工业集团公司洛阳电光设备研究所 | Infrared long-wave cut-off filter and preparation method thereof |
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