CN103197370B - Light guide plate manufacturing method - Google Patents
Light guide plate manufacturing method Download PDFInfo
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- CN103197370B CN103197370B CN201310117205.3A CN201310117205A CN103197370B CN 103197370 B CN103197370 B CN 103197370B CN 201310117205 A CN201310117205 A CN 201310117205A CN 103197370 B CN103197370 B CN 103197370B
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- groove
- light guide
- guide plate
- reflection horizon
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0058—Means for improving the coupling-out of light from the light guide varying in density, size, shape or depth along the light guide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00663—Production of light guides
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0036—2-D arrangement of prisms, protrusions, indentations or roughened surfaces
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
- G02B6/0055—Reflecting element, sheet or layer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0063—Means for improving the coupling-out of light from the light guide for extracting light out both the major surfaces of the light guide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0075—Arrangements of multiple light guides
- G02B6/0076—Stacked arrangements of multiple light guides of the same or different cross-sectional area
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Planar Illumination Modules (AREA)
- Illuminated Signs And Luminous Advertising (AREA)
- Liquid Crystal (AREA)
Abstract
The invention relates to the field of display technique and discloses a light guide plate manufacturing method. The light guide plate manufacturing method includes the following steps: a plurality of first groove patterns and a plurality of second groove patterns arranged at intervals are formed in the surface of a transparent substrate; a pattern comprising a first reflection layer is formed in the surface of first grooves; and a transparent protection layer is formed. Light guide plates manufactured according to the manufacturing method enable a display device to achieve double-face display.
Description
Technical field
The present invention relates to display technique field, particularly a kind of method for manufacturing light guide plate.
Background technology
Backlight module is one of significant components of liquid crystal display, and because liquid crystal itself is not luminous, the function of backlight module is exactly well-off brightness and the luminophor be evenly distributed, and makes the normal show image of liquid crystal display energy.At present, the display technique of liquid crystal display has been tending towards ripe, especially there has also been very large development at the design aspect of backlight module.Backlight module, except being applied in the liquid crystal indicator such as liquid crystal display, liquid crystal TV set, can also provide luminophor for display device such as digital album (digital photo frame), Electronic Paper, mobile phones.
Backlight module is divided into down straight aphototropism mode set and side entrance back module according to the position difference of luminophor.Wherein, down straight aphototropism mode set, is directly placed in luminophor below exit facet, and the light that luminophor sends, after the diffusion and mixing of one section of space length and diffuser plate, becomes area source and emits; Luminophor is generally placed at least one side of light guide plate by side entrance back module, and light enters light guide plate by side surface coupling, forms total reflection and continuous forward direction in light guide plate.By the destruction to total reflection condition, realize light guide plate exit facet and evenly penetrate light.Therefore, the light-out effect of structure on backlight module of light guide plate has important impact.
Fig. 1 shows the structural representation of a kind of light guide plate in prior art, described light guide plate comprises light guide plate base, and this light guide plate base comprises a bottom surface 3, be connected with the plane of incidence in order to the plane of incidence 1, of receiving beam and is connected with the plane of incidence 1 and the exit facet relative with bottom surface 32, a side 4 relative with the plane of incidence 1 and all the other relative two sides.In order to destroy the total reflection of light in light guide plate, bottom surface 3 is provided with optics site 5, incident light to enter after light guide plate multiple total reflection inside light guide plate, extend to whole light guide plate inner, when incident light propagation is to optics site 5, there is diffuse reflection and penetrate light guide plate (bottom surface is light tight) by the exit facet 2 of light guide plate.Adjusted by the density of optics site 5, the emergent light brightness of light guide plate can be made to be uniformly distributed on whole exit facet.At the light guide plate plane of incidence 1 arranged outside luminophor 6, luminophor 6 outer setting reflex housing 7, side 4 and other sides form reflecting surface by arranging reflector plate.Luminophor 6 launches light in light guide plate by the plane of incidence 1, through the reflex of bottom surface 3 and side 4, is penetrated by exit facet 2.
It should be noted that, the position of above-mentioned luminophor can be arranged at least one side place of light guide plate, the convenience here in order to illustrate, just luminophor is arranged on the side place of light guide plate.
But the normally one side display of existing display device, the light guide plate in backlight module can only the bright dipping of exit facet one side, cannot meet the demand of double-side display device.
Summary of the invention
(1) technical matters that will solve
The technical problem to be solved in the present invention is: how to make a kind of light guide plate that can make display device double-sided display.
(2) technical scheme
For solving the problems of the technologies described above, the invention provides a kind of method for manufacturing light guide plate, comprising step:
The figure of multiple spaced first groove and the second groove is formed on transparency carrier surface;
The figure comprising the first reflection horizon is formed in described first groove surfaces;
Form transparent protective seam.
Wherein, form in described first groove surfaces the figure comprising the first reflection horizon specifically to comprise:
Photoresist is formed on the surface of the figure with the first groove and the second groove;
By mask plate, described photoresist exposure imaging is removed to the photoresist of described first groove corresponding region;
Form reflecting material film;
Peel off remaining photoresist, make described first groove surfaces form described first reflection horizon.
Wherein, also comprise after the protective seam that described formation is transparent: form the first non-reflective layer in the region of corresponding first groove of described protective layer.
Wherein, also comprise after described formation reflecting material film: form non-reflective materials film on described reflective film surface; Perform the step of the remaining photoresist of described stripping afterwards, make described first groove surfaces be formed with the first reflection horizon and the first non-reflective layer successively.
Wherein, the degree of depth of described first groove is less than the degree of depth of described second groove, also forms the figure comprising the second reflection horizon in the side of described second groove, specifically comprise while described first groove surfaces formation comprises the figure in the first reflection horizon:
Form photoresist on the surface of the figure with the first groove and the second groove and make its planarization;
Ashing is carried out to described photoresist, retains the photoresist being positioned at described second bottom portion of groove, make the photoresist thickness of reservation be less than the degree of depth of described second groove;
Form reflecting material film, and peel off remaining photoresist, to form in described first groove surfaces the figure comprising the first reflection horizon, form the figure comprising the second reflection horizon in the side of described second groove.
Wherein, form in described first groove surfaces the figure comprising the first reflection horizon, also comprise after the formation of the side of described second groove comprises the figure in the second reflection horizon: remove the reflecting material film outside the second groove side and the first groove corresponding region.
Wherein, also comprise after the protective seam that described formation is transparent: form the first non-reflective layer in the region of corresponding first groove of described protective layer, region corresponding to corresponding second groove side face forms the second non-reflective layer.
Wherein, also comprise after forming reflecting material film: form non-reflective materials film at reflecting material film surface; Perform the step of the remaining photoresist of described stripping afterwards, make described first groove surfaces form the figure of the first reflection horizon and the first non-reflective layer successively, the side of described second groove forms the figure of the second reflection horizon and the second non-reflective layer successively.
Wherein, form in described first groove surfaces the figure comprising the first reflection horizon and the first non-reflective layer, also comprise after the formation of the side of described second groove comprises the figure of the second reflection horizon and the second non-reflective layer: remove the reflecting material film outside the second groove side and the first groove corresponding region and non-reflective materials film.
Wherein, the degree of depth of described first groove is 0.5 μm ~ 3 μm, and the degree of depth of described second groove is 3 μm ~ 50 μm.
Wherein, the cross sectional shape of described second groove is trapezoidal, and two waists are 20 ° ~ 60 ° with the angle formed of going to the bottom.
Wherein, described second groove is hexahedron, and the bottom surface of described second groove is the upper bottom surface of hexahedron, and the surface parallel with upper bottom surface is bottom surface, and all the other four sides are side, and the area of bottom surface is greater than the area of upper bottom surface.
Wherein, described trapezoidal be isosceles trapezoid.
(3) beneficial effect
Method for manufacturing light guide plate of the present invention is formed with the first groove and the second groove on transparency carrier surface, at the first bottom portion of groove, reflection horizon is set, for reflection ray, the light guide plate inside made by the method is formed with spaced transmission projection (corresponding second groove) and reflection protrusion (corresponding first groove), transmission projection is used for light and injects display panel from the one side of display device, reflection protrusion is for reflecting through the light of display panel, avoid the light therethrough of the another side of display device to disturb this face to show simultaneously, thus the display frame respectively of display device two sides can be realized.
Accompanying drawing explanation
Fig. 1 is existing light conducting plate structure schematic diagram.
Fig. 2 forms at light guide plate substrate the schematic diagram forming the first groove and the second groove in a kind of method for manufacturing light guide plate of the embodiment of the present invention;
Fig. 3 forms photoresist on the basis of Fig. 2, and to forming the schematic diagram of reflecting material film after its exposure imaging thereon;
Fig. 4 is the schematic diagram that stripping photoresist forms the first reflection horizon on the basis of Fig. 3;
Fig. 5 is the structural representation of the first light guide plate formed on the basis of Fig. 4;
Fig. 6 is the double-side display device adopting the light guide plate of Fig. 5 and the light path schematic diagram utilizing external light source to show;
Fig. 7 is the structural representation of the second light guide plate formed on the basis of Fig. 4;
Fig. 8 forms photoresist on the basis of Fig. 2, and to forming the schematic diagram of reflecting material film and non-reflective materials film successively after its exposure imaging thereon;
Fig. 9 is the schematic diagram of formation first reflection horizon on the basis of Fig. 8 after stripping photoresist and the first non-reflective layer;
Figure 10 is the structural representation of the third light guide plate formed on the basis of Fig. 9;
Figure 11 forms photoresist and the schematic diagram of planarization on the basis of Fig. 2;
Figure 12 is the schematic diagram forming reflecting material film on the basis of Figure 11 after ashing photoresist;
Figure 13 is the schematic diagram on the basis of Figure 12 after stripping photoresist;
Figure 14 is the schematic diagram remove the reflecting material film outside the first groove and the second corresponding region, groove side face on the basis of Figure 13 after;
Figure 15 is the structural representation of the 4th kind of light guide plate formed on the basis of Figure 14;
Figure 16 is the double-side display device adopting the light guide plate of Figure 15 and the light path schematic diagram utilizing internal light source to show;
Figure 17 is the structural representation of the 5th kind of light guide plate formed on the basis of Figure 14;
Figure 18 is the schematic diagram forming reflecting material film and non-reflective materials film on the basis of Figure 11 after ashing photoresist successively;
Figure 19 is the schematic diagram on the basis of Figure 18 after stripping photoresist;
Figure 20 removes the reflecting material film outside the first groove and the second corresponding region, groove side face and the schematic diagram after non-reflective materials film on the basis of Figure 19;
Figure 21 is the structural representation of the 6th kind of light guide plate formed on the basis of Figure 20;
Figure 22 is the planar structure schematic diagram of light guide plate (with non-reflective layer)
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
Embodiment 1
The method for manufacturing light guide plate of the present embodiment comprises the steps:
Step one, as shown in Figure 2, at transparency carrier 100(as glass, quartz material etc.) surface forms the figure of multiple spaced first groove 101 and the second groove 102.Can adopt and first apply photoresist, exposure imaging goes out the region that will etch, and then utilizes the solution such as hydrofluorite to etch, and forms groove
Step 2, forms on the first groove 101 surface the figure comprising the first reflection horizon.As shown in Figure 3, this step specifically comprises:
Photoresist 200 is formed on the surface of the figure with the first groove 101 and the second groove 102.By mask plate, photoresist 200 exposure imaging is removed to the photoresist 200 of the first groove 101 corresponding region.Form reflecting material film 300 ＇, reflecting material can metallic film.As shown in Figure 4, peel off remaining photoresist 200, thus form the first reflection horizon 300 on the first groove 101 surface.
Step 3, as shown in Figure 5, forms transparent protective seam 500, thus forms light guide plate.Wherein, the modes such as coating, sputtering can be adopted to form protective seam 500.
As shown in Figure 6, the double-side display device schematic diagram that the light guide plate comprising the present embodiment is formed, comprise light guide plate and a display panel of two the present embodiment, two light guide plate lay respectively at the side in two logical light faces of display panel, and display panel is between two light guide plate.For light guide plate inside, the first groove becomes reflection protrusion, and the second groove then becomes transmission projection, and the pixel electrode area A(respectively on corresponding display panel can a corresponding pixel electrode area A, also can corresponding multiple pixel electrode area A).Transmission projection can transmission extraneous light, therefore this display device can not need internal light source, and light path is as shown in figure dotted arrow, and reflection protrusion is not only for reflection ray, and when watching in side, blocked the light of coming from opposite side transmission, thus reach the effect of double-sided display.
Embodiment 2
The first groove 101 due to the light guide plate of embodiment 1 is formed with the first reflection horizon 300, can be reflective when the extraneous light of viewing side is irradiated on the first reflection horizon 300, as shown in solid arrow in Fig. 6, thus have impact on viewing effect.
As shown in Figure 7, in the present embodiment, form the first non-reflective layer 400 in case extraneous light reflection in the region of corresponding first groove in protective seam 500 surface.Specifically after step one ~ step 3, form the first non-reflective layer 400 by patterning processes (comprising the techniques such as photoresist coating, exposure, development, etching, photoresist lift off) in the region of corresponding first groove in protective seam 500 surface.
Owing to having the non-reflective layer 400 of one deck first in the first reflection horizon 300 surface coverage, there will not be the situation that the extraneous light in Fig. 6 shown in solid arrow reflects, thus improve the effect of double-sided display.
Embodiment 3
Form the first non-reflective layer 400 on protective seam 500 surface in embodiment 2 and need a mask technique, thus add production process and cost.In the present embodiment, form the first non-reflective layer 400 on the surface in the first reflection horizon 300.Particularly, in the method for manufacturing light guide plate of the present embodiment, step one is identical with embodiment 1 with step 3, and difference is step 2, and step 2 specifically comprises:
As shown in Figure 8, photoresist 200 is formed on the surface of the figure with the first groove 101 and the second groove 102.By mask plate, photoresist 200 exposure imaging is removed to the photoresist 200 of the first groove 101 corresponding region, form reflecting material film 300 ＇ and non-reflective materials film 400 ＇ (material identical with matrix black in display panel can be adopted) successively.As shown in Figure 9, peel off remaining photoresist, thus be formed with the first reflection horizon 300 and the first non-reflective layer 400 successively in the first groove surfaces.After step 3, the final light guide plate formed as shown in Figure 10.
Because the first reflection horizon 300 and the first non-reflective layer 400 are being formed with a mask, do not need additionally to increase mask number, saving production process and cost, also prevent the viewing of extraneous light reflections affect simultaneously, improve display effect.
The double-side display device of the light guide plate that the method comprising above-mentioned three embodiments makes all utilizes external light source to show, when external light source is more weak or do not have external light source, then cannot normally show, therefore also light source can be set the side of transparency carrier 100 (surface vertical with the second groove 102 surface with being formed with the first groove 101 arranges light source), form edge-type light guide plate.
Embodiment 4
In order to utilize internal light source, the present embodiment also form reflection horizon in the side of the second groove 102.Concrete steps comprise:
Step one, as shown in Figure 2, at transparency carrier 100(as glass, quartz material etc.) surface forms the figure of multiple spaced first groove 101 and the second groove 102.Due to will in the formation reflection horizon, side of the second groove 102, the side of the second groove 102 will be tried one's best greatly, and therefore the degree of depth of the second groove 102 is comparatively dark, and the degree of depth is greater than the degree of depth of the first groove 101.The degree of depth of the first groove can be 0.5 μm ~ 3 μm, and the degree of depth of the second groove 102 can be 3 μm ~ 50 μm, and for convenience of etching and make its degree of depth be greater than the degree of depth of the first groove 101 as far as possible, preferably, the degree of depth of the second groove 102 is 10 μm ~ 50 μm.
In order to better the internal light source of side is reflected into display panel, the cross sectional shape of the second groove 102 is trapezoidal, and two waists are 20 ° ~ 60 ° with the angle formed of going to the bottom, and in order to make reflected light evenly incide display panel, preferably trapezoidal is isosceles trapezoid.As: the second groove 102 can truncated cone-shaped or hexahedron type.When second groove 102 is hexahedron, the second groove 102 is hexahedron, and the bottom surface of described second groove 102 is the upper bottom surface of hexahedron, and parallel with upper bottom surface is bottom surface, and all the other four sides are side, and the area of bottom surface is greater than the area of upper bottom surface.When four sides are equal with bottom surface angle, xsect is isosceles trapezoid.
Step 2, forms on the first groove 101 surface the figure comprising the first reflection horizon, also forms the figure comprising the second reflection horizon simultaneously in the side of the second groove 102.This step specifically comprises:
As shown in figure 11, form photoresist 800 on the surface of the figure with the first groove 101 and the second groove 102 and make its planarization.As shown in figure 12, ashing is carried out to photoresist 800, retain the photoresist 800 be positioned at bottom the second groove 102, make the photoresist thickness 800 of reservation be less than the degree of depth of described second groove 102.Form reflecting material film 300 ＇, and peel off remaining photoresist 800, to form on the first groove 101 surface the figure comprising the first reflection horizon 300, form the figure comprising the second reflection horizon 600 in the side of the second groove 102, as shown in figure 13.
Further, when recycling external light source, in order to make more light therethrough light guide plate, remove the reflecting material film outside the first groove 101 and the second corresponding region, groove 102 side, as shown in figure 14, the figure in the first groove 101 and the second reflection horizon, corresponding region first, groove 102 side 300 and the second reflection horizon 600 is only retained.
Step 3, as shown in figure 15, forms transparent protective seam 500, thus forms light guide plate.Wherein, the modes such as coating, sputtering can be adopted to form protective seam 500.Because needs use internal light source, also form light source 900 in the side of transparency carrier 100, as LED illuminator.
As shown in figure 16, comprise the present embodiment light guide plate formed double-side display device schematic diagram, concrete structure and Fig. 6 similar, light path during display is as shown in dotted arrow in Figure 16.The light guide plate of the present embodiment is formed with the second reflection horizon 600 in the side of the second groove, for the light of reflection source 900 to display panel.
The light guide plate of the present embodiment has internal light source, not enough or do not have still can normally show when external light source at external light source.Can external light source intensity sensor be set in backlight drive circuit, strong and weak according to the external light source that detects, make that internal light source is not luminous, light filling or worked by internal light source completely.
Embodiment 5
The first groove 101 due to the light guide plate of embodiment 4 is formed with the first reflection horizon 300, second groove 102 side is formed can be reflective when the extraneous light watching side in the second reflection horizon 600 is irradiated on the first reflection horizon 300, as shown in solid arrow in Figure 16, thus have impact on viewing effect.
As shown in figure 17, in the present embodiment, form the first non-reflective layer 400 in the region of corresponding first groove 101 in protective seam 500 surface, region corresponding to corresponding second groove 102 side forms the second non-reflective layer 700.
First non-reflective layer 400 and the second non-reflective layer 700 are in case extraneous light reflection.Specifically after step one ~ step 3, form the first non-reflective layer 400 by the region of corresponding first groove 101 in patterning processes protective seam 500 surface, region corresponding to corresponding second groove 102 side forms the second non-reflective layer 700.
Owing to having the non-reflective layer 400 of one deck first in the first reflection horizon 300 surface coverage, second reflection horizon 600 surface coverage has the non-reflective layer 700 of one deck second, there will not be the situation that the extraneous light in Figure 16 shown in solid arrow reflects, thus improve the effect of double-sided display.
Embodiment 6
Need a mask technique at protective seam 500 surface formation the first non-reflective layer 400 and the first non-reflective layer 700 in embodiment 5, thus add production process and cost.In the present embodiment, form the first non-reflective layer 400 on the surface in the first reflection horizon 300, form the second non-reflective layer 700 on the surface in the second reflection horizon 600.Particularly, in the method for manufacturing light guide plate of the present embodiment, step one is identical with embodiment 4 with step 3, and difference is step 2, and step 2 specifically comprises:
As shown in figure 11, form photoresist 800 on the surface of the figure with the first groove 101 and the second groove 102 and make its planarization.As shown in figure 18, ashing is carried out to photoresist 800, retain the photoresist 800 be positioned at bottom the second groove 102, make the photoresist thickness 800 of reservation be less than the degree of depth of described second groove 102.Form reflecting material film 300 ＇ and non-reflective materials film 400 ＇ successively, and peel off remaining photoresist 800, to form the figure comprising the first reflection horizon 300 and the first non-reflective layer 400 successively on the first groove 101 surface, the figure comprising the second reflection horizon 600 and the second non-reflective layer 700 is formed successively, as shown in figure 19 in the side of the second groove 102.
Further, when recycling external light source, in order to make more light therethrough light guide plate, remove the reflecting material film outside the first groove 101 and the second corresponding region, groove 102 side and non-reflective materials film, as shown in figure 20, the figure of the first groove 101 and the second non-reflective layer 400, second reflection horizon 600, reflection horizon, corresponding region first, groove 102 side 300, first and the second non-reflective layer 700 is only retained.
The final light guide plate formed after step 3, installs the light guide plate after light source 900 as shown in figure 21.
Because the first non-reflective layer 400, second reflection horizon 600, reflection horizon 300, first and the second non-reflective layer 700 are being formed with a mask, do not need additionally to increase mask number, save production process and cost, also prevent the viewing of extraneous light reflections affect simultaneously, improve display effect.
In above-described embodiment, multiple spaced first groove 101 that transparency carrier 100 is formed and the figure of the second groove 102 can be spaced some strip grooves, are preferably spaced some block grooves, as shown in figure 22.
Above embodiment is only for illustration of the present invention; and be not limitation of the present invention; the those of ordinary skill of relevant technical field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all equivalent technical schemes also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (12)
1. a method for manufacturing light guide plate, is characterized in that, comprises step:
The figure of multiple spaced first groove and the second groove is formed on transparency carrier surface;
Form in described first groove surfaces the figure comprising the first reflection horizon, thus described first groove is used for reflection ray, the second groove is used for transmitted ray;
Form transparent protective seam;
The first non-reflective layer is formed in the region of corresponding first groove of described protective layer.
2. method for manufacturing light guide plate as claimed in claim 1, is characterized in that, forms the figure comprising the first reflection horizon specifically comprise in described first groove surfaces:
Photoresist is formed on the surface of the figure with the first groove and the second groove;
By mask plate, described photoresist exposure imaging is removed to the photoresist of described first groove corresponding region;
Form reflecting material film;
Peel off remaining photoresist, make described first groove surfaces form described first reflection horizon.
3. method for manufacturing light guide plate as claimed in claim 2, is characterized in that, also comprise after described formation reflecting material film: form non-reflective materials film at described reflecting material film surface; Perform the step of the remaining photoresist of described stripping afterwards, make described first groove surfaces be formed with the first reflection horizon and the first non-reflective layer successively.
4. method for manufacturing light guide plate as claimed in claim 1, it is characterized in that, the degree of depth of described first groove is less than the degree of depth of described second groove, while described first groove surfaces formation comprise the figure in the first reflection horizon, also form the figure comprising the second reflection horizon in the side of described second groove, specifically comprise:
Form photoresist on the surface of the figure with the first groove and the second groove and make its planarization;
Ashing is carried out to described photoresist, retains the photoresist being positioned at described second bottom portion of groove, make the photoresist thickness of reservation be less than the degree of depth of described second groove;
Form reflecting material film, and peel off remaining photoresist, to form in described first groove surfaces the figure comprising the first reflection horizon, form the figure comprising the second reflection horizon in the side of described second groove.
5. method for manufacturing light guide plate as claimed in claim 4, it is characterized in that, form in described first groove surfaces the figure comprising the first reflection horizon, also comprise after the formation of the side of described second groove comprises the figure in the second reflection horizon: remove the reflecting material film outside the second groove side and the first groove corresponding region.
6. method for manufacturing light guide plate as claimed in claim 4; it is characterized in that; also comprise after the protective seam that described formation is transparent: form the first non-reflective layer in the region of corresponding first groove of described protective layer, region corresponding to corresponding second groove side face forms the second non-reflective layer.
7. method for manufacturing light guide plate as claimed in claim 4, is characterized in that, also comprises after forming reflecting material film: form non-reflective materials film at reflecting material film surface; Perform the step of the remaining photoresist of described stripping afterwards, make described first groove surfaces form the figure of the first reflection horizon and the first non-reflective layer successively, the side of described second groove forms the figure of the second reflection horizon and the second non-reflective layer successively.
8. method for manufacturing light guide plate as claimed in claim 7, it is characterized in that, form in described first groove surfaces the figure comprising the first reflection horizon and the first non-reflective layer, also comprise after the formation of the side of described second groove comprises the figure of the second reflection horizon and the second non-reflective layer: remove the reflecting material film outside the second groove side and the first groove corresponding region and non-reflective materials film.
9. method for manufacturing light guide plate as claimed in claim 4, it is characterized in that, the degree of depth of described first groove is 0.5 μm ~ 3 μm, and the degree of depth of described second groove is 3 μm ~ 50 μm.
10. method for manufacturing light guide plate as claimed in claim 4, it is characterized in that, the cross sectional shape of described second groove is trapezoidal, and two waists are 20 ° ~ 60 ° with the angle formed of going to the bottom.
11. method for manufacturing light guide plate as claimed in claim 10, it is characterized in that, described second groove is hexahedron, the bottom surface of described second groove is the upper bottom surface of hexahedron, the surface parallel with upper bottom surface is bottom surface, and all the other four sides are side, and the area of bottom surface is greater than the area of upper bottom surface.
12. method for manufacturing light guide plate as claimed in claim 10, is characterized in that, described trapezoidal be isosceles trapezoid.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310117205.3A CN103197370B (en) | 2013-04-07 | 2013-04-07 | Light guide plate manufacturing method |
| PCT/CN2013/083851 WO2014166211A1 (en) | 2013-04-07 | 2013-09-19 | Light guide plate and manufacturing method therefor, and display device comprising same |
| US14/364,843 US9651731B2 (en) | 2013-04-07 | 2013-09-19 | Light guide plate, manufacturing method of the same and display device comprising the same |
| EP13861500.0A EP2985643B1 (en) | 2013-04-07 | 2013-09-19 | Light guide plate and manufacturing method therefor, and display device comprising same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310117205.3A CN103197370B (en) | 2013-04-07 | 2013-04-07 | Light guide plate manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103197370A CN103197370A (en) | 2013-07-10 |
| CN103197370B true CN103197370B (en) | 2015-05-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310117205.3A Expired - Fee Related CN103197370B (en) | 2013-04-07 | 2013-04-07 | Light guide plate manufacturing method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9651731B2 (en) |
| EP (1) | EP2985643B1 (en) |
| CN (1) | CN103197370B (en) |
| WO (1) | WO2014166211A1 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103197370B (en) * | 2013-04-07 | 2015-05-13 | 京东方科技集团股份有限公司 | Light guide plate manufacturing method |
| KR101511117B1 (en) * | 2014-01-07 | 2015-04-10 | 주식회사 토비스 | A Dual-sided Display |
| TWI554726B (en) * | 2014-06-27 | 2016-10-21 | 高雄晶傑達光電科技股份有限公司 | Light guide plate and manufacturing method thereof |
| CN105116484A (en) * | 2015-09-15 | 2015-12-02 | 北京京东方茶谷电子有限公司 | Light guide plate, backlight module and display device |
| CN105242335B (en) * | 2015-10-26 | 2017-07-04 | 江苏新广联科技股份有限公司 | The preparation method of LED panel lamp diffuser plate |
| US10088412B2 (en) * | 2016-09-27 | 2018-10-02 | Electronics & Telecommunications Research Institute | Apparatus for analyzing bio-material |
| CN110456443B (en) * | 2019-06-25 | 2020-07-28 | 盐城华旭光电技术有限公司 | Printing and etching all-in-one machine for producing backlight light guide plate |
| JP6924958B1 (en) * | 2020-01-31 | 2021-08-25 | 日亜化学工業株式会社 | Planar light source |
| WO2021153561A1 (en) * | 2020-01-31 | 2021-08-05 | 日亜化学工業株式会社 | Planar light source |
| CN114355670A (en) * | 2022-01-10 | 2022-04-15 | Tcl华星光电技术有限公司 | Light source module, liquid crystal display device and display equipment |
| CN114355672A (en) | 2022-01-10 | 2022-04-15 | Tcl华星光电技术有限公司 | Light source module, liquid crystal display device and display equipment |
| CN114355671A (en) * | 2022-01-10 | 2022-04-15 | Tcl华星光电技术有限公司 | Light source module, liquid crystal display device and display equipment |
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- 2013-04-07 CN CN201310117205.3A patent/CN103197370B/en not_active Expired - Fee Related
- 2013-09-19 WO PCT/CN2013/083851 patent/WO2014166211A1/en active Application Filing
- 2013-09-19 EP EP13861500.0A patent/EP2985643B1/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| US9651731B2 (en) | 2017-05-16 |
| US20150309244A1 (en) | 2015-10-29 |
| WO2014166211A1 (en) | 2014-10-16 |
| CN103197370A (en) | 2013-07-10 |
| EP2985643A1 (en) | 2016-02-17 |
| EP2985643B1 (en) | 2019-11-20 |
| EP2985643A4 (en) | 2016-09-28 |
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