CN103181024A - Method for manufacturing an autocompensating antenna structure by etching - Google Patents
Method for manufacturing an autocompensating antenna structure by etching Download PDFInfo
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- CN103181024A CN103181024A CN2010800681192A CN201080068119A CN103181024A CN 103181024 A CN103181024 A CN 103181024A CN 2010800681192 A CN2010800681192 A CN 2010800681192A CN 201080068119 A CN201080068119 A CN 201080068119A CN 103181024 A CN103181024 A CN 103181024A
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- tuned cell
- impedance matching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/2208—Supports; Mounting means by structural association with other equipment or articles associated with components used in interrogation type services, i.e. in systems for information exchange between an interrogator/reader and a tag/transponder, e.g. in Radio Frequency Identification [RFID] systems
- H01Q1/2225—Supports; Mounting means by structural association with other equipment or articles associated with components used in interrogation type services, i.e. in systems for information exchange between an interrogator/reader and a tag/transponder, e.g. in Radio Frequency Identification [RFID] systems used in active tags, i.e. provided with its own power source or in passive tags, i.e. deriving power from RF signal
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/38—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q9/00—Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
- H01Q9/04—Resonant antennas
- H01Q9/0407—Substantially flat resonant element parallel to ground plane, e.g. patch antenna
- H01Q9/0442—Substantially flat resonant element parallel to ground plane, e.g. patch antenna with particular tuning means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q9/00—Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
- H01Q9/04—Resonant antennas
- H01Q9/16—Resonant antennas with feed intermediate between the extremities of the antenna, e.g. centre-fed dipole
- H01Q9/28—Conical, cylindrical, cage, strip, gauze, or like elements having an extended radiating surface; Elements comprising two conical surfaces having collinear axes and adjacent apices and fed by two-conductor transmission lines
- H01Q9/285—Planar dipole
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Abstract
An antenna structure (2) comprising at least a non-conducting substrate (3) and an electrically conductive antenna line configuration (4', 4'', 4''') supported by the substrate (3), the electrically conductive antenna line configuration (4', 4'', 4''') being formed in an etching process by etching away locally by etchant an electrically conductive coating material supported by the substrate (3). The antenna structure (2) further comprises at least one electrically conductive tuning element (7) of the same electrically conductive coating material.; The tuning element (7) is at least partly formed simultaneously with the electrically conductive antenna line configuration (4', 4'', 4''') in the same etching process, the tuning element having after the etching process dimensional shape and geometry to at least partly compensate the effect of over-or under-etching in the electrical properties of the antenna structure (2).
Description
Technical field
The present invention relates to a kind of antenna structure, this antenna structure comprises non-conductive substrate and at least by the conductive antenna line configuring of described base plate supports, by falling by the conductive coating material of base plate supports to form described conductive antenna line configuring in etching process by the etchant local etching.
In addition, the present invention relates to a kind of method of making antenna structure by etching, this antenna structure comprises substrate and by the conductive antenna line configuring of described base plate supports, and in described method, form described conductive antenna line configuring by the conductive coating material that falls by the etchant local etching by base plate supports.
In addition, the present invention relates to a kind of for make the etching mask of antenna structure by etching, this antenna structure comprises non-conductive substrate and conductive antenna line configuring at least, by falling by the conductive coating material of base plate supports to form described conductive antenna line configuring in etching process by the etchant local etching, this etching mask is determined the conductive antenna line configuring of antenna structure.
In addition, the present invention relates to antenna structure for the manufacture of radio-frequency identification transponder or RFID tag.
Background technology
Usually, in the etching of printed circuit board (PCB) or other corresponding electronic units or electronic product, the variation of etching process can caused the deviation of the electrical characteristic of significant circuit in succession between etched similar etched circuit.During radio-frequency structure when etching such as antenna structure, especially true.In the etching of the antenna that for example is used for RFID tag (being the RFID label), the change in process in etching can cause the frequency performance of etching antenna to change, and this has further affected the electric coupling between other parts of antenna and RFID circuit.
Fig. 1 discloses a kind of RFID tag 1 or RFID label 1 of prior art, and RFID label 1 is an example that can comprise the product of antenna structure 4, and wherein antenna structure 4 comprises the conducting wire configuration that forms by etching.RFID label 1 comprises antenna structure 2, and antenna structure 2 comprises substrate 3 and bipolar shape antenna 4 or antenna pattern 4, and antenna 4 is conducting wire configurations of antenna element 2.Therefore, antenna structure 2 forms the part of the RFID label 1 that can use in much dissimilar application.The RFID label can for example attach to the dissimilar article of selling in department store, is used for the customizing messages that storage relates to the attached article of these labels.The means that antenna 4 provides at the RFID label and has been used for reading the device of the information that is stored in label or is used for sending transmission information between the device that will be stored in the information in label.
RFID label 1 also comprises and is arranged to the integrated circuit 5 relevant with antenna 4 or chip 5, relates to customizing messages with the attached article of RFID label 1 with storage.Antenna structure 2 attaches to contact adhesive with the integrated circuit 5 that attaches to antenna structure 2, it is the attached element of sticker 6 or certain other types, thereby the RFID label 1 of completing is provided, and this RFID label 1 of completing for example is ready to attach to article for sale within department store.In Fig. 1, schematically show sticker 6 by having around the square frame of the dotted line of antenna structure 2.Except primary element shown in Figure 1, the RFID label can also comprise other layers that are laminated in or attach in addition antenna structure.
Particularly in the UHF frequency range of operation RFID label, impedance matching element 4 ' ' and radiant element 4 ' can by coupling element 4 ' ' ' (namely being electrically connected to each other) physically is connected to each other, but in fact, impedance matching element 4 ' ' and radiant element 4 ' coupled to each other by mutual inductance, that is the impedance matching element 4 ' that, has particular resonant frequency ' inductively be coupled in the radiant element 4 ' with particular resonant frequency.Impedance matching element 4 ' ' and radiant element 4 ' between coupling distance D---be impedance matching element 4 ' ' and radiant element 4 ' between beeline---affect the frequency response of antenna 4.
Should be noted that specific antenna configurations shown in Figure 12 provides as just example.Independent impedance matching element 4 ' except radiant element 4 ' ' the general RFID label antenna that is used for for the design of UHF scope.For example, in the near field (UHF NF) of operation UHF label, impedance matching element 4 ' ' ring structure can be used as antenna and need not any additional radiant element.
For the present invention who will be described later, the etching process that main significance is to understand in the antenna manufacturing changes the physical size that may change antenna 4.The variation of the physical size of antenna 4 means that antenna pattern size and initial designs target have certain deviation, and this design object depends on frequency range and the type of related RFID label.The etching process variation may for example come from temperature and the change of component of etchant or come from etchant to wanting the influence time of etched conductive coating.The variation of the physical size of antenna causes the electric parameter of antenna 4 to change, thereby changes antenna 4 frequency tunings, and the impedance of mating with integrated circuit 5.This frequency tuning changes the variation that can further be regarded as aspect of performance, makes the optimum performance of antenna begin deteriorated.
The factor that frequency tuning changes is impedance matching element 4 ' ' and radiant element 4 ' between the variation of coupling distance D.The variation of coupling distance D further changes impedance matching and the frequency response of antenna 4 together with integrated circuit 5.By some Antenna Design, the variation of the coupling distance D after etching can be up to ± 10%.This variation of coupling distance D may have significant impact to the performance of antenna, and the performance of antenna begins deteriorated, for example makes the frequency response of the antenna distortion significantly that becomes.In practice, this can for example observe by certain loss of reading in distance of RFID label.
In order to improve frequency characteristic, known way is to provide one or more carrier strips that add to antenna, and the described carrier strip that adds is adjacent to place with the element of spacing distance and antenna.Add length, width and/or the spacing distance of carrier strip and/or add the quantity of carrier strip by adjusting, can change the input impedance of antenna.Alternately, antenna can be provided with one or more tuning stubs, and described tuning stub is as two-conductor transmission line and can be with short circuit or the termination of opening circuit.Add quantity and physical structure and/or the mutual spacing of carrier strip by adjustment, the frequency characteristic of the tuning stub of antenna and element and antenna can be affected.Yet these features must be selected in the Antenna Design process, and the antenna frequency characteristic deviation that occurs due to the change in process of antenna during etching can not be compensated.
The U.S. discloses 6,535, and 175 disclose a kind of RFID label that comprises antenna, this antenna comprise physics variable with the performance characteristics that optionally changes antenna tuning stub and add carrier strip.Add carrier strip and tuning stub and can comprise further separately that variable selectable length has element, it can for example be removed by punching, cutting, etching or laser reconditioning, so that the expected frequency attribute of antenna to be provided.When antenna being carried out test signal is sent to the antenna with initial size and size when tuning.Measurement is from the intensity of the radiation signal of antenna reception, and the part of the tuning stub of the part that adds carrier strip by removing antenna and/or antenna is adjusted at least one physical characteristic of antenna with the impedance that changes antenna.These are measured and set-up procedure can repeat until obtain the suitable strength of radiation signal always.
Therefore the U.S. discloses 6,535, and 175 disclose a kind of like this scheme: it can consider the antenna frequency characteristic deviation that the change in process due to the antenna during etching occurs.Yet above-mentioned measurement and set-up procedure have produced the additional step that increases the overall cost in the RFID manufacturing.
Summary of the invention
The purpose of this invention is to provide a kind of novel solution of having considered the change in process of the during etching that the conducting wire configures.
The invention is characterized in the feature of independent claims.
Tuned cell is designed to affect the electric attribute of antenna structure in the situation of over etching or undercut, make antenna structure will have the frequency response attribute of the frequency response attribute that corresponds essentially to designed target antenna structure after etching process.This means, tuned cell will during etching process at least in part auto-compensation or automatically compensation be in difference between etching target phase of antenna traces configuration of actual antennas structure and expectation under etch processes, the etching target phase is spatial form and the overall dimension that configures as the antenna traces on the design-calculated basis of the desired frequency response of antenna structure.
In the situation of undercut, therefore namely in during etching does not have enough materials to be removed and realizes the situation of etching target of expectation, undercut is tending towards making the electromagnetism length of antenna structure elongated, and then tuned cell is tending towards making the electromagnetism length of this antenna structure to shorten.On the other hand, in the situation of over etching, namely in during etching had been removed too many material and therefore and realized the situation of etching target of expectation, over etching was tending towards making the electromagnetism length of antenna structure to shorten, and it is elongated that then tuned cell is tending towards making the electromagnetism length of this antenna structure.
Tuned cell therefore be designed to antenna structure in other parts compare opposite direction, affect the electric attribute of the antenna structure during undercut or over etching situation.This scheme helps in addition realize that the design with prior art compares the insensitive much more Antenna Construction Design of etching variation.Although this scheme is not to eliminate the variation of the frequency performance of antenna structure in all scenario fully, in any case it helps to make the impact that causes due to over etching or undercut to reduce to minimum.
According to an embodiment, antenna structure can be used for forming the part of radio-frequency identification transponder or RFID tag, and this radio-frequency identification transponder or RFID tag also comprise the integrated circuit that is electrically connected to antenna structure.This scheme is very favorable in the use that is intended to as in the antenna structure of the part of radio-frequency identification transponder or RFID tag, because in the RFID label, can easily observe from the deviation of the frequency response attribute of expectation by the reading the loss in distance of RFID label.
According to another embodiment, antenna structure comprises: be arranged to the impedance matching element that can be connected with integrated circuit; Radiant element; And being arranged in other coupling element between impedance matching element and radiant element, this coupling element is provided for the radio-frequency feed point of radiant element.Tuned cell can be designed to according at least one the effective electromagnetism length in the element that changes along with the etch phase of antenna structure in antenna structure, thus auto-compensation and the deviation of etching target phase to a certain extent.On the other hand, tuned cell can be designed to change electromagnetic matching between coupling element and radiant element by the radio-frequency feed point that impact is provided by coupling element.
Also possibly, use some tuned cells in same Antenna Design, thereby for example side by side affect effective electromagnetism length of antenna traces configuration and the electromagnetic matching between two or more elements in antenna structure, as the electromagnetic matching between coupling element and radiant element.
Description of drawings
Hereinafter, by means of preferred embodiment, the present invention is described in more detail with reference to the accompanying drawings, in the accompanying drawings:
Fig. 1 schematically shows the vertical view of the RFID tag of prior art;
Fig. 2 schematically shows the vertical view of another RFID tag that comprises antenna structure;
Fig. 3 a schematically shows with 3b the vertical view that antenna traces configures and is arranged to the tuned cell relevant with the coupling element of antenna traces configuration;
The vertical view that Fig. 4 a and 4b schematically show the second antenna and be arranged near the tuned cell radiant element, impedance matching element and the coupling element of antenna;
The vertical view that Fig. 5 a schematically shows third antenna with 5b and is arranged to the tuning structure relevant with coupling element with the impedance matching element of antenna;
The vertical view that Fig. 6 a and 6b schematically show the 4th antenna and be arranged to the tuned cell relevant with the impedance matching element of antenna;
The vertical view that Fig. 7 a and 7b schematically show the 5th antenna and be arranged to the tuned cell relevant with the radiant element of antenna;
Fig. 8 schematically shows tuned cell to the example of the impact of the frequency response of the RFID label that comprises dual-resonant antenna;
Fig. 9 schematically shows tuned cell to the example of the impact of the frequency response of the RFID label that comprises the single resonance antenna;
Figure 10 a schematically shows the single resonance antenna that does not comprise any tuned cell, and Figure 10 b schematically shows the single resonance antenna that comprises tuned cell; And
Figure 11 a and 11b schematically show the vertical view of etching mask, and this etching mask can be used in to be made in antenna and tuned cell shown in Figure 4.
Embodiment
Fig. 2 schematically shows another RFID tag 1 of comprising antenna structure 2 or the vertical view of RFID label 1.Antenna structure 2 comprises non-conductive substrate 3 and corresponding to the configuration of the conducting wire of bipolar shape antenna 4 or antenna pattern 4.Make antenna 4 by fall the conductive coating material that is supported by substrate 3 by means of the etchant local etching.Antenna 4 comprises antenna traces configuration, and this antenna traces configuration comprises radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ', coupling element 4 ' ' ' be provided for the radio-frequency feed point of radiant element 4 '.Also comprise according to the RFID label 1 of Fig. 2 being arranged to integrated circuit 5 or the chip 5 relevant with the antenna 4 in antenna structure 2, relate to RFID label 1 with the customizing messages of the article that are attached to storage.Antenna structure 2 and the integrated circuit 5 that attaches to antenna structure 2 are attached to contact adhesive, the attached element of sticker 6 or certain other types for example, thus the RFID label 1 of completing is provided.By schematically showing sticker 6 with dotted line and around the frame of antenna structure 2.Except primary element shown in Figure 2, RFID label 1 can also comprise other layers that are laminated to or are attached in addition RFID label 1 structure.
Fig. 3 a schematically shows after the antenna structure 2 that comprises antenna 4 is carried out etching, the vertical view of antenna 4 shown in Figure 2.Fig. 3 b shows the vertical view of the details in Fig. 3 a.Antenna 4 shown in Fig. 2 and Fig. 3 a is the bipolar shape antennas 4 that comprise the antenna traces configuration, and this antenna traces configuration comprises radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' '.About coupling element 4 ' ' ', at coupling element 4 ' ' ' both sides all have a tuned cell 7, make tuned cell 7 and coupling element 4 ' ' ' between have and be electrically connected to, tuned cell 7 therefore with coupling element 4 ' ' ' relevant.This illustrates in greater detail in Fig. 3 b.Coupling element 4 ' ' ' form from impedance matching element 4 ' ' is to the feedback point of the radio-frequency power of radiant element 4 '.Impedance matching element 4 ' ' ' the suitable coupling with integrated circuit 5 is provided.When at the coupling element 4 ' as feedback point ' ' both sides on when having added tuned cell 7, coupling element 4 ' ' ' effective dimensions, particularly coupling element 4 ' ' ' width become at during etching and affected symmetrically.
Tuned cell 7 shown in Fig. 3 b comprises four tuning sections, i.e. tuning 7a, 7b, 7c and 7d, wherein tuning 7a is apart from coupling element 4 ' ' ' nearest and tuning 7d apart from coupling element 4 ' ' ' farthest.Tuning 7b and 7c between tuning 7a and tuning 7d, make tuning 7b near tuning 7a and tuning 7c near tuning 7d.Tuning 7a, 7b, 7c and 7d have the shape shape of bar, and they have can be different between a tuning 7a to 7d certain width W and length- specific L.Tuning 7a, 7b, 7c and 7d interconnect on the Width of tuning section, i.e. a tuning 7a to 7d series connection continuously each other.Therefore tuning 7a, 7b, 7c and 7d are arranged in tuned cell 7, make between tuning 7a, 7b, 7c and 7d to have electrical connection, and therefore tuning 7a, 7b, 7c and 7d form tuned cell zone or tuned cell pattern unified or that do not disconnect.Tuned cell 7 and therefore a tuning 7a to 7d of tuned cell 7 have the identical conductive coating material that is supported by substrate 3 of conductive antenna line configuring with antenna 4, and their are by by in the etching process identical with the corresponding conductive antenna line configuring of antenna 4, by etchant simultaneously or synchronously local etching fall the conductive coating material and form or make.Yet, be possible by shape and the overall dimension removing a certain amount of conductive coating material or change tuned cell 7 by add a certain amount of conductive coating materials to tuned cell 7 from tuned cell 7 after etching process.
In the embodiment shown in Fig. 3 b, each in a tuning 7a to 7d has length L different when comparing each other, and making tuning 7a is of growing most and tuning 7d is the shortest.There are little gap 8a, 8b, 8c and 8d between each in tuning 7a, 7b, 7c and 7d and the radiant element 4 ' of antenna 4, make between a tuning 7a to 7d and radiant element 4 ' directly to be electrically connected to.Similarly, directly be electrically connected between each in tuning 7a, 7b, 7c and 7d and the impedance matching element 4 ' of antenna 4 ' between have little gap 8a ', 8b ', 8c ' and 8d ', make at a tuning 7a to 7d and impedance matching element 4 ' '.Size H between each in a tuning 7a to 7d and radiant element 4 ' and each in a tuning 7a to 7d and impedance matching element 4 ' ' between the some place of each in a tuning 7a to 7d of size H ' be different, size H and H ' are therefore corresponding to the size of gap 8a to 8d and the gap 8a ' size to 8d '.
During etching at antenna 4, comprise that the antenna structure 2 of the conductive coating material that is supported by substrate 3 is subject to the effect of etchant, wherein, this etcher is used to form the line configuring of antenna 4, be radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ', and in the situation that according to the embodiment of Fig. 3 a and 3b, this etchant also is used to form tuned cell 7.At during etching, etchant is removed the conductive coating material from the substrate on those parts that substrate 3 is not protected by the etching mask that is used of structure 2.Etching mask comprises that the needs that are positioned at substrate 3 keep the barrier material on those parts of designed conductive antenna line configuring.The basic principle of etching process itself be those skilled in the art usually known to, so this paper does not make a more detailed description it.
Yet, described as mentioned, can change the physical size of antenna traces configuration in the etching process variation of the antenna manufacturing that is used for the RFID label.The variation of antenna 4 physical sizes means that antenna pattern size and initial designs target have certain deviation.Etching process changes the variation to the action time of conductive coating material that will be etched of the variation of the temperature can for example come from etchant and component or etchant.The variation of antenna physical size causes the electric parameter of antenna 4 to change, thereby changes the antenna frequencies tuning characteristic.The change of frequency tuning can further be regarded as the optimum performance that makes antenna and be begun deteriorated performance change.
By using tuned cell 7 or near the tuned cell antenna 47 relevant with antenna 4, due to etchant on the possible excessive influence of conductive coating material or because etchant changes the possible frequency tuning that the possible too little impact of conductive coating material causes, during the etching process of antenna structure 2, namely at the during etching of antenna 4, can be compensated at least to a certain degree.During etching process, etchant not only the conductive coating material to be removed obtain to remove the conductive coating material on those parts of designed target antenna pattern, but also from the part that forms the conductive antenna line configuring corresponding with antenna 4 and tuned cell 7 removal conductive coating material.
In the embodiment shown in Fig. 3 a and 3b, tuned cell 7 is used to by changing coupling element 4 ' according to the etch phase along with antenna structure (2) ' ' effective width compensate possible over etching or the undercut (under-etching) at the radio-frequency feed point place of antenna 4, thereby improve coupling element 4 ' by the possible over etching of auto-compensation or the impact of undercut ' ' and radiant element 4 ' between electromagnetic matching and therefore affect the electromagnetic performance of whole antenna structure 2.
Fig. 8, Fig. 9, Figure 10 a and Figure 10 schematically show tuned cell to the example of the impact of the frequency response of the configuration of the etching antenna in antenna structure.
Fig. 4 a schematically shows the vertical view of the second antenna 4.Fig. 4 b shows the vertical view of the details in Fig. 4 a.Antenna 4 shown in Fig. 4 a is to comprise radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ' bipolar shape antenna 4.About coupling element 4 ' ' ', at coupling element 4 ' ' ' place, both sides a tuned cell 7 is arranged, make between tuned cell 7 and antenna 4 not to be electrically connected to, but tuned cell 7 is arranged in coupling element 4 ' ' ' near.
Tuned cell 7 shown in Fig. 4 b comprises four tuning sections, be tuning 7a, 7b, 7c and 7d, this four tuning with like that about similarly about radiant element 4 ', impedance matching element 4 ' in Fig. 3 b ' and coupling element 4 ' ' ' arrange, but adopt this different mode: in the embodiment of Fig. 4 b, a tuning 7a to 7d is separated from each other, that is, there is not electrical connection between a tuning 7a to 7d yet.A tuning 7a to 7d also have the form of bar and they have can be different between a tuning 7a to 7d certain width W and length-specific L.Therefore a tuning 7a to 7d forms tuned cell zone or tuned cell pattern skimble-scamble or that disconnect.
In the embodiment of Fig. 4 b, each in a tuning 7a to 7d has again length L different when comparing each other, and making tuning 7a is of growing most and tuning 7d is the shortest.Between the radiant element 4 ' of each in a tuning 7a to 7d and antenna 4, there are little gap 8a, 8b, 8c and 8d.Similarly, the impedance matching element 4 ' of each in a tuning 7a to 7d and antenna 4 ' between, there are little gap 8a ', 8b ', 8c ' and 8d '.Therefore, the size H between each in a tuning 7a to 7d and radiant element 4 ' and each and impedance matching element 4 ' in a tuning 7a to 7d ' between the position of each in a tuning 7a to 7d of size H ' be different.
The impact of etchant on tuned cell 7, namely on the impact of a tuning 7a to 7d to discuss about Fig. 3 b substantially similar.Yet in the embodiment of Fig. 4 b, etchant is removed material in each from a tuning 7a to 7d of tuned cell 7, will make each the width W in tuning reduce.Be used for compensation changes the frequency Tuning Characteristics of the antenna 4 that causes due to etching process the compensation effect of possible change, with as be similar type in the embodiment of Fig. 3 a and Fig. 3 b, make tuned cell 7 be used for by changing coupling element 4 ' ' ' effective width compensate possible over etching or the undercut at the radio-frequency feed point place of antenna 4, thereby improve coupling element 4 ' by the possible over etching of auto-compensation or the impact of undercut ' ' with radiant element 4 ' between electromagnetic matching and so affect the electromagnetic performance of whole antenna structure 2.
Fig. 5 a schematically shows the vertical view of third antenna 4.Fig. 5 b shows the vertical view of the details in Fig. 5 a.Antenna 4 shown in Fig. 5 a is to comprise equally radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ' bipolar shape antenna 4.About coupling element 4 ' ' ', at coupling element 4 ' ' ' both sides places all have a tuned cell 7, make at tuned cell 7 and impedance matching element 4 ' ' between and at tuned cell 7 and coupling element 4 ' ' ' between have be electrically connected to, therefore tuned cell 7 is arranged to and impedance matching element 4 ' ' and coupling element 4 ' ' ' relevant.
Tuned cell 7 shown in Fig. 5 b comprises four tuning sections, i.e. tuning 7a, 7b, 7c and 7d, and this four tuning mutually is electrically connected to and makes a tuning 7a to 7d form tuned cell unified or that do not disconnect zone or tuned cell pattern.A tuning 7a to 7d also have the form of bar and they have can be different between a tuning 7a to 7d certain width W and length-specific L.There are little gap 8a, 8b, 8c and 8d between the radiant element 4 ' of each in a tuning 7a to 7d and antenna 4.Size H between each in a tuning 7a to 7d and radiant element 4 ' the therefore position of each in a tuning 7a to 7d is different.
The impact of etchant on tuned cell 7, namely on the impact of a tuning 7a to 7d with discuss about Fig. 3 b substantially similar, make tuned cell 7 be used to by changing coupling element 4 ' ' ' effective width compensate possible over etching or the undercut at the radio-frequency feed point place of antenna 4, thereby improve coupling element 4 ' by the possible over etching of auto-compensation or the impact of undercut ' ' with radiant element 4 ' between electromagnetic matching and so affect the electromagnetic performance of whole antenna structure 2.
Fig. 6 a schematically shows the vertical view of the 4th antenna 4.Fig. 6 b shows the vertical view of the details in Fig. 6 a.Antenna 4 shown in Fig. 6 a is also to comprise radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ' bipolar shape antenna 4.About coupling element 4 ' ' ', at coupling element 4 ' ' ' both sides places all have a tuned cell 7, make at the impedance matching element 4 ' of tuned cell 7 with antenna 4 ' between have and be electrically connected to, therefore tuned cell 7 is arranged to and impedance matching element 4 ' ' relevant, but be in close proximity to coupling element 4 ' ' ' or at coupling element 4 ' ' ' near.
Tuned cell 7 shown in Fig. 6 b comprises four tuning sections, be tuning 7a, 7b, 7c and 7d, this four tuning with like that about similarly about radiant element 4 ', impedance matching element 4 ' in Fig. 4 b ' and coupling element 4 ' ' ' arrange, make not have direct electrical connection between a tuning 7a to 7d.Therefore a tuning 7a to 7d forms tuned cell zone or tuned cell pattern skimble-scamble or that disconnect.A tuning 7a to 7d also have the form of bar and they have can be different between a tuning 7a to 7d certain width W and length-specific L.
In the embodiment of Fig. 6 b, each in a tuning 7a to 7d has length L different when comparing each other, and making tuning 7a is of growing most and tuning 7d is the shortest.Between the radiant element 4 ' of each in a tuning 7a to 7d and antenna 4, there are little gap 8a, 8b, 8c and 8d.Each in a tuning 7a to 7d and radiant element 4 ' and impedance matching element 4 ' ' between size H therefore the position of each in a tuning 7a to 7d be different.
The impact of etchant on tuned cell 7, namely on the impact of a tuning 7a to 7d with discuss about Fig. 4 b substantially similar, make tuned cell 7 be used to by changing coupling element 4 ' according to the etch phase along with antenna structure (2) ' ' effective width compensate possible over etching or the undercut at the radio-frequency feed point place of antenna 4, thereby improve coupling element 4 ' by the possible over etching of auto-compensation or the impact of undercut ' ' and radiant element 4 ' between electromagnetic matching and therefore affect the electromagnetic performance of whole antenna structure 2.
Fig. 7 a schematically shows the vertical view of the 5th antenna 4.Fig. 7 b shows the vertical view of the details in Fig. 7 a.Antenna 4 shown in Fig. 7 a is also to comprise radiant element 4 ', impedance matching element 4 ' ' and coupling element 4 ' ' ' bipolar shape antenna 4.About radiant element 4 ', all have a tuned cell 7 in two ends of radiant element 4 ', make the end place at a tuning 7a to 7d, do not have between the radiant element 4 ' of tuned cell 7 and antenna 4 and be electrically connected to.Therefore tuned cell 7 is arranged to be in close proximity to the radiant element 4 ' of antenna 4 or near the radiant element 4 ' of antenna 4.
Tuned cell 7 shown in Fig. 7 b comprises four tuning sections, i.e. tuning 7a, 7b, 7c and 7d, and these four tuning sections do not have direct electrical connection about being arranged so that each other between a tuning 7a to 7d.Therefore a tuning 7a to 7d forms tuned cell zone or tuned cell pattern skimble-scamble or that disconnect.A tuning 7a to 7d also have the form of bar and they have can be different between a tuning 7a to 7d certain width W and length-specific L, but in the embodiment of Fig. 7 b, each in a tuning 7a to 7d has length L identical when comparing each other.
Etchant is in the impact of during etching on tuned cell 7, namely on the impact of a tuning 7a to 7d and front discuss substantially similar.Yet in the present embodiment, tuned cell 7 is used to compensate by the effective length that changes radiant element 4 ' possible over etching or the undercut that the radiant element 4 ' of antenna 4 is located, thereby improves the frequency response characteristic of radiant element 4 '.
In embodiment shown in above, tuned cell 7 is arranged at the radiant element 4 ' of antenna 4 or coupling element 4 ' ' ' near or very near them, perhaps be arranged to relevant with the coupling element 4 ' of antenna 4.Although open particularly in the above example, tuned cell 7 also can be used for compensating impedance matching element 4 ' ' possible over etching or undercut, to improve the electromagnetic matching between antenna 4 and integrated circuit 5.An antenna structure 2 also can comprise some tuned cells 7, makes in same antenna structure 2 and can comprise for radiant element 4 ', impedance matching element 4 ' with the form of any combination ' and coupling element 4 ' ' ' tuned cell 7.
By selecting tuning section and radiant element 4 ' and/or impedance matching element 4 ' ' between gap 8a to 8d or 8a ' to size H, the H ' of 8d ' make they represent whole etching process range of tolerable variance and the position by selecting tuning section with representative by etching process cause whole frequency change, the impact that changes the change that causes due to the etching precision can be by effective compensation automatically.
If etchant at during etching on the impact of conductive coating material excessively or too strong, so when comparing with the physical size of designed target antenna, the physical size of antenna, be that the effective width of the antenna traces configuration of the effective length of antenna 4 and/or antenna 4 will be too little, this means the frequency Tuning Characteristics of actual etching antenna 4 and do not correspond to the frequency tuning of designed target antenna specific, that is, there is variation aspect the frequency Tuning Characteristics of antenna.
Fig. 8 schematically shows in the situation that over etching, the example of tuned cell on the impact of the frequency response of the RFID label that comprises dual-resonant antenna.Example shown in Figure 8 corresponds essentially to situation about presenting in Fig. 6 a and Fig. 6 b, is an example that produces the typical double resonance design of this dual resonance frequency response at the antenna shown in Fig. 6 a and Fig. 6 b.Frequency response shown in Figure 8 has two obvious resonance peaks at the place, two ends of its frequency envelope that with dashed lines indicates.First peak value in peak value, namely the peak value in stability at lower frequencies is due to integrated circuit 5 and impedance matching element 4 ' ' resonant circuit that forms causes.The resonance frequency of this circuit indicates with f_loop.Second peak value in peak value, namely be to cause due to resonant circuit that integrated circuit 5 and radiant element 4 ' form at the peak value of stability at lower frequencies.The resonance frequency of this circuit is denoted as f_radiator.Describe in a simplified manner, have the frequency response that combination, the coupling influence of these two resonant circuits of the envelope frequency response of described two resonance peaks produces the RFID label by generation.
In the example depicted in fig. 8, due to over etching and the impedance matching element 4 ' that causes thus ' the variation of overall dimension, corresponding resonance frequency f_loop is reduced to the f_loop* value that is significantly less than original frequency targets value f_loop.Similarly, due to the variation of the overall dimension of radiant element 4 ' and due to the impact between integrated circuit 5 and radiant element 4 ', the resonance frequency f_radiator relevant with radiant element can become and be offset to low frequency f_radiator* from its desired value f_radiator.Yet, if with to impedance matching element 4 ' ' variation of relevant resonance frequency f_loop compares, the variation of the resonance frequency of the radiant element 4 ' that causes due to over etching may be quite little, and amplified this variation in Fig. 8.
Now, by schematically show as Fig. 6 a and Fig. 6 b for increasing coupling element 4 ' ' ' the effect of the auto-compensation that provides of the tuned cell 7 of effective width be: will compensate the resonance frequency that is denoted as f_loop** and f_radiator** in situation at this and draw ground more each other close, the combination frequency of the RFID label of completing thus, responds the more close original object frequency response that becomes.
If essential, could be with the ancillary relief that provides as the compensation that schematically describes in Fig. 7 a and Fig. 7 b radiant element 4 '.By as providing coupling element 4 ' as shown in Fig. 6 a and Fig. 6 b ' ' compensation or provide the compensation of radiant element 4 ' as shown in Fig. 7 a and Fig. 7 b or provide they compensation of two, resonance frequency f_loop* and f_radiator* are drawn the more close original object frequency response of compensating frequency response that ground is more each other close and determined by resonance frequency f_loop** and f_radiator**.
The second example shown in Figure 9 relates to so-called single resonance Antenna Design.In this design, the RFID label that comprises this single resonance antenna has and comprises the only frequency response envelope of a resonance frequency peak value, and this resonance frequency peak value mainly comes from the resonant circuit that is formed between integrated circuit 5 and radiant element 4 '.Figure 10 a shows the example of the Antenna Design that produces this single resonance crest frequency response.Can see from Figure 10 a, this Antenna Design do not comprise picture for example the design shown in Fig. 6 a be positioned at similarly independent impedance matching element structure between integrated circuit 5 and radiant element 4 '.
In the example depicted in fig. 9, due to over etching, RFID label resonance frequency f_tag is reduced to the value f_tag* that is significantly less than the original frequency response.For the radiant element 4 ' that schematically shows as Figure 10 b, the auto-compensation that is provided by the tuned cell 7 in radiant element 4 ' end draws resonance frequency higher or pushes away highlyer until value f_tag**, therefore more close original resonance frequency f_tag.
Example shown in Fig. 8, Fig. 9, Figure 10 a and Figure 10 b relates to the situation of over etching.Yet in a similar fashion, described scheme can be used in the situation that undercut provides auto-compensation, and difference mainly is the direction of frequency change or frequency drift.
Size by suitably setting tuned cell and suitably position or the place of selecting tuning element, can etch phase just automatically compensated on the during etching etchant of antenna on the conductive coating material possible too by force or too weak impact, make after etching process is completed, the etching antenna of completing has electromagnetism effective length and/or the width of expectation, and therefore has the frequency Tuning Characteristics of expectation.Therefore, just can eliminate the during etching etchant to the possible too strong impact of conductive coating material or the impact of too weak impact during etching process itself.This means, no matter the variation in etching process how, the RFID label of completing all will have the actual frequency tuning characteristic that corresponds essentially to designed frequency Tuning Characteristics.This has reduced the quantity of the antenna structure 2 of being return and has accelerated the manufacture process of RFID label 1, because need not before the last fabrication stage of RFID label 1, measure the frequency response of antenna 4 after etching process or after etching process the configuration to antenna 4 carry out any adjustment.
Figure 11 a and Figure 11 b schematically show the vertical view of etching mask 9, can be in comprising Fig. 4 a and Fig. 4 b use etching mask 9 in the manufacturing of the antenna structure 2 of disclosed antenna.Etching mask is used to control by come part removal and the maintenance to the conductive coating material with etchant.When the etching of beginning antenna 4 shown in Figure 4 and tuned cell 7, be disposed on the substrate 3 that comprises the conductive coating material according to the etching mask 9 of Figure 11 and Figure 11 b, substrate 3 for example is illustrated schematically in Fig. 2.Etching mask 9 comprises on the first main region 10 that is positioned at etching mask 9, the second main region 10 ' is upper and the 3rd main region 10 ' ' on etching mask material or barrier material, the shape of the first main region 10 is corresponding to the shape at the radiant element 4 ' of during etching antenna 4 to be maintained, the shape that the shape of the second main region 10 ' is corresponding to the impedance matching element 4 ' at during etching antenna 4 to be maintained ' shape, and the 3rd main region 10 ' ' is corresponding to the coupling element 4 ' at during etching antenna 4 to be maintained ' ' shape.Etching mask 9 further comprise be positioned at the 3rd main region 10 ' ' the subregion 11 at both sides places on barrier material, subregion 11 is corresponding to the zone of disclosed tuned cell 7 in Fig. 4 a and Fig. 4 b.Subregion 11 comprises four lines or the bar of the barrier material that relative to each other has different width W and length L, be bar 11a, 11b, 11c and 11d, be used to form line or bar corresponding to the conductive coating material of tuning 7a, 7b, 7c and 7d of disclosed tuned cell 7 in Fig. 4 a and Fig. 4 b.The length L of bar 11a, 11b, 11c and 11d and/or width W can change between bar 11a, 11b, 11c and 11d.
Usually, etching mask 9 is arranged on the conductive coating material that is supported by substrate 3, makes in the phase I, and the whole zone of substrate is all applied by mask material or erosion resistant.After this, mask pattern is exposed in mask material, is then that positive photo-resistive mask material or negative photo-resistive mask material come by etchant or remove the expose portion of mask material or remove the unexposed portion according to use.In the etching of antenna, the general use born the photo-resistive mask material.In addition, to those skilled in the art, the mode of known other types is available for etching mask 9 is arranged on substrate 3 usually, for example uses the protectiveness material of the dissimilar opposing etchant such as coating.Yet above-mentioned method based on photoetching is the most frequently used in the etching of fine pattern or line configuring.
After the etching mask 9 according to Figure 11 a and Figure 11 b is positioned on the panel of antenna structure 2 or base (panel or base comprise the substrate 3 that comprises the conductive coating material), etchant is applied on the antenna structure panel.Etchant is removed the conductive coating material on the part that is not blocked material protection be positioned at coating, makes the conductive coating material stay the first main region 10, the second main region 10 ' and the 3rd main region 10 ' corresponding to etching mask ' and the zone of two sub regions 11 in.Therefore, in the etched a certain moment of antenna 4 and tuned cell 7, antenna structure 2 comprises at least to a certain extent the conductive antenna line configuring corresponding to designed target antenna pattern and tuned cell.Other parts of conductive coating material are removed from antenna structure 2 by etchant.
In Figure 11 a and Figure 11 b, the vertical view of etching mask 9 is schematically disclosed, in the manufacturing of the antenna structure 2 of disclosed antenna, can use etching mask 9 in being included in Fig. 4 a and Fig. 4 b.Yet, certainly be apparent that, the first main region 10, the second main region 10 ' and the 3rd main region 10 ' ' existence and shape depend on the configuration of concrete antenna traces, and the quantity of the subregion in etching mask 11, shape and position can be for example correspondingly change in the mode identical with the variation of quantity, shape and position of tuned cell 7 in above-mentioned example.
It will be apparent for a person skilled in the art that the progress along with technology, concept of the present invention can be implemented in many ways.The present invention and embodiment are not limited to above-described example, but can change within the scope of the claims.
Claims (25)
1. an antenna structure (2), at least comprise non-conductive substrate (3) and the conductive antenna line configuring (4 ' that is supported by described substrate (3), 4 ' ', 4 ' ' '), described conductive antenna line configuring (4 ', 4 ' ', 4 ' ' ') form in etching process by fall the conductive coating material that is supported by described substrate (3) by the etchant local etching, it is characterized in that, described antenna structure (2) also comprises at least one electrically conductive tuning elements (7) with identical conductive coating material, described tuned cell (7) is while and described conductive antenna line configuring (4 ' at least in part, 4 ' ', 4 ' ' ') form in same etching process, after etching process, described tuned cell has spatial form and the overall dimension of overcompensate etching at least in part or the impact of undercut aspect the electric attribute of described antenna structure (2).
2. antenna structure according to claim 1 (2), it is characterized in that, described antenna structure (2) is arranged to form the part of radio-frequency identification transponder or RFID tag (1), and described radio-frequency identification transponder or RFID tag (1) also comprise the integrated circuit (5) that is electrically connected to described antenna structure (2).
3. antenna structure according to claim 1 and 2 (2), it is characterized in that, described antenna structure (2) comprises impedance matching element (4 ' '), radiant element (4 ') and is arranged in other coupling element between described impedance matching element (4 ' ') and described radiant element (4 ') (4 ' ' '), described impedance matching element (4 ' ') is arranged to and can be connected with integrated circuit (5), and described coupling element (4 ' ' ') is provided for the radio-frequency feed point of described radiant element (4 ').
4. according to the described antenna structure of any one (2) in aforementioned claim, it is characterized in that, described tuned cell (7) is arranged to relevant with described radiant element (4 ') or near described radiant element (4 ').
5. according to the described antenna structure of any one (2) in aforementioned claim, it is characterized in that, described tuned cell (7) is arranged to relevant with described impedance matching element (4 ' ') or near described impedance matching element (4 ' ').
6. according to the described antenna structure of any one (2) in aforementioned claim, it is characterized in that, described tuned cell (7) is arranged to relevant with described coupling element (4 ' ' ') or near described coupling element (4 ' ' ').
7. the described antenna structure of any one (2) according to claim 4 to 6, is characterized in that, described tuned cell (7) is arranged to according to change the electromagnetism effective length of described antenna structure (2) along with the etch phase of described antenna structure (2).
8. the described antenna structure of any one (2) according to claim 4 to 6, it is characterized in that, described tuned cell (7) is arranged to according to the etch phase along with described antenna structure (2), and the radio-frequency feed point that is provided by described coupling element (4 ' ' ') via impact changes the electromagnetic matching between described coupling element (4 ' ' ') and described radiant element (4 ').
9. antenna structure according to claim 8 (2), is characterized in that, all has tuned cell (7) at the place, both sides of described coupling element (4 ' ' '), is used for affecting the effective width of described coupling element (4 ' ' ').
10. according to claim 8 or 9 described antenna structures (2), it is characterized in that, described tuned cell (7) comprise be arranged to described impedance matching element (4 ' ') and coupling element (4 ' ' ') at least one relevant or very contiguous described impedance matching element (4 ' ') and at least one a plurality of that separate or the interconnective adjacent tuning (7a in coupling element (4 ' ' '), 7b, 7c, 7d).
11. the described antenna structure of any one (2) according to claim 3 to 8, it is characterized in that having between at least one in described tuned cell (7) and described radiant element (4 '), described impedance matching element (4 ' ') and described coupling element (4 ' ' ') and be electrically connected to.
12. the described antenna structure of any one (2) according to claim 3 to 8, it is characterized in that not having between any one in described tuned cell (7) and described radiant element (4 '), described impedance matching element (4 ' ') and described coupling element (4 ' ' ') and be electrically connected to.
13. according to the described antenna structure of any one (2) in aforementioned claim, it is characterized in that, described tuned cell (7) comprises a plurality of adjacent tuning (7a, 7b, 7c, 7d).
14. antenna structure according to claim 13 (2) is characterized in that, described tuning (7a, 7b, 7c, 7d) relative to each other has variable width (W) and/or length (L).
15. method of making antenna structure (2) by etching, described antenna structure (2) comprises substrate (3) and the conductive antenna line configuring (4 ' that is supported by described substrate (3), 4 ' ', 4 ' ' '), and in described method, described conductive antenna line configuring (4 ', 4 ' ', 4 ' ' ') form by fall the conductive coating material that is supported by described substrate (3) by the etchant local etching, it is characterized in that, with to described conductive antenna line configuring (4 ', 4 ' ', 4 ' ' ') carry out the etched while, in same etching process, at least one electrically conductive tuning elements (7) that has the identical conduction coating material by being etched to small part ground formation, after etching process, described tuned cell has spatial form and the overall dimension of overcompensate etching at least in part or the impact of undercut aspect the electric attribute of described antenna structure (2).
16. method according to claim 15, it is characterized in that, electrically insert at least one integrated circuit (5) with described antenna structure (2) relevantly, be used for providing the antenna structure (2) of the part that can be arranged to form radio-frequency identification transponder or RFID tag (1).
17. according to claim 15 or 16 described methods, it is characterized in that, described antenna structure (2) comprises impedance matching element (4 ' '), radiant element (4 ') and is arranged in other coupling element between described impedance matching element (4 ' ') and described radiant element (4 ') (4 ' ' '), described impedance matching element (4 ' ') is arranged to and can be connected with integrated circuit (5), and described coupling element (4 ' ' ') is provided for the radio-frequency feed point of described radiant element (4 ').
18. method according to claim 17, it is characterized in that, with described tuned cell (7) be arranged to relevant with at least one in the described radiant element (4 ') of described antenna structure (2), described impedance matching element (4 ' ') and described coupling element (4 ' ' ') or in the described radiant element (4 ') of described antenna structure (2), described impedance matching element (4 ' ') and described coupling element (4 ' ' ') at least one near.
19. etching mask (9) of making antenna structure (2) by etching, described antenna structure (2) comprises non-conductive substrate (3) and conductive antenna line configuring (4 ' at least, 4 ' ', 4 ' ' '), described conductive antenna line configuring (4 ', 4 ' ', 4 ' ' ') form in etching process by fall the conductive coating material that is supported by described substrate (3) by the etchant local etching, described etching mask (9) is determined the described conductive antenna line configuring (4 ' of described antenna structure (2), 4 ' ', 4 ' ' '), it is characterized in that, described etching mask (9) comprise be positioned at will be in the maintained described conductive antenna line configuring (4 ' of during etching, 4 ' ', 4 ' ' ') at least one corresponding main region (10, 10 ', 10 ' ' barrier material), and described etching mask also comprises the barrier material that is positioned at least one subregion (11), be used for to described conductive antenna line configuring (4 ', 4 ' ', 4 ' ' ') carry out the etched while, in same etching process, form at least in part at least one electrically conductive tuning elements (7) with identical conduction coating material, after etching process, described tuned cell has spatial form and the overall dimension of overcompensate etching at least in part or the impact of undercut aspect the electric attribute of described antenna structure (2).
20. etching mask according to claim 19 (9), it is characterized in that, described antenna structure (2) is used for forming the part of radio-frequency identification transponder or RFID tag (1), and described radio-frequency identification transponder or RFID tag (1) also comprise the integrated circuit (5) that is electrically connected to described antenna structure (2).
21. according to claim 19 or 20 described etching masks (9), it is characterized in that, described antenna structure (2) comprises impedance matching element (4 ' '), radiant element (4 ') and be arranged in other coupling element between described impedance matching element (4 ' ') and described radiant element (4 ') (4 ' ' '), described impedance matching element (4 ' ') be arranged to and can be connected with integrated circuit (5), described coupling element (4 ' ' ') is provided for the radio-frequency feed point of described radiant element (4 '), thus, described etching mask (9) comprises the first main region (10) with barrier material corresponding to the described radiant element (4 ') of described antenna structure (2), the second main region (10 ') with barrier material corresponding to the described impedance matching element of described antenna structure (2) (4 ' '), and corresponding to the 3rd main region with barrier material of the described coupling element of described antenna structure (2) (4 ' ' ') (10 ' ').
22. according to claim 19 to the described etching mask of any one (9) in 21, it is characterized in that, the described subregion (11) with barrier material be arranged to relevant with at least one in described the first main region (10) with barrier material, described the second main region (10 ') and described the 3rd main region (10 ' ') or in having described first main region (10) of barrier material, described the second main region (10 ') and described the 3rd main region (10 ' ') at least one near.
23. according to claim 19 to the described etching mask of any one (9) in 22, it is characterized in that, the described subregion (11) that comprises the barrier material that is used to form described tuned cell (7) comprises having the tuning (7a that is used to form described tuned cell (7), 7b, 7c, 7d) a plurality of parallel bar (11a, the 11b of barrier material, 11c, 11d).
24. etching mask according to claim 23 (9), it is characterized in that having tuning (7a, 7b being used to form described tuned cell (7), 7c, described (11a, 11b, 11c of barrier material 7d), 11d) have at described (11a, 11b, 11c, 11d) between different width (W) and/or length (L).
25. according to claim 1 to 14, the described antenna structure of any one (2) is for the manufacture of the purposes of radio-frequency identification transponder or RFID tag (1).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/FI2010/050516 WO2011157883A1 (en) | 2010-06-17 | 2010-06-17 | Method for manufacturing an autocompensating antenna structure by etching |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103181024A true CN103181024A (en) | 2013-06-26 |
| CN103181024B CN103181024B (en) | 2015-11-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080068119.2A Expired - Fee Related CN103181024B (en) | 2010-06-17 | 2010-06-17 | The method of auto-compensation antenna structure is manufactured by etching |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101664263B1 (en) |
| CN (1) | CN103181024B (en) |
| WO (1) | WO2011157883A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103811873A (en) * | 2014-01-28 | 2014-05-21 | 杭州电子科技大学 | Tag antenna and corresponding optical disk |
| CN103811858A (en) * | 2014-01-28 | 2014-05-21 | 杭州电子科技大学 | RFID (radio frequency identification) tag antenna and corresponding optical disk |
| CN109546299A (en) * | 2017-09-21 | 2019-03-29 | 英飞凌科技股份有限公司 | Gain antenna, chip card, antenna structure and its manufacturing method and apparatus |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI482361B (en) | 2012-01-18 | 2015-04-21 | Cirocomm Technology Corp | Automatic testing and trimming method for planar antenna and system for the same |
| US20150249290A1 (en) * | 2012-07-31 | 2015-09-03 | Molex Incorporated | Slot fed dipole antenna |
| CN107403997A (en) | 2016-05-20 | 2017-11-28 | 中兴通讯股份有限公司 | A kind of circuit, method and electronic equipment for being used to adjust antenna frequency band |
| US10559884B2 (en) * | 2017-10-03 | 2020-02-11 | Intermec, Inc. | Wideband RFID tag antenna |
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| US6535175B2 (en) * | 2000-06-01 | 2003-03-18 | Intermec Ip Corp. | Adjustable length antenna system for RF transponders |
| CN101164196A (en) * | 2005-02-17 | 2008-04-16 | Upm拉弗拉塔克公司 | Transponder tuning method and a transponder |
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| JP3645239B2 (en) * | 2002-09-06 | 2005-05-11 | シャープ株式会社 | Dipole antenna, tag and moving object identification system using the same |
| MXPA05010864A (en) * | 2003-04-10 | 2006-03-21 | Avery Dennison Corp | Rfid devices having self-compensating antennas and conductive shields. |
| EP2309597A1 (en) * | 2003-04-10 | 2011-04-13 | Avery Dennison Corporation | RFID devices having self-compensating antennas and conductive shields |
| US7268687B2 (en) * | 2004-03-23 | 2007-09-11 | 3M Innovative Properties Company | Radio frequency identification tags with compensating elements |
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2010
- 2010-06-17 WO PCT/FI2010/050516 patent/WO2011157883A1/en active Application Filing
- 2010-06-17 CN CN201080068119.2A patent/CN103181024B/en not_active Expired - Fee Related
- 2010-06-17 KR KR1020137001201A patent/KR101664263B1/en active IP Right Grant
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6535175B2 (en) * | 2000-06-01 | 2003-03-18 | Intermec Ip Corp. | Adjustable length antenna system for RF transponders |
| CN101164196A (en) * | 2005-02-17 | 2008-04-16 | Upm拉弗拉塔克公司 | Transponder tuning method and a transponder |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103811873A (en) * | 2014-01-28 | 2014-05-21 | 杭州电子科技大学 | Tag antenna and corresponding optical disk |
| CN103811858A (en) * | 2014-01-28 | 2014-05-21 | 杭州电子科技大学 | RFID (radio frequency identification) tag antenna and corresponding optical disk |
| CN103811873B (en) * | 2014-01-28 | 2016-06-15 | 杭州电子科技大学 | label antenna and corresponding CD |
| CN103811858B (en) * | 2014-01-28 | 2016-07-06 | 杭州电子科技大学 | RFID label antenna and corresponding CD |
| CN109546299A (en) * | 2017-09-21 | 2019-03-29 | 英飞凌科技股份有限公司 | Gain antenna, chip card, antenna structure and its manufacturing method and apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011157883A8 (en) | 2012-03-15 |
| CN103181024B (en) | 2015-11-25 |
| KR101664263B1 (en) | 2016-10-10 |
| WO2011157883A1 (en) | 2011-12-22 |
| KR20130036116A (en) | 2013-04-10 |
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