CN103176371B - Automated mask management system and method - Google Patents
Automated mask management system and method Download PDFInfo
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- CN103176371B CN103176371B CN201310082060.8A CN201310082060A CN103176371B CN 103176371 B CN103176371 B CN 103176371B CN 201310082060 A CN201310082060 A CN 201310082060A CN 103176371 B CN103176371 B CN 103176371B
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Abstract
The invention discloses an automated mask management system and method. The system comprises a production management module, a mask management module, a process execution module, a mask processing module and a mask storage module, wherein the production management module can be in data interaction with the mask management module, the process execution module, the mask processing module and the mask storage module respectively through an EAP (Equipment Automatic Program) and a server. According to the system and the method, disclosed by the invention, a mask can be accurately applied to a corresponding photoetching machine, a corresponding photoetching process and a corresponding photoetching product, so that the error ratio caused by human factors is reduced, the range of influence caused after problems occur is reduced, the use conditions of the mask can be effectively monitored, and the mask trace tracking is facilitated; and thus, the subsequent data analysis is facilitated, the feedback speed is accelerated, and then, the management is timesaving and laborsaving, so that the process production cost is reduced, and the problem of yield caused by human errors is solved.
Description
Technical field
The present invention relates to a kind of automated management system, particularly relate to automated management system and the method for mask plate.
Background technology
Relate to hundreds of road technique of complexity in detail in semiconductor fabrication process, device must be produced according to strict explained hereafter condition.Semiconductor fabrication process comprises photoetching process, etching technics, depositing operation, injection technology and CMP (Chemical Mechanical Polishing) process etc., in whole manufacturing process, yield of devices to be had the greatest impact and the technique of complexity is photoetching process, and mask plate in photoetching process, must be used to carry out photoetching, mask plate is used to the additional device projected to by the circuit pattern of complexity by photoetching process in wafer surface, different mask plates must be assigned to different machines or equipment, and correspond to different technique, therefore, a certain mask plate can use by certain road technique of certain machine, just become problem very deeply concerned in semiconductor manufacturing.
At present, whether the title that the system of the management mask plate adopted in semiconductor fabrication factory just controls mask plate matches with the title that defines in product, and the historical record that tracking mask plate uses in litho machine, the effect of an information record and tracking can only be played, and for the litho machine type of different manufacturers, the litho machine type of Different Light, artificial judgement and control can only be carried out, meanwhile, for service time of mask plate and serviceable life being also detect by collecting historical record, manual analyzing and control manually completely.As everyone knows, in semiconductor fabrication, artificial error rate is quite high, and then causes the problem of yield.In addition, time efficiency etc. due to semiconductor production all can affect the cost of device, so wait until that product just can carry out mask plate determination and analysis after going wrong often, now, just there is a lot of products through photoetching process, the yield of large-tonnage product goes wrong, and causes very large impact to production.All manual control owing to comprising storage mode and environment etc. to the management of mask plate, randomness is very large, therefore the repair rate of annual mask plate is 6.6% of total use amount, especially the mask plate repair rate of below 65nm technique reaches more than 15% especially, and at every turn due to the problem that mask plate causes product rejection rate higher, loss is all more than 1,000,000 dollars.Therefore, mask plate, as the mother matrix exposed in integrated circuit, must accomplish zero-fault, and the randomness in existing management system controls not have management and control action to the defect problem of mask plate.
Chinese patent (application number: 200510092652.2) disclose the method and system that a kind of intelligent automation for mask plate manages, comprise: provide and will process multiple file on process equipment, wherein, described multiple workpiece is located at the treating stations before described process equipment; Arrive before process equipment at workpiece, the characteristic of being correlated with according to described multiple workpiece is to the distribution requirements of described process equipment determination utility appliance; And utility appliance was sent according to described distribution requirements to described process equipment before described workpiece arrives process equipment.
Be a kind of mask plate priority management system disclosed in foregoing invention, thus can specify in the short period of time on a certain mask plate to machine and carry out photoetching process, save the production time.The cost but although this invention can save time, still there is mask plate and be used in the risk of wrong machine carrying out photoetching, thus the problem causing yield low.
Chinese patent (application number: 200710041623.3) disclose a kind of mask plate loading technique, for mask plate being accurately loaded into the mask plate plummer of litho machine, described litho machine has mask transmission system and reticle stage system, described reticle stage system comprises mask plate plummer and micropositioner, and this mask plate loading technique comprises following flow process: version is got in (1) version storehouse; (2) thick prealignment; (3) mask plate handing-over; (4) meticulous prealignment.
Adopt foregoing invention that the precision of whole mask plate loading technique can be made to reach: x to ± 1um, y to ± 1um, rz be to ± 0.05mrad.Meanwhile, the number of times of meticulous prealignment is reduced to 1 time from traditional 3-5 time and just can reaches prealignment precision, substantially increases prealignment efficiency, boosts productivity.But this invention still fails to overcome because mask plate is used in the problem that wrong machine causes yield low.
Summary of the invention
For above-mentioned Problems existing, the invention provides automated management system and the method for mask plate, to make mask plate be used on the product of corresponding litho machine and corresponding technique and correspondence, reduce probability of makeing mistakes, and save time, laborsaving, explained hereafter cost is reduced.
To achieve these goals, the technical scheme that the present invention takes is:
An automated management system for mask plate, is characterized in that, comprises mask plate administration module, production management module, technique carries out module, mask plate processing module and mask plate reservoir module;
Described technique is carried out module, described mask plate processing module and described mask plate reservoir module and is all carried out the mutual of described mask plate data message by described production management module and described mask plate administration module; Described production management module carry out with described technique respectively module, described mask plate processing module and described mask plate reservoir module by equipment auto-programming (Equipment Automatic Program, be called for short: EAP) and server carry out the mutual of data message;
Described mask plate administration module comprises data storage cell and read/write cell, and described data storage cell stores the current data message of some mask plates; Described mask plate administration module utilizes EAP and server data storage cell and described production management module can be carried out the mutual of data message by read/write cell;
Described technique is carried out module and is comprised multiple lithographic cell and multiple detecting unit;
Described mask plate processing module comprises multiple cleaning unit and multiplely scraps unit;
Described mask plate reservoir module comprises internal storage unit and external storage unit, and inside and outside storage unit all stores some mask plates.
The automated management system of above-mentioned mask plate, it is characterized in that, when described external storage unit stores new mask plate, described external storage unit obtains the primary data information of this new mask plate, and this primary data information is stored in described data storage cell by described production management module and described read/write cell successively.
The automated management system of above-mentioned mask plate, it is characterized in that, described production management module is the GEOMAP in semiconductor production, this GEOMAP is according to the Production requirement of described lithographic cell or described detecting unit, the data message of the mask plate in described data storage cell is transferred by described read/write cell, described internal storage unit or described external storage unit according to the data message of the mask plate transferred out by the mask plate of correspondence from described internal storage unit or described external storage unit be transferred to described lithographic cell or described detecting unit or described cleaning unit or described in scrap unit.
The automated management system of above-mentioned mask plate, it is characterized in that, when described mask plate carries out photoetching process in described lithographic cell, the data message of mask plate in described lithographic cell described in described GEOMAP real time record, and by described read/write cell by record data information memory in described data storage cell.
The automated management system of above-mentioned mask plate, it is characterized in that the data message of mask plate described in described production management module installation, this data message comprises parameter attribute and status indicator;
Described parameter attribute comprises device attribute, memory attribute and type attribute;
Define described device attribute according to lithographic equipment and technical recipe (being referred to as Recipe in semiconductor applications), be applied to corresponding lithographic equipment and corresponding technique Recipe to make different mask plate;
Described memory attribute is defined, to calculate mask plate serviceable life under various circumstances according to home and clean dry environment;
Described type attribute is defined, to calculate mask plate exposure in process of production according to light source;
Described status indicator comprises storage state, detected state, using state, dead state, scraps state and cleaning state;
Wherein, described using state comprises idle state, waiting status, subscription state and just in using state.
The automated management system of above-mentioned mask plate, is characterized in that, when mask plate is in described external storage unit, is storage state by the status indicator of described mask plate;
When mask plate is in described internal storage unit, be dead state by the status indicator of described mask plate;
When mask plate is in described detecting unit, be detected state by the status indicator of described mask plate;
When mask plate is in described lithographic cell, be using state by the status indicator of described mask plate;
When scrapping in unit described in mask plate is in, be the state of scrapping by the status indicator of described mask plate;
When mask plate is in described cleaning unit, be cleaning state by the status indicator of described mask plate.
Utilize the automated management system of described mask plate to carry out a method for technique, it is characterized in that, be applied in the automated management system of above-mentioned mask plate, described method comprises:
Described lithographic cell is sent to GEOMAP according to process requirements by needing the request msg of the mask plate carrying out photoetching process, and described GEOMAP transfers the data message of the mask plate stored in described data storage cell by described read/write cell according to this request msg;
When status indicator in the data message of the mask plate transferred is stored condition, the mask plate transferred is transferred in described detecting unit and carries out defects detection technique by described external storage unit;
Defective for tool mask plate is transferred to described cleaning unit or described in scrap unit and carry out cleaning or directly scrap, and defects detection technique is repeated to the mask plate completing cleaning;
To not there is defect and the mask plate with process requirements is transferred to described lithographic cell carries out photoetching process, and continue the mask plate completing photoetching process to be transferred to described internal storage unit or to be transferred to described detecting unit to carry out defects detection technique;
To not there is defect and the mask plate without process requirements is transferred in internal storage unit and stores.
Above-mentioned method, it is characterized in that, behind waiting time T > A month of described mask plate storage state, wherein, A is the arbitrary value in 12 ~ 18, if A is 12,13,14 etc., when A is 12, the i.e. waiting time T > 12 months of mask plate storage state, if waiting time is 13 months, 14 months, 15 months etc., scrap unit described in this mask plate is transferred to by GEOMAP to scrap, the state of mask plate is set to the state of scrapping simultaneously.
Above-mentioned method, is characterized in that, it is characterized in that, described defects detection technique comprises defects detection technique and the particle detection technique of unrepairable;
Described mask plate is carried out to the defects detection technique of unrepairable, when detecting that this mask plate has the defect of unrepairable, this mask plate is transferred to by described GEOMAP to be scrapped unit and scraps, and the state of this mask plate is set to the state of scrapping simultaneously;
When detecting that this mask plate does not have the defect of unrepairable, continue to carry out particle detection technique to described mask plate;
When detecting that this mask plate has particle, this mask plate is transferred to cleaning unit and cleans by GEOMAP, the state of this mask plate is set to cleaning state simultaneously.
Above-mentioned method, is characterized in that, the described GEOMAP setting mask plate state be in described internal storage unit is dead state;
When T1 >=B month dead time of described dead state, wherein, B is the arbitrary value in 6 ~ 12, if B is 6,7,8 etc., when B is 6, i.e. T1 >=6 month dead time of dead state, as being dead time 6 months, 7 months, 8 months etc., mask plate is transferred to described external storage unit by described GEOMAP, the state of mask plate is set to storage state simultaneously;
As the T1 < 6 months dead time of described dead state, wherein, B is the arbitrary value in 6 ~ 12, if B is 6,7,8 etc., when B is 6, i.e. the T1 < 6 months dead time of dead state, as being dead time 3 months, 4 months, 5 months etc., mask plate is transferred to described lithographic cell according to process requirements by described GEOMAP, the state of mask plate is set to using state simultaneously
Above-mentioned method, is characterized in that, the described GEOMAP setting mask plate state be in described lithographic cell is using state;
When T2 < C month service time of described using state, wherein, C is the arbitrary value in 3 ~ 9, if C is 3,4,5 etc., when C is 3, i.e. the T2 < 3 months service time of using state, as being service time 1 month, 2 months, 2.5 months etc., mask plate is transferred to described internal storage unit by described GEOMAP, the state of mask plate is set to dead state simultaneously;
When T2 >=C month service time of described using state, wherein, C is the arbitrary value in 3 ~ 9, if C is 3,4,5 etc., when C is 3, i.e. T2 >=3 month service time of using state, as being service time 3 months, 4 months, 5 months etc., mask plate is transferred to described detecting unit by described GEOMAP, the state of mask plate is set to detected state simultaneously.
Technique scheme tool has the following advantages or beneficial effect:
In semiconductor production process, use automated management system and the method for mask plate provided by the invention, make mask plate can accurately for the litho machine of correspondence, in corresponding photoetching process and the photofabricated product of correspondence, thus the error rate reduced because human factor produces, reduce the coverage after generation problem, and can the behaviour in service of effective monitoring mask plate, the trace of mask plate is facilitated to follow the trail of, thus facilitate follow-up data analysis and accelerate the speed of feedback, and then save time, laborsaving, explained hereafter cost is reduced and reduces because people is the yield issues caused of makeing mistakes.
Accompanying drawing explanation
Fig. 1 is the structural representation of the automated management system of mask plate according to embodiments of the invention 1;
Fig. 2 is the flowage structure schematic diagram of mask plate in the automated management system according to the mask plate of embodiments of the invention 2.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment, the present invention is further illustrated, but not as limiting to the invention.
Embodiment 1:
Fig. 1 is the structural representation of the automated management system of mask plate according to embodiments of the invention 1; As shown in the figure, the automated management system of mask plate comprises production management module, mask plate administration module, technique carry out module, mask plate processing module and mask plate reservoir module, meanwhile, production management module is carried out module, mask plate processing module and mask plate reservoir module with mask plate administration module, technique respectively and is carried out the mutual of the data message of mask plate by EAP and server.
Wherein, production management module be GEOMAP; Mask plate administration module comprises data storage cell and read/write cell, and data storage cell stores the current data message of some mask plates; Technique is carried out module and is comprised multiple lithographic cell and multiple detecting unit; Mask plate processing module comprises multiple cleaning unit and multiplely scraps unit; Mask plate reservoir module comprises internal storage unit and external storage unit, and inside and outside storage unit all stores some mask plates.
Wherein, the data message of mask plate comprises parameter attribute and status indicator; Parameter attribute comprises device attribute, memory attribute and type attribute; Device attribute defines according to lithographic equipment and technique Recipe, is applied to corresponding lithographic equipment and corresponding technique Recipe to make different mask plate; Memory attribute defines according to home and clean dry environment, as N2 stores under clean dry environment, to calculate the serviceable life of corresponding mask plate; Type attribute defines according to light source, to calculate mask plate exposure in process of production; Status indicator comprises storage state, detected state, using state, dead state, scraps state and cleaning state;
Wherein, using state also comprises idle state, waiting status, subscription state and just in using state.
When lithographic cell needs mask plate to carry out photoetching process, GEOMAP is according to the attribute of lithographic cell, from data storage cell, the data message of mask plate is transferred by read/write cell, when the status indicator of the data message of the mask plate transferred out is stored condition, and the waiting time > 12 months of mask plate storage state, if waiting time is 13 months, 14 months, 15 months etc., mask plate is scrapped by the judgement according to slip-stick artist, the state that mask plate is current is simultaneously the state of scrapping, or mask plate is continued storage, the state that mask plate is current is simultaneously storage state, and the information of being scrapped by this mask plate via GEOMAP or the information that continues storage are stored in the data storage cell of mask plate by read/write cell, or when waiting time T≤12 month of stored condition, if waiting time is 12 months, 11 months, 10 months etc., the then data message of mask plate transferred according to GEOMAP of external storage unit, be transferred to detecting unit from external storage unit by the mask plate of correspondence and detect, the current state of mask plate is then detected state, after confirming mask plate defectiveness after testing, testing result is transferred to GEOMAP, then being transferred to by mask plate scraps in unit or cleaning unit, the state that mask plate is current is simultaneously the state of scrapping or cleaning state, and the information simultaneously mask plate being in the state of scrapping or cleaning state is stored in the data storage cell of mask plate via GEOMAP by read/write cell, GEOMAP transfers the cleaning information of mask plate, after confirming that cleaning completes, mask plate is transferred to detecting unit detect, and the current state of mask plate is detected state, and detected state information current for mask plate is stored in the data storage cell of mask plate via GEOMAP by read/write cell, GEOMAP transfers the Detection Information of mask plate, after confirming mask plate zero defect, mask plate is transferred to lithographic cell, the state that mask plate is current is simultaneously using state, and is stored in the data storage cell of mask plate via GEOMAP by read/write cell by using state information current for mask plate, GEOMAP transfers the use information of mask plate, as the T2 < 3 months service time of mask plate using state, as being service time 1 month, 2 months, 2.5 months etc., mask plate being transferred to internal storage unit, and staying cool, or when T2 >=3 month service time of mask plate using state, as being service time 3 months, 4 months, 5 months etc., mask plate is transferred to detecting unit, and detected state, device-identification information current for mask plate is stored in the data storage cell of mask plate via GEOMAP by read/write cell simultaneously, GEOMAP transfers the dead state information of mask plate, when T1 >=6 month dead time of mask plate dead state, as being dead time 6 months, 7 months, 8 months etc., mask plate being transferred to external storage unit stores, and the state of mask plate is storage state simultaneously, or as the T1 < 6 months dead time of mask plate dead state, as being dead time 3 months, 4 months, 5 months etc., mask plate is transferred to lithographic cell again and there is using state, as cocycle, be stored in the data storage cell of mask plate via GEOMAP by read/write cell simultaneously, with the behaviour in service of effective monitoring mask plate, facilitate the trace of mask plate to follow the trail of, thus facilitate follow-up data analysis and accelerate the speed of feedback.
In addition, when carrying out photoetching process with a random lithography mask version to lithographic cell, because lithographic cell carries out in module in technique, and technique carries out module and production management module has the mutual of mask plate data message, when mask plate is placed in lithographic cell, the data message of mask plate can be transferred in production management module, production management module is accepted the data message of this mask plate and is mated by the data message of read/write cell with the mask plate in the data storage element of mask plate, if do not mate, production management module can send an error message to lithographic cell, thus cannot photoetching process be carried out, and then prevent the generation of accident, reduce the problem because human factor causes yield low.
Embodiment 2:
Fig. 2 is the flowage structure schematic diagram of mask plate in the automated management system according to the mask plate of embodiments of the invention 2, as shown in Figure 2, when lithographic cell needs mask plate to carry out photoetching process, GEOMAP is according to the attribute of lithographic cell, from data storage cell, the data message of mask plate is transferred by read/write cell, when the status indicator of the data message of the mask plate transferred out is stored condition, judge the waiting time T under storage state, if waiting time T > 12 months, if waiting time is 13 months, 14 months, 15 months etc., according to the judgement of slip-stick artist mask plate is transferred to and scraps unit and scrap, and to identify the current state of mask plate be the state of scrapping, or or mask plate is continued storage, the state that mask plate is current is simultaneously storage state, if waiting time T≤12 month, if waiting time is 12 months, 11 months, 10 months etc., then mask plate is transferred to detecting unit to detect, and to identify the current state of mask plate be detected state, after detection completes, if there is expendable defect in testing result, namely the defect of product yield can be had influence on, then mask plate is transferred to and scraps unit and scrap, and to identify the current state of mask plate be the state of scrapping, if there is not expendable defect in testing result, but there is particle, namely there is recoverable defect, then mask plate is transferred to cleaning unit to clean, and to identify the current state of mask plate be cleaning state, after having cleaned, mask plate is transferred to detecting unit again detect, when testing result neither exist expendable defect not there is again particle time, according to process requirements, mask plate is transferred to lithographic cell or internal storage unit, if have process requirements, this mask plate is transferred in lithographic cell and carries out photoetching process, and to identify the current state of mask plate be using state, when T2 >=3 month service time of the mask plate under using state, as being service time 3 months, 4 months, 5 months etc., mask plate is transferred to detecting unit detect, and to identify the current state of mask plate be detected state, as cocycle, if as the T2 < 3 months service time of the mask plate under using state, as being service time 1 month, 2 months, 2.5 months etc., mask plate is transferred to internal storage unit, and to identify the current state of mask plate be dead state, as T1 < 6 months dead time under dead state, as being dead time 3 months, 4 months, 5 months etc., mask plate can be shifted lithographic cell according to need of production and carry out photoetching process, and the state identifying mask plate is using state, when T1 >=6 month dead time under dead state, mask plate is transferred to external storage unit to store, and to identify the current state of mask plate be storage state, as cocycle.
In sum, the automated management system of the mask plate that the application of the invention provides and method, make mask plate can accurately for the litho machine of correspondence, in corresponding photoetching process and the photofabricated product of correspondence, thus the error rate reduced because human factor produces, reduce the coverage after generation problem, and can the behaviour in service of effective monitoring mask plate, the trace of mask plate is facilitated to follow the trail of, thus facilitate follow-up data analysis and accelerate the speed of feedback, and then save time, laborsaving, explained hereafter cost is reduced and reduces because people is the yield issues caused of makeing mistakes.
The foregoing is only preferred embodiment of the present invention, not thereby limit claim of the present invention, so all utilizations instructions of the present invention and the change of the equivalence done by diagramatic content, be all included in protection scope of the present invention.
Claims (10)
1. an automated management system for mask plate, is characterized in that, comprises mask plate administration module, production management module, technique carries out module, mask plate processing module and mask plate reservoir module;
Described technique is carried out module, described mask plate processing module and described mask plate reservoir module and is all carried out the mutual of the data message of mask plate by described production management module and described mask plate administration module;
Described mask plate administration module comprises data storage cell and read/write cell, and described data storage cell stores the current data message of some mask plates;
Described technique is carried out module and is comprised multiple lithographic cell and multiple detecting unit;
Described mask plate processing module comprises multiple cleaning unit and multiplely scraps unit;
Described mask plate reservoir module comprises internal storage unit and external storage unit, and inside and outside storage unit all stores some mask plates;
The data message of mask plate described in described production management module installation, this data message comprises parameter attribute and status indicator;
Described parameter attribute comprises device attribute, memory attribute and type attribute;
Define described device attribute according to lithographic equipment and technical recipe, be applied to corresponding lithographic equipment and corresponding technical recipe to make different mask plate;
Described memory attribute is defined, to calculate mask plate serviceable life under various circumstances according to home and clean dry environment;
Described type attribute is defined, to calculate mask plate exposure in process of production according to light source;
Described status indicator comprises stored condition, detected state, using state, dead state, scraps state and cleaning state;
Wherein, described using state comprises idle state, waiting status, subscription state and just in using state.
2. the automated management system of mask plate as claimed in claim 1, it is characterized in that, when described external storage unit stores new mask plate, described external storage unit obtains the primary data information of this new mask plate, and this primary data information is stored in described data storage cell by described production management module and described read/write cell successively.
3. the automated management system of mask plate as claimed in claim 1, it is characterized in that, described production management module is the GEOMAP in semiconductor production, this GEOMAP is according to the Production requirement of described lithographic cell or described detecting unit, the data message of the mask plate in described data storage cell is transferred by described read/write cell, described internal storage unit or described external storage unit according to the data message of the mask plate transferred out by the mask plate of correspondence from described internal storage unit or described external storage unit be transferred to described lithographic cell or described detecting unit or described cleaning unit or described in scrap unit.
4. the automated management system of mask plate as claimed in claim 3, it is characterized in that, when described mask plate carries out photoetching process in described lithographic cell, the data message of mask plate in described lithographic cell described in described GEOMAP real time record, and by described read/write cell by the data information memory of record to described data storage cell.
5. the automated management system of mask plate as claimed in claim 1, it is characterized in that, when mask plate is in described external storage unit, be stored condition by the status indicator of described mask plate;
When mask plate is in described internal storage unit, be dead state by the status indicator of described mask plate;
When mask plate is in described detecting unit, be detected state by the status indicator of described mask plate;
When mask plate is in described lithographic cell, be using state by the status indicator of described mask plate;
When scrapping in unit described in mask plate is in, be the state of scrapping by the status indicator of described mask plate;
When mask plate is in described cleaning unit, be cleaning state by the status indicator of described mask plate.
6. utilize the automated management system of described mask plate to carry out a method for technique, it is characterized in that, be applied in the automated management system as the mask plate in claim 3-4 as described in any one, described method comprises:
Described lithographic cell is sent to GEOMAP according to process requirements by needing the request msg of the mask plate carrying out photoetching process, and described GEOMAP transfers the data message of the mask plate stored in described data storage cell by described read/write cell according to this request msg;
When status indicator in the data message of the mask plate transferred is stored condition, the mask plate transferred is transferred in described detecting unit and carries out defects detection technique by described external storage unit;
Defective for tool mask plate is transferred to described cleaning unit or described in scrap unit and carry out cleaning or directly scrap, and defects detection technique is repeated to the mask plate completing cleaning;
To not there is defect and the mask plate with process requirements is transferred to described lithographic cell carries out photoetching process, and continue the mask plate completing photoetching process to be transferred to described internal storage unit or to be transferred to described detecting unit to carry out defects detection technique;
To not there is defect and the mask plate without process requirements is transferred in internal storage unit and stores.
7. method as claimed in claim 6, it is characterized in that, when the period of storage T > A of described mask plate stored condition month, scrap unit described in this mask plate is transferred to by described GEOMAP to scrap, the state of mask plate is set to the state of scrapping simultaneously;
Wherein, A is the arbitrary value in 12 ~ 18.
8. method as claimed in claim 6, it is characterized in that, described defects detection technique comprises defects detection technique and the particle detection technique of unrepairable;
Described mask plate is carried out to the defects detection technique of unrepairable, when detecting that this mask plate has the defect of unrepairable, this mask plate is transferred to by described GEOMAP to be scrapped unit and scraps, and the state of this mask plate is set to the state of scrapping simultaneously;
When detecting that this mask plate does not have the defect of unrepairable, continue to carry out particle detection technique to described mask plate;
When detecting that this mask plate has particle, this mask plate is transferred to cleaning unit and cleans by GEOMAP, the state of this mask plate is set to cleaning state simultaneously.
9. method as claimed in claim 6, is characterized in that, the described GEOMAP setting mask plate state be in described internal storage unit is dead state;
When T1 >=B month dead time of described dead state, this mask plate is transferred to described external storage unit by described GEOMAP, the state of this mask plate is set to stored condition simultaneously;
When T1 < B month dead time of described dead state, mask plate is transferred to described lithographic cell according to photoetching process demand by described GEOMAP
Wherein, B is the arbitrary value in 6 ~ 12.
10. method as claimed in claim 6, is characterized in that, the described GEOMAP setting mask plate state be in described lithographic cell is using state;
When T2 < C month service time of described using state, this mask plate is transferred in described internal storage unit by described GEOMAP, the state of this mask plate is set to dead state simultaneously;
When T2 >=C month service time of described using state, this mask plate is transferred in described detecting unit by described GEOMAP, the state of this mask plate is set to detected state simultaneously
Wherein, C is the arbitrary value in 3 ~ 9.
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| CN201310082060.8A CN103176371B (en) | 2013-03-14 | 2013-03-14 | Automated mask management system and method |
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| CN201310082060.8A CN103176371B (en) | 2013-03-14 | 2013-03-14 | Automated mask management system and method |
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| CN103176371B true CN103176371B (en) | 2015-04-22 |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103579058B (en) * | 2012-07-24 | 2016-08-03 | 上海华虹宏力半导体制造有限公司 | A kind of method of multiple batches of continuous operation |
| CN103645610B (en) * | 2013-11-28 | 2015-06-24 | 上海华力微电子有限公司 | System and method for preventing misuse of working conditions of lithography equipment |
| CN104166317B (en) * | 2014-08-27 | 2018-10-16 | 上海华力微电子有限公司 | A kind of light shield automatic job distribution control method and control system |
| CN106158684A (en) * | 2015-04-15 | 2016-11-23 | 北大方正集团有限公司 | Quasiconductor light shield atomization detection control method and system |
| CN106486391B (en) * | 2015-08-31 | 2020-08-07 | 北大方正集团有限公司 | Semiconductor manufacturing control method and system based on MES system |
| CN105974729B (en) * | 2016-05-25 | 2020-02-18 | 京东方科技集团股份有限公司 | Mask management system and mask using method |
| CN108287454A (en) * | 2018-01-29 | 2018-07-17 | 信利（惠州）智能显示有限公司 | Mask plate Load System |
| CN109239953B (en) * | 2018-11-07 | 2021-03-05 | 成都中电熊猫显示科技有限公司 | Processing system of mask |
| CN111797644A (en) * | 2019-03-22 | 2020-10-20 | 芯恩（青岛）集成电路有限公司 | Radio frequency identification management system and method for photomask |
| CN114063382A (en) * | 2020-08-05 | 2022-02-18 | 长鑫存储技术有限公司 | Mask storage system, query system, mask storage method and computer equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| DE10005678B4 (en) * | 2000-02-07 | 2006-11-30 | Magna Auteca Zweigniederlassung Der Magna Holding Ag | Electrochromic dimming system |
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