CN103170376A - Double-layer-flow purification working table - Google Patents
Double-layer-flow purification working table Download PDFInfo
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- CN103170376A CN103170376A CN2013101200212A CN201310120021A CN103170376A CN 103170376 A CN103170376 A CN 103170376A CN 2013101200212 A CN2013101200212 A CN 2013101200212A CN 201310120021 A CN201310120021 A CN 201310120021A CN 103170376 A CN103170376 A CN 103170376A
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Abstract
The invention relates to a double-layer-flow purification working table which comprises an air intake system and an air discharging system, wherein an air diffusion plate is arranged below the air intake system; a working chamber is arranged below the air diffusion plate; large holes are formed along the transverse direction on the front side of the air diffusion plate; small holes are formed along the transverse direction at other parts of the air diffusion plate; the air discharging system comprises an air collecting plate which is positioned inside the working chamber and is vertically arranged; the holes in the air collecting plate are increased gradually from top to bottom; an air collecting hood is installed on the outer side of the air collecting plate; the lower part of the air collecting hood is connected with an air discharging device through an air discharging tube; the air flow inside the working chamber is collected by the air collecting hood after horizontally passing through the air collecting plate and is discharged out by the air discharging device through the air discharging tube. By adopting a mutation hole mode, two positive pressure areas are formed at the working chamber, wherein the air pressure on one side close to working personnel is greater than the air pressure on the inner side; the air discharging system is put on the inner side of the working chamber; and by adopting a gradual change hole mode, the air flow inside the working chamber is collected by the air collecting hood after horizontally passing through the air connecting plate, and the phenomenon that the air flow rebounds below the working chamber is avoided.
Description
Technical field
The present invention relates to clean work station, particularly a kind of two layers flow clean work station.
Background technology
In industrial production, scientific research, the environment of dustless work need to be used in a lot of places.Clean work station can provide effective working environment for these purposes, improves and produces and scientific research efficient.But there are some defectives in the present workbench that uses, and in general the clean work station district all keeps malleation to atmosphere, exists so in the course of the work volatilizable material directly to be discharged on operating personnel's body.This has a strong impact on operating personnel's health.Simultaneously, in operating process, the positions such as operating personnel's hand enter into clean workspace, also can bring a large amount of dust granules into, and impact purifies the cleanliness factor of workspace.
The applicant has applied for Chinese invention patent CN200910211063.0 in 2009, " air wall sealing type double positive pressure purification workbench ", it divides at water conservancy diversion and water conservancy diversion is set in nip divides pressing plate, make near staff's one side and have stronger air pressure, form the high pressure gas wall, this high pressure gas wall is effectively cut apart low zone of positive pressure and atmosphere, has prevented the volatile materials in the low-pressure area to the human injury, prevents that simultaneously the external dust particle from entering workbench.This workbench has solved the problems referred to above well, and is convenient to existing clean work station is transformed.
Work on hand platform extract system is all bled from the below of low zone of positive pressure, the air-flow that passes through from diffuser plate tends to get to bounce-back (air-flow rebound phenomena) after the working cavity bottom surface, cause the working cavity internal gas flow comparatively chaotic, be unfavorable for the rapid discharging of volatizable material.
Summary of the invention
The object of the invention is to: overcome the defective of above-mentioned prior art, propose a kind of two layers flow clean work station, it is rational in infrastructure, guarantees working cavity cleanliness factor and operating personnel's safety, and avoids the air-flow rebound phenomena of working cavity below appearance.
in order to achieve the above object, a kind of two layers flow clean work station that the present invention proposes, comprise gas handling system, gas extraction system, the gas handling system below is provided with diffuser plate, the diffuser plate below is working cavity, it is characterized in that: close staff's one side of described diffuser plate is along laterally offering macropore, the pore diameter range of described macropore is 18-22mm, all the other positions of diffuser plate are along laterally offering aperture, the pore diameter range of aperture is 9-11mm, described gas extraction system comprises the collector plate that is positioned at working cavity and vertically places, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then being deflated device through blast pipe discharges.
Two layers flow clean work station of the present invention, further improve being:
1, described collector plate is positioned at working cavity away from staff's a side.
2, macropore has 3 rows along lateral arrangement, and row's spacing is 1-2mm, and row's spacing of aperture is 2-3mm.
3, perforate aperture, described collector plate top is 5mm, and perforate aperture, middle and upper part is 10mm, and perforate aperture, middle and lower part is 15mm, and perforate aperture, bottom is 20mm.
Diffuser plate of the present invention adopts the sudden change well format, at diffuser plate front side (near staff's one side) wide-bore, all the other open aperture, will form like this front side air inflow large, the form that the rear side air inflow is little, make working cavity form two barotropic fields, wherein close staff's one side air pressure is greater than inboard air pressure; Simultaneously gas extraction system is placed on the working cavity inboard, and adopts the form in gradual change hole, makes flow level ground in working cavity by being collected by collecting cover after collector plate, the air-flow rebound phenomena that so just can avoid gas extraction system to occur below working cavity.
The present invention adopts technique scheme to have following advantage:
1, as long as change macropore in close staff's one side of the diffuser plate of existing clean work station, just can reach the purpose of controlling air inflow, thereby can form two barotropic fields in working cavity, wherein the high-pressure area forms the function of high pressure gas wall, very economical and effective;
2, the high pressure gas wall can effectively be separated atmospheric pressure region and low zone of positive pressure, has prevented that the volatile materials of low zone of positive pressure is to the injury of human body;
When 3, operating personnel operate, reduced by the high pressure gas wall dust granule that operating personnel bring the clean bench face into;
4, collector plate is equipped with in the working cavity inboard, at the inboard horizontal flow that forms of working cavity, has both reached the exhaust purpose, the air-flow reflex in the time of can avoiding again gas extraction system to be arranged on the working cavity below;
5, inner low zone of positive pressure can guarantee that the cleanliness factor of working cavity reaches designing requirement.
Description of drawings
The present invention is further illustrated below in conjunction with accompanying drawing.
Fig. 1 is two layers flow clean work station structural representation of the present invention.
Fig. 2 is the diffuser plate structural representation of two layers flow clean work station of the present invention.
Fig. 3 is the collector plate structural representation of two layers flow clean work station of the present invention.
The specific embodiment
The present invention will be further described below in conjunction with the drawings and specific embodiments.
as shown in Figure 1, embodiment of the present invention two layers flow clean work station, comprise gas handling system 1, gas extraction system, gas handling system 1 below is provided with diffuser plate 3, diffuser plate 3 belows are working cavity 7, working cavity 7 outsides are glass sliding door 8, working cavity 7 belows are support 9, close staff's one side of diffuser plate 3 is along laterally offering macropore, the aperture of macropore is 20mm, diffuser plate 3 all the other positions are along laterally offering aperture, the aperture of aperture is 10mm, gas extraction system comprises the collector plate 4 that is positioned at working cavity 7 and vertically places, collector plate 4 is positioned at working cavity 7 away from staff's a side, the perforate of collector plate 4 increases from top to bottom gradually, collecting cover 5 is equipped with in the outside of collector plate 4, collecting cover 5 bottoms are connected with exhaust apparatus by blast pipe 6, collected by collecting cover 5 by collector plate 4 is rear to flow level in working cavity 7, then being deflated device through blast pipe 6 discharges.
As shown in Figure 2, be the diffuser plate structural representation of this two layers flow clean work station, diffuser plate has 3 rows near the macropore of staff's one side, and row's spacing is 2mm, and row's spacing of aperture is 3mm.Under identical air inlet speed, the front side air inflow is large, and the rear side air inflow is little, will form in the working cavity inboard two barotropic fields like this, and front side air pressure is greater than rear side air pressure.
As shown in Figure 3, be the collector plate structural representation of this two layers flow clean work station, it adopts the form in gradual change hole, and varying aperture is 5mm, 10mm, 15mm, 20mm from top to bottom, will form horizontal flow in the working cavity inboard like this, so that gas is fully discharged.
In addition to the implementation, the present invention can also have other embodiments.All employings are equal to the technical scheme of replacement or equivalent transformation formation, all drop on the protection domain of requirement of the present invention.
Claims (4)
1. two layers flow clean work station, comprise gas handling system, gas extraction system, the gas handling system below is provided with diffuser plate, the diffuser plate below is working cavity, it is characterized in that: close staff's one side of described diffuser plate is along laterally offering macropore, the pore diameter range of described macropore is 18-22mm, all the other positions of diffuser plate are along laterally offering aperture, the pore diameter range of aperture is 9-11mm, described gas extraction system comprises the collector plate that is positioned at working cavity and vertically places, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then being deflated device through blast pipe discharges.
2. two layers flow clean work station according to claim 1, it is characterized in that: described collector plate is positioned at working cavity away from staff's a side.
3. two layers flow clean work station according to claim 1 is characterized in that: macropore has 3 rows along lateral arrangement, and row's spacing is 1-2mm, and row's spacing of aperture is 2-3mm.
4. two layers flow clean work station according to claim 1, it is characterized in that: perforate aperture, described collector plate top is 5mm, and perforate aperture, middle and upper part is 10mm, and perforate aperture, middle and lower part is 15mm, and perforate aperture, bottom is 20mm.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410680619.1A CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201310120021.2A CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
| CN201410610282.7A CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310120021.2A CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410680619.1A Division CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201410610282.7A Division CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103170376A true CN103170376A (en) | 2013-06-26 |
| CN103170376B CN103170376B (en) | 2014-12-10 |
Family
ID=48630821
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310120021.2A Expired - Fee Related CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
| CN201410680619.1A Expired - Fee Related CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410680619.1A Expired - Fee Related CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Country Status (1)
| Country | Link |
|---|---|
| CN (3) | CN103170376B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104060783A (en) * | 2014-05-15 | 2014-09-24 | 昆山协多利洁净科技有限公司 | Clean room guardrail |
| CN108214235A (en) * | 2018-01-03 | 2018-06-29 | 京东方科技集团股份有限公司 | Burnishing device |
| CN112379730A (en) * | 2020-11-24 | 2021-02-19 | 南通大学 | Computer memory bank with air cooling device and computer |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105327721A (en) * | 2015-11-30 | 2016-02-17 | 冯义文 | Auxiliary jig applied to purifying workbench |
| CN110860152A (en) * | 2019-11-22 | 2020-03-06 | 江苏徐工工程机械研究院有限公司 | Additive mixing system and method and dust suppression vehicle |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01239329A (en) * | 1988-03-18 | 1989-09-25 | Hitachi Ltd | Clean air circulation type pass box |
| US4976815A (en) * | 1987-04-03 | 1990-12-11 | Tadahiro Ohmi | Draft chamber |
| CN101385986A (en) * | 2007-09-04 | 2009-03-18 | 三菱麻铁里亚尔株式会社 | Clean bench and method of producing raw material for single crystal silicon |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
| CN202363428U (en) * | 2011-10-10 | 2012-08-01 | 北京七星华创电子股份有限公司 | Ultra-clean microenvironment device |
-
2013
- 2013-04-08 CN CN201310120021.2A patent/CN103170376B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201410680619.1A patent/CN104525287B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201410610282.7A patent/CN104307589B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4976815A (en) * | 1987-04-03 | 1990-12-11 | Tadahiro Ohmi | Draft chamber |
| JPH01239329A (en) * | 1988-03-18 | 1989-09-25 | Hitachi Ltd | Clean air circulation type pass box |
| CN101385986A (en) * | 2007-09-04 | 2009-03-18 | 三菱麻铁里亚尔株式会社 | Clean bench and method of producing raw material for single crystal silicon |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
| CN202363428U (en) * | 2011-10-10 | 2012-08-01 | 北京七星华创电子股份有限公司 | Ultra-clean microenvironment device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104060783A (en) * | 2014-05-15 | 2014-09-24 | 昆山协多利洁净科技有限公司 | Clean room guardrail |
| CN108214235A (en) * | 2018-01-03 | 2018-06-29 | 京东方科技集团股份有限公司 | Burnishing device |
| CN108214235B (en) * | 2018-01-03 | 2019-07-02 | 京东方科技集团股份有限公司 | Burnishing device |
| CN112379730A (en) * | 2020-11-24 | 2021-02-19 | 南通大学 | Computer memory bank with air cooling device and computer |
| CN112379730B (en) * | 2020-11-24 | 2022-04-01 | 南通大学 | Computer memory bank with air cooling device and computer |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104307589A (en) | 2015-01-28 |
| CN103170376B (en) | 2014-12-10 |
| CN104307589B (en) | 2016-01-13 |
| CN104525287A (en) | 2015-04-22 |
| CN104525287B (en) | 2016-04-27 |
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| C53 | Correction of patent of invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Wang Qiang Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Guoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Hua Guoran Inventor before: Wang Qiang Inventor before: Su Boyong Inventor before: Zhang Yu Inventor before: Deng Jie |
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Free format text: CORRECT: INVENTOR; FROM: HUA GUORAN WANG QIANG SU BOYONG ZHANG YU DENG JIE TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG |
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| C53 | Correction of patent of invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Wang Qiang Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Gyoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Hua Guoran Inventor before: Wang Qiang Inventor before: Su Boyong Inventor before: Zhang Yu Inventor before: Deng Jie |
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Free format text: CORRECT: INVENTOR; FROM: HUA GUORAN WANG QIANG SU BOYONG ZHANG YU DENG JIE TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C53 | Correction of patent of invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Wang Qiang Inventor after: Zhu Haifeng Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Guoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Wang Qiang Inventor before: Zhong Beixin Inventor before: Hu Chuanzhi Inventor before: Hua Guoran Inventor before: Cheng Shi Inventor before: Deng Jie Inventor before: Zhang Yu Inventor before: Wang Lei Inventor before: Su Boyong |
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Free format text: CORRECT: INVENTOR; FROM: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG ZHU HAIFENG |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141210 Termination date: 20160408 |
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| CF01 | Termination of patent right due to non-payment of annual fee |