CN103160880A - Electrolysis copper plating solution - Google Patents

Electrolysis copper plating solution Download PDF

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Publication number
CN103160880A
CN103160880A CN 201110423822 CN201110423822A CN103160880A CN 103160880 A CN103160880 A CN 103160880A CN 201110423822 CN201110423822 CN 201110423822 CN 201110423822 A CN201110423822 A CN 201110423822A CN 103160880 A CN103160880 A CN 103160880A
Authority
CN
China
Prior art keywords
copper plating
plating solution
electrolysis copper
good
phosphonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 201110423822
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Chinese (zh)
Inventor
顾向军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN 201110423822 priority Critical patent/CN103160880A/en
Publication of CN103160880A publication Critical patent/CN103160880A/en
Pending legal-status Critical Current

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Abstract

The invention discloses an electrolysis copper plating solution. The electrolysis copper plating solution comprises, by weight, 30-50g/L of one kind of cupric nitrate, 100-150g/L of hydroxy butylidene phosphonic acid, 1-5g/L of phosphonic acid dimethyl ammonium, 5-10g/L of tripotassium citrate, 0.01-0.05g/L of polyethyleneimine and the rest of the electrolysis copper plating solution is water. The electrolysis copper plating solution is reasonable in formula, good in stability of plating solution, environment-friendly, pollution free, and good in quality of produced products.

Description

A kind of electrolytic copper plating liquor
Technical field
The invention belongs to the electroplating technology field, be specifically related to a kind of electrolytic copper plating liquor.
Background technology
Metalwork copper facing can obtain preservative effect and conductivity preferably, and a large amount of copper electroplating solutions that use are seriously polluted at present, the wastewater treatment difficulty, and bath stability is poor, and work-ing life, short needs were frequently changed.
Summary of the invention
The object of the present invention is to provide a kind of formula reasonable, good stability, long service life, the electrolytic copper plating liquor that quality of coating is high.
Technical solution of the present invention is:
A kind of electrolytic copper plating liquor is characterized in that: namely formula is: a kind of 30~50g/L in cupric nitrate, hydroxyl fourth fork di 2 ethylhexyl phosphonic acid 100~150gL, first ammonia two methene phosphonic acids 1~5g/L, citric acid tri potassium 5~10g/L, polymine alkane 0.01~0.05g/L, excess water.
The present invention fills a prescription rationally, and bath stability is good, and is environment friendly and pollution-free, the good product quality of production.
Embodiment:
A kind of electrolytic copper plating liquor, its formula is: a kind of 30g/L in cupric nitrate, hydroxyl fourth fork di 2 ethylhexyl phosphonic acid 100gL, first ammonia two methene phosphonic acids 3g/L, citric acid tri potassium 5g/L, polymine alkane 0.01g/L, excess water.

Claims (1)

1. electrolytic copper plating liquor is characterized in that: namely formula is: a kind of 30~50g/L in cupric nitrate, hydroxyl fourth fork di 2 ethylhexyl phosphonic acid 100~150gL, first ammonia two methene phosphonic acids 1~5g/L, citric acid tri potassium 5~10g/L, polymine alkane 0.01~0.05g/L, excess water.
CN 201110423822 2011-12-18 2011-12-18 Electrolysis copper plating solution Pending CN103160880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201110423822 CN103160880A (en) 2011-12-18 2011-12-18 Electrolysis copper plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201110423822 CN103160880A (en) 2011-12-18 2011-12-18 Electrolysis copper plating solution

Publications (1)

Publication Number Publication Date
CN103160880A true CN103160880A (en) 2013-06-19

Family

ID=48584400

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201110423822 Pending CN103160880A (en) 2011-12-18 2011-12-18 Electrolysis copper plating solution

Country Status (1)

Country Link
CN (1) CN103160880A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104332213A (en) * 2014-11-19 2015-02-04 印培东 Electroplating copper clad aluminum conductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104332213A (en) * 2014-11-19 2015-02-04 印培东 Electroplating copper clad aluminum conductor

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C05 Deemed withdrawal (patent law before 1993)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130619