CN103149809A - Off-axis illuminating device for photoetching machine equipment - Google Patents
Off-axis illuminating device for photoetching machine equipment Download PDFInfo
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- CN103149809A CN103149809A CN2013100961362A CN201310096136A CN103149809A CN 103149809 A CN103149809 A CN 103149809A CN 2013100961362 A CN2013100961362 A CN 2013100961362A CN 201310096136 A CN201310096136 A CN 201310096136A CN 103149809 A CN103149809 A CN 103149809A
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Abstract
The invention discloses an off-axis illuminating device for photoetching machine equipment. The off-axis illuminating device for the photoetching machine equipment is characterized by comprising an illuminating unit, a diffractive optical element unit, a zoom collimating lens, a quarter-wave plate, a negative axial cone lens, a 45-degree optical rotation plate and a positive axial cone lens; and the illuminating unit consists of an excimer laser and an expanded beam collimating lens group. A photoetching machine provided by the invention can achieve dual-ring illumination, dual-bipolar illumination and dual-quadrupole illumination.
Description
Technical field
The present invention relates to litho machine, a kind of off-axis illumination device for litho machine is particularly realized the off-axis illumination of Crossed Circle, two two utmost points, two quadrupole illuminating patterns.
Background technology
Along with the development with very large scale integration technology of improving constantly of chip integration, need to improve constantly resolution and the depth of focus of litho machine.The resolution and the depth of focus that how to improve litho machine are present study hotspots.Reduce litho machine exposure wavelength, to improve the numerical aperture of projection objective or reduce process factor be all to improve the effective means of litho machine resolution, but when adopting above-mentioned means, the depth of focus of projection objective is sharply reduced.By adopting the modes such as off-axis illumination can increase depth of focus when improving litho machine resolution.
The scientific research personnel has developed multiple photoetching resolution enhance technology, and the off-axis illumination that obtains by the pupil shaping technique is a kind of commonly used and effective resolution enhance technology in litho machine.Litho machine need to be selected different off-axis illumination patterns for different mask arrangements, to reach the purpose that strengthens photoetching resolution, increasing depth of focus, raising contrast.The optical element that the pupil shaping technique refers in etching system to adopt particular design carries out amplitude and position modulation mutually to the laser beam of incident, thus on pupil plane a kind of shaping technique of the needed light field pattern of acquisition.A kind of common method of pupil shaping realizes by diffraction optical element and conical mirror group, can realize the multiple photoetching light illumination modes such as ring illumination, two utmost point illuminations and quadrupole illuminating.Along with constantly reducing of litho pattern characteristic dimension, also more and more higher to the requirement of litho machine novel illumination pattern, therefore research and develop a kind of principle device that produces the novel illumination pattern particularly important.
Chinese patent " a kind of free-form surface lens for double ring-shaped uniform illumination " (CN101916046B) has proposed a kind of method that realizes the dicyclo light illumination mode.Its principle is to have designed a kind of free-form surface lens, make laser beam incident arrive target face through free form surface deflection and form corresponding Crossed Circle light illumination mode, but element processing more complicated, and the inside and outside coherence factor of gained dicyclo light illumination mode is non-adjustable, therefore is not suitable for exposure system of photo-etching machine.
US Patent No. 20090135392A1 has openly proposed a kind of spatial beam modulating unit of realizing off-axis illumination, its principle is to have utilized the micro-reflector two-dimensional array, and realizes corresponding off-axis illumination pattern by the deflection angle that control module is controlled each micro-reflector.But each micro mirror of this device needs control module to control deflection angle, must increase the complexity of system.
Summary of the invention
The present invention is intended to overcome above-mentioned the deficiencies in the prior art, and a kind of off-axis illumination device for litho machine is provided, and this device can be realized the dicyclo illumination to litho machine, two two utmost point illuminations, two quadrupole illuminatings.
Technical solution of the present invention is as follows:
A kind of litho machine equipment off-axis illumination device, its characteristics are that this device comprises lighting unit, diffraction optical element unit, zoom collimating mirror group, quarter-wave plate, negative axial cone mirror, 45 ° of optical rotation plates and positive axis axicon lens; Described lighting unit is comprised of excimer laser and beam-expanding collimation mirror group;
The position relationship of said elements is as follows:
Laser Transmission direction along described excimer laser, beam-expanding collimation mirror group, diffraction optical element unit, zoom collimating mirror group, quarter-wave plate, negative axial cone mirror, polarization apparatus, the positive axis axicon lens with optical axis successively, before described negative axial cone mirror, polarization apparatus and positive axis axicon lens are positioned at the back focal plane of described zoom collimating mirror group; Described diffraction optical element unit is positioned at the front focal plane place of described zoom collimating mirror group;
The interior ring of the described negative axial cone mirror conical surface is coated with anti-reflection film, and the external radius of this film is slightly larger than the incident beam radius; Should bear the high reflective film that plates on axial cone mirror conical surface outer shroud, these highly reflecting films are total reflection phase retardation films, and the inside radius of this film equals the external radius of described anti-reflection film, and external radius equals the clear aperture of negative axial cone mirror;
The polarization spectro-film of described positive axis axicon lens is plated on the conical surface, and covers the whole conical surface fully, the angle at 45 °, polarization direction of the fast axle of described quarter-wave plate and incident light; Described positive axis axicon lens is arranged on a high precision line slideway that moves along optical axis direction.
Described glass optical component all adopts fused quartz to make.
The anti-reflection film that plates on the interior ring of the described negative axial cone mirror conical surface, near 100%, the external radius of this film is slightly larger than the incident beam radius to the transmitance of incident light; The high reflective film that plates on described negative axial cone mirror conical surface outer shroud, to the reflectivity of incident light near 100%, and the highly reflecting films that plate on the described negative axial cone mirror conical surface are total reflection phase retardation films, this film has the P light of reflection and the characteristic that the S light phase is consistent, the inside radius of this film equals the external radius of described anti-reflection film, and external radius equals the clear aperture of negative axial cone mirror.
The polarization spectro-film of described positive axis axicon lens is plated on the conical surface, and covers the whole conical surface fully, its characteristic for to the S light reflectivity near 100%, to the transmitance of P light near 100%.
The bore value of described negative axial cone mirror and positive axis axicon lens should be slightly larger than described dicyclo light illumination mode outer shroud external radius R
2Maximum required value, the value of described axial cone mirror base angle r should be between 5 °～20 °.
The polarization spectro-film of described positive axis axicon lens is plated on the conical surface, and covers the whole conical surface fully, its characteristic for to the S light reflectivity near 100%, to the transmitance of P light near 100%.The design details of polarization film is known by the researcher in this field, specifically can be referring to US Patent No. 005748369A " Polarizing beam splitter and an illuminating device provided with the same ".
Described lighting unit comprises excimer laser, beam expanding lens;
The angle at 45 °, polarization direction of the fast axle of described quarter-wave plate and incident light;
The position relationship of described component is as follows:
Along the working direction of described excimer laser Output of laser light beam, the optical element order of passing through is beam expanding lens, diffraction optical element unit, zoom collimating mirror group, quarter-wave plate, negative axial cone mirror, 45 ° of optical rotation plates and positive axis axicon lens successively.
Glass optical component described in this device all adopts fused quartz, and this material is high in the transmitance of deep ultraviolet wave band, is applicable to the deep UV (ultraviolet light) wave bands such as 193nm, 248nm.
When the linearly polarized laser light beam can form the tunable dicyclo light illumination mode of inner and outer ring radius, two two utmost point light illumination modes and two quadrupole illuminating pattern by described device.Wherein, when realizing dicyclo light illumination mode, two two utmost point light illumination modes and two quadrupole illuminating pattern, positive axis axicon lens and negative axial cone mirror need not be changed, and need be correspondingly only the diffraction optical element unit when realizing traditional lighting pattern, two utmost point light illumination modes and quadrupole illuminating mould with the diffraction optical element unit replacement.
The interior ring external radius of the dicyclo light illumination mode that described device forms can represent with following formula:
The outer shroud external radius of the dicyclo light illumination mode that described device forms can represent with following formula:
d
0Distance between the negative axial cone mirror of expression and positive axis axicon lens, it is the distance on two axial cone mirror axial cone summits, n is the refractive index of described axial cone mirror, r is the base angle of described positive axis axicon lens and negative axial cone mirror, and D is that laser beam incides the beam radius of quarter-wave plate through described diffraction optical element unit and zoom collimating mirror group.Between negative axial cone mirror 501 and positive axis axicon lens 502 apart from d
0When changing, the external diameter R of interior ring and outer shroud
1And R
2Also change accordingly, realize the adjusting of coherence factor.
The computing formula of the interior ring of described two two utmost point light illumination modes and two quadrupole illuminating patterns and the external radius of outer shroud is identical with above-mentioned two formulas.The interior ring of described dicyclo light illumination mode is identical with the ring width of outer shroud, and equals to be incident on the radius D of the light beam of quarter-wave plate.
The bore value of described negative axial cone mirror and positive axis axicon lens should be slightly larger than described dicyclo light illumination mode outer shroud external radius R
2Maximum required value.The value of described axial cone mirror base angle r should be between 5 °～20 °.
Compare with first technology, the present invention has following beneficial effect:
1, the present invention has realized a kind of novel illumination pattern for the photo-etching machine off-axis illumination, can realize the dicyclo illumination, two two utmost point illuminations and two quadrupole illuminating;
2, the present invention has realized the Crossed Circle illumination of adjustable coherence factor, two two utmost point illuminations, two quadrupole illuminating pattern, can be according to the demand of mask, by the focal length of adjusting front end zoom collimating mirror group and the distance of positive and negative axial cone mirror, obtain the adjusting of inside and outside coherence factor;
3, light illumination mode implementation proposed by the invention can improve in the lighting device of existing lithographic equipment, and cost is low, easily realizes;
4, light illumination mode implementation proposed by the invention can be used for the fields such as laser capture and Trapping of Atoms.
Description of drawings
Fig. 1 is litho machine equipment of the present invention with the light path schematic diagram of off-axis illumination device.
Fig. 2 is the light path schematic diagram of the embodiment of the present invention.
Fig. 3 is described negative axial cone mirror 501 plated film schematic diagram.
Fig. 4 is the light illumination mode schematic diagram that described device forms.
Embodiment
For making technical scheme of the present invention and advantage clear, below in conjunction with drawings and Examples, the present invention is done elaborating.
Please refer to accompanying drawing 1, accompanying drawing 1 is litho machine equipment of the present invention off-axis illumination device, and this device comprises lighting unit, diffraction optical element unit 301, zoom collimating mirror group 302, quarter-wave plate 401, negative axial cone mirror 501,45 ° of optical rotation plates 402 and positive axis axicon lens 502; Described lighting unit is comprised of excimer laser 101 and beam-expanding collimation mirror group 201,202;
The position relationship of said elements is as follows:
Laser Transmission direction along described excimer laser 101, beam-expanding collimation mirror group 201,202, diffraction optical element unit 301, zoom collimating mirror group 302, quarter-wave plate 401, negative axial cone mirror 501, polarization apparatus 402, the positive axis axicon lens 502 with optical axis successively, before described negative axial cone mirror 501, polarization apparatus 402 and positive axis axicon lens 502 are positioned at the back focal plane 601 of described zoom collimating mirror group 302; Described diffraction optical element unit 301 is positioned at the front focal plane place of described zoom collimating mirror group 302;
The interior ring of described negative axial cone mirror 501 conical surfaces is coated with anti-reflection film, and the external radius of this film is slightly larger than the incident beam radius; Should bear the high reflective film that plates on axial cone mirror conical surface outer shroud, these highly reflecting films are total reflection phase retardation films, and the inside radius of this film equals the external radius of described anti-reflection film, and external radius equals the clear aperture of negative axial cone mirror;
The polarization spectro-film of described positive axis axicon lens 502 is plated on the conical surface, and covers the whole conical surface fully, the angle at 45 °, polarization direction of the fast axle of described quarter-wave plate 401 and incident light; Described positive axis axicon lens 502 is arranged on a high precision line slideway that moves along optical axis direction.
The position relationship of said elements is as follows:
Along the Laser Transmission direction of described excimer laser 101, successively through beam expanding lens group 201 and 202, diffraction optical element unit 301, zoom collimating mirror group 302, quarter-wave plate 401, negative axial cone mirror 501, polarization apparatus 402, positive axis axicon lens 502.601 obtain required light illumination mode on the back focal plane of zoom collimating mirror group 302, and coordinate follow-up beam homogenization unit, mask plate, projection objective in lithographic equipment, realize optical lithography.
The angle at 45 °, polarization direction of the fast axle of described quarter-wave plate 401 and incident light.
Described diffraction optical element unit 301 is positioned at the front focal plane place of described zoom collimating mirror group 302, described quarter-wave plate 401 is between described zoom collimating mirror group 302 and negative axial cone mirror 501, and described polarization apparatus 402 is between described negative axial cone mirror 501 and described positive axis axicon lens 502.
In the conical surface of described negative axial cone mirror, the anti-reflection film of the upper plating of ring adopts dielectric film, to the transmitance of incident light near 100%, and the highly reflecting films that plate on described negative axial cone mirror conical surface outer shroud are total reflection phase retardation films, the P light of the reflection of this film is consistent with the S light phase, its design and job operation are known by the scientific research personnel, and the external radius of this film is slightly larger than the incident beam radius.
The polarization spectro-film of described positive axis axicon lens 502 is plated on the conical surface, and its characteristic is to S polarized light reflectivity 100%, and the P polarized light is seen through near 100%.The design details of polarization film is known by the researcher in this field, specifically can be referring to US Patent No. 005748369A " Polarizing beam splitter and an illuminating device provided with the same ".
If the linearly polarized laser light beam passes through described quarter-wave plate 401 successively, described negative axial cone mirror 501, after described 45 ° of optical rotation plates 402, the polarization state of laser beam transfers circularly polarized light to; This circularly polarized light incides on described positive axis axicon lens 502, owing to being coated with polarization spectro-film on described positive axis axicon lens 502 conical surfaces, the S polarized light is reflected near 100%, to the P polarized light near 100% see through, the P polarized light forms the interior ring of dicyclo through transmission after described positive axis axicon lens 502, the energy that in this, ring comprises is 50% of incident light; S light after reflection is through after described 45 ° of optical rotation plates 402, incide on the conical surface of described negative axial cone mirror 501, be coated with high reflective film on the outer ring surface of described negative axial cone mirror 501, with this incident light reflection, incide again described positive axis axicon lens 502 through after described 45 ° of optical rotation plates 402; Owing to being passed through described 45 ° of optical rotation plates 402 twice by the S polarized light after described positive axis axicon lens 502 conical reflectings, and the high reflective film that plates on described negative axial cone mirror 501 outer ring surfaces is the total reflection phase retardation film, P light and S light phase after reflection are consistent, when therefore this light beam was to described positive axis axicon lens 502, light beam was P direction polarized light; This P direction polarized light forms outer shroud all through the lip-deep polarization spectro-film of described positive axis axicon lens 502, and the energy that outer shroud comprises is 50% of incident light energy.Form by the way the dicyclo light illumination mode, or two two utmost point light illumination modes, or two quadrupole illuminating pattern.P polarized light described above and S polarized light refer to the polarization direction in the plane of incidence.
The interior ring external radius of the dicyclo light illumination mode that described device forms can represent with following formula:
The outer shroud external radius of the dicyclo light illumination mode that described device forms can represent with following formula:
d
0Distance between the negative axial cone mirror of expression and positive axis axicon lens, n is the refractive index of described axial cone mirror, r is the base angle of described positive axis axicon lens and negative axial cone mirror, and D is that laser beam incides the beam radius of quarter-wave plate through described diffraction optical element unit and zoom collimating mirror group.
The computing formula of the interior ring of described two two utmost point light illumination modes and two quadrupole illuminating patterns and the external radius of outer shroud is identical with above-mentioned two formulas.The interior ring of described dicyclo light illumination mode is identical with the ring width of outer shroud, and equals to be incident on the radius D of the light beam of quarter-wave plate.
The bore value of described negative axial cone mirror and positive axis axicon lens should be slightly larger than described dicyclo light illumination mode outer shroud external radius R
2Maximum required value.The value of described axial cone mirror base angle r should be between 5 °～20 °.
The expanding multiplying power and be 5 of described beam expanding lens unit 201,202 *.This beam expanding lens adopts negative-positive lens version, has shortened light path, has avoided simultaneously light beam to focus on the problem that produce power is concentrated.Described zoom collimating mirror group 302 is three groups of full ejector half zoom system, pancreatic systems, can realize the requirement of continuous vari-focus, zoom ratio is 6 *.
Described off-axis illumination device can obtain (US Patent No. 68B003B2) by the simple transformation to existing lighting device.Concrete steps are for plating respectively anti-reflection film and high antiferromagnetic thin film on the conical surface inner and outer ring of negative axial cone mirror, the conical surface at the positive axis axicon lens plates polarization spectro-film, and in the front of bearing the axial cone mirror, and inserting 45 ° of optical rotation plates between negative axial cone mirror and positive axis axicon lens, 45 ° of optical rotation plates all should be near bearing the axial cone mirror with quarter-wave plate.Due to anti-reflection film, high reflective film and the polarization spectro-film processing technology ripe, and quarter-wave plate also easily obtains, and realizes so this scheme has advantages of low cost and is easy to.
Utilize described device to realize the light illumination modes such as adjustable dicyclo illumination, two two utmost point illuminations, two quadrupole illuminatings, this performing step is as follows:
1. the diffraction optical element unit 301 of corresponding light illumination mode is fixed on the position of light beam irradiates;
2. start described excimer laser 101;
3. the mobile lens of mobile described zoom collimating mirror group 302 reaches the focal length of required zoom collimating mirror group 302;
4. regulate the distance between described negative axial cone mirror 501 and positive axis axicon lens 502, realize required dicyclo light illumination mode on the back focal plane of zoom collimating mirror group 302, generally should fix negative axial cone mirror 501, only move positive axis axicon lens 502 by line slideway along optical axis direction.Line slideway does not show in the drawings.External diameter formula by above-mentioned dicyclo can find, between negative axial cone mirror 501 and positive axis axicon lens 502 apart from d
0When changing, the external diameter R of interior ring and outer shroud
1And R
2Also change accordingly, realize the adjusting of coherence factor.
Specific embodiment
See also Fig. 2, right figure wherein is a kind of dicyclo light illumination mode pattern that utilizes the optical devices in Fig. 1 to produce.Wherein excimer laser 101 output light wavelengths are 193nm, and outgoing beam is of a size of 3mm * 3mm; Beam expanding lens 201 and 202 enlargement ratio are 5x, obtain circular light beam after incident beam process diffraction optical element unit 301 and zoom collimating mirror group 302, obtain the adjustable dicyclo light illumination mode of coherence factor after this circle light beam process quarter-wave plate 401, negative axial cone mirror 501, polarization apparatus 402, positive axis axicon lens 502.
The base angle of negative axial cone mirror 501 and positive axis axicon lens 502 is 5 °, and the Refractive Index of Material of axial cone mirror is taken as 1.56 under operation wavelength 193nm.When negative axial cone mirror 501 and positive axis axicon lens 502 apart from d
0During for 10mm, according to the formula of described calculating external diameter, can calculate the external radius R of interior ring
1The external radius R of=15.4937mm and outer shroud
2=56.5082mm.If negative axial cone mirror 501 and positive axis axicon lens 502 apart from d
0When being adjusted to 30mm from 5mm, the external radius R of interior ring and outer shroud
1And R
2Range of adjustment be respectively 15.2469mm～16.4811mm, 35.7541mm～139.5247mm, required negative axial cone mirror 501 and the size of positive axis axicon lens 502 need to be greater than 140mm.
The plated film mode of concrete negative axial cone mirror 501 is referring to Fig. 3, radius fr
1With interior circle plating anti-reflection film, fr
1Should be greater than the radius of incident beam on negative axial cone mirror 501, radius fr
1And fr
2Between plate high antiferromagnetic thin film.All plate polarization spectro-film on the conical surface of positive axis axicon lens 502.
Fig. 4 is the schematic diagram of two two utmost point light illumination modes of dicyclo light illumination mode, directions X, two two utmost point light illumination modes of Y-direction and two quadrupole illuminating patterns.
Claims (5)
1. a litho machine equipment off-axis illumination device, is characterized in that this device comprises lighting unit, diffraction optical element unit (301), zoom collimating mirror group (302), quarter-wave plate (401), negative axial cone mirror (501), 45 ° of optical rotation plates (402) and positive axis axicon lens (502); Described lighting unit is comprised of excimer laser (101) and beam-expanding collimation mirror group (201,202);
The position relationship of said elements is as follows:
Laser Transmission direction along described excimer laser (101), be the beam-expanding collimation mirror group (201,202), diffraction optical element unit (301), zoom collimating mirror group (302), quarter-wave plate (401) with optical axis, negative axial cone mirror (501), polarization apparatus (402), positive axis axicon lens (502) successively, the back focal plane (601) that described negative axial cone mirror (501), polarization apparatus (402) and positive axis axicon lens (502) are positioned at described zoom collimating mirror group (302) before; Described diffraction optical element unit (301) is positioned at the front focal plane place of described zoom collimating mirror group (302);
The interior ring of described negative axial cone mirror (501) conical surface is coated with anti-reflection film, and the external radius of this film is slightly larger than the incident beam radius; Should bear the high reflective film that plates on axial cone mirror conical surface outer shroud, these highly reflecting films are total reflection phase retardation films, and the inside radius of this film equals the external radius of described anti-reflection film, and external radius equals the clear aperture of negative axial cone mirror;
The polarization spectro-film of described positive axis axicon lens (502) is plated on the conical surface, and covers the whole conical surface fully, the angle at 45 °, polarization direction of the fast axle of described quarter-wave plate (401) and incident light; Described positive axis axicon lens (502) is arranged on a high precision line slideway that moves along optical axis direction.
2. litho machine equipment off-axis illumination device according to claim 1, is characterized in that described glass optical component all adopts fused quartz to make.
3. litho machine equipment off-axis illumination device according to claim 1 is characterized in that the anti-reflection film that plates on the interior ring of the described negative axial cone mirror conical surface, and near 100%, the external radius of this film is slightly larger than the incident beam radius to the transmitance of incident light; The high reflective film that plates on described negative axial cone mirror conical surface outer shroud, to the reflectivity of incident light near 100%, and the highly reflecting films that plate on the described negative axial cone mirror conical surface are total reflection phase retardation films, this film has the P light of reflection and the characteristic that the S light phase is consistent, the inside radius of this film equals the external radius of described anti-reflection film, and external radius equals the clear aperture of negative axial cone mirror.
4. litho machine equipment off-axis illumination device according to claim 1, it is characterized in that the polarization spectro-film of described positive axis axicon lens, be plated on the conical surface, and cover the whole conical surface fully, its characteristic for to the S light reflectivity near 100%, to the transmitance of P light near 100%.
5. the described litho machine equipment off-axis illumination device of according to claim 1 to 4 any one, is characterized in that the bore value of described negative axial cone mirror and positive axis axicon lens should be slightly larger than described dicyclo light illumination mode outer shroud external radius R
2Maximum required value, the value of described axial cone mirror base angle r should be between 5 °～20 °.
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| CN108919500A (en) * | 2018-09-19 | 2018-11-30 | 长春理工大学 | Tunable bottle beams optical optical tweezers system based on double light beam laser trap |
| CN109031647A (en) * | 2018-06-22 | 2018-12-18 | 平行现实（杭州）科技有限公司 | Optical amplifier method, optical amplifier mould group and amplification system |
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| CN110989300A (en) * | 2020-01-02 | 2020-04-10 | 中国科学院上海光学精密机械研究所 | Super-resolution imaging photoetching system and method |
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| CN108919500A (en) * | 2018-09-19 | 2018-11-30 | 长春理工大学 | Tunable bottle beams optical optical tweezers system based on double light beam laser trap |
| CN108919500B (en) * | 2018-09-19 | 2020-08-21 | 长春理工大学 | Tunable local hollow beam optical tweezers system based on double-beam laser trap |
| CN110989300A (en) * | 2020-01-02 | 2020-04-10 | 中国科学院上海光学精密机械研究所 | Super-resolution imaging photoetching system and method |
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