CN103123033A - Heat-insulating film - Google Patents
Heat-insulating film Download PDFInfo
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- CN103123033A CN103123033A CN2011103790751A CN201110379075A CN103123033A CN 103123033 A CN103123033 A CN 103123033A CN 2011103790751 A CN2011103790751 A CN 2011103790751A CN 201110379075 A CN201110379075 A CN 201110379075A CN 103123033 A CN103123033 A CN 103123033A
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Abstract
The invention relates to a heat-insulating film which comprises an absorbing layer and a cholesterol liquid crystal layer. The absorbing layer is used for absorbing ultraviolet light and infrared light, wherein the cholesterol liquid crystal layer reflects infrared light by adjusting the rotating screw pitch of the cholesterol liquid crystal layer.
Description
Technical field
The invention relates to a kind of thermal isolation film, and particularly relevant for a kind of thermal isolation film that comprises cholesteric liquid crystal layer.
Background technique
In recent years due to industrial and commercial flourishing, social progress, the product that relatively provides also is purport mainly for convenient, certain, economical and practical, and therefore, the product of current exploitation is also than in the past more progressive, and contributed social.
The predominant use of thermal isolation film is to hinder flowing of heat energy.Thermal isolation film not only is widely used on the various traffic tool, also uses on building in a large number.According to statistics, in general commercial building, the power consumption relevant with air-conditioning accounts for 47% of total electricity consumption.Hereat, reducing the need for electricity of air-conditioning, is a very important problem for saving the building operating cost.
Infrared rays in sunlight is partly the topmost pyrogen of nature.Sunlight (particularly wherein infrared rays part) can make room temperature improve after entering commercial building inside.Therefore, need air-conditioning to reduce temperature.
Enter the solar radiation of building in thing for reduction, generally can stick thermal isolation film at the window of commercial building.Yet thermal isolation film also can stop the visible light in sunlight except stopping the infrared rays part in sunlight, and causes the brightness reduction of commercial building inner space.
This shows that above-mentioned existing mode obviously still exists inconvenience and defective, and haves much room for improvement.In order to address the above problem, association area is there's no one who doesn't or isn't sought solution painstakingly, but does not develop yet for a long time suitable solution.Therefore, how to utilize thermal isolation film to reduce ultrared incident, and keep the penetration rate of visible light, real one of the current important research and development problem that belongs to also becomes current association area and needs improved target badly.
Summary of the invention
One purpose of content of the present invention is that a kind of thermal isolation film is being provided, and so as to reducing ultrared incident, and keeps the penetration rate of visible light.
For reaching above-mentioned purpose, a technological scheme of content of the present invention is about a kind of thermal isolation film.This thermal isolation film comprises at least one absorbed layer and at least one cholesteric liquid crystal layer.Absorbed layer is in order to absorb ultraviolet and infrared light.Cholesteric liquid crystal layer is disposed under absorbed layer, and wherein the rotation pitch of cholesteric liquid crystal layer makes the cholesteric liquid crystal layer reflects infrared light through adjustment.
According to one embodiment of the invention, the visible light average penetration rate of thermal isolation film is 50% to 80%.
According to another embodiment of the present invention, the infrared reflectivity of thermal isolation film (heat insulation rate) is 70% to 99%.
According to yet another embodiment of the invention, cholesteric liquid crystal layer is to utilize the mode of coating to form.
According to further embodiment of this invention, absorbed layer comprises metal layer.Can comprise in order to the material that forms this metal layer at least a following metal: silver, aluminium, tungsten, magnesium, molybdenum, zinc, tin, indium, chromium, antimony, titanium, nickel, copper, vanadium, brill, iron, niobium and alloy thereof.
The another embodiment again according to the present invention, absorbed layer comprises metal oxide layer.Can comprise in order to the material that forms this metal oxide layer at least a following metallic oxide: silver oxide, aluminum oxide, tungsten oxide, magnesium oxide, molybdenum oxide, zinc oxide, tin-oxide, indium oxide, chromated oxide, sb oxide, titanium oxide, nickel oxide, Cu oxide, barium oxide, cobalt/cobalt oxide, ferriferous oxide, niobium oxide, indium tin oxide, Zinc-aluminium and tin-antimony oxide.
Another embodiment again according to the present invention, above-mentioned metal layer or metal oxide layer are to utilize the mode of sputter, evaporation or coating to form.In general, described metal layer or metal oxide layer can absorb ultraviolet ray and/or infrared radiation.In addition, in optional embodiment, absorbed layer also can comprise extra ultraviolet ray and/or outer light absorbers.
According to certain embodiments of the invention, thermal isolation film also comprises base layer, its be disposed under cholesteric liquid crystal layer or be disposed at absorbed layer and cholesteric liquid crystal layer between.This base layer can be fibrous substrates (fibersubstrate) or membranaceous substrate (film substrate).
Another embodiment again according to the present invention, above-mentioned base layer can be formed by poly terephthalic acid diethylester (polyethylene terephthalate is called for short PET) or cellulose triacetate (triacetyl cellulose is called for short TAC).
The another embodiment again according to the present invention, thermal isolation film also comprises another cholesteric liquid crystal layer, and it is to be disposed under base layer.Another embodiment again according to the present invention, thermal isolation film also comprises another absorbed layer, and it is to be disposed under above-mentioned another cholesteric liquid crystal layer.
The another embodiment again according to the present invention, thermal isolation film also comprises another absorbed layer.Another absorbed layer is disposed under base layer.
Another embodiment again according to the present invention, thermal isolation film also comprises base layer.Base layer is disposed between absorbed layer and cholesteric liquid crystal layer.The another embodiment again according to the present invention, base layer comprise synthetic fiber pet layer and cellulose triacetate (Triacetyl Cellulose, TAC) layer wherein at least one.Another embodiment again according to the present invention, thermal isolation film also comprise anti-scratch layer, and it is to be disposed on absorbed layer, and is available to prevent that thermal isolation film is by scratch.
The another embodiment again according to the present invention, thermal isolation film also comprises release layer and glue-line.Release layer is disposed at the bottom of thermal isolation film, and glue-line is disposed on release layer.Can to protect glue-line not to be subjected to not dirty for release layer when using; In use, removable release layer, and through glue-line, thermal isolation film is attached on object.
For reaching above-mentioned purpose, another technological scheme of content of the present invention is about a kind of thermal isolation film, and this thermal isolation film comprises base layer, at least one absorbed layer and at least one cholesteric liquid crystal layer.Base layer comprises first surface and second surface, and wherein first surface is relative with second surface configures.Absorbed layer is disposed on first surface, and in order to absorb ultraviolet and infrared light.Cholesteric liquid crystal layer is disposed on second surface, and wherein the pitch of cholesteric liquid crystal layer is through allocating so that the cholesteric liquid crystal layer reflects infrared light.
According to one embodiment of the invention, base layer can be made by poly terephthalic acid diethylester or cellulose triacetate.
According to another embodiment of the present invention, above-mentioned thermal isolation film also comprises anti-scratch layer.Anti-scratch layer is disposed on absorbed layer, in order to prevent that thermal isolation film is by scratch.
According to yet another embodiment of the invention, above-mentioned thermal isolation film also comprises release layer and glue-line.Release layer is disposed at the bottom of thermal isolation film, and glue-line is disposed on release layer.Can to protect glue-line not to be subjected to not dirty for release layer when using; In use, removable release layer, and through glue-line, thermal isolation film is attached on object.
Therefore, according to technology contents of the present invention, the embodiment of the present invention is by providing a kind of thermal isolation film, so as to reducing ultrared incident, and keeps the penetration rate of visible light.
Description of drawings
For above and other objects of the present invention, feature, advantage and embodiment can be become apparent, appended the description of the drawings is as follows:
Figure 1A illustrates a kind of schematic diagram of thermal isolation film according to one embodiment of the invention;
Figure 1B illustrates a kind of schematic diagram of thermal isolation film according to another embodiment of the present invention;
Fig. 1 C illustrates a kind of schematic diagram of thermal isolation film according to yet another embodiment of the invention;
Fig. 1 D illustrates a kind of schematic diagram of thermal isolation film according to further embodiment of this invention;
Fig. 1 E illustrates a kind of schematic diagram of thermal isolation film according to yet another embodiment of the invention;
Fig. 2 is the schematic diagram that illustrates according to a kind of thermal isolation film of another embodiment of the present invention;
Fig. 3 is the sunlight reflectance curve figure that illustrates according to a kind of thermal isolation film of another embodiment of the present invention;
Fig. 4 is the sunlight penetration rate plotted curve that illustrates according to a kind of thermal isolation film of yet another embodiment of the invention.
[primary clustering symbol description]
110: protective layer
120: anti-scratch layer
130: absorbed layer
132: another absorbed layer
140: cholesteric liquid crystal layer
142: another cholesteric liquid crystal layer
150: base layer
160: glue-line
170: release layer
210: protective layer
220: anti-scratch layer
240: cholesteric liquid crystal layer
242: another cholesteric liquid crystal layer
250: base layer
260: glue-line
270: release layer
Embodiment
In order to make narration of the present invention more detailed and complete, can be with reference to appended accompanying drawing and the various embodiments of the following stated, in accompanying drawing, identical number represents same or analogous assembly.But the embodiment who provides limits the scope that the present invention is contained, and the description of structure running is non-in order to limit the order of its execution, any structure that is reconfigured by assembly, the device with impartial effect that produces is all the scope that the present invention is contained.
Wherein accompanying drawing only for the purpose of description, is not mapped according to life size.On the other hand, well-known assembly and step are not described in embodiment, to avoid that the present invention is caused unnecessary restriction.
Figure 1A illustrates a kind of schematic diagram of thermal isolation film according to one embodiment of the invention.As shown in Figure 1A, thermal isolation film comprises protective layer 110, anti-scratch layer 120, absorbed layer 130, cholesterol liquid crystal (Cholesteric LiquidCrystal) layer 140, base layer 150, glue-line 160 and release layer 170.Absorbed layer 120 can absorb ultraviolet and infrared light, and the rotation pitch of cholesteric liquid crystal layer 140 makes the cholesteric liquid crystal layer 140 can reflects infrared light through change.Base layer 150 is disposed under cholesteric liquid crystal layer 140.
In addition, configured above absorbed layer 130 and can prevent that thermal isolation film is by the anti-scratch layer 120 of scratch.Configured again protective layer 110 on anti-scratch layer 120, avoiding the thermal isolation film damaged, and the service life of prolong insulation film.Glue-line 160 has adhesive quality, if directly be exposed in environment, may adhere to dust or other dirt, and affect its adhesive quality.Therefore, configured release layer 170 at the bottom (being glue-line 160 belows) of thermal isolation film, dirty to prevent glue-line 160.When needs, thermal isolation film being installed on the object (not shown), can remove release layer 170 exposing glue-line 160, and see through glue-line 160 and make thermal isolation film then in body surface.
Generally speaking, cholesterol liquid crystal is to be contained stacking formation of nematic crystal of optically active molecular by multilayer.Add chiral dope in this nematic crystal system after, liquid crystal system namely produces helix structure, and when the molecular axis direction of molecule on two planes was parallel, distance therebetween was called a pitch, and this pitch will determine the wavelength of the light of its reflection.Therefore, can by adjusting pitch, change the reflection characteristic of cholesteric liquid crystal layer.For instance, but the cholesteric liquid crystal layer reflected wave that pitch is approximately 612nm is about the infrared rays of 1000nm; And when pitch was larger, cholesteric liquid crystal layer institute reflection ray wavelength was also longer.Therefore, in an embodiment of the present invention, the pitch of cholesterol liquid crystal used is about 500-1000nm, is about 550-900nm in another embodiment, is about 600-800nm in another embodiment.Test shows, pitch is the cholesteric liquid crystal layer 140 of 612nm approximately, but the about infrared rays more than 60% (wavelength is 1000nm approximately) of usable reflection, and its to wavelength approximately the penetration rate of the visible light of 400-800nm higher than approximately 80%.Hence one can see that, has the more cholesteric liquid crystal layer of large screw pitch as long as adopt, and just can promote it to the reflection efficiency of infrared light.
In one embodiment, the visible light average penetration rate that comprises the thermal isolation film of cholesteric liquid crystal layer 140 is 50% to 80%.In another embodiment, the visible light average penetration rate of thermal isolation film is 55% to 75%.In another embodiment, the visible light average penetration rate of thermal isolation film is 60% to 70%.
In addition, in one embodiment, the infrared reflectivity that comprises the thermal isolation film of cholesteric liquid crystal layer 140 is 70% to 99%.Separately again in an embodiment, the infrared reflectivity of thermal isolation film is 75% to 95%.In another another embodiment, the infrared reflectivity of thermal isolation film is 80% to 90%.
On making, can utilize the mode of coating to form cholesteric liquid crystal layer 140.
In one embodiment, absorbed layer 120 comprises metal layer.In another embodiment, absorbed layer 120 comprises metal oxide layer.
Can utilize any suitable material to prepare described metal layer, embodiment includes but not limited to: silver (Ag), aluminium (Al), tungsten (W), magnesium (Mg), molybdenum (No), zinc (Zn), tin (Sn), indium (In), chromium (Cr), antimony (Sb), titanium (Ti), nickel (Ni), copper (Cu), vanadium (V), cobalt (Co), iron (Fe), niobium (Nb) layer.In addition, also can use the alloy of above-mentioned metal, or the mixture of above-mentioned metal.
Similarly, also can utilize various suitable metallic oxides to form described metal oxide layer, embodiment includes but not limited to: silver oxide (for example: AgO), aluminum oxide (for example: Al
2O
3), tungsten oxide (for example: WO
2Or WO
3), magnesium oxide (for example: MgO), molybdenum oxide (for example: MoO
3), zinc oxide (for example: ZnO), tin-oxide (for example: SnO
2), indium oxide (for example: In
2O
3), chromated oxide (for example: CrO
3Or Cr
2O
3), sb oxide (for example: Sb
2O
3Or Sb
2O
5), titanium oxide (for example: TiO
2), nickel oxide (for example: NiO), Cu oxide (for example: CuO or Cu
2O), barium oxide (for example: V
2O
3Or V
2O
5), cobalt/cobalt oxide (for example: CoO), ferriferous oxide (for example: Fe
2O
3Or Fe
3O
4), niobium oxide (for example: Nb
2O
5), indium tin oxide (Indium tin oxide, ITO), aluminium zinc oxide (Aluminum Doped Zinc Oxide, AZO) and tin-antimony oxide (Antimony Tin Oxide, ATO) wherein at least one.
When understanding, above illustrative various materials are not to limit the present invention, anyly have the knack of this skill person, without departing from the spirit and scope of the present invention, and when selecting other suitable material to form this metal layer or metal oxide layer.
When making, can utilize the mode of sputter, evaporation or coating to form above-mentioned metal layer or metallic oxide.
In different embodiments, base layer 150 can be fibrous substrates or membranaceous substrate.Can utilize various suitable materials to form described base layer 150, the embodiment of these materials includes but not limited to: poly terephthalic acid diethylester (PET) and cellulose triacetate (TAC) layer.
Figure 1B to Fig. 1 E is the configuration schematic diagram of the various thermal isolation film that illustrate according to other embodiment of the present invention.As shown in Figure 1B, it has also comprised another cholesteric liquid crystal layer 142 and another absorbed layer 132 compared to the thermal isolation film of Figure 1A.Another cholesteric liquid crystal layer 142 is disposed under base layer 150, and another absorbed layer 132 is disposed under another cholesteric liquid crystal layer 142.It should be noted that at this effect of another cholesteric liquid crystal layer 142 is same as cholesteric liquid crystal layer 140, and the effect of another absorbed layer 132 is same as absorbed layer 130, does not do at this and gives unnecessary details.
Please refer to Fig. 1 C, it has also comprised another cholesteric liquid crystal layer 142 compared to the thermal isolation film of Figure 1A, and another cholesteric liquid crystal layer 142 is disposed under base layer 150.As shown in Fig. 1 D, it has also comprised another absorbed layer 132 compared to the thermal isolation film of Figure 1A, and another absorbed layer 132 is disposed under base layer 150.As mentioned above, another cholesteric liquid crystal layer 142 and another absorbed layer 132 acts on this and does not do and give unnecessary details.Please refer to Fig. 1 E, in another embodiment, base layer 150 is configurable between absorbed layer 130 and cholesteric liquid crystal layer 140.
Yet in one embodiment, the configuration of position between absorbed layer, cholesteric liquid crystal layer and base layer can be adjusted according to actual demand, is the schematic diagram that illustrates according to a kind of thermal isolation film of another embodiment of the present invention as Fig. 2.Thermal isolation film comprises protective layer 210, anti-scratch layer the 220, first cholesteric liquid crystal layer 240, base layer 250, the second cholesteric liquid crystal layer 242, glue-line 260 and release layer 270.
On making, base layer 250 comprises first surface and second surface, and wherein first surface is relative with second surface configures.The first cholesteric liquid crystal layer 240 is disposed on first surface, and wherein the rotation pitch of the first cholesteric liquid crystal layer 240 changes so that the first cholesteric liquid crystal layer 240 reflects infrared light.The second cholesteric liquid crystal layer 242 is disposed on second surface, and wherein the pitch of the second cholesteric liquid crystal layer 242 changes so that the second cholesteric liquid crystal layer 242 reflects infrared light.
In addition, anti-scratch layer 220 is disposed on the first cholesteric liquid crystal layer 240, and in order to preventing thermal isolation film by scratch, and protective layer 210 is disposed on anti-scratch layer 220, and in order to protect thermal isolation film, avoids the thermal isolation film damaged.Moreover release layer 270 is disposed at the bottom of thermal isolation film, and glue-line 260 is disposed on release layer 270, and in order to bonding thermal isolation film and object (not shown), wherein release layer 270 is in order to protect glue-line 260.
See through the laboratory data in table one, understood the effect of having added the thermal isolation film after the cholesteric liquid crystal layer:
Be can clearly be seen that by following table one, add cholesteric liquid crystal layer in thermal isolation film as the embodiment of the present invention, can be approximately under 70% situation in the penetration rate that keeps visible light, come reflects infrared light by cholesteric liquid crystal layer, with the penetration rate that reduces infrared light to less than 10%, make the heat insulation rate of the thermal isolation film of the embodiment of the present invention reach more than 90%, and the summation of its visible light penetration rate and heat insulation rate is greater than 160.
Table one, have or not the thermal isolation film effect comparison sheet that adds cholesteric liquid crystal layer
Fig. 3 illustrates a kind of sunlight reflectance curve figure of thermal isolation film according to another embodiment of the present invention.Curve in Fig. 3 is to utilize thermal isolation film, sunlight is carried out the data of reflectivity experiment gained, by in figure as can be known, the thermal isolation film of the embodiment of the present invention can stop effectively that the sunlight medium wavelength is that approximately 800nm is to the about wave band of 2500nm, that is the embodiment of the present invention can the usable reflection infrared light.Accordingly, can reduce ultrared incident, make indoor temperature descend.
Fig. 4 illustrates a kind of sunlight penetration rate plotted curve of thermal isolation film according to yet another embodiment of the invention.Curve in Fig. 4 is to utilize thermal isolation film, sunlight is carried out the data of penetration rate experiment gained, by in figure as can be known, the thermal isolation film of the embodiment of the present invention can allow the sunlight medium wavelength be that approximately 400nm penetrates to the about wave band of 800nm effectively, that is the embodiment of the present invention can allow visible light penetrate effectively, and the penetration rate of visible light can reach approximately 60～80%.The result of complex chart 3, Fig. 4 can find, the thermal isolation film that herein proposes can reduce ultrared incident really effectively, and keeps simultaneously the penetration rate of suitable visible light.
Although the present invention discloses as above with mode of execution; so it is not to limit the present invention; anyly be familiar with this skill person; without departing from the spirit and scope of the present invention; when can be used for a variety of modifications and variations, so protection scope of the present invention is as the criterion when looking the scope that appending claims defines.
Claims (21)
1. a thermal isolation film, is characterized in that, comprises:
At least one absorbed layer is in order to absorb a ultraviolet and an infrared light; And
At least one cholesteric liquid crystal layer is disposed under this absorbed layer, and wherein the pitch of this cholesteric liquid crystal layer is through allocating so that this cholesteric liquid crystal layer reflects this infrared light.
2. thermal isolation film according to claim 1, is characterized in that, the visible light average penetration rate of this thermal isolation film is 50% to 80%.
3. thermal isolation film according to claim 1, is characterized in that, the infrared reflectivity of this thermal isolation film is 70% to 99%.
4. thermal isolation film according to claim 1, is characterized in that, this cholesteric liquid crystal layer is to utilize the mode of coating to form.
5. thermal isolation film according to claim 1, is characterized in that, this absorbed layer comprises a metal layer and/or a metal oxide layer.
6. thermal isolation film according to claim 5, is characterized in that, this metal layer comprise silver, aluminium, tungsten, magnesium, molybdenum, zinc, tin, indium, chromium, antimony, titanium, nickel, copper, vanadium, cobalt, iron, niobium and alloy thereof wherein at least one.
7. thermal isolation film according to claim 5, it is characterized in that, this metal oxide layer comprise silver oxide, aluminum oxide, tungsten oxide, magnesium oxide, molybdenum oxide, zinc oxide, tin-oxide, indium oxide, chromated oxide, sb oxide, titanium oxide, nickel oxide, Cu oxide, barium oxide, cobalt/cobalt oxide, ferriferous oxide, niobium oxide, indium tin oxide, Zinc-aluminium and tin-antimony oxide layer wherein at least one.
8. thermal isolation film according to claim 5, is characterized in that, this metal layer and/or this metal oxide layer are to utilize the mode of sputter, evaporation or coating to form.
9. thermal isolation film according to claim 1, is characterized in that, also comprises:
One base layer is disposed between this absorbed layer and this cholesteric liquid crystal layer.
10. thermal isolation film according to claim 9, is characterized in that, this base layer comprises a material, and this material is poly terephthalic acid diethylester, cellulose triacetate or its combination.
11. thermal isolation film according to claim 1 is characterized in that, also comprises:
One base layer is disposed under this cholesteric liquid crystal layer.
12. thermal isolation film according to claim 11 is characterized in that, this base layer comprises a material, and this material is poly terephthalic acid diethylester, cellulose triacetate or its combination.
13. thermal isolation film according to claim 11 is characterized in that, also comprises: another absorbed layer is disposed under this base layer.
14. thermal isolation film according to claim 11 is characterized in that, also comprises:
Another cholesteric liquid crystal layer is disposed under this base layer.
15. thermal isolation film according to claim 14 is characterized in that, comprises:
Another absorbed layer is disposed under this another cholesteric liquid crystal layer.
16. thermal isolation film according to claim 1 is characterized in that, also comprises:
One anti-scratch layer is disposed on this absorbed layer, in order to prevent that this thermal isolation film is by scratch.
17. thermal isolation film according to claim 1 is characterized in that, also comprises:
One release layer is disposed at the bottom of this thermal isolation film; And
One glue-line is disposed on this release layer, and in order to bonding this thermal isolation film and an object, wherein this release layer is in order to protect this glue-line.
18. a thermal isolation film is characterized in that, comprises:
One base layer comprises a first surface and a second surface, and wherein this first surface is relative with this second surface configures;
One first cholesteric liquid crystal layer is disposed on this first surface, wherein the pitch of this first cholesteric liquid crystal layer through allotment so that this first cholesteric liquid crystal layer reflection one infrared light; And
One second cholesteric liquid crystal layer is disposed on this second surface, and wherein the pitch of this second cholesteric liquid crystal layer is through allocating so that this second cholesteric liquid crystal layer reflects this infrared light.
19. thermal isolation film according to claim 18 is characterized in that, this base layer comprises a material, and this material is poly terephthalic acid diethylester, cellulose triacetate or its combination.
20. thermal isolation film according to claim 18 is characterized in that, also comprises:
One anti-scratch layer is disposed on this first cholesteric liquid crystal layer, in order to prevent that this thermal isolation film is by scratch.
21. thermal isolation film according to claim 18 is characterized in that, also comprises:
One release layer is disposed at the bottom of this thermal isolation film; And
One glue-line is disposed on this release layer, and in order to bonding this thermal isolation film and an object, wherein this release layer is in order to protect this glue-line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103790751A CN103123033A (en) | 2011-11-18 | 2011-11-18 | Heat-insulating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103790751A CN103123033A (en) | 2011-11-18 | 2011-11-18 | Heat-insulating film |
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|---|---|
| CN103123033A true CN103123033A (en) | 2013-05-29 |
Family
ID=48454112
Family Applications (1)
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|---|---|---|---|
| CN2011103790751A Pending CN103123033A (en) | 2011-11-18 | 2011-11-18 | Heat-insulating film |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105334647A (en) * | 2015-11-19 | 2016-02-17 | 业成光电（深圳）有限公司 | Electronic device |
| CN105365288A (en) * | 2015-11-13 | 2016-03-02 | 北汽福田汽车股份有限公司 | Temperature regulating film, temperature regulating glass and automotive |
| CN108594337A (en) * | 2018-06-07 | 2018-09-28 | 安徽屹珹新材料科技有限公司 | a kind of optical film |
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| CN105365288A (en) * | 2015-11-13 | 2016-03-02 | 北汽福田汽车股份有限公司 | Temperature regulating film, temperature regulating glass and automotive |
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| CN108594337A (en) * | 2018-06-07 | 2018-09-28 | 安徽屹珹新材料科技有限公司 | a kind of optical film |
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