CN103091975A - Dustproof film assembly - Google Patents
Dustproof film assembly Download PDFInfo
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- CN103091975A CN103091975A CN2012104361743A CN201210436174A CN103091975A CN 103091975 A CN103091975 A CN 103091975A CN 2012104361743 A CN2012104361743 A CN 2012104361743A CN 201210436174 A CN201210436174 A CN 201210436174A CN 103091975 A CN103091975 A CN 103091975A
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- dustproof film
- framework
- film component
- resin
- component framework
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Abstract
The present invention provides a dustproof film assembly which is made of composite material that is obtained through dipping carbon fiber in resin and has the following advantages: small weight in manufacturing, small bending caused by tension of the dustproof film and in treatment, high rigidity, low raw material cost and low production cost. A dustproof film assembly frame (1) is a four-side frame which is composed of long sides and short sides, wherein the inner-wall side and the outer-wall side of each of the four corner parts are arc-shaped. Preset positions on the wall surface of each side of the long sides and the short sides are respectively provided with a ventilation hole (2) for ventilation between inside part and outside part of the dustproof film assembly frame (1) and recess holes (3) for treatment. Additionally, a lower end face of a mask adhesion layer is provided with a mask adhesion layer step (4) for forming the mask adhesion layer.
Description
Technical field
The present invention relates at semiconductor device the dustproof film component framework of the dustproof film component that uses as dust protector that uses in the manufacturing of printed base plate or liquid crystal display device etc., its manufacture method and dustproof film component.
Background technology
At LSI, in the manufacturing of the semiconductor manufacturing of super LSI etc. and liquid crystal display device etc., carry out irradiation with raw sheet to semiconductor wafer or liquid crystal, with pattern-making, the photomask that use this moment and reticle mask (below, be called for short photomask) upward adhere to if any dust, such dust can absorb light or make bendingof light, thereby make the pattern deformation of transfer printing, the edge is uneven, and substrate is dirty black etc., makes size, quality, outward appearance etc. are impaired.
Thus, such operation is carried out in dust free room usually, but even so, also is difficult to make photomask always to keep always cleaning, and therefore, first at the dustproof dustproof film component of photomask surface attaching, and then exposes.Such occasion, foreign matter just not again the surface of photomask directly adhere to, but adhere on dustproof film component.Therefore, then during photoetching, as long as on the pattern in focus on photomask, the foreign matter on dustproof film component just with for transfer printing has had nothing to do.
Dustproof film component, general, with the cellulose nitrate that light can see through well, cellulose acetate, or the transparent dustproof film of the formation such as fluororesin is attached at by aluminium, stainless steel, the upper surface of the dustproof film component framework of the formation such as tygon and forming.Further, in order to attach photomask, polybutene resin is set usually on the lower surface of dustproof film spare framework, polyvinyl acetate base resin, acryl resin, the adhesive coating that silicone resin etc. form, and the release layer take the protection adhesive coating as the purpose of protection.
In order to make dustproof film without loosely being supported in the dustproof film component framework, be then necessary on the dustproof film component framework with the state with suitable tension force.In the dustproof film component with the rectangle of in the past material system, dustproof film is by the dustproof film component framework after attaching, and some are crooked to the inside because the tension force of dustproof film has, and dustproof film is easily loose.Such phenomenon, the large dustproof film component framework that uses in represent panel etc. such as printed base plate and liquid crystal, even the small-sized dustproof film component framework of perhaps using in the semiconductor manufacturing, due to the restriction on material and size must adopt in the dustproof film component of framework of low rigidity, particularly remarkable.
On the other hand, in photomask, for cost degradation, make the exposure field wide as far as possible.As far as possible little for the bending to the inside that makes the dustproof film component framework thus, and carry out miniaturization, this can produce the problem that reduce in available exposure field.Further, when expectation suppresses amount of bow, obtain the little dustproof film component framework of width as far as possible, make its inboard exposure area become wide, thus Cost reduction.
Device as the bending that solves this dustproof film component framework, for example, in patent documentation 1, a kind of dustproof film component framework is disclosed, it is the limit at least one pair of of framework, central portion is laterally protruding circular shape part, and its both sides are the circular shape part of outer concave, and further its outside is rectilinear form dustproof film component framework partly.According to such method, carry out appropriate design, amount of bow can be controlled at below certain value.
But, no matter what kind of frame is wide, as long as obtain equalization of strain, the rectilinear form of holding frame is possible, still, if think to make the wide occasion that narrows down of frame as far as possible, even obtain rectilinear form, but rigidity can step-down, be difficult to process thereby can become, or with very little external force, just can make dustproof film generation wrinkle, the problem such as lax is unsuitable for practicality, and the dustproof film of not at all easy attaching can not be brought into play sufficient effect.
The high optical design by exposure machine of frame decides.So that the wide method that narrows down and the rigidity of dustproof film component framework is uprised of frame is to use the high material of elasticity coefficient.As such method, for example, in patent documentation 2, put down in writing on the framework of aluminium alloy, will contain than the large stainless steel of the elasticity coefficient of framework and the dustproof film component framework of imbedding titanium.But the iron class alloy of iron and steel, stainless steel etc. is extremely heavy, and in addition, the non-constant of titanium alloy processability (by cutting property) is so be difficult in practice adopt.As their surrogate, now, be the carbon fibre composite of the high rigid material of conduct of utilization in aviation field etc., it has the large rigidity than various metal materials, and its weight and processability are also no problem.But, use carbon fiber, there is carbon fiber that the worry of dust etc. can occur.
Further, in the occasion of using carbon fibre composite, raw materials cost, processing cost and the general aluminium alloy that uses etc. compare, and its cost can significantly rise.Due to such problem, carbon fibre composite is not adopted to the dustproof film component framework up to now.
The look-ahead technique document
Patent documentation
Patent documentation 1: TOHKEMY 2006-56544 communique
Patent documentation 2: TOHKEMY 2006-284927 communique
Summary of the invention
The present invention will solve described problem exactly, the utilization compound substance that impregnating resin forms in carbon fiber, obtain a kind of light-weighted, make that tension force due to dustproof film causes crooked and high rigidity that bending that occur in processing diminishes, the dustproof film component framework that raw materials cost and production cost lower, with and manufacture method.On this dustproof film component framework, dustproof film is attached in addition, can obtain a kind of large exposure area that has, the dustproof film component that raw materials cost and production cost lower.
Purpose of the present invention can be reached by the following technical programs:
1. dustproof film component framework, it tightens the polygonal framework of covering for dustproof film, it is characterized in that: with the impregnated compound substance that resin arranged of carbon fiber in the length direction orientation on each limit that forms this framework, be wound around lamination along polygon, make described resin solidification and become one.
2. above-mentioned 1 described dustproof film component framework is characterized in that: described compound substance is that the winding lamination of continuous homogenous material forms, or carries out lamination by a plurality of a plurality of materials that were wound around at least for 1 week and form.
3. above-mentioned 1 or 2 described dustproof film component frameworks is characterized in that: described compound substance is the many described carbon fibers that will the be orientated sheet with described resin-dipping.
4. the described dustproof film component framework of any one in above-mentioned 1-3 is characterized in that: the surface of described framework is polished and/or cutting and smoothing.
5. the described dustproof film component framework of any one of above-mentioned 1-4, it is characterized in that: the surface of described framework covers with resin covering film.
6. the manufacture method of a dustproof film component framework, is characterized in that comprising
Basic material forms operation: on than the little core that is polygonal framework of the inside dimension of expectation, with having than the width of the desired Gao Gengda of described framework and the length that has at least a week that is wound around described framework, be orientated on described length direction by resin-dipping the compound substance of sheet of carbon fiber, be wound around, carry out also wanting the earth lamination than the desired outside dimension of described framework, described resin is heating and curing, with it as basic material;
Framework forms operation: described basic material is carried out cut, make its formation have desired inside dimension, the framework of outside dimension and height.
7. the manufacture method of above-mentioned 6 described dustproof film component frameworks is characterized in that having described basic material and forms operation:
Have on than the little core of the desired inside dimension of described framework, to have than the width of at least 2 times of the desired height of described framework and the length that has at least a week of described framework, the flaky composite material with the carbon fiber of resin-dipping that is orientated on described length direction is wound around, the large laminated body of outside dimension of the described framework of ratio that obtains is heated make resin solidification, then cut apart on the cut pair direction parallel with the limit of described framework, obtain a plurality of described basic materials.
8. the manufacture method of any one described dustproof film component framework of above-mentioned 5-7, is characterized in that: have the described framework that forms resin covering film on the surface of described framework and form operation.
9. a dustproof film component, is characterized in that: on the described dustproof film component framework of any one of above-mentioned 1-5, dustproof film is tightened attaching.
The invention effect
Dustproof film component framework of the present invention, the compound substance that obtains by make resin-dipping in carbon fiber forms, and when having light weight, has high rigidity thus.Such dustproof film component framework, because the carbon fiber of the compound substance with this structure is length direction orientation along each limit, so the intensity of the machinery of fiber can perform to greatest extent, for cause crooked of the tension force of dustproof film and the bending that occurs in processing, demonstrate high rigidity.In addition, on the advantage of the orientation of carbon fiber, due to the seam that there is no fiber or seam is seldom arranged, so can be at the step-down of the intensity that prevents from being produced by seam, and when obtaining high rigidity, can prevent the generation of rupturing, have the characteristic that is difficult to propagate, and high credibility.Thus, compare with the dustproof film component framework of the material that used in the past, the width on each limit can narrow down, thereby can obtain large inboard exposure area.
Further, dustproof film component framework of the present invention can be by grinding its surface and the processing of cutting etc. makes its smoothing, and dimensional accuracy uprises.Further, this surface is owing to being covered by resin, to the processing of dustproof film component framework, carbon fiber exposed on the face of tool, thus, prevent carbon fiber come off and when dust occurs, can prevent by ultraviolet ray cause aging.
Manufacture method according to dustproof film component framework of the present invention, can be from the basic material of a large circle, process the dustproof film component framework that obtains having desired size with machine cut, thus can be when the defective on surface be removed, make dimensional accuracy high, the dustproof film component framework that can be equal to common metal work.
Manufacture method according to dustproof film component framework of the present invention, once can make the basic material that can form a plurality of dustproof film component frameworks, this can form on the dustproof film component framework with minimum necessary amount, the processing capacity of basic material is significantly tailed off, this compares with processing singly, can significantly reduce raw materials cost and production cost.
Dustproof film component of the present invention can be guaranteed the large exposure area that obtained by the dustproof film component framework of high rigidity, can reduce thus the manufacturing cost of semiconductor and liquid crystal display device etc.In addition, the danger that the dust that does not in use have occurs has high credibility.
Description of drawings
Fig. 1 is the oblique view of applicable dustproof film component framework of the present invention;
Fig. 2 is the A-A line sectional view of applicable dustproof film component framework of the present invention, B-B line sectional view and its a part of amplification sectional view;
Fig. 3 is the floor map of applicable dustproof film component framework of the present invention, and (a) and (b) 2 figure are arranged;
Fig. 4 is the floor map of applicable another dustproof film component framework of the present invention, and (a) and (b) 2 figure are arranged;
Fig. 5 carries out cut, the schematic diagram of the dustproof film component framework that obtains expecting for expression to the basic material that is suitable for dustproof film component framework of the present invention;
Fig. 6 has (a) for the synoptic diagram of the manufacture method of applicable dustproof film component framework of the present invention, (b), and (c) and (d) 4 figure;
Fig. 7 has (a) for the synoptic diagram of another manufacture method of applicable dustproof film component framework of the present invention, (b), and (c) and (d) 4 figure;
Fig. 8 is the oblique view of applicable dustproof film component of the present invention.
Embodiment
Below, embodiments of the present invention are elaborated, but scope of the present invention is not subjected to their restriction.
To dustproof film component framework of the present invention, be elaborated with reference to Fig. 1.
Dustproof film component framework 1, the framework of the quadrilateral shape that serve as reasons long limit and minor face form, its 4 bight inwall sides and outer wall side are all circular-arc.In the place of the regulation of the wall on each limit of long limit and minor face, the shrinkage pool 3 that is respectively equipped with the air hole 2 of ventilating in the inboard that makes dustproof film component framework 1 and the outside and uses when processing.In addition, in the lower surface that is provided with the mask adhesive coating, has the mask adhesive coating ladder 4 that the mask adhesive coating is formed.But such mask adhesive coating is also nonessential with ladder 4 is ladder.Further, can also carry out rib section section according to necessity and maybe other ladder can be set, pit or ditch etc.
Such dustproof film component framework 1 for the carbon fiber sheet compound substance that flooded resin (below, claim prepreg) consist of, the core of such prepreg 5 edge quadrilateral shapes is wound around, and then lamination makes the resin solidification in prepreg 5 and form that one forms.The prepreg 5 of such sheet, A-A line sectional view Fig. 2 (a) that passes through air hole 2 of dustproof film component framework 1 as shown in Figure 1, and Fig. 2 (b) of the part enlarged cross section of the B-B line sectional view of Fig. 1 and the prepreg 5 in the circle in this sectional view expression is such, each limit is respectively the prepreg 5a of stratiform, 5b, 5c ... gapless laminated body.The all surfaces of the dustproof film component framework 1 that such prepreg 5 laminations form is covered by resin molding 9.
The serve as reasons carbon fiber 15 of long fibre shape of many of prepreg 5 consists of.This machine direction only is orientated in one direction, and it is the compound substance of the sheet of resin immersion.This carbon fiber 15 is parallel to each other respectively on the direction of the length on each limit of framework, forms with identical direction on the inwall on 4 limits and outer wall.The resin that immerses in such prepreg 5 can exemplify epoxy resin etc.Wherein, preferably at the resin covering film 9 on the surface of dustproof film component framework 1 when forming, can heat, the gas flow with the generation of making lowers, and the thing with high-fire resistance.In addition, prepreg 5, its continuous length is 1 week of dustproof film component framework 1 at least.The prepreg 5 of the length of preferred sheet is ended from beginning to be wound into to be wound around, and forms dustproof film component framework 1 while be wound around as a continuous homogenous material.
Dustproof film component framework 1 as Fig. 3 represents, preferably is wound around and the structure of lamination with the prepreg 5 of the continuous sheet of piece limit along dustproof film component framework 1 continuously.In Fig. 3, the floor map of the dustproof film component framework 1 that forms with the preferred winding method of prepreg 5 represents with Fig. 3 (a), and described winding method is represented by Fig. 3 (b).In Fig. 3 (a), beginning to be wound around point 6 and being wound around the point 7 of ending has ladder, but prepreg 5 is as thin as a wafer sheet in fact, and this ladder is without should be noted.
With the prepreg 5 of one piece of sheet from be wound around beginning 6 to be wound around finish 7 in the middle of without seam, the intensity step-down that causes due to the seam of prepreg 5 thus just can be prevented from, so high confidence level is arranged, simultaneously, due to for working continuously, can efficient improve cost.But the length of prepreg 5 is not unlimited, whether will make jointless dustproof film component framework 1, is decided by size and the laminated thickness of the dustproof film component framework 1 made, therefore has several places seam passable in the way yet.For example, the prepreg 5 that will have the length that can multi-turn be wound around is wound around lamination, is wound around terminal point at it, prepreg 5 with another length that can multi-turn be wound around begins to be wound around, thereby can seamlessly be wound around, with its lamination, form dustproof film component framework 1.Also can be wound around with the prepreg 5 with the length that is wound around 1 circle in addition, form dustproof film component framework 1 with a plurality of material laminates.
The occasion made from the prepreg 5 with the length that was wound around in 1 week, for example, as Fig. 4 represented, the prepreg of length with 1 week of dustproof film component framework 1 was 5a, 5b, 5c ..., the starting point of the winding in each week is 6a, 6b, 6c ..., in winding, stop is 7a, 7b, 7c, ... and the relaying junction surface is 8a, 8b, 8c, ..., distinguish ground very close to each other lamination, dustproof film component framework 1 is formed.In Fig. 4, the prepreg 5 that winds with one circuit engages floor map Fig. 4 (a) expression of the dustproof film component framework 1 of lamination formation, and this winding method represents with Fig. 4 (b).
The junction surface 8a of the seam of prepreg 5,8b, 8c ..., be preferably the bight that does not appear at dustproof film component framework 1.Further, the preferred junction surface 8a of each layer, 8b, 8c ... not overlapping.Thus, junction surface 8a, 8b, 8c ... impact almost can ignore, so just can prevent due to junction surface 8a, 8b, 8c ... the step-down of the intensity of generation.
The upper surface of the dustproof film component framework 1 that forms so prepreg 5 being wound around lamination and the prepreg end face of lower surface and cutting arrange the cutting surface in necessary hole etc., for the resin of epoxy resin etc. that exposes and immersed carbon fiber sheet of the carbon fiber that prevents from rupturing when the exposure due to ultraviolet ray cause aging, preferably cover with resin covering film 9.The surface of dustproof film component framework 1 is covered by resin covering film 9 fully, just can prevent the generation of the dust that causes due to carbon fiber.
Preferred its material of resin covering film 9 is difficult to aging thing in the ultraviolet ray of exposure use.The tone of resin covering film 9, because base material prepreg 5 is black, thus can adopt dead color beyond black (such as dark blue etc.) and transparent, but black can further lower light at random, and institute thinks particularly preferably.The color of resin covering film itself is sneaked into resin covering film with pigment, carbon black etc. and also can.As such resin covering film 9, be preferably acryl resin, more preferably silicone resin, more preferably fluororesin.Such resin is easy to form high to ultraviolet tolerance, and the high coverlay of peel strength.The occasion of fluororesin, good especially to ultraviolet tolerance, but because ultraviolet ray transmissivity is also high, so the low thing of the ultraviolet permeabilities such as pigment preferred and that sneak into is used in combination.In addition, the while is easy to charged because insulativity is high, so preferably use the high thing of electric conductivity.
Dustproof film component framework 1 is, polygonal framework, and there is no particular limitation for its shape, as concrete example, can exemplify the bight and be circular quadrilateral, the rectangle that 4 bights are all the right angle also can, the shape of similarly other, for example, rectangle, square, octagons etc. also can.
Dustproof film component framework 1 of the present invention uses as the liquid crystal manufacturing, on one side length for surpassing the large-scale dustproof film component use of 500mm, its effect is large.But, do not limit as the size of the object dustproof film component of dustproof film component framework 1.Dustproof film component framework 1 of the present invention is applicable to the tension force to size (length on limit) and dustproof film, and the rigidity of dustproof film component framework did not obtain whole dustproof film component of fully guaranteeing in the past.
As for all size practicalities, the dustproof film component framework 1 that dimensional accuracy is high, preferably with the basic material of prepreg 5 laminations and the dustproof film component framework 1 that has been heating and curing, obtain comparing with desired dustproof film component framework 1, inside dimension is little, outside dimension is large, further highly also high dustproof film component framework, the thing that then obtains having desired size with machine cut processing.At Fig. 5, thereby prepreg 5 laminations are made the schematic diagram that carries out the dustproof film component framework 1 that cut obtains than the basic material 10 of the large circle of desired dustproof film component framework 1.In basic material 10, desired dustproof film component framework 1 use is represented by the dotted line that 2 and line segment consist of.
The inside dimension of basic material 10 and outside dimension will consider that chipping allowance determines, still, and the preferably one-sided large 0.2-3mm degree of dustproof film component framework 1 to making, more preferably large 0.5-1mm.The thickness of prepreg 5, even before and after thick namely 0.2mm, thus set the chipping allowance of 1mm, be near the winding in 5 weeks, the more favourable of so fewer cost of chipping allowance is as clear as noonday.But, might occur distortion when being heating and curing, and the length of side being longer, mismachining tolerance also just more can occur, and the chipping allowance of described degree is necessary.
Carry out machining from basic material 10 and obtain desired dustproof film component framework 1, the error of lamination and the distortion when being heating and curing may be revised by cutting, thus the dimensional accuracy after processing can for the equal degree of general metal-made dustproof film component framework.In addition, the use amount of prepreg 5 is also only greatly little by little carried out lamination than the shape of dustproof film component framework 1 and is got final product, so waste is few, compares with the method that cuts out from 1 sheet material, and production cost is lowered.In addition, with make each limit with bar-shaped material, then the occasion that they is connected together to carry out the making of dustproof film component framework is compared, the use amount of prepreg 5 is not low, but the time that each bar-shaped material is linked together is necessary, and how the intensity of the coupling part that further bar-shaped material is connected together is also worried.Thus, consider from the two sides of production cost and intensity, method of the present invention has superiority.
In addition, in described machine cut processing, when cutting out from basic material 10, the direction of the carbon fiber 15 that contains in prepreg 5 is had any problem with the direction strict conformance with the limit of its formation, so can not be the strictly parallel occasion in limit of carbon fiber 15 and dustproof film component framework 1 of the prepreg 5 of lamination is arranged.In addition, at continuous carbon fiber 15 of the stage of basic material 10, the occasion of being cut off by machine cut processing may be arranged also nearby on the surface.But no matter which kind of occasion, impact actually is very little, and the effect that can satisfy original purpose and obtain envisioning is within these are also included within the scope of technological thought of the present invention.
To as embodiment of manufacture method of above-mentioned dustproof film component framework 1 as shown in Figure 6, below this is described in detail.
Will be as (a) expression of Fig. 6, preparation is compared with the inside dimension of the desired dustproof film component framework 1 of the framework of quadrilateral shape, long limit and minor face are little, and the height than desired dustproof film component framework 1 is high, and chipping allowance is also taken in and the core 12 that designs.Then, will carry out nothing with the elongated prepreg 5 that the length of regulation is cut off and loosely be wound around, and make the orientation of this carbon fiber 5 consistent with the length direction on the limit of the framework that will form.The length of such prepreg 5 will be the length in week of the framework that will form at least, and the width larger than the height of the framework that will form will be arranged.At this moment, the carbon fiber 15 of preferred prepreg 5 is parallel with the limit that forms.In Fig. 6 (a), arrow P represents the direction of orientation of carbon fiber 15.In addition, on core 12, form gallantly in order to make prepreg 5 be wound around starting point 6, preferably arranging is highly the ladder 13 of the thickness of prepreg 5, still, and because bending radius is less, in the time of lamination, the fractureing of carbon fiber (fracture) also just more can occur, thus radius at least more than 3mm for well.Further, the bight of preferred core 12 has the radius close with the shape in the bight of the dustproof film component framework 1 that forms.
Such basic material 10 and core 12 are accommodated in the bag of tygon system (not shown), vacuum decompression heats while pressurize in thermal compressor, with the resin solidification of immersion in prepreg 5 after the air of inside is extracted out.After cooling, take out from thermal compressor, core 12 is taken off, obtain the basic material 10 of the large circle of the desired dustproof film component framework 1 of such ratio of (c) expression of Fig. 6.With such basic material 10, carry out machine cut processing with the machining device, grind and the cutting smoothing, make each face become the size of regulation, further be processed to form air hole 2 and shrinkage pool 3 (hold under the arm tool hole), obtain such, practical high dustproof film component framework 1 of dimensional accuracy of (d) expression of Fig. 6.
Dustproof film component framework 1 of the present invention in the man-hour that adds of air hole 2 and shrinkage pool 3, is that the stromatolith to prepreg 5 carries out vertical hole processing, and this can prevent that the hole from adding the peeling off and rupture of prepreg 5 in man-hour.
Further after cut, the dustproof film component framework 1 that obtains is cleaned, further according to necessity, its surface is covered with resin covering film 9, make because the carbon fiber that carries out the fracture that cut causes does not expose on the surface.The surface of dustproof film component framework 1 covers with resin covering film 9, can prevent the carbon fiber that ruptures expose and with cleaning the surface that can not obtain cleaning fully, thereby do not have in the occasion that dustproof film component is used the danger that produces dust due to coming off of carbon fiber and resin, institute thinks further preferred.Aging and the consequent intensity step-down that the resin that moreover, can also prevent the epoxy resin etc. in prepreg 5 occurs due to the ultraviolet ray of exposure.
Be used for covering the formation of resin covering film 9 on the surface of dustproof film component framework 1, there is no particular limitation, the dustproof film component framework 1 of making is fully clean, drying is dissolved with suitable concentration the formation resin of resin covering film 9 in solvent, will make the pigment that adds as required, carbon blacks etc. disperse in solvent, use spraying, dipping, electricity the known coating gimmick of coating etc. be coated with and get final product.These can carry out optimal selection according to the kind of the resin that uses and get final product, after coverlay forms, the dustproof film component framework is all carried out heat treated, when solvent being volatilized fully remove, the low molecular composition that contains in coverlay can be reduced, and this is preferred.Heating-up temperature, the high temperature of preferably trying one's best, but will consider the heat resisting temperature of prepreg 5, the heat resisting temperature of coverlay resin 9, the boiling points of the solvent of using during the coating of coverlay resin 9 etc. determine.
In addition, as another manufacture method, can exemplify as Fig. 7 represents the method for processing with the basic material 10 of tubulose.As (a) expression of Fig. 7, preparation quadrilateral shape, framework has long limit and the minor face less than the inside dimension of desired dustproof film component framework 1, and than the high at least core 12 more than 2 times of height of desired dustproof film component framework 1.The prepreg 5 of the length of cutting off with the length predesignated carries out nothing and loosely is wound around, and makes the carbon fiber direction consistent with the length direction on the limit of the framework that will form.The length of such prepreg 5 is the length in week of framework that formation will be arranged at least, and than the height height of the framework that will form more than at least 2 times, further preferred high more than 5 times.At this moment, the carbon fiber of preferred prepreg 5 is parallel with the limit that will form.In Fig. 6 (a), arrow P is the direction of orientation of carbon fiber.In addition, in such occasion, on core 12, it is the ladder 13 of the thickness of prepreg 5 that thickness preferably is set, and further, preferably has the mechanism (not shown) that applies tension force laterally.
The stravismus skeleton diagram of the dustproof film component that consists of with the dustproof film component framework 1 of such making as shown in Figure 8.The surface of prepreg 5 has on the face that is sticked 21 on an end face of the dustproof film component framework 1 that resin covering film 9 forms between the dustproof film following layer, and dustproof film 22 is tightened setting thereon, forms dustproof film component 20.As the material of dustproof film 22, for cellulose with and derivant, fluororesin etc.Be provided with mask adhesive coating 23 on another end face.As the mask sticker that forms mask adhesive coating 23, can the exemplified by acrylic sticker, rubber-like sticker, hot melt sticker, siloxane sticker etc.On the surface of such mask adhesive coating 23, for mask adhesive coating 23 is protected, the stripping film 24 of parting agent layer can be set on the thin resin film of PET etc. according to necessity.In addition, according to necessity, the air hole 2 of perforation is set in the side of dustproof film component framework 1, thus, can remove expansion and the depression of the dustproof film 22 that causes due to the draught head inside and outside dustproof film component, simultaneously, in order to prevent from preferably being accompanied by the intrusion from the dust of dustproof film component outside of ventilation, filtrator 25 is set preferably.In order to be easy to process, also (not shown) such as shrinkage pool 3 and ditches can be set in the place of necessity.
With above structure, at cause crooked of the tension force that can obtain dustproof film 22 and process cause crooked little, have the area that exposes completely and cheaply when dustproof film component 20, the danger of dust does not in use occur in dustproof film component 20, has high credibility.
Embodiment
Below, embodiment is elaborated to embodiments of the invention, but scope of the present invention is not subjected to the restriction of these embodiment.
(embodiment)
Make the dustproof film component framework 1 of the compound substance system with shape that Fig. 1 represents of machining.Being shaped as of such dustproof film component framework 1, the outside dimension in each bight are 904.5 * 750mm, and inside dimension is the rectangle of 896.5 * 742mm, and thickness is 5.8mm, each bight be shaped as inboard R2, outside R6.In addition, make with the interval of 860mm on long limit and process shrinkage pool (diameter 2.5mm, dark 2mm) 3, between minor face is with 730mm every making same processing shrinkage pool 3.In addition, near two long limit central portions, the air hole 2 that diameter is 1.5mm (each limit has respectively 4) is set.
The manufacturing process of the concrete formation of such dustproof film component framework 1 is as follows.Compound substance is the prepreg 5(trade name of the sheet of the epoxy resin that immerses in the carbon fiber of a direction orientation as used herein; E8025C-25N Japan graphite fiber company system).Such prepreg 5 cuts off with the length of 200mm, it is such that (a)-(c) of Fig. 7 represents, be wound around lamination with machine direction and each limit parallel direction on core 12, be heating and curing, obtain approximately 906.5 * 752mm of outside dimension, inside dimension 894.5 * 740mm, the basic material 10 of the tubulose of high approximately 200mm.From such basic material 10, produce the basic material 10a of high 6.5mm with water spray processing, 10b, 10c ....Then, from such basic material 10a, 10b, 10c ..., be processed into the dustproof film component framework 1 with described size with working apparatus.
Then, such dustproof film component framework 1 use interfacial agent and pure water are carried out good washing, after 80 ℃ * 3 hours heat dryings, the surface is coated with resin, forms resin covering film 9.Coating is with fluororesin (trade name; CYTOP CTX109A Asahi Glass company system) with fluorine class solvent (trade name; NOVEC7300, Sumitomo 3M company system) dissolving, and make carbon black (trade name; HCF2650, Mitsubishi Chemical Ind's system) solution that disperses carries out 4 times coatings with spray-on process.Thereafter, in baking box, 130 ℃ of heating, remove solvent fully.The thickness of the resin covering film 9 of fluororesin is about 30 μ m.
At last, carry out the inspection of size, outside dimension and inside dimension are the scope of processing specified size+0/-0.3mm.In addition, there is the dislocation of 0.5mm at the right angle for to grow the limit as benchmark to the dummy line with 90 degree pictures.
Such dustproof film component framework 1 is moved into dust free room, wash with interfacial agent and pure water, after drying, in the dark indoor 400,000 Halogen lamp LED irradiations of strangling, carry out visual examination.Its result does not have the place of exposing of compound substance.In addition, there is no the defective of the flash of light on surface and coating spot etc. and owing to cleaning peeling off of the resin covering film 9 that causes etc. yet.
Then, the such dustproof film component 20 that represents with such dustproof film component framework 1 construction drawing 8.The face that is sticked 21 use air pressurized formula dividers at an end face of dustproof film component framework 1 will be as the siloxane sticker of dustproof film following layer, and will be as siloxane sticker (the trade name KR3700 of mask adhesive coating 23 on another end face, chemical industrial company of SHIN-ETSU HANTOTAI system) be coated with, be heating and curing.Then; with mould release by attached on the surface and thickness 125 μ m the PET film with dustproof film component framework 1 almost the mask adhesive coating protection of cutting off processing and fabricating of same shape installed with stripping film 24; further attach the 3.6 * 9.5mm that covers air hole 2, the PTFE filter made device 25 of thickness 0.35mm.
Outside described dustproof film component framework 1, with fluorine-based polymer (trade name CYTOP, Asahi Glass company system) with slot coated method film forming on the rectangle quartz base plate of 1200 * 850 * thickness 10mm, after the solvent drying, following with the aluminium alloy of the same shape of contour substrate temporary frame processed, peel off, obtain the approximately dustproof film 22 of 3 μ m of thickness.With such dustproof film 22 on the face that is sticked 21 of an end face of as described the dustproof film component framework 1 that makes like that between the dustproof film following layer then after, the dustproof film of not wanting 22 use cuttves around dustproof film component framework 1 are cut off remove, make dustproof film component 20.
Then, such dustproof film component 20 is placed on the measurement dish, and the amount of bow on each limit of dustproof film component framework 1 is carried out instrumentation.Its result, the amount of bow to the inside of the central portion on long limit is one-sided 1.0mm, the amount of bow to the inside of minor face central portion is one-sided 0.6mm.
(comparative example)
Unidimensional with described embodiment 1 with the machining making, with the dustproof film component framework of shape.At this moment, as basic material, use the carbon fibre fabric of plain weave to flood prepreg (trade name: DIALEAD HMFJ3113/948A1, resin company of the Mitsubishi system) lamination that becomes sheet with epoxy resin, be heating and curing, obtain the approximately sheet material of 6mm of 910 * 760 * thickness.From such plate material, carry out machining with processing equipment, obtain the dustproof film component framework of described size, use the operation identical with embodiment 1 to carry out the surface resin coating.
Then, with the operation fully same with embodiment 1, the dustproof film component of construction drawing 8 expressions is placed on the dustproof film component of completing on the mensuration dish with such dustproof film component framework, and the amount of bow on dustproof film component framework each limit is carried out instrumentation.As a result, for the amount of bow to the inside of growing the limit central portion is one-sided 2.3mm, the amount of bow to the inside of minor face central portion is one-sided 1.9mm.In addition, cost is approximately 9 times of described embodiment.
(comparative example 2)
Use aluminium alloy A5052, the machining making is measure-alike with described embodiment's, the dustproof film component framework that shape is identical, and the surface imposes the black alumina film and processes.Then, use such dustproof film component framework to carry out the making of dustproof film component, only dustproof film component is vertically erected, long limit will occur, the bending before and after 20mm all appears in minor face, and rectangular shape all is difficult to guarantee.Therefore, this thing can not use fully as the dustproof film component framework.
Utilize possibility on industry
Dustproof film component framework of the present invention, rigidity is increased substantially, thereby can guarantee large-area exposure field.Thus, suitable to semiconductor, the IC packaging body, printed base plate uses as dustproof film component in the manufacturing process of liquid crystal and organic EL indication device etc.
The explanation of symbol
1 is the dustproof film component framework, and 2 is air hole, and 3 is shrinkage pool, and 4 are mask adhesive coating ladder, 5 is prepreg, and 6 for being wound around starting point, and 7 for being wound around terminal point, and 8 is the junction surface, 9 is resin covering film, 10,10a, 10b, 10c is basic material, and 12 is core, and 13 is ladder, and 15 is carbon fiber, 16 is abrasive machine, and 20 is dustproof film component, and 21 are the face of being sticked, and 22 is dustproof film, 23 is the mask adhesive coating, and 24 is stripping film, and 25 is filtrator.
Claims (9)
1. dustproof film component framework, it tightens the polygonal framework of covering for dustproof film, it is characterized in that: with the impregnated compound substance that resin arranged of carbon fiber in the length direction orientation on each limit that forms this framework, be wound around lamination along polygon, make described resin solidification and become one.
2. dustproof film component framework claimed in claim 1 is characterized in that: described compound substance is that the winding lamination of continuous homogenous material forms, or carries out lamination by a plurality of a plurality of materials that were wound around at least for 1 week and form.
3. the described dustproof film component framework of claim 1 or 2 is characterized in that: described compound substance is the many described carbon fibers that will the be orientated sheet with described resin-dipping.
4. the described dustproof film component framework of any one in claim 1-3 is characterized in that: the surface of described framework is polished and/or cutting and smoothing.
5. the described dustproof film component framework of any one of claim 1-4, it is characterized in that: the surface of described framework covers with resin covering film.
6. the manufacture method of a dustproof film component framework, is characterized in that: comprise
Basic material forms operation: on than the little core that is polygonal framework of the inside dimension of expectation, with having than the width of the desired Gao Gengda of described framework and the length that has at least a week that is wound around described framework, be orientated on described length direction by resin-dipping the compound substance of sheet of carbon fiber, be wound around, carry out also wanting the earth lamination than the desired outside dimension of described framework, described resin is heating and curing, with it as basic material;
Framework forms operation: described basic material is carried out cut, make its formation have desired inside dimension, the framework of outside dimension and height.
7. the manufacture method of dustproof film component framework claimed in claim 6 is characterized in that: have described basic material and form operation:
Have on than the little core of the desired inside dimension of described framework, to have than the width of at least 2 times of the desired height of described framework and the length that has at least a week of described framework, the flaky composite material with the carbon fiber of resin-dipping that is orientated on described length direction is wound around, the large laminated body of outside dimension of the described framework of ratio that obtains is heated make resin solidification, then cut apart on the cut pair direction parallel with the limit of described framework, obtain a plurality of described basic materials.
8. the manufacture method of any one described dustproof film component framework of claim 5-7, is characterized in that: have the described framework that forms resin covering film on the surface of described framework and form operation.
9. a dustproof film component, is characterized in that: on the described dustproof film component framework of any one of claim 1-5, dustproof film is tightened attaching.
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Cited By (6)
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CN103279008A (en) * | 2013-05-23 | 2013-09-04 | 上海华力微电子有限公司 | Method for designing mask plate cover film |
CN103389618A (en) * | 2012-05-11 | 2013-11-13 | 信越化学工业株式会社 | Anti-dust pellicle assembly frame |
TWI585516B (en) * | 2014-12-01 | 2017-06-01 | 信越化學工業股份有限公司 | A pellicle frame, and a pellicle assembly using the pellicle frame |
CN107209452A (en) * | 2015-01-16 | 2017-09-26 | 日本轻金属株式会社 | Epidermis supporting frame |
CN107615739A (en) * | 2015-12-30 | 2018-01-19 | 深圳市大富科技股份有限公司 | Mobile phone, mobile phone framework and its manufacture method |
CN110325908A (en) * | 2017-02-17 | 2019-10-11 | 三井化学株式会社 | Protect the manufacturing method of membrane module, exposure master, exposure device and semiconductor device |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101089729A (en) * | 2006-06-14 | 2007-12-19 | 信越化学工业株式会社 | Pellicle |
CN101352928A (en) * | 2008-09-05 | 2009-01-28 | 沈阳航空工业学院 | On-line impregnation and winding, molding method of PPESK-based composite material |
JP2009139879A (en) * | 2007-12-11 | 2009-06-25 | Toppan Printing Co Ltd | Pellicle |
CN101689018A (en) * | 2007-07-06 | 2010-03-31 | 旭化成电子材料株式会社 | Frame of large pellicle and grasping method of frame |
US20110189594A1 (en) * | 2010-01-29 | 2011-08-04 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography and method for manufacturing the same |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6380257A (en) * | 1986-09-24 | 1988-04-11 | Hitachi Micro Comput Eng Ltd | Photomask |
JP3027073B2 (en) * | 1993-07-28 | 2000-03-27 | 信越化学工業株式会社 | Pellicle |
JPH10209340A (en) * | 1997-01-16 | 1998-08-07 | Toray Ind Inc | Ic sealing frame and its manufacture |
JP2001291757A (en) * | 2000-02-03 | 2001-10-19 | Nippon Mitsubishi Oil Corp | Cfrp transfer member with coated machining surface and processing method therefor |
JP4458315B2 (en) * | 2000-06-02 | 2010-04-28 | 旭化成イーマテリアルズ株式会社 | Pellicle |
JP4286194B2 (en) | 2004-08-18 | 2009-06-24 | 信越化学工業株式会社 | Pellicle frame and pellicle for photolithography using the frame |
JP4459824B2 (en) * | 2005-01-26 | 2010-04-28 | 中西金属工業株式会社 | Roller bearing cage |
JP4577069B2 (en) | 2005-03-31 | 2010-11-10 | 日本軽金属株式会社 | Pellicle support frame, pellicle frame, and method for manufacturing pellicle frame |
EP1897921B1 (en) * | 2005-06-24 | 2014-07-16 | Nippon Kasei Chemical Company Limited | Coating composition, process for production thereof, resin moldings and process for production of the moldings |
JP2008183626A (en) * | 2005-11-25 | 2008-08-14 | Hamamatsu Kagaku Gijutsu Kenkyu Shinkokai | Ultrasonic vibration machining method and fiber reinforced resin produced by the method |
JP5515238B2 (en) * | 2008-06-05 | 2014-06-11 | 凸版印刷株式会社 | Method and apparatus for preventing fogging of photomask |
JP5141485B2 (en) * | 2008-10-03 | 2013-02-13 | 日本精工株式会社 | Manufacturing method of cage for rolling bearing for high speed rotation |
JP5133229B2 (en) * | 2008-12-05 | 2013-01-30 | 信越ポリマー株式会社 | Pellicle storage container |
JP2011059446A (en) * | 2009-09-10 | 2011-03-24 | Asahi Kasei E-Materials Corp | Pellicle frame, pellicle, and usage of pellicle frame |
JP4974389B2 (en) * | 2009-10-30 | 2012-07-11 | 信越化学工業株式会社 | Pellicle frame for lithography and pellicle for lithography |
JP2012093595A (en) * | 2010-10-28 | 2012-05-17 | Shin Etsu Chem Co Ltd | Pellicle frame and pellicle |
JP5663376B2 (en) * | 2011-04-04 | 2015-02-04 | 信越化学工業株式会社 | Pellicle frame, manufacturing method thereof, and pellicle |
-
2011
- 2011-11-04 JP JP2011242344A patent/JP5940283B2/en active Active
-
2012
- 2012-10-04 KR KR1020120110013A patent/KR102028374B1/en active IP Right Grant
- 2012-11-01 TW TW101140616A patent/TWI452422B/en active
- 2012-11-05 CN CN2012104361743A patent/CN103091975A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101089729A (en) * | 2006-06-14 | 2007-12-19 | 信越化学工业株式会社 | Pellicle |
CN101689018A (en) * | 2007-07-06 | 2010-03-31 | 旭化成电子材料株式会社 | Frame of large pellicle and grasping method of frame |
JP2009139879A (en) * | 2007-12-11 | 2009-06-25 | Toppan Printing Co Ltd | Pellicle |
CN101352928A (en) * | 2008-09-05 | 2009-01-28 | 沈阳航空工业学院 | On-line impregnation and winding, molding method of PPESK-based composite material |
US20110189594A1 (en) * | 2010-01-29 | 2011-08-04 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography and method for manufacturing the same |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103389618A (en) * | 2012-05-11 | 2013-11-13 | 信越化学工业株式会社 | Anti-dust pellicle assembly frame |
CN103279008A (en) * | 2013-05-23 | 2013-09-04 | 上海华力微电子有限公司 | Method for designing mask plate cover film |
TWI585516B (en) * | 2014-12-01 | 2017-06-01 | 信越化學工業股份有限公司 | A pellicle frame, and a pellicle assembly using the pellicle frame |
CN107209452A (en) * | 2015-01-16 | 2017-09-26 | 日本轻金属株式会社 | Epidermis supporting frame |
CN107615739A (en) * | 2015-12-30 | 2018-01-19 | 深圳市大富科技股份有限公司 | Mobile phone, mobile phone framework and its manufacture method |
CN110325908A (en) * | 2017-02-17 | 2019-10-11 | 三井化学株式会社 | Protect the manufacturing method of membrane module, exposure master, exposure device and semiconductor device |
Also Published As
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KR102028374B1 (en) | 2019-10-04 |
TWI452422B (en) | 2014-09-11 |
KR20130049719A (en) | 2013-05-14 |
JP2013097308A (en) | 2013-05-20 |
TW201339740A (en) | 2013-10-01 |
JP5940283B2 (en) | 2016-06-29 |
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