CN103091897A - Liquid crystal display device - Google Patents

Liquid crystal display device Download PDF

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Publication number
CN103091897A
CN103091897A CN2013100416671A CN201310041667A CN103091897A CN 103091897 A CN103091897 A CN 103091897A CN 2013100416671 A CN2013100416671 A CN 2013100416671A CN 201310041667 A CN201310041667 A CN 201310041667A CN 103091897 A CN103091897 A CN 103091897A
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spacer
opaque
array base
base palte
liquid crystal
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CN2013100416671A
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CN103091897B (en
Inventor
任思雨
洪胜宝
陈建荣
阮文中
林建伟
柳发霖
胡君文
于春崎
何基强
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Truly Semiconductors Ltd
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Truly Semiconductors Ltd
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Abstract

The invention discloses a liquid crystal display device. The liquid crystal display device comprises array substrates, color film substrates and opaque photo spacers, wherein the color film substrates are arranged relative to the array substrates, the opaque photo spacers are arranged between the array substrates and the color film substrates, and the photo spacers are arranged on the upper sides of thin film transistors of the array substrates. Due to the fact that the photo spacers are opaque and are arranged on the surfaces of the thin film transistors of the array substrates, the photo spacers are capable of blocking light reflected by the color film substrates. From structures of the thin film transistors, gate lines exist on the lower sides of silicon islands of the thin film transistors, and the same with the prior art, direct light of the backlight is blocked by the gate lines. By means of the thin film transistors, the photoproduction current leakage of the liquid crystal display device can be prevented effectively, and further the working stability of liquid crystal display device is prevented from being affected by the photoproduction current leakage.

Description

A kind of liquid crystal indicator
Technical field
The invention belongs to field of liquid crystal display, relate in particular to a kind of liquid crystal indicator.
Background technology
Informationized society more and more needs frivolous portable display device, and the most ripe current product has been exactly liquid crystal indicator (Liquid Crystal Display).Liquid crystal indicator generally includes for the display panels of display frame with for the circuit part that signal is provided to display panels.This display panels generally includes color membrane substrates and array base palte, and they are bonded to each other and are separated by spacer by frame glue, and liquid crystal material is injected in gap between color membrane substrates and array base palte.
Described first substrate is for example thin film transistor (TFT) (Thin Film Transistor, TFT) array base palte, is formed with many gate lines and many data lines above it and corresponding is provided with a plurality of thin film transistor (TFT)s.Wherein, amorphous silicon material is generally adopted in the silicon island of described thin film transistor (TFT), and amorphous silicon material is a kind of photoactive substance, when being subject to illumination, the easy generation current of amorphous silicon material is reacted on liquid crystal indicator and just the photoproduction leakage current can occurs, affects the work of liquid crystal indicator.
For the photoproduction leakage current of liquid crystal indicator, existing solution is generally to adopt gate line as light-shielding structure, with the light of the direct directive thin film transistor (TFT) of the backlight that blocks liquid crystal indicator.But, still can't effectively avoid the generation of the photoproduction leakage current of liquid crystal indicator, the stability of liquid crystal indicator work still is subject to the impact of photoproduction leakage current.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of liquid crystal indicator, to avoid the generation of liquid crystal indicator photoproduction leakage current fully, avoid the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
A kind of liquid crystal indicator comprises:
The array base palte that is oppositely arranged and color membrane substrates, and the opaque spacer between described array base palte and color membrane substrates, and described spacer is positioned at the top of the thin film transistor (TFT) of described array base palte.
Preferably, described spacer is the black spacer.
Preferably, the making material of described spacer comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
Preferably, described spacer is the spacer of column.
A kind of method for making of liquid crystal indicator comprises:
Array base palte is provided;
Form spacer above the thin film transistor (TFT) of described array base palte, described spacer is opaque spacer;
Color membrane substrates is provided, and fit described array base palte and color membrane substrates.
Preferably, the process of described formation spacer comprises:
Apply opaque photochromics on described array base palte surface, form opaque layer;
Take mask plate with spacer figure as mask, described opaque layer is exposed, form the spacer pattern on described opaque layer;
Adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer, and described spacer is positioned at the thin film transistor (TFT) top of described array base palte;
Oven dry.
Preferably, described opaque photochromics comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
A kind of method for making of liquid crystal indicator comprises:
Color membrane substrates is provided;
Form spacer on described color membrane substrates surface, described spacer is opaque spacer;
Array base palte is provided, and fit described array base palte and color membrane substrates, and described spacer is corresponding with the thin film transistor (TFT) of described array base palte.
Preferably, the process of described formation spacer comprises:
Apply opaque photochromics on described color membrane substrates surface, form opaque layer;
Take mask plate with spacer figure as mask, described opaque layer is exposed, form the spacer pattern on described opaque layer;
Adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer, and the distribution of described spacer is corresponding with the distribution of the thin film transistor (TFT) of described array base palte;
Oven dry.
Preferably, described opaque photochromics comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
Compared with prior art, liquid crystal indicator provided by the present invention, comprise: the array base palte that is oppositely arranged and color membrane substrates, and the opaque spacer between described array base palte and color membrane substrates, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte.Wherein, because spacer is opaque, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte, and described spacer can block the light by the color membrane substrates reflection.And, by the structure of thin film transistor (TFT) as can be known, there is gate line below the silicon island of described thin film transistor (TFT), identical with prior art, the light of backlight direct projection is blocked by gate line.So compared with prior art, the liquid crystal indicator that the application provides has further reduced the light that is mapped to the silicon island, the photoproduction leakage current of described thin film transistor (TFT) silicon island also can weaken accordingly, be that liquid crystal indicator provided by the present invention can effectively be avoided the generation of liquid crystal indicator photoproduction leakage current, and then avoid the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
Description of drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, the below will do to introduce simply to the required accompanying drawing that will use in embodiment or description of the Prior Art, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of a kind of liquid crystal indicator of providing of the embodiment of the present application;
A kind of schematic flow sheet of making spacer that Fig. 2 ~ 5th, the embodiment of the present application provide.
Embodiment
For purpose, technical scheme and the advantage of the embodiment of the present invention is clearer, below in conjunction with the accompanying drawing in the embodiment of the present invention, technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
Just as stated in the Background Art, existing liquid crystal indicator still can't effectively be avoided the generation of photoproduction leakage current, and the stability of liquid crystal indicator work still is subject to the impact of photoproduction leakage current.
The inventor studies discovery, although existing liquid crystal indicator has blocked the light of backlight direct projection to the thin film transistor (TFT) silicon island by gate line, but the light that backlight sends can be through the reflection of color membrane substrates, and then shine the silicon island of thin film transistor (TFT), significant photoproduction leakage current appears, so the stability of existing liquid crystal indicator work still is subject to the impact of photoproduction leakage current.
Therefore, the inventor proposes a kind of liquid crystal indicator, this liquid crystal indicator comprises: the array base palte that is oppositely arranged and color membrane substrates, and the opaque spacer between described array base palte and color membrane substrates, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte.
Compared with prior art, in liquid crystal indicator provided by the present invention, because spacer is opaque, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte, and described spacer can block the light by the color membrane substrates reflection.And, by the structure of thin film transistor (TFT) as can be known, there is gate line below the silicon island of described thin film transistor (TFT), identical with prior art, the light of backlight direct projection is blocked by gate line.As seen, compared with prior art, the disclosed thin film transistor (TFT) of the application can not be subject to the irradiation of color membrane substrates reflection and liquid crystal molecule scattered beam, effectively avoid the generation of liquid crystal indicator photoproduction leakage current, and then avoided the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
It is more than the application's core concept, below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
Embodiment one:
The present embodiment discloses a kind of liquid crystal indicator, as shown in Figure 1, comprising:
The array base palte that is oppositely arranged and color membrane substrates, and the opaque spacer 10 between described array base palte and color membrane substrates.
Wherein, described array base palte comprises:
The first transparency carrier 11, described the first transparency carrier 11 is preferably glass substrate.
Gate line 12, described gate line 12 is positioned on the surface of described transparency carrier 11.Wherein, described gate line 12 specifically is divided into controlling grid scan line and grid.
The first protective seam 13, described the first protective seam 13 cover on described gate line 12 and the first transparency carrier 11 surfaces, and described the first protective seam 13 is transparent.
Silicon island 14, the making material of described silicon island 14 is amorphous silicon, be positioned on described the first protective seam 13 surfaces, and described silicon island 14 is positioned at directly over the grid of described gate line 12.As seen, the light that the backlight of described liquid crystal indicator sends can be subject to blocking of gate line 12, can not shine directly on silicon island 14.
Data line 15, described data line 15 are positioned on the surface of described the first protective seam 13 and silicon island 14, and described data line 15 is divided into two parts by the channel structure of silicon island 14.Described data line 15, gate line 12, the first protective seam 13 and silicon island 14 have consisted of the thin film transistor (TFT) on described array base palte.
The second protective seam 16, described the second protective seam 16 covers on the surface of described data line 15 and the first protective seam 13, is provided with contact hole in described the second protective seam 16, and described the second protective seam 16 is transparent.
Pixel electrode 17, described pixel electrode 17 is transparency electrode, is preferably indium-tin oxide electrode or indium zinc oxide electrode, described pixel electrode is positioned on described the second protective seam 16 surfaces, is electrically connected to described data line 15 by via hole.
Described color membrane substrates comprises:
The second transparency carrier 21, described second Benq's plate 21 is preferably glass substrate.
Black matrix" 20, described black matrix" 20 are arranged on described the second transparency carrier 21 on the surface of described array base palte one side, are used for blocking the non-essential light leak of described liquid crystal indicator.
Color filter film 19, described color filter film 19 are positioned on described the second transparency carrier 21 surfaces.
Common electrode 18, described common electrode 18 is transparency electrode, is positioned on described ink lay 19 surfaces.
Described spacer 10 is preferably the black spacer, and it is made material and comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.And as shown in Figure 1, described spacer is the spacer of column, and the gap between described array base palte and color membrane substrates can effectively be supported in the position between described array base palte and color membrane substrates.
And described spacer 10 is positioned at the top of the thin film transistor (TFT) of described array base palte, and as shown in Figure 1, described spacer 10 is positioned on the surface of the raceway groove of described silicon island 14 and the second protective seam 16.Be filled with liquid crystal molecule 22 in gap between described array base palte and color membrane substrates.
The light that sends of described backlight, a part can be blocked by gate line 12; Another part can see through array base palte, liquid crystal molecule 22 and color membrane substrates successively, becomes described liquid crystal indicator work light to display; Some light can be through the reflection of color membrane substrates and the scattering of liquid crystal molecule, direction towards the silicon island 14 of thin film transistor (TFT) penetrates, because the spacer 10 that is arranged on thin film transistor (TFT) top is opaque, the light of directive silicon island 14 can be stopped by spacer 10, make it can't arrive silicon island 14, can effectively avoid the generation of liquid crystal indicator photoproduction leakage current, avoid the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
Embodiment two:
The present embodiment discloses a kind of method for making of liquid crystal indicator, and the method comprises:
Step S11, as shown in Figure 2 provides array base palte 101, and described array base palte 101 comprises the first transparency carrier, gate line, the first protective seam, silicon island, data line, the second protective seam and pixel electrode.
Step S12, form spacer above the thin film transistor (TFT) of described array base palte, described spacer is opaque spacer.
Concrete, the process of formation spacer comprises:
As shown in Figure 3, apply opaque photochromics on described array base palte 101 surfaces, form opaque layer 102, described opaque photochromics preferably comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
As shown in Figure 4, take mask plate 103 with spacer figure as mask, adopt ultraviolet ray that described opaque layer 102 is exposed, form the spacer pattern on described opaque layer 102.
As shown in Figure 5, adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer 104, and described spacer 104 is positioned at the thin film transistor (TFT) top of described array base palte 101.
Step S13, oven dry.Specifically the array base palte that is formed with spacer can be placed in baking oven, under the environment of 220 ℃ ~ 230 ℃, carry out the baking of 30min, spacer be solidified stable.
Step S14, provide color membrane substrates, and fit described array base palte and color membrane substrates, filling liquid crystal molecule between described array base palte and color membrane substrates.
In the liquid crystal indicator of the method made that the present embodiment provides, because spacer is opaque, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte, and described spacer can block the light by the color membrane substrates reflection.And, by the structure of thin film transistor (TFT) as can be known, there is gate line below the silicon island of described thin film transistor (TFT), identical with prior art, the light of backlight direct projection is blocked by gate line.As seen, compared with prior art, the disclosed thin film transistor (TFT) of the application can not be subject to the irradiation of color membrane substrates reflection and liquid crystal molecule scattered beam, has effectively avoided the generation of photoproduction leakage current, and then avoids the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
Embodiment three:
The present embodiment discloses the method for making of another kind of liquid crystal indicator, and the method comprises:
Step S21, provide color membrane substrates, described color membrane substrates comprises the second transparency carrier, black matrix", ink lay and common electrode.
Step S22, form spacer on described color membrane substrates surface, described spacer is opaque spacer.
Concrete, the process of formation spacer comprises:
Apply opaque photochromics on described color membrane substrates surface, form opaque layer, described opaque photochromics preferably comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
Take mask plate with spacer figure as mask, described opaque layer is exposed, form the spacer pattern on described opaque layer.
Adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer, and the distribution of described spacer is corresponding with the distribution of the thin film transistor (TFT) of array base palte.
Step S23, oven dry.Specifically the color membrane substrates that is formed with spacer can be placed in baking oven, under the environment of 220 ℃ ~ 230 ℃, carry out the baking of 30min, spacer be solidified stable.
Step S24, provide array base palte, and fit described array base palte and color membrane substrates, make described spacer corresponding with the thin film transistor (TFT) of described array base palte, namely described spacer is positioned at the top of described thin film transistor (TFT).Afterwards, filling liquid crystal molecule between described array base palte and color membrane substrates.
In the liquid crystal indicator of the method made that the present embodiment provides, because spacer is opaque, and described spacer is positioned on the surface of thin film transistor (TFT) of described array base palte, and described spacer can block the light by the color membrane substrates reflection.And, by the structure of thin film transistor (TFT) as can be known, there is gate line below the silicon island of described thin film transistor (TFT), identical with prior art, the light of backlight direct projection is blocked by gate line.As seen, compared with prior art, the disclosed thin film transistor (TFT) of the application can not be subject to the irradiation of color membrane substrates reflection and liquid crystal molecule scattered beam, has effectively avoided the generation of photoproduction leakage current, and then avoids the stability of liquid crystal indicator work to be subject to the impact of photoproduction leakage current.
In this instructions, various piece adopts the mode of going forward one by one to describe, and what each part stressed is and the difference of other parts that between various piece, identical similar part is mutually referring to getting final product.
To the above-mentioned explanation of the disclosed embodiments, this area professional and technical personnel can be realized maybe using the present invention.Multiple modification to these embodiment will be apparent concerning those skilled in the art, and General Principle as defined herein can be in the situation that do not break away from the spirit or scope of the present invention, realization in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.

Claims (10)

1. a liquid crystal indicator, is characterized in that, comprising:
The array base palte that is oppositely arranged and color membrane substrates, and the opaque spacer between described array base palte and color membrane substrates, and described spacer is positioned at the top of the thin film transistor (TFT) of described array base palte.
2. liquid crystal indicator according to claim 1, is characterized in that, described spacer is the black spacer.
3. liquid crystal indicator according to claim 2, is characterized in that, the making material of described spacer comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
4. liquid crystal indicator according to claim 1, is characterized in that, described spacer is the spacer of column.
5. the method for making of a liquid crystal indicator, is characterized in that, comprising:
Array base palte is provided;
Form spacer above the thin film transistor (TFT) of described array base palte, described spacer is opaque spacer;
Color membrane substrates is provided, and fit described array base palte and color membrane substrates.
6. method according to claim 5, is characterized in that, the process of described formation spacer comprises:
Apply opaque photochromics on described array base palte surface, form opaque layer;
Take mask plate with spacer figure as mask, described opaque layer is exposed, form the spacer pattern on described opaque layer;
Adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer, and described spacer is positioned at the thin film transistor (TFT) top of described array base palte;
Oven dry.
7. method according to claim 6, is characterized in that, described opaque photochromics comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
8. the method for making of a liquid crystal indicator, is characterized in that, comprising:
Color membrane substrates is provided;
Form spacer on described color membrane substrates surface, described spacer is opaque spacer;
Array base palte is provided, and fit described array base palte and color membrane substrates, and described spacer is corresponding with the thin film transistor (TFT) of described array base palte.
9. method according to claim 8, is characterized in that, the process of described formation spacer comprises:
Apply opaque photochromics on described color membrane substrates surface, form opaque layer;
Take mask plate with spacer figure as mask, described opaque layer is exposed, form the spacer pattern on described opaque layer;
Adopt developing process, remove the opaque photochromics outside described spacer pattern, form spacer, and the distribution of described spacer is corresponding with the distribution of the thin film transistor (TFT) of described array base palte;
Oven dry.
10. method according to claim 9, is characterized in that, described opaque photochromics comprises photonasty acryl resin 12% ~ 25%, photonasty acrylic monomers 10% ~ 25%, emulsion 2% ~ 10%, stabilizing agent 0.3% ~ 2%, propylene glycol monomethyl ether ester 50% ~ 70% and carbon black 3% ~ 8%.
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US11604373B2 (en) 2020-04-23 2023-03-14 Coretronic Corporation Electrically controllable viewing angle switch device and display apparatus

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