CN103084054B - Polysilicon waste gas elution circuit - Google Patents
Polysilicon waste gas elution circuit Download PDFInfo
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- CN103084054B CN103084054B CN201310029582.1A CN201310029582A CN103084054B CN 103084054 B CN103084054 B CN 103084054B CN 201310029582 A CN201310029582 A CN 201310029582A CN 103084054 B CN103084054 B CN 103084054B
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- Prior art keywords
- leacheate
- circulatory pool
- eluting column
- waste gas
- waste residue
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Abstract
The present invention proposes a kind of polysilicon waste gas elution circuit.This system comprises: the first eluting column, utilizes leacheate to carry out drip washing to described polysilicon waste gas; Second eluting column, utilizes leacheate to carry out drip washing to described polysilicon waste gas; First leacheate circulatory pool is for receiving the leacheate from described first eluting column and the second eluting column; Second leacheate circulatory pool, for receiving the leacheate from described first leacheate circulatory pool; Waste residue stop member, enters described second leacheate circulatory pool for stoping waste residue from described first leacheate circulatory pool; First circulating pump, for being incorporated in described first eluting column by the leacheate in described second leacheate circulatory pool, the second circulating pump, for being incorporated into the leacheate in described second leacheate circulatory pool in described second eluting column.Utilize this system, effectively can carry out drip washing to polysilicon waste gas.
Description
Technical field
The present invention relates to polysilicon waste gas elution circuit.
Background technology
The waste gas elution device that existing improved Siemens produces polysilicon is by eluting column, NaOH solution circulating pump, safe liquid seal tank, blow-down pipe, reception geosyncline.Waste gas eluting column is wet absorption type purification apparatus, and function is spray packet classification formula, and leacheate is for absorbing neutralizer with NaOH (NaOH).Originally to design continuous waste gas be two cover eluting columns receives geosyncline to two independent waste liquids, circulating pump and dredge pump are arranged on waste liquid and receive geosyncline side, directly take out the leacheate received in geosyncline and carry out cycling elution, the complete leacheate of drip washing is got back to by the outlet of eluting column and is received in geosyncline.Its operation principle is: waste gas is entered in eluting column by air inlet and enters first order spray section slowly, carry out first order spray, gas-liquid two-phase is made to obtain first time fully contact, waste gas after one-level drip washing slows down and enters second level spray function section, waste gas is made to obtain gas-liquid two-phase haptoreaction more fully again, waste gas after the process of the second level slows down and enters third level spray function section, waste gas is made to obtain gas-liquid two-phase haptoreaction more fully again, waste gas after third level spray to enter in the safe liquid seal tank that is arranged on eluting column top platform from the top of eluting column, react with the leacheate in safe liquid seal tank again, air is entered through blow-down pipe after reaching national toxic emission secondary discharge standard.
But the drip washing means at present for polysilicon waste gas still have much room for improvement.
Summary of the invention
The present invention completes based on the following discovery of inventor:
Inventor finds, the leacheate of current employing is alkaline solution such as sodium hydroxide solution, because alkaline solution such as sodium hydroxide solution very easily reacts with chlorosilane or hydrogen chloride, thus, when leacheate after alkaline solution such as sodium hydroxide solution and chlorosilane or hydrogen chloride react flow into circulatory pool from the outlet of eluting column, can generate a large amount of waste residues in circulatory pool, waste residue main component is Na
2siO
3, SiO
2, NaCl etc.A part for these waste residues can be floated at the top of circulatory pool, and another part can be deposited in the bottom of circulatory pool, along with bottom waste residue is cumulative, the import of circulating pump and dredge pump can be caused to block, cause the separation difficulty of pulp water, pond body cleaning difficulty, has influence on the treatment effeciency of waste gas simultaneously.
The present invention one of is intended to solve the problems of the technologies described above at least to a certain extent or at least provides a kind of useful business to select.For this reason, one object of the present invention is to propose a kind ofly effectively to carry out the drip washing of polysilicon waste gas and effectively can carry out the polysilicon waste gas elution circuit of leacheate circulation.
In one aspect of the invention, the present invention proposes a kind of polysilicon waste gas elution circuit.According to embodiments of the invention, this system comprises: the first eluting column, and described first eluting column utilizes leacheate to carry out drip washing to described polysilicon waste gas; Second eluting column, described second eluting column utilizes leacheate to carry out drip washing to described polysilicon waste gas; First leacheate circulatory pool, described first leacheate circulatory pool is connected with the second eluting column with described first eluting column respectively, for receiving the leacheate from described first eluting column and the second eluting column; Second leacheate circulatory pool, described second leacheate circulatory pool is communicated with described first leacheate circulatory pool, for receiving the leacheate from described first leacheate circulatory pool; Waste residue stop member, described waste residue stop member is arranged between described first leacheate circulatory pool and described second leacheate circulatory pool, enters described second leacheate circulatory pool for stoping waste residue from described first leacheate circulatory pool; First circulating pump, described first circulating pump is arranged in described second leacheate circulatory pool, for being incorporated in described first eluting column by the leacheate in described second leacheate circulatory pool; And second circulating pump, described second circulating pump is arranged in described second leacheate circulatory pool, for being incorporated in described second eluting column by the leacheate in described second leacheate circulatory pool.Because all first the leacheate of the first eluting column and the second eluting column enters in the first leacheate circulatory pool, and between the first leacheate circulatory pool and the second leacheate circulatory pool, be provided with waste residue stop member, thus effectively can reduce the gathering of waste residue in the second leacheate circulatory pool and deposition, thus can effectively recycle leacheate, and effectively can carry out drip washing to polysilicon waste gas.
According to embodiments of the invention, this polysilicon waste gas elution circuit can also have following additional technical feature:
In one embodiment of the present of invention, described leacheate is sodium hydroxide solution 6 % by weight ~ 8 % by weight.In one embodiment of the present of invention, described waste residue stop member is flase floor, and described flase floor is formed with through hole.
In one embodiment of the present of invention, described through hole is square through hole or manhole.
In one embodiment of the present of invention, the length of side of described square through hole is 15 ~ 20mm.
In one embodiment of the present of invention, the diameter of described manhole is 15 ~ 20mm.
In one embodiment of the present of invention, form overlapping region at the sidewall of described first leacheate circulatory pool and described second leacheate circulatory pool, wherein, described overlapping region is formed with connected entrance, described waste residue stop member is arranged in described connected entrance.
In one embodiment of the present of invention, described overlapping region is formed with multiple connected entrance, wherein, each connected entrance is provided with at least one waste residue stop member.
In one embodiment of the present of invention, described connected entrance to be arranged under liquid level at least 400mm.
In one embodiment of the present of invention, at least one of described first circulating pump and the second circulating pump is arranged on the interior side away from described first leacheate circulatory pool of described second leacheate circulatory pool.
Polysilicon waste gas elution circuit at least can have one of following advantages according to an embodiment of the invention:
1, according to embodiments of the invention, leacheate can realize circulating in two leacheate circulatory pools, thus make two independent continuous exhaust treatment systems become a large circulating treating system, improve the mobility of leacheate, alkali lye in leacheate obtains better utilization, has saved production cost.
2, according to embodiments of the invention, waste residue stop member can play the effect of filtration to waste residue especially scum silica frost, greatly reduce the stopping state of circulating pump and dredge pump, saves a large amount of manpowers and the time removes dredging pipeline.
3, according to embodiments of the invention, a large amount of waste residue has been deposited in the bottom of the first leacheate circulatory pool, and the waste residue in the second leacheate circulatory pool is significantly reduced, so the frequency of cleaning circulatory pool can significantly be reduced.
Additional aspect of the present invention and advantage will part provide in the following description, and part will become obvious from the following description, or be recognized by practice of the present invention.
Accompanying drawing explanation
Above-mentioned and/or additional aspect of the present invention and advantage will become obvious and easy understand from accompanying drawing below combining to the description of embodiment, wherein:
Fig. 1 is the structural representation of polysilicon waste gas elution circuit according to an embodiment of the invention; And
Fig. 2 is the partial structurtes schematic diagram of the polysilicon waste gas elution circuit according to another embodiment of the present invention.
Detailed description of the invention
Be described below in detail embodiments of the invention, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has element that is identical or similar functions from start to finish.Be exemplary below by the embodiment be described with reference to the drawings, be intended to for explaining the present invention, and can not limitation of the present invention be interpreted as.
Term " first ", " second " only for describing object, and can not be interpreted as instruction or hint relative importance or imply the quantity indicating indicated technical characteristic.Thus, be limited with " first ", the feature of " second " can express or impliedly comprise one or more these features.In describing the invention, the implication of " multiple " is two or more, unless otherwise expressly limited specifically.
In the present invention, term " polysilicon waste gas " refers in polysilicon production process, the waste gas produced, and waste gas component is dichlorosilane, trichlorosilane, silicon tetrachloride, hydrogen, nitrogen, hydrogen chloride and a small amount of solid silicon particle normally.In the present invention, unless otherwise clearly defined and limited, the term such as term " installation ", " being connected ", " connection ", " fixing " should be interpreted broadly, and such as, can be fixedly connected with, also can be removably connect, or connect integratedly; Can be mechanical connection, also can be electrical connection; Can be directly be connected, also indirectly can be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, above-mentioned term concrete meaning in the present invention can be understood as the case may be.
The present invention proposes a kind of polysilicon waste gas elution circuit.With reference to figure 1, according to embodiments of the invention, this polysilicon waste gas elution circuit comprises: the first eluting column 100, second eluting column 200, first leacheate circulatory pool 300, second leacheate circulatory pool 400, waste residue stop member 500, first circulating pump 600 and the second circulating pump 700.
According to embodiments of the invention, the first eluting column 100 utilizes leacheate to carry out drip washing to polysilicon waste gas, and the second eluting column 200 utilizes leacheate to carry out drip washing to polysilicon waste gas.According to embodiments of the invention, the first eluting column 100 is identical with the leacheate that the second eluting column 200 adopts, and can be any known leacheate, and wherein, preferred NaOH, most preferable concentrations is the sodium hydrate aqueous solution of 6 % by weight ~ 8 % by weight.Inventor is surprised to find: thus, drip washing requirement can be met, and the waste residue viscosity that drip washing produces is low, substantially non-caked, dioxide-containing silica relatively high (because of air-intake component change, the waste residue dioxide-containing silica of generation is not fixed) in waste residue solid, be convenient to grid isolation and be separated salvaging with later stage pulp water, the waste residue major part simultaneously produced is in floating state, sinks on a small quantity, is conducive to grid isolation.In addition, the first eluting column 100 separately can carry out parallel drip washing to the polysilicon waste gas of different batches with the second eluting column 200, and also can carry out continuous multi-stage drip washing to the polysilicon waste gas of identical one batch, this can regulate according to actual needs.
According to embodiments of the invention, first leacheate circulatory pool 300 is connected with the second eluting column 200 with the first eluting column 100 respectively, for receiving the leacheate from the first eluting column 100 and the second eluting column 200, second leacheate circulatory pool 400 is communicated with the first leacheate circulatory pool 300, thus, the second leacheate circulatory pool 400 can receive the leacheate from the first leacheate circulatory pool 300.In addition according to embodiments of the invention, waste residue stop member 500 is arranged between the first leacheate circulatory pool 300 and the second leacheate circulatory pool 400, may be used for stoping waste residue to enter the second leacheate circulatory pool 400 from the first leacheate circulatory pool 300.Thus while the leacheate in the first leacheate circulatory pool 300 enters into the second leacheate circulatory pool 400, the waste residue in the first leacheate circulatory pool 300 can't enter into the second leacheate circulatory pool 400.Thus, can guarantee do not have in the second leacheate circulatory pool 400 or seldom have waste residue to gather.According to embodiments of the invention, the type of waste residue stop member 500 is also not particularly limited.According to a particular embodiment of the invention, waste residue stop member 500 can be flase floor, and this flase floor is formed with through hole.Optionally, through hole is square through hole or manhole.In addition, according to the exploration of inventor, the length of side of described square through hole is the diameter of 15 ~ 20mm or manhole is 15 ~ 20mm, both can meet waste residue and cannot enter the second leacheate circulatory pool 400, the efficiency that leacheate enters into the second leacheate circulatory pool 400 from the first leacheate circulatory pool 300 can also have been improved to the utmost simultaneously.
In addition, according to embodiments of the invention, the position relationship of the first leacheate circulatory pool 300 and the second leacheate circulatory pool 400 is also not particularly limited, as long as it can be interconnected.In addition, with reference to figure 2, according to the specific embodiment of the invention, the sidewall of the first leacheate circulatory pool 300 and the second leacheate circulatory pool 400 forms overlapping region, wherein, this overlapping region is formed with connected entrance 800, namely waste residue stop member 500 is arranged in this connected entrance 800.According to embodiments of the invention, the number of connected entrance 800 and waste residue stop member 500 is also not particularly limited.According to embodiments of the invention, overlapping region is formed with multiple connected entrance 800, wherein, each connected entrance 800 is provided with at least one waste residue stop member 500.In addition, according to embodiments of the invention, thus, both can meet waste residue and cannot enter the second leacheate circulatory pool 400, the efficiency that leacheate enters into the second leacheate circulatory pool 400 from the first leacheate circulatory pool 300 can also have been improved to the utmost simultaneously.In addition, according to embodiments of the invention, connected entrance 800 can be arranged under liquid level at least 400mm.Thus, effectively can prevent floating waste residue from from the first leacheate circulatory pool 300, entering into the second leacheate circulatory pool 400, and the efficiency that leacheate enters into the second leacheate circulatory pool 400 from the first leacheate circulatory pool 300 can be improved to the utmost.
According to embodiments of the invention, the first circulating pump 600 is arranged in the second leacheate circulatory pool 400, for being incorporated in the first eluting column 100 by the leacheate in the second leacheate circulatory pool 400.Second circulating pump 700 is arranged in the second leacheate circulatory pool 400, for being incorporated in the second eluting column 200 by the leacheate in the second leacheate circulatory pool 400.Because all first the leacheate of the first eluting column and the second eluting column enters in the first leacheate circulatory pool, and between the first leacheate circulatory pool and the second leacheate circulatory pool, be provided with waste residue stop member, thus effectively can reduce the gathering of waste residue in the second leacheate circulatory pool and deposition, thus can effectively recycle leacheate, and effectively can carry out drip washing to polysilicon waste gas.With reference to figure 1 and Fig. 2, according to embodiments of the invention, at least one of the first circulating pump 600 and the second circulating pump 700, preferably two are all arranged on the side away from the first leacheate circulatory pool 300 in the second leacheate circulatory pool 400.Thus, the mobility between the first leacheate circulatory pool 300 and the second leacheate circulatory pool 400 can be improved.Further raising utilizes this system to carry out the efficiency of drip washing.
Polysilicon waste gas elution circuit at least can have one of following advantages according to an embodiment of the invention:
1, according to embodiments of the invention, leacheate can realize circulating in two leacheate circulatory pools, thus make two independent continuous exhaust treatment systems become a large circulating treating system, improve the mobility of leacheate, alkali lye in leacheate obtains better utilization, has saved production cost.
2, according to embodiments of the invention, waste residue stop member can play the effect of filtration to waste residue especially scum silica frost, greatly reduce the stopping state of circulating pump and dredge pump, saves a large amount of manpowers and the time removes dredging pipeline.
3, according to embodiments of the invention, a large amount of waste residue has been deposited in the bottom of the first leacheate circulatory pool, and the waste residue in the second leacheate circulatory pool is significantly reduced, so the frequency of cleaning circulatory pool can significantly be reduced.
In the description of this description, specific features, structure, material or feature that the description of reference term " embodiment ", " some embodiments ", " example ", " concrete example " or " some examples " etc. means to describe in conjunction with this embodiment or example are contained at least one embodiment of the present invention or example.In this manual, identical embodiment or example are not necessarily referred to the schematic representation of above-mentioned term.And the specific features of description, structure, material or feature can combine in an appropriate manner in any one or more embodiment or example.
Although illustrate and describe embodiments of the invention above, be understandable that, above-described embodiment is exemplary, can not be interpreted as limitation of the present invention, those of ordinary skill in the art can change above-described embodiment within the scope of the invention when not departing from principle of the present invention and aim, revising, replacing and modification.
Claims (4)
1. a polysilicon waste gas elution circuit, is characterized in that, comprising:
First eluting column, described first eluting column utilizes leacheate to carry out drip washing to described polysilicon waste gas;
Second eluting column, described second eluting column utilizes leacheate to carry out drip washing to described polysilicon waste gas;
First leacheate circulatory pool, described first leacheate circulatory pool is connected with the second eluting column with described first eluting column respectively, for receiving the leacheate from described first eluting column and the second eluting column;
Second leacheate circulatory pool, described second leacheate circulatory pool is communicated with described first leacheate circulatory pool, for receiving the leacheate from described first leacheate circulatory pool;
Waste residue stop member, described waste residue stop member is arranged between described first leacheate circulatory pool and described second leacheate circulatory pool, enters described second leacheate circulatory pool for stoping waste residue from described first leacheate circulatory pool;
First circulating pump, described first circulating pump is arranged in described second leacheate circulatory pool, for being incorporated in described first eluting column by the leacheate in described second leacheate circulatory pool; And
Second circulating pump, described second circulating pump is arranged in described second leacheate circulatory pool, for the leacheate in described second leacheate circulatory pool is incorporated in described second eluting column,
Wherein,
Described waste residue stop member is flase floor, and described flase floor is formed with through hole,
Described through hole is square through hole or manhole,
The length of side of described square through hole is 15 ~ 20mm,
The diameter of described manhole is 15 ~ 20mm,
Overlapping region is formed at the sidewall of described first leacheate circulatory pool and described second leacheate circulatory pool,
Wherein, described overlapping region is formed with connected entrance, described waste residue stop member is arranged in described connected entrance,
Described overlapping region is formed with multiple connected entrance, and wherein, each connected entrance is provided with at least one waste residue stop member.
2. system according to claim 1, is characterized in that, described leacheate is sodium hydroxide solution 6 % by weight ~ 8 % by weight.
3. system according to claim 1, is characterized in that, described connected entrance to be arranged under liquid level at least 400mm.
4. system according to claim 1, is characterized in that, at least one of described first circulating pump and the second circulating pump is arranged on the interior side away from described first leacheate circulatory pool of described second leacheate circulatory pool.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310029582.1A CN103084054B (en) | 2013-01-25 | 2013-01-25 | Polysilicon waste gas elution circuit |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310029582.1A CN103084054B (en) | 2013-01-25 | 2013-01-25 | Polysilicon waste gas elution circuit |
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|---|---|
| CN103084054A CN103084054A (en) | 2013-05-08 |
| CN103084054B true CN103084054B (en) | 2015-12-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310029582.1A Expired - Fee Related CN103084054B (en) | 2013-01-25 | 2013-01-25 | Polysilicon waste gas elution circuit |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202315673U (en) * | 2011-09-15 | 2012-07-11 | 常州天兴环保科技有限公司 | Equipment for treating waste gas containing nitric oxide |
| CN202542834U (en) * | 2012-03-31 | 2012-11-21 | 四川瑞能硅材料有限公司 | Polycrystalline silicon waste acid reclaiming device and polyaluminium chloride (PAC) production device using same |
| CN203061051U (en) * | 2013-01-25 | 2013-07-17 | 昆明冶研新材料股份有限公司 | Polycrystalline silicon waste gas elution system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8187361B2 (en) * | 2009-07-02 | 2012-05-29 | America Air Liquide, Inc. | Effluent gas recovery system in polysilicon and silane plants |
-
2013
- 2013-01-25 CN CN201310029582.1A patent/CN103084054B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202315673U (en) * | 2011-09-15 | 2012-07-11 | 常州天兴环保科技有限公司 | Equipment for treating waste gas containing nitric oxide |
| CN202542834U (en) * | 2012-03-31 | 2012-11-21 | 四川瑞能硅材料有限公司 | Polycrystalline silicon waste acid reclaiming device and polyaluminium chloride (PAC) production device using same |
| CN203061051U (en) * | 2013-01-25 | 2013-07-17 | 昆明冶研新材料股份有限公司 | Polycrystalline silicon waste gas elution system |
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| CN103084054A (en) | 2013-05-08 |
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Address after: 655011 No. 9, Sanjiang Avenue, Qujing economic and Technological Development Zone, Kunming, Yunnan Patentee after: Yunnan metallurgical cloud core silicon material Limited by Share Ltd Address before: 655011 No. 9, Sanjiang Avenue, Qujing economic and Technological Development Zone, Kunming, Yunnan Patentee before: Kunming Yeyan New Material Co., Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20151223 Termination date: 20190125 |